JP2017020000A5 - - Google Patents

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Publication number
JP2017020000A5
JP2017020000A5 JP2016111352A JP2016111352A JP2017020000A5 JP 2017020000 A5 JP2017020000 A5 JP 2017020000A5 JP 2016111352 A JP2016111352 A JP 2016111352A JP 2016111352 A JP2016111352 A JP 2016111352A JP 2017020000 A5 JP2017020000 A5 JP 2017020000A5
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JP
Japan
Prior art keywords
monomers
polymer
formula
dimers
polymerized units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016111352A
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English (en)
Japanese (ja)
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JP2017020000A (ja
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Publication date
Priority claimed from US14/739,402 external-priority patent/US9442377B1/en
Application filed filed Critical
Publication of JP2017020000A publication Critical patent/JP2017020000A/ja
Publication of JP2017020000A5 publication Critical patent/JP2017020000A5/ja
Pending legal-status Critical Current

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JP2016111352A 2015-06-15 2016-06-02 湿式剥離性シリコン含有反射防止剤 Pending JP2017020000A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/739,402 2015-06-15
US14/739,402 US9442377B1 (en) 2015-06-15 2015-06-15 Wet-strippable silicon-containing antireflectant

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018128294A Division JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Publications (2)

Publication Number Publication Date
JP2017020000A JP2017020000A (ja) 2017-01-26
JP2017020000A5 true JP2017020000A5 (https=) 2017-10-19

Family

ID=56881349

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016111352A Pending JP2017020000A (ja) 2015-06-15 2016-06-02 湿式剥離性シリコン含有反射防止剤
JP2018128294A Expired - Fee Related JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018128294A Expired - Fee Related JP6643411B2 (ja) 2015-06-15 2018-07-05 湿式剥離性シリコン含有反射防止剤

Country Status (5)

Country Link
US (2) US9442377B1 (https=)
JP (2) JP2017020000A (https=)
KR (1) KR101849638B1 (https=)
CN (1) CN106243357B (https=)
TW (1) TWI600724B (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11815815B2 (en) * 2014-11-19 2023-11-14 Nissan Chemical Industries, Ltd. Composition for forming silicon-containing resist underlayer film removable by wet process
US10043162B1 (en) 2015-03-31 2018-08-07 Square, Inc. Open ticket payment handling with bill splitting
US10528945B1 (en) 2015-03-31 2020-01-07 Square, Inc. Open ticket payment handling with incremental authorization
US10658191B2 (en) * 2015-09-04 2020-05-19 Taiwan Semiconductor Manufacturing Company, Ltd. Conformal middle layer for a lithography process
US10410883B2 (en) * 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10311420B1 (en) 2016-06-17 2019-06-04 Square, Inc. Synchronizing open ticket functionality with kitchen display systems
US10580062B1 (en) * 2016-06-28 2020-03-03 Square, Inc. Integrating predefined templates with open ticket functionality
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
US10007184B2 (en) * 2016-09-01 2018-06-26 Rohm And Haas Electronic Materials Llc Silicon-containing underlayers
US11506979B2 (en) 2016-12-14 2022-11-22 Rohm And Haas Electronic Materials Llc Method using silicon-containing underlayers
US20180164685A1 (en) * 2016-12-14 2018-06-14 Rohm And Haas Electronic Materials Llc Method using silicon-containing underlayers
CN110494807A (zh) * 2017-03-31 2019-11-22 日产化学株式会社 具有羰基结构的含有硅的抗蚀剂下层膜形成用组合物
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
WO2019009413A1 (ja) * 2017-07-06 2019-01-10 日産化学株式会社 アルカリ性現像液可溶性シリコン含有レジスト下層膜形成組成物
US11360387B2 (en) 2017-08-04 2022-06-14 Rohm And Haas Electronic Materials Llc Silicon-containing underlayers
US10761423B2 (en) * 2017-08-30 2020-09-01 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical composition for tri-layer removal
US10943311B1 (en) 2017-09-29 2021-03-09 Square, Inc. Order fulfillment and tracking systems and methods
US20190146343A1 (en) * 2017-11-10 2019-05-16 Rohm And Haas Electronic Materials Llc Silicon-containing underlayers
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US11138680B1 (en) 2018-11-21 2021-10-05 Square, Inc. Updating menus based on predicted efficiencies
US10915905B1 (en) 2018-12-13 2021-02-09 Square, Inc. Batch-processing transactions in response to an event
US20220187709A1 (en) * 2019-03-28 2022-06-16 Nissan Chemical Corporation Film-forming composition
KR20220041836A (ko) * 2019-07-29 2022-04-01 제이에스알 가부시끼가이샤 조성물, 규소 함유막, 규소 함유막의 형성 방법 및 반도체 기판의 처리 방법
JP7692902B2 (ja) * 2019-10-24 2025-06-16 ブルーワー サイエンス アイ エヌ シー． シリコン含有高水分除去可能平坦化層
WO2021145064A1 (ja) * 2020-01-15 2021-07-22 株式会社カネカ 樹脂組成物、その製造方法、及び、多液型硬化性樹脂組成物
US20230152700A1 (en) * 2020-03-31 2023-05-18 Nissan Chemical Corporation Film-forming composition
US12585188B2 (en) 2020-04-30 2026-03-24 Nissan Chemical Corporation Composition for forming resist underlying film
WO2026083794A1 (ja) * 2024-10-16 2026-04-23 日産化学株式会社 レジスト下層膜形成用組成物

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03100021A (ja) * 1989-09-14 1991-04-25 Nippon Telegr & Teleph Corp <Ntt> ポリシロキサン
JP4096138B2 (ja) 1999-04-12 2008-06-04 Ｊｓｒ株式会社 レジスト下層膜用組成物の製造方法
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6420088B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US6730454B2 (en) 2002-04-16 2004-05-04 International Business Machines Corporation Antireflective SiO-containing compositions for hardmask layer
US6740469B2 (en) 2002-06-25 2004-05-25 Brewer Science Inc. Developer-soluble metal alkoxide coatings for microelectronic applications
JP3951124B2 (ja) 2002-12-06 2007-08-01 Ｊｓｒ株式会社 絶縁膜
ATE377036T1 (de) 2003-05-23 2007-11-15 Dow Corning Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
US7270887B2 (en) 2004-10-13 2007-09-18 Shin-Etsu Chemical Co., Ltd. Antireflective coating, coating composition, and antireflective coated article
EP1762895B1 (en) 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
US7678529B2 (en) 2005-11-21 2010-03-16 Shin-Etsu Chemical Co., Ltd. Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
WO2007066597A1 (ja) 2005-12-06 2007-06-14 Nissan Chemical Industries, Ltd. 光架橋硬化のレジスト下層膜を形成するためのケイ素含有レジスト下層膜形成組成物
JP4421566B2 (ja) 2005-12-26 2010-02-24 チェイル インダストリーズ インコーポレイテッド フォトレジスト下層膜用ハードマスク組成物及びこれを利用した半導体集積回路デバイスの製造方法
KR101523393B1 (ko) * 2007-02-27 2015-05-27 이엠디 퍼포먼스 머티리얼스 코프. 규소를 주성분으로 하는 반사 방지 코팅 조성물
JP5078475B2 (ja) * 2007-07-11 2012-11-21 旭化成イーマテリアルズ株式会社 ポリオルガノシロキサン
JP2009265595A (ja) * 2007-09-07 2009-11-12 Sekisui Chem Co Ltd 感光性組成物及びパターン膜の製造方法
JP5369553B2 (ja) * 2007-09-07 2013-12-18 東レ株式会社 シロキサン樹脂組成物、硬化物およびこれを用いた光半導体
WO2009111122A2 (en) * 2008-03-04 2009-09-11 Dow Corning Corporation Silsesquioxane resins
JP2010039051A (ja) * 2008-08-01 2010-02-18 Sekisui Chem Co Ltd 感光性組成物及びパターン膜の製造方法
JP2010039056A (ja) * 2008-08-01 2010-02-18 Sekisui Chem Co Ltd 感光性組成物及びパターン膜の製造方法
US7955782B2 (en) 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
JP5015892B2 (ja) 2008-10-02 2012-08-29 信越化学工業株式会社 ケイ素含有膜形成用組成物、ケイ素含有膜形成基板及びパターン形成方法
CN102245674B (zh) 2008-12-10 2014-12-10 陶氏康宁公司 倍半硅氧烷树脂
JP5534230B2 (ja) 2008-12-19 2014-06-25 日産化学工業株式会社 アニオン基を有するシリコン含有レジスト下層膜形成組成物
CN102460301B (zh) 2009-06-02 2014-08-06 日产化学工业株式会社 含有带硫醚键的硅的抗蚀剂下层膜形成用组合物
KR101749601B1 (ko) 2009-09-16 2017-06-21 닛산 가가쿠 고교 가부시키 가이샤 설폰아미드기를 가지는 실리콘 함유 레지스트 하층막 형성 조성물
TWI432895B (zh) 2010-12-01 2014-04-01 Chi Mei Corp 感光性聚矽氧烷組成物及其所形成之基材保護膜
JP5785121B2 (ja) 2011-04-28 2015-09-24 信越化学工業株式会社 パターン形成方法
EP2752712A4 (en) * 2011-08-31 2014-12-03 Asahi Kasei E Materials Corp LENS-SENSITIVE ALKALILOUS SILICONE RESIN COMPOSITION
US9011591B2 (en) 2011-09-21 2015-04-21 Dow Global Technologies Llc Compositions and antireflective coatings for photolithography
TWI432898B (zh) * 2011-12-05 2014-04-01 Chi Mei Corp 彩色濾光片用藍色感光性樹脂組成物及其應用
WO2014080908A1 (ja) * 2012-11-26 2014-05-30 東レ株式会社 ネガ型感光性樹脂組成物
US9348228B2 (en) 2013-01-03 2016-05-24 Globalfoundries Inc. Acid-strippable silicon-containing antireflective coating
CN104969126B (zh) * 2013-02-14 2019-10-01 东丽株式会社 负型感光性着色组合物、固化膜、触摸面板用遮光图案和触摸面板的制造方法
JP5830044B2 (ja) 2013-02-15 2015-12-09 信越化学工業株式会社 レジスト下層膜形成用組成物及びパターン形成方法
TWI490653B (zh) 2013-09-10 2015-07-01 Chi Mei Corp 正型感光性樹脂組成物及其圖案形成方法
US10409163B2 (en) * 2014-09-30 2019-09-10 Toray Industries, Inc. Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device

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