JP2017002401A - Silver-coated copper powder - Google Patents
Silver-coated copper powder Download PDFInfo
- Publication number
- JP2017002401A JP2017002401A JP2016111396A JP2016111396A JP2017002401A JP 2017002401 A JP2017002401 A JP 2017002401A JP 2016111396 A JP2016111396 A JP 2016111396A JP 2016111396 A JP2016111396 A JP 2016111396A JP 2017002401 A JP2017002401 A JP 2017002401A
- Authority
- JP
- Japan
- Prior art keywords
- silver
- copper powder
- coated copper
- coated
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/17—Metallic particles coated with metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0466—Alloys based on noble metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Powder Metallurgy (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
本発明は、導電性ペーストなどの導電性材料として好適に用いることができる銀被覆銅粉に関する。 The present invention relates to a silver-coated copper powder that can be suitably used as a conductive material such as a conductive paste.
導電性ペーストは、樹脂系バインダと溶媒からなるビヒクル中に導電性粉末を分散させた流動性組成物であり、電気回路の形成や、セラミックコンデンサの外部電極の形成や、電磁波シールドフィルムの形成、ボンディングフィルムの形成などに広く用いられている。 The conductive paste is a fluid composition in which conductive powder is dispersed in a vehicle composed of a resin binder and a solvent, and the formation of an electric circuit, the formation of an external electrode of a ceramic capacitor, the formation of an electromagnetic shielding film, Widely used for forming bonding films.
この種の導電性ペーストは、樹脂の硬化によって導電性粉末が圧着されて導通が確保される樹脂硬化型と、焼成によって有機成分が揮発して導電性粉末が焼結して導通が確保される焼成型とに分類される。 This type of conductive paste has a resin-cured type in which conductive powder is pressure-bonded by curing the resin to ensure conduction, and an organic component is volatilized by firing to sinter the conductive powder to ensure conduction. It is classified as a firing mold.
前者の樹脂硬化型導電性ペーストは、一般的に、金属粉末からなる導電性粉末と、エポキシ樹脂等の熱硬化性樹脂からなる有機バインダとを含んだペースト状組成物であって、熱を加えることによって熱硬化型樹脂が導電性粉末とともに硬化収縮して、樹脂を介して導電性粉末同士が圧着され接触状態となり、導通性が確保されるものである。この樹脂硬化型導電性ペーストは100℃から精々200℃までの比較的低温域で処理可能であり、熱ダメージが少ないため、プリント配線基板や熱に弱い樹脂基板、電磁波シールドフィルム、ボンディングフィルムなどに主に使用されている。 The former resin-curable conductive paste is generally a paste-like composition containing conductive powder made of metal powder and an organic binder made of thermosetting resin such as epoxy resin, and applies heat. As a result, the thermosetting resin is cured and shrunk together with the conductive powder, and the conductive powder is pressed and brought into contact with each other through the resin, thereby ensuring conductivity. This resin-curable conductive paste can be processed in a relatively low temperature range from 100 ° C. to 200 ° C. and has little thermal damage, so it can be used for printed wiring boards, heat-sensitive resin substrates, electromagnetic shielding films, bonding films, etc. Mainly used.
他方、後者の焼成型導電性ペーストは、一般に導電性粉末(金属粉末)とガラスフリットとを有機ビヒクル中に分散させてなるペースト状組成物であり、500〜900℃にて焼成することにより、有機ビヒクルが揮発し、さらに導電性粉末が焼結することによって導通性が確保されるものである。この際、ガラスフリットは、この導電膜を基板に接着させる作用を有し、有機ビヒクルは、金属粉末およびガラスフリットを印刷可能にするための有機液体媒体として作用する。
焼成型導電性ペーストは、焼成温度が高いため、プリント配線基板や樹脂材料には使用できないが、焼結して金属が一体化することから低抵抗化を実現することができ、例えば積層セラミックコンデンサの外部電極などに使用されている。
On the other hand, the latter fired conductive paste is a paste-like composition in which conductive powder (metal powder) and glass frit are generally dispersed in an organic vehicle. By firing at 500 to 900 ° C., Conductivity is ensured by volatilization of the organic vehicle and sintering of the conductive powder. At this time, the glass frit has a function of adhering the conductive film to the substrate, and the organic vehicle functions as an organic liquid medium for enabling printing of the metal powder and the glass frit.
Firing-type conductive paste cannot be used for printed wiring boards or resin materials because of its high firing temperature, but it can be reduced in resistance because it is sintered and the metal is integrated. It is used for external electrodes.
銀は、導電性に優れているため、異方導電性フィルム、導電性ペースト、導電性接着剤など、各種導電性材料の主要構成材料として用いられている。例えば銀粉に結合剤および溶剤を混合して導電性ペーストとし、この導電性ペーストを用いて基板上に回路パターンを印刷し、焼き付けることでプリント配線板や電子部品の電気回路などを形成することができる。 Since silver is excellent in conductivity, it is used as a main constituent material of various conductive materials such as anisotropic conductive films, conductive pastes, and conductive adhesives. For example, a silver paste can be mixed with a binder and a solvent to form a conductive paste, and a circuit pattern can be printed on the substrate using this conductive paste and baked to form a printed wiring board or an electric circuit of an electronic component. it can.
しかし、銀はとても高価であるため、芯材粒子の表面に、貴金属の膜をメッキしてなる銀被覆粉と呼ばれる導電性粉末が開発され使用されている。例えば特許文献1には、芯材としての銀被覆銅粒子の表面を、酸化銀、炭酸銀、及び有機酸銀のいずれかの銀化合物で被覆してなる銀化合物被覆銅粉であって、SSA(m3/g)が0.1〜10.0であり、D50(μm)が0.5〜10.0であり、1wt%〜40wt%の割合で銀化合物を粒子表面に付着させてなる銀化合物被覆銅粉が開示されている。 However, since silver is very expensive, conductive powder called silver-coated powder obtained by plating a noble metal film on the surface of core material particles has been developed and used. For example, Patent Document 1 discloses a silver compound-coated copper powder obtained by coating the surface of silver-coated copper particles as a core material with a silver compound of silver oxide, silver carbonate, and organic acid silver, and SSA (M 3 / g) is 0.1 to 10.0, D50 (μm) is 0.5 to 10.0, and a silver compound is adhered to the particle surface at a rate of 1 wt% to 40 wt%. Silver compound-coated copper powder is disclosed.
銅粉粒子表面に銀を被覆させる方法として、還元メッキ被覆法と置換メッキ被覆の2種類を挙げることができる。 As a method for coating the surface of the copper powder particles with silver, there can be mentioned two types, ie, a reduction plating coating method and a displacement plating coating.
還元メッキ被覆法は、銅粉粒子の表面に、還元剤で還元された銀の微粒子を緻密に被覆させていく方法であり、例えば特許文献2には、還元剤が溶存した水溶液中で金属銅粉と硝酸銀を反応させる銀被覆銅粉の製造方法が提案されている。 The reduction plating coating method is a method in which fine particles of silver reduced with a reducing agent are densely coated on the surface of copper powder particles. For example, Patent Document 2 discloses metallic copper in an aqueous solution in which a reducing agent is dissolved. A method for producing a silver-coated copper powder in which powder and silver nitrate are reacted is proposed.
他方、置換メッキ被覆法は、銅粉粒子の界面で、銀イオンが金属の銅と電子の授受を行い、銀イオンが金属の銀に還元され、代わりに金属の銅が酸化され銅イオンになることで、銅粉粒子の表面層を銀層とする方法であり、例えば特許文献3には、銀イオンが存在する有機溶媒含有溶液中で、銀イオンと金属銅との置換反応により、銀を銅粒子の表面に被覆する銀被覆銅粉の製造方法が記載されている。 On the other hand, in the displacement plating coating method, silver ions exchange electrons with metallic copper at the interface of copper powder particles, silver ions are reduced to metallic silver, and instead metallic copper is oxidized into copper ions. That is, a method in which the surface layer of the copper powder particles is a silver layer. For example, in Patent Document 3, silver is exchanged between silver ions and metallic copper in an organic solvent-containing solution in which silver ions are present. A method for producing silver-coated copper powder for coating the surface of copper particles is described.
銀被覆銅粉に関しては、特許文献4において、銅粉粒子の表面に銀層を備えたデンドライト状導電性粉末であって、銀の含有量がデンドライト状導電性粉末全体に対して3.0〜30.0質量%であることを特徴とするデンドライト状導電性粉末が提案されている。
また、特許文献5において、銅粉粒子表面が銀で被覆されてなるデンドライト状を呈する銀被覆銅粉粒子からなる銀被覆銅粉であって、レーザー回折散乱式粒度分布測定装置によって測定される比表面積(「球形近似比表面積」と称する)に対するBET一点法で測定される比表面積(「BET比表面積」と称する)の比率(BET比表面積/球形近似比表面積)が6.0〜15.0であることを特徴とする銀被覆銅粉を提案されている。
さらに特許文献6において、銅粉粒子表面が銀で被覆されてなる銀被覆銅粉粒子からなる銀被覆銅粉であって、走査型電子顕微鏡(SEM)を用いて銀被覆銅粉粒子を観察した際、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して、二次元的或いは三次元的に成長したデンドライト状を呈し、かつ、主軸の太さaが0.3μm〜5.0μmであり、主軸から伸びた枝の中で最も長い枝の長さbが0.6μm〜10.0μmであるデンドライト状を呈する銀被覆銅粉粒子を含有することを特徴とする銀被覆銅粉が提案されている。
Regarding the silver-coated copper powder, in Patent Document 4, it is a dendritic conductive powder having a silver layer on the surface of the copper powder particles, and the silver content is 3.0 to the entire dendritic conductive powder. A dendritic conductive powder characterized by 30.0% by mass has been proposed.
Moreover, in patent document 5, it is silver covering copper powder which consists of silver covering copper powder particle which exhibits the dendritic shape by which the copper powder particle surface is coat | covered with silver, Comprising: Ratio measured by the laser diffraction scattering type particle size distribution measuring apparatus The ratio (BET specific surface area / spherical approximate specific surface area) of the specific surface area (referred to as “BET specific surface area”) measured by the BET single point method to the surface area (referred to as “spherical approximate specific surface area”) is 6.0 to 15.0. A silver-coated copper powder characterized by the above has been proposed.
Furthermore, in Patent Document 6, a silver-coated copper powder composed of silver-coated copper powder particles whose surface is coated with silver, and the silver-coated copper powder particles were observed using a scanning electron microscope (SEM). At this time, it is provided with one main shaft, a plurality of branches obliquely branch from the main shaft, exhibiting a dendritic shape grown two-dimensionally or three-dimensionally, and the thickness a of the main shaft is 0.3 μm. Silver having a dendrite-like shape and silver-coated copper powder particles having a length b of 0.6 μm to 10.0 μm, the longest branch length b of the branches extending from the main axis is about 5.0 μm Coated copper powder has been proposed.
ところで、銀被覆銅粉の芯材、すなわち銅粉粒子の製法として、従来から、電解銅粉のデンドライト形態を整えるために、電解液に塩素を添加して電解する方法が知られている(特許文献7参照)。しかしながら、残留塩素の影響で、実際に電解液に塩素を添加して電解してみると、銅粉粒子に銀を被覆する際、銀を均一に被覆させることが困難であり、期待したほど導電性を高めることができないという問題が判明した。特に銀の被覆量が少ない場合には、銀を均一に被覆させることが特に困難であるため、銀を被覆しても導電性を有効に高めることができないことが分かってきた。
そこで本発明は、電解法で得られた銅粉粒子の表面が銀又は銀合金で被覆されてなる構成を有する銀被覆銅粉粒子からなる銀被覆銅粉に関し、塩素を含んでいても、導電性を高めることができる、新たな銀被覆銅粉を提供せんとするものである。
By the way, as a method for producing a silver-coated copper powder core material, that is, copper powder particles, a method of electrolyzing by adding chlorine to an electrolytic solution has been conventionally known (patent). Reference 7). However, due to the effect of residual chlorine, when adding chlorine to the electrolyte and electrolyzing it, it is difficult to uniformly coat the silver when the copper powder particles are coated with silver. The problem that it was not possible to improve the sex was found. In particular, when the coating amount of silver is small, it is particularly difficult to uniformly coat silver, and it has been found that the conductivity cannot be effectively increased even if silver is coated.
Therefore, the present invention relates to a silver-coated copper powder composed of silver-coated copper powder particles having a structure in which the surface of the copper powder particles obtained by the electrolytic method is coated with silver or a silver alloy. It is intended to provide a new silver-coated copper powder that can enhance the properties.
本発明は、電解法で得られた銅粉粒子の表面が銀又は銀合金で被覆されてなる構成を有する銀被覆銅粉粒子を含有する銀被覆銅粉であって、塩素の濃度が5wtppm〜250wtppmであり、且つ、X線光電子分光分析法による測定される、当該銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu)と銀の濃度(ρAg)との比率(ρCu/ρAg)が0.12以下であることを特徴とする銀被覆銅粉を提案する。 The present invention is a silver-coated copper powder containing silver-coated copper powder particles having a structure in which the surface of the copper powder particles obtained by the electrolytic method is coated with silver or a silver alloy, and the concentration of chlorine is 5 wtppm to Ratio of total Cu concentration (ρCu) and silver concentration (ρAg) of Cu, CuO and Cu 2 O on the surface of the silver-coated copper powder particles, which is 250 wtppm and measured by X-ray photoelectron spectroscopy A silver-coated copper powder characterized in that (ρCu / ρAg) is 0.12 or less is proposed.
本発明が提案する銀被覆銅粉は、電解法で得られた銅粉粒子の表面が銀又は銀合金で被覆されてなる構成を有する銀被覆銅粉粒子を含有する銀被覆銅粉において、銀被覆銅粉粒子表面における銅(Cu、CuO及びCu2Oの合計量)の割合を低くして銀を均一に被覆したことによって、塩素を含んでいても導電性を有効に高めることができるようになった。よって、本発明が提案する銀被覆銅粉は、導電性ペーストなどの材料として特に有効に用いることができる。 The silver-coated copper powder proposed by the present invention is a silver-coated copper powder containing silver-coated copper powder particles having a structure in which the surface of the copper powder particles obtained by the electrolytic method is coated with silver or a silver alloy. By lowering the ratio of copper (total amount of Cu, CuO and Cu 2 O) on the surface of the coated copper powder particles and uniformly coating silver, the conductivity can be effectively increased even if chlorine is contained. Became. Therefore, the silver-coated copper powder proposed by the present invention can be used particularly effectively as a material such as a conductive paste.
以下、本発明の実施形態について詳述する。但し、本発明の範囲が以下の実施形態に限定されるものではない。 Hereinafter, embodiments of the present invention will be described in detail. However, the scope of the present invention is not limited to the following embodiments.
<本銀被覆銅粉>
本実施形態に係る銀被覆銅粉(「本銀被覆銅粉」と称する)は、芯材としての銅粉粒子の表面が銀又は銀合金で被覆されてなる構成を有する銀被覆銅粉粒子(「本銀被覆銅粉粒子」と称する)を含有する粉体である。
<Silver-coated copper powder>
Silver-coated copper powder according to the present embodiment (referred to as “main silver-coated copper powder”) is a silver-coated copper powder particle having a structure in which the surface of a copper powder particle as a core material is coated with silver or a silver alloy ( (Referred to as “silver-coated copper powder particles”).
(芯材粒子)
芯材としての銅粉粒子は、電解法で得られた銅粉粒子であればよい。例えば球状を呈する銅粉粒子なども含まれる。中でも、本銀被覆銅粉粒子の形状としてデンドライト状が好ましいという観点から、芯材粒子はデンドライト状を呈する銅粉粒子であるのが好ましい。
(Core particles)
The copper powder particles as the core material may be copper powder particles obtained by an electrolytic method. For example, spherical copper powder particles are also included. Among these, from the viewpoint that a dendrite shape is preferable as the shape of the silver-coated copper powder particles, the core material particles are preferably copper powder particles exhibiting a dendrite shape.
(本銀被覆銅粉粒子の形状)
本銀被覆銅粉粒子の形状は特に限定するものではない。例えば球状、略球状、楕円粒状、略楕円球状、角柱状、芋状、プレート状、フレーク状、針状、デンドライト状などの様々形状であってもよい。中でも、デンドライト状を呈する銀被覆銅粉粒子であれば、粒子同士の接点の数が多く、優れた導通性を得ることができる。例えば導電性ペーストなどに含まれる導電性粉末粒子がデンドライト状を呈していれば、球状粒子などに比べて、粒子同士の接点の数が多くなるため、導電性粉末の量を少なくしても導電特性を高めることができる。よって、本銀被覆銅粉粒子の形状は、デンドライト状であるのが好ましい。
(Shape of this silver-coated copper powder particle)
The shape of the silver-coated copper powder particles is not particularly limited. For example, various shapes such as a spherical shape, a substantially spherical shape, an elliptical granular shape, a substantially elliptical spherical shape, a prismatic shape, a bowl shape, a plate shape, a flake shape, a needle shape, and a dendrite shape may be used. Among these, if the silver-coated copper powder particles have a dendritic shape, the number of contacts between the particles is large, and excellent conductivity can be obtained. For example, if the conductive powder particles contained in the conductive paste have a dendritic shape, the number of contact points between the particles is larger than that of the spherical particles, so that even if the amount of the conductive powder is reduced, the conductive powder particles are conductive. The characteristics can be enhanced. Therefore, it is preferable that the silver-coated copper powder particles have a dendrite shape.
ここで、「デンドライト状」とは、図1のモデル図に示されるように、電子顕微鏡(500〜20、000倍)で観察した際に、一本の主軸を備えており、該主軸から複数の枝が垂直若しくは斜めに分岐して、二次元的或いは三次元的に成長した形状を呈するという意味である。この際、主軸とは、複数の枝がそこから分岐している基となる棒状部分を示す。
中でも、本銀被覆銅粉粒子を電子顕微鏡(500〜20,000倍)で観察した際、次のような所定の特徴を有するデンドライト状を呈するのが特に好ましい。
Here, as shown in the model diagram of FIG. 1, the “dendritic shape” includes a single main axis when observed with an electron microscope (500 to 20,000 times), and a plurality of the main axes from the main axis. This means that the branches are vertically or obliquely branched to form a shape grown two-dimensionally or three-dimensionally. In this case, the main axis refers to a rod-like portion that is a group from which a plurality of branches are branched.
Among these, when the present silver-coated copper powder particles are observed with an electron microscope (500 to 20,000 times), it is particularly preferable to exhibit a dendrite shape having the following predetermined characteristics.
・主軸の太さaは0.3μm〜5.0μmであることが好ましく、中でも0.4μm以上或いは4.5μm以下、中でも特に特に0.5μm以上或いは4.0μm以下であるのがさらに好ましい。
デンドライトにおける主軸の太さaが0.3μm以上であれば、主軸がしっかりとしているために枝が成長し易い一方、5.0μm以下であれば、粒子が凝集し易いことがなく、例えば松ぼっくり状になるのを防ぐことができる。
The thickness “a” of the main shaft is preferably 0.3 μm to 5.0 μm, more preferably 0.4 μm or more and 4.5 μm or less, and particularly preferably 0.5 μm or more or 4.0 μm or less.
If the thickness a of the main axis in the dendrite is 0.3 μm or more, the main axis is firm and the branches are likely to grow. On the other hand, if the thickness is 5.0 μm or less, the particles are not likely to aggregate. Can be prevented.
・主軸から伸びた枝の中で最も長い枝の長さb(「枝長b」と称する)は、デンドライトの成長度合いを示しており、0.7μm〜12.0μmであることが好ましく、中でも1.0μm以上或いは10.0μm以下、その中でも1.2μm以上或いは8.0μm以下であるのがさらに好ましい。
枝長bが0.7μm以上であれば、デンドライトが十分に成長しており、少ない量で導電性を高めることができるなどの効果を享受できる一方、枝長bが12.0μm以下であれば、本銀被覆銅粉の流動性が低下して取り扱いが難しくなることもないから、好ましい。
The longest branch length b (referred to as “branch length b”) among the branches extending from the main axis indicates the degree of dendrite growth, and is preferably 0.7 μm to 12.0 μm. 0.0 μm or more or 10.0 μm or less, more preferably 1.2 μm or more or 8.0 μm or less.
If the branch length b is 0.7 μm or more, the dendrite is sufficiently grown, and it is possible to enjoy the effect that the conductivity can be increased with a small amount. On the other hand, if the branch length b is 12.0 μm or less, the present Since the fluidity | liquidity of silver covering copper powder falls and handling does not become difficult, it is preferable.
・主軸の長径Lに対する枝の本数(枝本数/長径L)は、デンドライトの枝の多さを示しており、0.5本/μm〜4.0本/μmであるのが好ましく、中でも0.6本/μm以上或いは3.5本/μm以下、その中でも特に0.8本/μm以上或いは3.0本/μm以下であるのがさらに好ましい。枝本数/長径Lが0.5本/μm以上であれば、枝の数は十分に多く、接点を十分に確保できる一方、枝本数/長径Lが4.0本/μm以下であれば、枝の数が多過ぎて本銀被覆銅粉の流動性が劣るようになるのを防ぐことができる。
なお、分岐枝の本数は、写真で確認できる本数であり、隠れた分岐枝の本数は無視した本数である。
The number of branches relative to the major axis L of the main axis (number of branches / major axis L) indicates the number of dendrite branches, and is preferably 0.5 / μm to 4.0 / μm. .6 / μm or more or 3.5 / μm or less, more preferably 0.8 / μm or more or 3.0 / μm or less. If the number of branches / major axis L is 0.5 / μm or more, the number of branches is sufficiently large and sufficient contact can be secured, while if the number of branches / major axis L is 4.0 / μm or less, It can prevent that the fluidity | liquidity of this silver covering copper powder becomes inferior because there are too many branches.
Note that the number of branch branches is the number that can be confirmed by a photograph, and the number of hidden branch branches is an ignored number.
但し、本銀被覆銅粉を電子顕微鏡(500〜20,000倍)で観察した際、多くが上記の如きデンドライト状粒子で占められていれば、それ以外の形状の粒子が混じっていても、本銀被覆銅粉が上記の如きデンドライト状粒子のみからなる場合と同様の効果を得ることができる。よって、かかる観点から、本銀被覆銅粉を電子顕微鏡(500〜20,000倍)で観察した際、上記の如き本銀被覆銅粉粒子が全銅粉粒子のうちの80個数%以上、好ましくは90個数%以上を占めていれば、上記の如きデンドライト状とは認められない非デンドライト状の銀被覆銅粉粒子を含んでいてもよい。 However, when the present silver-coated copper powder is observed with an electron microscope (500 to 20,000 times), if many are occupied by dendritic particles as described above, particles of other shapes are mixed, The same effect as when the present silver-coated copper powder consists only of dendritic particles as described above can be obtained. Therefore, from this viewpoint, when the present silver-coated copper powder is observed with an electron microscope (500 to 20,000 times), the present silver-coated copper powder particles as described above are preferably 80% by number or more of the total copper powder particles, preferably As long as it occupies 90% by number or more, it may contain non-dendritic silver-coated copper powder particles that are not recognized as dendritic.
ちなみに、本銅粉を構成する銅粉粒子のうち、デンドライト状粒子と認められる粒子における、主軸の太さaの平均値は0.5μm〜4.0μmであることが好ましく、中でも1.0μm以上或いは3.0μm以下、中でも特に1.2μm以上或いは2.0μm以下であるのがさらに好ましい。
また、本銅粉を構成する銅粉粒子のうち、デンドライト状粒子と認められる粒子における枝長bの平均は、0.7μm〜8.0μmであることが好ましく、中でも3.0μm以上或いは6.0μm以下、中でも特に特に2.0μm以上或いは4.0μm以下であるのがさらに好ましい。
また、枝本数/主軸長径Lの平均値は、1.0〜4.0本/μmであるのが好ましく、中でも1.5本/μm以上或いは3.0本/μm以下、その中でも1.7本/μm以上或いは2.5本/μm以下であるのがさらに好ましい。
この際、平均値の求め方としては、本銅粉を構成する銅粉粒子のうち、任意に50個以上のデンドライト状粒子を計測して、その平均値を求める必要がある。
Incidentally, among the copper powder particles constituting the present copper powder, the average value of the main axis thickness a in the particles recognized as dendritic particles is preferably 0.5 μm to 4.0 μm, and more preferably 1.0 μm or more. Alternatively, it is preferably 3.0 μm or less, more preferably 1.2 μm or more or 2.0 μm or less.
Moreover, it is preferable that the average of the branch length b in the particle | grains recognized as dendrite-like particle | grains among the copper powder particle | grains which comprise this copper powder is 0.7 micrometer-8.0 micrometers, Especially 3.0 micrometers or more or 6.0 micrometers. In particular, the thickness is particularly preferably 2.0 μm or more and 4.0 μm or less.
The average number of branches / major axis major axis L is preferably 1.0 to 4.0 / μm, and more preferably 1.5 / μm or more or 3.0 / μm or less. More preferably, it is 7 pieces / μm or more or 2.5 pieces / μm or less.
At this time, as a method for obtaining the average value, it is necessary to arbitrarily measure 50 or more dendrite-like particles among the copper powder particles constituting the copper powder and obtain the average value.
上記のように本銀被覆銅粉粒子のデンドライト形状を発達させるためには、言い換えれば、デンドライトの枝を長く成長させるためには、後述するように、本銀被覆銅粉粒子の芯材、すなわち銅粉の製造において、後述する電解装置を使用して所定の電解条件下で、電解液に塩素を添加して電解を行うことが好ましい。 In order to develop the dendrite shape of the present silver-coated copper powder particles as described above, in other words, to grow a dendrite branch long, as described later, the core material of the present silver-coated copper powder particles, that is, In the production of copper powder, it is preferable to perform electrolysis by adding chlorine to the electrolyte under predetermined electrolysis conditions using an electrolysis apparatus described later.
(含有塩素濃度)
本銀被覆銅粉の塩素濃度、すなわち含有塩素濃度は、5wtppm〜250wtppmであるのが好ましく、中でも10wtppm以上或いは220wtppm以下、その中でも20wtppm以上或いは200wtppm以下、その中でも特に30wtppm以上或いは180wtppm以下、その中でも50wtppm以上であるのがさらに好ましい。
本銀被覆銅粉の含有塩素濃度が250wtppm以下であれば、残留塩素による悪影響を効果的に抑制することができる。例えば銅粉粒子に銀を被覆する際に均一な厚さに均一に被覆することができる。なお、本銀被覆銅粉の含有塩素濃度は5wtppm程度が検出限界である。
(Contained chlorine concentration)
The chlorine concentration of the present silver-coated copper powder, that is, the contained chlorine concentration is preferably 5 wtppm to 250 wtppm. More preferably, it is 50 wtppm or more.
If the concentration of chlorine contained in the present silver-coated copper powder is 250 wtppm or less, adverse effects due to residual chlorine can be effectively suppressed. For example, when silver is coated on copper powder particles, it can be uniformly coated to a uniform thickness. The chlorine concentration contained in the present silver-coated copper powder is about 5 wtppm, which is the detection limit.
本銀被覆銅粉の含有塩素濃度を5wtppm〜250wtppmとするには、芯材となる銅粉を電解法によって製造する際、電解液に塩素を添加する一方、電解して得られた直後の銅粉を、pH8以上のアルカリ溶液と接触させるアルカリ処理を行うのが好ましい。
デンドライト状銅粉粒子を含有する銅粉を製造する際、塩素を添加した電解液を用いて電解を行うのが好ましいが、その場合、単に純水で洗浄しただけでは、粒子内部に塩素が残留してしまうため、残留塩素による悪影響を効果的に抑制することができない。そこで、前述のようにアルカリ処理することによって、粒子内部、少なくとも悪影響を及ぼす表面近傍内部の塩素までも除去することによって、芯材となる銅粉さらには本銀被覆銅粉の含有塩素濃度を5wtppm〜250wtppmとすることで、残留塩素による悪影響を効果的に抑制することができ、例えば銅粉粒子に銀を被覆する際に均一な厚さに被覆させることができる。
ちなみに、pH8以上のアルカリ溶液によりアルカリ処理の代わりに、純水を用いて洗浄した結果、芯材となる銅粉及び本銀被覆銅粉の含有塩素濃度を5wtppm〜250wtppmとすることはできないことが確認されている。
In order to adjust the chlorine concentration of the present silver-coated copper powder to 5 wtppm to 250 wtppm, when producing copper powder as a core material by an electrolytic method, while adding chlorine to the electrolytic solution, copper immediately after being obtained by electrolysis It is preferable to perform an alkali treatment in which the powder is brought into contact with an alkaline solution having a pH of 8 or higher.
When producing copper powder containing dendritic copper powder particles, it is preferable to perform electrolysis using an electrolytic solution to which chlorine is added. In that case, chlorine remains in the particles simply by washing with pure water. Therefore, the adverse effect of residual chlorine cannot be effectively suppressed. Therefore, by performing alkali treatment as described above, the chlorine concentration in the copper powder as a core material and further the silver-coated copper powder is reduced to 5 wtppm by removing even the chlorine inside the particles, at least the adverse effect of the vicinity of the surface. By setting it to -250 wtppm, the bad influence by a residual chlorine can be suppressed effectively, for example, when silver is coat | covered to a copper powder particle, it can be made to coat | cover to uniform thickness.
By the way, as a result of washing with pure water instead of alkali treatment with an alkaline solution having a pH of 8 or more, the concentration of chlorine contained in the core copper powder and the silver-coated copper powder cannot be 5 wtppm to 250 wtppm. It has been confirmed.
(酸素濃度)
本銀被覆銅粉の酸素濃度は0.20質量%以下であるのが好ましい。
本銀被覆銅粉の酸素濃度が0.20質量%以下であれば、導電性をさらに良好にすることができる。かかる観点から、本銀被覆銅粉の酸素濃度は0.18質量%以下であるのがさらに好ましく、中でも0.15質量%以下であるのが特に好ましい。
本銀被覆銅粉の酸素濃度を0.20質量%以下とするためには、芯材とする銅粉を製造する際、乾燥雰囲気の酸素濃度や乾燥温度を制御したり、或いは、電解後の銅粉をアルカリ処理したりする方法を挙げることができる。但し、この方法に限定するものではない。
(Oxygen concentration)
The oxygen concentration of the present silver-coated copper powder is preferably 0.20% by mass or less.
If the oxygen concentration of the present silver-coated copper powder is 0.20% by mass or less, the conductivity can be further improved. From this viewpoint, the oxygen concentration of the present silver-coated copper powder is more preferably 0.18% by mass or less, and particularly preferably 0.15% by mass or less.
In order to set the oxygen concentration of the present silver-coated copper powder to 0.20% by mass or less, when producing copper powder as a core material, the oxygen concentration and drying temperature in a dry atmosphere are controlled, or after electrolysis The method of carrying out alkali treatment of copper powder can be mentioned. However, it is not limited to this method.
(粒子表面の銅割合)
本銀被覆銅粉は、X線光電子分光分析法による測定される、当該銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu)と銀の濃度(ρAg)との比率(ρCu/ρAg)が0.12以下であることが重要である。
銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu)と銀の濃度(ρAg)との比率(ρCu/ρAg)が0.12以下であれば、塩素を含んでいても、導電性を有効に高めることができる。
かかる観点から、当該銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu)と銀の濃度(ρAg)との比率(ρCu/ρAg)は、0.12以下であることが重要であり、中でも0.10以下であるのが好ましく、その中でも0.08以下、特に0.06以下であるのがさらに好ましい。なお、分析精度などを考慮すると、ρCu/ρAgの下限値は0.01程度となると推定される。
(Copper ratio on particle surface)
The present silver-coated copper powder is a ratio of the total Cu concentration (ρCu) and silver concentration (ρAg) of Cu, CuO and Cu 2 O on the surface of the silver-coated copper powder particles measured by X-ray photoelectron spectroscopy. It is important that (ρCu / ρAg) is 0.12 or less.
If the ratio (ρCu / ρAg) of the total Cu concentration (ρCu) and silver concentration (ρAg) of Cu, CuO and Cu 2 O on the surface of the silver-coated copper powder particles is 0.12 or less, chlorine is included. Also, the conductivity can be effectively increased.
From this viewpoint, the ratio (ρCu / ρAg) of the total Cu concentration (ρCu) and the silver concentration (ρAg) of Cu, CuO and Cu 2 O on the surface of the silver-coated copper powder particles is 0.12 or less. Is important, and among them, it is preferably 0.10 or less, more preferably 0.08 or less, and particularly preferably 0.06 or less. In consideration of analysis accuracy and the like, the lower limit value of ρCu / ρAg is estimated to be about 0.01.
本銀被覆銅粉において、粒子表面における銅割合をこのように低くするためには、言い換えれば、芯材である銅粉粒子に銀を均一に被覆するためには、上述のように、芯材となる銅粉を電解法によって製造する際、電解液に塩素を添加する一方で、電解して得られた直後の銅粉を、pH8以上のアルカリ溶液と接触させるアルカリ処理を行うのが好ましい。 In the present silver-coated copper powder, in order to reduce the copper ratio on the particle surface in this way, in other words, in order to uniformly coat silver on the copper powder particles as the core material, as described above, the core material When the copper powder to be obtained is produced by an electrolytic method, it is preferable to perform an alkali treatment in which chlorine is added to the electrolytic solution, and the copper powder immediately after electrolysis is brought into contact with an alkaline solution having a pH of 8 or more.
(銀の量)
本銀被覆銅粉において、銀の含有量は、本銀被覆銅粉全体に対して0.5〜35.0質量%であるのが好ましい。銀の含有量が、本銀被覆銅粉全体の0.5質量%以上を占めれば、本銀被覆銅粉を構成する粒子が重なり合った時、粒子表面の銀同士が接触するため、導電性を高めることが出来る。その一方、35.0質量%を超えると、必要以上に銀を被覆することになり不経済である。言い換えれば、35.0質量%以下であれば、製造の方法にもよるが、銀粒子と比較して経済的により優位となるから好ましい。このような観点から、銀の含有量は、本銀被覆銅粉全体の0.5〜35.0質量%であるのが好ましく、中でも3.0質量%以上或いは25.0質量%以下、その中でも5.0質量%以上或いは20.0質量%以下であるのがさらに好ましい。
(Amount of silver)
In the present silver-coated copper powder, the silver content is preferably 0.5 to 35.0 mass% with respect to the entire present silver-coated copper powder. If the silver content occupies 0.5% by mass or more of the total silver-coated copper powder, the particles on the surface of the silver-coated copper powder will be in contact with each other when the particles composing the silver-coated copper powder overlap. Can be increased. On the other hand, when it exceeds 35.0 mass%, it will be uneconomical because it coats silver more than necessary. In other words, if it is 35.0% by mass or less, although it depends on the production method, it is preferable because it is economically superior to silver particles. From such a viewpoint, the silver content is preferably 0.5 to 35.0 mass% of the total silver-coated copper powder, and more preferably 3.0 mass% or more or 25.0 mass% or less. Of these, 5.0% by mass or more or 20.0% by mass or less is more preferable.
(D50)
本銀被覆銅粉の中心粒径(D50)、すなわちレーザー回折散乱式粒度分布測定装置によって測定される体積累積粒径D50は、1.0μm〜30.0μmであるのが好ましい。導電粒子として大きな粒子であると、ペースト中の導電粒子のネットワークが少なくなるため、導電性能が低下するおそれがある。その一方、粒子径が小さ過ぎると、銀の被覆にムラをなくすためには、銀の含有量を多くする必要があり、経済的に無駄である。
よって、本銀被覆銅粉の中心粒径(D50)は1.0μm〜30.0μmであるのが好ましく、中でも2.0μm以上或いは25.0μm以下、その中でも特に3.0μm以上或いは20.0μm以下であるのがさらに好ましい。
(D50)
The central particle size (D50) of the present silver-coated copper powder, that is, the volume cumulative particle size D50 measured by a laser diffraction / scattering particle size distribution analyzer is preferably 1.0 μm to 30.0 μm. If the particles are large as the conductive particles, the conductive particle network in the paste is reduced, which may reduce the conductive performance. On the other hand, if the particle diameter is too small, it is necessary to increase the silver content in order to eliminate unevenness in the silver coating, which is economically wasteful.
Therefore, the center particle diameter (D50) of the present silver-coated copper powder is preferably 1.0 μm to 30.0 μm, more preferably 2.0 μm or more or 25.0 μm or less, and particularly preferably 3.0 μm or more or 20.0 μm. More preferably, it is as follows.
(BET比表面積)
本銀被覆銅粉のBET比表面積(SSA)は、例えば0.30〜2.00m2/gであるのが好ましい。0.30m2/gより著しく小さいと、枝が発達しておらず、松ぼっくり若しくは球状に近づくため、本発明が規定するデンドライト状を呈することができなくなる。他方、2.00m2/gよりも著しく大きくなると、デンドライトの枝が細くなりすぎて、ペーストとした際などにデンドライトの枝を折らないで分散させることが困難となるなど、後のペースト工程で不具合が発生して、目的とする導電性を確保することができない可能性があるため好ましくない。
よって、本銀被覆銅粉のBET一点法で測定される比表面積は0.30〜2.00m2/gであるのが好しく、中でも0.40m2/g以上或いは1.80m2/g以下、その中でも特に1.50m2/g以下であるのがさらに好ましい。
(BET specific surface area)
The BET specific surface area (SSA) of the silver-coated copper powder is preferably, for example, 0.30 to 2.00 m 2 / g. If it is remarkably smaller than 0.30 m 2 / g, the branches are not developed, and it becomes close to a pinecone or a sphere, so that the dendrite shape defined by the present invention cannot be exhibited. On the other hand, if it is significantly larger than 2.00 m 2 / g, the dendrite branch becomes too thin and it becomes difficult to disperse without breaking the dendrite branch when it is made into a paste. It is not preferable because a problem may occur and the target conductivity may not be ensured.
Therefore, the specific surface area as measured by single point method BET of the silver-coated copper powder 0.30~2.00m 2 / g at and even good properly, inter alia 0.40 m 2 / g or more or 1.80 m 2 / g In particular, among these, it is more preferable to be 1.50 m 2 / g or less.
(タップ嵩密度:TD)
本銀被覆銅粉のタップ嵩密度は、0.5〜2.0g/cm3であるのが好ましい。本銀被覆銅粉のタップ嵩密度は、そのデンドライト形状の発達度合いにより左右されることになる。本銀被覆銅粉粒子はデンドライト形状が発達しているため、タップ嵩密度は低くなり、2.0g/cm3以下とすることができる。他方、タップ嵩密度が0.5g/cm3以上であれば、ペースト作製時の取り扱いが容易となるばかりか、より一層高い導電性を得ることができる。
かかる観点から、本銀被覆銅粉のタップ嵩密度は0.5〜2.0g/cm3であるのが好ましく、中でも0.7g/cm3以上或いは1.8g/cm3以下、その中でも特に0.9g/cm3以上或いは1.6g/cm3以下であるのがさらに好ましい。
(Tap bulk density: TD)
The tap bulk density of the present silver-coated copper powder is preferably 0.5 to 2.0 g / cm 3 . The tap bulk density of the present silver-coated copper powder depends on the degree of development of the dendrite shape. Since the silver-coated copper powder particles have a dendrite shape, the tap bulk density is low and can be 2.0 g / cm 3 or less. On the other hand, if the tap bulk density is 0.5 g / cm 3 or more, not only the handling at the time of preparing the paste becomes easy, but also higher conductivity can be obtained.
From this point of view, the tap bulk density of the silver-coated copper powder is preferably from 0.5 to 2.0 g / cm 3, among them 0.7 g / cm 3 or more, or 1.8 g / cm 3 or less, among the More preferably, it is 0.9 g / cm 3 or more or 1.6 g / cm 3 or less.
<製造方法>
本銀被覆銅粉は、芯材としての所望の銅粉を水に分散させ、必要に応じてキレート剤を添加した後、水に可溶な銀塩を加えて置換反応させて銅粉粒子の表面層を銀に置換させ、得られた銀被覆銅粉を溶液から取り出して、必要に応じてキレート剤を用いて洗浄した後、乾燥させることで得ることができる。但し、この製造方法に限定されるものではない。
なお、このような方法で、芯材としての銅粉粒子の表面に銀又は銀合金を被覆すれば、芯材として用いる銅粉粒子の形状をほぼそのまま本銀被覆銅粉の粒子形状に転化させることができる。
<Manufacturing method>
The present silver-coated copper powder is prepared by dispersing desired copper powder as a core material in water, adding a chelating agent as necessary, and then adding a water-soluble silver salt to cause a substitution reaction. The surface layer can be replaced with silver, and the obtained silver-coated copper powder can be taken out of the solution, washed with a chelating agent as necessary, and then dried. However, it is not limited to this manufacturing method.
In addition, if the surface of the copper powder particles as the core material is coated with silver or a silver alloy by such a method, the shape of the copper powder particles used as the core material is almost directly converted to the particle shape of the silver-coated copper powder. be able to.
(芯材として用いる銅粉の製法)
芯材として用いる銅粉は、前述したように、電解法で得られた銅粉、中でも、枝が十分に発達したデンドライト状を呈する電解銅粉を用いるのが好ましい。
(Manufacturing method of copper powder used as core material)
As described above, as the copper powder used as the core material, it is preferable to use a copper powder obtained by an electrolysis method, and in particular, an electrolytic copper powder exhibiting a dendritic shape with sufficiently developed branches.
上述したような枝が十分に発達したデンドライト状を呈する電解銅粉は、次のような電解法によって製造することができる。 The electrolytic copper powder having a dendritic shape with sufficiently developed branches as described above can be produced by the following electrolytic method.
電解法としては、例えば、銅イオンを含む硫酸酸性の電解液に陽極と陰極を浸漬し、これに直流電流を流して電気分解を行い、陰極表面に粉末状に銅を析出させ、機械的又は電気的方法により掻き落として回収し、洗浄し、乾燥し、必要に応じて篩別工程などを経て電解銅粉を製造する方法を例示できる。
電解に際しては、電解液に塩素を添加して、電解液の塩素濃度を3〜300mg/L、中でも5〜200mg/Lに調整するのが好ましい。
As an electrolysis method, for example, an anode and a cathode are immersed in a sulfuric acid electrolytic solution containing copper ions, and a direct current is passed through the electrolyte to conduct electrolysis. An example is a method of producing electrolytic copper powder by scraping and collecting by an electric method, washing, drying, and passing through a sieving step as necessary.
In electrolysis, it is preferable to add chlorine to the electrolytic solution to adjust the chlorine concentration of the electrolytic solution to 3 to 300 mg / L, particularly 5 to 200 mg / L.
また、電解法で銅粉を製造する場合、銅の析出に伴って電解液中の銅イオンが消費されるため、電極板付近の電解液の銅イオン濃度は薄くなり、そのままでは電解効率が低下してしまう。そのため、通常は電解効率を高めるために、電解槽内の電解液の循環を行って電極間の電解液の銅イオン濃度が薄くならないようにしている。
しかし、各銅粉粒子のデンドライトを発達させるためには、言い換えれば主軸から伸びる枝の成長を促すためには、電極付近の電解液の銅イオン濃度が低い方が好ましいことが分かってきた。そこで、銅粉の製造においては、電解槽の大きさ、電極枚数、電極間距離及び電解液の循環量を調整し、電極付近の電解液の銅イオン濃度を低く調整するのが好ましい。この際、少なくとも電解槽の底部の電解液の銅イオン濃度よりも、電極間の電解液の銅イオン濃度が常に薄くなるように調整するのが好ましい。
Also, when copper powder is produced by the electrolytic method, the copper ions in the electrolytic solution are consumed as copper is deposited, so the copper ion concentration in the electrolytic solution near the electrode plate is reduced, and the electrolytic efficiency is reduced as it is. Resulting in. Therefore, normally, in order to increase the electrolytic efficiency, the electrolytic solution in the electrolytic cell is circulated so that the copper ion concentration of the electrolytic solution between the electrodes does not become thin.
However, it has been found that in order to develop the dendrite of each copper powder particle, in other words, to promote the growth of branches extending from the main axis, it is preferable that the copper ion concentration in the electrolyte solution near the electrode is low. Accordingly, in the production of copper powder, it is preferable to adjust the size of the electrolytic cell, the number of electrodes, the distance between the electrodes, and the circulation amount of the electrolytic solution, and to adjust the copper ion concentration of the electrolytic solution in the vicinity of the electrode to be low. At this time, it is preferable to adjust so that the copper ion concentration of the electrolytic solution between the electrodes is always thinner than the copper ion concentration of the electrolytic solution at the bottom of the electrolytic cell.
デンドライト状銅粉粒子の粒子径を調整するには、上記条件の範囲内で技術常識に基づいて適宜条件を設定すればよい。例えば、大きな粒径のデンドライト状銅粉粒子を得ようとするならば、銅濃度は上記好ましい範囲内で比較的高い濃度に設定するのが好ましく、電流密度は、上記好ましい範囲内で比較的低い密度に設定するのが好ましく、電解時間は、上記好ましい範囲内で比較的長い時間に設定するのが好ましい。小さな粒径のデンドライト状銅粉粒子を得ようとするならば、前記の逆の考え方で各条件を設定するのが好ましい。一例としては銅濃度を1g/L〜30g/Lとし、電流密度を100A/m2〜4000A/m2とし、電解時間を3分〜8時間とすればよい。 In order to adjust the particle size of the dendritic copper powder particles, conditions may be set as appropriate based on common general technical knowledge within the range of the above conditions. For example, if it is intended to obtain dendritic copper powder particles having a large particle size, the copper concentration is preferably set to a relatively high concentration within the above preferred range, and the current density is relatively low within the above preferred range. The density is preferably set, and the electrolysis time is preferably set to a relatively long time within the above preferable range. If it is intended to obtain dendritic copper powder particles having a small particle size, it is preferable to set the respective conditions based on the opposite concept. As an example, the copper concentration may be 1 g / L to 30 g / L, the current density may be 100 A / m 2 to 4000 A / m 2 , and the electrolysis time may be 3 minutes to 8 hours.
このように電解した後、電解析出した銅粉を、必要に応じて水で洗浄した後、水と混合してスラリーとするか、或いは、銅粉ケーキとした後、pH8以上のアルカリ溶液を混合して、必要に応じて撹拌して、銅粉とアルカリ溶液とを接触させるアルカリ処理を行い、水などで洗浄することにより、銅粉の含有塩素濃度を低減させるのが好ましい。
アルカリ処理においては、電解銅粉析出後のスラリー又は銅粉ケーキのpHを8以上、中でも9以上或いは12以下、その中でも10以上或いは11以下となるように調整するのが好ましい。
また、このようなアルカリ処理に用いるアルカリ剤としては、例えば炭酸アンモニウム溶液、苛性ソーダ溶液、重炭酸ナトリウム、水酸化カリウム、アンモニア水などを挙げることができる。
After electrolyzing in this manner, the electrolytically deposited copper powder is washed with water as necessary, and then mixed with water to form a slurry, or a copper powder cake, and then an alkaline solution having a pH of 8 or more is added. It is preferable to reduce the concentration of chlorine contained in the copper powder by mixing, stirring as necessary, performing an alkali treatment for bringing the copper powder into contact with the alkaline solution, and washing with water or the like.
In the alkali treatment, the pH of the slurry or copper powder cake after electrolytic copper powder deposition is preferably adjusted to 8 or more, particularly 9 or more, or 12 or less, and more preferably 10 or more or 11 or less.
Examples of the alkali agent used for such alkali treatment include ammonium carbonate solution, caustic soda solution, sodium bicarbonate, potassium hydroxide, and aqueous ammonia.
また、電解銅粉粒子の表面は、必要に応じて、有機物を用いて耐酸化処理を施し、銅粉粒子表面に有機物層を形成するようにしてもよい。必ずしも有機物層を形成する必要はないが、銅粉粒子表面の酸化による経時変化を考慮すると形成した方がより好ましい。
この耐酸化処理に用いる有機物は、特にその種類を限定するものではなく、例えば膠、ゼラチン、有機脂肪酸、カップリング剤等を挙げることができる。
耐酸化処理の方法、すなわち有機物層の形成方法は、乾式法でも湿式法でもよい。乾式法であれば、有機物と銅粉粒子をV型混合器等で混合する方法、湿式法であれば水−銅粉粒子スラリーに有機物を添加し表面に吸着させる方法等を挙げることができる。但し、これらに限ったものではない。
例えば、電解銅粉析出後にアルカリ処理した後、銅粉ケーキ及び所望の有機物を含んだ水溶液と、有機溶媒とを混合して、銅粉表面に有機物を付着させる方法は好ましい一例である。
Moreover, the surface of the electrolytic copper powder particles may be subjected to an oxidation resistance treatment using an organic material as necessary to form an organic material layer on the surface of the copper powder particles. It is not always necessary to form the organic layer, but it is more preferable that the organic layer is formed in consideration of the change over time due to oxidation of the copper powder particle surface.
The organic substance used for this oxidation resistance treatment is not particularly limited, and examples thereof include glue, gelatin, organic fatty acid, and a coupling agent.
The oxidation-resistant treatment method, that is, the organic layer forming method may be a dry method or a wet method. In the case of a dry method, a method of mixing an organic substance and copper powder particles with a V-type mixer or the like, and in the case of a wet method, a method of adding an organic substance to a water-copper powder particle slurry and adsorbing it on the surface can be exemplified. However, it is not limited to these.
For example, after carrying out alkali treatment after electrolytic copper powder precipitation, the method of mixing the copper powder cake and the aqueous solution containing the desired organic substance, and the organic solvent, and making an organic substance adhere to the copper powder surface is a preferable example.
なお、芯材は、必要に応じて、置換反応前に表面酸化物(酸化皮膜)を除去する処理を行なうのがよい。例えば、芯材を水に投入して攪拌混合した後、ヒドラジン等の還元剤を加えて攪拌混合して反応させればよい。この際、加えた還元剤を十分に洗浄して芯材から除去するのが好ましい。 In addition, it is good to perform the process which removes a surface oxide (oxide film) before a substitution reaction as needed for a core material. For example, after the core material is put into water and stirred and mixed, a reducing agent such as hydrazine is added and stirred and mixed to react. At this time, it is preferable that the added reducing agent is sufficiently washed and removed from the core material.
(銀の被覆)
次に、上述のようにして作製した銅粉粒子の表面に銀又は銀合金を被覆する方法について説明する。一例として、置換メッキ被覆法について説明する。但し、銅粉粒子の表面に銀又は銀合金を被覆する方法をこの方法に限定するものではない。
(Silver coating)
Next, a method for coating the surface of the copper powder particles produced as described above with silver or a silver alloy will be described. As an example, a displacement plating coating method will be described. However, the method of coating the surface of the copper powder particles with silver or a silver alloy is not limited to this method.
置換メッキ被覆法は、還元メッキ被覆法に比べて、芯材(銅粉粒子)表面に銀又は銀合金をより均一に被覆することができるばかりか、被覆後の粒子の凝集を抑えることができ、さらには、より安価に製造できるという特徴を有している。よって、置換メッキ被覆法を採用するのが好ましい。
なお、上記のように銅粉粒子表面に疎水性の有機物層が形成されている場合、銀を被覆する際には脱脂処理をして、銅粉粒子の表面を親水化する必要がある。この脱脂処理する場合、通常のように機械撹拌すると銅粉の粒子形状、特にデンドライト銅粉粒子の枝部分が折れてしまう可能性があるため、銅粉粒子形状を維持することができる強度で撹拌もしくは漬け置き等の無撹拌の状態で脱脂処理するのが好ましい。その一方で、銅粉粒子をゼラチン等の親水性の表面処理剤で表面処理して親水性化した場合は、脱脂処理する必要がないため、銅粉粒子の形状を維持できる観点から、このような処理が好ましい。
Compared to the reduction plating coating method, the displacement plating coating method can more uniformly coat the surface of the core material (copper powder particles) with silver or a silver alloy, and can also suppress aggregation of particles after coating. Furthermore, it has a feature that it can be manufactured at a lower cost. Therefore, it is preferable to employ a displacement plating coating method.
In addition, when the hydrophobic organic substance layer is formed in the copper powder particle surface as mentioned above, when coat | covering silver, it is necessary to degrease and to make the surface of a copper powder particle hydrophilic. When this degreasing treatment is performed, mechanical stirring as usual may cause breakage of the copper powder particle shape, especially the dendrite copper powder particle branch, so stirring with strength sufficient to maintain the copper powder particle shape. Alternatively, the degreasing treatment is preferably performed in a non-stirred state such as soaking. On the other hand, when the copper powder particles are surface treated with a hydrophilic surface treatment agent such as gelatin to make them hydrophilic, it is not necessary to degrease, so from the viewpoint of maintaining the shape of the copper powder particles, Is preferable.
従来の置換メッキ被覆法においては、反応溶液から銀被覆銅粉を取り出す時に、水などで濾過・洗浄していたが、水で洗浄しただけでは、銅イオンの一部が銀被覆銅粉に吸着されるため、粒子表面に銅イオンが残留することになり、この状態で乾燥させると、銅イオンが酸化銅を形成し、粒子表面に酸化銅の被膜ができてしまう。
これに対し、キレート剤を用いて洗浄することで、置換反応後に銅の再吸着を防止することができるため、粒子表面に残留する銅イオンを抑制することができ、その結果、粒子表面に酸化銅の被膜が出来ることを抑制して、導電性を高めることができる。
但し、キレート剤を用いて洗浄した場合、キレート剤が残留する可能性があるため、純水などを用いて洗浄するのが好ましい。
In the conventional displacement plating coating method, when silver-coated copper powder is taken out from the reaction solution, it is filtered and washed with water or the like, but only by washing with water, some of the copper ions are adsorbed on the silver-coated copper powder. Therefore, copper ions remain on the particle surface, and when dried in this state, the copper ions form copper oxide and a copper oxide film is formed on the particle surface.
In contrast, by washing with a chelating agent, copper re-adsorption after the substitution reaction can be prevented, so that copper ions remaining on the particle surface can be suppressed. Conductivity can be improved by suppressing the formation of a copper film.
However, since washing with a chelating agent may leave the chelating agent, washing with pure water or the like is preferable.
キレート剤としては、例えばエチレンジアミン四酢酸塩(以下「EDTA」という)、ジエチレントリアミン五酢酸、イミノ二酢酸などのアミノカルボン酸系キレート剤のほか、ヒドロキシエチルエチレンジアミン三酢酸、ジヒドロキシエチルエチレンジアミン二酢酸)、1,3-プロパンジアミン四酢酸から選ばれた1種又は2種以上のものを挙げることができるが、中でもEDTAを用いるのが好ましい。 Examples of the chelating agent include ethylenediaminetetraacetic acid salt (hereinafter referred to as “EDTA”), aminocarboxylic acid-based chelating agents such as diethylenetriaminepentaacetic acid and iminodiacetic acid, hydroxyethylethylenediaminetriacetic acid, dihydroxyethylethylenediaminediacetic acid), 1 , 3-propanediaminetetraacetic acid, one or two or more selected from propanediaminetetraacetic acid can be mentioned, and among these, EDTA is preferably used.
銀塩を加える際、溶液のpH、すなわち置換反応させる際の溶液のpHは3〜4に調整するのが好ましい。
銀塩としては、水に可溶な銀塩、すなわちAgイオン供給源としては、硝酸銀、過塩素酸銀、酢酸銀、シュウ酸銀、塩素酸銀、6フッ化リン酸銀、4フッ化ホウ酸銀、6フッ化ヒ酸銀、硫酸銀から選ばれた1種又は2種以上を挙げることができる。
銀塩の添加量は、理論当量以上、例えば銅を芯材として用いる場合、銅1モルに対して銀2モル以上、特に2.1モル以上となるように添加するのが好ましい。2モルより少ないと、置換が不十分となり銀粉粒子中に銅が多く残留することになる。但し、2.5モル以上入れても不経済である。
When adding a silver salt, it is preferable to adjust the pH of the solution, that is, the pH of the solution at the time of the substitution reaction to 3 to 4.
Silver salts soluble in water, that is, Ag ion sources include silver nitrate, silver perchlorate, silver acetate, silver oxalate, silver chlorate, silver hexafluorophosphate, and boron tetrafluoride. One or more selected from acid silver, silver hexafluoroarsenate, and silver sulfate can be mentioned.
The addition amount of the silver salt is preferably equal to or greater than the theoretical equivalent, for example, when copper is used as the core material, the silver salt is added in an amount of 2 mol or more, particularly 2.1 mol or more, per 1 mol of copper. When the amount is less than 2 mol, the substitution is insufficient and a large amount of copper remains in the silver powder particles. However, it is not economical to add 2.5 mol or more.
本銀被覆銅粉における銀の含有率は、銀塩の添加量、反応時間、反応速度、キレート剤の添加量などによって調整することができる。
置換反応終了後は、銀粉粒子を十分に洗浄し、乾燥させるのが好ましい。
The silver content in the present silver-coated copper powder can be adjusted by the amount of silver salt added, the reaction time, the reaction rate, the amount of chelating agent added, and the like.
After completion of the substitution reaction, the silver powder particles are preferably thoroughly washed and dried.
(用途)
本銀被覆銅粉は導電特性に優れているため、本銀被覆銅粉を用いて導電性ペーストや導電性接着剤などの導電性樹脂組成物、さらには導電性塗料など、各種導電性材料の主要構成材料として好適に用いることができる。
(Use)
Since the silver-coated copper powder has excellent conductive properties, the silver-coated copper powder can be used for various conductive materials such as conductive resin compositions such as conductive pastes and conductive adhesives, and conductive paints. It can be suitably used as a main constituent material.
例えば導電性ペーストを作製するには、本銀被覆銅粉をバインダ及び溶剤、さらに必要に応じて硬化剤やカップリング剤、腐食抑制剤などと混合して導電性ペーストを作製することができる。
この際、バインダとしては、液状のエポキシ樹脂、フェノール樹脂、不飽和ポリエステル樹脂等を挙げることができるが、これらに限定するものではない。
溶剤としては、テルピネオール、エチルカルビトール、カルビトールアセテート、ブチルセロソルブ等が挙げることができる。
硬化剤としては、2エチル4メチルイミダゾールなどを挙げることができる。
腐食抑制剤としては、ベンゾチアゾール、ベンゾイミダゾール等を挙げることができる。
For example, in order to produce a conductive paste, the present silver-coated copper powder can be mixed with a binder and a solvent, and further, if necessary, a curing agent, a coupling agent, a corrosion inhibitor, etc. to produce a conductive paste.
In this case, examples of the binder include liquid epoxy resins, phenol resins, unsaturated polyester resins, and the like, but are not limited thereto.
Examples of the solvent include terpineol, ethyl carbitol, carbitol acetate, butyl cellosolve and the like.
Examples of the curing agent include 2-ethyl 4-methylimidazole.
Examples of the corrosion inhibitor include benzothiazole and benzimidazole.
導電性ペーストは、これを用いて基板上に回路パターンを形成して各種電気回路を形成することができる。例えば焼成済み基板或いは未焼成基板に塗布又は印刷し、加熱し、必要に応じて加圧して焼き付けることでプリント配線板や各種電子部品の電気回路や外部電極などを形成することができる。また、電磁波シールドフィルムや、ボンディングフィルムなどの形成にも利用することができる。 The conductive paste can be used to form a circuit pattern on a substrate to form various electric circuits. For example, it is possible to form a printed wiring board, an electric circuit of various electronic components, external electrodes, and the like by applying or printing on a fired substrate or an unfired substrate, heating, pressurizing and baking as necessary. Moreover, it can utilize also for formation of an electromagnetic wave shield film, a bonding film, etc.
<語句の説明>
本明細書において「X〜Y」(X,Yは任意の数字)と表現する場合、特にことわらない限り「X以上Y以下」の意と共に、「好ましくはXより大きい」或いは「好ましくYより小さい」の意も包含する。
また、「X以上」(Xは任意の数字)と表現する場合、特にことわらない限り「好ましくはXより大きい」の意を包含し、「Y以下」(Yは任意の数字)と表現する場合、特にことわらない限り「好ましくYより小さい」の意を包含する。
<Explanation of words>
In the present specification, when expressed as “X to Y” (X and Y are arbitrary numbers), “X is preferably greater than X” or “preferably more than Y” with the meaning of “X to Y” unless otherwise specified. The meaning of “small” is also included.
In addition, when expressed as “X or more” (X is an arbitrary number), it means “preferably larger than X” unless otherwise specified, and expressed as “Y or less” (Y is an arbitrary number). In the case, unless otherwise specified, the meaning of “preferably smaller than Y” is included.
以下、本発明の実施例について説明する。但し、本発明が以下の実施例に限定されるものではない。 Examples of the present invention will be described below. However, the present invention is not limited to the following examples.
<粒子形状の観察>
実施例・比較例で得た銀被覆銅粉(サンプル)について、走査型電子顕微鏡(5,000倍)にて、任意の500個の粒子の形状をそれぞれ観察し、主軸の太さa(「主軸太さa」)、主軸から伸びた枝の中で最も長い枝の長さb(「枝長b」)、主軸の長径に対する枝の本数(「枝本数/長径L」)を測定し、その平均値を表1に示した。なお、この平均値とは、デンドライト状銅粉粒子と認められる粒子における平均値である。
また、表1には、太さaが0.3μm〜5.0μmの範囲内であり、長さbが0.7μm〜12.0μmの範囲内であり、且つ枝本数/長径Lが0.5〜4.0本/μmであるデンドライト状銅粉粒子(「特殊デンドライト」と称する)が、全銅粉粒子のうちに占める個数割合を「全粒子中の特殊デンドライトの個数割合」として表1に示した。
また、太さaが0.3μm〜5.0μmの範囲内であり、長さbが0.7μm〜12.0μmの範囲内であり、且つ枝本数/長径Lが0.5〜4.0本/μmであるデンドライト状銅粉粒子(「特殊デンドライト」と称する)が、デンドライト状銅粉粒子のうちに占める個数割合を、「デンドライト中の特殊デンドライトの個数割合」として表1に示した。
なお、粒子形状の観察の際、粒子同士が重ならないように、カーボンテープ上に少量の銅粉(サンプル)を付けて測定を行った。
<Observation of particle shape>
With respect to the silver-coated copper powder (sample) obtained in Examples and Comparative Examples, the shape of arbitrary 500 particles was observed with a scanning electron microscope (5,000 times), respectively, and the thickness a (“ Main axis thickness a "), the length b of the longest branch among the branches extending from the main axis (" branch length b "), the number of branches with respect to the major axis of the main axis (" number of branches / major axis L "), The average value is shown in Table 1. In addition, this average value is an average value in the particles recognized as dendrite-like copper powder particles.
In Table 1, the thickness a is in the range of 0.3 μm to 5.0 μm, the length b is in the range of 0.7 μm to 12.0 μm, and the number of branches / major axis L is 0. Table 1 shows the number proportion of dendritic copper powder particles (referred to as “special dendrites”) of 5 to 4.0 particles / μm in the total copper powder particles as “number proportion of special dendrites in all particles”. It was shown to.
Further, the thickness a is in the range of 0.3 μm to 5.0 μm, the length b is in the range of 0.7 μm to 12.0 μm, and the number of branches / major axis L is 0.5 to 4.0. Table 1 shows the number ratio of the dendrite-like copper powder particles (referred to as “special dendrites”) / μm in the dendrite-like copper powder particles as “number ratio of special dendrite in dendrites”.
In the observation of the particle shape, a small amount of copper powder (sample) was attached to the carbon tape so that the particles did not overlap each other.
<粒度測定>
実施例・比較例で得た銀被覆銅粉(サンプル)を少量ビーカーに取り、3%トリトンX溶液(関東化学製)を2、3滴添加し、粉末になじませてから、0.1%SNディスパーサント41溶液(サンノプコ製)50mLを添加し、その後、超音波分散器TIPφ20(日本精機製作所製)を用いて2分間分散処理して測定用サンプルを調製した。
この測定用サンプルを、レーザー回折散乱式粒度分布測定装置MT3300(日機装製)を用いて体積累積基準D50を測定した。
<Particle size measurement>
Take the silver-coated copper powder (sample) obtained in Examples and Comparative Examples in a small amount of beaker, add a few drops of 3% Triton X solution (manufactured by Kanto Chemical Co., Inc.), blend into the powder, and then add 0.1% SN Dispersant 41 solution (manufactured by San Nopco) (50 mL) was added, and thereafter a dispersion sample was dispersed for 2 minutes using an ultrasonic disperser TIPφ20 (manufactured by Nippon Seiki Seisakusho) to prepare a measurement sample.
The volume accumulation standard D50 of this measurement sample was measured using a laser diffraction / scattering particle size distribution measuring device MT3300 (manufactured by Nikkiso).
<BET比表面積の測定>
実施例・比較例で得た銀被覆銅粉(サンプル)の比表面積は、マックソーブ社製モノソーブにて、BET一点法で測定し、BET比表面積として表1に示した。
<Measurement of BET specific surface area>
The specific surface area of the silver-coated copper powder (sample) obtained in Examples and Comparative Examples was measured by a BET one-point method using a monosorb manufactured by Macsorb Corporation, and is shown in Table 1 as a BET specific surface area.
<含有塩素濃度の測定>
実施例・比較例で得た銀被覆銅粉(サンプル)を、純水を用いて洗浄し、洗浄後の液の塩素濃度が5wtppm以下となるまで洗浄した。このように洗浄した銀被覆銅粉(サンプル)を硝酸で全溶解し、得られた溶液中の塩素濃度を分光光度計で測定することにより、含有塩素濃度(wtppm)を測定した。なお、表1中の「<5」は、測定限界未満であったことを示している。
<Measurement of chlorine concentration>
The silver-coated copper powder (sample) obtained in Examples and Comparative Examples was washed with pure water and washed until the chlorine concentration of the liquid after washing was 5 wtppm or less. The thus-washed silver-coated copper powder (sample) was completely dissolved with nitric acid, and the chlorine concentration in the resulting solution was measured with a spectrophotometer to measure the chlorine concentration (wtppm). Note that “<5” in Table 1 indicates that it was less than the measurement limit.
<酸素濃度の測定>
実施例・比較例で得た銀被覆銅粉(サンプル)を、堀場製作所社製「EMGA-820ST」を用いてHe雰囲気中で加熱溶融し、酸素濃度(wt%)を測定した。
<Measurement of oxygen concentration>
The silver-coated copper powder (sample) obtained in Examples and Comparative Examples was heated and melted in a He atmosphere using “EMGA-820ST” manufactured by Horiba, Ltd., and the oxygen concentration (wt%) was measured.
<XPSによる表面分析>
X線光電子分光分析(X−rayPhotoelectronSpectroscopy、XPS)により、実施例・比較例で得た銀被覆銅粉(サンプル)の粒子表面の分析を行った。
X線源として、Mg−Kα線(1253.6eV)を用いて、15KV×26.7mAで操作した。
帯電補正:SiO2 の結合エネルギーを103.2eVとして帯電補正を行った。
供試試料:加圧成形機により、230kg/cm2 の圧力でディクス状に成形した。
上記方法により、実施例・比較例で得た銀被覆銅粉(サンプル)について、粒子表面から約5nmまでの深さのAg及びCu成分について定量分析を行った。
表1には、粒子表面におけるAgの合計Ag濃度(ρAg)を「Ag(wt%)」又は「Ag(atomic%)」として示し、粒子表面におけるCu、CuO(Cu濃度換算)及びCu2O(Cu濃度換算)の合計Cu濃度(ρCu)を「Cu(atomic%)」として示し、粒子表面におけるAg濃度(ρAg)に対する、Cu、CuO及びCu2Oの合計Cu濃度(ρCu)の比率を「ρCu/ρAg」として示した。
<Surface analysis by XPS>
The surface of the particles of the silver-coated copper powder (sample) obtained in Examples and Comparative Examples was analyzed by X-ray photoelectron spectroscopy (X-ray Photoelectron Spectroscopy, XPS).
Using an Mg-Kα ray (1253.6 eV) as an X-ray source, operation was performed at 15 KV × 26.7 mA.
Charging correction: Charging correction was performed with the SiO 2 binding energy set to 103.2 eV.
Test sample: Molded in a disc shape with a pressure of 230 kg / cm 2 by a pressure molding machine.
By the above method, the silver-coated copper powder (sample) obtained in Examples and Comparative Examples was quantitatively analyzed for Ag and Cu components at a depth from the particle surface to about 5 nm.
Table 1 shows the total Ag concentration (ρAg) of Ag on the particle surface as “Ag (wt%)” or “Ag (atomic%)”, Cu, CuO (Cu concentration conversion) and Cu 2 O on the particle surface. The total Cu concentration (ρCu) in terms of Cu concentration is shown as “Cu (atomic%)”, and the ratio of the total Cu concentration (ρCu) of Cu, CuO and Cu 2 O to the Ag concentration (ρAg) on the particle surface is It was shown as “ρCu / ρAg”.
<タップ嵩密度(TD)測定>
実施例・比較例で得た銀被覆銅粉(サンプル)のタップ嵩密度(g/cm3)は、試料200gを用いてパウダーテスターPT−E型(ホソカワミクロン製)により測定した。
<Tap bulk density (TD) measurement>
The tap bulk density (g / cm 3 ) of the silver-coated copper powder (sample) obtained in Examples and Comparative Examples was measured with a powder tester PT-E type (manufactured by Hosokawa Micron) using a sample 200 g.
<導電性ペーストの導電性(比抵抗)評価>
実施例・比較例で得た銀被覆銅粉(サンプル)を、樹脂ワニスに対して60質量%の比率で配合し、シンキー社製あわ取り練太郎(型番AR−100)を用いて十分に混合してペーストとし、そのペーストをガラス板上に塗布し、大気中にて180℃で3分間乾燥させた後、四極端子型(AgilnetTechnologies社製)にて電気抵抗を測定した。
そして、比抵抗(Ω・cm)=幅(cm)×膜厚(μm)×電気抵抗(Ω)/(長さ(cm)×104)という式にて、導電性ペーストの導電性(比抵抗)を算出し、表1に示した。
<Evaluation of conductivity (specific resistance) of conductive paste>
The silver-coated copper powder (sample) obtained in the examples and comparative examples is blended at a ratio of 60% by mass with respect to the resin varnish, and thoroughly mixed using Shintaro Awatori Nertaro (model number AR-100). Then, the paste was applied on a glass plate, dried at 180 ° C. for 3 minutes in the air, and then the electric resistance was measured with a quadrupole terminal type (manufactured by Agilent Technologies).
And the specific resistance (Ω · cm) = width (cm) × film thickness (μm) × electrical resistance (Ω) / (length (cm) × 10 4 ) Resistance) was calculated and shown in Table 1.
<実施例1>
2.5m×1.1m×1.5mの大きさ(約4m3)の電解槽内に、それぞれ大きさ(1.0m×1.0m)9枚のSUS製陰極板と不溶性陽極板(DSE(ペルメレック電極社製))とを電極間距離5cmとなるように吊設し、電解液としての硫酸銅溶液を30L/分で循環させて、この電解液に陽極と陰極を浸漬し、これに直流電流を流して電気分解を行い、陰極表面に粉末状の銅を析出させた。
この際、循環させる電解液のCu濃度を10g/L、硫酸(H2SO4)濃度を100g/L、塩素濃度を50mg/Lとし、且つ、電流密度を800A/m2に調整して30分間電解を実施した。この時の溶液のpHは1であった。
電解中、電解槽の底部の電解液の銅イオン濃度よりも、電極間の電解液の銅イオン濃度が常に薄く維持されていた。
<Example 1>
In an electrolytic cell having a size of 2.5 m × 1.1 m × 1.5 m (about 4 m 3 ), 9 SUS cathode plates and insoluble anode plates (DSE) each having a size (1.0 m × 1.0 m). (Permelec Electrode Co., Ltd.)) is suspended so that the distance between the electrodes is 5 cm, and a copper sulfate solution as an electrolytic solution is circulated at 30 L / min, and an anode and a cathode are immersed in the electrolytic solution. Electrolysis was performed by applying a direct current, and powdered copper was deposited on the cathode surface.
At this time, the Cu concentration of the electrolyte to be circulated is adjusted to 10 g / L, the sulfuric acid (H 2 SO 4 ) concentration is set to 100 g / L, the chlorine concentration is set to 50 mg / L, and the current density is adjusted to 800 A / m 2 to 30. Electrolysis was performed for a minute. The pH of the solution at this time was 1.
During electrolysis, the copper ion concentration of the electrolyte solution between the electrodes was always kept lower than the copper ion concentration of the electrolyte solution at the bottom of the electrolytic cell.
そして、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。このケーキを水3Lに分散させてスラリーとし、pH9になるまで炭酸アンモニウム溶液を添加し、撹拌して“アルカリ化処理”を行った。その後、純水で洗浄して不純物を取り除いた。
次に、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えて撹拌した後、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。
こうして得られた電解銅粉を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が垂直若しくは斜めに分岐して三次元的に成長したデンドライト状を呈していることを確認できた。
Then, the copper deposited on the cathode surface was mechanically scraped and collected, and then washed to obtain a hydrated copper powder cake equivalent to 1 kg of copper powder. This cake was dispersed in 3 L of water to form a slurry, and an ammonium carbonate solution was added until pH 9 was obtained, followed by stirring to perform “alkalizing treatment”. Thereafter, the impurities were removed by washing with pure water.
Next, 1 L of an industrial gelatin (Nitta Gelatin) 10 g / L aqueous solution was added and stirred, and then dried under reduced pressure (1 × 10 −3 Pa) at 80 ° C. for 6 hours to obtain electrolytic copper powder. It was.
When the electrolytic copper powder obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of copper powder particles had a single main axis, and a plurality of branches from the main axis. It was confirmed that it had a dendritic shape that branched vertically or obliquely and grew three-dimensionally.
こうして得られた電解銅粉25kgを、50℃に保温した純水50L中に投入してよく攪拌させた。これとは別に、純水5Lに硝酸銀4.5kg投入して硝酸銀溶液を作製した。先ほど銅粉を溶解した溶液に硝酸銀溶液を一括添加した。この状態で2時間攪拌を行い、銀被覆銅粉スラリーを得た。
次に、真空ろ過にて銀被覆銅粉スラリーのろ過を行い、ろ過が終わった後、EDTA(エチレンジアミン四酢酸)600gを純水6Lに溶解させた溶液を用いて洗浄し、続いて3Lの純水で残留EDTAを洗浄した。その後、120℃で3時間乾燥させてデンドライト状銀被覆銅粉(サンプル)を得た。銀の被覆量は、銀被覆銅粉全体の10.8質量%であった。
25 kg of the obtained electrolytic copper powder was put into 50 L of pure water kept at 50 ° C. and stirred well. Separately, 4.5 kg of silver nitrate was put into 5 L of pure water to prepare a silver nitrate solution. The silver nitrate solution was added all at once to the solution in which the copper powder was dissolved. In this state, stirring was performed for 2 hours to obtain a silver-coated copper powder slurry.
Next, the silver-coated copper powder slurry is filtered by vacuum filtration. After the filtration is completed, the slurry is washed with a solution obtained by dissolving 600 g of EDTA (ethylenediaminetetraacetic acid) in 6 L of pure water, followed by 3 L of pure water. Residual EDTA was washed with water. Then, it was made to dry at 120 degreeC for 3 hours, and dendritic silver covering copper powder (sample) was obtained. The silver coating amount was 10.8% by mass of the total silver-coated copper powder.
得られたデンドライト状銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the obtained dendrite-like silver-coated copper powder (sample) was observed using a scanning electron microscope (SEM), at least 90% by number of silver-coated copper powder particles had one main axis, It has a dendritic shape in which a plurality of branches are obliquely branched from the main axis and grown three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the length of the longest branch It was confirmed that b was in the range of 0.7 μm to 12.0 μm, and the number of branches with respect to the major axis L (the number of branches / major axis L) was 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(実施例2、3)
実施例1の“アルカリ処理”において、pH9になるまで炭酸アンモニウム溶液を添加してアルカリ処理を行った代わりに、実施例2では、pH11になるまでアンモニア水を添加してアルカリ処理を行い、実施例3では、pH14まで苛性ソーダを添加してアルカリ処理を行い、銀コート処理を行った。この点以外は、実施例1と同様に銀被覆銅粉(サンプル)を得た。
(Examples 2 and 3)
In Example 1, “Alkali treatment”, instead of adding an ammonium carbonate solution until pH 9 and performing an alkali treatment, in Example 2, an aqueous ammonia was added until pH 11 and an alkali treatment was performed. In Example 3, caustic soda was added to pH 14 to perform alkali treatment, and silver coating treatment was performed. Except this point, a silver-coated copper powder (sample) was obtained in the same manner as in Example 1.
得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the obtained silver-coated copper powder (sample) was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, and the main axis A plurality of branches obliquely branch to form a dendritic shape that grows three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the longest branch length b is It was within the range of 0.7 μm to 12.0 μm, and it was confirmed that the number of branches with respect to the major axis L of the main shaft (the number of branches / major axis L) was 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(実施例4)
2.5m×1.1m×1.5mの大きさ(約4m3)の電解槽内に、それぞれ大きさ(1.0m×1.0m)9枚のSUS製陰極板と不溶性陽極板(DSE(ペルメレック電極社製))とを電極間距離5cmとなるように吊設し、電解液としての硫酸銅溶液を30L/分で循環させて、この電解液に陽極と陰極を浸漬し、これに直流電流を流して電気分解を行い、陰極表面に粉末状の銅を析出させた。
この際、循環させる電解液のCu濃度を5g/L、硫酸(H2SO4)濃度を80g/L、塩素濃度を100mg/Lとし、且つ、電流密度を1200A/m2に調整して10分間電解を実施した。この時の溶液のpHは1であった。
電解中、電解槽の底部の電解液の銅イオン濃度よりも、電極間の電解液の銅イオン濃度が常に薄く維持されていた。
Example 4
In an electrolytic cell having a size of 2.5 m × 1.1 m × 1.5 m (about 4 m 3 ), 9 SUS cathode plates and insoluble anode plates (DSE) each having a size (1.0 m × 1.0 m). (Permelec Electrode Co., Ltd.)) is suspended so that the distance between the electrodes is 5 cm, and a copper sulfate solution as an electrolytic solution is circulated at 30 L / min, and an anode and a cathode are immersed in the electrolytic solution. Electrolysis was performed by applying a direct current, and powdered copper was deposited on the cathode surface.
At this time, the Cu concentration of the electrolyte to be circulated is adjusted to 5 g / L, the sulfuric acid (H 2 SO 4 ) concentration is set to 80 g / L, the chlorine concentration is set to 100 mg / L, and the current density is adjusted to 1200 A / m 2 to 10. Electrolysis was performed for a minute. The pH of the solution at this time was 1.
During electrolysis, the copper ion concentration of the electrolyte solution between the electrodes was always kept lower than the copper ion concentration of the electrolyte solution at the bottom of the electrolytic cell.
そして、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。このケーキを水3Lに分散させてスラリーとし、pH9になるまで炭酸アンモニウム溶液を添加し、撹拌してアルカリ化処理を行った。その後、純水で洗浄して不純物を取り除いた。
次に、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えて撹拌した後、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。
こうして得られた電解銅粉を、実施例1と同じように銀被覆工程を行って銀被覆銅粉(サンプル)を得た。
Then, the copper deposited on the cathode surface was mechanically scraped and collected, and then washed to obtain a hydrated copper powder cake equivalent to 1 kg of copper powder. This cake was dispersed in 3 L of water to make a slurry, and an ammonium carbonate solution was added until pH 9 was obtained, followed by stirring to perform alkalinization treatment. Thereafter, the impurities were removed by washing with pure water.
Next, 1 L of an industrial gelatin (Nitta Gelatin) 10 g / L aqueous solution was added and stirred, and then dried under reduced pressure (1 × 10 −3 Pa) at 80 ° C. for 6 hours to obtain electrolytic copper powder. It was.
The electrolytic copper powder thus obtained was subjected to a silver coating step in the same manner as in Example 1 to obtain a silver-coated copper powder (sample).
こうして得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the silver-coated copper powder (sample) obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, It has a dendritic shape in which a plurality of branches are obliquely branched from the main axis and grown three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the longest branch length b In the range of 0.7 μm to 12.0 μm, and the number of branches (the number of branches / major axis L) with respect to the major axis L of the main shaft was confirmed to be 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(実施例5、6)
実施例4のアルカリ処理において、pH9になるまで炭酸アンモニウム溶液を添加してアルカリ処理を行った代わりに、実施例5では、pH11になるまでアンモニア水を添加してアルカリ処理を行い、実施例6では、pH14まで苛性ソーダを添加してアルカリ処理を行った。この点以外は、実施例4と同様にして銀被覆銅粉(サンプル)を得た。
(Examples 5 and 6)
In the alkali treatment of Example 4, instead of performing an alkali treatment by adding an ammonium carbonate solution until the pH reached 9, in Example 5, an aqueous ammonia was added until the pH reached 11, and the alkali treatment was performed. Then, alkali treatment was performed by adding caustic soda to pH14. Except this point, it carried out similarly to Example 4, and obtained the silver covering copper powder (sample).
こうして得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the silver-coated copper powder (sample) obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, It has a dendritic shape in which a plurality of branches are obliquely branched from the main axis and grown three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the longest branch length b In the range of 0.7 μm to 12.0 μm, and the number of branches (the number of branches / major axis L) with respect to the major axis L of the main shaft was confirmed to be 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(実施例7)
2.5m×1.1m×1.5mの大きさ(約4m3)の電解槽内に、それぞれ大きさ(1.0m×1.0m)9枚のSUS製陰極板と不溶性陽極板(DSE(ペルメレック電極社製))とを電極間距離5cmとなるように吊設し、電解液としての硫酸銅溶液を30L/分で循環させて、この電解液に陽極と陰極を浸漬し、これに直流電流を流して電気分解を行い、陰極表面に粉末状の銅を析出させた。
この際、循環させる電解液のCu濃度を20g/L、硫酸(H2SO4)濃度を80g/L、塩素濃度を20mg/Lとし、且つ、電流密度を500A/m2に調整して10分間電解を実施した。この時の溶液のpHは1であった。
電解中、電解槽の底部の電解液の銅イオン濃度よりも、電極間の電解液の銅イオン濃度が常に薄く維持されていた。
(Example 7)
In an electrolytic cell having a size of 2.5 m × 1.1 m × 1.5 m (about 4 m 3 ), 9 SUS cathode plates and insoluble anode plates (DSE) each having a size (1.0 m × 1.0 m). (Permelec Electrode Co., Ltd.)) is suspended so that the distance between the electrodes is 5 cm, and a copper sulfate solution as an electrolytic solution is circulated at 30 L / min, and an anode and a cathode are immersed in the electrolytic solution. Electrolysis was performed by applying a direct current, and powdered copper was deposited on the cathode surface.
At this time, the electrolytic solution to be circulated was adjusted to a Cu concentration of 20 g / L, a sulfuric acid (H 2 SO 4 ) concentration of 80 g / L, a chlorine concentration of 20 mg / L, and a current density of 500 A / m 2 to 10 Electrolysis was performed for a minute. The pH of the solution at this time was 1.
During electrolysis, the copper ion concentration of the electrolyte solution between the electrodes was always kept lower than the copper ion concentration of the electrolyte solution at the bottom of the electrolytic cell.
そして、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。このケーキを水3Lに分散させてスラリーとし、pH9になるまで炭酸アンモニウム溶液を添加し、撹拌してアルカリ化処理を行った。その後、純水で洗浄して不純物を取り除いた。
次に、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えて撹拌した後、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。
こうして得られた電解銅粉を、実施例1と同じように銀被覆工程を行って銀被覆銅粉(サンプル)を得た。
Then, the copper deposited on the cathode surface was mechanically scraped and collected, and then washed to obtain a hydrated copper powder cake equivalent to 1 kg of copper powder. This cake was dispersed in 3 L of water to make a slurry, and an ammonium carbonate solution was added until pH 9 was obtained, followed by stirring to perform alkalinization treatment. Thereafter, the impurities were removed by washing with pure water.
Next, 1 L of an industrial gelatin (Nitta Gelatin) 10 g / L aqueous solution was added and stirred, and then dried under reduced pressure (1 × 10 −3 Pa) at 80 ° C. for 6 hours to obtain electrolytic copper powder. It was.
The electrolytic copper powder thus obtained was subjected to a silver coating step in the same manner as in Example 1 to obtain a silver-coated copper powder (sample).
こうして得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the silver-coated copper powder (sample) obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, It has a dendritic shape in which a plurality of branches are obliquely branched from the main axis and grown three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the longest branch length b In the range of 0.7 μm to 12.0 μm, and the number of branches (the number of branches / major axis L) with respect to the major axis L of the main shaft was confirmed to be 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(実施例8)
実施例4の“電流密度”において、電流密度を3000A/m2、“塩素濃度”を30mg/Lとした点以外は、実施例4と同様に銀被覆銅粉(サンプル)を得た。
(Example 8)
A silver-coated copper powder (sample) was obtained in the same manner as in Example 4 except that the “current density” in Example 4 was set to 3000 A / m 2 and the “chlorine concentration” was set to 30 mg / L.
得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈しており、主軸の太さaが0.3μm〜5.0μmの範囲内であり、最も長い枝の長さbが0.7μm〜12.0μmの範囲内であり、主軸の長径Lに対する枝の分岐本数(枝本数/長径L)0.5〜4.0本/μmであることが確認された。
また、表1に示すように、この銀被覆銅粉の導電性を測定したところ、良好な値を示した。
When the obtained silver-coated copper powder (sample) was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, and the main axis A plurality of branches obliquely branch to form a dendritic shape that grows three-dimensionally, the main axis thickness a is in the range of 0.3 μm to 5.0 μm, and the longest branch length b is It was within the range of 0.7 μm to 12.0 μm, and it was confirmed that the number of branches with respect to the major axis L of the main shaft (the number of branches / major axis L) was 0.5 to 4.0 / μm.
Moreover, when the electroconductivity of this silver covering copper powder was measured as shown in Table 1, the favorable value was shown.
(比較例1)
実施例1において、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。このケーキを水3Lに分散させ、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えた後、純水で洗浄した。次に、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。これ以外の点は、実施例1と同様にして銀被覆銅粉(サンプル)を得た。
(Comparative Example 1)
In Example 1, the copper deposited on the cathode surface was mechanically scraped and collected, and then washed to obtain a hydrous copper powder cake equivalent to 1 kg of copper powder. The cake was dispersed in 3 L of water, 1 L of an aqueous solution of 10 g / L of industrial gelatin (manufactured by Nitta Gelatin) was added, and then washed with pure water. Next, it was dried at 80 ° C. for 6 hours under reduced pressure (1 × 10 −3 Pa) to obtain electrolytic copper powder. Otherwise, silver-coated copper powder (sample) was obtained in the same manner as in Example 1.
こうして得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が垂直若しくは斜めに分岐して三次元的に成長したデンドライト状を呈していることを確認できた。 When the silver-coated copper powder (sample) obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, It was confirmed that a plurality of branches from the main axis branched vertically or obliquely to form a dendritic shape that grew three-dimensionally.
(比較例2)
実施例4において、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。このケーキを水3Lに分散させ、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えた後、純水で洗浄した。次に、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。これ以外の点は、実施例1と同様にして銀被覆銅粉(サンプル)を得た。
(Comparative Example 2)
In Example 4, the copper deposited on the cathode surface was mechanically scraped off and collected, and then washed to obtain a hydrous copper powder cake equivalent to 1 kg of copper powder. The cake was dispersed in 3 L of water, 1 L of an aqueous solution of 10 g / L of industrial gelatin (manufactured by Nitta Gelatin) was added, and then washed with pure water. Next, it was dried at 80 ° C. for 6 hours under reduced pressure (1 × 10 −3 Pa) to obtain electrolytic copper powder. Otherwise, silver-coated copper powder (sample) was obtained in the same manner as in Example 1.
こうして得られた銀被覆銅粉(サンプル)を、走査型電子顕微鏡(SEM)を用いて観察したところ、少なくとも90個数%以上の銀被覆銅粉粒子は、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して三次元的に成長したデンドライト状を呈していることを確認できた。 When the silver-coated copper powder (sample) obtained in this way was observed using a scanning electron microscope (SEM), at least 90% by number or more of the silver-coated copper powder particles had one main axis, It was confirmed that a plurality of branches from the main axis were obliquely branched to form a dendritic shape that grew three-dimensionally.
(比較例3)
5.0m×1.1m×1.5mの大きさ(約8m3)の電解槽内に、それぞれ大きさ(1.0m×1.0m)19枚の銅陰極板と銅陽極板とを電極間距離10cmとなるように吊設し、電解液としての硫酸銅溶液を150L/分で循環させて、この電解液に陽極と陰極を浸漬し、これに直流電流を流して電気分解を行い、陰極表面に粉末状の銅を析出させ、陰極表面に析出した銅を、機械的に掻き落として回収し、その後、洗浄し、銅粉1kg相当の含水銅粉ケーキを得た。
この際、循環させる電解液のCu濃度を80g/L、硫酸(H2SO4)濃度を200g/L、電流密度を90A/m2に調整して6時間電解を実施した。
このケーキを水3Lに分散させてスラリーとし、pH9になるまで炭酸アンモニウム溶液を添加し、撹拌してアルカリ化処理を行った。その後、純水で洗浄して不純物を取り除いた。
次に、工業用ゼラチン(新田ゼラチン社製)10g/Lの水溶液1Lを加えて撹拌した後、減圧状態(1×10-3Pa)で80℃、6時間乾燥させ、電解銅粉を得た。
こうして得られた電解銅粉を、実施例1と同じように銀被覆工程を行って銀被覆銅粉(サンプル)を得た。
得られた電解銅粉の粒子形状は松ぼっくり状であり、主軸太さ、枝長、枝本数/長径Lの測定は出来なかった。
(Comparative Example 3)
In an electrolytic cell having a size of 5.0 m × 1.1 m × 1.5 m (about 8 m 3 ), 19 copper cathode plates and copper anode plates each having a size (1.0 m × 1.0 m) are electrodes. Suspended so as to have a distance of 10 cm, and circulated a copper sulfate solution as an electrolytic solution at 150 L / min, immersed an anode and a cathode in the electrolytic solution, and conducted a direct current to conduct electrolysis. Powdered copper was deposited on the cathode surface, and the copper deposited on the cathode surface was mechanically scraped and collected, and then washed to obtain a hydrous copper powder cake equivalent to 1 kg of copper powder.
At this time, the electrolytic solution to be circulated was adjusted to a Cu concentration of 80 g / L, a sulfuric acid (H 2 SO 4 ) concentration of 200 g / L, and a current density of 90 A / m 2 for electrolysis for 6 hours.
This cake was dispersed in 3 L of water to make a slurry, and an ammonium carbonate solution was added until pH 9 was obtained, followed by stirring to perform alkalinization treatment. Thereafter, the impurities were removed by washing with pure water.
Next, 1 L of an industrial gelatin (Nitta Gelatin) 10 g / L aqueous solution was added and stirred, and then dried under reduced pressure (1 × 10 −3 Pa) at 80 ° C. for 6 hours to obtain electrolytic copper powder. It was.
The electrolytic copper powder thus obtained was subjected to a silver coating step in the same manner as in Example 1 to obtain a silver-coated copper powder (sample).
The particle shape of the obtained electrolytic copper powder was pinecone-like, and the main shaft thickness, branch length, number of branches / long diameter L could not be measured.
(考察)
上記実施例とこれまで行った試験結果を総合的に考えると、塩素の濃度が5wtppm〜250wtppmであっても、銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu)と銀の濃度(ρAg)との比率(ρCu/ρAg)が0.12以下であれば、導電性を有効に高めることができることが分かった。
(Discussion)
Considering the above examples and the test results conducted so far, even if the chlorine concentration is 5 wtppm to 250 wtppm, the total Cu concentration (ρCu) of Cu, CuO and Cu 2 O on the surface of the silver-coated copper powder particles It was found that if the ratio (ρCu / ρAg) to the silver concentration (ρAg) is 0.12 or less, the conductivity can be effectively increased.
実施例で得られた被覆銅粉を走査型電子顕微鏡(SEM)を用いて観察した結果、一本の主軸を備えており、該主軸から複数の枝が斜めに分岐して、二次元的或いは三次元的に成長したデンドライト状を呈し、かつ、主軸の太さaが0.3μm〜5.0μmであり、主軸から伸びた枝の中で最も長い枝の長さbが0.7μm〜12.0μmであるデンドライト状(「特殊デンドライト状」と称する)を呈するデンドライト状銀被覆銅粉粒子が、全銀被覆銅粉粒子のうちの80個数%以上を占めることを確認することができた。
また、実施例で得られた被覆銅粉を走査型電子顕微鏡(SEM)を用いて観察した結果、上記特殊デンドライト状を呈するデンドライト状銀被覆銅粉粒子が、デンドライト状銀被覆銅粉粒子のうちの90個数%以上を占めることを確認することができた。
As a result of observing the coated copper powder obtained in the examples using a scanning electron microscope (SEM), it is provided with one main axis, and a plurality of branches branch obliquely from the main axis, It has a dendritic shape that grows three-dimensionally, has a main axis thickness a of 0.3 μm to 5.0 μm, and the longest branch length b among the branches extending from the main axis is 0.7 μm to 12 μm. It was confirmed that the dendrite-like silver-coated copper powder particles having a dendrite shape of 0.0 μm (referred to as “special dendritic shape”) accounted for 80% by number or more of the total silver-coated copper powder particles.
Moreover, as a result of observing the coated copper powder obtained in the Examples using a scanning electron microscope (SEM), the dendrite-like silver-coated copper powder particles exhibiting the above-mentioned special dendritic shape are among the dendrite-like silver-coated copper powder particles. It was confirmed that it occupied 90% by number or more.
Claims (6)
塩素の濃度が5wtppm〜250wtppmであり、且つ、X線光電子分光分析法による測定される、当該銀被覆銅粉粒子表面におけるCu、CuO及びCu2Oの合計Cu濃度(ρCu、原子%)と銀の濃度(ρAg、原子%)との比率(ρCu/ρAg)が0.12以下であり、且つ、BET比表面積0.30〜2.00m2/gであり、且つ、レーザー回折散乱式粒度分布測定装置によって測定される体積累積粒径D50が1.0μm〜11.2μmであることを特徴とする銀被覆銅粉。 A silver-coated copper powder containing silver-coated copper powder particles having a configuration in which the surface of dendritic copper powder particles exhibiting a dendritic shape is coated with silver or a silver alloy,
The total Cu concentration (ρCu, atomic%) and silver concentration of Cu, CuO and Cu2O on the surface of the silver-coated copper powder particles, measured by X-ray photoelectron spectroscopy, with a chlorine concentration of 5 wtppm to 250 wtppm The ratio (ρCu / ρAg) to (ρAg, atomic%) is 0.12 or less, the BET specific surface area is 0.30 to 2.00 m 2 / g, and the laser diffraction / scattering particle size distribution measuring apparatus A silver-coated copper powder characterized by having a volume cumulative particle diameter D50 measured by: 1.0 μm to 11.2 μm.
The silver-coated copper according to any one of claims 1 to 5, wherein the oxygen concentration is 0.20% by mass or less and the tap bulk density is 0.5 to 2.0 g / cm 3. powder.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013220786 | 2013-10-24 | ||
JP2013220786 | 2013-10-24 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015538205A Division JP6278969B2 (en) | 2013-10-24 | 2014-10-20 | Silver coated copper powder |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2017002401A true JP2017002401A (en) | 2017-01-05 |
Family
ID=52992853
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015538205A Active JP6278969B2 (en) | 2013-10-24 | 2014-10-20 | Silver coated copper powder |
JP2016111396A Pending JP2017002401A (en) | 2013-10-24 | 2016-06-03 | Silver-coated copper powder |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015538205A Active JP6278969B2 (en) | 2013-10-24 | 2014-10-20 | Silver coated copper powder |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP6278969B2 (en) |
WO (1) | WO2015060258A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018155520A (en) * | 2017-03-15 | 2018-10-04 | 住友金属鉱山株式会社 | Evaluation method of particle shape |
KR20190043568A (en) * | 2017-09-29 | 2019-04-26 | 제이엑스금속주식회사 | Metallic powder for metal laminate molding and sculpture made by using the metal powder |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5907302B1 (en) | 2015-05-15 | 2016-04-26 | 住友金属鉱山株式会社 | Copper powder, copper paste using the same, conductive paint, conductive sheet, and method for producing copper powder |
JP5907301B1 (en) | 2015-05-15 | 2016-04-26 | 住友金属鉱山株式会社 | Silver-coated copper powder, copper paste using the same, conductive paint, conductive sheet, and method for producing silver-coated copper powder |
CN109773179B (en) * | 2019-03-23 | 2020-01-10 | 昆明理工大学 | Method for preparing high-density silver-coated copper powder by external electromagnetic field |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01247584A (en) * | 1988-03-30 | 1989-10-03 | Nippon Mining Co Ltd | Production of electrolytic copper powder |
JPH0257623A (en) * | 1988-08-24 | 1990-02-27 | Kawasaki Steel Corp | Production of fine copper powder |
JPH11189813A (en) * | 1997-12-25 | 1999-07-13 | Kawatetsu Mining Co Ltd | Cleaning method of metal super fine powder |
JP2008031491A (en) * | 2006-07-26 | 2008-02-14 | Sumitomo Metal Mining Co Ltd | Fine copper powder, its manufacturing method and conductive paste |
WO2009060803A1 (en) * | 2007-11-05 | 2009-05-14 | Sumitomo Metal Mining Co., Ltd. | Copper fine particle, method for producing the same, and copper fine particle dispersion |
JP2012153967A (en) * | 2011-01-28 | 2012-08-16 | Mitsui Mining & Smelting Co Ltd | Conductive powder, and conductive paste |
JP2013001917A (en) * | 2011-06-13 | 2013-01-07 | Mitsui Mining & Smelting Co Ltd | Silver coated copper powder and method for manufacturing the same |
JP2013100592A (en) * | 2011-10-21 | 2013-05-23 | Mitsui Mining & Smelting Co Ltd | Silvered copper powder |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008019475A (en) * | 2006-07-12 | 2008-01-31 | Sumitomo Metal Mining Co Ltd | Method for removing chlorine in electrodeposited copper |
JP2009191321A (en) * | 2008-02-15 | 2009-08-27 | Sumitomo Metal Mining Co Ltd | Method for removing chlorine from electrowon copper powder |
CN103153503B (en) * | 2010-10-06 | 2018-01-02 | 旭硝子株式会社 | The manufacture method of electric conductivity copper particle and electric conductivity copper particle, electric conductor formation composition and the base material with electric conductor |
JP5868752B2 (en) * | 2012-03-26 | 2016-02-24 | 富士フイルム株式会社 | Method for producing metal nanowire |
-
2014
- 2014-10-20 WO PCT/JP2014/077851 patent/WO2015060258A1/en active Application Filing
- 2014-10-20 JP JP2015538205A patent/JP6278969B2/en active Active
-
2016
- 2016-06-03 JP JP2016111396A patent/JP2017002401A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01247584A (en) * | 1988-03-30 | 1989-10-03 | Nippon Mining Co Ltd | Production of electrolytic copper powder |
JPH0257623A (en) * | 1988-08-24 | 1990-02-27 | Kawasaki Steel Corp | Production of fine copper powder |
JPH11189813A (en) * | 1997-12-25 | 1999-07-13 | Kawatetsu Mining Co Ltd | Cleaning method of metal super fine powder |
JP2008031491A (en) * | 2006-07-26 | 2008-02-14 | Sumitomo Metal Mining Co Ltd | Fine copper powder, its manufacturing method and conductive paste |
WO2009060803A1 (en) * | 2007-11-05 | 2009-05-14 | Sumitomo Metal Mining Co., Ltd. | Copper fine particle, method for producing the same, and copper fine particle dispersion |
JP2012153967A (en) * | 2011-01-28 | 2012-08-16 | Mitsui Mining & Smelting Co Ltd | Conductive powder, and conductive paste |
JP2013001917A (en) * | 2011-06-13 | 2013-01-07 | Mitsui Mining & Smelting Co Ltd | Silver coated copper powder and method for manufacturing the same |
JP2013100592A (en) * | 2011-10-21 | 2013-05-23 | Mitsui Mining & Smelting Co Ltd | Silvered copper powder |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018155520A (en) * | 2017-03-15 | 2018-10-04 | 住友金属鉱山株式会社 | Evaluation method of particle shape |
KR20190043568A (en) * | 2017-09-29 | 2019-04-26 | 제이엑스금속주식회사 | Metallic powder for metal laminate molding and sculpture made by using the metal powder |
KR102301256B1 (en) | 2017-09-29 | 2021-09-10 | 제이엑스금속주식회사 | Metal powder for metal lamination molding and a sculpture manufactured using the metal powder |
Also Published As
Publication number | Publication date |
---|---|
WO2015060258A1 (en) | 2015-04-30 |
JPWO2015060258A1 (en) | 2017-03-09 |
JP6278969B2 (en) | 2018-02-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5631910B2 (en) | Silver coated copper powder | |
JP5631841B2 (en) | Silver coated copper powder | |
JP6165399B1 (en) | Silver coated copper powder | |
JP6166012B2 (en) | Conductive powder and conductive paste | |
JP5701695B2 (en) | Silver-coated copper powder and method for producing the same | |
WO2016038914A1 (en) | Silver-coated copper powder, and conductive paste, conductive coating material and conductive sheet, each of which uses said silver-coated copper powder | |
JP6278969B2 (en) | Silver coated copper powder | |
JP5907301B1 (en) | Silver-coated copper powder, copper paste using the same, conductive paint, conductive sheet, and method for producing silver-coated copper powder | |
WO2016031286A1 (en) | Silver-coated copper powder, and conductive paste, conductive coating material and conductive sheet each of which uses same | |
WO2016151859A1 (en) | Silver-coated copper powder and conductive paste, conductive material, and conductive sheet using same | |
JP2016139598A (en) | Silver coated copper powder, and copper paste, conductive coating and conductive sheet using the same | |
JP2014159646A (en) | Silver-coated copper powder | |
JP2016094665A (en) | Silver coated copper powder and conductive paste using the same, conductive coating and conductive sheet | |
JP5711435B2 (en) | Copper powder | |
JP6332125B2 (en) | Silver coated copper powder and conductive paste, conductive paint, conductive sheet using the same | |
JP5790900B1 (en) | Silver coated copper powder and conductive paste, conductive paint, conductive sheet using the same | |
JP2017071809A (en) | Sn-COATED COPPER POWDER AND CONDUCTIVE PASTE USING THE SAME, AND PRODUCTION PROCESS FOR Sn-COATED COPPER POWDER | |
JP2017071820A (en) | Sn-COATED COPPER POWDER AND CONDUCTIVE PASTE USING THE SAME, AND PRODUCTION PROCESS FOR Sn-COATED COPPER POWDER | |
TWI553661B (en) | Silver powder and its use of conductive paste, conductive paint, conductive film | |
JP6056901B2 (en) | Method for producing dendritic silver-coated copper powder, and copper paste, conductive paint, and conductive sheet using the dendritic silver-coated copper powder | |
JP2017071823A (en) | Sn-COATED COPPER POWDER AND CONDUCTIVE PASTE USING THE SAME, AND PRODUCTION PROCESS FOR Sn-COATED COPPER POWDER | |
JP2017071822A (en) | Sn-COATED COPPER POWDER AND CONDUCTIVE PASTE USING THE SAME, AND PRODUCTION PROCESS FOR Sn-COATED COPPER POWDER | |
JP2017071821A (en) | Sn-COATED COPPER POWDER AND CONDUCTIVE PASTE USING THE SAME |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170725 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180807 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20190219 |