JP2016537504A5 - - Google Patents

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Publication number
JP2016537504A5
JP2016537504A5 JP2016523311A JP2016523311A JP2016537504A5 JP 2016537504 A5 JP2016537504 A5 JP 2016537504A5 JP 2016523311 A JP2016523311 A JP 2016523311A JP 2016523311 A JP2016523311 A JP 2016523311A JP 2016537504 A5 JP2016537504 A5 JP 2016537504A5
Authority
JP
Japan
Prior art keywords
heating
deposition apparatus
heating device
roller
roller device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016523311A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016537504A (ja
Filing date
Publication date
Priority claimed from EP13189388.5A external-priority patent/EP2862956B1/en
Application filed filed Critical
Publication of JP2016537504A publication Critical patent/JP2016537504A/ja
Publication of JP2016537504A5 publication Critical patent/JP2016537504A5/ja
Pending legal-status Critical Current

Links

JP2016523311A 2013-10-18 2014-10-17 真空堆積装置のためのローラデバイス、ローラを有する真空堆積装置、及びローラを操作するための方法 Pending JP2016537504A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13189388.5A EP2862956B1 (en) 2013-10-18 2013-10-18 Roller device for vacuum deposition arrangement, vacuum deposition arrangement with roller and method for operating a roller
EP13189388.5 2013-10-18
PCT/EP2014/072346 WO2015055828A1 (en) 2013-10-18 2014-10-17 Roller device for vacuum deposition arrangement, vacuum deposition arrangement with roller and method for operating a roller

Publications (2)

Publication Number Publication Date
JP2016537504A JP2016537504A (ja) 2016-12-01
JP2016537504A5 true JP2016537504A5 (enExample) 2017-11-30

Family

ID=49447989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016523311A Pending JP2016537504A (ja) 2013-10-18 2014-10-17 真空堆積装置のためのローラデバイス、ローラを有する真空堆積装置、及びローラを操作するための方法

Country Status (6)

Country Link
US (1) US20150110960A1 (enExample)
EP (1) EP2862956B1 (enExample)
JP (1) JP2016537504A (enExample)
KR (1) KR20160073404A (enExample)
CN (2) CN105658840A (enExample)
WO (1) WO2015055828A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101938874B1 (ko) * 2016-07-20 2019-01-15 주식회사 참트론 고품질 그래핀 합성을 위한 열처리 장비
KR102543516B1 (ko) * 2017-12-20 2023-06-13 엘지디스플레이 주식회사 롤투롤 증착용 드럼, 롤투롤 증착 장치 및 필름 롤
WO2020078557A1 (en) * 2018-10-18 2020-04-23 Applied Materials, Inc. Deposition apparatus, system and method for depositing a material on a substrate
CN110670021A (zh) * 2019-10-24 2020-01-10 湖南玉丰真空科学技术有限公司 一种用于真空镀膜机的高温加热辊装置
CN111509208A (zh) * 2020-04-26 2020-08-07 合肥国轩高科动力能源有限公司 一种锂离子电池负极材料及其制备方法和装置
CN115461491B (zh) * 2020-07-01 2024-08-23 应用材料公司 用于操作腔室的方法、用于处理基板的装置和基板处理系统
JP2022046262A (ja) * 2020-09-10 2022-03-23 トクデン株式会社 誘導発熱ローラ装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3952798A (en) * 1970-08-31 1976-04-27 Xerox Corporation Internally heated heat pipe roller
JPS5459549A (en) * 1977-10-21 1979-05-14 Canon Kk Heat roller supporting device
JPS614923Y2 (enExample) * 1980-12-05 1986-02-15
JPS62207867A (ja) * 1986-03-06 1987-09-12 Matsushita Electric Ind Co Ltd 金属薄膜の製造方法
JPS6435112A (en) * 1987-07-30 1989-02-06 Toppan Printing Co Ltd Cooling and heating roll
JPH04225788A (ja) * 1990-12-26 1992-08-14 Sumitomo Heavy Ind Ltd 真空中での連続鋼帯等の加熱装置
JP3571785B2 (ja) * 1993-12-28 2004-09-29 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JP2866070B2 (ja) * 1996-01-19 1999-03-08 シチズン時計株式会社 加熱ローラ装置
US5786570A (en) * 1996-01-19 1998-07-28 Citizen Watch Co., Ltd. Heating roller device
US6054018A (en) * 1998-08-28 2000-04-25 Wisconsin Alumni Research Foundation Outside chamber sealing roller system for surface treatment gas reactors
JP2000355071A (ja) * 1999-04-16 2000-12-26 Dainippon Printing Co Ltd バリア性フィルム及びそれを使用した積層材、並びにバリア性フィルムの製造方法及び装置
JP3255903B2 (ja) * 2000-08-10 2002-02-12 キヤノン株式会社 堆積膜形成方法および堆積膜形成装置
JP2002076394A (ja) * 2000-08-23 2002-03-15 Fuji Electric Co Ltd 薄膜半導体の製造装置
JP4200413B2 (ja) * 2001-01-17 2008-12-24 富士電機ホールディングス株式会社 薄膜半導体の製造装置
KR100502000B1 (ko) * 2003-06-19 2005-07-18 주식회사뉴테크 플라스틱 제품의 진공증착 코팅장치
US20060159844A1 (en) * 2005-01-18 2006-07-20 Fuji Photo Film Co., Ltd. Process and apparatus for producing magnetic recording medium
EP1840926B1 (de) * 2006-03-29 2011-10-19 Applied Materials GmbH & Co. KG Isolierende Vakuumdrehdurchführung für Rotationsmagnetrons
JP5213571B2 (ja) * 2008-07-28 2013-06-19 トクデン株式会社 円筒状鉄心、誘導発熱ローラ装置及び静止誘導機器
EP2216831A1 (en) * 2009-02-05 2010-08-11 Applied Materials, Inc. Modular PVD system for flex PV
CN102648138B (zh) * 2009-10-13 2015-11-25 万佳雷射有限公司 用于加工长的连续的柔性基片的装置和方法
DE112011102023T5 (de) * 2010-06-17 2013-08-01 Fuji Electric Co., Ltd Vorrichtung zur Herstellung eines fotoelektrischen Umwandlungselements
CN201952487U (zh) * 2010-12-01 2011-08-31 东莞宏威数码机械有限公司 真空基片加热装载设备
US8726829B2 (en) * 2011-06-07 2014-05-20 Jiaxiong Wang Chemical bath deposition apparatus for fabrication of semiconductor films through roll-to-roll processes
CN103380231A (zh) * 2011-06-15 2013-10-30 松下电器产业株式会社 基板输送辊、薄膜制造装置以及薄膜制造方法
US20140311409A1 (en) * 2011-12-28 2014-10-23 Dai Nippon Printing Co., Ltd. Vapor deposition apparatus having pretreatment device that uses plasma

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