JP2016532882A - 円形出力ビーム用の高効率単一パス高調波発生器 - Google Patents
円形出力ビーム用の高効率単一パス高調波発生器 Download PDFInfo
- Publication number
- JP2016532882A JP2016532882A JP2016502194A JP2016502194A JP2016532882A JP 2016532882 A JP2016532882 A JP 2016532882A JP 2016502194 A JP2016502194 A JP 2016502194A JP 2016502194 A JP2016502194 A JP 2016502194A JP 2016532882 A JP2016532882 A JP 2016532882A
- Authority
- JP
- Japan
- Prior art keywords
- harmonic
- crystal
- input
- harmonic generation
- fundamental
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 claims abstract description 192
- 201000009310 astigmatism Diseases 0.000 claims abstract description 31
- 230000009467 reduction Effects 0.000 claims abstract description 8
- 230000005855 radiation Effects 0.000 abstract description 47
- 230000003287 optical effect Effects 0.000 description 65
- 238000006243 chemical reaction Methods 0.000 description 20
- RIUWBIIVUYSTCN-UHFFFAOYSA-N trilithium borate Chemical compound [Li+].[Li+].[Li+].[O-]B([O-])[O-] RIUWBIIVUYSTCN-UHFFFAOYSA-N 0.000 description 19
- 239000000463 material Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000000835 fiber Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 230000010287 polarization Effects 0.000 description 7
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 6
- 238000005086 pumping Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000005670 electromagnetic radiation Effects 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- VJPICIAGVDFWEO-UHFFFAOYSA-N 2-chloro-6,7-dihydro-5h-pyrrolo[3,4-d]pyrimidine Chemical compound ClC1=NC=C2CNCC2=N1 VJPICIAGVDFWEO-UHFFFAOYSA-N 0.000 description 3
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002223 garnet Substances 0.000 description 3
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- ZPDRQAVGXHVGTB-UHFFFAOYSA-N gallium;gadolinium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Gd+3] ZPDRQAVGXHVGTB-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 235000019837 monoammonium phosphate Nutrition 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- QXTZRWXQGJJYKK-UHFFFAOYSA-N O.[Li].C(=O)O Chemical compound O.[Li].C(=O)O QXTZRWXQGJJYKK-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- NNAZVIPNYDXXPF-UHFFFAOYSA-N [Li+].[Cs+].OB([O-])[O-] Chemical compound [Li+].[Cs+].OB([O-])[O-] NNAZVIPNYDXXPF-UHFFFAOYSA-N 0.000 description 1
- TVFHPXMGPBXBAE-UHFFFAOYSA-N [Sc].[Gd] Chemical compound [Sc].[Gd] TVFHPXMGPBXBAE-UHFFFAOYSA-N 0.000 description 1
- MOCSSSMOHPPNTG-UHFFFAOYSA-N [Sc].[Y] Chemical compound [Sc].[Y] MOCSSSMOHPPNTG-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- XBJJRSFLZVLCSE-UHFFFAOYSA-N barium(2+);diborate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]B([O-])[O-].[O-]B([O-])[O-] XBJJRSFLZVLCSE-UHFFFAOYSA-N 0.000 description 1
- -1 boric acid Potassium aluminum Chemical compound 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VCZFPTGOQQOZGI-UHFFFAOYSA-N lithium bis(oxoboranyloxy)borinate Chemical compound [Li+].[O-]B(OB=O)OB=O VCZFPTGOQQOZGI-UHFFFAOYSA-N 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- IDEDFOKHQXDWGJ-UHFFFAOYSA-N nonacesium triborate Chemical compound [Cs+].[Cs+].[Cs+].[Cs+].[Cs+].[Cs+].[Cs+].[Cs+].[Cs+].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-] IDEDFOKHQXDWGJ-UHFFFAOYSA-N 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- CCTIOCVIZPCTGO-BYPYZUCNSA-N phosphoarginine Chemical class OC(=O)[C@@H](N)CCCNC(=N)NP(O)(O)=O CCTIOCVIZPCTGO-BYPYZUCNSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- GNSKLFRGEWLPPA-UHFFFAOYSA-M potassium dihydrogen phosphate Chemical class [K+].OP(O)([O-])=O GNSKLFRGEWLPPA-UHFFFAOYSA-M 0.000 description 1
- ZBWBYBYOJRDPDE-UHFFFAOYSA-K potassium titanium(4+) phosphate Chemical compound P(=O)([O-])([O-])[O-].[Ti+4].[K+] ZBWBYBYOJRDPDE-UHFFFAOYSA-K 0.000 description 1
- GVPLVOGUVQAPNJ-UHFFFAOYSA-M potassium;hydron;trioxido(oxo)-$l^{5}-arsane Chemical compound [K+].O[As](O)([O-])=O GVPLVOGUVQAPNJ-UHFFFAOYSA-M 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- KBAHJOGZLVQNBH-UHFFFAOYSA-K rubidium(1+);phosphate Chemical compound [Rb+].[Rb+].[Rb+].[O-]P([O-])([O-])=O KBAHJOGZLVQNBH-UHFFFAOYSA-K 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10084—Frequency control by seeding
- H01S3/10092—Coherent seed, e.g. injection locking
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10084—Frequency control by seeding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
- G02F1/3503—Structural association of optical elements, e.g. lenses, with the non-linear optical device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
- G02F1/3507—Arrangements comprising two or more nonlinear optical devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
- G02F1/3509—Shape, e.g. shape of end face
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/354—Third or higher harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/37—Non-linear optics for second-harmonic generation
- G02F1/372—Means for homogenizing the output beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
- H01S3/06758—Tandem amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1666—Solid materials characterised by a crystal matrix borate, carbonate, arsenide
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
Abstract
Description
次のとおり用語を定義する。
M2=πw0θ/λ
高次高調波発生(HHG,higher harmonic generation)、例えば、第二次高調波発生(SHG)、第三次高調波発生(THG)、第四次高調波発生(FHG,fourth harmonic generation)等。高調波発生では、入力光の二つ以上の光子が、周波数Nf0の出力光の光子を生じさせるように相互作用する。ここで、Nは、相互作用する光子の数であり、例えば、SHGでは、N=2である;
和周波発生(SFG,sum frequency generation)。和周波発生では、周波数f1の入力光の光子が、周波数f2の他の入力光の光子と相互作用して、周波数f1+f2を有する出力光の光子を生じさせる;
差周波発生(DFG,difference frequency generation)。差周波発生では、周波数f1の入力光の光子が、周波数f2の他の入力光の光子と相互作用して、周波数f1−f2を有する出力光の光子を生じさせる。
図1は、第三次高調波発生に使用される典型的な光学設定の概略を示す。基本ビーム209が、基本集束レンズ203を通過して集束される。第二次高調波(SH)結晶202が、基本ビーム焦点に又はその近傍に配置される。SH結晶202は、入射基本ビームの一部を第二次高調波に変換する。例えば、基本ビームが1064nmの場合、適切に形成され向けられた第二次高調波結晶はLBOであり得る。結果としての第二次高調波は532nmの波長を有する。残存基本ビーム209’及び第二次高調波ビーム323は、SH結晶202の出力面206から出射する。出射する基本ビーム209’は、そのパワーの一部が第二次高調波ビーム323に変換されているので、入射基本ビーム209よりも低いパワーを有する。第二次高調波ビーム323は、基本ビーム209’の光周波数の二倍に等しい周波数を有する。換言すると、第二次高調波ビームは、基本ビーム209’の真空波長の半分である真空波長を有する。これら両方のビームは、リレーレンズ205を通過して集束される。
i)基本ビームの横モード特性
ii)基本ビームのピークパワー
iii)基本ビームのスペクトル幅
iv)SHG結晶内への集束条件
v)THG結晶内への集束条件
vi)SHG結晶の入力角度及び出力角度
vii)THG結晶の入力角度及び出力角度
viii)SHG結晶の長さ
ix)THG結晶の長さ
x)SHG中でのポインティングベクトルのウォークオフ
xi)THG中でのポインティングベクトルのウォークオフ
図2Aは、本開示の態様に係る光高調波発生器200の配置を概略的に示す。集束レンズが、M2<1.2及び最小の非点収差で、入力基本放射を、円形でほぼ回折限界の入力基本ビーム209に集束する。例えば、非点収差は10%未満であり得る。
(i)第三次高調波の反射が十分に低いこと、例えば5%未満;
(ii)分散によるビームの角度分離が、基本ビーム及び第二次高調波ビームから第三次高調波を空間的にフィルタリングするのに十分であること。非限定的な一例では、フィルタリングの典型的な基準は、ビーム間の角度分離がビーム発散(広がり)の少なくとも二倍であることである;
(iii)出力面を通過する第三次高調波ビームが受ける縮小が、ウォークオフ方向及び非ウォークオフ方向において略等しいウエストサイズを生じさせることができること;
(iv)出力面によって生じる非点収差が、それまでのビームの非点収差をほぼ打ち消すように選択され得て、出射第三次高調波ビームの見掛けのウエスト位置がウォークオフ方向及び非ウォークオフ方向においてほぼ等しいようにすること;
(v)好ましくは、出力面が光学損傷に対してロバストであり、長寿命の動作を生じさせること。
i)基本入力ビームをSHG結晶内に集束させるレンズ又は他の光学部品;
ii)ブリュースター角又はほぼブリュースター角のSHGの入力面;
iii)SHG結晶とTHG結晶との間のリレーレンズ(又は他の光学部品);
iv)SHビーム及び残存基本ビームのTHG出力面におけるほぼ20°の入射
(1)非線形結晶内での小さなビームサイズを可能にして最適な効率を与える。
(2)ウォークオフ補償用の特別なレンズやプリズムが必要とされない。
(3)SHG結晶の入力面に対する第一の基本ビームウエストの位置を調整することによって非点収差調整用の“ノブ”を提供する。
(4)リレーレンズ及びTHG結晶の位置を調整することによって、真円度調整用の“ノブ”を提供する。
第一の代替実施形態は、ブリュースター角よりも大きくなるようにSHG結晶202への入射角を増大させることである。SHG結晶202の入力面204はコーティングされて、後方反射を減らし、効率を改善し得る。ブリュースター角又はブリュースター角近くに向けられた出力面を有するように形成されたTHG結晶302を用いることによって、円形であり非点収差のないほぼ回折限界の第三次高調波を得ることができる。
図6は、本発明の一実施形態に係る波長変換レーザーシステム600の一例を示す。具体的には、システム600は、シード源602と、一つ以上の光増幅器604、606と、波長変換器100とを含み、波長変換器100は、図2A、図2Bに関して本願で説明されるように、上述の他の構成のいずれかとして構成され得る。シード源602はシード放射601を発生させ、シード放射601は、光増幅器604、606によって増幅されて、波長変換器用の基本入力放射101となる増幅出力を生じさせる。波長変換器100は、増幅出力の少なくとも一部を波長変換して、波長変換された出力を生じさせる。基本入力ビームの一部も、波長変換器100から出射し得る。
203 基本集束レンズ
205 リレーレンズ
209 基本ビーム
302 第三次高調波発生(THG)結晶
325 第三次高調波ビーム
Claims (11)
- 公称円形であり非点収差のない回折限界の入力基本ビームから、円形であり非点収差のない第三次高調波出力ビームを発生させるように構成されたキャビティ外高調波発生器システムであって、
前記入力基本ビームに対する入射角に向けられた入力面を有する第二次高調波発生結晶であって、該入力面において該第二次高調波発生結晶の非ウォークオフ方向に基本ビームのサイズを拡大して、前記入力基本ビームから第二次高調波ビームを発生させるように構成された第二次高調波発生結晶と、
第三次高調波発生結晶であって、該第三次高調波発生結晶の非ウォークオフ方向において傾斜した入射角に向けられた出力面を有し、該非ウォークオフ方向に第三次高調波ビームのサイズを縮小して、前記第二次高調波発生結晶からの前記第二次高調波ビーム及び残存基本ビームから、第三次高調波ビームを発生させるように構成された第三次高調波発生結晶とを備え、
前記第二次高調波発生結晶の入力面における入力基本ビームの拡大が、前記第三次高調波発生結晶の出力面における第三次高調波ビームの縮小よりも強力である、システム。 - 前記第二次高調波発生結晶の入力面が、前記入力基本ビームに対して傾斜した入射角に向けられて、該入力面において前記第二次高調波発生結晶の非ウォークオフ方向に基本ビームを拡大する、請求項1に記載のシステム。
- 前記第三次高調波発生結晶の出力面が、前記第三次高調波ビームに対してブリュースター角未満に向けられる、請求項1に記載のシステム。
- 前記第三次高調波ビームが、ビームの角度発散よりも大きな角度で基本ビーム及び第二次高調波ビームから角度分離される、請求項1に記載のシステム。
- 前記第三次高調波ビームの平均パワーが略30Wよりも大きい、請求項1に記載のシステム。
- 前記第二次高調波発生結晶の入力面が、前記入力基本ビームに対してブリュースター角の略5度以内に向けられる、請求項1に記載のシステム。
- 前記第三次高調波発生結晶の出力面が、前記第三次高調波発生結晶の出力面に入射する残存基本ビーム及び第二次高調波ビームに対して略20度の入射角に向けられる、請求項1に記載のシステム。
- 前記第三次高調波発生結晶の出力面が、前記第三次高調波発生結晶の出力面に入射する残存基本ビーム及び第二次高調波ビームに対する入射角に向けられて、該入射角が、基本ビームを第三次高調波ビームに変換する正味の効率を最適化するように選択される、請求項1に記載のシステム。
- 公称円形であり非点収差のない回折限界の入力基本ビームから、円形であり非点収差のない第三次高調波出力ビームを発生させるように構成されたキャビティ外高調波発生器システムであって、
前記入力基本ビームに対する入射角に向けられた入力面を有する第二次高調波発生結晶であって、該入力面において該第二次高調波発生結晶の非ウォークオフ方向に基本ビームのサイズを拡大して、前記入力基本ビームから第二次高調波ビームを発生させるように構成された第二次高調波発生結晶と、
一つ以上の高次高調波発生結晶であって、該高次高調波発生結晶のうち少なくとも一つの非ウォークオフ方向において傾斜した入射角に向けられた出力面を有し、該非ウォークオフ方向に出力高次高調波ビームのサイズを縮小して、前記第二次高調波発生結晶からの第二次高調波ビーム及び残存基本ビームから、高次高調波ビームを発生させるように構成された一つ以上の高次高調波発生結晶とを備え、
前記第二次高調波発生結晶の入力面における入力基本ビームの拡大が、前記一つ以上の高次高調波発生結晶のうち少なくとも一つの出力面における第三次高調波ビームの縮小よりも強力である、システム。 - 前記一つ以上の高次高調波発生結晶が、前記第二次高調波発生結晶からの第二高調波ビーム及び第一の残存基本ビームから第三次高調波ビームを発生させるように構成された第三次高調波発生結晶と、前記第三次高調波発生結晶からの第三次高調波ビーム及び第二の残存基本ビームから第四次高調波ビームを発生させるように構成された第四次高調波発生結晶とを含む、請求項9に記載のシステム。
- 前記一つ以上の高次高調波発生結晶が、前記第二次高調波ビームから第四次高調波ビームを発生させるように構成された非線形結晶を含む、請求項9に記載のシステム。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361783686P | 2013-03-14 | 2013-03-14 | |
US61/783,686 | 2013-03-14 | ||
US14/209,908 | 2014-03-13 | ||
US14/209,908 US9912114B2 (en) | 2013-03-14 | 2014-03-13 | Highly efficient, single-pass, harmonic generator with round output beam |
PCT/US2014/026617 WO2014151887A1 (en) | 2013-03-14 | 2014-03-13 | Highly efficient, single-pass, harmonic generator with round output beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016532882A true JP2016532882A (ja) | 2016-10-20 |
JP6453844B2 JP6453844B2 (ja) | 2019-01-16 |
Family
ID=51581063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016502194A Active JP6453844B2 (ja) | 2013-03-14 | 2014-03-13 | 円形出力ビーム用の高効率単一パス高調波発生器 |
Country Status (5)
Country | Link |
---|---|
US (2) | US9912114B2 (ja) |
JP (1) | JP6453844B2 (ja) |
KR (1) | KR102100728B1 (ja) |
CN (1) | CN105210245B (ja) |
WO (1) | WO2014151887A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023100546A1 (ja) * | 2021-11-30 | 2023-06-08 | 株式会社ニコン | パルス光生成装置、パルス光生成方法及び加工装置 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105210245B (zh) * | 2013-03-14 | 2019-04-12 | Ipg光子公司 | 具有圆形输出光束的高效单通型谐波发生器 |
CN104682184B (zh) * | 2015-03-16 | 2017-11-14 | 中国工程物理研究院激光聚变研究中心 | 一种纵向局部扩束三倍频激光终端光学系统 |
CN109196737B (zh) * | 2016-03-30 | 2020-07-10 | Ipg光子公司 | 用于三次谐波生成的高效激光系统 |
CN105932534A (zh) * | 2016-06-17 | 2016-09-07 | 北京国科世纪激光技术有限公司 | 腔内倍频像散补偿型激光器 |
CN108988107A (zh) * | 2018-08-15 | 2018-12-11 | 武汉安扬激光技术有限责任公司 | 一种飞秒紫外光激光器 |
CN109283769A (zh) * | 2018-11-26 | 2019-01-29 | 山东大学 | 一种宽带倍频晶体器件 |
CN110286542B (zh) * | 2019-07-26 | 2024-07-09 | 南京钻石激光科技有限公司 | 激光辐射三倍率产生的装置 |
DE102019131827B4 (de) * | 2019-11-25 | 2021-12-23 | Novanta Europe Gmbh | Frequenzkonversionsanordnung zur Optimierung von Eigenschaften einer Harmonischen eines Lasers |
CN111244744B (zh) * | 2020-01-16 | 2022-02-15 | 中国科学院大连化学物理研究所 | 一种高功率激光系统中光学晶体损伤防护方法 |
KR20230023730A (ko) * | 2020-06-11 | 2023-02-17 | 앤드류 힝 청 쿵 | 광원 생성 장치, 광원 생성 방법 및 관련된 결함 검출 시스템 |
DE102021210706A1 (de) * | 2021-09-24 | 2023-03-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung und verfahren zur frequenzkonversion elektromagnetischer strahlung |
KR20240009263A (ko) | 2022-07-13 | 2024-01-22 | 김점술 | 2중 셔터방식의 심자외선광 발생기 |
KR20240101148A (ko) * | 2022-12-23 | 2024-07-02 | 한국과학기술연구원 | 레이저 장치 및 그를 포함하는 레이저 시스템 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09160086A (ja) * | 1995-12-05 | 1997-06-20 | Nec Corp | 波長変換素子 |
US20030214984A1 (en) * | 2002-03-28 | 2003-11-20 | Lightwave Electronics Corporation | Intracavity resonantly enhanced fourth-harmonic generation using uncoated brewster surfaces |
JP2006163256A (ja) * | 2004-12-10 | 2006-06-22 | Nikon Corp | 波長変換結晶及び波長変換光学系 |
JP2010064450A (ja) * | 2008-09-12 | 2010-03-25 | Asahi Kasei E-Materials Corp | レーザー彫刻印刷版の製造方法 |
JP2011197432A (ja) * | 2010-03-19 | 2011-10-06 | Mitsubishi Electric Corp | 波長変換レーザ装置 |
US20110243163A1 (en) * | 2010-04-02 | 2011-10-06 | Electro Scientific Industries, Inc. | Wedge-faceted nonlinear crystal for harmonic generation |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5835513A (en) | 1997-01-08 | 1998-11-10 | Spectra Physics, Inc. | Q-switched laser system providing UV light |
US5850407A (en) * | 1997-11-25 | 1998-12-15 | Lightwave Electronics Corporation | Third-harmonic generator with uncoated brewster-cut dispersive output facet |
US7016389B2 (en) * | 2003-01-24 | 2006-03-21 | Spectra Physics, Inc. | Diode pumped laser with intracavity harmonics |
JP4517698B2 (ja) | 2003-09-26 | 2010-08-04 | 三菱電機株式会社 | 波長変換レーザ装置 |
US20060114946A1 (en) * | 2004-11-30 | 2006-06-01 | Yunlong Sun | Nonlinear crystal modifications for durable high-power laser wavelength conversion |
US7292387B2 (en) * | 2005-01-12 | 2007-11-06 | Spectra-Physics, Inc. | Methods and systems to enhance multiple wave mixing process |
US7443903B2 (en) | 2006-04-19 | 2008-10-28 | Mobius Photonics, Inc. | Laser apparatus having multiple synchronous amplifiers tied to one master oscillator |
US7529281B2 (en) | 2006-07-11 | 2009-05-05 | Mobius Photonics, Inc. | Light source with precisely controlled wavelength-converted average power |
US7469081B2 (en) | 2006-09-01 | 2008-12-23 | Mobius Photonics, Inc. | Reducing thermal load on optical head |
US8009705B2 (en) | 2007-07-05 | 2011-08-30 | Mobius Photonics, Inc. | Fiber MOPA system without stimulated brillouin scattering |
US8422119B1 (en) * | 2010-09-20 | 2013-04-16 | Disco Corporation | Compensation of beam walkoff in nonlinear crystal using cylindrical lens |
US8559472B2 (en) * | 2011-03-02 | 2013-10-15 | Coherent, Inc. | Single-mode intra-cavity frequency-doubled CW solid-state laser with volumetric gain-grating |
JP5959815B2 (ja) | 2011-08-15 | 2016-08-02 | キヤノン株式会社 | 画像処理装置およびその方法 |
CN105210245B (zh) * | 2013-03-14 | 2019-04-12 | Ipg光子公司 | 具有圆形输出光束的高效单通型谐波发生器 |
-
2014
- 2014-03-13 CN CN201480027556.8A patent/CN105210245B/zh active Active
- 2014-03-13 KR KR1020157029432A patent/KR102100728B1/ko active IP Right Grant
- 2014-03-13 JP JP2016502194A patent/JP6453844B2/ja active Active
- 2014-03-13 WO PCT/US2014/026617 patent/WO2014151887A1/en active Application Filing
- 2014-03-13 US US14/209,908 patent/US9912114B2/en active Active
-
2017
- 2017-10-06 US US15/727,313 patent/US10283926B2/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09160086A (ja) * | 1995-12-05 | 1997-06-20 | Nec Corp | 波長変換素子 |
US20030214984A1 (en) * | 2002-03-28 | 2003-11-20 | Lightwave Electronics Corporation | Intracavity resonantly enhanced fourth-harmonic generation using uncoated brewster surfaces |
JP2005521910A (ja) * | 2002-03-28 | 2005-07-21 | ライトウェーブ エレクトロニクス コーポレイション | 非被覆ブリュースタ表面を用いてキャビティ内共振を増強した第4高調波の生成 |
JP2006163256A (ja) * | 2004-12-10 | 2006-06-22 | Nikon Corp | 波長変換結晶及び波長変換光学系 |
JP2010064450A (ja) * | 2008-09-12 | 2010-03-25 | Asahi Kasei E-Materials Corp | レーザー彫刻印刷版の製造方法 |
JP2011197432A (ja) * | 2010-03-19 | 2011-10-06 | Mitsubishi Electric Corp | 波長変換レーザ装置 |
US20110243163A1 (en) * | 2010-04-02 | 2011-10-06 | Electro Scientific Industries, Inc. | Wedge-faceted nonlinear crystal for harmonic generation |
JP2013524276A (ja) * | 2010-04-02 | 2013-06-17 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | 高調波生成用のくさび形小平面のある非線形結晶 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023100546A1 (ja) * | 2021-11-30 | 2023-06-08 | 株式会社ニコン | パルス光生成装置、パルス光生成方法及び加工装置 |
Also Published As
Publication number | Publication date |
---|---|
CN105210245A (zh) | 2015-12-30 |
JP6453844B2 (ja) | 2019-01-16 |
KR20150129021A (ko) | 2015-11-18 |
US10283926B2 (en) | 2019-05-07 |
US20170299943A1 (en) | 2017-10-19 |
WO2014151887A1 (en) | 2014-09-25 |
CN105210245B (zh) | 2019-04-12 |
US9912114B2 (en) | 2018-03-06 |
KR102100728B1 (ko) | 2020-04-14 |
US20180034230A1 (en) | 2018-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6453844B2 (ja) | 円形出力ビーム用の高効率単一パス高調波発生器 | |
US8422119B1 (en) | Compensation of beam walkoff in nonlinear crystal using cylindrical lens | |
US7443903B2 (en) | Laser apparatus having multiple synchronous amplifiers tied to one master oscillator | |
US7529281B2 (en) | Light source with precisely controlled wavelength-converted average power | |
US6999483B1 (en) | External 3rd, 4th and 5th harmonic laser | |
JP3199120B2 (ja) | ダイオード励起多軸モード空洞内周波数2倍型レーザ | |
US20090185583A1 (en) | UV and Visible Laser Systems | |
US20120263196A1 (en) | Ultrafast raman laser systems and methods of operation | |
KR102344775B1 (ko) | 제3 고조파 생성을 위한 고효율 레이저 시스템 | |
US20130294465A1 (en) | HIGHLY EFFICIENT 3rd HARMONIC GENERATION IN Nd: YAG LASER | |
WO2015174388A1 (ja) | 深紫外レーザ発生装置および光源装置 | |
JP4231829B2 (ja) | 内部共振器型和周波混合レーザ | |
CN110932079A (zh) | 一种四次谐波光束的产生装置 | |
EP2973897B1 (en) | Highly efficient, single-pass, harmonic generator with round output beam | |
CN109742646B (zh) | 一种抑制腔内泵浦连续波光参量振荡器弛豫振荡的装置 | |
CN103236638B (zh) | 一种基于体光栅构成半内腔式光学参量振荡器的2μm激光器 | |
McDonagh et al. | 888-nm pumping of Nd: YVO4 for high-power high-efficiency TEM00 lasers | |
KR101596478B1 (ko) | 다중 펄스 폭 출력이 가능한 레이저 장치 | |
JP7535669B2 (ja) | 周波数変換レーザ装置 | |
Cho et al. | Intracavity infrared OPO using periodically poled Mg-doped stoichiometric LiTaO3 for generating high average power | |
US9851570B2 (en) | Beam shaping of high intensity high frequency optical output | |
JP2021132127A (ja) | 半導体レーザ励起固体レーザ | |
Zavadilova et al. | Mode locked Nd: YVO 4 laser with intracavity synchronously pumped optical parametric oscillator | |
Iliev et al. | Steady state mode-locking of the Nd: YVO4 laser operating on the 1.34 µm transition using intracavity SHG in BIBO or PPMgSLT | |
Rustad et al. | Optical parametric oscillators with high pulse energy and beam quality |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170301 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180116 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180305 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180605 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180620 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20181119 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20181213 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6453844 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |