JP2016522572A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016522572A5 JP2016522572A5 JP2016511103A JP2016511103A JP2016522572A5 JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5 JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016511103 A JP2016511103 A JP 2016511103A JP 2016522572 A5 JP2016522572 A5 JP 2016522572A5
- Authority
- JP
- Japan
- Prior art keywords
- sub
- apertures
- aperture array
- small
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 9
- 230000001788 irregular Effects 0.000 claims 6
- 238000000034 method Methods 0.000 claims 3
- 239000011295 pitch Substances 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361818919P | 2013-05-03 | 2013-05-03 | |
| US61/818,919 | 2013-05-03 | ||
| PCT/EP2014/059106 WO2014177718A1 (en) | 2013-05-03 | 2014-05-05 | Beam grid layout |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016522572A JP2016522572A (ja) | 2016-07-28 |
| JP2016522572A5 true JP2016522572A5 (cg-RX-API-DMAC7.html) | 2018-07-19 |
| JP6377724B2 JP6377724B2 (ja) | 2018-08-22 |
Family
ID=50630812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016511103A Active JP6377724B2 (ja) | 2013-05-03 | 2014-05-05 | ビームグリッドレイアウト |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9934943B2 (cg-RX-API-DMAC7.html) |
| EP (2) | EP3020062B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6377724B2 (cg-RX-API-DMAC7.html) |
| NL (1) | NL2010760C2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014177718A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6537592B2 (ja) * | 2014-08-19 | 2019-07-03 | インテル・コーポレーション | 電子ビーム（ｅｂｅａｍ）直接書き込みシステムのためのコーナー部の丸み補正 |
| EP3010031B1 (en) * | 2014-10-16 | 2017-03-22 | Fei Company | Charged Particle Microscope with special aperture plate |
| JP6616986B2 (ja) * | 2015-09-14 | 2019-12-04 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置 |
| US10395883B2 (en) * | 2016-03-31 | 2019-08-27 | Intel Corporation | Aperture size modulation to enhance ebeam patterning resolution |
| IL272370B2 (en) | 2017-08-08 | 2024-10-01 | Asml Netherlands Bv | Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus |
| KR20230141901A (ko) | 2018-06-12 | 2023-10-10 | 에이에스엠엘 네델란즈 비.브이. | 다중 빔 검사 장치를 사용하여 샘플을 스캐닝하기 위한 시스템 및 방법 |
| US10593509B2 (en) | 2018-07-17 | 2020-03-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| US10483080B1 (en) * | 2018-07-17 | 2019-11-19 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device |
| EP3834222A1 (en) | 2018-08-09 | 2021-06-16 | ASML Netherlands B.V. | An apparatus for multiple charged-particle beams |
| JP7234052B2 (ja) | 2019-06-28 | 2023-03-07 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム画像取得装置及びマルチ電子ビーム画像取得方法 |
| US11309163B2 (en) * | 2019-11-07 | 2022-04-19 | Applied Materials, Inc. | Multibeamlet charged particle device and method |
| CN115053320B (zh) * | 2020-02-04 | 2025-08-12 | 卡尔蔡司MultiSEM有限责任公司 | 多光束数字扫描以及图像获取 |
| KR102839877B1 (ko) * | 2020-03-05 | 2025-07-29 | 에이에스엠엘 네델란즈 비.브이. | 멀티-빔 검사 시스템을 위한 빔 어레이 지오메트리 옵티마이저 |
| JP2022034866A (ja) * | 2020-08-19 | 2022-03-04 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム検査装置及びその調整方法 |
| WO2022048896A1 (en) | 2020-09-03 | 2022-03-10 | Asml Netherlands B.V. | Multi-beam charged particle column |
| EP3982392A1 (en) | 2020-10-08 | 2022-04-13 | ASML Netherlands B.V. | Multi-beam charged particle column |
| IL303577A (en) * | 2020-12-14 | 2023-08-01 | Asml Netherlands Bv | Charged particle system, a sample processing method using multiple beams of charged particles |
| US20250343024A1 (en) * | 2021-11-09 | 2025-11-06 | Photo Electron Soul Inc. | Electron gun, electron beam application device, and method for forming multi-electron beam |
| JP7080533B1 (ja) | 2021-11-09 | 2022-06-06 | 株式会社Photo electron Soul | 電子銃、電子線適用装置およびマルチ電子ビームの形成方法 |
| EP4202970A1 (en) * | 2021-12-24 | 2023-06-28 | ASML Netherlands B.V. | Alignment determination method and computer program |
| EP4511860A1 (en) | 2022-04-18 | 2025-02-26 | ASML Netherlands B.V. | Charged particle optical device and method |
| EP4280252A1 (en) | 2022-05-16 | 2023-11-22 | ASML Netherlands B.V. | Charged particle optical device and method |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0736323B2 (ja) * | 1983-08-15 | 1995-04-19 | アプライド マテリアルズ インコーポレーテッド | イオン打込み装置 |
| US5369282A (en) * | 1992-08-03 | 1994-11-29 | Fujitsu Limited | Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput |
| EP2302460A3 (en) | 2002-10-25 | 2011-04-06 | Mapper Lithography Ip B.V. | Lithography system |
| KR101077098B1 (ko) | 2002-10-30 | 2011-10-26 | 마퍼 리쏘그라피 아이피 비.브이. | 전자 빔 노출 시스템 |
| CN1759465B (zh) | 2003-03-10 | 2010-06-16 | 迈普尔平版印刷Ip有限公司 | 用于产生多个小波束的装置 |
| EP1830384B1 (en) | 2003-05-28 | 2011-09-14 | Mapper Lithography Ip B.V. | Charged particle beamlet exposure system |
| DE602004010824T2 (de) | 2003-07-30 | 2008-12-24 | Mapper Lithography Ip B.V. | Modulator-schaltkreise |
| GB2414111B (en) * | 2004-04-30 | 2010-01-27 | Ims Nanofabrication Gmbh | Advanced pattern definition for particle-beam processing |
| GB2413694A (en) * | 2004-04-30 | 2005-11-02 | Ims Nanofabrication Gmbh | Particle-beam exposure apparatus |
| US7391033B1 (en) | 2005-05-04 | 2008-06-24 | Kla-Tencor Technologies Corporation | Skew-oriented multiple electron beam apparatus and method |
| US8890095B2 (en) | 2005-07-25 | 2014-11-18 | Mapper Lithography Ip B.V. | Reliability in a maskless lithography system |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
| WO2007048433A1 (en) * | 2005-10-28 | 2007-05-03 | Carl Zeiss Sms Gmbh | Charged particle beam exposure system |
| TWI432908B (zh) | 2006-03-10 | 2014-04-01 | Mapper Lithography Ip Bv | 微影系統及投射方法 |
| US8258484B2 (en) * | 2008-04-15 | 2012-09-04 | Mapper Lithography Ip B.V. | Beamlet blanker arrangement |
| CN102113083B (zh) * | 2008-06-04 | 2016-04-06 | 迈普尔平版印刷Ip有限公司 | 对目标进行曝光的方法和系统 |
| NL1037639C2 (en) * | 2010-01-21 | 2011-07-25 | Mapper Lithography Ip Bv | Lithography system with lens rotation. |
| CN103238202B (zh) * | 2010-09-28 | 2016-11-09 | 以色列实用材料有限公司 | 粒子光学系统及布置，以及用于这种系统及布置的粒子光学组件 |
| JP5744564B2 (ja) * | 2011-02-25 | 2015-07-08 | キヤノン株式会社 | 描画装置、描画方法、および、物品の製造方法 |
| JP2013069813A (ja) * | 2011-09-21 | 2013-04-18 | Canon Inc | 描画装置、および、物品の製造方法 |
| JP6128744B2 (ja) * | 2012-04-04 | 2017-05-17 | キヤノン株式会社 | 描画装置、描画方法、および、物品の製造方法 |
| JP6087570B2 (ja) * | 2012-10-15 | 2017-03-01 | キヤノン株式会社 | 描画装置、および物品の製造方法 |
| EP2937888B1 (en) * | 2014-04-25 | 2019-02-20 | IMS Nanofabrication GmbH | Multi-beam tool for cutting patterns |
-
2013
- 2013-05-06 NL NL2010760A patent/NL2010760C2/en active
-
2014
- 2014-05-05 EP EP14720984.5A patent/EP3020062B1/en active Active
- 2014-05-05 US US14/787,775 patent/US9934943B2/en not_active Ceased
- 2014-05-05 US US16/838,976 patent/USRE49952E1/en active Active
- 2014-05-05 WO PCT/EP2014/059106 patent/WO2014177718A1/en not_active Ceased
- 2014-05-05 JP JP2016511103A patent/JP6377724B2/ja active Active
- 2014-05-05 EP EP19214148.9A patent/EP3651183B1/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016522572A5 (cg-RX-API-DMAC7.html) | ||
| JP6377724B2 (ja) | ビームグリッドレイアウト | |
| JP5977941B2 (ja) | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 | |
| KR101483543B1 (ko) | 멀티 하전 입자빔 묘화 장치 및 멀티 하전 입자빔 묘화 방법 | |
| US9299535B2 (en) | Multi charged particle beam writing apparatus | |
| TWI684072B (zh) | 多帶電粒子束描繪裝置及多帶電粒子束描繪方法 | |
| US10134562B2 (en) | Multi charged particle beam writing apparatus, and multi charged particle beam writing method | |
| KR101698890B1 (ko) | 멀티 하전 입자빔의 블랭킹 장치 및 멀티 하전 입자빔 묘화 장치 | |
| JP2012178437A5 (cg-RX-API-DMAC7.html) | ||
| KR102093809B1 (ko) | 멀티 하전 입자 빔 묘화 장치 및 멀티 하전 입자 빔 묘화 방법 | |
| KR101698892B1 (ko) | 데이터 생성 장치, 에너지빔 묘화 장치, 및 에너지빔 묘화 방법 | |
| TWI655514B (zh) | Multi-charged particle beam drawing device and multi-charged particle beam drawing method | |
| JP2019114748A (ja) | マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置 | |
| US9691585B2 (en) | Multi charged particle beam writing method, and multi charged particle beam writing apparatus | |
| DE602005016256D1 (de) | Belichtungssystem mit einem geladenen teilchenstrahl | |
| JP2013069813A (ja) | 描画装置、および、物品の製造方法 | |
| JP2013128031A (ja) | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 | |
| JP2020514996A5 (cg-RX-API-DMAC7.html) | ||
| Eder-Kapl et al. | Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator | |
| IL309679A (en) | Charged particle device and method | |
| US9001387B2 (en) | Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules | |
| JP5709465B2 (ja) | 描画装置、および、物品の製造方法 | |
| JP2012099568A5 (cg-RX-API-DMAC7.html) | ||
| KR20190069931A (ko) | 전자빔 장치의 어퍼처 시스템, 전자빔 노광 장치 및 전자빔 노광 장치 시스템 | |
| JPWO2021132401A5 (cg-RX-API-DMAC7.html) |