JP2016510363A5 - - Google Patents

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Publication number
JP2016510363A5
JP2016510363A5 JP2015557463A JP2015557463A JP2016510363A5 JP 2016510363 A5 JP2016510363 A5 JP 2016510363A5 JP 2015557463 A JP2015557463 A JP 2015557463A JP 2015557463 A JP2015557463 A JP 2015557463A JP 2016510363 A5 JP2016510363 A5 JP 2016510363A5
Authority
JP
Japan
Prior art keywords
mgo
zno
sputtering target
less
target according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2015557463A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016510363A (ja
Filing date
Publication date
Priority claimed from EP13155587.2A external-priority patent/EP2767610B1/en
Application filed filed Critical
Publication of JP2016510363A publication Critical patent/JP2016510363A/ja
Publication of JP2016510363A5 publication Critical patent/JP2016510363A5/ja
Withdrawn legal-status Critical Current

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JP2015557463A 2013-02-18 2014-02-18 ＺｎＯ−Ａｌ２Ｏ３−ＭｇＯスパッタリングターゲット及びその製造方法 Withdrawn JP2016510363A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13155587.2 2013-02-18
EP13155587.2A EP2767610B1 (en) 2013-02-18 2013-02-18 ZnO-Al2O3-MgO sputtering target and method for the production thereof
PCT/EP2014/053128 WO2014125122A1 (en) 2013-02-18 2014-02-18 Zno-al2o3-mgo sputtering target and method for the production thereof

Publications (2)

Publication Number Publication Date
JP2016510363A JP2016510363A (ja) 2016-04-07
JP2016510363A5 true JP2016510363A5 (enExample) 2017-01-12

Family

ID=47739126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015557463A Withdrawn JP2016510363A (ja) 2013-02-18 2014-02-18 ＺｎＯ−Ａｌ２Ｏ３−ＭｇＯスパッタリングターゲット及びその製造方法

Country Status (4)

Country Link
EP (1) EP2767610B1 (enExample)
JP (1) JP2016510363A (enExample)
CN (1) CN105008579B (enExample)
WO (1) WO2014125122A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106187100B (zh) * 2015-05-04 2019-02-12 清华大学 溅射靶及其制备方法
CN108559959A (zh) * 2018-01-12 2018-09-21 基迈克材料科技（苏州）有限公司 复合金属氧化物靶材材料、靶材及靶材材料、靶材的制备方法
CN109133910B (zh) * 2018-09-13 2021-07-20 先导薄膜材料（广东）有限公司 Zmo靶材的生产方法
EP3875443A4 (en) * 2018-10-31 2022-08-03 Idemitsu Kosan Co., Ltd. SINTERED BODY
EP3992168A4 (en) * 2019-06-27 2023-08-02 Idemitsu Kosan Co.,Ltd. Oxide sintered body
CN113073302B (zh) * 2021-04-09 2023-02-14 基迈克材料科技（苏州）有限公司 Zmo靶材及其制备方法
CN114477994A (zh) * 2022-01-25 2022-05-13 广东爱晟电子科技有限公司 一种大功率陶瓷芯片电阻及其材料和制备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1887100B1 (en) 2005-05-30 2011-05-11 Nippon Mining & Metals Co., Ltd. Sputtering target and process for producing the same
US20070071985A1 (en) * 2005-09-29 2007-03-29 Prabhat Kumar Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
WO2007141994A1 (ja) * 2006-06-08 2007-12-13 Sumitomo Metal Mining Co., Ltd. 酸化物焼結体、ターゲット、およびそれを用いて得られる透明導電膜、並びに透明導電性基材
JP5665870B2 (ja) * 2009-08-27 2015-02-04 アモテック・カンパニー・リミテッド ＺｎＯ系バリスタ組成物
KR20120094013A (ko) * 2009-11-13 2012-08-23 가부시키가이샤 한도오따이 에네루기 켄큐쇼 스퍼터링 타겟 및 그 제조방법, 및 트랜지스터
EP2514851B1 (en) * 2009-12-16 2015-04-15 Mitsubishi Materials Corporation Transparent conductive film, solar cell using same, sputtering target for forming said transparent conductive film, and manufacturing method therefor

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