JP2016507645A5 - - Google Patents

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Publication number
JP2016507645A5
JP2016507645A5 JP2015548616A JP2015548616A JP2016507645A5 JP 2016507645 A5 JP2016507645 A5 JP 2016507645A5 JP 2015548616 A JP2015548616 A JP 2015548616A JP 2015548616 A JP2015548616 A JP 2015548616A JP 2016507645 A5 JP2016507645 A5 JP 2016507645A5
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JP
Japan
Prior art keywords
distribution showerhead
substrate
dielectric material
showerhead
vapor distribution
Prior art date
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Application number
JP2015548616A
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English (en)
Japanese (ja)
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JP2016507645A (ja
JP6456841B2 (ja
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Publication date
Priority claimed from EP12198692.1A external-priority patent/EP2747122B1/en
Application filed filed Critical
Publication of JP2016507645A publication Critical patent/JP2016507645A/ja
Publication of JP2016507645A5 publication Critical patent/JP2016507645A5/ja
Application granted granted Critical
Publication of JP6456841B2 publication Critical patent/JP6456841B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015548616A 2012-12-20 2013-12-20 誘電体材料蒸発のためのプラズマ強化堆積設備、堆積装置及びその操作方法 Expired - Fee Related JP6456841B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12198692.1A EP2747122B1 (en) 2012-12-20 2012-12-20 Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof
EP12198692.1 2012-12-20
PCT/EP2013/077575 WO2014096303A1 (en) 2012-12-20 2013-12-20 Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof

Publications (3)

Publication Number Publication Date
JP2016507645A JP2016507645A (ja) 2016-03-10
JP2016507645A5 true JP2016507645A5 (enExample) 2017-02-09
JP6456841B2 JP6456841B2 (ja) 2019-01-23

Family

ID=47632733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015548616A Expired - Fee Related JP6456841B2 (ja) 2012-12-20 2013-12-20 誘電体材料蒸発のためのプラズマ強化堆積設備、堆積装置及びその操作方法

Country Status (7)

Country Link
US (1) US20150284841A1 (enExample)
EP (1) EP2747122B1 (enExample)
JP (1) JP6456841B2 (enExample)
KR (1) KR20150099577A (enExample)
CN (1) CN104838467B (enExample)
TW (1) TWI607102B (enExample)
WO (1) WO2014096303A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105449216B (zh) * 2015-11-18 2018-10-23 何整风 一种锂电池
CN112458404A (zh) * 2016-05-10 2021-03-09 应用材料公司 操作沉积设备的方法和沉积设备
WO2017198297A1 (en) * 2016-05-18 2017-11-23 Applied Materials, Inc. Apparatus and method for transportation of a deposition source
EP3374540A1 (en) * 2017-01-31 2018-09-19 Applied Materials, Inc. Material deposition arrangement, vacuum deposition system and method therefor
WO2020251696A1 (en) 2019-06-10 2020-12-17 Applied Materials, Inc. Processing system for forming layers
CN119800292B (zh) * 2024-12-20 2025-06-17 合肥致真精密设备有限公司 一种电子束蒸发镀膜设备及其应用方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
JP2001200361A (ja) * 2000-01-19 2001-07-24 Mitsubishi Heavy Ind Ltd 高温真空蒸着装置における観測装置
WO2001090438A1 (en) * 2000-05-23 2001-11-29 University Of Virginia Patent Foundation A process and apparatus for plasma activated deposition in a vacuum
US20030045098A1 (en) * 2001-08-31 2003-03-06 Applied Materials, Inc. Method and apparatus for processing a wafer
JP4013859B2 (ja) * 2003-07-17 2007-11-28 富士電機ホールディングス株式会社 有機薄膜の製造装置
WO2009023744A1 (en) * 2007-08-13 2009-02-19 University Of Virginia Patent Foundation Thin film battery synthesis by directed vapor deposition
EP2128303B1 (en) * 2008-05-30 2013-03-13 Applied Materials, Inc. Arrangement for coating a substrate
US20100267191A1 (en) * 2009-04-20 2010-10-21 Applied Materials, Inc. Plasma enhanced thermal evaporator
CN103385035B (zh) * 2011-03-14 2016-02-17 夏普株式会社 蒸镀颗粒射出装置和蒸镀装置以及蒸镀方法
US9130238B2 (en) * 2011-06-10 2015-09-08 Applied Materials, Inc. Methods of and hybrid factories for thin-film battery manufacturing

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