JP2016216331A5 - - Google Patents
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- Publication number
- JP2016216331A5 JP2016216331A5 JP2015106564A JP2015106564A JP2016216331A5 JP 2016216331 A5 JP2016216331 A5 JP 2016216331A5 JP 2015106564 A JP2015106564 A JP 2015106564A JP 2015106564 A JP2015106564 A JP 2015106564A JP 2016216331 A5 JP2016216331 A5 JP 2016216331A5
- Authority
- JP
- Japan
- Prior art keywords
- yttrium oxide
- oxide film
- resistant
- plasma
- film according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 24
- 230000007797 corrosion Effects 0.000 claims description 10
- 238000005260 corrosion Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 239000010410 layer Substances 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015106564A JP6876892B2 (ja) | 2015-05-26 | 2015-05-26 | 酸化イットリウム膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015106564A JP6876892B2 (ja) | 2015-05-26 | 2015-05-26 | 酸化イットリウム膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016216331A JP2016216331A (ja) | 2016-12-22 |
| JP2016216331A5 true JP2016216331A5 (enExample) | 2018-07-12 |
| JP6876892B2 JP6876892B2 (ja) | 2021-05-26 |
Family
ID=57580167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015106564A Active JP6876892B2 (ja) | 2015-05-26 | 2015-05-26 | 酸化イットリウム膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6876892B2 (enExample) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4895574B2 (ja) * | 2005-11-02 | 2012-03-14 | シャープ株式会社 | 波長変換部材及び発光装置 |
| JP2008274374A (ja) * | 2007-05-02 | 2008-11-13 | Seiko Epson Corp | 成膜装置および成膜方法 |
| JP2009287058A (ja) * | 2008-05-27 | 2009-12-10 | Hakumaku Process:Kk | 直流反応性対向ターゲット方式スパッタリング成膜方法、その成膜方法によって形成される純イットリア耐食膜、及び耐食性石英構成体 |
| JP2010070854A (ja) * | 2008-08-20 | 2010-04-02 | Kyocera Corp | 耐食性部材およびこれを用いた半導体製造装置 |
-
2015
- 2015-05-26 JP JP2015106564A patent/JP6876892B2/ja active Active
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