JP2016212009A5 - - Google Patents
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- Publication number
- JP2016212009A5 JP2016212009A5 JP2015097366A JP2015097366A JP2016212009A5 JP 2016212009 A5 JP2016212009 A5 JP 2016212009A5 JP 2015097366 A JP2015097366 A JP 2015097366A JP 2015097366 A JP2015097366 A JP 2015097366A JP 2016212009 A5 JP2016212009 A5 JP 2016212009A5
- Authority
- JP
- Japan
- Prior art keywords
- nitride film
- silicon nitride
- component
- transmittance
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015097366A JP6414801B2 (ja) | 2015-05-12 | 2015-05-12 | 欠陥検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015097366A JP6414801B2 (ja) | 2015-05-12 | 2015-05-12 | 欠陥検査方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016212009A JP2016212009A (ja) | 2016-12-15 |
| JP2016212009A5 true JP2016212009A5 (https=) | 2017-06-29 |
| JP6414801B2 JP6414801B2 (ja) | 2018-10-31 |
Family
ID=57551613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015097366A Active JP6414801B2 (ja) | 2015-05-12 | 2015-05-12 | 欠陥検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6414801B2 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019049387A1 (ja) * | 2017-09-11 | 2019-03-14 | 株式会社日立ハイテクノロジーズ | 欠陥分類装置、検査装置、および検査システム |
| CN108010863B (zh) * | 2017-12-07 | 2021-10-01 | 武汉新芯集成电路制造有限公司 | 凹陷缺陷的检测方法以及用于检测凹陷缺陷的晶圆 |
| KR102060084B1 (ko) * | 2018-01-22 | 2019-12-30 | 에스케이실트론 주식회사 | 웨이퍼의 결함 측정 방법 |
| CN109059812B (zh) * | 2018-09-11 | 2020-11-24 | 太原理工大学 | 一种精确测量曲面上多层微纳米薄膜厚度的方法 |
| JP7103211B2 (ja) | 2018-12-27 | 2022-07-20 | 株式会社Sumco | 半導体ウェーハの評価方法および製造方法ならびに半導体ウェーハの製造工程管理方法 |
| US12345658B2 (en) | 2020-09-24 | 2025-07-01 | Kla Corporation | Large-particle monitoring with laser power control for defect inspection |
| JP7567747B2 (ja) * | 2021-10-19 | 2024-10-16 | 信越半導体株式会社 | シリコン単結晶ウェーハの欠陥の種類の特定方法 |
| KR102728792B1 (ko) * | 2022-02-15 | 2024-11-11 | 에스케이실트론 주식회사 | 실리콘 웨이퍼의 미세 입자 결함의 판단 방법 |
| JP7711657B2 (ja) | 2022-08-04 | 2025-07-23 | 株式会社Sumco | 半導体ウェーハの評価方法及び半導体ウェーハの製造方法 |
| JP7771899B2 (ja) * | 2022-09-05 | 2025-11-18 | 株式会社Sumco | 半導体ウェーハの評価方法、半導体ウェーハの製造方法及び半導体ウェーハ |
| CN115732350A (zh) * | 2022-11-22 | 2023-03-03 | 上海华虹宏力半导体制造有限公司 | 微缺陷测量结构及其形成方法 |
| CN116130377B (zh) * | 2023-04-17 | 2023-09-29 | 西安奕斯伟材料科技股份有限公司 | 外延晶圆的缺陷检测方法、装置、系统及其制造方法 |
| JP2025153297A (ja) * | 2024-03-29 | 2025-10-10 | 株式会社Sumco | 半導体ウェーハの評価方法および半導体ウェーハの製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6473203A (en) * | 1987-09-14 | 1989-03-17 | Oki Electric Ind Co Ltd | Inspection of surface foreign matter |
| JPH06252230A (ja) * | 1993-02-24 | 1994-09-09 | Hitachi Ltd | 欠陥検査方法および装置 |
-
2015
- 2015-05-12 JP JP2015097366A patent/JP6414801B2/ja active Active
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