JP2016204522A - Prepreg and manufacturing method therefor, printed wire board and manufacturing method therefor - Google Patents

Prepreg and manufacturing method therefor, printed wire board and manufacturing method therefor Download PDF

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JP2016204522A
JP2016204522A JP2015087945A JP2015087945A JP2016204522A JP 2016204522 A JP2016204522 A JP 2016204522A JP 2015087945 A JP2015087945 A JP 2015087945A JP 2015087945 A JP2015087945 A JP 2015087945A JP 2016204522 A JP2016204522 A JP 2016204522A
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prepreg
filler
drying
applying
varnish
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公冶 福島
Kimiya Fukushima
公冶 福島
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Kyocera Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a prepreg having high rigidity and high insulation property without insulation deterioration by getting long term reliability and a manufacturing method therefor, a printed wire board using the prepreg and a manufacturing method therefor.SOLUTION: There is provided a printed wire board 100 that comprises a first prepreg 10 forming a filler-containing resin layer 3 in a semi-cured condition by impregnating an insulation cloth material 1 with varnish containing no filler and applying varnish containing the filler to both surfaces of a dried prepreg intermediate 2 and drying it, a circuit part containing a via hole 6 formed on at least one surface of the first prepreg 10, and a second prepreg 11 manufactured by applying varnish containing the filler to one surface of the prepreg intermediate 2 and drying it to form the filler-containing resin layer 3 in the semi-cured condition and applying varnish containing no filler to another surface and drying it to form a filler-non-containing resin layer 4 in the semi-cured condition, where the surface of the filler-non-containing resin layer 4 of the second prepreg 11 is laid so as to contact a blacking processing surface 61 of the circuit part of a core layer 10'.SELECTED DRAWING: Figure 2

Description

本発明は、プリプレグおよびその製造方法ならびに印刷配線板およびその製造方法に関する。   The present invention relates to a prepreg and a manufacturing method thereof, a printed wiring board and a manufacturing method thereof.

従来、電子機器の小型化・薄型化に伴い、これに用いられるモバイル用端末印刷配線板などの層間厚の薄化(20μm〜40μmなど)が進んでいるが、層間の薄化により、材料剛性が低くなり、製造上不具合(製造ラインにおける折れ、詰まりなど)や印刷配線板完成後の部品実装ができないなどの問題が生じている。
この問題を解決するために、印刷配線板の樹脂層内にフィラー(充填剤)を混ぜ込む手法が、材料メーカーで取り入れられている。
例えば、引用文献1には、印刷配線板(銅張積層板)の樹脂層に、めっき銅層と良好に接着する性質を有するものや、ポリイミド樹脂を含むものなどを用い、これに充填剤(各種有機フィラー、無機フィラー)などを添加することが記載されている。
また、引用文献2には、基材に繊維布を使用し、これに絶縁性無機充填剤(無機フィラー)を10〜79重量%配合した熱硬化性樹脂組成物を含浸、乾燥させたプリプレグの両側に、絶縁性無機充填剤を80〜99重量%熱硬化性樹脂中に配合した熱硬化性樹脂組成物を熱可塑性フィルムの片面に付着させ、これを前記プリプレグの両面に配置して、加熱・付着させて作成したプリプレグが記載されている。
Conventionally, with the miniaturization and thinning of electronic devices, the thickness of the interlayers (20 μm to 40 μm, etc.) of mobile terminal printed wiring boards used for this has progressed. However, there are problems such as manufacturing defects (breaking, clogging, etc. in the manufacturing line) and component mounting after completion of the printed wiring board.
In order to solve this problem, a method in which a filler (filler) is mixed in a resin layer of a printed wiring board has been adopted by material manufacturers.
For example, in Cited Document 1, a resin layer of a printed wiring board (copper-clad laminate) having a property of adhering well to a plated copper layer, or containing a polyimide resin is used as a filler ( The addition of various organic fillers and inorganic fillers) is described.
Further, in Cited Document 2, a prepreg impregnated and dried with a thermosetting resin composition containing 10 to 79% by weight of an insulating inorganic filler (inorganic filler) using a fiber cloth as a base material. On both sides, a thermosetting resin composition in which an insulating inorganic filler is blended in a thermosetting resin of 80 to 99% by weight is attached to one side of a thermoplastic film, which is disposed on both sides of the prepreg and heated. -The prepreg made by adhering is described.

しかしながら、これらの印刷配線板は、樹脂層内に含まれるフィラーの影響で、従来同様の長期信頼性が得られないことや、絶縁劣化に繋がるという問題が発生している。
長期信頼性が得られない理由としては、積層板作成における積層成形時に、フィラーが溶融樹脂の流れの障害となるためである。これは、プリプレグを形成する絶縁性布材間の樹脂に含まれるフィラーが、絶縁性布材に対する樹脂の含浸を阻害して、樹脂と絶縁性布材間に空隙が発生することにより、樹脂内の水分で短絡が発生しやすくなることが原因となっていた。
However, these printed wiring boards have problems in that long-term reliability similar to that of the prior art cannot be obtained and insulation deterioration is caused by the influence of the filler contained in the resin layer.
The reason why long-term reliability cannot be obtained is that the filler becomes an obstacle to the flow of the molten resin during the lamination molding in the production of the laminated board. This is because the filler contained in the resin between the insulating cloth materials forming the prepreg inhibits the impregnation of the resin with the insulating cloth material, and voids are generated between the resin and the insulating cloth material. This is because short circuit is likely to occur due to moisture.

絶縁劣化に繋がる理由としては、積層板作成時に、フィラーが樹脂層と銅回路の密着を向上させる処理である黒化処理面がフィラーによって削られ、削られた黒化処理面の酸化銅が樹脂流れによって、プリプレグ内および銅回路と同一面の銅回路が無い部分に拡散するためである。   The reason for the deterioration of insulation is that the blackened surface, which is a process that improves the adhesion between the resin layer and the copper circuit, is scraped by the filler when the laminate is created, and the copper oxide on the blackened surface is the resin. This is because the flow diffuses in the prepreg and in a portion where there is no copper circuit on the same plane as the copper circuit.

特開2006−324654号公報JP 2006-324654 A 特開2002−265644号公報JP 2002-265644 A

本発明の課題は、長期信頼性を得て絶縁劣化しない、高剛性および高絶縁性を有するプリプレグおよびその製造方法を提供することである。
また、本発明の別の課題は、高剛性および高絶縁性を有するプリプレグを用いた印刷配線板およびその製造方法を提供することである。
An object of the present invention is to provide a prepreg having a high rigidity and a high insulating property that has long-term reliability and does not deteriorate in insulation, and a method for manufacturing the same.
Moreover, another subject of this invention is providing the printed wiring board using the prepreg which has high rigidity and high insulation, and its manufacturing method.

本発明は、上記課題を解決するべく完成されたものであって、以下の構成からなる。
(1)フィラーを含まないワニスを絶縁性布材に含浸させ乾燥して得られたプリプレグ中間体の少なくとも一方の面にフィラーを含むワニスを塗布し乾燥させたことを特徴とするプリプレグ。
(2)フィラーを含まないワニスを絶縁性布材に含浸させ乾燥したプリプレグ中間体の一方の面にフィラーを含むワニスを塗布し乾燥させ、他方の面にフィラーを含まないワニスを塗布し乾燥させたことを特徴とするプリプレグ。
(3)前記フィラーがシリカまたは水酸化アルミニウムである(1)または(2)に記載のプリプレグ。
(4)前記絶縁性布材が、ガラス繊維である(1)〜(3)のいずれかに記載のプリプレグ。
(5)第1のプリプレグと、この第1のプリプレグの少なくとも一方の面に形成した回路部とからなるコア層と、このコア層の回路部に積層した第2のプリプレグとを備えた印刷配線板であって、第1のプリプレグが、フィラーを含まないワニスを含浸させ、乾燥して得られた第1のプリプレグ中間体の両面にフィラーを含むワニスを塗布し乾燥させて形成したものであり、第2のプリプレグが、フィラーを含まないワニスを含浸させ、乾燥して得られた第2のプリプレグ中間体の一方の面にフィラーを含むワニスを塗布し乾燥させ、他方の面にフィラーを含まないワニスを塗布し乾燥させて形成したものであり、前記第2のプリプレグが、フィラーを含有しないワニス塗布面を前記コア層の回路部の黒化処理面に接するように積層したことを特徴とする印刷配線板。
(6)前記第2のプリプレグに、前記回路部と電気的に接続されるビアホールが設けられた(5)に記載の印刷配線板。
(7)前記コア層および第2のプリプレグを貫通するスルーホールが設けられた(5)または(6)に記載の印刷配線板。
(8)絶縁性布材にフィラーを含まないワニスを塗布または含浸させ乾燥させてプリプレグ中間体を形成する工程と、前記プリプレグ中間体の少なくとも一方の面にフィラーを含むワニスを塗布し、乾燥させる工程と、を含むことを特徴とするプリプレグの製造方法。
(9)絶縁性布材にフィラーを含まないワニスを塗布または含浸させ乾燥させてプリプレグ中間体を形成する工程と、前記プリプレグ中間体の一方の面にフィラーを含むワニスを塗布し、乾燥させる工程と、前記プリプレグ中間体の他方の面にフィラーを含まないワニスを塗布し、乾燥させる工程と、を含むことを特徴とするプリプレグの製造方法。
(10)絶縁性布材にフィラーを含まないワニスを塗布または含浸させ、乾燥させてプリプレグ中間体を形成する工程と、前記プリプレグ中間体の両面に、フィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成した第1のプリプレグからなるコア材を形成する工程と、前記第1のプリプレグの少なくとも一方の面に設けた銅箔に、めっき処理をした後、エッチングにて回路部としたコア層を形成する工程と、前記プリプレグ中間体の一方の面にフィラーを含むワニスを塗布し、乾燥させて硬化状態のフィラー含有樹脂層を形成し、他方の面にフィラーを含まないワニスを塗布し、乾燥させて半硬化状態のフィラー非含有樹脂層を形成した第2のプリプレグを形成する工程と、前記第2のプリプレグを、フィラー非含有樹脂層の面が、前記コア層の回路部の黒化処理面に接するように積層する工程と、を含むことを特徴とする印刷配線板の製造方法。
The present invention has been completed in order to solve the above problems, and has the following configuration.
(1) A prepreg characterized by applying a varnish containing a filler to at least one surface of a prepreg intermediate obtained by impregnating an insulating cloth material with a varnish not containing a filler and drying it.
(2) An insulating cloth material impregnated with a varnish that does not contain a filler is dried by applying a varnish containing a filler to one side of a dried prepreg intermediate, and a varnish containing no filler is applied to the other side and dried. A prepreg characterized by that.
(3) The prepreg according to (1) or (2), wherein the filler is silica or aluminum hydroxide.
(4) The prepreg according to any one of (1) to (3), wherein the insulating cloth material is glass fiber.
(5) Printed wiring including a core layer including a first prepreg and a circuit portion formed on at least one surface of the first prepreg, and a second prepreg laminated on the circuit portion of the core layer. The first prepreg is a plate formed by impregnating a varnish containing no filler and applying and drying a varnish containing a filler on both sides of a first prepreg intermediate obtained by drying. The second prepreg is impregnated with a varnish that does not contain a filler, and dried by applying a varnish containing a filler to one side of the second prepreg intermediate obtained by drying, and containing the filler on the other side. The second prepreg was laminated so that the varnish-coated surface containing no filler was in contact with the blackened surface of the circuit portion of the core layer. Printed wiring board characterized.
(6) The printed wiring board according to (5), wherein a via hole that is electrically connected to the circuit unit is provided in the second prepreg.
(7) The printed wiring board according to (5) or (6), wherein a through hole penetrating the core layer and the second prepreg is provided.
(8) A step of applying or impregnating a varnish containing no filler to an insulating cloth material and drying it to form a prepreg intermediate, and applying and drying a varnish containing a filler on at least one surface of the prepreg intermediate. A process for producing a prepreg comprising the steps of:
(9) A step of applying or impregnating a varnish containing no filler to an insulating cloth material and drying it to form a prepreg intermediate, and a step of applying and drying a varnish containing a filler on one surface of the prepreg intermediate And a step of applying a varnish that does not contain a filler to the other surface of the prepreg intermediate and drying the prepreg intermediate.
(10) A step of applying or impregnating a varnish not containing a filler to an insulating cloth material and drying to form a prepreg intermediate, and applying a varnish containing a filler to both sides of the prepreg intermediate and drying A step of forming a core material composed of a first prepreg in which a filler-containing resin layer in a semi-cured state is formed, and a copper foil provided on at least one surface of the first prepreg is plated and then etched Forming a core layer as a circuit part, applying a varnish containing a filler to one surface of the prepreg intermediate, drying to form a cured filler-containing resin layer, and applying a filler to the other surface A step of forming a second prepreg in which a varnish not included is applied and dried to form a semi-cured filler-free resin layer, and the second prepreg is used as a filler Surface of the containing resin layer, a method of manufacturing a printed wiring board which comprises a laminating in contact with the blackened surface of the circuit portion of the core layer.

本発明によれば、ガラス繊維にフィラーを含まないワニスを含浸させ乾燥させたプリプレグを用いるので、絶縁性布材間に十分にワニスの含浸がなされ、積層成形時には絶縁性布材に対する溶融樹脂の流れを良好にすることができ、長期信頼性を有する基板を製造することができる。
また、プリプレグのフィラーを含まない樹脂を塗布した面を、黒化処理面に当たる側にして積層成形することにより、黒化処理面の酸化銅の拡散防止が可能となり、絶縁劣化を防止することができる。
According to the present invention, since a prepreg obtained by impregnating a glass fiber with a varnish not containing a filler and drying is used, the varnish is sufficiently impregnated between the insulating cloth materials. The flow can be improved, and a substrate having long-term reliability can be manufactured.
In addition, it is possible to prevent copper oxide from diffusing on the blackened surface by laminating the surface of the prepreg with a resin-free surface applied to the blackened surface, thereby preventing deterioration of insulation. it can.

(a)は本発明のプリプレグの一実施形態を示す説明図であり、(b)は別の実施形態を示す説明図である(A) is explanatory drawing which shows one Embodiment of the prepreg of this invention, (b) is explanatory drawing which shows another embodiment. 本発明に係る印刷配線板の一実施形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the printed wiring board which concerns on this invention. (a)〜(i)は、本発明に係る印刷配線板の製造方法の一実施形態を示す工程説明図である。(A)-(i) is process explanatory drawing which shows one Embodiment of the manufacturing method of the printed wiring board concerning this invention.

本発明の一実施形態である第1のプリプレグ10は、図1(a)に示すように、フィラーを含まないワニスを絶縁性布材1に塗布して含浸し、乾燥させたプリプレグ中間体2の両面にフィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層3を形成したものである。
また、本発明の別の実施形態である第2のプリプレグ11は、図1(b)に示すように、前記と同様にして得られたプリプレグ中間体2の一方の面にフィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層3を形成し、他方の面にフィラーを含まないワニスを塗布し、乾燥させて半硬化状態のフィラー非含有樹脂層4を形成したものである。
As shown in FIG. 1A, a first prepreg 10 according to an embodiment of the present invention is obtained by applying a varnish containing no filler to an insulating cloth material 1 and impregnating and drying the prepreg intermediate 2. A varnish containing a filler is applied to both sides of the resin and dried to form a semi-cured filler-containing resin layer 3.
Moreover, the 2nd prepreg 11 which is another embodiment of this invention is, as shown in FIG.1 (b), the varnish containing a filler on one surface of the prepreg intermediate body 2 obtained by carrying out similarly to the above. It is applied and dried to form a semi-cured filler-containing resin layer 3, and the other surface is coated with a filler-free varnish and dried to form a semi-cured filler-free resin layer 4. is there.

前記絶縁性布材1は、絶縁性を有する素材であり、後述する回路部(導体)を形成する導体材料(めっき)が通過しないように、隙間の無いものが好ましい。このような絶縁性を有する素材としては、例えば、ガラス繊維やガラス不織布などがよい。ガラス繊維としては、例えばガラス繊維から作られるHigh densityガラスクロス、高開織クロスなどが挙げられる。   The insulating cloth material 1 is a material having insulating properties, and preferably has no gap so that a conductor material (plating) forming a circuit portion (conductor) described later does not pass through. As a material having such an insulating property, for example, glass fiber or glass nonwoven fabric is preferable. Examples of the glass fiber include a high density glass cloth and a high weaving cloth made from glass fiber.

プリプレグ中間体2は、フィラーを含まないワニスを前記絶縁性布材1に塗布して含浸し、乾燥させて得られるものである。このワニスは、樹脂と溶剤とを含むものであり、絶縁性布材1に含浸または塗布し乾燥させることによって、プリプレグ中間体2の剛性を確保することができる。
このワニスは絶縁性布材1と同程度以下の厚みで塗布されるのが好ましい。
The prepreg intermediate 2 is obtained by applying a varnish containing no filler to the insulating cloth material 1, impregnating it, and drying it. This varnish contains a resin and a solvent, and the rigidity of the prepreg intermediate body 2 can be ensured by impregnating or coating the insulating cloth material 1 and drying it.
It is preferable that the varnish is applied with a thickness equal to or less than that of the insulating cloth material 1.

フィラー含有樹脂層3は、フィラーを含むワニスを、前記プリプレグ中間体2に塗布し、乾燥させて得られる半硬化状態の樹脂層であり、フィラー含有樹脂層3をプリプレグ中間体2の両面に形成すると第1のプリプレグ10となる。   The filler-containing resin layer 3 is a semi-cured resin layer obtained by applying a varnish containing a filler to the prepreg intermediate 2 and drying it. The filler-containing resin layer 3 is formed on both surfaces of the prepreg intermediate 2. Then, the first prepreg 10 is obtained.

フィラー非含有樹脂層4は、フィラーを含まないワニスを、前記プリプレグ中間体2に塗布し、乾燥させて得られる半硬化状態の樹脂層である。このフィラー非含有樹脂層4をプリプレグ中間体2の一方の面に形成し、プリプレグ中間体2の他方の面に前記フィラー含有樹脂層3を形成すると第2のプリプレグ11となる。   The filler-free resin layer 4 is a semi-cured resin layer obtained by applying a varnish containing no filler to the prepreg intermediate 2 and drying it. When the filler-free resin layer 4 is formed on one surface of the prepreg intermediate 2 and the filler-containing resin layer 3 is formed on the other surface of the prepreg intermediate 2, a second prepreg 11 is obtained.

前記ワニスに含まれるフィラーは、剛性を確保する効果を有し、有機フィラーまたは無機フィラーのどちらでもよいが、無機フィラーであるのがよい。この無機フィラーとしては、例えば、シリカ、アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸アルミニウム、チタン酸バリウム、チタン酸ストロンチウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、ジルコン酸カルシウムなどが挙げられ、これらの中でも溶融球状シリカ、または水酸化アルミニウムが特に好ましい。また、無機フィラーは1種又は2種以上を使用することができる。
樹脂に対するフィラー含有率は、例えば0より高く85vol%までとする。特に、複数の最適化した粒径のフィラーを使い分ける必要がなく、1種類の粒径のフィラーで実現できる74vol%までとすることが好ましい。
また、前記プリプレグ中間体2、フィラー含有樹脂層3およびフィラー非含有樹脂層4に使用されるワニスは、フィラーの含有の有無以外は同じ素材でもよく、このワニスに含まれる樹脂としては、例えば、フェノール樹脂やエポキシ樹脂などの熱硬化性樹脂、不飽和ポリエステル樹脂、メラミン樹脂、ポリイミド樹脂などが挙げられ、また溶剤としては、例えば、メタノール、エタノールなどのアルコール類、酢酸エチレンなどのエステル類、アセトンなどのケトン類、ヘキサンなどの炭化水素類などが挙げられる。
The filler contained in the varnish has an effect of ensuring rigidity and may be either an organic filler or an inorganic filler, but is preferably an inorganic filler. Examples of the inorganic filler include silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, barium titanate, Examples include strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate. Among these, fused spherical silica or aluminum hydroxide is particularly preferable. Moreover, 1 type, or 2 or more types can be used for an inorganic filler.
The filler content relative to the resin is, for example, higher than 0 and up to 85 vol%. In particular, it is not necessary to use a plurality of fillers having optimized particle diameters, and it is preferable to use up to 74 vol% that can be realized with one kind of filler having a particle diameter.
Further, the varnish used for the prepreg intermediate 2, the filler-containing resin layer 3 and the filler-free resin layer 4 may be the same material except for the presence or absence of filler, and examples of the resin contained in the varnish include: Examples include thermosetting resins such as phenol resins and epoxy resins, unsaturated polyester resins, melamine resins, and polyimide resins. Examples of solvents include alcohols such as methanol and ethanol, esters such as ethylene acetate, and acetone. And ketones such as hexane, and hydrocarbons such as hexane.

印刷配線板100は、図2に示すように、第1のプリプレグ10と、この第1のプリプレグ10の少なくとも一方の面に形成したビアホール6を含む回路部と、このビアホール6を含む回路部に積層した第2のプリプレグ11とからなる積層板であり、前記第2のプリプレグ11のフィラー非含有樹脂層4を、前記コア層10’のビアホール6を含む回路部の黒化処理面61に接するように積層したものである。また、第2のプリプレグ11は、積層形成時に、コア層10’のビアホール6を含む回路部の黒化処理面61とフィラー非含有樹脂層4とが接触するように用いられる。   As shown in FIG. 2, the printed wiring board 100 includes a first prepreg 10, a circuit unit including a via hole 6 formed on at least one surface of the first prepreg 10, and a circuit unit including the via hole 6. A laminated plate made of the laminated second prepreg 11, and the filler-free resin layer 4 of the second prepreg 11 is in contact with the blackened surface 61 of the circuit portion including the via hole 6 of the core layer 10 ′. Thus, they are laminated. Further, the second prepreg 11 is used so that the blackened surface 61 of the circuit portion including the via hole 6 of the core layer 10 ′ and the filler-free resin layer 4 are in contact with each other at the time of lamination.

コア層10’を構成するプリプレグは、コア層10’形成時に回路部の黒化処理面と接触することはないため、前記プリプレグ中間体2の両面にフィラー含有樹脂層3を形成した第1のプリプレグ10を用いる。   Since the prepreg constituting the core layer 10 ′ does not come into contact with the blackened surface of the circuit portion when the core layer 10 ′ is formed, the first prepreg in which the filler-containing resin layer 3 is formed on both surfaces of the prepreg intermediate 2. A prepreg 10 is used.

また、前記印刷配線板100は、コア層10’の両面に積層された第2のプリプレグ11に、導電性金属箔71と共に表層を形成する導体層7を備え、この導体層7を壁面に設けたビアホール5や、コア層10’と第2のプリプレグ11とを貫通するスルーホール8を有していてもよい。   The printed wiring board 100 includes a conductor layer 7 that forms a surface layer together with the conductive metal foil 71 on the second prepreg 11 laminated on both surfaces of the core layer 10 ′, and the conductor layer 7 is provided on the wall surface. Further, the via hole 5 or the through hole 8 penetrating the core layer 10 ′ and the second prepreg 11 may be provided.

ビアホール6は、ドリル加工またはレーザ加工によって前記コア層10’にビアホール下孔6aを形成し、このビアホール下孔6aにめっき処理して導体を設けて形成される。このレーザ加工で用いられるレーザ光としては、CO2レーザ、UV−YAGレーザなどが挙げられる。また、ビアホール6の直上と、印刷配線板表面のフィラー含有樹脂層3の上には導体層7がそれぞれ設けられ、第2のプリプレグ11のフィラー非含有樹脂層4と接するコア材10’上のビアホール6を含む回路部は、その表面が黒化処理面61となっている。
この黒化処理面61は、ビアホール6を含む回路部に第2のプリプレグ11を積層する際に、接着性を向上させるための前処理として、銅箔表面を酸化処理し、酸化銅皮膜を形成する黒化処理を行ったものである。
The via hole 6 is formed by forming a via hole lower hole 6a in the core layer 10 'by drilling or laser processing, and plating the via hole lower hole 6a to provide a conductor. Examples of laser light used in this laser processing include a CO 2 laser and a UV-YAG laser. Also, a conductor layer 7 is provided immediately above the via hole 6 and on the filler-containing resin layer 3 on the surface of the printed wiring board, and on the core material 10 ′ in contact with the filler-free resin layer 4 of the second prepreg 11. The surface of the circuit portion including the via hole 6 is a blackened surface 61.
This blackened surface 61 is formed by oxidizing the copper foil surface to form a copper oxide film as a pretreatment for improving adhesion when the second prepreg 11 is laminated on the circuit portion including the via hole 6. The blackening process is performed.

前記ビアホール6に形成される導体材料は、ビアホール6を後述するビアホール5や他の導体層と電気的に接続すれば特に制限はなく、例えば、導電性樹脂や金属めっき等が挙げられるが、銅めっきであるのが特に好ましい。また、ビアホール6は後述するビアホール5の導体層7と同様に、ビアホール下孔6aの内壁面に導体層60を設けているが、これに限らず、例えば導体層60をビアホール下孔6a内に充填したものであってもよい。   The conductor material formed in the via hole 6 is not particularly limited as long as the via hole 6 is electrically connected to the via hole 5 and other conductor layers described later, and examples thereof include conductive resin and metal plating. Particularly preferred is plating. In addition, the via hole 6 is provided with the conductor layer 60 on the inner wall surface of the via hole lower hole 6a in the same manner as the conductor layer 7 of the via hole 5 described later. However, the present invention is not limited to this, and for example, the conductor layer 60 is placed in the via hole lower hole 6a. It may be filled.

前記コア層10’および第2のプリプレグ11のフィラー含有樹脂層3の表面には、電解めっきのシード層として導電性金属箔71が積層される。導電性金属箔71としては、電気的に接続されるならば特に制限されないが、例えば、銅箔または薄銅箔であるのが好ましい。   On the surface of the core layer 10 ′ and the filler-containing resin layer 3 of the second prepreg 11, a conductive metal foil 71 is laminated as a seed layer for electrolytic plating. The conductive metal foil 71 is not particularly limited as long as it is electrically connected, but is preferably a copper foil or a thin copper foil, for example.

第2のプリプレグ11にはビアホール5を設けてもよい。このビアホール5は、後述するビアホール下穴5aの内壁面に金属めっき(例えば、銅めっき)からなる導体が形成されたものであり、第2のプリプレグ11の上下面に設けた導体層7を通して、コア層10’のビアホール6と電気的に接続される。   A via hole 5 may be provided in the second prepreg 11. This via hole 5 is formed by forming a conductor made of metal plating (for example, copper plating) on an inner wall surface of a via hole prepared hole 5a described later, and through a conductor layer 7 provided on the upper and lower surfaces of the second prepreg 11, It is electrically connected to the via hole 6 of the core layer 10 ′.

また、印刷配線板100には、コア層10’と両面の第2のプリプレグ11とを貫通するスルーホール8を設けてもよい。このスルーホール8は、後述するスルーホール下孔8aの内壁面に金属めっき(例えば、銅めっき)からなる導体が形成されたものであり、絶縁樹脂板100の表裏面にある図示しない配線パターンに接続される。   Further, the printed wiring board 100 may be provided with a through hole 8 penetrating the core layer 10 ′ and the second prepreg 11 on both sides. The through-hole 8 is formed by forming a conductor made of metal plating (for example, copper plating) on the inner wall surface of a through-hole lower hole 8a, which will be described later, and a wiring pattern (not shown) on the front and back surfaces of the insulating resin plate 100. Connected.

図2に示す印刷配線板100では、コア層10’ の上下面に第2のプリプレグ11が1層ずつ積層されているが、1層に限定されず、例えば、第2のプリプレグ11を複数交互に積層させて多層のビルドアップ層としてもよい。この場合、積層した第2のプリプレグ11にビアホール5が形成されて電気的に接続される。さらに、ビルドアップ印刷配線板に限らず、通常の多層印刷配線板、貼り合わせ多層印刷配線板、多重多層印刷配線板などに適用できることは、言うまでもない。   In the printed wiring board 100 shown in FIG. 2, the second prepreg 11 is laminated one by one on the upper and lower surfaces of the core layer 10 ′, but is not limited to one layer. For example, a plurality of second prepregs 11 are alternately arranged. It is good also as a multilayer buildup layer by laminating | stacking. In this case, the via hole 5 is formed in the stacked second prepreg 11 and is electrically connected. Furthermore, it goes without saying that the present invention can be applied not only to build-up printed wiring boards but also to ordinary multilayer printed wiring boards, bonded multilayer printed wiring boards, multiple multilayer printed wiring boards, and the like.

本発明に係る第1および第2のプリプレグの一実施形態の製造方法を説明する。第1のプリプレグの製造方法は、下記の工程(i)〜(ii)を含む。
(i)絶縁性布材にフィラーを含まないワニスを塗布または含浸し、乾燥させてプリプレグ中間体を得る工程
(ii)前記プリプレグ中間体の両面にフィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成した第1のプリプレグを得る工程
また、本発明に係る第2のプリプレグの一実施形態の製造方法は、第1のプリプレグの製造工程(ii)に変えて、下記の工程(iii)を加えたものである。
(iii)前記プリプレグ中間体の一方の面に、フィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成し、他方の面にフィラーを含まないワニスを塗布し、乾燥させて半硬化状態のフィラー非含有樹脂層を形成した第2のプリプレグを得る工程
A manufacturing method of one embodiment of the first and second prepregs according to the present invention will be described. The manufacturing method of the first prepreg includes the following steps (i) to (ii).
(I) A step of applying or impregnating a varnish containing no filler to an insulating cloth material and drying it to obtain a prepreg intermediate (ii) Applying a varnish containing a filler to both sides of the prepreg intermediate and drying it The process of obtaining the 1st prepreg which formed the filler containing resin layer of the hardening state Moreover, the manufacturing method of one Embodiment of the 2nd prepreg which concerns on this invention changes into the manufacturing process (ii) of a 1st prepreg, The following step (iii) is added.
(Iii) A varnish containing a filler is applied to one side of the prepreg intermediate and dried to form a semi-cured filler-containing resin layer, and a varnish containing no filler is applied to the other side and dried. Step of obtaining a second prepreg in which a semi-cured filler-free resin layer is formed

本発明に係るプリプレグの製造方法における一実施形態を、図3(a)、(b−1)(b−2)に基づいて説明する。   An embodiment of the prepreg manufacturing method according to the present invention will be described with reference to FIGS. 3 (a), (b-1) and (b-2).

まず、図3(a)に示すように、絶縁性布材(ガラス繊維)1に、フィラーを含まないワニスを塗布または含浸し、乾燥させてプリプレグ中間体2を作成する。
このとき、塗布またはされるワニスの厚みは、絶縁性布材1の厚みと同程度以下であるのがよい。
First, as shown to Fig.3 (a), the varnish which does not contain a filler is apply | coated or impregnated to the insulating cloth material (glass fiber) 1, and it is made to dry, and the prepreg intermediate body 2 is created.
At this time, the thickness of the varnish to be applied or applied is preferably equal to or less than the thickness of the insulating cloth material 1.

次に、図3(b−1)に示すように、プリプレグ中間体2の少なくとも一方の面にフィラーを含むワニスを塗布し、乾燥させて、半硬化状態のフィラー含有樹脂層3を形成した第1のプリプレグ10が得られる。
なお、後述する印刷配線板100のコア材10’として用いる場合、プリプレグ中間体2の両面に前記フィラー含有樹脂層3を形成するのがよい。
Next, as shown in FIG. 3 (b-1), a varnish containing a filler was applied to at least one surface of the prepreg intermediate 2 and dried to form a semi-cured filler-containing resin layer 3. 1 prepreg 10 is obtained.
In addition, when using as core material 10 'of the printed wiring board 100 mentioned later, it is good to form the said filler containing resin layer 3 on both surfaces of the prepreg intermediate body 2. FIG.

第2のプリプレグ11は、図3(b−2)に示すように、前記プリプレグ中間体2の一方の面にフィラーを含むワニスを塗布し、乾燥させて、半硬化状態のフィラー含有樹脂層3を形成し、他方の面にフィラーを含まないワニスを塗布し、乾燥させて、半硬化状態のフィラー非含有樹脂層4を形成して得ることができる。   As shown in FIG. 3 (b-2), the second prepreg 11 is coated with a varnish containing a filler on one surface of the prepreg intermediate 2 and dried to make a semi-cured filler-containing resin layer 3. Can be obtained by applying a varnish containing no filler to the other surface and drying to form a semi-cured filler-free resin layer 4.

このように、プリプレグ中間体2を形成する際、絶縁性布材1の厚みと同程度以下の厚みでフィラーを含まないワニスを絶縁性布材1に塗布することで、前記絶縁性布材1間に十分にワニス(樹脂)が含浸され、積層成形持に絶縁性布材に対する樹脂流れを良好にすることができ、樹脂と絶縁性布材1間に空隙が発生せず、樹脂内の水分で短絡が発生しなくなる。   Thus, when forming the prepreg intermediate body 2, the insulating cloth material 1 is applied to the insulating cloth material 1 by applying a varnish that does not contain a filler in a thickness equal to or less than the thickness of the insulating cloth material 1. The varnish (resin) is sufficiently impregnated in between, and the resin flow with respect to the insulating cloth material can be improved in the laminated molding, and no void is generated between the resin and the insulating cloth material 1, and the moisture in the resin In short, no short circuit occurs.

次に、本発明に係る印刷配線板の一実施形態の製造方法を説明する。本発明に係る印刷配線板の製造方法は、下記の工程(I)〜(IX)を含む。
(I)絶縁性布材にフィラーを含まないワニスを塗布または含浸し、乾燥させてプリプレグ中間体を得る工程
(II)プリプレグ中間体の両面にフィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成した第1のプリプレグを形成する工程
(III)第1のプリプレグの表面に導電性金属箔(銅箔)を積層し、加熱および加圧を行うプレス処理を行った後、レーザー加工またはドリル加工によりビアホール形成用のビアホール下孔を形成する工程
(IV)ビアホール下孔に導体材料にて導体層を形成(めっき処理)した後、導体上にドライフィルムを貼付し、露光および現像して回路部を形成したい場所以外のドライフィルムを剥離する工程
(V)コア材表面の導電性金属箔および導体層をエッチングしてビアホールを含む回路部を形成し、回路部を形成した場所のドライフィルムを剥離する工程。
(VI)前記プリプレグ中間体の一方の面にフィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成し、他方の面にフィラーを含まないワニスを塗布し、半硬化状態のフィラー非含有樹脂層を形成した第2のプリプレグを得た後、前記コア材の回路部に、第2のプリプレグのフィラー非含有樹脂層の面が接するように積層し、更に第2のプリプレグの表面に導電性金属箔(銅箔)を積層して、加熱および加圧を行うプレス処理を行って積層板を得る工程
(VII)レーザー加工またはドリル加工により、コア層の回路部に達するビアホール下穴と、積層板を貫通するスルーホール下孔を形成する工程
(VIII)ビアホール下穴とスルーホール下孔とに導体材料にて導体層を形成(めっき処理)した後、ドライフィルムを貼付し、露光および現像して回路部を形成したい場所以外のドライフィルムを剥離する工程
(IX)エッチングしてビアホールおよびスルーホールを含む回路部を形成し、回路部を形成した場所のドライフィルムを剥離する工程。
Next, the manufacturing method of one Embodiment of the printed wiring board concerning this invention is demonstrated. The method for manufacturing a printed wiring board according to the present invention includes the following steps (I) to (IX).
(I) Step of applying or impregnating a varnish containing no filler to an insulating cloth material and drying it to obtain a prepreg intermediate (II) Applying a varnish containing a filler to both sides of the prepreg intermediate, drying and semi-curing Step (III) of Forming First Prepreg Forming Filler-Containing Resin Layer in State (III) Conductive metal foil (copper foil) was laminated on the surface of the first prepreg, and press treatment was performed for heating and pressurization. Thereafter, a step of forming a via-hole prepared hole for forming a via hole by laser processing or drilling (IV) After forming a conductor layer with a conductive material in the via-hole prepared hole (plating treatment), a dry film is pasted on the conductor, Step of peeling dry film other than the place where the circuit part is to be formed by exposure and development (V) Etching the conductive metal foil and conductor layer on the surface of the core material to Step to form a circuit portion, peeling the dry film location on the basis of the circuit portion including Le.
(VI) A varnish containing a filler is applied to one surface of the prepreg intermediate, dried to form a semi-cured filler-containing resin layer, and a varnish not containing a filler is applied to the other surface to be semi-cured. After obtaining the second prepreg in which the filler-free resin layer in the state is formed, the second prepreg is laminated so that the surface of the filler-free resin layer of the second prepreg is in contact with the circuit portion of the core material. A process of laminating a conductive metal foil (copper foil) on the surface of the prepreg, and performing a pressing process of heating and pressing to obtain a laminated board (VII) A circuit part of the core layer is reached by laser processing or drilling Step of forming via hole pilot holes and through hole pilot holes penetrating the laminate (VIII) After forming a conductor layer (plating process) with a conductive material in via hole pilot holes and through hole pilot holes, A process of removing the dry film other than the place where the circuit part is to be formed by exposing and developing the film (IX) Etching to form a circuit part including a via hole and a through hole, and drying the place where the circuit part is formed The process of peeling a film.

本発明に係る印刷配線板の製造方法における一実施形態を、図3(a)〜(i)に基づいて説明する。   One embodiment of the method for producing a printed wiring board according to the present invention will be described with reference to FIGS.

図3(a)は、前述した絶縁性布材1にフィラーを含まないワニスを塗布し、含浸させ、乾燥させたプリプレグ中間体2を示している。
前記プリプレグ中間体2は、図3(b−1)、(b−2)に示すように、それぞれ第1のプリプレグ10、第2のプリプレグ11となる。なお、それぞれの製造方法は前述したため省略する。
FIG. 3A shows a prepreg intermediate 2 in which the insulating cloth material 1 is coated with a varnish that does not contain a filler, impregnated, and dried.
The prepreg intermediate 2 becomes a first prepreg 10 and a second prepreg 11, respectively, as shown in FIGS. 3 (b-1) and 3 (b-2). Since each manufacturing method has been described above, the description thereof will be omitted.

次に、図3(c)に示すように、第1のプリプレグ10の表裏面に導電性金属箔(銅箔)71を積層しプレスで加圧加熱してコア材10aを得た後、レーザー加工またはドリル加工によりコア材10aを貫通させ、ビアホール6形成用のビアホール下孔6aを形成する。このレーザー加工で用いられるレーザー光としては、CO2レーザー、UV−YAGレーザーなどが挙げられる。 Next, as shown in FIG.3 (c), after electrically conductive metal foil (copper foil) 71 is laminated | stacked on the front and back of the 1st prepreg 10, and pressurizing and heating with a press, after obtaining the core material 10a, laser The core material 10a is penetrated by processing or drilling, and the via hole prepared hole 6a for forming the via hole 6 is formed. Examples of laser light used in this laser processing include a CO 2 laser and a UV-YAG laser.

次に、図3(d)に示すように、ビアホール下孔6aの孔内の内壁面とコア材10aの両面に導体材料にて導体層60を形成する(めっき処理)。導体層60の導体材料としては、例えば、銅めっきがよく、銅めっきは化学銅めっき(無電解銅めっき)でもよく、電解銅めっきでもよい。また、ビアホール下孔6aに銅めっきを充填してもよい。
ビアホール下孔6aをめっき処理した後、コア材10aの表面に、公知の方法で、ドライフィルム9を貼付し、露光および現像して回路部を形成したい場所以外のドライフィルム9を剥離し、コア材10a表面の導電性金属箔71および導体層60をエッチングすると、図3(e)に示すように、コア材10aにビアホール6を含む回路部を形成し、回路部を形成した場所のドライフィルム9を剥離すると、コア層10’となる。
Next, as shown in FIG.3 (d), the conductor layer 60 is formed with a conductor material on the inner wall face in the hole of the via hole lower hole 6a, and both surfaces of the core material 10a (plating process). The conductor material of the conductor layer 60 is, for example, copper plating, and the copper plating may be chemical copper plating (electroless copper plating) or electrolytic copper plating. Further, the via hole prepared hole 6a may be filled with copper plating.
After plating the via hole lower hole 6a, a dry film 9 is pasted on the surface of the core material 10a by a known method, and the dry film 9 other than the place where the circuit portion is to be formed is peeled off by exposure and development. When the conductive metal foil 71 and the conductor layer 60 on the surface of the material 10a are etched, as shown in FIG. 3E, a circuit part including the via hole 6 is formed in the core material 10a, and the dry film at the place where the circuit part is formed When 9 is peeled, the core layer 10 'is obtained.

次に、図3(b−2)に示す第2のプリプレグ11を、コア層10’に積層し、更に導電性金属箔(銅箔)71を第2のプリプレグに積層し、第2のプリプレグ11のフィラー非含有樹脂層4とコア層10’とが、完全に硬化するまで加熱と加圧を同時に行うプレス処理を行って、図3(f)に示すような積層板100aを作成する。
このとき、第2のプリプレグ11は、コア層10’のビアホール6を含む回路部に、フィラー非含有樹脂層4の面を接するように積層し、積層板100aの表裏面がフィラー含有樹脂層3となるように積層する。
また、ビアホール6を含む回路部に第2のプリプレグ11を積層する際に、接着性を向上させるための前処理として、前記ビアホール6を含む回路部の表面に酸化銅皮膜を形成する黒化処理を行ってもよい。黒化処理された回路部の表面は、黒化処理面61となる。
Next, the second prepreg 11 shown in FIG. 3 (b-2) is laminated on the core layer 10 ′, and further a conductive metal foil (copper foil) 71 is laminated on the second prepreg. 11 is used to perform a pressing process in which heating and pressurization are performed simultaneously until the filler-free resin layer 4 and the core layer 10 ′ are completely cured, thereby producing a laminate 100a as shown in FIG.
At this time, the second prepreg 11 is laminated so that the surface of the filler-free resin layer 4 is in contact with the circuit portion including the via hole 6 of the core layer 10 ′, and the front and back surfaces of the laminate 100 a are filled with the filler-containing resin layer 3. Laminate so that
Further, when the second prepreg 11 is laminated on the circuit portion including the via hole 6, as a pretreatment for improving the adhesion, a blackening process for forming a copper oxide film on the surface of the circuit portion including the via hole 6 is performed. May be performed. The surface of the circuit part that has been blackened is a blackened surface 61.

次に、図3(g)に示すように、積層板100aの表裏面に導電性金属箔(銅箔)71を積層した後、レーザー加工またはドリル加工により、コア層10’のビアホール6を含む回路部に達するビアホール下穴5aと、積層板100aを貫通するスルーホール下孔8aを形成する。   Next, as shown in FIG. 3 (g), after laminating a conductive metal foil (copper foil) 71 on the front and back surfaces of the laminate 100a, the via hole 6 of the core layer 10 'is included by laser processing or drilling. A via hole pilot hole 5a reaching the circuit part and a through hole pilot hole 8a penetrating the laminated plate 100a are formed.

次に、図3(h)に示すように、ビアホール下穴5a、スルーホール下孔8aのそれぞれの孔(穴)内の内壁面および積層板100aの両面に導体材料にて、導体層7を形成する(めっき処理)。この導体材料としては、前記導体層60と同じものであるのがよく、例えば、銅めっきがよく、銅めっきは化学銅めっき(無電解銅めっき)でもよく、電解銅めっきでもよい。
前記ビアホール下穴5aおよびスルーホール下孔8aをめっき処理した後、積層板100aの表面のビアホール下穴5aおよびスルーホール下孔8aの形成位置に、公知の方法で、ドライフィルム9を貼付し、露光および現像して回路部を形成したい場所以外のドライフィルム9を剥離し、導体層7をエッチングし、回路部を形成した場所のドライフィルム9を剥離すると、図3(i)に示すように、ビアホール5およびスルーホール8を形成された印刷配線板100を得ることができる。また、最後に、印刷配線板表面の所定の位置にソルダーレジスト(図示せず)を形成してもよい。
Next, as shown in FIG. 3 (h), the conductor layer 7 is made of a conductor material on both the inner wall surfaces of the via hole lower hole 5a and the through hole lower hole 8a and both surfaces of the laminated plate 100a. Form (plating process). The conductor material is preferably the same as that of the conductor layer 60. For example, copper plating is good, and the copper plating may be chemical copper plating (electroless copper plating) or electrolytic copper plating.
After plating the via-hole prepared hole 5a and the through-hole prepared hole 8a, a dry film 9 is applied to the formation position of the via-hole prepared hole 5a and the through-hole prepared hole 8a on the surface of the laminate 100a by a known method, When the dry film 9 other than the place where the circuit part is to be formed is peeled off by exposure and development, the conductor layer 7 is etched, and the dry film 9 is peeled off at the place where the circuit part is formed, as shown in FIG. The printed wiring board 100 in which the via hole 5 and the through hole 8 are formed can be obtained. Finally, a solder resist (not shown) may be formed at a predetermined position on the surface of the printed wiring board.

1 絶縁性布材
2 プリプレグ中間体
3 フィラー含有樹脂層
4 フィラー非含有樹脂層
5 ビアホール
5a ビアホール下穴
6 ビアホール
60 導体層
61 黒化処理面
6a ビアホール下孔
7 導体層
71 導電性金属箔
8 スルーホール
8a スルーホール下孔
9 ドライフィルム
10 第1のプリプレグ
10a コア材
10’ コア層
11 第2のプリプレグ
100a 積層板
100 印刷配線板
DESCRIPTION OF SYMBOLS 1 Insulating cloth material 2 Prepreg intermediate 3 Filler containing resin layer 4 Filler non-containing resin layer 5 Via hole 5a Via hole pilot hole 6 Via hole 60 Conductor layer 61 Blackening surface 6a Via hole pilot hole 7 Conductor layer 71 Conductive metal foil 8 Through Hole 8a Through-hole pilot hole 9 Dry film 10 First prepreg 10a Core material 10 'Core layer 11 Second prepreg 100a Laminated board 100 Printed wiring board

Claims (10)

フィラーを含まないワニスを絶縁性布材に含浸させ乾燥して得られたプリプレグ中間体の少なくとも一方の面にフィラーを含むワニスを塗布し乾燥させたことを特徴とするプリプレグ。   A prepreg characterized by applying a varnish containing a filler to at least one surface of a prepreg intermediate obtained by impregnating an insulating cloth material with a varnish not containing a filler and drying it. フィラーを含まないワニスを絶縁性布材に含浸させ乾燥したプリプレグ中間体の一方の面にフィラーを含むワニスを塗布し乾燥させ、他方の面にフィラーを含まないワニスを塗布し乾燥させたことを特徴とするプリプレグ。   Applying a varnish containing a filler to one side of a prepreg intermediate impregnated with a varnish containing no filler and drying the prepreg intermediate and drying, applying a varnish containing no filler to the other side and drying Characteristic prepreg. 前記フィラーがシリカまたは水酸化アルミニウムである請求項1または2に記載のプリプレグ。   The prepreg according to claim 1 or 2, wherein the filler is silica or aluminum hydroxide. 前記絶縁性布材が、ガラス繊維である請求項1〜3のいずれかに記載のプリプレグ。   The prepreg according to any one of claims 1 to 3, wherein the insulating cloth material is glass fiber. 第1のプリプレグと、この第1のプリプレグの少なくとも一方の面に形成した回路部とからなるコア層と、このコア層の回路部に積層した第2のプリプレグとを備えた印刷配線板であって、
第1のプリプレグが、フィラーを含まないワニスを含浸させ、乾燥して得られた第1のプリプレグ中間体の両面にフィラーを含むワニスを塗布し乾燥させて形成したものであり、
第2のプリプレグが、フィラーを含まないワニスを含浸させ、乾燥して得られた第2のプリプレグ中間体の一方の面にフィラーを含むワニスを塗布し乾燥させ、他方の面にフィラーを含まないワニスを塗布し乾燥させて形成したものであり、
前記第2のプリプレグが、フィラーを含有しないワニス塗布面を前記コア層の回路部の黒化処理面に接するように積層したことを特徴とする印刷配線板。
A printed wiring board comprising a core layer comprising a first prepreg, a circuit portion formed on at least one surface of the first prepreg, and a second prepreg laminated on the circuit portion of the core layer. And
The first prepreg is formed by impregnating a varnish containing no filler and applying and drying a varnish containing a filler on both sides of a first prepreg intermediate obtained by drying,
The second prepreg is impregnated with a varnish that does not contain a filler, and dried by applying a varnish containing a filler to one side of a second prepreg intermediate obtained by drying, and the other side does not contain a filler. It is formed by applying varnish and drying,
The printed wiring board, wherein the second prepreg is laminated so that a varnish-coated surface not containing a filler is in contact with a blackened surface of a circuit portion of the core layer.
前記第2のプリプレグに、前記回路部と電気的に接続されるビアホールが設けられた請求項5に記載の印刷配線板。   The printed wiring board according to claim 5, wherein a via hole that is electrically connected to the circuit unit is provided in the second prepreg. 前記コア層および第2のプリプレグを貫通するスルーホールが設けられた請求項5または6に記載の印刷配線板。   The printed wiring board according to claim 5, wherein a through-hole penetrating the core layer and the second prepreg is provided. 絶縁性布材にフィラーを含まないワニスを塗布または含浸させ乾燥させてプリプレグ中間体を形成する工程と、
前記プリプレグ中間体の少なくとも一方の面にフィラーを含むワニスを塗布し、乾燥させる工程と、を含むことを特徴とするプリプレグの製造方法。
Applying or impregnating varnish containing no filler to the insulating cloth material and drying to form a prepreg intermediate; and
Applying a varnish containing a filler to at least one surface of the prepreg intermediate, and drying the prepreg intermediate.
絶縁性布材にフィラーを含まないワニスを塗布または含浸させ乾燥させてプリプレグ中間体を形成する工程と、
前記プリプレグ中間体の一方の面にフィラーを含むワニスを塗布し、乾燥させる工程と、
前記プリプレグ中間体の他方の面にフィラーを含まないワニスを塗布し、乾燥させる工程と、を含むことを特徴とするプリプレグの製造方法。
Applying or impregnating varnish containing no filler to the insulating cloth material and drying to form a prepreg intermediate; and
Applying a varnish containing a filler to one surface of the prepreg intermediate, and drying;
Applying the varnish containing no filler to the other surface of the prepreg intermediate and drying the prepreg intermediate.
絶縁性布材にフィラーを含まないワニスを塗布または含浸させ、乾燥させてプリプレグ中間体を形成する工程と、
前記プリプレグ中間体の両面に、フィラーを含むワニスを塗布し、乾燥させて半硬化状態のフィラー含有樹脂層を形成した第1のプリプレグからなるコア材を形成する工程と、
前記第1のプリプレグの少なくとも一方の面に設けた銅箔に、めっき処理をした後、エッチングにて回路部としたコア層を形成する工程と、
前記プリプレグ中間体の一方の面にフィラーを含むワニスを塗布し、乾燥させて硬化状態のフィラー含有樹脂層を形成し、他方の面にフィラーを含まないワニスを塗布し、乾燥させて半硬化状態のフィラー非含有樹脂層を形成した第2のプリプレグを形成する工程と、
前記第2のプリプレグを、フィラー非含有樹脂層の面が、前記コア層の回路部の黒化処理面に接するように積層する工程と、を含むことを特徴とする印刷配線板の製造方法。
Applying or impregnating a varnish containing no filler to the insulating cloth material and drying to form a prepreg intermediate; and
Applying a varnish containing a filler to both surfaces of the prepreg intermediate, and forming a core material composed of a first prepreg in which a filler-containing resin layer in a semi-cured state is formed by drying;
Forming a core layer as a circuit part by etching after plating the copper foil provided on at least one surface of the first prepreg; and
A varnish containing a filler is applied to one side of the prepreg intermediate and dried to form a cured filler-containing resin layer, and a varnish containing no filler is applied to the other side and dried to a semi-cured state. Forming a second prepreg having the filler-free resin layer formed thereon,
Laminating the second prepreg so that the surface of the filler-free resin layer is in contact with the blackened surface of the circuit portion of the core layer.
JP2015087945A 2015-04-22 2015-04-22 Prepreg and manufacturing method therefor, printed wire board and manufacturing method therefor Pending JP2016204522A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022059613A1 (en) * 2020-09-17 2022-03-24 三菱重工航空エンジン株式会社 Method for producing prepreg and method for molding composite material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022059613A1 (en) * 2020-09-17 2022-03-24 三菱重工航空エンジン株式会社 Method for producing prepreg and method for molding composite material

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