JP2016195233A - Semiconductor production device and semiconductor chip production method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device and a production method capable of picking up semiconductor chips in accordance with an adhesion state between the same and a holding member.SOLUTION: A pickup device 100 comprises: a stage 110 mounted with an adhesive tape 30 holding a substrate W separated into individual semiconductor chips 10; a pushing up device 120; a collet 130; an upper imaging camera 140; and a lower imaging camera 150. The pickup device 100: detects an adhesion state on a rear surface of the semiconductor chip 10 on the basis of captured image of the lower imaging camera 150; adjusts a pushing up amount or absorption pressure of the pushing up device 120 on the basis of a detection result; and picks up the semiconductor chip 10 with the collet 130.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a semiconductor manufacturing apparatus and a method for manufacturing a semiconductor piece.

  In the manufacturing process of semiconductor pieces, after an adhesive tape such as a dicing tape is expanded, individual semiconductor pieces are picked up from the adhesive tape, and the picked-up semiconductor pieces are mounted on a circuit board or the like. In the semiconductor piece pick-up process, the semiconductor pieces arranged on the adhesive tape are pushed up from below with a push-up member such as a needle, the semiconductor chip is peeled off from the adhesive tape, and the upper surface of the semiconductor piece is adsorbed by a collet. (Patent Document 1).

JP 2007-109680 A

A technique is known in which a holding member (such as a dicing tape) that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded by tensile stress, and the semiconductor pieces are picked up in this expanded state. Yes.
In this technique, when picking up the semiconductor piece from the holding member, a pickup failure may occur due to the adhesion state between the semiconductor piece and the holding member.

  Then, an object of this invention is to provide the apparatus and manufacturing method which can be picked up according to the adhesion state of a semiconductor piece and a holding member.

According to a first aspect of the present invention, in a state where a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, a detecting unit that detects an interval between the semiconductor pieces, and a semiconductor in which the detected interval is narrow A semiconductor manufacturing apparatus comprising: pick-up means for changing the amount of protrusion in the same substrate so that the amount of protrusion of the semiconductor piece increases as the piece increases.
Claim 2 is a region in which a plurality of semiconductor pieces are included in an interval between the semiconductor pieces in a state where a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded. And a pick-up means for changing the amount of protrusion for each region in the same substrate so that the region where the detected interval is narrower increases the amount of protrusion of the semiconductor piece. Semiconductor manufacturing equipment.
According to a third aspect of the present invention, in a state where a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, a detecting unit that detects an interval between the semiconductor pieces, and a semiconductor in which the detected interval is narrow A semiconductor manufacturing apparatus comprising: pickup means for changing the adsorption pressure in the same substrate so that the adsorption pressure for adsorbing the holding member downward when the semiconductor piece is pushed up as the piece is increased.
According to a fourth aspect of the present invention, in a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, the interval between the semiconductor pieces is set to a region that includes a plurality of the semiconductor pieces. The detection means for detecting each time and the area where the detected interval is narrower, the suction pressure to the holding member when the semiconductor piece is pushed up and picked up is increased for each area in the same substrate. A semiconductor manufacturing apparatus comprising: pickup means for changing pressure;
According to a fifth aspect of the present invention, in a state where a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, a detection unit that detects an interval between the semiconductor pieces, and a semiconductor in which the detected interval is narrow A semiconductor manufacturing apparatus comprising: pick-up means for changing a time interval for picking up the semiconductor pieces in the same substrate so that the pieces are picked up at a short time interval after the adjacent semiconductor pieces are picked up.
In a sixth aspect of the present invention, in a state in which the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, the interval between the semiconductor pieces is set to a region that includes a plurality of the semiconductor pieces. Pickup means for changing the time interval for each region in the same substrate so that the detection means for detecting each time and the region where the detected interval is narrower are picked up at a short time interval after the adjacent semiconductor piece is picked up And a semiconductor manufacturing apparatus.
Claim 7 is a step of detecting the interval between the semiconductor pieces in a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, and semiconductor pieces of the same size are mutually connected. The step of detecting the interval in each of the substrates, and the semiconductor piece by changing the amount of protrusion for each of the substrates so that the amount of protrusion of the semiconductor piece increases as the detected interval becomes narrower. And a step of picking up a semiconductor piece.
Claim 8 is a step of detecting the interval between the semiconductor pieces in a state where the holding member holding the substrate separated into the semiconductor pieces on the adhesive layer is expanded, and the semiconductor pieces having the same size are mutually connected. For each of the substrates, the step of detecting the interval in each of the substrates and the substrate having a narrower detected interval increase the adsorption pressure for adsorbing the holding member downward when the semiconductor piece is pushed up. And a step of picking up the semiconductor piece by changing the adsorption pressure.
Claim 9 is a step of detecting the interval between the semiconductor pieces in a state where the holding member that holds the substrate separated into the semiconductor pieces on the adhesive layer is expanded, and the semiconductor pieces having the same size are mutually connected. The interval of picking up the semiconductor piece for each of the substrates is changed so that the step of detecting the interval in each substrate having the substrate and the semiconductor piece picked up at a shorter time interval as the detected interval is narrower. Picking up the semiconductor piece;
A method of manufacturing a semiconductor piece.

According to the first, third, and fifth aspects, the pickup according to the interval between the semiconductor pieces can be performed.
According to the second, fourth, and sixth aspects, the pickup according to the interval between the semiconductor pieces can be performed for each region of the substrate.
According to the seventh to ninth aspects, it is possible to perform pick-up according to the interval between the semiconductor pieces in units of substrates.

FIG. 1A is a schematic schematic perspective view of a pickup device according to an embodiment of the present invention, and FIG. 1B is a schematic cross-sectional view of FIG. FIG. 2A is a schematic plan view of a semiconductor substrate, and FIG. 2B is a schematic perspective view showing an example of a semiconductor piece. It is a figure explaining pushing up of the adhesive tape by a pushing-up apparatus. It is a block diagram which shows the electrical structure of the pick-up apparatus which concerns on the Example of this invention. It is the figure which showed typically the adhesion state and peeling state of the back surface of a semiconductor piece when observed from the back surface direction of a semiconductor substrate. It is a block diagram which shows the functional structure of the pick-up control program which concerns on the Example of this invention. It is a figure explaining the generation | occurrence | production phenomenon of the defect in a pick-up process. It is a flowchart which shows the 1st method of changing the pick-up conditions of the pick-up apparatus based on 1st Example of this invention. It is a figure explaining the pickup when the amount of needle protrusion is adjusted It is a figure explaining a pickup when the adsorption pressure of a pushing-up device is adjusted It is a figure explaining a pickup when a time interval is adjusted It is a flowchart which shows the 2nd method of changing the pick-up conditions of the pick-up apparatus based on 1st Example of this invention. It is a figure explaining the 3rd method of detecting the adhesion state of the board | substrate unit by 1st Example of this invention. It is a figure explaining the 4th method of detecting the adhesion state of the area unit by the 1st example of the present invention. The schematic plan view of the surface of the semiconductor substrate after an expanding process is shown. It is a graph which shows the relationship between the adhesion width Wp of the adhesion area | region P of the back surface of a semiconductor piece, and the space | interval Se of the semiconductor piece of the surface side. 1 is a schematic perspective view of a pickup device according to an embodiment of the present invention. It is a flowchart which changes the pick-up conditions of the pick-up apparatus based on 2nd Example of this invention.

  The manufacturing process of a semiconductor piece includes, for example, a step of forming an element on the surface of a semiconductor substrate or a semiconductor wafer (hereinafter referred to as a semiconductor substrate or a substrate), a step of attaching a dicing tape to the semiconductor substrate, and a semiconductor substrate as an individual semiconductor piece. A step of dicing (semiconductor chip), a step of expanding a dicing tape, a step of picking up a semiconductor piece from the dicing tape, and a step of mounting the picked-up semiconductor piece on a circuit board or the like. The semiconductor manufacturing apparatus of this invention is related with the pick-up apparatus utilized in the pick-up process after an expand process. The pick-up device peels a semiconductor piece held on an adhesive tape such as a dicing tape or an expanding tape from the adhesive tape, and picks up the peeled semiconductor piece with an adsorbing member such as a collet. The pick-up device may be a device that performs an expansion process that is a pre-process, a device that is combined with a device that performs a die-mount process that is a post-process, or may constitute a part of such a device. However, it may be separated from these devices.

  The element formed in the semiconductor piece is not particularly limited, and can include a light emitting element, a light receiving element, an active element, a passive element, and the like. The light emitting element can be, for example, a surface emitting semiconductor laser, a light emitting diode, a light emitting thyristor, or an array in which a plurality of such elements are formed. The light receiving element can be, for example, a contact image sensor or a line sensor. Further, one semiconductor piece can include a driving circuit for driving the element. Further, the semiconductor substrate can be, for example, a substrate made of silicon, SiC, a compound semiconductor, sapphire, or the like, but is not limited thereto, and may be a substrate made of other materials as long as the substrate includes at least a semiconductor. May be. For example, a light receiving element such as a contact image sensor is formed on a silicon substrate, and a light emitting element such as a surface emitting semiconductor laser or a light emitting diode is formed on a III-V group compound semiconductor substrate such as GaAs.

  The semiconductor piece picked up by the pickup device is mounted on a circuit board or the like. A circuit board on which a semiconductor piece on which a light emitting element or the like is formed is mounted, for example, as a light source of an image forming apparatus or an optical transmission apparatus.

  Hereinafter, a pickup apparatus will be described in detail with reference to the drawings as an example of a semiconductor manufacturing apparatus of the present invention. It should be noted that the scale and shape of the drawings are emphasized for easy understanding of the features of the invention, and are not necessarily the same as the scale and shape of an actual apparatus.

  1A is a schematic perspective view showing an outline of a pickup device according to an embodiment of the present invention, FIG. 1B is a schematic cross-sectional view thereof, and FIG. 2A is a device in which an element is formed. A schematic top view of the semiconductor substrate, FIG. 2B, is a schematic perspective view of one semiconductor piece.

  As shown in FIG. 2A, on the surface of the semiconductor substrate W, a plurality of semiconductor pieces 10 are formed in an array in the matrix direction. Here, as an example, rectangular semiconductor pieces 10 having a large aspect ratio are shown, and each semiconductor piece 10 is separated in a lattice pattern by cutting regions 20 defined by scribe lines or the like having a spacing S. As shown in FIG. 2B, one semiconductor piece has a generally rectangular shape having a length L in the depth direction, a width W, and a height H. However, the width W is very large with respect to the length L. The height H is larger than the length L. In such a semiconductor piece having a large aspect ratio, for example, a plurality of light emitting elements are formed in the width W direction. However, the configuration of the semiconductor piece shown in FIGS. 2A and 2B is an example, and the semiconductor piece may be a rectangular shape having a small aspect ratio, or a square having a length L and a width W substantially equal. It may be a shape.

  For example, an ultraviolet curable adhesive tape is attached to the back surface of the semiconductor substrate W, and the semiconductor substrate W is diced along the cutting region 20 by a dicing apparatus or the like and separated into individual semiconductor pieces. Thereafter, the adhesive tape is irradiated with ultraviolet rays to cure the adhesive layer, and then the adhesive tape is expanded. In the expanding step, for example, the pressure-sensitive adhesive tape is mounted on a heated stage, and the pressure-sensitive adhesive tape is stretched by pulling the pressure-sensitive adhesive tape in a two-dimensional direction, and accordingly, the interval S between the semiconductor pieces 10 is expanded.

  The expanded adhesive tape is held by a ring-shaped holding member and set on a stage of a pip-up device. As shown in FIG. 1A, the pickup apparatus 100 according to the present embodiment includes a stage 110 that is fixed via a holding member that holds an adhesive tape 30 to which the back surface of the semiconductor piece 10 is bonded, and a position below the stage 110. Then, a push-up device 120 that pushes the semiconductor piece upward via an adhesive tape, a collet 130 that is positioned above the stage 110 and sucks the surface of the pushed-up semiconductor piece, and a semiconductor substrate from above the stage 110 An upper imaging camera 140 that images the front surface side of the semiconductor substrate, and a lower imaging camera 150 that images the back surface side of the semiconductor substrate from below the stage 110.

  The push-up device 120 is fixed in the X and Y planes, and the semiconductor piece 10 to be picked up is positioned on the push-up device 120 by moving the stage 110 in the X and Y directions. After the positioning by the stage 110 is performed, the push-up device 120 moves the push-up member such as a needle upward (Z direction) to lift the adhesive tape 30 and the semiconductor piece 10. Thereby, a part of the back surface of the semiconductor piece 10 is peeled off from the adhesive tape 30. On the other hand, the collet 130 is positioned directly above the semiconductor piece 10, and the collet 130 picks up the surface of the semiconductor piece 10 and moves the collet 130 in the Z direction, so that the semiconductor piece 10 is picked up in the Z direction together with the collet 130. Then, the semiconductor piece 10 is completely peeled off from the adhesive tape 30. The semiconductor piece adsorbed by the collet 130 is conveyed to the circuit board or another position.

  As shown in FIG. 1B, the push-up device 120 includes a cylindrical needle cap 160 having a flat surface, and a circular through-hole 162 extending in the axial direction is formed at substantially the center of the needle cap 160. Is done. A needle 164 is accommodated in the through hole 162, and the needle 164 is moved up and down in the Z direction by the push-up drive device 166. That is, when picking up the semiconductor piece, the push-up driving device 166 raises the needle 164 so that the needle 164 protrudes from the surface of the needle cap 160, and when the pick-up is completed, the needle 164 moves from the surface of the needle cap 160. The needle 164 is lowered so as not to protrude. A plurality of suction holes 168 are formed around the through-hole 162. The suction hole 168 is connected to a suction device 170 that generates a negative pressure, and sucks the back surface of the adhesive tape 30 located on the needle cap 160. Here, four circular suction holes are shown, but the shape and number of the suction holes are not particularly limited.

  FIG. 3 is a diagram for explaining the operation of the push-up device 120. When the semiconductor piece to be picked up is positioned on the push-up device 120, the back surface of the adhesive tape 30 is adsorbed on the surface of the needle cap 160 through the adsorption hole 168 as shown in FIG. Next, when the needle 164 is raised by the push-up drive device 166, the needle 164 pushes up the adhesive tape 30 and the semiconductor piece 10 thereon as shown in FIG. Thereby, the adhesive tape 30 is deformed into a convex shape around the needle 164, and the adhesive tape 30 is peeled from the back surface of the semiconductor piece 10 in the vicinity R where the inclination starts. The distance in the width direction when the back surface of the semiconductor piece 10 peels from the adhesive tape 30 is defined as a peel amount D.

  FIG. 4 is a block diagram showing an electrical configuration of the pickup apparatus 100 of the present embodiment. The pickup apparatus 100 receives imaging data from the upper imaging camera 140 and the lower imaging camera 150, stores an image processing unit 210 that performs image processing on the received imaging data, and data such as parameters for controlling operations related to the pickup. A storage unit 220 that moves the stage 110 in the X or Y direction, a collet drive unit 240 that moves the collet 130 in the X, Y, and Z directions and controls the suction of the collet 130 The suction pressure adjusting unit 250 that adjusts the suction force of the suction device 170 of the thrusting device 120, the thrust amount adjusting unit 260 that adjusts the thrusting amount of the thrusting drive device 166 of the thrusting device 120, and each part are controlled. And a control unit 270.

  The image processing unit 210 recognizes the semiconductor piece 10 by analyzing imaging data from the upper imaging camera 140. For example, when the semiconductor piece 10 as shown in FIG. 2B is imaged from almost right above, the image processing unit 210 uses the edge detection filter to outline the semiconductor piece, that is, width W × length. L contour is detected. The detection result is provided to the control unit 270, and the control unit 270 controls the movement of the stage 110 based on the detection result.

  Further, the image processing unit 210 analyzes the imaging data from the lower imaging camera 150 to analyze the adhesion state between the back surface of the semiconductor piece 10 and the adhesive tape 30. Although the back surface of the semiconductor piece is held by the pressure-sensitive adhesive tape 30 via the pressure-sensitive adhesive layer or the adhesive layer, the bonding state of the back surface of the semiconductor piece may vary depending on each semiconductor piece. As described above, when the expanding process for expanding the interval S between the semiconductor pieces 10 is performed before the pickup process, the adhesive tape is expanded in the X and Y directions, whereby a part of the back surface of the semiconductor piece 10 is formed. The adhesive tape 30 is peeled off. All the semiconductor pieces may be peeled off uniformly, but the peeled state, that is, the adhesion state differs depending on the semiconductor pieces. In this embodiment, the lower imaging camera 150 images the back side of the semiconductor substrate W, and detects the bonding state of the semiconductor pieces from the imaging data.

  FIG. 5 schematically shows the adhesion state of the back surface of the semiconductor piece 10 after the expanding process. When the back surface of the semiconductor piece is observed through the adhesive tape from the back surface side of the semiconductor substrate W, an adhesive region P where the back surface of the semiconductor piece 10 is bonded by the adhesive tape 30 and a peeling region Q peeled from the adhesive tape 30 There is a difference in shade or color between the two. The pressure-sensitive adhesive tape 30 includes a pressure-sensitive adhesive layer and a light-transmitting base material. When the back surface of the semiconductor piece is bonded by the pressure-sensitive adhesive layer, the pressure-sensitive adhesive tape 30 has a dark color, and when peeled, the color becomes a light color. When the adhesive tape 30 is expanded, both end portions of the back surface of the semiconductor piece 10 are peeled off and the central portion between them is adhered. However, the adhesion width Wp of the adhesion region P may not be uniform depending on the semiconductor pieces. is there.

  The image processing unit 210 analyzes the imaging data from the lower imaging camera 150 and provides the analysis result to the control unit 270. As will be described later, the control unit 270 detects the bonding state of the semiconductor piece based on the analysis result, and controls the pickup operation based on the detection result.

  The storage unit 220 stores parameters for controlling the semiconductor chip pickup operation. As an example, the correspondence relationship between the bonding state of the semiconductor pieces and the optimum parameters is grasped in advance through experiments and simulations, and these relationships are stored. The relationship between the adhesion state and the optimum parameter stored in the storage unit 220 is referred to as optimum parameter information for convenience. In this embodiment, as parameters for controlling the pick-up of the semiconductor piece, the needle push-up amount, the suction pressure of the suction device 170, and the time interval until the next semiconductor piece is picked up are used.

  An example of optimal parameter information will be described. Here, the bonding area is used as the bonding state of the semiconductor pieces, but the bonding state may be expressed by an index other than this, for example, the bonding width Wp shown in FIG. Note that the adhesion area is approximately the size of the adhesion region P (adhesion width Wp × length L). An example in which the parameter to be controlled is the needle push-up amount will be described. The push-up amount of the needle 164 increases as the adhesion area increases, and the push-up amount of the needle 164 decreases as the adhesion area decreases. When the bonding area is large, the bonding strength is high, and thus the back surface of the semiconductor piece is difficult to peel from the adhesive tape. For this reason, the needle protrusion amount increases.

  An example in which the parameter to be controlled is the adsorption pressure of the adsorption device 170 will be described. The larger the adhesion area, the larger the adsorption pressure, and the smaller the adhesion area, the smaller the adsorption pressure. When the bonding area is large, the back surface of the semiconductor piece is difficult to peel off. For this reason, peeling is promoted by increasing the adsorption pressure of the adhesive tape 30 by the adsorption device 170.

  An example in which the parameter to be controlled is a time interval until the next semiconductor piece is picked up will be described. The larger the adhesion area, the shorter the time interval, and the smaller the adhesion area, the longer the time interval. If the bonding area is large, the bonding force increases, and the time until the next adjacent semiconductor piece returns to its original position after picking up the semiconductor piece is fast. Conversely, if the bonding area is small, the posture returns. Becomes slower. If the posture of the semiconductor piece is deteriorated, image recognition by the upper imaging camera 140 may not be performed normally, and thus it is necessary to control an optimal time interval according to the adhesion state. The relationship between these adhesion states and parameters will be described in detail later.

  The stage driving unit 230 moves the stage 110 in the X direction and the Y direction so that the semiconductor piece to be picked up next is positioned on the push-up device 120 based on the image analysis result of the imaging data of the upper imaging camera 140. .

  When picking up the semiconductor piece, the collet driving unit 240 positions the collet 130 in a direction directly above the push-up device 120 and sucks the surface of the semiconductor piece through the suction hole 132 of the collet 130. Further, the collet driving unit 240 moves the collet 130 that has attracted the semiconductor piece to a predetermined position, and stops the suction there to release the semiconductor piece.

  The adsorption pressure adjustment unit 250 adjusts the adsorption force by the adsorption device 170. The suction device 170 sucks the back surface of the adhesive tape 30 from the suction hole 168 with a constant suction force by a preset negative pressure. The adsorption pressure adjustment unit 250 also varies the adsorption pressure of the adsorption device 170 according to the parameters determined by the control unit 270.

  The push-up amount adjusting unit 260 adjusts the needle push-up amount by the push-up drive device 166. The push-up drive device 166 pushes up the needle 164 with a preset push-up amount, and peels a part of the back surface of the semiconductor piece from the adhesive tape 30. The push-up amount adjustment unit 260 also varies the push-up amount of the push-up drive device 166 according to the parameters determined by the control unit 270.

  The control unit 270 controls the operation of each unit of the pickup device 100. The control unit 270 includes, for example, a microcontroller or a microprocessor and a ROM / RM, and controls the pickup device by executing a program stored in, for example, a ROM / RAM. In the present embodiment, the control unit 270 includes a pickup control program for controlling each unit of the pickup device. FIG. 6 shows a functional block diagram of the pickup control program. As shown in the figure, the pickup control program 280 includes a semiconductor piece recognition unit 282, an adhesion state detection unit 284, and a parameter determination unit 286.

  The semiconductor piece recognition unit 282 recognizes the semiconductor piece to be picked up next based on the outline information of the semiconductor piece that is the analysis result of the imaging data of the upper imaging camera 140 processed by the image processing unit 210. The semiconductor piece recognition unit 282 controls the stage driving unit 230 based on the recognition result, and moves the stage 110 in the X direction and the Y direction so that the semiconductor piece to be picked up next is positioned on the push-up device 120. .

The adhesion state detection unit 284 detects the adhesion state of the semiconductor piece based on the analysis result of the imaging data of the lower imaging camera 150 processed by the image processing unit 210. The adhesion state of the back surface of the semiconductor piece is, for example, the adhesion state of the adhesion region P shown in FIG. 5, and here, the adhesion area Sp or the adhesion width Wp is detected as an index representing the adhesion state. As an example of the method for detecting the bonding area Sp or the bonding width Wp, the contour of the back surface of the semiconductor piece is extracted from the imaging data by performing an edge detection filter. For example, when one pixel is composed of n bits, one pixel data is represented by 2 ⁿ gradation data. As shown in FIG. 5, since a difference in density appears between the adhesion area P and the peeling area Q, a threshold value that defines a certain density is compared with pixel data, and the image data includes the corresponding value. The number of pixels having a threshold value or more, that is, the number of dark pixels is counted, and the total of the counted pixels is defined as an adhesion area Sp. At this time, the total of pixels in a region where pixels equal to or greater than the threshold value continue for a predetermined number of pixels or more may be determined as the adhesion area Sp.

  Further, when detecting the bonding width Wp, for example, the number of pixels that are continuous in the width direction may be detected as the bonding width Wp based on the position information of the pixel group detected as the bonding area Sp. In this case, the bonding width Wp may be a width at any angle in the left-right direction, the up-down direction, and the oblique direction with respect to the bonding region P, and the maximum width is not necessarily determined as the bonding width. That is, the width at an arbitrary angle may be determined as the bonding width Wp as long as the angle can be correlated with the size of the adhesive force and the size of the bonding area Sp.

  The parameter determination unit 286 determines an optimum parameter for controlling the pickup of the semiconductor piece based on the detection result of the adhesion state detection unit 284. In the present embodiment, the parameters for controlling the pickup are the suction force of the suction device 170, the amount of needle push-up of the push-up drive device 166, and the time interval until image processing of the next semiconductor piece by the upper imaging camera 140 is performed. It is. The adjustment of the time interval may be performed at any timing. For example, the start time of image processing by the image processing unit 210, the moving time of the stage 110 of the stage driving unit 230, and the like may be managed by a timer. In response to the detection of the adhesion state by the adhesion state detection unit 284, the parameter determination unit 286 reads the optimum parameter information from the storage unit 220, compares the detected adhesion state with the optimum parameter information, and is detected. The optimum parameters are determined according to the adhesion state. The parameter determined by the parameter determination unit 286 is provided to the adsorption pressure adjustment unit 250 and the push-up amount adjustment unit 260. The adsorption pressure adjustment unit 250 varies the adsorption pressure according to the determined parameter, and the push-up amount adjustment unit 260 changes the push-up amount according to the determined parameter.

  Next, the operation of the pickup device of this embodiment will be described. Defects in the pick-up process occur due to a phenomenon that the semiconductor piece cannot be recognized from the imaging data of the upper imaging camera 140 due to the inclination of the semiconductor piece, a phenomenon that two semiconductor pieces are taken, or the like. . The occurrence mechanism of these phenomena is caused by the amount D of peeling of the semiconductor piece from the adhesive tape (see FIG. 3) and the posture of the semiconductor piece. When the peel amount D is large, the posture of the semiconductor piece collapses and is lost or cannot be recognized by the imaging data, and adjacent semiconductor pieces are attracted to the collet at the time of pick-up and two pieces are generated. On the other hand, even if the peel amount D is small, the back surface of the semiconductor piece is not peeled off from the adhesive tape, resulting in missing.

  FIG. 7A shows an example in which the semiconductor piece by the collet 130 is missed when the amount D of peeling of the semiconductor piece is small. The small peel amount D means that the bonding area is large, and the adhesive strength between the back surface of the semiconductor piece 10A and the adhesive tape 30 is superior to the suction force of the collet 130, and the semiconductor piece 10A is lost. FIG. 7B shows an example in which the semiconductor piece 10B by the collet 130 is missed when the peeling amount D of the semiconductor piece 10B is large. Since the peeling amount D is large, the adhesive strength is weakened. If the posture of the semiconductor piece 10B is inclined due to this, the surface of the semiconductor piece 10B cannot be properly sucked by the collet 130, and the spilling occurs. FIG. 7C shows an example in which two semiconductor pieces are taken by the collet 130. When the amount D of peeling of the semiconductor piece 10C-2 is large and the posture thereof is slightly inclined toward the semiconductor piece 10C-1, the two semiconductor pieces 10C-1 and 10C-2 are simultaneously picked up by the collet 130. . FIG. 7D shows an example in which when the peel amount D of the semiconductor piece 10D is large, the semiconductor piece 10D cannot be recognized from the imaging data of the upper imaging camera 140 due to the inclination of the semiconductor piece 10D. Yes. The inclination of the posture of the semiconductor piece 10D is likely to occur particularly when the adjacent semiconductor piece is picked up, that is, when the adjacent semiconductor piece and the adhesive tape are pushed up by the needle. Such a defect is more likely to occur when the semiconductor piece has a large aspect ratio as shown in FIG. 2B than the semiconductor piece with a small aspect ratio.

  A semiconductor piece determined to be defective in the pickup process must be discarded, and a reduction in yield is inevitable. For this reason, in order to improve the yield, it is very important to reduce the occurrence rate of defects in the pickup process.

  The occurrence rate of defects in the conventional pick-up process differs between wafers and also within wafers. One of the reasons is that pickup is performed under the same pickup conditions even though the bonding state of the back surface of the semiconductor piece is different between wafers and also within the wafer surface. In other words, the pickup conditions cannot cope with variations in the bonding state between wafers or within a wafer. On the other hand, even when trying to cope with such a variation in the adhesion state, man-hours are required to adjust the pickup conditions, so it is very complicated to change the pickup conditions. Depends on experience. For the above reasons, automatically applying optimum pickup conditions to semiconductor pieces with different adhesion states is effective in improving the yield, and adjustment man-hours for changing pickup conditions and between workers The difference is reduced. Therefore, in the pickup device of this embodiment, parameters for adjusting the pickup conditions are automatically changed according to the bonding state of the semiconductor pieces.

  FIG. 8 is a flowchart for explaining a first method for automatically changing the pickup conditions of the pickup device of this embodiment. When the expanding process, which is the previous process, is completed (S100), the adhesive tape to which the semiconductor substrate having the expanded semiconductor interval is bonded is held by the ring-shaped holding member, and this holding member is placed on the stage 110 of the pickup apparatus 100. The pick-up operation is started under the control of the control unit 270 (S102).

  When the holding member including the semiconductor substrate is set on the stage 110, the upper imaging camera 140 and the lower imaging camera 150 respectively image the semiconductor substrate from above and below the stage 110, and the image processing unit 210 captures the image data. Image processing is performed. The semiconductor piece recognition unit 282 recognizes the next semiconductor piece to be picked up based on the analysis result of the image processing unit 210, the stage 110 is moved according to the recognition result, and the semiconductor piece is positioned on the push-up device 120. . Further, the adhesion state detection unit 284 detects the adhesion state between the back surface of the semiconductor piece and the adhesive tape based on the analysis result of the image processing unit 210 (S104). Here, the adhesion state detection unit 284 detects the adhesion state of the semiconductor piece to be picked up next recognized by the semiconductor piece recognition unit 282. The parameter determination unit 286 compares the adhesion state detected by the adhesion state detection unit 284 with the optimum parameter information read from the storage unit 220 (S106), and determines the optimum parameter according to the detected adhesion state. (S108). For example, when adjusting the push-up amount as a parameter, the parameter determination unit 286 selects an adhesion area that matches or is closest to the detected adhesion area Wp from the optimum parameter information, and corresponds to the selected adhesion area. Determine the push-up amount. Alternatively, when adjusting the adsorption pressure as a parameter, the parameter determination unit 286 determines the adsorption pressure corresponding to the adhesion area closest to or equal to the adhesion area Wp. Or when adjusting a time interval as a parameter, the parameter determination part 286 determines the time interval applicable to the adhesion area which is the closest to the adhesion area Wp. The parameter determination unit 286 may determine not only one parameter but also two or three parameters at the same time. That is, determine each parameter of the thrust amount and adsorption pressure, determine each parameter of the thrust amount and time interval, determine each parameter of the adsorption pressure and time interval, or determine the thrust amount, Three parameters may be determined: adsorption pressure and time interval.

  When the parameter is determined by the parameter determination unit 286, the semiconductor piece is picked up at the push-up amount, adsorption pressure or time interval adjusted according to the parameter (S110). Next, it is determined whether or not the pickup of all the semiconductor pieces in the semiconductor substrate has been completed (S112). If there is a semiconductor piece that has not been picked up, the operation from step S104 is repeated, When all the semiconductor pieces have been picked up, the flow ends.

  Next, each parameter will be described. FIG. 9 is a diagram illustrating the pickup when the needle protrusion amount is adjusted. As shown in the figure, the push-up driving device 166 varies the push-up amount V of the needle 164 protruding from the surface of the needle cap 160 according to the parameter determined by the parameter determining unit 286. That is, when the adhesion area of the back surface of the semiconductor piece is large, the push-up amount V is increased, and conversely, when the adhesion area is small, the push-up amount V is decreased, so that the peeling amount D is controlled according to the adhesion area. Is done. As a result, the occurrence of defects as shown in FIG. 7 is suppressed.

  FIG. 10 is a diagram illustrating the pickup when the adsorption pressure of the thrusting device is adjusted. As shown in the figure, the adsorption device 170 varies the adsorption pressure for adsorbing the back surface of the adhesive tape 30 from the adsorption hole 168 according to the parameter determined by the parameter determination unit 286. That is, when the adhesion area of the back surface of the semiconductor piece is large, the adsorption pressure is increased, and conversely, when the adhesion area is small, the adsorption pressure is decreased, so that the adsorption pressure for pulling the adhesive tape 30 in the peeling direction can be varied. The peel amount D is controlled according to the adhesion area.

  FIG. 11 is a diagram illustrating the pickup when the time interval is adjusted. First, in FIG. 11A, when the semiconductor piece 10A is picked up, the semiconductor piece 10A and the adhesive tape 30 are pushed up by the needle 164. At that time, the adjacent semiconductor piece 10B is inclined by the adhesive tape 30 being deformed into a convex shape. Immediately after the pickup of the semiconductor piece 10A, as shown in FIG. 11B, when the adhesive tape 30 starts to return to its original state and a certain time has passed, the original tape is completely restored as shown in FIG. 11C. Return to the state. When the bonding area of the semiconductor piece 10B is small, the bonding strength is weak and it takes time until the posture of the semiconductor piece 10B returns to the original state. However, if the bonding area of the semiconductor piece 10B is large, the posture of the semiconductor piece 10B is the original. Time to return to the state is shortened. If the posture of the semiconductor piece 10B is poor, the upper imaging camera 140 may not be able to accurately recognize the semiconductor piece 10B, or the semiconductor piece 10B may not be accurately positioned and may not be attracted by the collet 130. For this reason, a time interval is adjusted according to the adhesion area of a semiconductor piece. This time interval is a period from the time when the semiconductor piece 10A is pushed up until the next semiconductor piece 10B is image-recognized, and the time may be adjusted at any time within this period. Moreover, when determining the parameter of a time interval, it is necessary to detect the adhesion state of the adjacent semiconductor piece 10B. Therefore, the adhesion state detection unit 284 simultaneously detects the adhesion state of the semiconductor piece 10A to be picked up and the adhesion state of the next adjacent semiconductor piece 10B, or determines the adhesion state of the semiconductor piece 10A as the adhesion state of the semiconductor piece 10B. May be considered.

  By such a method, the adhesion state of each semiconductor piece is detected, and the parameter is changed according to the detected adhesion state. Therefore, when the number of semiconductor pieces in the semiconductor substrate is large, the pickup process is completed. Although the time is long, even if there are variations in the bonding state of the semiconductor pieces in the semiconductor substrate, the pick-up operation corresponding to each bonding state is performed, so that the occurrence of defects in the pick-up process is suppressed.

  FIG. 12 shows a second method for automatically changing the pickup conditions of the pickup device of this embodiment. The first method shows an example in which the parameter is changed while detecting the bonding state of the semiconductor piece to be picked up. However, the second method detects the bonding state of the semiconductor piece in advance, and then removes the semiconductor piece. When picking up, the parameters are changed according to the bonding state of the semiconductor piece. When the expanding step is completed (S200), the holding member that holds the semiconductor substrate and the adhesive tape is set on the stage of the pickup device (S202). Next, the control unit 270 detects the bonding state of all the semiconductor pieces in the semiconductor substrate as pre-processing for pickup. First, the lower imaging camera 150 images the entire back surface of the semiconductor substrate from below the stage 110, and the image processing unit 210 performs image analysis on the imaging data. The adhesion state detection unit 284 detects the adhesion state of all the semiconductor pieces in the semiconductor substrate based on the analysis result from the image processing unit 210 (S204), and stores the detected adhesion state in association with each semiconductor piece. The data is stored in the unit 220 (S206). When the preprocessing is completed in this way, the semiconductor piece pick-up is started. When the semiconductor piece to be picked up is recognized by the semiconductor piece recognition unit 282, the adhesion state detection unit 284 reads the adhesion state corresponding to the recognized semiconductor piece from the storage unit 220 (S208), and this adhesion state and optimum parameter information. (S210), a parameter corresponding to the adhesion state is determined (S212), and a semiconductor piece is picked up according to the parameter (S214). Thereafter, the processes from step S208 to S214 are repeated until the pickup of all the semiconductor pieces in the semiconductor substrate is completed.

  As described above, according to the second method, the time required for the pickup operation can be shortened by detecting the bonding state of each semiconductor piece on the semiconductor substrate in advance as preprocessing. Note that when the bonding state of the semiconductor pieces is detected in advance as in the second method, step S204 may be performed prior to step S202. That is, before setting the holding member for holding the semiconductor substrate and the adhesive tape to the pickup device, the back side of the semiconductor substrate may be observed with an imaging camera to detect the bonding state of each semiconductor piece.

  Next, the third method will be described. The first and second methods detect the bonding state of each semiconductor piece and change the parameters of each semiconductor piece. The third method detects the bonding state of the semiconductor piece on a substrate basis, and Change the parameter. When detecting the bonding state of a semiconductor piece on a substrate basis, one or more representative semiconductor pieces of the semiconductor substrate are selected, and the bonding state of the selected semiconductor piece is set as the bonding state of the substrate. Also in the third method, as in the second method, the adhesion state of the substrate unit is detected in advance and stored in the storage unit 220, and when the target substrate is picked up, the storage unit 220 is stored. The adhesion state of the corresponding substrate may be read out from.

  Next, a method for detecting the adhesion state of the substrate unit will be described. In FIG. 13A, the bonding state of the semiconductor pieces positioned in the radial direction of the semiconductor substrate is the bonding state of the substrate unit. For example, the bonding state of the semiconductor piece 10a located at a substantially intermediate point ra in the radial direction is detected and set as the bonding state of the substrate. The reason for this is that when the adhesive tape is expanded in the expanding step, the expansion of the adhesive tape is not necessarily uniform, and the peripheral portion tends to be larger than the central portion. As a result, the bonding area of the peripheral semiconductor piece tends to be smaller than that of the central piece. Therefore, an average adhesion state between the central portion and the peripheral portion is detected by detecting the adhesion state of the semiconductor piece 10a at the radial intermediate point ra.

  Moreover, the adhesion state of the several semiconductor piece in a board | substrate may be detected, and the adhesion state of a board | substrate unit may be calculated | required from this detection result. For example, the bonding state of a plurality of semiconductor pieces positioned in one radial direction, the bonding state of a plurality of semiconductor pieces positioned in a plurality of radial directions, or a plurality of random positions on a substrate The bonding state of the semiconductor pieces is detected, and the average bonding state of these detection results is calculated. FIG. 13B detects the bonding state of the semiconductor pieces 10a, 10b, and 10c at the three points ra, rb, and rc in the radial direction, and calculates the bonding state for each substrate from the detection result. In the present specification, “average” does not mean only a simple arithmetic average of the detected adhesion state, but the center of the range of the maximum value and the minimum value of the detected value divided into three equal parts. Any value may be used as long as the value falls within the range of 1/3 of the detected value, and other detected values other than the maximum value and the minimum value among the detected values may be used.

  According to the third method, when there is a difference in the bonding state of the semiconductor pieces between the semiconductor substrates, by changing the parameter according to the bonding state for each semiconductor substrate, the occurrence of a pickup defect is suppressed for each substrate. Is done. Compared with the first and second methods, the parameter change is performed only once for each semiconductor substrate, so that the time required for picking up one semiconductor substrate is shortened.

  Next, the fourth method will be described. In the third method, the bonding state is detected in units of semiconductor substrates and the parameters are changed. In the fourth method, the bonding state is detected for a plurality of semiconductor pieces of the semiconductor substrate, in other words, in units of regions of the semiconductor substrate. Change the parameters. In FIG. 14A, the semiconductor substrate is divided into a plurality of concentric regions, and an average adhesion state is obtained from the adhesion state of one or a plurality of semiconductor pieces included in each region, and this is determined as the adhesion of each region. State. 14B is divided into a plurality of rectangular regions, and an average adhesion state is calculated from the adhesion state of one or a plurality of semiconductor pieces included in each region, and this is bonded to each region. State. Also in the case of the fourth method, as in the second method, the adhesion state of the region unit of the semiconductor substrate is stored in the storage unit 220 in advance, and when the semiconductor piece in the corresponding region is picked up, the adhesion of the region is performed. Read the status and change the parameters for each area.

  According to the fourth method, even when there is a difference in the adhesion state between the regions in the semiconductor substrate, the parameter is changed according to the adhesion state of the region, so that the defect is smaller than the parameter is changed in units of the substrate. Pickup control that suppresses the occurrence is performed. In addition, the time required for pickup is reduced as compared with the first and second methods.

  Next, a second embodiment of the present invention will be described. In the first embodiment, the back side of the semiconductor piece is observed from the imaging data obtained by imaging the back side of the semiconductor substrate through the adhesive tape, and the adhesion state of the semiconductor piece is detected. The adhesion state of the semiconductor piece is detected from the surface side of the semiconductor substrate. FIG. 15 shows a plan view of the semiconductor piece on the surface of the semiconductor substrate after the expanding step. As shown in FIG. 2, the semiconductor pieces 10 are separated by the interval S, but the interval S is expanded to the interval Se by the expanding process. This interval Se has a certain correlation with the adhesion state of the back surface of the semiconductor piece. FIG. 16 is a graph showing the relationship between the bonding width Wp of the bonding region P of the semiconductor piece shown in FIG. 5 and the interval Se between the semiconductor pieces on the substrate surface side. As is apparent from the figure, it can be seen that there is a correlation between the adhesion width Wp and the interval Se. That is, the smaller the adhesion width Wp on the back surface of the semiconductor piece, the larger the interval Se, and the larger the adhesion width Wp, the smaller the interval Se. If the adhesion width Wp on the back surface of the semiconductor piece is small, the adhesive force is small and the interval Se is large. If the adhesive width Wp is large, the adhesive force is large and the interval Se is small. As described above, since the adhesion width Wp and the interval Se are in an inversely proportional relationship, the surface of the semiconductor substrate is imaged with the imaging camera without observing the back side of the semiconductor substrate with the imaging camera. The adhesion state of the back surface is detected.

  FIG. 17 is a schematic perspective view of the pickup device according to the second embodiment, and the same components as those in FIG. 1 are denoted by the same reference numerals. The pickup device 100A of the second embodiment has a configuration substantially similar to that of the pickup device of the first embodiment, except for the lower imaging camera 150.

  FIG. 18 shows a flowchart for automatically changing the pickup conditions according to the second embodiment. This flow corresponds to the first method (FIG. 8) of the first embodiment. After the expanding step (S300), the holding device holding the adhesive tape including the semiconductor device is set on the stage 110 of the pickup device 100A (S302), and the pickup operation is started. The upper imaging camera 140 images the surface side of the semiconductor substrate (S304), the captured image data is analyzed by the image processing unit 210, and the analysis result is provided to the semiconductor piece recognition unit 282 and the adhesion state detection unit 284. The semiconductor piece recognition unit 282 recognizes the next semiconductor piece to be picked up (S306), and based on the recognition result, the stage driving unit 230 moves the stage 110 in the X and Y directions and positions the semiconductor piece on the push-up device 120. To do. In parallel with this, the adhesion state detection unit 284 detects the interval Se between the semiconductor pieces (S306). For example, edge detection is performed on the imaging data to detect the outer shape of each semiconductor piece, and the number of pixels between the detected outer shapes is defined as the interval Se of the semiconductor pieces. The adhesion state detection unit 284 further detects the adhesion width Wp or the adhesion area of the back surface of the semiconductor piece using the correlation shown in FIG. 16 (S308). The subsequent processing from step S310 to S316 is the same as in the first embodiment. The second embodiment can also be applied to the second to fourth methods described in the first embodiment.

  According to the second embodiment, since the adhesion state of the back surface of the semiconductor piece is detected using image data obtained by the upper imaging camera 140, the pickup device 100A can be reduced in size and cost.

  The “adhesion state” in this specification may be rephrased as “adhesive strength” or “a state having a correlation with the adhesive strength”. Furthermore, “adhesive state”, “adhesive strength”, or “correlation with adhesive strength” is “adhesive area size”, “adhesive width size” or “interval between semiconductor pieces” May be rephrased as “the size of”.

  Further, in the above-described embodiment, the bonding state of the semiconductor piece is detected using the imaging data of the imaging camera. However, the operator visually confirms the bonding state, and based on the confirmation result, the operator performs an operation related to the pickup on the pickup device. And the pickup apparatus may be operated based on the setting.

  Further, in the above embodiment, as the adhesive tape to be attached to the back surface of the semiconductor substrate, the dicing tape or the expanding tape is exemplified, but the adhesive tape only needs to have the same function as these, for example, Any substrate may be used as long as it has a flexible substrate and an adhesive layer or adhesive layer formed on the surface thereof. Further, the name of the adhesive tape is not limited to the tape, and may be a sheet-like holding member such as a resin or a film. Furthermore, the pressure-sensitive adhesive layer or adhesive layer that is in close contact with the substrate may be a material such as an ultraviolet curable material, a material that is not an ultraviolet curable material, an epoxy resin, or the like.

  As mentioned above, although embodiment of this invention was explained in full detail, each function and each function and structure disclosed by embodiment can be combined in the range in which the effect | action and effect do not contradict. In addition, the present invention is not limited to a specific embodiment, and various modifications and changes can be made within the scope of the gist of the present invention described in the claims.

100, 100A: Pickup device 110: Stage 120: Pushing device 130: Collet 140: Upper imaging camera 150: Lower imaging camera 160: Needle cap 162: Through hole 164: Needle 166: Pushing drive device 168: Suction hole 170: Adsorption device

According to a first aspect of the present invention, in the state in which the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded, the detection of the interval between the semiconductor pieces is detected. A semiconductor manufacturing apparatus comprising: means; and pick-up means for changing an amount of protrusion within the same substrate so that the semiconductor piece with the detected interval being narrower has a larger amount of protrusion of the semiconductor piece.
According to a second aspect of the present invention, in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded, the intervals between the semiconductor pieces are set to The detection means for detecting each area of the size including the semiconductor piece, and the area of the same substrate so that the amount of protrusion of the semiconductor piece increases as the detected interval is narrower. A semiconductor manufacturing apparatus comprising: pickup means for changing the amount.
According to a third aspect of the present invention, the detection of detecting the interval between the semiconductor pieces in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded. And a pick-up means for changing the adsorption pressure in the same substrate so that the semiconductor piece having the narrower detected interval has a larger adsorption pressure for adsorbing the holding member downward when the semiconductor piece is pushed up. A semiconductor manufacturing apparatus comprising:
According to a fourth aspect of the present invention, in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded, the intervals between the semiconductor pieces are set to The detecting means for detecting each area of the size including the semiconductor piece, and the area where the detected interval is narrower, the suction pressure to the holding member when the semiconductor piece is pushed up and picked up is increased. Pick-up means for changing the adsorption pressure for each region in the same substrate.
According to a fifth aspect of the present invention, in a state where a holding member that holds a substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on an adhesive layer is expanded, detection for detecting the interval between the semiconductor pieces is detected. And a pick-up means for changing a time interval for picking up the semiconductor piece in the same substrate so that a semiconductor piece having a smaller detected interval is picked up at a short time interval after the adjacent semiconductor piece is picked up, A semiconductor manufacturing apparatus comprising:
According to a sixth aspect of the present invention, in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded, the intervals between the semiconductor pieces are set to a plurality of intervals. The detecting means for detecting each region of the size including the semiconductor piece, and the region in which the detected interval is narrower, the adjacent semiconductor pieces are picked up at a short time interval after being picked up. Pick-up means for changing the time interval for each region.
According to a seventh aspect of the present invention, the step of detecting the interval between the semiconductor pieces in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded. In addition, the step of detecting the interval between the plurality of substrates expanded at the same expansion rate, and the substrate for each of the substrates so that the amount of protrusion of the semiconductor piece increases as the detected interval decreases. And a step of picking up the semiconductor piece by changing an amount to be raised.
According to an eighth aspect of the present invention, in the process of detecting the interval between the semiconductor pieces in a state where the holding member that holds the substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded. The step of detecting the interval between the plurality of substrates expanded at the same expansion rate, and the substrate having a narrower detected interval has an adsorption pressure that adsorbs the holding member downward when the semiconductor piece is pushed up. And a step of picking up the semiconductor piece by changing the adsorption pressure for each of the substrates so as to be large.
According to a ninth aspect of the present invention, in a state in which a holding member that holds a substrate separated into a plurality of semiconductor pieces of the same size aligned at the same interval on the adhesive layer is expanded, the interval between the semiconductor pieces is detected. The step of detecting the intervals in the plurality of substrates expanded at the same expansion rate, and the semiconductor for each substrate so that the semiconductor pieces are picked up at shorter time intervals as the detected intervals are narrower And a step of picking up the semiconductor piece by changing a time interval for picking up the piece.

Claims (9)

In a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, a detecting means for detecting the interval between the semiconductor pieces,
Pick-up means for changing the amount of protrusion in the same substrate so that the semiconductor piece with the detected interval is narrower, the amount of protrusion of the semiconductor piece is larger;
A semiconductor manufacturing apparatus comprising: Detection in which the interval between the semiconductor pieces is detected for each area including a plurality of the semiconductor pieces in a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded. Means,
Pickup means for changing the amount of protrusion for each region in the same substrate so that the amount of protrusion of the semiconductor piece increases as the detected interval is narrower,
A semiconductor manufacturing apparatus comprising: In a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, a detecting means for detecting the interval between the semiconductor pieces,
Pickup means for changing the adsorption pressure in the same substrate so that the semiconductor piece with the detected interval is narrower, the adsorption pressure for adsorbing the holding member downward when the semiconductor piece is pushed up is increased.
A semiconductor manufacturing apparatus comprising: Detection in which the interval between the semiconductor pieces is detected for each area including a plurality of the semiconductor pieces in a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded. Means,
Pickup means for changing the adsorption pressure for each of the regions in the same substrate, so that the region where the detected interval is narrower, the adsorption pressure to the holding member when the semiconductor piece is pushed up and picked up is increased,
A semiconductor manufacturing apparatus comprising: In a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded, a detecting means for detecting the interval between the semiconductor pieces,
The pick-up means for changing the time interval for picking up the semiconductor piece in the same substrate so that the semiconductor piece with the detected interval narrower is picked up at a short time interval after the adjacent semiconductor piece is picked up,
A semiconductor manufacturing apparatus comprising: Detection in which the interval between the semiconductor pieces is detected for each area including a plurality of the semiconductor pieces in a state where the holding member that holds the substrate separated into semiconductor pieces on the adhesive layer is expanded. Means,
Pickup means for changing the time interval for each of the regions in the same substrate, so that the region where the detected interval is narrower is picked up at a short time interval after the adjacent semiconductor piece is picked up,
A semiconductor manufacturing apparatus comprising: In a state in which a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, the interval between the semiconductor pieces is detected, and each substrate having semiconductor pieces of the same size is used. Detecting the interval;
The step of picking up the semiconductor piece by changing the amount of protrusion for each of the substrates, so that the amount of protrusion of the semiconductor piece increases as the detected interval is narrower,
A method of manufacturing a semiconductor piece. In a state in which a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, the interval between the semiconductor pieces is detected, and each substrate having semiconductor pieces of the same size is used. Detecting the interval;
Picking up the semiconductor piece by changing the adsorption pressure for each of the substrates so that the closer the detected interval is, the larger the adsorption pressure that adsorbs the holding member downward when the semiconductor piece is pushed up. Process,
A method of manufacturing a semiconductor piece. In a state in which a holding member that holds a substrate separated into semiconductor pieces on an adhesive layer is expanded, the interval between the semiconductor pieces is detected, and each substrate having semiconductor pieces of the same size is used. Detecting the interval;
The step of picking up the semiconductor piece by changing the time interval of picking up the semiconductor piece for each substrate, so that the substrate having a narrower detected interval is picked up at a short time interval,
A method of manufacturing a semiconductor piece.

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