JP2016175318A - Manufacturing apparatus and manufacturing method of film coating component - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase manufacturing efficiency by shortening a vacuum suction time with a simple structure, and achieve reduction of cost of installation.SOLUTION: A manufacturing apparatus 10 of a film coating component W includes: an upper chamber 1 and a lower chamber 2 capable of being connected and separated in the vertical direction; first vacuum circuits 11, 21 and air circuits 12, 22 connected to each of the chambers; a heater 3 installed in the upper chamber 1; a table 4 arranged in the lower chamber 2 so as to elevate and lower; and a table driving device 5 for elevating and lowering the table. The manufacturing apparatus 10 bonds by pressure difference a film material F which is held between the upper chamber and the lower chamber and softened by heating, to a surface of a substrate K placed on the table elevated to a prescribed position with the table driving device. The lower chamber is provided with a second vacuum circuit 91 which is connected to an airtight chamber 9 formed between the film material and the table when elevating the table to a prescribed position with the table driving device, and is formed so as to lower pressure in the airtight chamber to a target high vacuum state.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a manufacturing apparatus and a manufacturing method for a film-covered part formed by sticking a heat-softened film material to a base material by a pressure difference, and particularly relates to a manufacturing apparatus and a manufacturing method for a film covering part for a large vehicle.

  For example, Patent Document 1 discloses a manufacturing apparatus and a manufacturing method for a film-covered part that is formed by sticking a heat-softened film material to a base material by a pressure difference. The manufacturing apparatus and manufacturing method are shown in FIGS. As shown in FIGS. 11 to 16, the manufacturing apparatus includes an upper chamber 101a and a lower chamber 101b that can be joined and separated in the vertical direction, a vacuum circuit and an air circuit 104 connected to each chamber, A vacuum tank 105, a pressurized air tank 106 connected to the circuit, a heater 107 mounted in the upper chamber 101a, a table 108 arranged to be movable up and down in the lower chamber 101b, and an upper chamber for moving the upper chamber 101a up and down A driving device 101c and a table driving device 101d for raising and lowering the table 108 are provided.

  Moreover, the manufacturing method of the said film covering component is comprised from the process described below. That is, as shown in FIG. 11, the base material 102 and the film material 103 are set in the separated upper chamber 101a and lower chamber 101b (setting process). Next, as shown in FIG. 12, the upper chamber 101a is lowered, the upper and lower chambers are joined to close each room, and each room is sucked from the atmospheric pressure state to the vacuum state by the vacuum tank 105 together. (Vacuum suction process). Next, as shown in FIG. 13, the heater 107 is turned on while the chambers of the upper and lower chambers are vacuumed to heat the film material 103 (film heating process). At this time, in order to prevent excessive dripping of the heat-softened film material 103, the gas stored in the gas supply chamber 109 is sent into the lower chamber 101b to adjust the pressure difference in the upper and lower chambers. Next, as shown in FIG. 14, the table 108 in the lower chamber 101b is raised to a predetermined position (table raising step). Next, as shown in FIG. 15, when the interior of the upper and lower chambers reaches a target high vacuum state, the vacuum in the upper chamber 101a is released and air is introduced to create a pressure difference between the front and back of the film material 103. Thus, the film material 103 is pressed against and adhered to the base material 102 (film attaching step). At this time, the pressure in the lower chamber 101b remains in a high vacuum state. In addition, in order to improve the adhesiveness of the film material 103 to the base material 102, the pressurized air tank 106 can be open | released and the gas more than atmospheric pressure can also be sent in in the upper chamber 101a. Next, as shown in FIG. 16, when the attachment of the film material 103 to the base material 102 is completed, the heater 107 is turned off, the vacuum in the lower chamber 101b is released to return to the atmospheric pressure state, and the upper chamber 101a is raised, and the product in which the base material 102 is coated with the film material 103 is taken out (product take-out step).

JP 2002-67137 A

However, the film-coated component manufacturing apparatus and method described in Patent Document 1 have the following problems.
That is, in order to adhere the film material 103 to the base material 102 uniformly and reliably in the film attaching process shown in FIG. 15, the vacuum suction process and the film heating process shown in FIGS. It is necessary to bring the pressure of the target to a target high vacuum state (for example, about 50 to 100 Pa), and when the upper and lower chambers have a large volume, it takes a long time to reach the target pressure and the production efficiency decreases. was there.
Moreover, in order to make the pressure in the upper and lower chambers reach the target high vacuum state in a short time, it is necessary to provide a high performance vacuum pump. Furthermore, in order for the upper and lower chambers to withstand the strength of high vacuum pressure, it is necessary to increase the rigidity of the chamber walls by increasing their thickness. Therefore, there has been a problem that the equipment costs for the vacuum pump, the upper and lower chambers, the upper chamber driving device, and the like increase.
In particular, with the recent increase in size and integration of vehicle parts, there is a high demand for handling large film-coated parts. Therefore, in a production apparatus and a production method for a film covering component for a vehicle, a technology for improving production efficiency and a technology for reducing equipment costs that can cope with an increase in volume of the upper and lower chambers are desired.

  The present invention has been made to solve the above-described problems, and manufactures a film-coated component in which a film material gripped between an upper chamber and a lower chamber and heated and softened is adhered to a substrate by a pressure difference. An object of the apparatus and the manufacturing method is to reduce the vacuum suction time with a simple structure to increase production efficiency and to reduce the equipment cost.

In order to solve the above problems, a film-coated component manufacturing apparatus and method according to the present invention have the following configuration.
(1) An upper chamber and a lower chamber that can be joined and separated in the vertical direction, a first vacuum circuit and an air circuit connected to each chamber, and a heater mounted in the upper chamber or the lower chamber And a table disposed in the lower chamber so as to be movable up and down, and a table driving device for raising and lowering the table, and the base material placed on the table raised to a predetermined position by the table driving device. An apparatus for producing a film-coated component, wherein a film material gripped between the upper chamber and the lower chamber and softened by heating is adhered to a surface by a pressure difference,
The lower chamber communicates with an airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device, and the pressure in the airtight chamber is set to a target high vacuum state. And a second vacuum circuit formed so as to be lowered.

In the present invention, the lower chamber communicates with the airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device, and the pressure in the airtight chamber is set to the target high vacuum state. Since the second vacuum circuit formed so as to be able to be lowered is provided, the upper and lower chambers are joined and closed, the first vacuum circuit is operated, the heater is turned on, and the upper and lower chambers are vacuumed to suck the film material. When the temperature of the upper and lower chambers is softened by heating to a predetermined temperature at which it can be attached to the base material, the first vacuum circuit is stopped in a moderate vacuum state before the pressure in the upper and lower chambers reaches the target high vacuum state, and the table After the table is raised to a predetermined position by the driving device, the second vacuum circuit communicating with the hermetic chamber is operated to cause the pressure in the hermetic chamber to reach the target high vacuum state in a short time. Door can be. If the pressure in the hermetic chamber can reach the target high vacuum state, the upper chamber can be opened to the atmosphere, and the heat-softened film material can be attached to the substrate by the pressure difference. Here, since the volume of the hermetic chamber is much smaller than the volume of the upper and lower chambers, the vacuum chamber is continuously vacuumed by the first vacuum circuit even after the table is raised to a predetermined position. The time required for the pressure in the hermetic chamber to reach the target high vacuum state from the medium vacuum state by the second vacuum circuit is longer than the time required for the pressure in the upper and lower chambers to reach the target high vacuum state from the medium vacuum state. It is clearly shorter. As a result, the vacuum suction time required for attaching the film material to the substrate can be greatly shortened.
In addition, the upper and lower chambers need only be able to withstand moderate vacuum pressures, so the upper and lower chambers need not be made more rigid than necessary, and the equipment costs of the upper and lower chambers and the upper chamber drive device are reduced. can do. In addition, the first vacuum circuit only needs to be able to lower the pressure in the upper and lower chambers to a moderate vacuum state, so the vacuum pump connected to the first vacuum circuit does not have to be improved more than necessary. An inexpensive vacuum pump can be used.
Therefore, according to the present invention, in a film-coated component manufacturing apparatus in which a film material gripped between an upper chamber and a lower chamber and heated and softened is adhered to a substrate by a pressure difference, a vacuum suction time is obtained with a simple structure. Can be shortened to increase production efficiency and reduce equipment costs.

(2) In the film coated component manufacturing apparatus described in (1),
The second vacuum circuit is characterized in that a first vent hole formed in the lower chamber and a second vent hole formed in the table are connected by piping to communicate with the hermetic chamber.

In the present invention, the second vacuum circuit is connected to the airtight chamber by connecting the first vent hole formed in the lower chamber and the second vent hole formed in the table to the hermetic chamber. Can follow. Therefore, the vacuum suction time required for sticking the film material to the substrate can be shortened without complicating the second vacuum circuit.
As a result, the vacuum suction time can be shortened with a simpler structure to increase production efficiency, and the equipment cost can be reduced.

(3) In the film-coated component manufacturing apparatus described in (2),
A pipe connecting the first vent hole and the second vent hole is provided along the table, and the pipe is formed so as to be connectable to the first vent hole when the table is raised to a predetermined position. It is characterized by that.

In the present invention, a pipe connecting the first vent hole and the second vent hole is provided along the table, and the pipe is formed to be connectable to the first vent hole when the table is raised to a predetermined position. Therefore, the piping does not extend or bend with respect to the lifting and lowering operation of the table. Therefore, it can be easily avoided that the piping and the lower chamber wall, the table driving device, and the like interfere with the raising / lowering operation of the table, thereby damaging the piping and causing the malfunction of the table driving device.
As a result, the vacuum suction time can be shortened with a much simpler piping structure to increase production efficiency, and the equipment cost can be reduced.

(4) In the film-coated component manufacturing apparatus described in (1),
The second vacuum circuit is characterized in that it communicates with the hermetic chamber through a third vent formed in a film receiving portion of the lower chamber.

In the present invention, the second vacuum circuit is communicated with the hermetic chamber through the third vent formed in the film receiving portion of the lower chamber, so that piping for connecting the table and the lower chamber can be omitted. it can. Therefore, the second vacuum circuit and the hermetic chamber can be communicated with each other with a simpler structure without being affected by the lifting / lowering operation of the table.
As a result, the vacuum suction time can be shortened with a much simpler structure to increase the production efficiency and the equipment cost can be reduced.

(5) In the film-coated component manufacturing apparatus described in any one of (1) to (4),
The second vacuum circuit includes a vacuum preliminary tank connected to a vacuum pump.

In the present invention, the second vacuum circuit is provided with a vacuum preliminary tank connected to a vacuum pump, so the upper and lower chambers are joined and closed, the first vacuum circuit is operated, and the heater is turned on, The pressure in the vacuum pre-tank is adjusted to the target level until the pressure in the upper and lower chambers reaches a moderate vacuum state, or until the film material is heated and softened to a predetermined temperature. It can be reduced to a high vacuum state or lower. Therefore, after the pressure in the upper and lower chambers reaches a moderate vacuum state, or after the film material is heated and softened to a predetermined temperature, the table is raised to a predetermined position at the same time or afterwards. By opening and operating the second vacuum circuit, the pressure in the hermetic chamber can reach the target high vacuum state in a shorter time. As a result, the simple structure of providing a vacuum pre-tank connected to the vacuum pump in the second vacuum circuit further reduces the vacuum suction time required to attach the film material to the base material, thereby improving production efficiency. And the equipment cost can be reduced.
Note that the vacuum pump connected to the vacuum preparatory tank can be shared with the vacuum pump connected to the first vacuum circuit, so that the facility cost can be further reduced.

(6) Upper and lower chambers that can be joined and separated in the vertical direction, a first vacuum circuit and an air circuit connected to each chamber, and a heater mounted in the upper chamber or the lower chamber And a table disposed in the lower chamber so as to be movable up and down, and a table driving device for raising and lowering the table, and the base material placed on the table raised to a predetermined position by the table driving device. A method for producing a film-coated component, wherein a film material that is gripped between the upper chamber and the lower chamber and softened by heating is adhered to a surface by a pressure difference,
The lower chamber includes a second vacuum circuit communicating with an airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device. After the vacuum circuit is activated and the pressure in the upper and lower chambers reaches an intermediate vacuum state lower than the target high vacuum state, the first vacuum circuit is stopped and the table is raised to a predetermined position. Then, the second vacuum circuit is operated to bring the pressure in the hermetic chamber to a target high vacuum state.

In the present invention, the lower chamber is provided with a second vacuum circuit communicating with an airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device. After the vacuum circuit is activated and the pressure in the upper and lower chambers reaches an intermediate vacuum state lower than the target high vacuum state, the first vacuum circuit is stopped and the table is raised to a predetermined position. Since the vacuum circuit of No. 2 is operated to reach the target high vacuum state, the vacuum suction time required for adhering the film material to the substrate is determined by the first vacuum circuit by the upper and lower chambers. The time required for the internal pressure to reach the intermediate vacuum state from the atmospheric pressure state and the time required for the pressure in the hermetic chamber to reach the target high vacuum state from the intermediate vacuum state by the second vacuum circuit. It becomes the result of the addition of the between. Here, since the volume of the hermetic chamber is much smaller than the volume of the upper and lower chambers, the inside of the upper and lower chambers is continuously vacuumed by the first vacuum circuit, and the pressure is changed from a moderate vacuum state to a target high level. The time for the pressure in the hermetic chamber to reach the target high vacuum state from the intermediate vacuum state by the second vacuum circuit is clearly shorter than the time for reaching the vacuum state. As a result, the vacuum suction time required for attaching the film material to the substrate can be greatly shortened.
In addition, the upper and lower chambers need only be able to withstand moderate vacuum pressures, so the upper and lower chambers need not be made more rigid than necessary, and the equipment costs of the upper and lower chambers and the upper chamber drive device are reduced. can do. In addition, the first vacuum circuit only needs to be able to lower the pressure in the upper and lower chambers to a moderate vacuum state, so the vacuum pump connected to the first vacuum circuit does not have to be improved more than necessary. An inexpensive vacuum pump can be used.
Therefore, according to the present invention, in a method for manufacturing a film-coated component in which a film material gripped between an upper chamber and a lower chamber and heated and softened is adhered to a substrate by a pressure difference, a vacuum suction time is obtained with a simple structure. Can be shortened to increase production efficiency and reduce equipment costs.

(7) In the method for producing a film-coated component described in (6),
The second vacuum circuit includes a vacuum preliminary tank connected to a vacuum pump.

In the present invention, the second vacuum circuit is provided with a vacuum reserve tank connected to a vacuum pump, so that the upper and lower chambers are joined and closed, the first vacuum circuit is operated, and the pressure in the upper and lower chambers is increased. Prior to or before reaching a moderate vacuum, the pressure in the vacuum reserve tank can be reduced to a target high vacuum or lower. Therefore, after allowing the pressure in the upper and lower chambers to reach a moderate vacuum state, simultaneously with or after raising the table to a predetermined position, by opening the vacuum preliminary tank and operating the second vacuum circuit, The pressure in the airtight chamber can be reached to the target high vacuum state in a shorter time. As a result, the simple structure of providing a vacuum pre-tank connected to the vacuum pump in the second vacuum circuit further reduces the vacuum suction time required to attach the film material to the base material, thereby improving production efficiency. And the equipment cost can be reduced.
Note that the vacuum pump connected to the vacuum preparatory tank can be shared with the vacuum pump connected to the first vacuum circuit, so that the facility cost can be further reduced.

  According to the present invention, in a manufacturing apparatus and a manufacturing method for a film-covered part in which a film material gripped between an upper chamber and a lower chamber and heated and softened is adhered to a substrate by a pressure difference, vacuum suction is performed with a simple structure. It is possible to shorten the time and increase the production efficiency and reduce the equipment cost.

It is typical sectional drawing at the time of the base material and film material set of the manufacturing apparatus of the film covering component which concerns on embodiment of this invention. It is typical sectional drawing at the time of the vacuum suction in an upper and lower chamber in the manufacturing apparatus shown in FIG. 1, and a film material heating. It is typical sectional drawing at the time of the table rise in the manufacturing apparatus shown in FIG. It is typical sectional drawing at the time of the vacuum suction of the airtight chamber in the manufacturing apparatus shown in FIG. It is typical sectional drawing at the time of upper chamber air release in the manufacturing apparatus shown in FIG. It is typical sectional drawing at the time of product taking-out of the manufacturing apparatus shown in FIG. It is a fragmentary sectional view showing the 1st modification of the 2nd vacuum circuit in the manufacturing apparatus shown in FIG. It is a fragmentary sectional view showing the 2nd modification of the 2nd vacuum circuit in the manufacturing apparatus shown in FIG. It is a follow chart figure in the manufacturing method of the film covering component which concerns on 2nd Embodiment of this invention. In this manufacturing apparatus shown in FIG. 1, it is a correlation diagram of the vacuum suction time required in order to stick a film material on a base material, and the pressure in an up-and-down chamber and an airtight chamber. It is typical sectional drawing at the time of the base material of the manufacturing apparatus of the film covering component described in patent document 1, and a film material set. It is typical sectional drawing at the time of the vacuum suction of the manufacturing apparatus shown in FIG. It is typical sectional drawing at the time of the film material heating of the manufacturing apparatus shown in FIG. It is typical sectional drawing at the time of the table rising of the manufacturing apparatus shown in FIG. FIG. 12 is a schematic cross-sectional view of the manufacturing apparatus shown in FIG. 11 when the upper chamber is opened to the atmosphere. It is typical sectional drawing at the time of product taking-out of the manufacturing apparatus shown in FIG.

  Next, a manufacturing apparatus and a manufacturing method for a film-covered component according to an embodiment of the present invention will be described in detail with reference to the drawings. First, the overall structure of the film-coated component manufacturing apparatus according to the first embodiment will be described, and then, a modification of the second vacuum circuit in the manufacturing apparatus will be described. Next, the manufacturing method of the film covering component which is 2nd Embodiment of this invention is demonstrated. Finally, the vacuum suction time by this manufacturing apparatus and manufacturing method will be described in comparison with the conventional apparatus and method.

<Overall structure of film-coated component manufacturing apparatus>
First, the whole structure in the manufacturing apparatus of the film covering component which concerns on 1st Embodiment is demonstrated using FIGS. FIG. 1 shows a schematic cross-sectional view of a film-coated component manufacturing apparatus according to an embodiment of the present invention when a base material and a film material are set. FIG. 2 is a schematic cross-sectional view of the manufacturing apparatus shown in FIG. 1 during vacuum suction and heating of the film material in the upper and lower chambers. FIG. 3 shows a schematic cross-sectional view when the table is raised in the manufacturing apparatus shown in FIG. FIG. 4 is a schematic cross-sectional view at the time of vacuum suction of the hermetic chamber in the manufacturing apparatus shown in FIG. FIG. 5 is a schematic cross-sectional view of the manufacturing apparatus shown in FIG. 1 when the upper chamber is opened to the atmosphere. FIG. 6 shows a schematic cross-sectional view of the manufacturing apparatus shown in FIG. 1 when the product is taken out.

  As shown in FIGS. 1 to 6, the film-coated component manufacturing apparatus 10 according to this embodiment is connected to the upper chamber 1 and the lower chamber 2 that can be joined and separated in the vertical direction, and to each chamber. First vacuum circuits 11 and 21 and air circuits 12 and 22, a heater 3 mounted in the upper chamber 1, a table 4 disposed so as to be movable up and down in the lower chamber 2, and a table for moving the table 4 up and down And a driving device 5. The lower chamber 2 includes an airtight chamber 9 formed between the film material F and the table 4 when the table 4 is raised to a predetermined position by the table driving device 5 (see FIGS. 3 and 4). A second vacuum circuit 91 is provided which is formed so as to be capable of sucking the hermetic chamber 9 into a target high vacuum state.

(Upper chamber)
The upper chamber 1 is a box-shaped molding chamber having an open bottom, and a first vacuum circuit 11 is connected to the side wall, and an air circuit 12 is connected to the upper wall. The first vacuum circuit 11 is connected to the vacuum pump 7 via the opening / closing valve 111. When the upper and lower chambers are joined and closed, and the first vacuum circuit 11 is operated, the pressure in the upper chamber 1 is sucked from the atmospheric pressure state to the vacuum state. The air circuit 12 is communicated with the outside air via the opening / closing valve 121. When the air circuit 12 is activated, the pressure in the upper chamber 1 is returned to the atmospheric pressure state. The air circuit 12 is communicated with a pressurized air tank (not shown) via a switching valve, and a gas at atmospheric pressure or higher can be sent into the upper chamber 1 as necessary. A pressure adjustment valve 15 is attached to the side wall of the upper chamber 1 so that the pressure in the upper chamber 1 can be adjusted.

The upper chamber 1 is equipped with an infrared heater (heater) 3 for heating and softening the film material F. A plurality of heaters 3 are arranged along the ceiling, and a radiation thermometer 14 for measuring the temperature of the film material F is arranged in the gap between the heaters 3. The heater 3 may be attached to both the upper chamber 1 and the lower chamber 2 or only to the lower chamber 2.
In addition, a film presser 13 is formed at the lower end of the side wall of the upper chamber 1 to hold the film material F, which is gripped at both ends by the gripper 6 and formed into a sheet shape, in an airtight manner. The film presser 13 protrudes horizontally into the side wall of the upper chamber 1. The lower surface (contact surface with the film material F) of the film pressing part 13 is formed in a flat surface. The upper chamber 1 is equipped with an upper chamber driving device (not shown) that moves the upper chamber 1 in the vertical direction.

(Lower chamber)
The lower chamber 2 is a box-shaped molding chamber whose upper side is opened, and a first vacuum circuit 21, a second vacuum circuit 91, and an air circuit 22 are connected to the side wall thereof. The first vacuum circuit 21 is connected to the vacuum pump 7 via the open / close valve 211. When the upper and lower chambers are joined and closed, and the first vacuum circuit 21 is activated, the heater 3 is heated and softened to a predetermined temperature convenient for adhering the film material F to the base material K. The internal pressure is reached from an atmospheric pressure state to an intermediate vacuum state (for example, about 500 to 600 Pa).

  The second vacuum circuit 91 is connected to the vacuum preparatory tank 8 via an opening / closing valve 911. The vacuum preliminary tank 8 is connected to the vacuum pump 7 via the opening / closing valve 912. The pressure in the vacuum preliminary tank 8 is lowered to a target high vacuum state (for example, about 50 to 100 Pa) or lower by the vacuum pump 7 in advance. At least within the time during which the heater 3 is heated and softened to a predetermined temperature convenient for adhering the film material F to the substrate K, the pressure in the vacuum preliminary tank 8 reaches the target high vacuum state. The vacuum pump 7 connected to the vacuum preliminary tank 8 is the same as the vacuum pump 7 connected to the first vacuum circuit 21.

  In the second vacuum circuit 91, a first ventilation hole 913 formed in the lower chamber 2 and a second ventilation hole 914 formed in the table 4 are connected by a flexible pipe 915. The second vent hole 914 is formed at a position adjacent to the base material K placed on the table. When the on-off valve 911 is opened and the second vacuum circuit 91 is operated, the pressure is sucked from the vacuum reserve tank 8 that has already reached the target high vacuum state, so that the pressure in the hermetic chamber 9 is increased to the target high pressure. A vacuum state can be reached in a short time.

  The air circuit 22 is communicated with the outside air via the opening / closing valve 221. When the opening / closing valve 221 is opened and the air circuit 22 is operated, the pressure in the lower chamber 2 is returned to the atmospheric pressure state. A pressure adjustment valve 24 is attached to the side wall of the lower chamber 2 so that the pressure in the lower chamber 2 can be adjusted.

  In addition, a film receiving portion 23 is formed at the upper end of the side wall of the lower chamber 2 to receive the film material F formed in a sheet shape by gripping both ends by the grip portion 6. The film receiving portion 23 is formed in a size corresponding to the film pressing portion 13 of the upper chamber 1, and protrudes horizontally into the side wall of the lower chamber 2. The upper surface of the film receiving portion 23 (the contact surface with the film material F) is formed as a flat surface. When the upper chamber 1 and the lower chamber 2 are joined, the film pressing portion 13 and the film receiving portion 23 are brought into close contact with the film material F to maintain the airtightness in both chambers.

(Table, table driving device)
The table 4 is formed with a base material receiving jig 44 for placing the base material K at the center thereof. A table driving device 5 is connected to the center of the table 4. The table driving device 5 can use, for example, a hydraulic cylinder. Further, the table 4 includes an outer wall portion 41 projecting upward so as to surround the base material K. The outer wall portion 41 protrudes to the vicinity of the apex in the height direction of the base material K. When the table 4 is raised to a predetermined position, the upper surface of the outer wall portion 41 and the lower surface of the film receiving portion 23 of the lower chamber 2 are in close contact with each other via the seal member 42, and the film material F and the base material K are attached when the film is stuck. Is formed in an airtight chamber 9 held in an airtight manner (see FIGS. 3 and 4). In addition, the volume of the airtight chamber 9 can be reduced by forming the outer wall 41 lower than the apex in the height direction of the base material K or omitting it. In this case, when a bag-like sealed space surrounded by the film material F and the base material K is formed in the hermetic chamber 9, a vertical rib that can eliminate the sealed space projects upward from the table 4. It is preferable to do.

<Modification of second vacuum circuit>
Next, a modification of the second vacuum circuit in the manufacturing apparatus will be described with reference to FIGS. FIG. 7 is a partial cross-sectional view showing a first modification of the second vacuum circuit in the manufacturing apparatus shown in FIG. FIG. 8 is a partial cross-sectional view showing a second modification of the second vacuum circuit in the manufacturing apparatus shown in FIG. In addition, the part which is common in this manufacturing apparatus shown in FIG. 1 attaches | subjects the same code | symbol, and omits the description.

(First modification)
As shown in FIG. 7, in the manufacturing apparatus 10B according to the first modification, the second vacuum circuit 91B includes a first ventilation hole 913B formed in the film receiving portion 23 of the lower chamber 2 and a table 4. A pipe 915B that connects the formed second vent hole 914 is disposed along the table 4 to the upper surface of the outer wall portion 41B. The first vent hole 913B is formed to open downward from the lower surface of the film receiving portion 23 of the lower chamber 2 at a position facing the upper end portion of the pipe 915B. The pipe 915B is formed so as to be connectable to the first vent hole 913B when the table 4 rises to a predetermined position and the upper surface of the outer wall portion 41 of the table 4 comes into contact with the lower surface of the film receiving portion 23 of the lower chamber 2. Has been. On the upper surface of the outer wall portion 41 of the table 4, seal members 42B are fitted on the outer side and the inner side of the pipe 915B. Note that the first vent hole 913B is not limited to the film receiving portion 23 of the lower chamber 2, and may be formed in a protruding portion that protrudes inward from the side wall of the lower chamber 2.

(Second modification)
As shown in FIG. 8, in the manufacturing apparatus 10 </ b> C according to the second modification, the second vacuum circuit 91 </ b> C is connected to the airtight chamber 9 via the third vent hole 916 formed in the film receiving portion 23 of the lower chamber 2. It is formed to communicate. The third vent hole 916 is formed so as to penetrate the film receiving portion 23 of the lower chamber 2 horizontally in the inner and outer directions.

<Method for producing film-coated component>
Next, the manufacturing method of the film covering component which is 2nd Embodiment which concerns on this invention is demonstrated using FIGS. 1-6, FIG. In FIG. 9, the follow chart figure in the manufacturing method of the film covering component which concerns on 2nd Embodiment of this invention is shown.

  First, as shown in step S1 of FIG. 9, the upper chamber 1 and the lower chamber 2 are separated from each other by a predetermined distance, and the base material K and the film material F are set at predetermined positions in the chamber (see FIG. 1). . Step S1 corresponds to a setting process. Specifically, the table drive device 5 raises the table 4 to a predetermined position (a position where the upper surface of the outer wall portion 41 abuts the lower surface of the film receiving portion 23), and then the substrate K is received by the substrate receiving treatment. Then, the table 4 is lowered to the original position, and the film material F gripped by the gripping portion 6 is brought into contact with the film receiving portion 23. The base material K is a base material for large-sized resin parts for vehicles, and is made of a resin such as polypropylene resin, acrylic resin, polystyrene resin, ABS resin, and is formed in a predetermined shape in advance. The film material F is, for example, a sheet-like decorative film material on which a wood grain pattern or the like is printed, and is made of a resin such as an acrylic resin, a polyester resin, or a polycarbonate resin. An adhesive is uniformly applied to the lower surface of the film material F.

  Next, as shown in step S2 of FIG. 9, after the upper and lower chambers are joined in an airtight manner, the film material F is heated while vacuuming the inside of the upper chamber 1 and the lower chamber 2 (see FIG. 2). reference). At this time, the vacuum preliminary tank 8 is also vacuumed. Step S2 corresponds to a vacuum suction process and a film heating process. Specifically, after the upper chamber 1 is lowered, the film receiving portion 23, the film pressing portion 13, and the film material F are brought into close contact with each other. As a result, the upper chamber 1 and the lower chamber 2 are closed. Next, the heater 3 is turned on and the open / close valves 111 and 211 are opened to operate the first vacuum circuit 11 connected to the upper chamber 1 and the first vacuum circuit 21 connected to the lower chamber 2, respectively. Then, the air in both chambers is sucked to reduce the pressure to a moderate vacuum state (for example, about 500 to 600 Pa). When the pressure in the upper and lower chambers reaches a moderate vacuum state, the first vacuum circuit is stopped.

  While the pressure in the upper and lower chambers reaches a moderate vacuum state, the heater 3 heats and softens the film material F to a predetermined temperature convenient for adhering it to the substrate. At this time, in the second vacuum circuit 91, the opening / closing valve 912 connected to the vacuum pump 7 is opened, and the pressure in the vacuum preliminary tank 8 is reduced to a target high vacuum state (for example, about 50 to 100 Pa) or lower. Reduce. At this stage, the open / close valve 911 connected to the first vent hole 913 of the lower chamber 2 is closed. The air circuit 12 of the upper chamber 1 and the air circuit 22 of the lower chamber 2 are stopped by closing the on-off valves 121 and 221. At this time, in order to prevent the film material F from drooping excessively, the pressure adjustment valve 15 of the upper chamber 1 or the pressure adjustment valve 24 of the lower chamber 2 may be operated to adjust the pressure difference in the upper and lower chambers. .

  Next, as shown in step S3 of FIG. 9, the table 4 is raised to a predetermined position, and an airtight chamber 9 is formed between the film material F and the table 4 (see FIG. 3). Step S3 corresponds to a table raising process. Specifically, it is confirmed that the pressure in the upper chamber 1 and the lower chamber 2 is in a moderate vacuum state, or the heating temperature of the film material F is at a predetermined temperature, and the table driving device 5 Is activated. At this stage, the first vacuum circuits 11 and 21 in both chambers are stopped.

  Next, as shown in step S4 of FIG. 9, while maintaining the pressure in the upper chamber 1 and the lower chamber 2 in a moderate vacuum state, the pressure in the hermetic chamber 9 is reduced to a target high vacuum state ( (See FIG. 4). Step S4 is a vacuum suction process of the hermetic chamber 9 newly added in the present embodiment. Specifically, with the on-off valves 111 and 211 of the first vacuum circuits 11 and 21 closed, the on-off valve 911 connected to the first vent 913 is opened to operate the second vacuum circuit 91. By operating the second vacuum circuit 91, the vacuum preliminary tank 8 whose pressure has been reduced to a target high vacuum state (for example, about 50 to 100 Pa) and the hermetic chamber 9 are communicated with each other, and the pressure in the hermetic chamber 9 is increased. Reaches the target high vacuum state in a short time. At this stage, the on-off valve 912 connecting the vacuum pump 7 and the vacuum preparatory tank 8 is opened, and the pressure in the hermetic chamber 9 is changed to a high vacuum state faster while suctioning with the vacuum pump 7. You can also.

  Next, as shown in step S5 in FIG. 9, the upper chamber 1 is opened to the atmosphere (see FIG. 5). Step S5 corresponds to a film sticking process. Specifically, the air circuit 12 is operated by opening the on-off valve 121 connected to the upper chamber 1. By opening the upper chamber 1 to the atmosphere, a large atmospheric pressure difference is generated between the upper chamber 1 and the hermetic chamber 9. The film material F is pressed against the surface of the base material K by the pressing force f based on this atmospheric pressure difference. In addition, the film material F is uniformly distributed on the surface of the base material K by sending a gas at atmospheric pressure or higher into the upper chamber 1 or holding the second vacuum circuit 91 in an activated state. Can be attached.

  Next, as shown in step S6 of FIG. 9, when the film material F is attached to the base material K, the product of the film-covered component W is taken out (see FIG. 6). Step S6 corresponds to a product removal process. Specifically, the heater 3 is turned off, the upper chamber 1 is raised to a predetermined height, the outer peripheral edge of the film material F is cut, and the product of the film-covered component W is taken out of the upper and lower chambers. As described above in detail, the film-coated component W according to the present embodiment can be manufactured through the above steps S1 to S6.

<Comparison of vacuum suction time>
Next, the results of comparing the vacuum suction time by the present manufacturing apparatus and the manufacturing method with the vacuum suction time by the conventional apparatus and method as shown in Patent Document 1 will be described with reference to FIG. FIG. 10 shows a correlation diagram between the vacuum suction time required for adhering the film material to the base material and the pressure in the upper and lower chambers and the hermetic chamber in the manufacturing apparatus shown in FIG.

  FIG. 10 shows the pressure (Pa) in the lower chamber 2 and the airtight chamber 9 on the vertical axis, and the vacuum suction time (second) on the horizontal axis. The vertical axis is a logarithmic scale, and the horizontal axis is a normal scale. A curve R1 connecting the points P1 and P2 indicates that the pressure in the upper and lower chambers 1 and 2 is changed from the atmospheric pressure state (pressure: 100 KPa) by operating the first vacuum circuits 11 and 21 after joining the upper and lower chambers. It is a pressure curve when it is reduced to a vacuum state (pressure: 500 Pa). Further, a curve R2 connecting the points P2 and P3 raises the table 4 to a predetermined position, forms an airtight chamber 9 between the film material F and the table 4, and then operates the second vacuum circuit 91. 4 is a pressure curve when the pressure in the hermetic chamber 9 is lowered from a moderate vacuum state (pressure: 500 Pa) to a target high vacuum state (pressure: 100 Pa). A curve R3 connecting the points P2 and P4 indicates that the first vacuum circuit 21 is continuously operated, and the pressure in the upper and lower chambers 1 and 2 is changed from a moderate vacuum state (pressure: 500 Pa) to a target high vacuum state (pressure: 500 Pa). It is a pressure curve when it reduces to pressure: 100Pa). This curve R3 corresponds to the conventional apparatus and method. In addition, the used vacuum pump 7 is a normal performance vacuum pump whose suction performance is inferior to that of a high performance vacuum pump.

  As shown in FIG. 10, the vacuum suction time X according to the manufacturing apparatus and the manufacturing method is a time obtained by adding the suction time t1 from the points P1 to P2 and the suction time t2 from the points P2 to P3. On the other hand, the vacuum suction time Y according to the conventional apparatus and method is a time obtained by adding the suction time t1 from the points P1 to P2 and the suction time t3 from the points P2 to P4. The suction time t2 to the points P2 to P3 is clearly shorter than the suction time t3 to the points P2 to P4. As a result, the vacuum suction time X by the manufacturing apparatus and the manufacturing method is significantly shortened compared to the conventional case.

  The reason why the vacuum suction time X by the manufacturing apparatus and the manufacturing method can be greatly shortened is that the inclination angle of the curve R2 is larger than the inclination angle of the curve R3. From this, it is conceivable that the volume of the airtight chamber 9 can be remarkably reduced, and suction is performed from the vacuum preliminary tank 8 whose pressure has been lowered to a high vacuum state in advance. Therefore, the vacuum suction time X could be greatly shortened without using a high performance vacuum pump.

<Effect>
As described above in detail, according to the apparatus 10 for manufacturing the film-coated component W according to the first embodiment, the film is placed in the lower chamber 2 when the table 4 is raised to a predetermined position by the table driving device 5. Since the second vacuum circuit 91 is provided which communicates with the hermetic chamber 9 formed between the material F and the table 4 and can reduce the pressure in the hermetic chamber 9 to a target high vacuum state. The chambers 1 and 2 are joined and closed, the first vacuum circuits 11 and 21 are operated, the heater 3 is turned on, and the film material F can be adhered to the base material K while vacuuming the inside of the upper and lower chambers. When the temperature is softened by heating, the first vacuum circuits 11 and 21 are stopped in a medium vacuum state before the pressure in the upper and lower chambers reaches the target high vacuum state, and the table 4 is driven by the table driving device 5. The After having raised into position, a second vacuum circuit 91 which communicates with the airtight chamber 9 is operated, it can be reached in a short time the pressure of the airtight chamber 9 in a high vacuum state of the target. If the pressure in the hermetic chamber 9 can reach the target high vacuum state, the upper chamber 1 can be opened to the atmosphere, and the heat-softened film material F can be adhered to the base material K by the pressure difference. Here, since the volume of the airtight chamber 9 is much smaller than the volumes of the upper and lower chambers 1 and 2, the upper and lower chambers are moved by the first vacuum circuits 11 and 21 even after the table 4 is raised to a predetermined position. The vacuum in the hermetic chamber 9 is reduced to a medium vacuum by the second vacuum circuit 91 from time t3 when the inside of the chamber is continuously vacuumed and the pressure in the upper and lower chambers is reached from the medium vacuum state to the target high vacuum state. The time t2 for reaching the target high vacuum state from the state is clearly shorter. As a result, the vacuum suction time X required for attaching the film material F to the base material K can be greatly shortened.

Further, since the upper and lower chambers 1 and 2 need only be able to withstand a moderate vacuum pressure, the upper and lower chambers 1 and 2 do not have to be more rigid than necessary. Equipment costs for the chamber drive device and the like can be reduced. Further, since the first vacuum circuits 11 and 21 only need to be able to lower the pressure in the upper and lower chambers to a moderate vacuum state, the vacuum pump 7 connected to the first vacuum circuits 11 and 21 is made higher than necessary. It is not necessary to improve the performance, and an inexpensive vacuum pump can be used.
Therefore, according to the first embodiment, the apparatus 10 for manufacturing the film-coated component W that adheres the film material F, which is gripped between the upper chamber 1 and the lower chamber 2 and softened by heating, to the base material K due to a pressure difference. Therefore, the vacuum suction time X can be shortened with a simple structure to increase the production efficiency, and the equipment cost can be reduced.

Further, according to the first embodiment, the second vacuum circuit 91 connects the first ventilation hole 913 formed in the lower chamber 2 and the second ventilation hole 914 formed in the table 4 by the pipe 915. Since the closed chamber 9 is communicated, it is possible to easily follow the lifting and lowering operation of the table 4. Therefore, the vacuum suction time X necessary for sticking the film material F to the base material K can be shortened without complicating the second vacuum circuit 91.
As a result, the vacuum suction time X can be shortened with a simpler structure to increase production efficiency, and the equipment cost can be reduced.

Further, according to the first embodiment, the pipe 915B connecting the first vent hole 913B and the second vent hole 914 is disposed along the table 4, and the pipe 915B is raised to a predetermined position. In this case, since the first vent hole 913B is formed so as to be connectable, the pipe 915B does not extend or bend with respect to the lifting / lowering operation of the table 4. Therefore, it can be easily avoided that the pipe 915B interferes with the wall surface of the lower chamber, the table driving device, etc. due to the raising / lowering operation of the table 4, and the piping 915B is damaged or the table driving device 5 malfunctions. .
As a result, the vacuum suction time X can be shortened with a simpler piping structure to increase production efficiency, and the equipment cost can be reduced.

Further, according to the first embodiment, the second vacuum circuit 91C is communicated with the hermetic chamber 9 via the third vent hole 916 formed in the film receiving portion 23 of the lower chamber 2, so that the table 4 The pipes 915 and 915B connecting the lower chamber 2 can be omitted. Therefore, the second vacuum circuit 91 </ b> C and the hermetic chamber 9 can be communicated with each other with a simpler structure without being affected by the lifting / lowering operation of the table 4.
As a result, the vacuum suction time X can be shortened with a much simpler structure to increase production efficiency, and the equipment cost can be reduced.

Further, according to the first embodiment, the second vacuum circuits 91, 91B, 91C are provided with the vacuum preliminary tank 8 connected to the vacuum pump 7, so that the upper and lower chambers 1, 2 are joined and closed. The first vacuum circuit 11, 21 is operated and the heater 3 is turned on until the pressure in the upper and lower chambers 1, 2 reaches a moderate vacuum state, or the film material F is The pressure in the vacuum pre-tank 8 can be reduced to a target high vacuum state or lower before or before the temperature is softened to heat. Therefore, after the pressure in the upper and lower chambers 1 and 2 has reached a moderate vacuum state, or after the film material F has been heated and softened to a predetermined temperature, the table 4 is raised to a predetermined position or thereafter Furthermore, by opening the vacuum preliminary tank 8 and operating the second vacuum circuit 91, the pressure in the hermetic chamber 9 can be reached to the target high vacuum state in a shorter time. As a result, the vacuum suction time X required for adhering the film material F to the substrate K can be further increased with a simple structure in which the second vacuum circuit 91 is provided with the vacuum preliminary tank 8 connected to the vacuum pump 7. It can be further shortened to increase production efficiency and reduce equipment costs.
In addition, the vacuum pump 7 connected to the vacuum preliminary tank 8 can be shared with the vacuum pump 7 connected to the first vacuum circuits 11 and 21, thereby further reducing the equipment cost.

  Further, according to the method for manufacturing the film-coated component according to the second embodiment of the present invention, the lower chamber 2 includes the film material F and the table 4 when the table 4 is raised to a predetermined position by the table driving device 5. The second vacuum circuits 91, 91B, 91C communicating with the hermetic chamber 9 formed therebetween are operated, and the first vacuum circuits 11, 21 are operated so that the pressure in the upper and lower chambers 1, 2 is a target high vacuum state. After reaching a lower intermediate vacuum state, the first vacuum circuits 11, 21 are stopped and the table 4 is raised to a predetermined position, and then the second vacuum circuits 91, 91B, 91C are operated. Since the pressure of the hermetic chamber 9 reaches the target high vacuum state, the vacuum suction time X required for adhering the film material F to the substrate K is determined by the first vacuum circuit 11, 21 by the upper and lower chambers 1. In 2 The time t1 until the force reaches an intermediate vacuum state from the atmospheric pressure state, and the second vacuum circuit 91, 91B, 91C changes the pressure in the hermetic chamber 9 from the intermediate vacuum state to the target high vacuum state. It is the sum of the time t2 to reach. Here, since the volume of the hermetic chamber 9 is much smaller than the volumes of the upper and lower chambers 1 and 2, the first vacuum circuit 11 and 21 continuously vacuums the interior of the upper and lower chambers 1 and 21 to reduce the pressure. From the time t3 for reaching the target high vacuum state from the intermediate vacuum state, the pressure in the hermetic chamber 9 is reached from the intermediate vacuum state to the target high vacuum state by the second vacuum circuits 91, 91B, 91C. The time t2 is obviously shorter. As a result, the vacuum suction time X required for attaching the film material F to the base material K can be greatly shortened.

Further, since the upper and lower chambers 1 and 2 need only be able to withstand a moderate vacuum pressure, the upper and lower chambers 1 and 2 do not have to be more rigid than necessary. Equipment costs for the chamber drive device and the like can be reduced. The first vacuum circuits 11 and 21 need only have a vacuum pump 7 connected to the first vacuum circuits 11 and 21 because the pressure in the upper and lower chambers 1 and 2 can be reduced to a moderate vacuum state. It is not necessary to improve the performance as described above, and an inexpensive vacuum pump can be used.
Therefore, according to the second embodiment, in the manufacturing method of the film-coated component W in which the film material F gripped between the upper chamber 1 and the lower chamber 2 and softened by heating is adhered to the base material K by a pressure difference. In addition, the vacuum suction time X can be shortened with a simple structure to increase the production efficiency, and the equipment cost can be reduced.

Further, according to the second embodiment, since the second vacuum circuits 91, 91B, 91C are provided with the vacuum preliminary tank connected to the vacuum pump, the upper and lower chambers are joined and closed to form the first vacuum circuit. Before the circuit 11, 21 is activated and the pressure in the upper and lower chambers 1, 2 reaches a moderate vacuum state, or before that, the pressure in the vacuum reserve tank 8 is set to the target high vacuum state or It can be reduced to: Therefore, after the pressure in the upper and lower chambers 1 and 2 reaches an intermediate vacuum state, the table 4 is raised to a predetermined position, or at the same time or later, the vacuum preliminary tank 8 is opened and the second vacuum circuit 91 is opened. , 91B, 91C are operated, the pressure in the hermetic chamber 9 can be reached to the target high vacuum state in a shorter time. As a result, the vacuum suction required for adhering the film material F to the base material K with a simple structure in which the vacuum vacuum tank 7 connected to the vacuum pump 7 is provided in the second vacuum circuits 91, 91B, 91C. The time X can be further shortened to increase production efficiency, and the equipment cost can be reduced.
In addition, the vacuum pump 7 connected to the vacuum preliminary tank 8 can be shared with the vacuum pump 7 connected to the first vacuum circuits 11 and 21, thereby further reducing the equipment cost.

  In addition, it cannot be overemphasized that this embodiment can be changed in the range which does not change the summary of this invention. For example, as shown in FIGS. 1 to 8, the second vacuum circuits 91, 91 </ b> B, and 91 </ b> C include the vacuum reserve tank 8 connected to the vacuum pump 7, but the vacuum reserve tank 8 may be omitted. it can. Since the volume of the airtight chamber 9 is much smaller than the volumes of the upper and lower chambers 1 and 2, even if the vacuum preparatory tank 8 is omitted, the interior of the upper and lower chambers 1 and 2 is maintained by the first vacuum circuits 11 and 21. From the time t3 to reach the target high vacuum state from the medium vacuum state, the time t2 to reach the inside of the hermetic chamber 9 from the medium vacuum state to the target high vacuum state by the second vacuum circuits 91, 91B, 91C. Is still shorter. As a result, the vacuum suction time X required for sticking the film material F to the substrate K can be greatly shortened.

  INDUSTRIAL APPLICABILITY The present invention is used as a manufacturing apparatus and manufacturing method for a film-covered part formed by adhering a heat-softened film material to a base material by a pressure difference, and particularly as a manufacturing apparatus and a manufacturing method for a large-sized film-coated part for a vehicle it can.

1 Upper chamber 2 Lower chamber 1, 2 Upper and lower chambers 3 Infrared heater (heater)
4 Table 5 Table driving device 7 Vacuum pump 8 Vacuum preparatory tank 9 Airtight chamber 10, 10B, 10C Manufacturing device 11, 21 First vacuum circuit 12, 22 Air circuit 13 Film pressing portion 23 Film receiving portion 41 Outer wall portion 91, 91B 91C Second vacuum circuit 913, 913B First vent hole 914 Second vent hole 915, 915B Pipe 916 Third vent hole F Film material K Substrate W Film coated part

Claims (7)

An upper chamber and a lower chamber that can be joined and separated in the vertical direction; a first vacuum circuit and an air circuit connected to each chamber; a heater mounted in the upper chamber or the lower chamber; A table disposed in a lower chamber so as to be movable up and down, and a table driving device that raises and lowers the table, on the surface of the base material placed on the table raised to a predetermined position by the table driving device, An apparatus for manufacturing a film-covered component that adheres a film material that has been gripped between the upper chamber and the lower chamber and heat-softened by a pressure difference,
The lower chamber communicates with an airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device, and the pressure of the airtight chamber is set to a target high vacuum state. An apparatus for manufacturing a film-covered component, comprising a second vacuum circuit formed to be capable of being lowered. In the apparatus for manufacturing a film-coated component according to claim 1,
In the film-covered component, the second vacuum circuit has a first vent hole formed in the lower chamber and a second vent hole formed in the table connected to each other by pipe connection. manufacturing device. In the apparatus for manufacturing a film-coated component according to claim 2,
A pipe connecting the first vent hole and the second vent hole is provided along the table, and the pipe is formed so as to be connectable to the first vent hole when the table is raised to a predetermined position. An apparatus for manufacturing a film-covered part. In the apparatus for manufacturing a film-coated component according to claim 1,
The apparatus for producing a film-covered component, wherein the second vacuum circuit communicates with the hermetic chamber through a third vent formed in a film receiving portion of the lower chamber. In the apparatus for manufacturing a film-coated component according to any one of claims 1 to 4,
The apparatus for producing a film-coated part, wherein the second vacuum circuit includes a vacuum preliminary tank connected to a vacuum pump. An upper chamber and a lower chamber that can be joined and separated in the vertical direction; a first vacuum circuit and an air circuit connected to each chamber; a heater mounted in the upper chamber or the lower chamber; A table disposed in a lower chamber so as to be movable up and down, and a table driving device that raises and lowers the table, on the surface of the base material placed on the table raised to a predetermined position by the table driving device, A method for producing a film-coated component in which a film material gripped between the upper chamber and the lower chamber and heated and softened is attached by a pressure difference,
The lower chamber includes a second vacuum circuit communicating with an airtight chamber formed between the film material and the table when the table is raised to a predetermined position by the table driving device. After the vacuum circuit is activated and the pressure in the upper and lower chambers reaches an intermediate vacuum state lower than the target high vacuum state, the first vacuum circuit is stopped and the table is raised to a predetermined position. Then, the second vacuum circuit is operated to cause the pressure in the hermetic chamber to reach a target high vacuum state. In the manufacturing method of the film covering component described in Claim 6,
The method for producing a film-coated component, wherein the second vacuum circuit includes a vacuum preliminary tank connected to a vacuum pump.

Images