JP2016066607A5 - Peeling method and light emitting device - Google Patents
Peeling method and light emitting device Download PDFInfo
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- JP2016066607A5 JP2016066607A5 JP2015181422A JP2015181422A JP2016066607A5 JP 2016066607 A5 JP2016066607 A5 JP 2016066607A5 JP 2015181422 A JP2015181422 A JP 2015181422A JP 2015181422 A JP2015181422 A JP 2015181422A JP 2016066607 A5 JP2016066607 A5 JP 2016066607A5
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- 239000012790 adhesive layer Substances 0.000 claims 28
- 239000010410 layer Substances 0.000 claims 24
- 239000000758 substrate Substances 0.000 claims 16
- 239000002346 layers by function Substances 0.000 claims 14
- 230000015556 catabolic process Effects 0.000 claims 1
Claims (8)
前記剥離層上に被剥離層を形成する第2の工程と、
前記被剥離層と第2の基板とを、接着層を用いて貼り合わせ、前記接着層を硬化する第3の工程と、
前記剥離層及び前記接着層と重なる前記被剥離層の一部を除去する第4の工程と、
前記第1の基板と前記被剥離層とを分離する第5の工程と、を有し、
前記第5の工程で前記第1の基板と前記被剥離層とを分離する力は、前記第1の基板と前記被剥離層とを分離するために要する力以上であり、
前記第1の基板と前記被剥離層とを分離するために要する力は、前記被剥離層と前記第3の工程で硬化した前記接着層との間で界面破壊を生じさせるために要する力よりも小さいことを特徴とする剥離方法。 A first step of forming a peeling layer over a first substrate,
A second step of forming a layer to be peeled before Symbol peeling layer,
A front SL layer to be peeled and the second substrate, bonded by using an adhesive layer, and a third step of curing the adhesive layer,
A fourth step you divided part of the pre-Symbol peeling layer and the layer to be peeled overlapping with the adhesive layer,
A fifth step of separating the before and Symbol first substrate said layer to be peeled, and
The force for separating the first substrate and the layer to be peeled in the fifth step is greater than or equal to the force required for separating the first substrate and the layer to be peeled,
The force required for separating the peeled layer and the first substrate, the more force required to cause interfacial failure between the adhesive layer cured by the layer to be peeled the third step A peeling method characterized by being small.
前記被剥離層と前記第3の工程で硬化した前記接着層との間で界面破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする剥離方法。 In claim 1,
A peeling method characterized in that a force required to cause interface fracture between the peelable layer and the adhesive layer cured in the third step is 0.14 N / 25 mm or more.
前記第3の工程で硬化した前記接着層の凝集破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする剥離方法。 In claim 1 or 2,
A peeling method, wherein a force required to cause cohesive failure of the adhesive layer cured in the third step is 0.14 N / 25 mm or more.
前記第5の工程で前記第1の基板と前記被剥離層とを分離する力は、0.10N/25mm以下であることを特徴とする剥離方法。 In any one of Claims 1 thru | or 3,
It said fifth step with a force separating the peeled layer and the first substrate is peeled wherein the at 0.10 N / 25 mm or less.
前記第1の接着層は、前記第1の可撓性基板と前記第1の絶縁層の間に位置し、
前記第2の接着層は、前記第2の可撓性基板と前記第1の機能層の間に位置し、
前記第1の接着層と前記第2の接着層は、前記第1の絶縁層及び前記第1の機能層を介して互いに重なる部分を有し、
前記第1の機能層は、発光素子を有し、
前記第2の接着層と前記第1の機能層との間、又は、前記第2の接着層と前記第2の可撓性基板との間で界面破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする発光装置。 A first flexible substrate, a second flexible substrate, a first adhesive layer, a second adhesive layer, a first insulating layer, and a first functional layer;
The first adhesive layer is located between the first flexible substrate and the first insulating layer,
The second adhesive layer is located between the second flexible substrate and the first functional layer,
The first adhesive layer and the second adhesive layer have portions that overlap each other via the first insulating layer and the first functional layer,
The first functional layer has a light emitting element,
The force required to cause interface fracture between the second adhesive layer and the first functional layer or between the second adhesive layer and the second flexible substrate is 0. A light-emitting device characterized by being 14 N / 25 mm or more.
前記第2の接着層の凝集破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする発光装置。 In claim 5,
A light emitting device characterized in that a force required to cause cohesive failure of the second adhesive layer is 0.14 N / 25 mm or more.
前記第1の接着層は、前記第1の可撓性基板と前記第1の絶縁層の間に位置し、
前記第2の接着層は、前記第2の可撓性基板と前記第2の絶縁層の間に位置し、
前記第3の接着層は、前記第1の機能層と前記第2の機能層の間に位置し、
前記第1の接着層と前記第3の接着層は、前記第1の絶縁層及び前記第1の機能層を介して互いに重なる部分を有し、
前記第2の接着層と前記第3の接着層は、前記第2の絶縁層及び前記第2の機能層を介して互いに重なる部分を有し、
前記第1の機能層は、発光素子を有し、
前記第2の機能層は、着色層を有し、
前記第3の接着層と前記第1の機能層の間、又は、前記第3の接着層と第2の機能層の間で界面破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする発光装置。 First flexible substrate, second flexible substrate, first adhesive layer, second adhesive layer, third adhesive layer, first insulating layer, second insulating layer, first function A layer, and a second functional layer,
The first adhesive layer is located between the first flexible substrate and the first insulating layer,
The second adhesive layer is located between the second flexible substrate and the second insulating layer;
The third adhesive layer is located between the first functional layer and the second functional layer,
The first adhesive layer and the third adhesive layer have portions that overlap each other via the first insulating layer and the first functional layer,
The second adhesive layer and the third adhesive layer have portions that overlap each other via the second insulating layer and the second functional layer,
The first functional layer has a light emitting element,
The second functional layer has a colored layer,
The force required to cause interface breakdown between the third adhesive layer and the first functional layer or between the third adhesive layer and the second functional layer is 0.14 N / 25 mm or more A light emitting device characterized by the above .
前記第3の接着層の凝集破壊を生じさせるために要する力は、0.14N/25mm以上であることを特徴とする発光装置。 In claim 7,
A light emitting device characterized in that a force required to cause cohesive failure of the third adhesive layer is 0.14 N / 25 mm or more.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2014189611 | 2014-09-18 | ||
JP2014189611 | 2014-09-18 |
Publications (2)
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JP2016066607A JP2016066607A (en) | 2016-04-28 |
JP2016066607A5 true JP2016066607A5 (en) | 2018-10-25 |
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JP2015181422A Withdrawn JP2016066607A (en) | 2014-09-18 | 2015-09-15 | Exfoliation method, light-emitting device, module and electronic apparatus |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7038477B2 (en) * | 2017-02-27 | 2022-03-18 | デクセリアルズ株式会社 | Image display device and its manufacturing method |
JP6834609B2 (en) * | 2017-03-07 | 2021-02-24 | デクセリアルズ株式会社 | Manufacturing method of image display device |
CN115397103A (en) * | 2021-05-24 | 2022-11-25 | 庆鼎精密电子(淮安)有限公司 | Preparation method of circuit board with heat dissipation function |
CN114449778B (en) * | 2022-04-11 | 2022-06-10 | 四川英创力电子科技股份有限公司 | Printed circuit board tears sticky tape device |
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JP4567941B2 (en) * | 2001-12-28 | 2010-10-27 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device and method for manufacturing display device |
US6953735B2 (en) * | 2001-12-28 | 2005-10-11 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating a semiconductor device by transferring a layer to a support with curvature |
JP4495939B2 (en) * | 2003-10-08 | 2010-07-07 | 株式会社リコー | Thin film device device manufacturing method, active matrix substrate manufacturing method, and electro-optical device manufacturing method |
WO2008081593A1 (en) * | 2006-12-28 | 2008-07-10 | Zeon Corporation | Laminated body for light emitting element, and light emitting element |
KR102161078B1 (en) * | 2012-08-28 | 2020-09-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Display device and manufacturing method thereof |
WO2014097647A1 (en) * | 2012-12-21 | 2014-06-26 | 三井化学株式会社 | Sheet-like epoxy resin composition, method for manufacturing organic el device using same, organic el device and organic el display panel |
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