JP2016058548A5 - - Google Patents
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- JP2016058548A5 JP2016058548A5 JP2014183609A JP2014183609A JP2016058548A5 JP 2016058548 A5 JP2016058548 A5 JP 2016058548A5 JP 2014183609 A JP2014183609 A JP 2014183609A JP 2014183609 A JP2014183609 A JP 2014183609A JP 2016058548 A5 JP2016058548 A5 JP 2016058548A5
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Description
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014183609A JP6362488B2 (ja) | 2014-09-09 | 2014-09-09 | プラズマ処理装置及びプラズマ処理方法 |
| US14/840,250 US20160071722A1 (en) | 2014-09-09 | 2015-08-31 | Plasma processing device and plasma processing method |
| KR1020150125487A KR101922287B1 (ko) | 2014-09-09 | 2015-09-04 | 플라즈마 처리 장치 및 플라즈마 처리 방법 |
| TW104129463A TWI612175B (zh) | 2014-09-09 | 2015-09-07 | 電漿處理裝置及電漿處理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014183609A JP6362488B2 (ja) | 2014-09-09 | 2014-09-09 | プラズマ処理装置及びプラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016058548A JP2016058548A (ja) | 2016-04-21 |
| JP2016058548A5 true JP2016058548A5 (ja) | 2017-05-25 |
| JP6362488B2 JP6362488B2 (ja) | 2018-07-25 |
Family
ID=55438158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014183609A Active JP6362488B2 (ja) | 2014-09-09 | 2014-09-09 | プラズマ処理装置及びプラズマ処理方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20160071722A1 (ja) |
| JP (1) | JP6362488B2 (ja) |
| KR (1) | KR101922287B1 (ja) |
| TW (1) | TWI612175B (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5803714B2 (ja) * | 2012-02-09 | 2015-11-04 | 東京エレクトロン株式会社 | 成膜装置 |
| US10861693B2 (en) * | 2015-12-18 | 2020-12-08 | Applied Materials, Inc. | Cleaning method |
| JP6608332B2 (ja) * | 2016-05-23 | 2019-11-20 | 東京エレクトロン株式会社 | 成膜装置 |
| JP6832154B2 (ja) * | 2016-12-27 | 2021-02-24 | 東京エレクトロン株式会社 | パージ方法 |
| JP2019096666A (ja) * | 2017-11-20 | 2019-06-20 | 東京エレクトロン株式会社 | エッチング方法及びこれを用いた窪みパターンの埋め込み方法 |
| US11239060B2 (en) * | 2018-05-29 | 2022-02-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Ion beam etching chamber with etching by-product redistributor |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04504442A (ja) * | 1988-12-21 | 1992-08-06 | モンコブスキー―ライン・インコーポレイテッド | 化学気相成長反応装置とその使用方法 |
| JP3144664B2 (ja) * | 1992-08-29 | 2001-03-12 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
| US7416989B1 (en) * | 2006-06-30 | 2008-08-26 | Novellus Systems, Inc. | Adsorption based material removal process |
| US8277670B2 (en) * | 2008-05-13 | 2012-10-02 | Lam Research Corporation | Plasma process with photoresist mask pretreatment |
| JP5327147B2 (ja) * | 2009-12-25 | 2013-10-30 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP5812606B2 (ja) * | 2010-02-26 | 2015-11-17 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
| JP2013149945A (ja) * | 2011-12-21 | 2013-08-01 | Hitachi High-Technologies Corp | 半導体装置の製造方法 |
| JP5803706B2 (ja) * | 2012-02-02 | 2015-11-04 | 東京エレクトロン株式会社 | 成膜装置 |
| US11164753B2 (en) * | 2014-01-13 | 2021-11-02 | Applied Materials, Inc. | Self-aligned double patterning with spatial atomic layer deposition |
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2014
- 2014-09-09 JP JP2014183609A patent/JP6362488B2/ja active Active
-
2015
- 2015-08-31 US US14/840,250 patent/US20160071722A1/en not_active Abandoned
- 2015-09-04 KR KR1020150125487A patent/KR101922287B1/ko active IP Right Grant
- 2015-09-07 TW TW104129463A patent/TWI612175B/zh active