JP2016055319A5 - - Google Patents

Download PDF

Info

Publication number
JP2016055319A5
JP2016055319A5 JP2014184020A JP2014184020A JP2016055319A5 JP 2016055319 A5 JP2016055319 A5 JP 2016055319A5 JP 2014184020 A JP2014184020 A JP 2014184020A JP 2014184020 A JP2014184020 A JP 2014184020A JP 2016055319 A5 JP2016055319 A5 JP 2016055319A5
Authority
JP
Japan
Prior art keywords
light
spatial
modulator
time waveform
spectrum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014184020A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016055319A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014184020A priority Critical patent/JP2016055319A/ja
Priority claimed from JP2014184020A external-priority patent/JP2016055319A/ja
Priority to PCT/JP2015/074061 priority patent/WO2016039148A1/ja
Priority to CN201580048521.7A priority patent/CN106687852B/zh
Priority to EP15840056.4A priority patent/EP3193207B1/en
Priority to US15/509,265 priority patent/US10576580B2/en
Publication of JP2016055319A publication Critical patent/JP2016055319A/ja
Publication of JP2016055319A5 publication Critical patent/JP2016055319A5/ja
Priority to JP2019155946A priority patent/JP6940564B2/ja
Pending legal-status Critical Current

Links

JP2014184020A 2014-09-10 2014-09-10 光照射装置および光照射方法 Pending JP2016055319A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014184020A JP2016055319A (ja) 2014-09-10 2014-09-10 光照射装置および光照射方法
PCT/JP2015/074061 WO2016039148A1 (ja) 2014-09-10 2015-08-26 光照射装置および光照射方法
CN201580048521.7A CN106687852B (zh) 2014-09-10 2015-08-26 光照射装置和光照射方法
EP15840056.4A EP3193207B1 (en) 2014-09-10 2015-08-26 Light irradiating device and light irradiating method
US15/509,265 US10576580B2 (en) 2014-09-10 2015-08-26 Light irradiating device and light irradiating method
JP2019155946A JP6940564B2 (ja) 2014-09-10 2019-08-28 光照射装置および光照射方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014184020A JP2016055319A (ja) 2014-09-10 2014-09-10 光照射装置および光照射方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019155946A Division JP6940564B2 (ja) 2014-09-10 2019-08-28 光照射装置および光照射方法

Publications (2)

Publication Number Publication Date
JP2016055319A JP2016055319A (ja) 2016-04-21
JP2016055319A5 true JP2016055319A5 (enExample) 2017-08-24

Family

ID=55458902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014184020A Pending JP2016055319A (ja) 2014-09-10 2014-09-10 光照射装置および光照射方法

Country Status (5)

Country Link
US (1) US10576580B2 (enExample)
EP (1) EP3193207B1 (enExample)
JP (1) JP2016055319A (enExample)
CN (1) CN106687852B (enExample)
WO (1) WO2016039148A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016055319A (ja) * 2014-09-10 2016-04-21 浜松ホトニクス株式会社 光照射装置および光照射方法
JP6676168B2 (ja) * 2016-07-14 2020-04-08 三菱電機株式会社 レーザ加工ヘッド及びレーザ加工装置
JP7149857B2 (ja) * 2019-01-08 2022-10-07 浜松ホトニクス株式会社 データ作成装置、光制御装置、データ作成方法、及びデータ作成プログラム
JP7450413B2 (ja) 2020-03-09 2024-03-15 株式会社ディスコ レーザー加工装置およびレーザー加工装置の調整方法
CN111796439B (zh) * 2020-06-11 2023-04-21 杭州奥创光子技术有限公司 一种飞秒脉冲的整形压缩装置及其使用方法
JPWO2023228548A1 (enExample) * 2022-05-24 2023-11-30

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3594384B2 (ja) * 1995-12-08 2004-11-24 ソニー株式会社 半導体露光装置、投影露光装置及び回路パターン製造方法
JP2001311877A (ja) * 2000-04-27 2001-11-09 Hamamatsu Photonics Kk 撮像装置
US7151609B2 (en) * 2000-07-06 2006-12-19 Filmetrics, Inc. Determining wafer orientation in spectral imaging
US20050174583A1 (en) * 2000-07-06 2005-08-11 Chalmers Scott A. Method and apparatus for high-speed thickness mapping of patterned thin films
US20050174584A1 (en) * 2000-07-06 2005-08-11 Chalmers Scott A. Method and apparatus for high-speed thickness mapping of patterned thin films
US7609731B2 (en) * 2001-01-30 2009-10-27 Board Of Trustees Operating Michigan State University Laser system using ultra-short laser pulses
US7450618B2 (en) 2001-01-30 2008-11-11 Board Of Trustees Operating Michigan State University Laser system using ultrashort laser pulses
US6781691B2 (en) 2001-02-02 2004-08-24 Tidal Photonics, Inc. Apparatus and methods relating to wavelength conditioning of illumination
JP2002273583A (ja) * 2001-03-19 2002-09-25 Inst Of Physical & Chemical Res 透明媒質加工装置
EP2412304B1 (en) * 2003-09-04 2016-08-03 The UAB Research Foundation Method and apparatus for the detection of impaired dark adaptation
JP2005084266A (ja) * 2003-09-05 2005-03-31 Kawasaki Heavy Ind Ltd 光制御装置および光制御方法
ATE436106T1 (de) * 2004-03-02 2009-07-15 Univ Michigan State Lasersystem mit ultrakurzen laserimpulsen
JP4716663B2 (ja) * 2004-03-19 2011-07-06 株式会社リコー レーザ加工装置、レーザ加工方法、及び該加工装置又は加工方法により作製された構造体
US7787779B2 (en) * 2005-05-06 2010-08-31 Purdue Research Foundation Photonic time-domain electromagnetic signal generator and system using the same
JP2007114278A (ja) * 2005-10-18 2007-05-10 Fuji Xerox Co Ltd 光アドレス型空間光変調素子の駆動方法、および光アドレス型空間光変調素子駆動装置
US9018562B2 (en) * 2006-04-10 2015-04-28 Board Of Trustees Of Michigan State University Laser material processing system
US7430071B2 (en) * 2006-05-16 2008-09-30 Coherent, Inc. Adjustable pulse-shaper
JP4402708B2 (ja) * 2007-08-03 2010-01-20 浜松ホトニクス株式会社 レーザ加工方法、レーザ加工装置及びその製造方法
US7813390B2 (en) * 2007-08-29 2010-10-12 Pavilion Integration Corporation Injection-seeded monolithic laser
US8239165B1 (en) * 2007-09-28 2012-08-07 Alliance For Sustainable Energy, Llc Ultra-fast determination of quantum efficiency of a solar cell
US7576907B1 (en) * 2008-05-12 2009-08-18 Colorado State University Research Foundation Phase and amplitude light pulse shaping using a one-dimensional phase mask
JP5692969B2 (ja) * 2008-09-01 2015-04-01 浜松ホトニクス株式会社 収差補正方法、この収差補正方法を用いたレーザ加工方法、この収差補正方法を用いたレーザ照射方法、収差補正装置、及び、収差補正プログラム
CN101349871B (zh) 2008-09-05 2010-09-15 上海微电子装备有限公司 光刻照明装置
US7894493B2 (en) * 2008-10-02 2011-02-22 Coherent, Inc. Ultrashort seed-pulse generating laser with integral pulse shaping
JP2010151948A (ja) 2008-12-24 2010-07-08 Hamamatsu Photonics Kk 光制御装置および光制御方法
EP2211430A3 (en) * 2009-01-23 2015-05-27 Board of Trustees of Michigan State University Laser autocorrelation system
US8456629B2 (en) * 2009-11-18 2013-06-04 The Regents Of The University Of California Apparatus and method for multiple-pulse impulsive stimulated raman spectroscopy
US20130076861A1 (en) * 2010-01-21 2013-03-28 Shmuel Sternklar Method and apparatus for probing an object, medium or optical path using noisy light
US8630322B2 (en) * 2010-03-01 2014-01-14 Board Of Trustees Of Michigan State University Laser system for output manipulation
US9052239B2 (en) * 2011-03-14 2015-06-09 Wisconsin Alumni Research Foundation Multidimensional spectrometer
JP5802110B2 (ja) 2011-10-26 2015-10-28 浜松ホトニクス株式会社 光変調制御方法、制御プログラム、制御装置、及びレーザ光照射装置
US9137874B2 (en) * 2011-12-02 2015-09-15 Biological Illumination, Llc Illumination and grow light system and associated methods
JP5575200B2 (ja) * 2012-09-28 2014-08-20 浜松ホトニクス株式会社 レーザ加工装置及びその製造方法
JP2016055319A (ja) * 2014-09-10 2016-04-21 浜松ホトニクス株式会社 光照射装置および光照射方法

Similar Documents

Publication Publication Date Title
JP2016055319A5 (enExample)
MX375410B (es) Sistema de gestión de modulación de fotones.
EP2955495A3 (en) Method and system for correcting incident light fluctuations in absorption spectroscopy
MX392973B (es) Sistema de gestion de modulacion de fotones.
JP2017511149A5 (enExample)
HK1245167A1 (zh) 物品和用於生成气溶胶的装置
MX2016003664A (es) Dispositivo y procedimiento de marcado laser de una lentilla oftalmica con un pulso laser de longitud de onda y energia por pulsos seleccionados.
WO2014143826A3 (en) Interior energy-activation of photo-reactive species inside a medium or body
RU2017132197A (ru) Способы для дисплея с двойной модуляцией с преобразованием света
WO2015157778A3 (en) System and method for generating high energy optical pulses with arbitrary waveform
WO2011099409A3 (en) Wavelength swept light source apparatus and optical coherence tomography system including the same
MY186130A (en) Wavelength-dependent light intensity modulation in multivariate optical computing devices using polarizers
GB2553614B (en) Wavelength conversion element, light source apparatus and image projection apparatus
JP2017146753A5 (enExample)
EP2662906A3 (en) Lighting device
WO2014145644A3 (en) Methods of tuning light emitting devices and tuned light emitting devices
EP4043933A4 (en) LIGHT MODULATION DEVICE
TW201615062A (en) Laser-driven photon source and inspection apparatus including such a laser-driven photon source
GB201821316D0 (en) Wavelength conversion element, light source device, and image projection device
EP3136454A4 (en) Wavelength conversion joining member, wavelength conversion heat-radiating member, and light emission device
EP2733519A3 (en) Light-emitting apparatus capable of adjusting a color of a projected light thereof
WO2012102833A3 (en) Systems and methods for stimulated raman scattering flow-cytometry
MX2019013664A (es) Dispositivos de iluminacion y metodos de uso.
WO2016026484A3 (de) Anordnung und verfahren zum modulieren von laserpulsen
Al-Amri et al. Beyond the Rayleigh limit in optical lithography