JP2016018794A5 - - Google Patents
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- Publication number
- JP2016018794A5 JP2016018794A5 JP2014138229A JP2014138229A JP2016018794A5 JP 2016018794 A5 JP2016018794 A5 JP 2016018794A5 JP 2014138229 A JP2014138229 A JP 2014138229A JP 2014138229 A JP2014138229 A JP 2014138229A JP 2016018794 A5 JP2016018794 A5 JP 2016018794A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- flow rate
- processing method
- plasma processing
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000003672 processing method Methods 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 4
- 238000001020 plasma etching Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims 49
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims 1
- 229910018503 SF6 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims 1
- 229960000909 sulfur hexafluoride Drugs 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014138229A JP6334296B2 (ja) | 2014-07-04 | 2014-07-04 | プラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014138229A JP6334296B2 (ja) | 2014-07-04 | 2014-07-04 | プラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016018794A JP2016018794A (ja) | 2016-02-01 |
| JP2016018794A5 true JP2016018794A5 (enExample) | 2017-02-16 |
| JP6334296B2 JP6334296B2 (ja) | 2018-05-30 |
Family
ID=55233844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014138229A Active JP6334296B2 (ja) | 2014-07-04 | 2014-07-04 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6334296B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10734238B2 (en) * | 2017-11-21 | 2020-08-04 | Lam Research Corporation | Atomic layer deposition and etch in a single plasma chamber for critical dimension control |
| JP7220603B2 (ja) * | 2019-03-20 | 2023-02-10 | 東京エレクトロン株式会社 | 膜をエッチングする方法及びプラズマ処理装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19706682C2 (de) * | 1997-02-20 | 1999-01-14 | Bosch Gmbh Robert | Anisotropes fluorbasiertes Plasmaätzverfahren für Silizium |
| JP2001168086A (ja) * | 1999-12-09 | 2001-06-22 | Kawasaki Steel Corp | 半導体装置の製造方法および製造装置 |
| JP2003151960A (ja) * | 2001-11-12 | 2003-05-23 | Toyota Motor Corp | トレンチエッチング方法 |
| US20070202700A1 (en) * | 2006-02-27 | 2007-08-30 | Applied Materials, Inc. | Etch methods to form anisotropic features for high aspect ratio applications |
-
2014
- 2014-07-04 JP JP2014138229A patent/JP6334296B2/ja active Active
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