JP2016012678A5 - - Google Patents
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- Publication number
- JP2016012678A5 JP2016012678A5 JP2014133924A JP2014133924A JP2016012678A5 JP 2016012678 A5 JP2016012678 A5 JP 2016012678A5 JP 2014133924 A JP2014133924 A JP 2014133924A JP 2014133924 A JP2014133924 A JP 2014133924A JP 2016012678 A5 JP2016012678 A5 JP 2016012678A5
- Authority
- JP
- Japan
- Prior art keywords
- processing
- processing gas
- gas
- light transmission
- ultraviolet rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims description 38
- 238000010926 purge Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical group O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 238000003672 processing method Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014133924A JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
| US15/321,163 US20170156217A1 (en) | 2014-06-30 | 2015-03-19 | Desmear treatment device and desmear treatment method |
| PCT/JP2015/058190 WO2016002266A1 (ja) | 2014-06-30 | 2015-03-19 | デスミア処理装置およびデスミア処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014133924A JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016012678A JP2016012678A (ja) | 2016-01-21 |
| JP2016012678A5 true JP2016012678A5 (cg-RX-API-DMAC7.html) | 2016-12-08 |
| JP6102842B2 JP6102842B2 (ja) | 2017-03-29 |
Family
ID=55018826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014133924A Active JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20170156217A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6102842B2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2016002266A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113518510B (zh) * | 2020-04-10 | 2022-10-11 | 南通深南电路有限公司 | 一种pcb板除胶装置和方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4328081A (en) * | 1980-02-25 | 1982-05-04 | Micro-Plate, Inc. | Plasma desmearing apparatus and method |
| JPS6320833A (ja) * | 1986-07-14 | 1988-01-28 | Toshiba Corp | アツシング装置 |
| JPH05109674A (ja) * | 1991-10-18 | 1993-04-30 | Ushio Inc | レジスト膜の灰化方法と灰化装置 |
| JPH08180757A (ja) * | 1994-12-21 | 1996-07-12 | Nitto Denko Corp | 接点部の形成方法 |
| JPH10280151A (ja) * | 1997-04-08 | 1998-10-20 | Fujitsu Ltd | Ｃｖｄ装置のクリーニング方法 |
| US7566664B2 (en) * | 2006-08-02 | 2009-07-28 | Qualcomm Mems Technologies, Inc. | Selective etching of MEMS using gaseous halides and reactive co-etchants |
| JP2010027702A (ja) * | 2008-07-16 | 2010-02-04 | Hitachi Kokusai Electric Inc | 基板処理装置及び薄膜生成方法 |
-
2014
- 2014-06-30 JP JP2014133924A patent/JP6102842B2/ja active Active
-
2015
- 2015-03-19 US US15/321,163 patent/US20170156217A1/en not_active Abandoned
- 2015-03-19 WO PCT/JP2015/058190 patent/WO2016002266A1/ja not_active Ceased
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