JP2016012649A - 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法 - Google Patents

指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法 Download PDF

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JP2016012649A
JP2016012649A JP2014133284A JP2014133284A JP2016012649A JP 2016012649 A JP2016012649 A JP 2016012649A JP 2014133284 A JP2014133284 A JP 2014133284A JP 2014133284 A JP2014133284 A JP 2014133284A JP 2016012649 A JP2016012649 A JP 2016012649A
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Japan
Prior art keywords
data
section
command data
command
control
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JP2014133284A
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English (en)
Japanese (ja)
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JP2016012649A5 (enExample
Inventor
博仁 伊藤
Hirohito Ito
博仁 伊藤
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014133284A priority Critical patent/JP2016012649A/ja
Priority to US14/749,357 priority patent/US20150378342A1/en
Publication of JP2016012649A publication Critical patent/JP2016012649A/ja
Publication of JP2016012649A5 publication Critical patent/JP2016012649A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/416—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control of velocity, acceleration or deceleration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/40—Robotics, robotics mapping to robotics vision
    • G05B2219/40408—Intention learning
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45028—Lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement
    • H01J2237/20285—Motorised movement computer-controlled
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • Artificial Intelligence (AREA)
  • Health & Medical Sciences (AREA)
  • Medical Informatics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Software Systems (AREA)
  • Evolutionary Computation (AREA)
  • Computer Hardware Design (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014133284A 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法 Pending JP2016012649A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014133284A JP2016012649A (ja) 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法
US14/749,357 US20150378342A1 (en) 2014-06-27 2015-06-24 Command data generation method, positioning apparatus, lithography apparatus, and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014133284A JP2016012649A (ja) 2014-06-27 2014-06-27 指令データの作成方法、位置決め装置、リソグラフィ装置、物品の製造方法

Publications (2)

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JP2016012649A true JP2016012649A (ja) 2016-01-21
JP2016012649A5 JP2016012649A5 (enExample) 2017-08-03

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US (1) US20150378342A1 (enExample)
JP (1) JP2016012649A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022059871A (ja) * 2020-10-02 2022-04-14 キヤノン株式会社 フィードバック制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置、物品の製造方法、コンピュータプログラム、およびフィードバック制御方法
JP2022129161A (ja) * 2021-02-24 2022-09-05 キヤノン株式会社 制御装置、位置決め装置、リソグラフィー装置および物品製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6861508B2 (ja) * 2016-12-08 2021-04-21 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム露光方法及びマルチ荷電粒子ビーム露光装置
CN110147043B (zh) * 2019-05-31 2021-11-16 中国工程物理研究院计算机应用研究所 一种数据驱动的复杂控制系统扰动解耦容错控制方法
WO2021078352A1 (en) * 2019-10-21 2021-04-29 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle beam device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6280710A (ja) * 1985-10-04 1987-04-14 San Esu Shoko Co Ltd デジタルサ−ボ制御法
JPH0974059A (ja) * 1995-09-04 1997-03-18 Canon Inc 精密制御装置
JPH11114858A (ja) * 1997-10-07 1999-04-27 Toyoda Mach Works Ltd 軌跡制御方法および軌跡制御装置
US20050231706A1 (en) * 2004-04-14 2005-10-20 Nikon Corporation Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
JP2007251162A (ja) * 2006-03-14 2007-09-27 Asml Netherlands Bv 設定値プロファイルを介した構成要素を移動するシステムおよび方法、リソグラフィ装置およびデバイス製造方法
JP2007294958A (ja) * 2006-04-20 2007-11-08 Asml Netherlands Bv 改善されたフィードフォワードデータを取得する方法、その方法を実行するリソグラフィ装置およびデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6280710A (ja) * 1985-10-04 1987-04-14 San Esu Shoko Co Ltd デジタルサ−ボ制御法
JPH0974059A (ja) * 1995-09-04 1997-03-18 Canon Inc 精密制御装置
JPH11114858A (ja) * 1997-10-07 1999-04-27 Toyoda Mach Works Ltd 軌跡制御方法および軌跡制御装置
US20050231706A1 (en) * 2004-04-14 2005-10-20 Nikon Corporation Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
JP2007251162A (ja) * 2006-03-14 2007-09-27 Asml Netherlands Bv 設定値プロファイルを介した構成要素を移動するシステムおよび方法、リソグラフィ装置およびデバイス製造方法
JP2007294958A (ja) * 2006-04-20 2007-11-08 Asml Netherlands Bv 改善されたフィードフォワードデータを取得する方法、その方法を実行するリソグラフィ装置およびデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022059871A (ja) * 2020-10-02 2022-04-14 キヤノン株式会社 フィードバック制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置、物品の製造方法、コンピュータプログラム、およびフィードバック制御方法
JP7508325B2 (ja) 2020-10-02 2024-07-01 キヤノン株式会社 フィードバック制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置、物品の製造方法、コンピュータプログラム、およびフィードバック制御方法
JP2022129161A (ja) * 2021-02-24 2022-09-05 キヤノン株式会社 制御装置、位置決め装置、リソグラフィー装置および物品製造方法
JP7645658B2 (ja) 2021-02-24 2025-03-14 キヤノン株式会社 制御装置、位置決め装置、リソグラフィー装置および物品製造方法

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