JP2016009767A5 - - Google Patents

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Publication number
JP2016009767A5
JP2016009767A5 JP2014129706A JP2014129706A JP2016009767A5 JP 2016009767 A5 JP2016009767 A5 JP 2016009767A5 JP 2014129706 A JP2014129706 A JP 2014129706A JP 2014129706 A JP2014129706 A JP 2014129706A JP 2016009767 A5 JP2016009767 A5 JP 2016009767A5
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JP
Japan
Prior art keywords
substrate
detector
mark
information
exposure apparatus
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Application number
JP2014129706A
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English (en)
Japanese (ja)
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JP6371602B2 (ja
JP2016009767A (ja
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Priority to JP2014129706A priority Critical patent/JP6371602B2/ja
Priority claimed from JP2014129706A external-priority patent/JP6371602B2/ja
Publication of JP2016009767A publication Critical patent/JP2016009767A/ja
Publication of JP2016009767A5 publication Critical patent/JP2016009767A5/ja
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Publication of JP6371602B2 publication Critical patent/JP6371602B2/ja
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JP2014129706A 2014-06-24 2014-06-24 露光装置、露光方法、および物品の製造方法 Active JP6371602B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014129706A JP6371602B2 (ja) 2014-06-24 2014-06-24 露光装置、露光方法、および物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014129706A JP6371602B2 (ja) 2014-06-24 2014-06-24 露光装置、露光方法、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016009767A JP2016009767A (ja) 2016-01-18
JP2016009767A5 true JP2016009767A5 (cg-RX-API-DMAC7.html) 2017-08-03
JP6371602B2 JP6371602B2 (ja) 2018-08-08

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JP2014129706A Active JP6371602B2 (ja) 2014-06-24 2014-06-24 露光装置、露光方法、および物品の製造方法

Country Status (1)

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JP (1) JP6371602B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6853700B2 (ja) * 2017-03-14 2021-03-31 キヤノン株式会社 露光装置、露光方法、プログラム、決定方法及び物品の製造方法
KR20210001968A (ko) * 2019-06-27 2021-01-06 캐논 가부시끼가이샤 패턴 형성 방법 및 물품의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0616478B2 (ja) * 1983-12-19 1994-03-02 株式会社ニコン 投影露光装置の位置合せ装置
JPS62183515A (ja) * 1986-02-07 1987-08-11 Canon Inc 位置合せ装置
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
JPH10172890A (ja) * 1996-12-12 1998-06-26 Nikon Corp 投影露光方法
JP2001118768A (ja) * 1999-10-15 2001-04-27 Nikon Corp マスクのアライメント方法および露光装置
JP2003017382A (ja) * 2001-06-28 2003-01-17 Canon Inc 露光装置およびデバイス製造方法
JP2003059807A (ja) * 2001-08-20 2003-02-28 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法

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