JP2016009570A - Method of manufacturing contact part - Google Patents

Method of manufacturing contact part Download PDF

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JP2016009570A
JP2016009570A JP2014129020A JP2014129020A JP2016009570A JP 2016009570 A JP2016009570 A JP 2016009570A JP 2014129020 A JP2014129020 A JP 2014129020A JP 2014129020 A JP2014129020 A JP 2014129020A JP 2016009570 A JP2016009570 A JP 2016009570A
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Prior art keywords
contact
terminal
tab
contact surface
indent
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準弥 篠原
Junya Shinohara
準弥 篠原
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Yazaki Corp
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Yazaki Corp
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Priority to JP2014129020A priority Critical patent/JP2016009570A/en
Priority to PCT/JP2015/062489 priority patent/WO2015163439A1/en
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Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a contact part capable of reducing contact resistance, without upsizing a terminal, and without complicating as much as possible.SOLUTION: In a method of manufacturing a contact part, where the indent 4 of a box 2 slides on the contact surface 12a of a tab 12, and the indent 4 comes into contact with the tab 12 at a terminal insertion completion position, reflow processing after plating a base material 12A composing the box 2 and tab 12 is performed only for the base material 12A composing the tab 12.

Description

この発明は、第1接点部(第1端子)と第2接点部(第2端子)との間の電気的接続を行う接点部の製造方法に関するものである。   The present invention relates to a method of manufacturing a contact portion that performs electrical connection between a first contact portion (first terminal) and a second contact portion (second terminal).

図4および図5には、従来の接点接続構造を適用したメス端子51とオス端子61とが示されている(類似技術として特許文献1、特許文献2参照)。   4 and 5 show a female terminal 51 and a male terminal 61 to which a conventional contact connection structure is applied (see Patent Document 1 and Patent Document 2 as similar techniques).

図4、図5および図6に示すように、メス端子51は、四角形状の箱部52と、箱部52に一体に設けられ、箱部52内に配置された弾性撓み部53とを有している。
弾性撓み部53には、箱部52の底面部52a側に向かって突出するインデント部54が設けられている。
As shown in FIGS. 4, 5, and 6, the female terminal 51 includes a rectangular box portion 52 and an elastic bending portion 53 that is provided integrally with the box portion 52 and disposed in the box portion 52. doing.
The elastic bending portion 53 is provided with an indent portion 54 that protrudes toward the bottom surface portion 52 a side of the box portion 52.

インデント部54は、外周面がほぼ球面形状で、中心の頂点が最下方に位置している。
なお、図4〜図6では、図示が省略されているが、メス端子51の外面の全域には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上等の観点からメッキ(例えば、錫メッキ)が施され、メッキ層が設けられている。
The indented portion 54 has a substantially spherical outer peripheral surface, and the center vertex is located at the lowest position.
Although not shown in FIGS. 4 to 6, the entire outer surface of the female terminal 51 is provided from the viewpoint of improving connection reliability in a high temperature environment, improving corrosion resistance in a corrosive environment, and the like. Plating (for example, tin plating) is performed and a plating layer is provided.

図4、図5および図7に示すように、オス端子61は、平板状のタブ部62を有している。
なお、図4、図5および図7では、図示が省略されているが、オス端子61の外面の全域には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上等の観点からメッキ(例えば、錫メッキ)が施され、メッキ層が設けられている。
As shown in FIGS. 4, 5, and 7, the male terminal 61 has a flat tab portion 62.
4, 5, and 7, illustration is omitted, but the entire area of the outer surface of the male terminal 61 is improved in connection reliability in a high-temperature environment, improved in corrosion resistance in a corrosive environment, and the like. From this point of view, plating (for example, tin plating) is performed and a plating layer is provided.

上記のようにメッキ(錫メッキ)し、その後にリフロー処理を行うと、例えば、図10に示すような構造となる。
すなわち、オス端子61(タブ部62)を構成する銅合金材の母材62Aにメッキ、例えば、錫メッキを施すと、図10(a)に示すように、母材62Aの表面に、表面に凹凸を有するメッキ層63が形成される。
When plating (tin plating) is performed as described above and then a reflow process is performed, for example, a structure as shown in FIG. 10 is obtained.
That is, if the copper alloy base material 62A constituting the male terminal 61 (tab portion 62) is plated, for example, tin-plated, the surface of the base material 62A is applied to the surface as shown in FIG. A plating layer 63 having irregularities is formed.

そして、メッキ時の応力を除去したり、母材62Aとの拡散層を形成することで経時的変化を少なくする等のためにリフロー処理を行うと、図10(b)に示すように、メッキ層63の表面は平坦化され、メッキ層63の外面側に酸化膜64が形成される。
このメッキ層63は、母材62Aの外面に形成される銅/錫合金層(拡散層)と、この銅/錫合金層の外側に形成される錫メッキ層とで形成されている。
メス端子51の母材においても、同様に、メッキを施した後にリフロー処理が行われ、メッキ層、酸化膜が形成される。
Then, when reflow processing is performed to remove the stress at the time of plating or to reduce the change over time by forming a diffusion layer with the base material 62A, as shown in FIG. The surface of the layer 63 is planarized, and an oxide film 64 is formed on the outer surface side of the plating layer 63.
The plating layer 63 is formed of a copper / tin alloy layer (diffusion layer) formed on the outer surface of the base material 62A and a tin plating layer formed outside the copper / tin alloy layer.
Similarly, the reflow process is performed on the base material of the female terminal 51 after plating, and a plating layer and an oxide film are formed.

上記した構成において、図4の位置に位置するオス端子61のタブ部62をメス端子51の箱部52内へ挿入すると、タブ部62に押されることによって弾性撓み部53が撓み、変形することにより、タブ部62の挿入が許容される。
タブ部62の挿入過程では、弾性撓み部53のインデント部54がタブ部62の接触面62a上を摺動し、端子挿入完了位置では、図5および図8に示すように、弾性撓み部53のインデント部54と、タブ部62の接触面62aとが接触する。
In the above configuration, when the tab portion 62 of the male terminal 61 located at the position of FIG. 4 is inserted into the box portion 52 of the female terminal 51, the elastic bending portion 53 is bent and deformed by being pushed by the tab portion 62. Accordingly, the insertion of the tab portion 62 is allowed.
In the insertion process of the tab portion 62, the indent portion 54 of the elastic bending portion 53 slides on the contact surface 62a of the tab portion 62, and at the terminal insertion completion position, as shown in FIGS. The indent portion 54 and the contact surface 62a of the tab portion 62 come into contact with each other.

この端子挿入完了位置では、弾性撓み部53の撓み復帰力が接触荷重として作用することにより、メス端子51のインデント部54と、オス端子61のタブ部62(接触面62a)とが電気的に接触する。
そして、インデント部54とタブ部62との間を電流が流れることによってメス端子51とオス端子61との間が導通する。
At the terminal insertion completion position, the bending return force of the elastic bending portion 53 acts as a contact load, so that the indent portion 54 of the female terminal 51 and the tab portion 62 (contact surface 62a) of the male terminal 61 are electrically connected. Contact.
Then, when a current flows between the indent portion 54 and the tab portion 62, the female terminal 51 and the male terminal 61 are electrically connected.

特開2007−280825号公報JP 2007-280825 A 特開2013−105642号公報JP 2013-105642 A

しかしながら、前述した従来の構造では、メス端子51のインデント部54がほぼ球面形状であるため、インデント部54の外周面の頂点でのみタブ部62の接触面62aと接触する。
ここで、双方の接触面は、図9(a)(みかけ接触面E2は、明確化のためにハッチングを施してある。)に示すように、みかけ接触面E2(みかけ接触面径D2)の全領域において実質的に接触しているわけではなく、図9(b)に示すように、みかけ接触面E2の内で実際に接触する面(真実接触面A)のみが電気的通電を担っている。
However, in the conventional structure described above, the indent portion 54 of the female terminal 51 has a substantially spherical shape, so that it contacts the contact surface 62a of the tab portion 62 only at the apex of the outer peripheral surface of the indent portion 54.
Here, as shown in FIG. 9A (the apparent contact surface E2 is hatched for clarity), both the contact surfaces are of the apparent contact surface E2 (apparent contact surface diameter D2). It is not in substantial contact in the entire region, and as shown in FIG. 9B, only the surface that actually contacts (true contact surface A) in the apparent contact surface E2 is responsible for electrical conduction. Yes.

インデント部54とタブ部62の接触面62aは、共に平滑な面に形成されているが、実際には少ない凹凸が形成された面である。
このように少ない凹凸面同士の接触では、図9(b)に示すように、みかけ接触面E2の範囲内の真実接触面Aの数が少なくなるため、接触抵抗が大きくなる。
Both the indented portion 54 and the contact surface 62a of the tab portion 62 are formed as smooth surfaces, but are actually surfaces on which few irregularities are formed.
In such a contact between the concave and convex surfaces, as shown in FIG. 9B, the number of the true contact surfaces A within the range of the apparent contact surface E2 decreases, so that the contact resistance increases.

そこで、みかけ接触面E2のみかけ接触面径D2を大きくして接触抵抗の低減を図るため、弾性撓み部53の撓み復帰力(接触荷重)を大きくしたり、接点部(インデント部54)を大型化したりすることが考えられるが、端子51,61が大型化したり、複雑化するという問題がある。   Therefore, in order to reduce the contact resistance by increasing the apparent contact surface diameter D2 of the apparent contact surface E2, the bending return force (contact load) of the elastic bending portion 53 is increased, or the contact portion (indent portion 54) is enlarged. However, there is a problem that the terminals 51 and 61 are enlarged or complicated.

この発明は、上記した問題を解決すべくなされたものであり、端子を大型化させたり、極力複雑化させたりすることなく、接触抵抗を低減させることのできる接点部の製造方法を提供するものである。   The present invention has been made to solve the above-described problems, and provides a method for manufacturing a contact portion that can reduce contact resistance without increasing the size of a terminal or complicating it as much as possible. It is.

この発明の接点部の製造方法は、第1接点部のインデント部が第2接点部の接触面上を摺動し、端子挿入完了位置では、前記インデント部が前記第2接点部に接触する接点部の製造方法であって、前記各接点部を構成する母材にメッキを施した後のリフロー処理を、前記各接点部を構成する、前記メッキを施した前記各母材のいずれか一方に対してのみ行うことを特徴とする。   The contact portion manufacturing method of the present invention is such that the indent portion of the first contact portion slides on the contact surface of the second contact portion, and the indent portion contacts the second contact portion at the terminal insertion completion position. Part manufacturing method, wherein the reflow treatment after plating the base material constituting each contact portion is applied to any one of the plated base materials constituting each contact portion. It is characterized in that it is performed only for this.

この発明の接点部の製造方法によれば、各接点部を構成する母材にメッキを施した後のリフロー処理を、各接点部を構成する、メッキを施した各母材のいずれか一方に対してのみ行うことにより、一方の接点部の表面は平坦化され、他方の接点部の表面は凹凸状態のままとなる。
このように、一方の接点部の表面が平坦化され、他方の接点部の表面が凹凸状態のままとなることにより、インデント部と第2接点部の接触面とのみかけ接触面における真実接触面を多く確保することができる。
したがって、端子を大型化させたり、極力複雑化させたりすることなく、接触抵抗を低減させることができる。
According to the method for manufacturing a contact portion of the present invention, the reflow process after plating the base material constituting each contact portion is applied to any one of the plated base materials constituting each contact portion. By performing only on the surface, the surface of one contact portion is flattened, and the surface of the other contact portion remains in an uneven state.
In this way, the surface of one contact portion is flattened and the surface of the other contact portion remains in an uneven state, so that the contact surface of the indented portion and the contact surface of the second contact portion is a real contact surface in the apparent contact surface. A lot can be secured.
Therefore, the contact resistance can be reduced without increasing the size of the terminal or making it as complex as possible.

この発明を適用した端接点接続構造の、接続前のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal before connection and the male terminal of the end contact connection structure to which this invention is applied. この発明を適用した端接点接続構造の、接続後のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal and male terminal after a connection of the end contact connection structure to which this invention is applied. この発明の一実施例を示す図で、(a)みかけ接触面を示す説明図、(b)は真実接触面を示す説明図である。It is a figure which shows one Example of this invention, (a) Explanatory drawing which shows an apparent contact surface, (b) is explanatory drawing which shows a true contact surface. 従来例の、接続前のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal and male terminal before a connection of a prior art example. 従来例の、接続後のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal and male terminal after a connection of a prior art example. 従来例を示す図で、(a)はメス端子の接点部の要部側面図、(b)は図6(a)のC矢視図である。It is a figure which shows a prior art example, (a) is a principal part side view of the contact part of a female terminal, (b) is C arrow line view of Fig.6 (a). 従来例を示す図で、(a)はオス端子の接点部の要部側面図、(b)はオス端子の接点部の要部平面図である。It is a figure which shows a prior art example, (a) is a principal part side view of the contact part of a male terminal, (b) is a principal part top view of the contact part of a male terminal. 従来例の、接点接続箇所の要部側面図である。It is a principal part side view of the contact connection location of a prior art example. 従来例を示す図で、(a)みかけ接触面を示す説明図、(b)は真実接触面を示す説明図である。It is a figure which shows a prior art example, (a) Explanatory drawing which shows an apparent contact surface, (b) is explanatory drawing which shows a true contact surface. リフロー処理を示す図で、(a)はリフロー処理前の断面図に相当する説明図、(b)はリフロー処理後の断面図に相当する説明図である。It is a figure which shows reflow processing, (a) is explanatory drawing equivalent to sectional drawing before reflow processing, (b) is explanatory drawing equivalent to sectional drawing after reflow processing.

以下、この発明の一実施例を、図10を参照して説明する。   An embodiment of the present invention will be described below with reference to FIG.

オス端子(タブ部12)を構成する銅合金材の母材12Aにメッキ、例えば、錫メッキを施すと、図10(a)に示すように、母材12Aの外面に、表面に凹凸を有するメッキ層13が形成される。   When the copper alloy base material 12A constituting the male terminal (tab portion 12) is plated, for example, tin-plated, as shown in FIG. 10A, the outer surface of the base material 12A has irregularities on the surface. A plating layer 13 is formed.

このようにメッキを施した母材12Aを、例えば、空気中で、350℃に加熱した後に冷却するリフロー処理を行うと、図10(b)に示すように、メッキ層13の表面は平坦化され、メッキ層13の外面側に酸化膜14が形成される。
このメッキ層13は、母材12Aの外面に形成される銅/錫合金層(拡散層)と、この銅/錫合金層の外側に形成される錫メッキ層とで形成されている。
When reflow treatment is performed on the base material 12A plated in this manner, for example, in air, after cooling to 350 ° C. and then cooling, the surface of the plating layer 13 is flattened as shown in FIG. Then, an oxide film 14 is formed on the outer surface side of the plating layer 13.
The plating layer 13 is formed of a copper / tin alloy layer (diffusion layer) formed on the outer surface of the base material 12A and a tin plating layer formed outside the copper / tin alloy layer.

なお、メス端子(箱部、弾性撓み部、インデント部)を構成する銅合金材の母材にメッキ(例えば、錫メッキ)を施した後、この母材に対してはリフロー処理を行わない。
しかしながら、メス端子においても、メッキ層(銅/錫合金層(拡散層)と、この銅/錫合金層の外側に形成される錫メッキ層とで形成されている。)と、酸化膜14とが形成される。
In addition, after giving plating (for example, tin plating) to the base material of the copper alloy material which comprises a female terminal (a box part, an elastic bending part, an indent part), a reflow process is not performed with respect to this base material.
However, also in the female terminal, a plating layer (formed by a copper / tin alloy layer (diffusion layer) and a tin plating layer formed outside the copper / tin alloy layer), and the oxide film 14 are formed. Is formed.

この発明を適用した接点接続構造を、図1〜図3を参照して説明する。   A contact connection structure to which the present invention is applied will be described with reference to FIGS.

図1および図2に示すメス端子(第1端子)1は、メス側コネクタハウジング(図示省略)内の端子収容室に配置(収容)されている。
メス端子1は、上述したようにメッキが施され、リフロー処理が施されない導電性金属(例えば、銅合金)を所定形状に打ち抜き、折り曲げ加工することによって形成されている。
A female terminal (first terminal) 1 shown in FIGS. 1 and 2 is disposed (accommodated) in a terminal accommodating chamber in a female connector housing (not shown).
The female terminal 1 is formed by punching and bending a conductive metal (for example, copper alloy) that has been plated as described above and not subjected to reflow treatment into a predetermined shape.

メス端子1は、図1および図2に示すように、第1接点部である箱部2を有している。
箱部2は、前方(図1の左側)が開口した方形状である。
箱部2内には、箱部2の上面部より折り曲げられた弾性撓み部3が配置されている。
As shown in FIGS. 1 and 2, the female terminal 1 has a box portion 2 that is a first contact portion.
The box part 2 has a rectangular shape with the front (left side in FIG. 1) opened.
In the box part 2, an elastic bending part 3 bent from the upper surface part of the box part 2 is arranged.

弾性撓み部3には、箱部2の底面部2a側に向かって突出するインデント部4が設けられている。
インデント部4は、外周面(箱部2の底面部2aと対向する面)がほぼ球面形状で、中心の頂点が最下方に位置し、弾性撓み部3の弾性変形によって上方に変移する。
The elastic bending portion 3 is provided with an indent portion 4 that protrudes toward the bottom surface portion 2 a side of the box portion 2.
The indented portion 4 has an outer peripheral surface (a surface facing the bottom surface portion 2 a of the box portion 2) having a substantially spherical shape, the center vertex is located at the lowest position, and is shifted upward by elastic deformation of the elastic bending portion 3.

弾性撓み部3と、固定面部である箱部2の底面部2aとは、間隔を置いて配置されている。
弾性撓み部3と、箱部2の底面部2aとの間に、オス端子11が挿入される。
The elastic bending part 3 and the bottom part 2a of the box part 2 which is a fixed surface part are arranged at intervals.
A male terminal 11 is inserted between the elastic bending portion 3 and the bottom surface portion 2 a of the box portion 2.

図1および図2に示すオス端子(第2端子)11は、オス側コネクタハウジング(図示せず)内の端子収容室に配置(収容)されている。
オス端子11は、上述したようにメッキが施され、リフロー処理された導電性金属(例えば、銅合金)を所定形状に打ち抜き、折り曲げ加工することによって形成されている。
A male terminal (second terminal) 11 shown in FIGS. 1 and 2 is disposed (accommodated) in a terminal accommodating chamber in a male connector housing (not shown).
The male terminal 11 is formed by punching and bending a conductive metal (for example, copper alloy) that has been plated and reflowed as described above into a predetermined shape.

オス端子11は、第2接点部であるタブ部12を有している。
タブ部12は、フラットな板形状である。
The male terminal 11 has a tab portion 12 that is a second contact portion.
The tab portion 12 has a flat plate shape.

次に、メス端子1とオス端子11との接続について説明する。   Next, the connection between the female terminal 1 and the male terminal 11 will be described.

図1の位置に位置するオス端子11のタブ部12をメス端子1の箱部2内へ挿入すると、タブ部12に押されることによって弾性撓み部3が撓み、変形することにより、タブ部12の挿入が許容される。
タブ部12の挿入過程では、弾性撓み部3のインデント部4がタブ部12の接触面12a上を摺動し、端子挿入完了位置では、図2に示すように、弾性撓み部3のインデント部4がタブ部12の接触面12aに圧接する。
When the tab portion 12 of the male terminal 11 located at the position of FIG. 1 is inserted into the box portion 2 of the female terminal 1, the elastic bending portion 3 is bent and deformed by being pushed by the tab portion 12, whereby the tab portion 12. Insertion is allowed.
In the insertion process of the tab portion 12, the indent portion 4 of the elastic bending portion 3 slides on the contact surface 12a of the tab portion 12, and at the terminal insertion completion position, as shown in FIG. 2, the indent portion of the elastic bending portion 3 4 is in pressure contact with the contact surface 12 a of the tab portion 12.

この端子挿入完了位置では、弾性撓み部13の撓み復帰力が接触荷重として作用することにより、メス端子1のインデント部4と、タブ部12の接触面12aとが電気的に接触する。
そして、インデント部4とタブ部12との間を電流が流れることによってメス端子51とオス端子61との間が導通する。
At the terminal insertion completion position, the bending return force of the elastic bending portion 13 acts as a contact load, so that the indent portion 4 of the female terminal 1 and the contact surface 12a of the tab portion 12 are in electrical contact.
Then, when a current flows between the indent portion 4 and the tab portion 12, the female terminal 51 and the male terminal 61 are electrically connected.

上述したインデント部4と、タブ部12の接触面12aとの接触面は、図3(a)(みかけ接触面E1は、明確化のためにハッチングを施してある。)に示すように、みかけ接触面E1(みかけ接触面径D1)が従来と同じであっても、インデント部4の表面が、図10(a)に示すように、凹凸を有しているので、図3(b)に示すように、みかけ接触面E1の内で実際に接触する面(真実接触面A)の数は、従来よりも多くなる。
したがって、メス端子1、オス11を大型化したり、極力複雑化したりすることなく、接触抵抗を低減させることができる。
As shown in FIG. 3A (the apparent contact surface E1 is hatched for clarity), the contact surface between the indented portion 4 and the contact surface 12a of the tab portion 12 is apparent. Even if the contact surface E1 (apparent contact surface diameter D1) is the same as the conventional one, the surface of the indent portion 4 has irregularities as shown in FIG. As shown, the number of actual contact surfaces (true contact surfaces A) in the apparent contact surface E1 is greater than that in the past.
Therefore, the contact resistance can be reduced without increasing the size of the female terminal 1 and the male 11 or complicating them as much as possible.

この発明を適用した接点接続構造の一実施例によれば、タブ部12(オス端子11)を構成する母材12Aにのみメッキを施した後のリフロー処理を行うことにより、タブ部12の接触面12aの表面は平坦化され、インデント部4の表面は凹凸状態のままとなる。
このように、タブ部12の接触面12aの表面が平坦化され、インデント部4の表面が凹凸状態のままとなることにより、インデント4部と接触面12aとのみかけ接触面E1における真実接触面Aおよびその数を多く確保することができる。
したがって、端子1,11を大型化させたり、極力複雑化させたりすることなく、接触抵抗を低減させることができる。
According to one embodiment of the contact connection structure to which the present invention is applied, contact of the tab portion 12 is achieved by performing reflow processing after plating only the base material 12A constituting the tab portion 12 (male terminal 11). The surface of the surface 12a is flattened, and the surface of the indent portion 4 remains in an uneven state.
In this way, the surface of the contact surface 12a of the tab portion 12 is flattened, and the surface of the indent portion 4 remains in an uneven state, so that the true contact surface in the contact surface E1 is apparent between the indent 4 portion and the contact surface 12a. A large number of A and the number thereof can be secured.
Therefore, the contact resistance can be reduced without increasing the size of the terminals 1 and 11 and making them as complex as possible.

上記した実施例では、箱部2(第1端子1)にリフロー処理を施さず、タブ部12(第2端子11)にリフロー処理を施した例を示したが、箱部2(第1端子1)にリフロー処理を施し、タブ部12(第2端子11)にリフロー処理を施さない場合であっても、同様な効果を得ることができる。   In the embodiment described above, an example in which the reflow process is not performed on the box part 2 (first terminal 1) and the reflow process is performed on the tab part 12 (second terminal 11) is shown. Even when the reflow process is performed on 1) and the reflow process is not performed on the tab portion 12 (second terminal 11), the same effect can be obtained.

1 メス端子(第1端子)
2 箱部(第1接点部)
2a 底面部(固定面部)
3 弾性撓み部
4 インデント部
11 オス端子(第2端子)
12 タブ部(第2接点部)
12A 母材
12a 接触面
13 メッキ層
14 酸化膜
E1 みかけ接触面
D1 みかけ接触面径
A 真実接触面
1 Female terminal (1st terminal)
2 Box part (first contact part)
2a Bottom (fixed surface)
3 Elastic Deflection Part 4 Indentation Part 11 Male Terminal (Second Terminal)
12 Tab part (second contact part)
12A Base material 12a Contact surface 13 Plating layer 14 Oxide film E1 Apparent contact surface D1 Apparent contact surface diameter A Real contact surface

Claims (1)

第1接点部のインデント部が第2接点部の接触面上を摺動し、端子挿入完了位置では、前記インデント部が前記第2接点部に接触する接点部の製造方法であって、
前記各接点部を構成する母材にメッキを施した後のリフロー処理を、前記各接点部を構成する、前記メッキを施した前記各母材のいずれか一方に対してのみ行う、
ことを特徴とする接点部の製造方法。
The indented portion of the first contact portion slides on the contact surface of the second contact portion, and at the terminal insertion completion position, the indented portion is a method of manufacturing a contact portion that contacts the second contact portion,
Reflow treatment after plating the base material constituting each contact part is performed only on one of the plated base materials constituting the contact part,
A method for manufacturing a contact portion.
JP2014129020A 2014-04-24 2014-06-24 Method of manufacturing contact part Abandoned JP2016009570A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014129020A JP2016009570A (en) 2014-06-24 2014-06-24 Method of manufacturing contact part
PCT/JP2015/062489 WO2015163439A1 (en) 2014-04-24 2015-04-24 Terminal contact

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014129020A JP2016009570A (en) 2014-06-24 2014-06-24 Method of manufacturing contact part

Publications (1)

Publication Number Publication Date
JP2016009570A true JP2016009570A (en) 2016-01-18

Family

ID=55227001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014129020A Abandoned JP2016009570A (en) 2014-04-24 2014-06-24 Method of manufacturing contact part

Country Status (1)

Country Link
JP (1) JP2016009570A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018037374A (en) * 2016-09-02 2018-03-08 矢崎総業株式会社 Electric wire with terminal

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002317295A (en) * 2001-04-19 2002-10-31 Furukawa Electric Co Ltd:The REFLOW TREATED Sn ALLOY PLATING MATERIAL AND FIT TYPE CONNECTING TERMINAL USING THE SAME

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002317295A (en) * 2001-04-19 2002-10-31 Furukawa Electric Co Ltd:The REFLOW TREATED Sn ALLOY PLATING MATERIAL AND FIT TYPE CONNECTING TERMINAL USING THE SAME

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018037374A (en) * 2016-09-02 2018-03-08 矢崎総業株式会社 Electric wire with terminal

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