JP2015220061A - Contact connection structure - Google Patents

Contact connection structure Download PDF

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JP2015220061A
JP2015220061A JP2014102103A JP2014102103A JP2015220061A JP 2015220061 A JP2015220061 A JP 2015220061A JP 2014102103 A JP2014102103 A JP 2014102103A JP 2014102103 A JP2014102103 A JP 2014102103A JP 2015220061 A JP2015220061 A JP 2015220061A
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contact
indent
terminal
tab
connection structure
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隆博 弓立
Takahiro Yudate
隆博 弓立
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Yazaki Corp
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Yazaki Corp
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Priority to JP2014102103A priority Critical patent/JP2015220061A/en
Priority to DE112015001904.9T priority patent/DE112015001904T5/en
Priority to PCT/JP2015/062546 priority patent/WO2015163454A1/en
Publication of JP2015220061A publication Critical patent/JP2015220061A/en
Priority to US15/290,007 priority patent/US9871311B2/en
Abandoned legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a contact connection structure capable of reducing contact resistance not only without enlarging a terminal but also extremely complicating it.SOLUTION: A contact connection structure includes: an elastic flexible part 3 in which an indent part 4 is projected and a plated layer is formed on the outer surface; and a tab part 11 in which the plated layer is formed on the outer surface. In a terminal insertion process, the indent part 4 of the elastic flexible part 3 slides on the contact surface of the tab part 11, and at a terminal insertion completion position, the indent part 4 comes into contact with the contact surface of the tab part 11. The indent part 4 has a top surface 5 in contact with the tab part 11, and on the top surface 5 is formed on the surface having a rough surface roughness. On the contact surface of the tab part 11, a region where at least the indent part 4 of a terminal insertion completion position is located is formed on the surface 12 having the rough surface roughness.

Description

本発明は、第1端子と第2端子間の電気的接続を行う接点接続構造に関する。   The present invention relates to a contact connection structure that performs electrical connection between a first terminal and a second terminal.

図5及び図6には、従来の接点接続構造を適用したメス端子とオス端子が示されている(類似技術として特許文献1参照)。図5、図6及び図7に示すように、メス端子51は、四角形状の箱部52と、この箱部52に一体に設けられ、箱部52内に配置された弾性撓み部53とを有する。弾性撓み部53には、底面側に向かって突出するインデント部54が設けられている。インデント部54は、その外周面がほぼ球面形状であり、中心の頂点が最下方に位置している。   5 and 6 show a female terminal and a male terminal to which a conventional contact connection structure is applied (see Patent Document 1 as a similar technique). As shown in FIGS. 5, 6, and 7, the female terminal 51 includes a rectangular box portion 52 and an elastic bending portion 53 that is provided integrally with the box portion 52 and disposed in the box portion 52. Have. The elastic bending portion 53 is provided with an indent portion 54 that protrudes toward the bottom surface side. The indented portion 54 has a substantially spherical outer peripheral surface, and the center vertex is located at the lowest position.

図5、図6及び図8に示すように、オス端子60は、平板状のタブ部61を有する。   As shown in FIGS. 5, 6, and 8, the male terminal 60 has a flat tab portion 61.

上記構成において、図5の位置にあって、オス端子60のタブ部61をメス端子51の箱部52に挿入すると、弾性撓み部53が撓み変形してタブ部61の挿入が許容される。タブ部61の挿入過程では、弾性撓み部53のインデント部54がタブ部61の接触面をを摺動し、端子挿入完了位置では、図6及び図9に示すように、弾性撓み部53のインデント部54とタブ部61の接触面が接触する。端子挿入完了位置では、弾性撓み部53の撓み復帰力を接触荷重として、メス端子51のインデント部54とオス端子60のタブ部61の接触面とが電気的に接触する。   In the above configuration, when the tab portion 61 of the male terminal 60 is inserted into the box portion 52 of the female terminal 51 in the position of FIG. 5, the elastic bending portion 53 is deformed and the insertion of the tab portion 61 is allowed. In the insertion process of the tab part 61, the indent part 54 of the elastic bending part 53 slides on the contact surface of the tab part 61, and in the terminal insertion completion position, as shown in FIGS. The contact surface of the indent part 54 and the tab part 61 contacts. At the terminal insertion completion position, the indented portion 54 of the female terminal 51 and the contact surface of the tab portion 61 of the male terminal 60 are in electrical contact with each other using the bending return force of the elastic bending portion 53 as a contact load.

特開2007−280825号公報JP 2007-280825 A

しかしながら、前記従来の構造では、メス端子51のインデント部54がほぼ球面形状であり、インデント部54の外周面の頂点箇所でのみオス端子60のタブ部61と接触するため、みかけの接触面E2(接触面径D2)が小さい。又、双方の接触面は、みかけの接触面E2(接触面径D2)の全領域において実質的に接触しているわけではない。みかけの接触面E2の内で実際にメッキ層同士が接触する面(真実接触面A)のみが電気的通電を担う。みかけの接触面E2は、図10(a)では明確化のためハッチング表示する。   However, in the conventional structure, the indented portion 54 of the female terminal 51 has a substantially spherical shape, and comes into contact with the tab portion 61 of the male terminal 60 only at the apex portion of the outer peripheral surface of the indented portion 54. Therefore, the apparent contact surface E2 (Contact surface diameter D2) is small. Further, both contact surfaces are not substantially in contact with each other in the entire region of the apparent contact surface E2 (contact surface diameter D2). Of the apparent contact surface E2, only the surface (true contact surface A) where the plated layers actually contact each other is responsible for electrical conduction. The apparent contact surface E2 is hatched for clarity in FIG.

前記従来例では、インデント部54とタブ部61の接触面は共に平滑な面に形成されているため、双方の接触面は凹凸の少ない面である。このように凹凸の少ない面同士の接触では、酸化膜の破壊が促進されず、メッキ層同士の接触点(真実接触面A)が少ない。従って、図10(b)に示すように、みかけの接触面E2の範囲内の真実接触面Aの数が少なくなる。つまり、従来例では、みかけの接触面E2が小さく、且つ、みかけの接触面E2内の真実接触面Aの数が少ないため、接触抵抗が大きくなる。   In the conventional example, since the contact surfaces of the indent portion 54 and the tab portion 61 are both smooth surfaces, both contact surfaces are surfaces with less unevenness. As described above, the contact between the surfaces with less unevenness does not promote the destruction of the oxide film, and there are few contact points (the true contact surface A) between the plating layers. Therefore, as shown in FIG. 10B, the number of true contact surfaces A within the range of the apparent contact surface E2 is reduced. That is, in the conventional example, the apparent contact surface E2 is small and the number of the true contact surfaces A in the apparent contact surface E2 is small, so that the contact resistance is increased.

ここで、みかけの接触面径を大きくして接触抵抗の低減を図るため、弾性撓み部53の撓み復帰力(接触荷重)を大きくしたり、接点部(インデント部54)を大型化したりすることが考えられるが、端子51,60が大型化したり、複雑化する。   Here, in order to reduce the contact resistance by increasing the apparent contact surface diameter, the bending return force (contact load) of the elastic bending portion 53 is increased or the contact portion (indent portion 54) is enlarged. However, the terminals 51 and 60 are enlarged or complicated.

そこで、本発明は、前記した課題を解決すべくなされたものであり、端子を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる接点接続構造を提供することを目的とする。   Therefore, the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a contact connection structure capable of reducing contact resistance without increasing the size of a terminal or making it as complex as possible.

本発明は、インデント部が突設され、外面にメッキ層が形成された第1接点部と、外面にメッキ層が形成された第2接点部とを有し、端子挿入過程では、前記第1接点部の前記インデント部が前記第2接点部の接触面を摺動し、端子挿入完了位置では、前記インデント部が前記第2接点部の接触面に接触する接点接続構造であって、前記インデント部は、前記第2接点部に接触する頂上面を有し、前記頂上面は、表面粗さの粗い面に形成されていると共に、前記第2接点部の接触面で、且つ、少なくとも端子挿入完了位置の前記インデント部が位置する領域は、表面粗さの粗い面に形成されていることを特徴とする接点接続構造である。   The present invention includes a first contact portion having an indented portion projecting and having a plated layer formed on an outer surface thereof, and a second contact portion having a plated layer formed on an outer surface thereof. A contact connection structure in which the indent portion of the contact portion slides on the contact surface of the second contact portion and the indent portion contacts the contact surface of the second contact portion at a terminal insertion completion position, and the indent The portion has a top surface that contacts the second contact portion, and the top surface is formed on a surface having a rough surface, and is a contact surface of the second contact portion, and at least terminal insertion In the contact connection structure, the region where the indent portion at the completion position is located is formed on a surface having a rough surface.

前記インデント部は、円柱形状のものを含む。   The indent portion includes a cylindrical shape.

本発明によれば、インデント部の頂上面の外径がみかけの接触面径となり、みかけの接触面径が従来例に較べて大きい。また、インデント部の頂上面と第2接点部の接触面の双方は、その表面粗さによって多数の凸形状がそれぞれ形成されており、この多数の凸形状で酸化膜の破壊が促進される。これにより、メッキ層同士の接触箇所が増えるため、インデント部と第2接点部の接触面は、双方が平滑な面の場合に比べて、インデント部と第2接点部間の真実接触面が多くなる。以上より、端子を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる。   According to the present invention, the outer diameter of the top surface of the indent portion becomes the apparent contact surface diameter, and the apparent contact surface diameter is larger than that of the conventional example. Further, both the top surface of the indent portion and the contact surface of the second contact portion are formed with a large number of convex shapes depending on the surface roughness, and the destruction of the oxide film is promoted by the large number of convex shapes. As a result, the number of contact points between the plating layers increases, so that the contact surface of the indent portion and the second contact portion has more true contact surfaces between the indent portion and the second contact portion than when both surfaces are smooth. Become. As described above, the contact resistance can be reduced without increasing the size of the terminal or making it as complex as possible.

本発明の一実施形態を示し、端子接続前のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal and male terminal which show one Embodiment of this invention before a terminal connection. 本発明の一実施形態を示し、(a)は端子接続状態のメス端子とオス端子の断面図、(b)は接点接続箇所の要部断面図、(c)はみかけの接触面と真実接触面を示す図である。1 shows an embodiment of the present invention, (a) is a cross-sectional view of a female terminal and a male terminal in a terminal connection state, (b) is a cross-sectional view of a main part of a contact connection point, (c) is an apparent contact surface and true contact It is a figure which shows a surface. 本発明の一実施形態を示し、(a)はメス端子のインデント部の斜視図、(b)はオス端子の接点部の要部平面図、(c)は(b)のA−A線断面図である。1 shows an embodiment of the present invention, (a) is a perspective view of an indent portion of a female terminal, (b) is a plan view of a main part of a contact portion of a male terminal, and (c) is a cross-sectional view taken along line AA of (b). FIG. (a)は第1変形例に係るインデント部の斜視図、(b)は第2変形例に係るインデント部の斜視図、(c)は第3変形例に係るインデント部の斜視図である。(A) is a perspective view of the indent part which concerns on a 1st modification, (b) is a perspective view of the indent part which concerns on a 2nd modification, (c) is a perspective view of the indent part which concerns on a 3rd modification. 従来例を示し、端子接続前のメス端子とオス端子の断面図である。It is a sectional view of a female terminal and a male terminal before showing a conventional example and connecting a terminal. 従来例を示し、端子接続状態のメス端子とオス端子の断面図である。It is a sectional view of a female terminal and a male terminal in a terminal connected state, showing a conventional example. 従来例を示し、(a)はメス端子の接点部の要部側面図、(b)は(a)のC矢視図である。A prior art example is shown, (a) is a principal part side view of the contact part of a female terminal, (b) is C arrow directional view of (a). 従来例を示し、(a)はオス端子の接点部の要部側面図、(b)はオス端子の接点部の要部平面図である。A prior art example is shown, (a) is a principal part side view of the contact part of a male terminal, (b) is a principal part top view of the contact part of a male terminal. 従来例を示し、接点接続箇所の要部側面図である。It is a principal part side view of a contact connection part which shows a prior art example. 従来例を示し、(a)みかけの接触面を示す図、(b)は真実接触面を示す図である。A prior art example is shown, (a) The figure which shows an apparent contact surface, (b) is a figure which shows a true contact surface.

以下、本発明の実施形態を図面に基づいて説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1〜図3は本発明の一実施形態を示す。第1端子であるメス端子と第2端子であるオス端子間に本発明に係る接点接続構造が適用されている。以下、説明する。   1 to 3 show an embodiment of the present invention. The contact connection structure according to the present invention is applied between the female terminal as the first terminal and the male terminal as the second terminal. This will be described below.

メス端子1は、メス側コネクタハウジング(図示せず)内の端子収容室に配置されている。メス端子1は、所定形状に打ち抜かれた導電性金属(例えば銅合金)を折り曲げ加工して形成されている。メス端子1の外面には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上等の観点から錫メッキ層(図示せず)が形成されている。錫メッキ層の表面には、リフロー処理後等に酸化膜(図示せず)が生成される。   The female terminal 1 is disposed in a terminal accommodating chamber in a female connector housing (not shown). The female terminal 1 is formed by bending a conductive metal (for example, copper alloy) punched into a predetermined shape. A tin-plated layer (not shown) is formed on the outer surface of the female terminal 1 from the viewpoint of improving connection reliability in a high-temperature environment and improving corrosion resistance in a corrosive environment. An oxide film (not shown) is formed on the surface of the tin plating layer after reflow treatment or the like.

メス端子1は、オス端子10が挿入される前方を開口した方形状の箱部2と、この箱部2の上面部より延設され、箱部2内に配置された弾性撓み部3とを有する。弾性撓み部3には、底面側に向かって突出するインデント部4が設けられている。インデント部4は、図2(b)、(c)、図3(a)に示すように、円柱形状であり、頂上面5が最下方に位置している。頂上面5は、下記するタブ部11が接触する面であり、表面粗さの粗い面に形成されている。表面粗さの程度は、Ra(算術平均粗さ)>0.1μmである。   The female terminal 1 includes a rectangular box part 2 having an opening in the front where the male terminal 10 is inserted, and an elastic bending part 3 that extends from the upper surface part of the box part 2 and is disposed in the box part 2. Have. The elastic bending portion 3 is provided with an indent portion 4 protruding toward the bottom surface side. As shown in FIGS. 2B, 2 </ b> C, and 3 </ b> A, the indent portion 4 has a columnar shape, and the top surface 5 is located at the lowest position. The top surface 5 is a surface with which the tab portion 11 described below comes into contact, and is formed on a surface with a rough surface. The degree of surface roughness is Ra (arithmetic mean roughness)> 0.1 μm.

インデント部4は、撓み変形部3の撓み変形によって上方に変移できる。メス端子1は、弾性撓み部3と箱部2の底面部2aが第1接点部を形成している。   The indent portion 4 can be shifted upward by the bending deformation of the bending deformation portion 3. In the female terminal 1, the elastic deflection portion 3 and the bottom surface portion 2 a of the box portion 2 form a first contact portion.

オス端子10は、オス側コネクタハウジング(図示せず)内の端子収容室に配置されている。オス端子10は、所定形状に打ち抜かれた導電性金属(例えば銅合金)を折り曲げ加工して形成されている。オス端子10の外面には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上等の観点から錫メッキ層(図示せず)が形成されている。錫メッキ層の表面には、リフロー処理後等に酸化膜(図示せず)が生成される。   The male terminal 10 is disposed in a terminal accommodating chamber in a male connector housing (not shown). The male terminal 10 is formed by bending a conductive metal (for example, copper alloy) punched into a predetermined shape. A tin-plated layer (not shown) is formed on the outer surface of the male terminal 10 from the viewpoint of improving connection reliability in a high temperature environment and improving corrosion resistance in a corrosive environment. An oxide film (not shown) is formed on the surface of the tin plating layer after reflow treatment or the like.

オス端子10は、平板状のタブ部11を有する。オス端子10は、タブ部11が第2接点部を形成している。タブ部11の上面側(接触面側)は、端子挿入完了位置のインデント部4が位置する領域に表面粗さの粗い面12、つまり、凹凸面に形成されている。表面粗さの程度は、Ra(算術平均粗さ)>0.1μmである。   The male terminal 10 has a flat tab portion 11. As for the male terminal 10, the tab part 11 forms the 2nd contact part. The upper surface side (contact surface side) of the tab portion 11 is formed on a surface 12 having a rough surface, that is, an uneven surface in a region where the indent portion 4 is located at the terminal insertion completion position. The degree of surface roughness is Ra (arithmetic mean roughness)> 0.1 μm.

上記構成において、メス側コネクタハウジング(図示せず)とオス側コネクタハウジング(図示せず)間をかん合すると、そのかん合過程ではオス端子10のタブ部11がメス端子1の箱部2に挿入される。すると、先ずタブ部11の先端が弾性撓み部3に当接し、この当接箇所より更に挿入が進むと、弾性撓み部3が撓み変形してタブ部11の挿入が許容される。タブ部11の挿入過程(端子挿入過程)では、弾性撓み部3のインデント部4がタブ部11の接触面を摺動する。端子挿入完了位置(コネクタかん合完了位置)では、図2(a)、(b)に示すように、弾性撓み部3の撓み復帰力を接触荷重として、インデント部4の頂上面5がタブ部11の接触面と接触する。   In the above configuration, when the female connector housing (not shown) and the male connector housing (not shown) are mated, the tab portion 11 of the male terminal 10 is connected to the box portion 2 of the female terminal 1 in the mating process. Inserted. Then, first, the tip of the tab portion 11 comes into contact with the elastic bending portion 3, and when the insertion further proceeds from this contact portion, the elastic bending portion 3 is bent and deformed, and insertion of the tab portion 11 is allowed. In the insertion process (terminal insertion process) of the tab part 11, the indent part 4 of the elastic bending part 3 slides on the contact surface of the tab part 11. At the terminal insertion completion position (connector mating completion position), as shown in FIGS. 2 (a) and 2 (b), the top surface 5 of the indent portion 4 is a tab portion with the bending return force of the elastic bending portion 3 as a contact load. 11 contact surfaces.

この接点接続構造では、インデント部4は、タブ部11に接触する頂上面5を有し、この頂上面5は、表面粗さの粗い面に形成されていると共に、タブ部11の接触面で、且つ、端子挿入完了位置のインデント部4が位置する領域は、表面粗さの粗い面12に形成されている。従って、図2(c)に示すように、インデント部4の頂上面5の外径がみかけの接触面径D1となり、みかけの接触面径D1が従来に較べて大きい。また、インデント部4の頂上面5とタブ部11の接触面の双方は、その表面粗さによって多数の凸形状がそれぞれ形成されており、この多数の凸形状で酸化膜の破壊が促進される。酸化膜の破壊箇所より錫が表面ににじみ出て、錫メッキ同士の接触箇所(オーミック点)が増えるため、インデント部4とタブ部11の接触面は、双方が平滑な面の場合に比べて、インデント部4とタブ部11間の真実接触面Aが多くなる。以上より、メス端子1、オス端子10を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる。   In this contact connection structure, the indent portion 4 has a top surface 5 that comes into contact with the tab portion 11, and the top surface 5 is formed on a surface having a rough surface and is a contact surface of the tab portion 11. And the area | region where the indent part 4 of a terminal insertion completion position is located is formed in the surface 12 with a rough surface roughness. Therefore, as shown in FIG. 2C, the outer diameter of the top surface 5 of the indent portion 4 becomes the apparent contact surface diameter D1, and the apparent contact surface diameter D1 is larger than the conventional one. Further, both the top surface 5 of the indent portion 4 and the contact surface of the tab portion 11 are formed with a number of convex shapes depending on the surface roughness, and the destruction of the oxide film is promoted by the number of convex shapes. . Since tin oozes out from the oxide film breakage point and the contact points (ohmic points) between the tin platings increase, the contact surface of the indented portion 4 and the tab portion 11 is compared to the case where both surfaces are smooth, The true contact surface A between the indent portion 4 and the tab portion 11 increases. As described above, the contact resistance can be reduced without increasing the size of the female terminal 1 and the male terminal 10 or complicating them as much as possible.

この実施形態では、表面粗さの粗い面12は、タブ部11の接触面の内で、端子挿入完了位置のインデント部4が位置する領域のみに形成されているが、タブ部11の接触面の内で、インデント部4が摺動する領域全域に、又は、タブ部11の接触面の全域に形成しても良い。このように形成すれば、インデント部4の頂上面5とタブ部11の接触面が摺動する全領域で表面粗さの粗い面同士で摺動するため、摺動による酸化膜の破壊が促進され、好ましい。   In this embodiment, the rough surface 12 is formed only in the region where the indent portion 4 at the terminal insertion completion position is located in the contact surface of the tab portion 11, but the contact surface of the tab portion 11. Of these, it may be formed over the entire region where the indented portion 4 slides or over the entire contact surface of the tab portion 11. If formed in this way, the surface of the top surface 5 of the indent portion 4 and the contact surface of the tab portion 11 slide on the surfaces having rough surfaces in the entire area where the contact surface slides. And preferred.

図4(a)〜(c)には、第1〜第3変形例に係るインデント部4A,4B,4Cが示されている。図4(a)の第1変形例のインデント部4Aは、円錐台形状である。頂上面5は、前記実施形態と同様に、円形である。図4(b)の第2変形例のインデント部4Bは、四角柱形状である。頂上面5は、四角形である。図4(c)の第3変形例のインデント部4Cは、四角形の角錐台形状である。頂上面5は、四角形である。各頂上面5は、表面粗さの粗い面に形成されている。   4A to 4C show indent portions 4A, 4B, and 4C according to first to third modifications. 4A of the 1st modification of Fig.4 (a) is truncated cone shape. The top surface 5 is circular as in the above embodiment. The indent portion 4B of the second modified example in FIG. 4B has a quadrangular prism shape. The top surface 5 is a quadrangle. 4C of the 3rd modification of FIG.4 (c) is a quadrangular pyramid frustum shape. The top surface 5 is a quadrangle. Each top surface 5 is formed on a surface having a rough surface.

この各変形例のインデント部4A〜4Cでも、前記実施形態と同様の作用・効果が得られる。   In the indented portions 4A to 4C of the respective modified examples, the same operations and effects as those of the above embodiment can be obtained.

インデント部4,4A〜4Cの形状は、前記実施形態及び各変形例に限定されるものではなく、頂上面5を有する形状であれば良い。   The shape of the indented portions 4, 4 </ b> A to 4 </ b> C is not limited to the above-described embodiment and each modified example, and may be a shape having the top surface 5.

1 メス端子(第1端子)
2a 底面部(第1接点部)
3 弾性撓み部(第1接点部)
4,4A〜4C インデント部
5 頂上面
10 オス端子(第2端子)
11 タブ部(第2接点部)
12 表面粗さの粗い面
1 Female terminal (1st terminal)
2a Bottom part (first contact part)
3 Elastic flexure (first contact)
4, 4A to 4C Indented portion 5 Top surface 10 Male terminal (second terminal)
11 Tab part (second contact part)
12 Surface with rough surface

Claims (2)

インデント部が突設され、外面にメッキ層が形成された第1接点部と、外面にメッキ層が形成された第2接点部とを有し、端子挿入過程では、前記第1接点部の前記インデント部が前記第2接点部の接触面を摺動し、端子挿入完了位置では、前記インデント部が前記第2接点部の接触面に接触する接点接続構造であって、
前記インデント部は、前記第2接点部に接触する頂上面を有し、前記頂上面は、表面粗さの粗い面に形成されていると共に、
前記第2接点部の接触面で、且つ、少なくとも端子挿入完了位置の前記インデント部が位置する領域は、表面粗さの粗い面に形成されていることを特徴とする接点接続構造。
A first contact portion having an indented portion projecting and having a plating layer formed on the outer surface; and a second contact portion having a plating layer formed on the outer surface; and in the terminal insertion process, the first contact portion The indented part slides on the contact surface of the second contact part, and at the terminal insertion completion position, the indented part is a contact connection structure that contacts the contact surface of the second contact part,
The indent portion has a top surface in contact with the second contact portion, and the top surface is formed on a surface having a rough surface,
The contact connection structure according to claim 1, wherein at least a region where the indent portion at a terminal insertion completion position is located on a contact surface of the second contact portion is formed on a surface having a rough surface.
請求項1記載の接点接続構造であって、
前記インデント部は、円柱形状であることを特徴とする接点接続構造。
The contact connection structure according to claim 1,
The indent portion has a cylindrical shape, and is a contact connection structure.
JP2014102103A 2014-04-24 2014-05-16 Contact connection structure Abandoned JP2015220061A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014102103A JP2015220061A (en) 2014-05-16 2014-05-16 Contact connection structure
DE112015001904.9T DE112015001904T5 (en) 2014-04-24 2015-04-24 Contact interconnect structure
PCT/JP2015/062546 WO2015163454A1 (en) 2014-04-24 2015-04-24 Contact connection structure
US15/290,007 US9871311B2 (en) 2014-04-24 2016-10-11 Contact connection structure for removing oxide buildup

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JP2018018647A (en) * 2016-07-27 2018-02-01 矢崎総業株式会社 Manufacturing method of terminal, and terminal

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JPH01103280U (en) * 1987-12-28 1989-07-12
JPH0837052A (en) * 1994-07-21 1996-02-06 Sumitomo Wiring Syst Ltd Female terminal metal
JP2001006764A (en) * 1999-06-17 2001-01-12 Yazaki Corp Terminal hardware
JP2006172877A (en) * 2004-12-15 2006-06-29 Sumitomo Wiring Syst Ltd Terminal fitting
JP2008117554A (en) * 2006-11-01 2008-05-22 Sumitomo Wiring Syst Ltd Terminal fitting
JP2013101915A (en) * 2011-10-14 2013-05-23 Dowa Metaltech Kk Mating-type connection terminal, and method for manufacturing the same
WO2014034460A1 (en) * 2012-08-31 2014-03-06 株式会社オートネットワーク技術研究所 Plated terminal for connector, and terminal pair

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JPH01103280U (en) * 1987-12-28 1989-07-12
JPH0837052A (en) * 1994-07-21 1996-02-06 Sumitomo Wiring Syst Ltd Female terminal metal
JP2001006764A (en) * 1999-06-17 2001-01-12 Yazaki Corp Terminal hardware
JP2006172877A (en) * 2004-12-15 2006-06-29 Sumitomo Wiring Syst Ltd Terminal fitting
JP2008117554A (en) * 2006-11-01 2008-05-22 Sumitomo Wiring Syst Ltd Terminal fitting
JP2013101915A (en) * 2011-10-14 2013-05-23 Dowa Metaltech Kk Mating-type connection terminal, and method for manufacturing the same
WO2014034460A1 (en) * 2012-08-31 2014-03-06 株式会社オートネットワーク技術研究所 Plated terminal for connector, and terminal pair

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018018647A (en) * 2016-07-27 2018-02-01 矢崎総業株式会社 Manufacturing method of terminal, and terminal

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