JP2015210863A - Contact connection structure - Google Patents

Contact connection structure Download PDF

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JP2015210863A
JP2015210863A JP2014090058A JP2014090058A JP2015210863A JP 2015210863 A JP2015210863 A JP 2015210863A JP 2014090058 A JP2014090058 A JP 2014090058A JP 2014090058 A JP2014090058 A JP 2014090058A JP 2015210863 A JP2015210863 A JP 2015210863A
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contact
terminal
plating layer
indent
connection structure
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大沼 雅則
Masanori Onuma
雅則 大沼
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Yazaki Corp
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Yazaki Corp
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Priority to PCT/JP2015/062489 priority patent/WO2015163439A1/en
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Abstract

PROBLEM TO BE SOLVED: To provide a contact connection structure capable of reducing contact resistance without upsizing a terminal and complexing the terminal as much as possible.SOLUTION: A contact connection structure comprises first contact parts 2a and 3 in which an indent part 4 is installed in a protruding manner and a second contact part 11. In a terminal insertion process, the second contact parts 11 of the first contact parts 2a and 3 slide on a contact surface of the second contact part 11. In a terminal insertion completion position, an outer peripheral surface of the indent part 4 comes into contact with the second contact part 11. A tin plating layers 11b and 11c are formed on an external surface of the second contact part 11. A thing plating 11c having higher height than other locations is formed in the region corresponding to the terminal insertion completion position of the indent part 4.

Description

本発明は、第1端子と第2端子間の電気的接続を行う接点接続構造に関する。   The present invention relates to a contact connection structure that performs electrical connection between a first terminal and a second terminal.

図5及び図6には、従来の接点接続構造を適用したメス端子とオス端子が示されている(類似技術として特許文献1参照)。図5及び図6に示すように、メス端子51は、四角形状の箱部52と、この箱部52に一体に設けられ、箱部52内に配置された弾性撓み部52とを有する。弾性撓み部53には、底面側に向かって突出するインデント部54が設けられている。インデント部54は、その外周面がほぼ球面形状であり、中心の頂点が最下方に位置している。又、メス端子51には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上などの観点から錫メッキが施される。従って、弾性撓み部53には、図7に示すように、銅合金材の母材層53aの外面に錫メッキ層53bが形成されている。   5 and 6 show a female terminal and a male terminal to which a conventional contact connection structure is applied (see Patent Document 1 as a similar technique). As shown in FIGS. 5 and 6, the female terminal 51 includes a rectangular box portion 52 and an elastic deflecting portion 52 provided integrally with the box portion 52 and disposed in the box portion 52. The elastic bending portion 53 is provided with an indent portion 54 that protrudes toward the bottom surface side. The indented portion 54 has a substantially spherical outer peripheral surface, and the center vertex is located at the lowest position. The female terminal 51 is tin-plated from the viewpoints of improving connection reliability in a high temperature environment and improving corrosion resistance in a corrosive environment. Therefore, as shown in FIG. 7, a tin plating layer 53b is formed on the outer surface of the base layer 53a of the copper alloy material in the elastic bending portion 53.

図5及び図6に示すように、オス端子60は、平板状のタブ部61を有する。又、オス端子60には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上などの観点から錫メッキが施される。従って、タブ部61には、図8に示すように、銅合金材の母材層61aの外面に錫メッキ層61bが形成されている。   As shown in FIGS. 5 and 6, the male terminal 60 has a flat tab portion 61. The male terminal 60 is tin-plated from the viewpoints of improving connection reliability in a high temperature environment and improving corrosion resistance in a corrosive environment. Therefore, as shown in FIG. 8, the tab portion 61 has a tin-plated layer 61b formed on the outer surface of the copper alloy base material layer 61a.

上記構成において、図5の位置にあって、オス端子60のタブ部61をメス端子51の箱部52に挿入すると、弾性撓み部53が撓み変形してタブ部61の挿入が許容される。タブ部61の挿入過程では、弾性撓み部53のインデント部54がタブ部61の接触面を摺動し、端子挿入完了位置では、図6及び図9に示すように、弾性撓み部53のインデント部54とタブ部61の面が接触する。   In the above configuration, when the tab portion 61 of the male terminal 60 is inserted into the box portion 52 of the female terminal 51 in the position of FIG. 5, the elastic bending portion 53 is deformed and the insertion of the tab portion 61 is allowed. In the insertion process of the tab portion 61, the indent portion 54 of the elastic bending portion 53 slides on the contact surface of the tab portion 61, and at the terminal insertion completion position, as shown in FIGS. 6 and 9, the indentation of the elastic bending portion 53 is performed. The surface of the part 54 and the tab part 61 contacts.

この従来例では、弾性撓み部53の撓み復帰力を接触荷重として、メス端子51のインデント部54とオス端子60のタブ部61の接触面とが電気的に接触する。   In this conventional example, the indented portion 54 of the female terminal 51 and the contact surface of the tab portion 61 of the male terminal 60 are in electrical contact with each other using the bending return force of the elastic bending portion 53 as a contact load.

ところで、上記したタブ部61の挿入過程では、錫はやわらかい金属であるため、インデント部54がタブ部61の錫メッキ層61bに食い込む状態で摺動される。そのため、インデント部54とタブ部61との接触面E2は、図10に示すように、上方から見た場合に、半円状となる。   By the way, in the above-described insertion process of the tab portion 61, tin is a soft metal, so that the indent portion 54 is slid in a state of biting into the tin plating layer 61 b of the tab portion 61. Therefore, as shown in FIG. 10, the contact surface E2 between the indent portion 54 and the tab portion 61 has a semicircular shape when viewed from above.

特開2007−280825号公報JP 2007-280825 A

しかしながら、前記従来の構造では、メス端子51のインデント部54がほぼ球面形状であり、その頂点箇所でオス端子60のタブ部61と接触する。従って、図10に示すように、この単一の接触面の外径がみかけの接触面E2(直径:D2)となるため、みかけの接触面E2(図10にて明確化のためハッチング表示)が小さい。   However, in the conventional structure, the indent portion 54 of the female terminal 51 has a substantially spherical shape, and contacts the tab portion 61 of the male terminal 60 at the apex portion. Therefore, as shown in FIG. 10, since the outer diameter of this single contact surface becomes the apparent contact surface E2 (diameter: D2), the apparent contact surface E2 (hatched for clarity in FIG. 10) Is small.

又、みかけの接触面E2は、表面粗さの影響等によって全領域が実際に接触しないために全領域が電気的通電を担うわけではなく、みかけの接触面E2の内で実際に接触する面(真実接触面)が電気的通電を担う。しかし、みかけの接触面径D2が小さいと、真実接触面も小さくなるため、接触抵抗が大きくなる。   The apparent contact surface E2 is not actually in contact with the entire region because the entire region does not actually contact due to the influence of surface roughness or the like, but the surface that actually contacts within the apparent contact surface E2. (True contact surface) is responsible for electrical energization. However, if the apparent contact surface diameter D2 is small, the true contact surface is also small, so that the contact resistance is large.

ここで、みかけの接触面を大きくして接触抵抗の低減を図るため、弾性撓み部53の撓み復帰力(ばね圧)を大きくしたり、接点部(インデント部54)を大型化したりすることが考えられるが、端子51,60が大型化したり、複雑化する。   Here, in order to reduce the contact resistance by increasing the apparent contact surface, the bending return force (spring pressure) of the elastic bending portion 53 may be increased, or the contact portion (indent portion 54) may be enlarged. Though conceivable, the terminals 51 and 60 become larger or complicated.

そこで、本発明は、前記した課題を解決すべくなされたものであり、端子を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる接点接続構造を提供することを目的とする。   Therefore, the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a contact connection structure capable of reducing contact resistance without increasing the size of a terminal or making it as complex as possible.

本発明は、インデント部が突設された第1接点部と、第2接点部とを有し、端子挿入過程では、前記第1接点部の前記インデント部が前記第2接点部の接触面上を摺動し、端子挿入完了位置では、前記インデント部の外周面が前記第2接点部に接触する接点接続構造であって、前記第2接点部の外面には、メッキ層が形成されていると共に、前記インデント部の端子挿入完了位置に対応する領域では、他の箇所よりも高くメッキ層が形成されていることを特徴とする接点接続構造である。   The present invention includes a first contact portion having a projecting indent portion and a second contact portion, and the indent portion of the first contact portion is on a contact surface of the second contact portion in a terminal insertion process. And the outer peripheral surface of the indent portion is in contact with the second contact portion at the terminal insertion completion position, and a plating layer is formed on the outer surface of the second contact portion. The contact connection structure is characterized in that a plating layer is formed higher in the region corresponding to the terminal insertion completion position of the indent portion than in other portions.

前記メッキ層は、錫メッキ層であるものを含む。   The plating layer includes a tin plating layer.

本発明によれば、第1接点部のインデント部は、端子挿入完了位置では、従来よりも深くメッキ層にめり込んだ状態で第2接点部に接触するため、従来と比較して大きな接触面で接触し、みかけの接触面が大きくなる。みかけの接触面が大きくなるため、その中の真実接触のトータル面積も大きくなる。以上より、端子を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる。   According to the present invention, the indented portion of the first contact portion is in contact with the second contact portion in a state where the indented position of the first contact portion is deeply recessed into the plating layer than in the conventional case. The apparent contact surface becomes larger. Since the apparent contact surface becomes larger, the total area of the true contact in it becomes larger. As described above, the contact resistance can be reduced without increasing the size of the terminal or making it as complex as possible.

本発明の一実施形態を示し、端子接続前のメス端子とオス端子の断面図である。It is sectional drawing of the female terminal and male terminal which show one Embodiment of this invention before a terminal connection. 本発明の一実施形態を示し、(a)は端子接続状態のメス端子とオス端子の断面図、(b)は接点接続箇所の要部断面図、(c)みかけの接触面及び接触面径を示す図である。1 shows an embodiment of the present invention, (a) is a cross-sectional view of a female terminal and a male terminal in a terminal connection state, (b) is a cross-sectional view of a main part of a contact connection location, (c) an apparent contact surface and a contact surface diameter. FIG. 本発明の一実施形態を示し、(a)はメス端子の接点部の要部断面図、(b)は(a)のA矢視図である。1 shows an embodiment of the present invention, (a) is a cross-sectional view of the main part of the contact portion of the female terminal, (b) is a view taken in the direction of arrow A in (a). 本発明の一実施形態を示し、(a)はオス端子の接点部の要部平面図、(b)はオス端子の接点部の要部断面図である。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows an embodiment of the present invention, where (a) is a plan view of a main part of a contact part of a male terminal, and (b) is a cross-sectional view of a main part of the contact part of the male terminal. 従来例を示し、端子接続前のメス端子とオス端子の断面図である。It is a sectional view of a female terminal and a male terminal before showing a conventional example and connecting a terminal. 従来例を示し、端子接続状態のメス端子とオス端子の断面図である。It is a sectional view of a female terminal and a male terminal in a terminal connected state, showing a conventional example. 従来例を示し、(a)はメス端子の接点部の要部側面図、(b)は(a)のB矢視図である。A prior art example is shown, (a) is a principal part side view of the contact part of a female terminal, (b) is a B arrow directional view of (a). 従来例を示し、(a)はオス端子の接点部の要部平面図、(b)はオス端子の接点部の要部断面図である。A prior art example is shown, (a) is a principal part top view of the contact part of a male terminal, (b) is principal part sectional drawing of the contact part of a male terminal. 従来例を示し、接点接続箇所の要部断面図である。It is a principal part sectional drawing of a contact connection location, showing a conventional example. 従来例のみかけの接触面及び接触面径を示す図である。It is a figure which shows the apparent contact surface and contact surface diameter of a prior art example.

以下、本発明の一実施形態を図面に基づいて説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

図1〜図4は本発明の一実施形態を示す。第1端子であるメス端子と第2端子であるオス端子間に本発明に係る接点接続構造が適用されている。以下、説明する。   1 to 4 show an embodiment of the present invention. The contact connection structure according to the present invention is applied between the female terminal as the first terminal and the male terminal as the second terminal. This will be described below.

メス端子1は、メス側コネクタハウジング(図示せず)内の端子収容室に配置されている。メス端子1は、所定形状に打ち抜かれた導電性金属(例えば銅合金)を折り曲げ加工して形成されている。メス端子1は、オス端子10が挿入される前方を開口した方形状の箱部2と、この箱部2の上面部より延設され、箱部2内に配置された弾性撓み部3とを有する。弾性撓み部3には、底面側に向かって突出するインデント部4が設けられている。インデント部4は、その外周面がほぼ球面形状であり、中心の頂点が最下方に位置している。インデント部4は、撓み変形部3の撓み変形によって上方に変移できる。   The female terminal 1 is disposed in a terminal accommodating chamber in a female connector housing (not shown). The female terminal 1 is formed by bending a conductive metal (for example, copper alloy) punched into a predetermined shape. The female terminal 1 includes a rectangular box part 2 having an opening in the front where the male terminal 10 is inserted, and an elastic bending part 3 that extends from the upper surface part of the box part 2 and is disposed in the box part 2. Have. The elastic bending portion 3 is provided with an indent portion 4 protruding toward the bottom surface side. The indented portion 4 has a substantially spherical outer peripheral surface, and the center vertex is located at the lowest position. The indent portion 4 can be shifted upward by the bending deformation of the bending deformation portion 3.

又、メス端子1には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上などの観点から錫メッキが施される。従って、弾性撓み部3には、図3(a)、(b)に示すように、銅合金材の母材層3aの外面に錫メッキ層3bが形成されている。メス端子1は、弾性撓み部3と箱部2の底面部2aが第1接点部を形成している。   The female terminal 1 is tin-plated from the viewpoints of improving connection reliability in a high temperature environment and improving corrosion resistance in a corrosive environment. Therefore, as shown in FIGS. 3A and 3B, the elastic bending portion 3 has a tin plating layer 3b formed on the outer surface of the base material layer 3a of the copper alloy material. In the female terminal 1, the elastic deflection portion 3 and the bottom surface portion 2 a of the box portion 2 form a first contact portion.

オス端子10は、オス側コネクタハウジング(図示せず)内の端子収容室に配置されている。オス端子10は、所定形状に打ち抜かれた導電性金属(例えば銅合金)を折り曲げ加工して形成されている。オス端子10は、平板状のタブ部11を有する。又、オス端子10には、高温環境下での接続信頼性の向上、腐食環境下での耐食性の向上などの観点から錫メッキが施される。従って、タブ部11には、図4(a)、(b)に示すように、銅合金材の母材層11aの外面に錫メッキ層11bが形成されている。錫メッキ層11bの上で、且つ、インデント部4の端子挿入完了位置に対応する領域には、更に錫メッキ層11cが形成されている。つまり、タブ部11のインデント部4の端子挿入完了位置に対応する領域は、錫メッキ層11cのh高さ分だけ他の箇所よりも高くメッキが形成されている。一段高い錫メッキ層11cは、ストライプメッキ、溶射、クラッド材によって形成することができる。オス端子10は、タブ部11が第2接点部を形成している。   The male terminal 10 is disposed in a terminal accommodating chamber in a male connector housing (not shown). The male terminal 10 is formed by bending a conductive metal (for example, copper alloy) punched into a predetermined shape. The male terminal 10 has a flat tab portion 11. The male terminal 10 is tin-plated from the viewpoints of improving connection reliability in a high temperature environment and improving corrosion resistance in a corrosive environment. Therefore, as shown in FIGS. 4A and 4B, the tab portion 11 has a tin plating layer 11b formed on the outer surface of the base material layer 11a of the copper alloy material. A tin plating layer 11 c is further formed on the tin plating layer 11 b and in a region corresponding to the terminal insertion completion position of the indent portion 4. That is, the region corresponding to the terminal insertion completion position of the indented portion 4 of the tab portion 11 is plated higher than the other portions by the height h of the tin plating layer 11c. The one-step higher tin plating layer 11c can be formed by stripe plating, thermal spraying, or a clad material. As for the male terminal 10, the tab part 11 forms the 2nd contact part.

上記構成において、メス側コネクタハウジング(図示せず)とオス側コネクタハウジング(図示せず)間をかん合すると、そのかん合過程ではオス端子10のタブ部11がメス端子1の箱部2に挿入される。すると、先ずタブ部11の先端が弾性撓み部3に当接し、この当接箇所より更に挿入が進むと、弾性撓み部3が撓み変形してタブ部11の挿入が許容される。タブ部11の挿入過程(端子挿入過程)では、弾性撓み部3のインデント部4がタブ部11の接触面を摺動する。端子挿入完了位置(コネクタかん合完了位置)では、図2(a)に示すように、弾性撓み部3の撓み復帰力を接触荷重として、弾性撓み部3のインデント部4がタブ部11の面に接触する。   In the above configuration, when the female connector housing (not shown) and the male connector housing (not shown) are mated, the tab portion 11 of the male terminal 10 is connected to the box portion 2 of the female terminal 1 in the mating process. Inserted. Then, first, the tip of the tab portion 11 comes into contact with the elastic bending portion 3, and when the insertion further proceeds from this contact portion, the elastic bending portion 3 is bent and deformed, and insertion of the tab portion 11 is allowed. In the insertion process (terminal insertion process) of the tab part 11, the indent part 4 of the elastic bending part 3 slides on the contact surface of the tab part 11. At the terminal insertion completion position (connector mating completion position), as shown in FIG. 2A, the indented portion 4 of the elastic bending portion 3 is the surface of the tab portion 11 with the bending return force of the elastic bending portion 3 as a contact load. To touch.

上記したタブ部11の挿入過程(端子挿入過程)にあって、錫は軟らかい金属であるため、インデント部4がタブ部11の錫メッキ層11bに食い込みつつ摺動される。そして、挿入完了位置の手前位置では、錫メッキ層11cの段差に突き当たるが、その段差状の錫メッキ層11cにめり込みつつ摺動する。端子挿入完了位置では、インデント部4の外周面の挿入前方側が錫メッキ層11bにめり込んだ状態で停まる。つまり、端子挿入完了位置では、インデント部4は、錫メッキ層11b,11cによって深くめり込んだ状態となる。   In the insertion process (terminal insertion process) of the tab portion 11 described above, since tin is a soft metal, the indent portion 4 slides while biting into the tin plating layer 11b of the tab portion 11. Then, at the position before the insertion completion position, the bumper hits the step of the tin plating layer 11c, but slides while sinking into the stepped tin plating layer 11c. At the terminal insertion completion position, the insertion front side of the outer peripheral surface of the indent portion 4 stops in a state where it is recessed into the tin plating layer 11b. That is, at the terminal insertion completion position, the indent portion 4 is deeply recessed by the tin plating layers 11b and 11c.

この接点接続構造では、タブ部11の外面には、錫メッキ層11bが形成されていると共に、インデント部4の端子挿入完了位置に対応する領域では、他の箇所よりも高くメッキ層11cが形成されている。従って、インデント部4は、端子挿入完了位置にあって、従来よりも深く錫メッキ層11cにめり込んだ状態となるため、図2(c)に示すように、上方から見た場合に、インデント部4がタブ部11の接触面に大きな半円状の接触面E1で接触し、従来例よりみかけの接触面E1(みかけの接触面径:D1)が大きくなる。みかけの接触面E1が大きくなるため、その中の真実接触面のトータル面積も従来に較べて大きくなる。みかけの接触面E1は、図2(c)では明確化のためハッチング表示する。以上より、メス端子1、オス端子10を大型化したり、極力複雑化したりすることなく、接触抵抗を低減できる。   In this contact connection structure, a tin plating layer 11b is formed on the outer surface of the tab portion 11, and a plating layer 11c is formed higher in the region corresponding to the terminal insertion completion position of the indent portion 4 than in other portions. Has been. Therefore, the indented portion 4 is located at the terminal insertion completion position and is in a state of being deeply recessed into the tin plating layer 11c as compared with the prior art. Therefore, as shown in FIG. 4 contacts the contact surface of the tab portion 11 with a large semicircular contact surface E1, and the apparent contact surface E1 (apparent contact surface diameter: D1) becomes larger than that of the conventional example. Since the apparent contact surface E1 is increased, the total area of the true contact surface is also increased compared to the conventional case. The apparent contact surface E1 is hatched for clarity in FIG. As described above, the contact resistance can be reduced without increasing the size of the female terminal 1 and the male terminal 10 or complicating them as much as possible.

次に、Holmの接触理論式によって接触抵抗が小さくなることを説明する。Holmの接触理論式によれば、接触抵抗Rは、D:みかけの接触面径(直径)、ρ:接点材料の抵抗率、a:真実接触面(スポット)の半径、n:真実接触面の数とすると、R=(ρ/D)+(ρ/2na)によって算出される。本発明では、従来よりみかけの接触面径Dが大きくなるため、接触抵抗が小さくなる。   Next, it will be described that the contact resistance is reduced by Holm's contact theory. According to Holm's theoretical contact formula, contact resistance R is: D: apparent contact surface diameter (diameter), ρ: resistivity of contact material, a: radius of true contact surface (spot), n: true contact surface If it is a number, it is calculated by R = (ρ / D) + (ρ / 2na). In the present invention, since the apparent contact surface diameter D is larger than in the prior art, the contact resistance is reduced.

タブ部11には、インデント部4の端子挿入完了位置に対応する領域では、他の箇所よりも高くメッキ層11cを形成すれば良いため、製造方法の大幅変更が不要である。   In the tab portion 11, in the region corresponding to the terminal insertion completion position of the indent portion 4, it is only necessary to form the plating layer 11 c higher than other portions, so that a significant change in the manufacturing method is unnecessary.

この実施形態では、メッキ層は、錫メッキ層4b、4cである。従って、低コストである。メッキ層4bの材料は、導電性があり、且つ、錫程度に軟らかい材料(インジウム(In)、アルミニウム(AL)、半田(SnAgCu系)等であっても良い。   In this embodiment, the plating layers are tin plating layers 4b and 4c. Therefore, the cost is low. The material of the plating layer 4b may be a conductive material that is as soft as tin (indium (In), aluminum (AL), solder (SnAgCu system), or the like.

この実施形態では、インデント部4の外周面は、ほぼ球面形状であるが、外周面の形状は限定されない。頂点を最も高い位置とし、外周に向かうに従って滑らかな曲面によって徐々に低くなる曲面形状でも、楕円曲面形状でも、円錐形状でも、角錐形状でも良い。   In this embodiment, the outer peripheral surface of the indent portion 4 has a substantially spherical shape, but the shape of the outer peripheral surface is not limited. It may be a curved surface shape having an apex at the highest position and gradually lowering with a smooth curved surface toward the outer periphery, an elliptical curved surface shape, a conical shape, or a pyramid shape.

1 メス端子(第1端子)
2a 底面部(第1接点部)
3 弾性撓み部(第1接点部)
4 インデント部
4b 錫メッキ層
10 オス端子(第2端子)
11 タブ部(第2接点部)
11b 錫メッキ層
1 Female terminal (1st terminal)
2a Bottom part (first contact part)
3 Elastic flexure (first contact)
4 Indented portion 4b Tin plating layer 10 Male terminal (second terminal)
11 Tab part (second contact part)
11b Tin plating layer

Claims (2)

インデント部が突設された第1接点部と、第2接点部とを有し、端子挿入過程では、前記第1接点部の前記インデント部が前記第2接点部の接触面上を摺動し、端子挿入完了位置では、前記インデント部の外周面が前記第2接点部に接触する接点接続構造であって、
前記第2接点部の外面には、メッキ層が形成されていると共に、前記インデント部の端子挿入完了位置に対応する領域では、他の箇所よりも高くメッキ層が形成されていることを特徴とする接点接続構造。
In the terminal insertion process, the indented portion of the first contact portion slides on the contact surface of the second contact portion. In the terminal insertion completion position, a contact connection structure in which an outer peripheral surface of the indent portion contacts the second contact portion,
A plating layer is formed on the outer surface of the second contact portion, and a plating layer is formed higher than other portions in a region corresponding to the terminal insertion completion position of the indent portion. Contact connection structure.
請求項1記載の接点接続構造であって、
前記メッキ層は、錫メッキ層であることを特徴とする接点接続構造。
The contact connection structure according to claim 1,
The contact connection structure, wherein the plating layer is a tin plating layer.
JP2014090058A 2014-04-24 2014-04-24 Contact connection structure Abandoned JP2015210863A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014090058A JP2015210863A (en) 2014-04-24 2014-04-24 Contact connection structure
PCT/JP2015/062489 WO2015163439A1 (en) 2014-04-24 2015-04-24 Terminal contact

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014090058A JP2015210863A (en) 2014-04-24 2014-04-24 Contact connection structure

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114402487A (en) * 2019-09-19 2022-04-26 株式会社自动网络技术研究所 Pin terminal, connector, harness with connector, and control unit
CN114424413A (en) * 2019-09-19 2022-04-29 株式会社自动网络技术研究所 Pin terminal, connector, harness with connector, and control unit

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005353352A (en) * 2004-06-09 2005-12-22 Auto Network Gijutsu Kenkyusho:Kk Fitting type male terminal and its plating method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005353352A (en) * 2004-06-09 2005-12-22 Auto Network Gijutsu Kenkyusho:Kk Fitting type male terminal and its plating method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114402487A (en) * 2019-09-19 2022-04-26 株式会社自动网络技术研究所 Pin terminal, connector, harness with connector, and control unit
CN114424413A (en) * 2019-09-19 2022-04-29 株式会社自动网络技术研究所 Pin terminal, connector, harness with connector, and control unit
CN114424413B (en) * 2019-09-19 2023-12-08 株式会社自动网络技术研究所 Pin terminal, connector, wire harness with connector, and control unit
CN114402487B (en) * 2019-09-19 2023-12-08 株式会社自动网络技术研究所 Pin terminal, connector, wire harness with connector, and control unit

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