JP2015535096A5 - - Google Patents

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Publication number
JP2015535096A5
JP2015535096A5 JP2015540078A JP2015540078A JP2015535096A5 JP 2015535096 A5 JP2015535096 A5 JP 2015535096A5 JP 2015540078 A JP2015540078 A JP 2015540078A JP 2015540078 A JP2015540078 A JP 2015540078A JP 2015535096 A5 JP2015535096 A5 JP 2015535096A5
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JP
Japan
Prior art keywords
exposure apparatus
illumination system
projection exposure
projection lens
mask stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015540078A
Other languages
English (en)
Japanese (ja)
Other versions
JP6502258B2 (ja
JP2015535096A (ja
Filing date
Publication date
Priority claimed from DE201210219806 external-priority patent/DE102012219806A1/de
Application filed filed Critical
Publication of JP2015535096A publication Critical patent/JP2015535096A/ja
Publication of JP2015535096A5 publication Critical patent/JP2015535096A5/ja
Application granted granted Critical
Publication of JP6502258B2 publication Critical patent/JP6502258B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015540078A 2012-10-30 2013-09-20 圧力変動の影響を減少させる手段を備える投影露光装置 Active JP6502258B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261720079P 2012-10-30 2012-10-30
US61/720,079 2012-10-30
DE201210219806 DE102012219806A1 (de) 2012-10-30 2012-10-30 Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen
DE102012219806.7 2012-10-30
PCT/EP2013/069575 WO2014067707A1 (de) 2012-10-30 2013-09-20 Druckschwankungen in einer projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2015535096A JP2015535096A (ja) 2015-12-07
JP2015535096A5 true JP2015535096A5 (https=) 2016-10-20
JP6502258B2 JP6502258B2 (ja) 2019-04-17

Family

ID=50479689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015540078A Active JP6502258B2 (ja) 2012-10-30 2013-09-20 圧力変動の影響を減少させる手段を備える投影露光装置

Country Status (4)

Country Link
US (1) US10162267B2 (https=)
JP (1) JP6502258B2 (https=)
DE (1) DE102012219806A1 (https=)
WO (1) WO2014067707A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018015121A1 (en) * 2016-07-21 2018-01-25 Asml Netherlands B.V. Lithographic method
CN111624731B (zh) * 2019-02-28 2021-12-10 上海微电子装备（集团）股份有限公司 一种物镜装置
US10991544B2 (en) * 2019-05-29 2021-04-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, objective lens module, electrode device, and method of inspecting a specimen
JP2024169178A (ja) * 2023-05-25 2024-12-05 キヤノン株式会社 構造体、露光装置、および物品の製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2856626B2 (ja) * 1993-03-22 1999-02-10 株式会社日立製作所 縮小投影露光装置
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
US5877843A (en) * 1995-09-12 1999-03-02 Nikon Corporation Exposure apparatus
JP3552363B2 (ja) * 1995-09-12 2004-08-11 株式会社ニコン 走査型露光装置
AU8885198A (en) * 1997-08-26 1999-03-16 Nikon Corporation Aligner, exposure method, method of pressure adjustment of projection optical system, and method of assembling aligner
US6197454B1 (en) * 1998-12-29 2001-03-06 Intel Corporation Clean-enclosure window to protect photolithographic mask
WO2000074120A1 (en) * 1999-05-28 2000-12-07 Nikon Corporation Exposure method and apparatus
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
US6614504B2 (en) * 2000-03-30 2003-09-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2002151400A (ja) * 2000-11-15 2002-05-24 Canon Inc 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場
JP2003347194A (ja) * 2002-05-24 2003-12-05 Canon Inc 露光装置、露光方法、デバイス製造方法及びデバイス
US7791826B2 (en) * 2005-01-26 2010-09-07 Carl Zeiss Smt Ag Optical assembly
US7492441B2 (en) * 2005-12-22 2009-02-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method incorporating a pressure shield
JP5141979B2 (ja) * 2006-09-29 2013-02-13 株式会社ニコン ステージ装置および露光装置
EP2126636B1 (en) * 2007-01-30 2012-06-13 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036192A1 (nl) * 2007-12-06 2009-06-09 Asml Netherlands Bv Lithographic apparatus having acoustic resonator.
NL1036290A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus.
NL1036433A1 (nl) * 2008-01-31 2009-08-03 Asml Netherlands Bv Lithographic apparatus, method and device manufacturing method.
NL2002902A1 (nl) * 2008-06-18 2009-12-22 Asml Netherlands Bv Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame.

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