JP2015522939A5 - - Google Patents

Download PDF

Info

Publication number
JP2015522939A5
JP2015522939A5 JP2015509061A JP2015509061A JP2015522939A5 JP 2015522939 A5 JP2015522939 A5 JP 2015522939A5 JP 2015509061 A JP2015509061 A JP 2015509061A JP 2015509061 A JP2015509061 A JP 2015509061A JP 2015522939 A5 JP2015522939 A5 JP 2015522939A5
Authority
JP
Japan
Prior art keywords
lamp
reflector
lamp head
passages
monolithic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015509061A
Other languages
English (en)
Japanese (ja)
Other versions
JP6637312B2 (ja
JP2015522939A (ja
Filing date
Publication date
Priority claimed from US13/865,672 external-priority patent/US10202707B2/en
Application filed filed Critical
Publication of JP2015522939A publication Critical patent/JP2015522939A/ja
Publication of JP2015522939A5 publication Critical patent/JP2015522939A5/ja
Application granted granted Critical
Publication of JP6637312B2 publication Critical patent/JP6637312B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015509061A 2012-04-26 2013-04-22 温度管理を備えるランプヘッドを有する基板処理システム Active JP6637312B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261638619P 2012-04-26 2012-04-26
US61/638,619 2012-04-26
US201261707938P 2012-09-29 2012-09-29
US61/707,938 2012-09-29
US13/865,672 US10202707B2 (en) 2012-04-26 2013-04-18 Substrate processing system with lamphead having temperature management
US13/865,672 2013-04-18
PCT/US2013/037585 WO2013163080A1 (en) 2012-04-26 2013-04-22 Substrate processing system with lamphead having temperature management

Publications (3)

Publication Number Publication Date
JP2015522939A JP2015522939A (ja) 2015-08-06
JP2015522939A5 true JP2015522939A5 (https=) 2016-06-30
JP6637312B2 JP6637312B2 (ja) 2020-01-29

Family

ID=49483801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015509061A Active JP6637312B2 (ja) 2012-04-26 2013-04-22 温度管理を備えるランプヘッドを有する基板処理システム

Country Status (6)

Country Link
US (1) US10202707B2 (https=)
JP (1) JP6637312B2 (https=)
KR (1) KR102108408B1 (https=)
CN (1) CN104246969B (https=)
TW (1) TWI646298B (https=)
WO (1) WO2013163080A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6469680B2 (ja) * 2013-11-22 2019-02-13 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ アクセスが容易なランプヘッド
US10053777B2 (en) 2014-03-19 2018-08-21 Applied Materials, Inc. Thermal processing chamber
CN107620893A (zh) * 2017-08-31 2018-01-23 江苏米优光电科技有限公司 一种透气散热型户外全彩led贴片灯组及其生产工艺
KR102699383B1 (ko) 2019-04-18 2024-08-26 삼성전자주식회사 웨이퍼 클리닝 장치
US11680338B2 (en) * 2019-12-19 2023-06-20 Applied Materials, Inc. Linear lamp array for improved thermal uniformity and profile control
US12060651B2 (en) 2021-05-11 2024-08-13 Applied Materials, Inc. Chamber architecture for epitaxial deposition and advanced epitaxial film applications
US12091749B2 (en) 2021-05-11 2024-09-17 Applied Materials, Inc. Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet
US12018372B2 (en) 2021-05-11 2024-06-25 Applied Materials, Inc. Gas injector for epitaxy and CVD chamber
US20220367216A1 (en) * 2021-05-11 2022-11-17 Applied Materials, Inc. Multi-zone lamp heating and temperature monitoring in epitaxy process chamber
KR20250075736A (ko) * 2021-05-11 2025-05-28 어플라이드 머티어리얼스, 인코포레이티드 에피택시 및 cvd 챔버용 가스 인젝터
US20220397706A1 (en) * 2021-06-09 2022-12-15 Applied Materials, Inc. Axisymmetric heating assembly layout with double ended lamp
CN115161764B (zh) * 2022-06-23 2024-02-06 江苏天芯微半导体设备有限公司 一种控温装置及其外延设备
US20250132175A1 (en) * 2023-10-18 2025-04-24 Applied Materials, Inc. Actively controlled window for epitaxial deposition process temperature control

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4047496A (en) * 1974-05-31 1977-09-13 Applied Materials, Inc. Epitaxial radiation heated reactor
US5156820A (en) * 1989-05-15 1992-10-20 Rapro Technology, Inc. Reaction chamber with controlled radiant energy heating and distributed reactant flow
US5002630A (en) 1989-06-06 1991-03-26 Rapro Technology Method for high temperature thermal processing with reduced convective heat loss
US5108792A (en) 1990-03-09 1992-04-28 Applied Materials, Inc. Double-dome reactor for semiconductor processing
JPH04297581A (ja) 1991-03-15 1992-10-21 Mitsubishi Electric Corp 光気相成長装置
JPH0845863A (ja) 1994-07-27 1996-02-16 Touyoko Kagaku Kk 半導体基板の枚葉式熱処理装置
JPH09237763A (ja) 1996-02-28 1997-09-09 Tokyo Electron Ltd 枚葉式の熱処理装置
TW315493B (en) * 1996-02-28 1997-09-11 Tokyo Electron Co Ltd Heating apparatus and heat treatment apparatus
JP3616687B2 (ja) 1996-03-04 2005-02-02 東洋製罐株式会社 耐熱耐圧性に優れた自立性容器
US6007635A (en) * 1997-11-26 1999-12-28 Micro C Technologies, Inc. Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing
JP3438658B2 (ja) 1999-07-22 2003-08-18 ウシオ電機株式会社 ランプユニット及び光照射式加熱装置
JP2005222962A (ja) * 2000-04-20 2005-08-18 Tokyo Electron Ltd 熱処理装置及びその方法
JP5049443B2 (ja) 2000-04-20 2012-10-17 東京エレクトロン株式会社 熱処理システム
US6476362B1 (en) * 2000-09-12 2002-11-05 Applied Materials, Inc. Lamp array for thermal processing chamber
JP2002270532A (ja) 2001-03-14 2002-09-20 Tokyo Electron Ltd 加熱装置及び熱処理装置
US7075037B2 (en) 2001-03-02 2006-07-11 Tokyo Electron Limited Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer
JP2002270533A (ja) 2001-03-14 2002-09-20 Tokyo Electron Ltd 熱処理装置及びランプ出力制御方法
JP2003022982A (ja) 2001-07-09 2003-01-24 Tokyo Electron Ltd 熱処理装置
US6818864B2 (en) * 2002-08-09 2004-11-16 Asm America, Inc. LED heat lamp arrays for CVD heating
US7691204B2 (en) * 2005-09-30 2010-04-06 Applied Materials, Inc. Film formation apparatus and methods including temperature and emissivity/pattern compensation
US20080072820A1 (en) 2006-06-30 2008-03-27 Applied Materials, Inc. Modular cvd epi 300mm reactor
US7860379B2 (en) 2007-01-15 2010-12-28 Applied Materials, Inc. Temperature measurement and control of wafer support in thermal processing chamber
US8314368B2 (en) 2008-02-22 2012-11-20 Applied Materials, Inc. Silver reflectors for semiconductor processing chambers
JP5169299B2 (ja) 2008-02-22 2013-03-27 株式会社デンソー 半導体製造装置
KR101458001B1 (ko) 2008-06-17 2014-11-04 주성엔지니어링(주) 기판 처리 장치
US8294068B2 (en) * 2008-09-10 2012-10-23 Applied Materials, Inc. Rapid thermal processing lamphead with improved cooling
WO2011021549A1 (ja) * 2009-08-18 2011-02-24 東京エレクトロン株式会社 熱処理装置

Similar Documents

Publication Publication Date Title
JP2015522939A5 (https=)
USD774235S1 (en) Glare shield for LED light fixture
USD770673S1 (en) LED light fixture double seal end cap
USD774687S1 (en) LED reflector array
ES2682718T3 (es) Boquilla térmica optimizada y método de uso de la misma
JP2016526279A5 (https=)
USD748067S1 (en) LED lighting unit
USD739975S1 (en) LED light with rotating and swiveling head
USD750832S1 (en) Trim for a recessed luminaire
MX2019003327A (es) Envase para productos de consumo.
JP2017514266A5 (https=)
MX2018001884A (es) Metodo de flexion por gravedad auxiliado por presion elevada y dispositivo adecuado para el mismo.
JP2015515597A5 (https=)
AR110832A1 (es) Hidrociclón cerámico
MX2017005057A (es) Luminaria de flujo pasante.
JP2015069968A5 (https=)
USD751248S1 (en) Housing for an LED based lighting apparatus
CL2016000719A1 (es) Un sistema para el recubrimiento de lentes ópticos, que comprende: una carcasa que tiene al menos dos caras a través de la cual se forma una abertura; y un soporte de lente que tiene una apertura del lente que acepta un lente óptico y que tiene una forma exterior y tamaño que es complementario y está aceptado dentro de la abertura de la carcasa.
AR099845A1 (es) Luminaria de exterior
USD703865S1 (en) Cylindrical LED fixture
ES2427490B1 (es) Neumático con distribución de gases a presión en varios volúmenes estancos y válvula única
CL2019000467A1 (es) Un hidrociclón.
GB201313353D0 (en) Hexagonal supercapacitor
USD773077S1 (en) LED lamp
WO2014025935A3 (en) Led bulb having a uniform light-distribution profile