JP2015522715A5 - - Google Patents
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- Publication number
- JP2015522715A5 JP2015522715A5 JP2015518864A JP2015518864A JP2015522715A5 JP 2015522715 A5 JP2015522715 A5 JP 2015522715A5 JP 2015518864 A JP2015518864 A JP 2015518864A JP 2015518864 A JP2015518864 A JP 2015518864A JP 2015522715 A5 JP2015522715 A5 JP 2015522715A5
- Authority
- JP
- Japan
- Prior art keywords
- magnet
- adjacent
- polarity
- assemblies
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000000712 assembly Effects 0.000 claims 13
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2012/062836 WO2014005617A1 (en) | 2012-07-02 | 2012-07-02 | Apparatus for coating a layer of sputtered material on a substrate and deposition system |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015522715A JP2015522715A (ja) | 2015-08-06 |
JP2015522715A5 true JP2015522715A5 (zh) | 2015-09-17 |
JP6113841B2 JP6113841B2 (ja) | 2017-04-12 |
Family
ID=46395630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015518864A Active JP6113841B2 (ja) | 2012-07-02 | 2012-07-02 | 基板上にスパッタリングされた材料の層をコーティングするための装置及び堆積システム |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP2867916A1 (zh) |
JP (1) | JP6113841B2 (zh) |
KR (1) | KR101920840B1 (zh) |
CN (1) | CN104704603B (zh) |
TW (1) | TWI627297B (zh) |
WO (1) | WO2014005617A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103993273B (zh) * | 2014-05-09 | 2016-01-27 | 浙江上方电子装备有限公司 | 一种动静混合镀膜系统及利用其进行动静混合镀膜的方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5096562A (en) * | 1989-11-08 | 1992-03-17 | The Boc Group, Inc. | Rotating cylindrical magnetron structure for large area coating |
GB9006073D0 (en) * | 1990-03-17 | 1990-05-16 | D G Teer Coating Services Limi | Magnetron sputter ion plating |
DE4038497C1 (zh) | 1990-12-03 | 1992-02-20 | Leybold Ag, 6450 Hanau, De | |
KR950000906B1 (ko) * | 1991-08-02 | 1995-02-03 | 니찌덴 아넬바 가부시기가이샤 | 스퍼터링장치 |
ES2202439T3 (es) * | 1995-04-25 | 2004-04-01 | Von Ardenne Anlagentechnik Gmbh | Sistema de pulverizacion que utiliza un magnetron cilindrico rotativo alimentado electricamente utilizando corriente alterna. |
WO1998013532A1 (en) * | 1996-09-24 | 1998-04-02 | Deposition Sciences, Inc. | A multiple target arrangement for decreasing the intensity and severity of arcing in dc sputtering |
GB0503401D0 (en) * | 2005-02-18 | 2005-03-30 | Applied Multilayers Ltd | Apparatus and method for the application of material layer to display devices |
CN201614406U (zh) * | 2008-08-27 | 2010-10-27 | 梯尔涂层有限公司 | 沉积材料形成镀层的设备 |
-
2012
- 2012-07-02 KR KR1020157002725A patent/KR101920840B1/ko active IP Right Grant
- 2012-07-02 EP EP12730223.0A patent/EP2867916A1/en not_active Withdrawn
- 2012-07-02 WO PCT/EP2012/062836 patent/WO2014005617A1/en active Application Filing
- 2012-07-02 CN CN201280075041.6A patent/CN104704603B/zh active Active
- 2012-07-02 JP JP2015518864A patent/JP6113841B2/ja active Active
-
2013
- 2013-06-27 TW TW102123028A patent/TWI627297B/zh active
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