JP2015230458A5 - - Google Patents
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- JP2015230458A5 JP2015230458A5 JP2014117925A JP2014117925A JP2015230458A5 JP 2015230458 A5 JP2015230458 A5 JP 2015230458A5 JP 2014117925 A JP2014117925 A JP 2014117925A JP 2014117925 A JP2014117925 A JP 2014117925A JP 2015230458 A5 JP2015230458 A5 JP 2015230458A5
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- JP
- Japan
- Prior art keywords
- nozzle
- dropping
- nozzles
- dropping device
- work table
- Prior art date
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- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 239000011344 liquid material Substances 0.000 claims description 12
- 239000011159 matrix material Substances 0.000 claims description 6
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
Description
滴下装置に係る本発明は、液体材料を計量する計量部と、計量部内を往復移動するプランジャと、吐出口を有するノズルを複数備えるノズル部と、計量部に液体材料を供給する供給流路と、計量部とノズル部および計量部と供給流路の連通を切り換える切換弁とを備える滴下装置において、前記ノズル部に、マトリクス状に複数点同時塗布を行えるように、一のノズルと隣り合うノズルとの間隔がいずれも同一となるように前記ノズルを底面から見てマトリクス状に配置するとともに、前記各ノズルのうち傾斜した複数のノズルと垂直線が構成する角度θがいずれも同一となるように前記傾斜した複数のノズルを傾けて配置したことを特徴とする。
上記滴下装置において、前記各ノズルが、底面から見て矩形の枠内でマトリクス状に配置されることを特徴としてもよいし、これに加え、前記ノズルが、ｎ２（ｎは２以上の自然数）個のノズルからなることを特徴としてもよいし、前記ノズル部に、前記傾斜した複数のノズルの吐出口が前記ノズル部の鉛直方向中心に対し外側を向くように配置されることを特徴としてもよいし、或いは、前記ノズル部に、前記傾斜した複数のノズルの吐出口が前記ノズル部の鉛直方向中心に対し内側を向くように配置されることを特徴としてもよい。さらに、前記ノズルが、偶数個のノズルにより構成され、前記各ノズルの全部が、底面から見て正方形の枠内で傾斜して配置されていることを特徴としてもよいし、あるいは、前記ノズルが、奇数個のノズルにより構成され、中心以外のノズルが、底面から見て正方形の枠内で傾斜して配置され、中心にある一のノズルが、底面から見て正方形の枠の対角線の交点に配置されていることを特徴としてもよい。
上記滴下装置において、前記ノズル部が、一の流入流路および流入流路と前記吐出口と連通する分岐流路が形成されたノズルブロックを備え、当該ノズルブロックに前記ノズルが装着されることを特徴としてもよい。
The present invention relating to a dropping device includes a metering unit that measures a liquid material, a plunger that reciprocates in the metering unit, a nozzle unit that includes a plurality of nozzles having discharge ports, and a supply channel that supplies the liquid material to the metering unit. In a dropping device comprising a metering unit, a nozzle unit, and a switching valve for switching the communication between the metering unit and the supply flow path , a nozzle adjacent to one nozzle so that a plurality of points can be applied simultaneously in a matrix on the nozzle unit The nozzles are arranged in a matrix so that the intervals between the nozzles are the same as each other, and the angle θ formed by the plurality of inclined nozzles and the vertical line is the same among the nozzles. The plurality of inclined nozzles are arranged in an inclined manner.
In the dropping apparatus, the nozzles may be arranged in a matrix within a rectangular frame when viewed from the bottom, and in addition to the nozzles, n 2 (n is a natural number of 2 or more) ) pieces of it may be characterized in that it consists of a nozzle, before Symbol nozzle unit, that the discharge ports of the plurality of nozzles the inclined are placed so as to face outward with respect to the vertical direction center of the nozzle portion may be characterized, or, to the nozzle portion, the discharge port of the plurality of nozzles the inclined may be characterized in that it is placed so as to face inward with respect to the vertical direction center of the nozzle portion. Further, the nozzles may be configured by an even number of nozzles, and all of the nozzles may be arranged in an inclined manner within a square frame when viewed from the bottom, or the nozzles may be It is composed of an odd number of nozzles, and the nozzles other than the center are arranged inclined in the square frame when viewed from the bottom, and one nozzle at the center is at the intersection of the diagonal lines of the square frame when viewed from the bottom It may be characterized by being arranged.
In the dropping device, the nozzle portion includes a nozzle block in which a single inflow channel and a branch channel that communicates with the inflow channel and the discharge port are formed, and the nozzle is mounted on the nozzle block. It may be a feature.
塗布装置に係る本発明は、上記滴下装置と、基板が載置されるワークテーブルと、前記滴下装置とワークテーブルとを相対的に移動させるＸＹＺ駆動装置と、記憶装置を有する制御部とを備えることを特徴とする。
上記塗布装置において、前記滴下装置を複数備え、一の滴下装置のノズル数、ノズルの間隔またはノズルの角度θが、他の滴下装置のノズルの間隔またはノズルの角度θと異なることを特徴としてもよいし、前記滴下装置を複数備え、全ての滴下装置のノズル数、ノズルの間隔およびノズルの角度θが同一であることを特徴としてもよいし、あるいは、前記制御部が、入力値に基づき前記ワークテーブルと前記滴下装置との垂直距離を調節することにより、前記ノズルから吐出された液滴の滴下点間距離（Ｌ１、Ｌ２）を調節し、前記ワークテーブルと前記滴下装置との垂直距離を一定としたまま、前記滴下装置と前記ワークテーブルとを水平方向に相対移動させながら液体材料をワークに滴下することを特徴してもよい。加えて、前記制御部の記憶装置に、前記ワークテーブルおよび前記滴下装置の垂直距離と液滴の滴下点間距離（Ｌ１、Ｌ２）との相関関係パターンが複数記憶されており、前記入力値が、前記相関関係パターンの選択値であることを特徴としてもよい。
The present invention relating to a coating apparatus includes the above-described dropping device, a work table on which a substrate is placed, an XYZ driving device that relatively moves the dropping device and the work table, and a control unit having a storage device. It is characterized by that.
The coating apparatus may include a plurality of the dropping devices, wherein the number of nozzles of one dropping device, the nozzle interval, or the nozzle angle θ is different from the nozzle interval or nozzle angle θ of another dropping device. Alternatively, a plurality of the dropping devices may be provided, and the number of nozzles, the interval between the nozzles, and the nozzle angle θ of all the dropping devices may be the same, or the control unit may be configured based on an input value. By adjusting the vertical distance between the work table and the dropping device, the distance (L1, L2) between the dropping points of the droplets discharged from the nozzle is adjusted, and the vertical distance between the work table and the dropping device is adjusted. The liquid material may be dropped onto the workpiece while moving the dropping device and the work table relative to each other in the horizontal direction while maintaining the same. In addition, a plurality of correlation patterns between the vertical distance of the work table and the dropping device and the distance (L1, L2) between the dropping points of the droplets are stored in the storage device of the control unit, and the input value is The correlation pattern may be a selected value.
滴下方法に係る本発明は、上記塗布装置を用いた滴下方法であって、入力値に基づき前記ワークテーブルと前記滴下装置との垂直距離を調節することにより、前記ノズルから吐出された液滴の滴下点間距離（Ｌ１、Ｌ２）を調節し、前記ワークテーブルと前記滴下装置との垂直距離を一定としたまま、前記滴下装置と前記ワークテーブルとを水平方向に相対移動させながら液体材料をワークに滴下することを特徴とする。
上記滴下方法において、前記制御部の記憶装置に、前記ワークテーブルおよび前記滴下装置の垂直距離と液滴の滴下点間距離（Ｌ１、Ｌ２）との相関関係パターンが複数記憶されており、前記入力値が、前記相関関係パターンの選択値であることを特徴としてもよい。
別の観点からの滴下方法に係る本発明は、前記滴下装置を複数備え、全ての滴下装置のノズル数、ノズルの間隔およびノズルの角度θが同一であることを特徴とする塗布装置を用いた滴下方法であって、前記複数の滴下装置の全てで同一の滴下塗布を行うことにより、多面取りを行うことを特徴とする。ここで、前記ワークが、液体材料が滴下される矩形の枠を備えることを特徴としてもよいし、あるいは、前記ワークが液晶パネル基板であり、前記液体材料が液晶であることを特徴としてもよい。
The present invention relating to a dropping method is a dropping method using the above-described coating apparatus, and by adjusting a vertical distance between the work table and the dropping apparatus based on an input value, droplets discharged from the nozzle While adjusting the distance (L1, L2) between the dropping points and keeping the vertical distance between the work table and the dropping device constant, the liquid material is moved while moving the dropping device and the work table relative to each other in the horizontal direction. It is characterized by dripping in
In the dropping method, a plurality of correlation patterns between the vertical distances of the work table and the dropping device and the distances (L1, L2) between the dropping points of the droplets are stored in the storage device of the control unit. The value may be a selection value of the correlation pattern.
The present invention relating to a dropping method from another viewpoint uses a coating apparatus including a plurality of the dropping apparatuses, wherein the number of nozzles, the interval between the nozzles, and the nozzle angle θ of all the dropping apparatuses are the same. It is a dripping method, Comprising: Multi-chamfering is performed by performing the same dripping application | coating with all the said some dripping apparatus. Here, the workpiece may include a rectangular frame into which a liquid material is dropped, or the workpiece may be a liquid crystal panel substrate, and the liquid material may be liquid crystal. .
Claims (18)
前記ノズル部に、マトリクス状に複数点同時塗布を行えるように、一のノズルと隣り合うノズルとの間隔がいずれも同一となるように前記ノズルを底面から見てマトリクス状に配置するとともに、前記各ノズルのうち傾斜した複数のノズルと垂直線が構成する角度θがいずれも同一となるように前記傾斜した複数のノズルを傾けて配置したことを特徴とする滴下装置。 Measuring unit for measuring liquid material, plunger reciprocating in measuring unit, nozzle unit having a plurality of nozzles having discharge ports, supply channel for supplying liquid material to measuring unit, measuring unit, nozzle unit and measuring unit In the dropping device comprising a switching valve for switching the communication between the section and the supply channel,
Said nozzle portion, to allow a plurality of points simultaneously applied to the matrix, as well as arranged in a matrix to look at the nozzle and the interval between the adjacent nozzles and one nozzle are the same either from the bottom, the dropping device, characterized in that the angle which a plurality of nozzles and vertical lines inclined constitutes θ is arranged to be inclined a plurality of nozzles the inclined so both the same among the respective nozzles.
前記各ノズルの全部が、底面から見て正方形の枠内で傾斜して配置されていることを特徴とする請求項３に記載の滴下装置。The dropping device according to claim 3, wherein all of the nozzles are arranged to be inclined in a square frame when viewed from the bottom.
中心以外のノズルが、底面から見て正方形の枠内で傾斜して配置され、The nozzles other than the center are arranged in an inclined manner in a square frame when viewed from the bottom,
中心にある一のノズルが、底面から見て正方形の枠の対角線の交点に配置されていることを特徴とする請求項３に記載の滴下装置。4. The dropping device according to claim 3, wherein the one nozzle at the center is arranged at an intersection of diagonal lines of a square frame when viewed from the bottom surface.
前記入力値が、前記相関関係パターンの選択値であることを特徴とする請求項１２に記載の塗布装置。The coating apparatus according to claim 12, wherein the input value is a selection value of the correlation pattern.
入力値に基づき前記ワークテーブルと前記滴下装置との垂直距離を調節することにより、前記ノズルから吐出された液滴の滴下点間距離（Ｌ１、Ｌ２）を調節し、前記ワークテーブルと前記滴下装置との垂直距離を一定としたまま、前記滴下装置と前記ワークテーブルとを水平方向に相対移動させながら液体材料をワークに滴下することを特徴とする滴下方法。 A dropping method using the coating apparatus according to claim 12 ,
By adjusting the vertical distance between the work table and the dropping device based on the input value, the distance (L1, L2) between the dropping points of the droplets discharged from the nozzle is adjusted, and the work table and the dropping device are adjusted. A dropping method characterized in that the liquid material is dropped onto the workpiece while the dropping device and the work table are relatively moved in the horizontal direction while keeping the vertical distance to the workpiece constant.
前記入力値が、前記相関関係パターンの選択値であることを特徴とする請求項１４に記載の滴下方法。 In the storage device of the control unit, a plurality of correlation patterns between the vertical distance of the work table and the dropping device and the distance (L1, L2) between droplet dropping points are stored,
The dropping method according to claim 14 , wherein the input value is a selection value of the correlation pattern.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014117925A JP6389379B2 (en) | 2014-06-06 | 2014-06-06 | Liquid material dropping apparatus and method |
| PCT/JP2015/066051 WO2015186743A1 (en) | 2014-06-06 | 2015-06-03 | Liquid material dropping device and method |
| KR1020167031980A KR102328887B1 (en) | 2014-06-06 | 2015-06-03 | Liquid material dropping device and method |
| CN201580030173.0A CN106461989B (en) | 2014-06-06 | 2015-06-03 | Liquid material dripping device and method |
| TW109116267A TWI718061B (en) | 2014-06-06 | 2015-06-05 | Liquid material dropping device |
| TW104118291A TWI717320B (en) | 2014-06-06 | 2015-06-05 | Coating device and dropping method using the device |
| HK17105021.3A HK1231567A1 (en) | 2014-06-06 | 2017-05-18 | Liquid material dropping device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014117925A JP6389379B2 (en) | 2014-06-06 | 2014-06-06 | Liquid material dropping apparatus and method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015230458A JP2015230458A (en) | 2015-12-21 |
| JP2015230458A5 true JP2015230458A5 (en) | 2017-07-13 |
| JP6389379B2 JP6389379B2 (en) | 2018-09-12 |
Family
ID=54766812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014117925A Active JP6389379B2 (en) | 2014-06-06 | 2014-06-06 | Liquid material dropping apparatus and method |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6389379B2 (en) |
| KR (1) | KR102328887B1 (en) |
| CN (1) | CN106461989B (en) |
| HK (1) | HK1231567A1 (en) |
| TW (2) | TWI717320B (en) |
| WO (1) | WO2015186743A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6745683B2 (en) * | 2016-08-31 | 2020-08-26 | Ntn株式会社 | Liquid coating unit, liquid coating device, and liquid coating method |
| CN107300811B (en) * | 2017-08-11 | 2020-11-20 | 京东方科技集团股份有限公司 | Liquid crystal dripping nozzle, liquid crystal dripping device and liquid crystal dripping method |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3436785B2 (en) * | 1994-01-25 | 2003-08-18 | 芝浦メカトロニクス株式会社 | Substrate cleaning equipment |
| JPH10263467A (en) * | 1997-03-25 | 1998-10-06 | Nichiha Corp | Coating of building panel and apparatus therefor |
| WO2001012386A1 (en) * | 1999-08-18 | 2001-02-22 | Koninklijke Philips Electronics N.V. | Method of obtaining a pattern of concave spaces or apertures in a plate |
| JP2003025565A (en) | 2001-07-11 | 2003-01-29 | Sharp Corp | Line head and printer comprising it |
| JP2004145090A (en) * | 2002-10-25 | 2004-05-20 | Seiko Epson Corp | Apparatus and method for manufacturing liquid crystal display device |
| CN1261230C (en) * | 2003-05-19 | 2006-06-28 | 乐金电子（沈阳）有限公司 | Ink jetting coating unit for making display board |
| CN100383566C (en) * | 2004-05-19 | 2008-04-23 | 精工爱普生株式会社 | Method of manufacturing color filter substrate, method of manufacturing electro-optical device, electro-optical device, and electronic apparatus |
| JP2006272292A (en) * | 2005-03-30 | 2006-10-12 | Matsushita Electric Ind Co Ltd | Viscous fluid applying apparatus |
| US20070145164A1 (en) * | 2005-12-22 | 2007-06-28 | Nordson Corporation | Jetting dispenser with multiple jetting nozzle outlets |
| US20080062376A1 (en) * | 2006-09-12 | 2008-03-13 | United Microdisplay Optronics Corp. | Method of fabricating a liquid crystal panel and alignment method |
| JP5244366B2 (en) * | 2007-10-30 | 2013-07-24 | 武蔵エンジニアリング株式会社 | Liquid material dripping method, program and apparatus |
| JP5340181B2 (en) * | 2008-02-21 | 2013-11-13 | 武蔵エンジニアリング株式会社 | Liquid material discharge apparatus and method |
| JP2009291684A (en) * | 2008-06-03 | 2009-12-17 | Fujifilm Corp | Method of forming functional film pattern |
| JP2010194399A (en) * | 2009-02-23 | 2010-09-09 | Fuji Xerox Co Ltd | Liquid droplet discharge head and liquid droplet discharge device |
| JP5126185B2 (en) * | 2009-08-26 | 2013-01-23 | カシオ計算機株式会社 | Coating device |
-
2014
- 2014-06-06 JP JP2014117925A patent/JP6389379B2/en active Active
-
2015
- 2015-06-03 KR KR1020167031980A patent/KR102328887B1/en active IP Right Grant
- 2015-06-03 WO PCT/JP2015/066051 patent/WO2015186743A1/en active Application Filing
- 2015-06-03 CN CN201580030173.0A patent/CN106461989B/en active Active
- 2015-06-05 TW TW104118291A patent/TWI717320B/en active
- 2015-06-05 TW TW109116267A patent/TWI718061B/en active
-
2017
- 2017-05-18 HK HK17105021.3A patent/HK1231567A1/en unknown
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