JP2015198217A - Cleaning device and cleaning method of workpiece - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent a contamination removed from a workpiece by cleaning from re-adhering to the upper surface of the workpiece.SOLUTION: Water is supplied by a water layer formation nozzle 61 to an upper surface 91 of a workpiece 90 held on a holding table 11, from above the holding table 11 rotating continuously by rotary means 12. A water layer is formed to cover the upper surface 91 of the workpiece 90 entirely, and a mixed fluid of the cleaning liquid and air is jetted from a cleaning nozzle 31 and brought into collision with the water layer formed by the water layer formation nozzle 61, thus destroying the water layer and cleaning the upper surface 91 of the workpiece 90. Readhesion of contamination to the workpiece, due to formation of a water layer, can thereby prevented, and since the water layer is destroyed to expose the upper surface of the workpiece, the upper surface of the workpiece can be cleaned reliably.

Description

  The present invention relates to a cleaning apparatus and a cleaning method for cleaning a workpiece.

  In order to remove debris generated by machining such as cutting and grinding, two fluids (mixed fluid) mixed with high-pressure air and cleaning liquid are sprayed from the cleaning nozzle onto the upper surface of a disk-shaped workpiece such as a wafer. A cleaning method has been proposed (see, for example, Patent Document 1 and Patent Document 2).

JP 2011-200785 A JP 2008-80180 A

  However, since the amount of the cleaning liquid contained in the mixed fluid is relatively small, the cleaning liquid may become polka dots and adhere to the upper surface of the workpiece. In particular, when cleaning the outer periphery of the workpiece, the cleaning liquid is directed to the outside of the workpiece due to the centrifugal force generated by rotating the workpiece during cleaning. The top surface is exposed. A part of the cleaning liquid contained in the mixed fluid scatters in a mist shape including the debris removed from the work by cleaning. In some cases, debris contained in the cleaning liquid may adhere to the upper surface of the workpiece.

  The present invention has been considered in view of such a problem, and an object of the present invention is to prevent debris removed from a workpiece by cleaning from reattaching to the upper surface of the workpiece.

  The first invention is a holding table for holding a disk-shaped workpiece, a rotating means for continuously rotating the holding table, and a mixture in which cleaning water and gas are mixed on the upper surface of the workpiece held on the holding table. A cleaning apparatus comprising: a cleaning nozzle that jets a fluid to clean the upper surface of the workpiece; and a moving unit that moves the cleaning nozzle in the radial direction of the holding table, wherein the rotating unit continuously rotates. A water layer forming nozzle for supplying water to the upper surface of the disk-shaped workpiece from above the disk-shaped workpiece held on the holding table and forming a water layer covering the entire upper surface of the workpiece; The mixed fluid ejected from the cleaning nozzle is made to collide with the aqueous layer formed by the aqueous layer forming nozzle, and the upper surface of the workpiece is cleaned by destroying the aqueous layer.

  In the cleaning apparatus, the water layer forming nozzle includes a plurality of supply ports arranged in a line in parallel with the upper surface of the disk-shaped workpiece held by the holding table, and the plurality of supply ports are arranged. It is preferable that the length made is longer than the radius of the outermost diameter of the disk-shaped workpiece | work hold | maintained at this holding table which the said rotation means rotates.

A second invention is a workpiece cleaning method for cleaning a workpiece using the cleaning device, wherein the water layer forming nozzle is used to apply the water to the entire upper surface of the disk-shaped workpiece held on the holding table. An aqueous layer forming step of forming a layer; and while forming the aqueous layer in the aqueous layer forming step, the mixed fluid is jetted onto the upper surface by the cleaning nozzle, and the cleaning nozzle is moved to a disk-shaped workpiece by the moving means A cleaning step of moving the upper surface of the workpiece in parallel with the upper surface of the workpiece;
Consists of

  The water layer forming nozzle includes a plurality of supply ports arranged in a line in parallel with the upper surface of the work held by the holding table, and the length of the plurality of supply ports arranged is: It is preferable that the radius is longer than the outermost radius of the work held by the holding table rotated by the rotating means.

  A second invention is a work cleaning method for cleaning a work using the cleaning device, wherein the water layer is formed on the entire upper surface of the work held on the holding table by the water layer forming nozzle. Forming a water layer in the water layer forming step, and jetting the mixed fluid onto the upper surface of the workpiece by the cleaning nozzle, and moving the cleaning nozzle to the workpiece by the moving means. And a cleaning step of cleaning the upper surface of the workpiece by moving the upper surface of the workpiece in parallel.

  According to the cleaning apparatus and the cleaning method of the present invention, the water layer is formed on the entire upper surface of the work by the water supplied from the water layer forming nozzle, so that the contamination removed by the cleaning is reattached to the work. Can be prevented. On the other hand, in the portion to be cleaned by the cleaning nozzle, the water layer is destroyed by collision with the mixed fluid and the upper surface of the workpiece is exposed, so that the upper surface of the workpiece can be reliably cleaned.

  If a plurality of supply ports are arranged in a line longer than the radius of the workpiece, a water layer can be uniformly formed from the center portion to the outer peripheral portion of the workpiece, and the dust removed by the cleaning is reapplied to the workpiece. It can be surely prevented from adhering.

The perspective view which shows a washing | cleaning apparatus. The front view and top view which show a washing | cleaning apparatus. The perspective view which shows another washing | cleaning apparatus. The front view and top view which show another washing | cleaning apparatus.

  A cleaning apparatus 10 shown in FIG. 1 is incorporated in a processing apparatus such as a cutting apparatus or a grinding apparatus or used as a single apparatus, and cleans a disk-shaped workpiece 90 such as a processed wafer. Thus, it is a device that removes contaminants such as cutting waste and grinding waste adhering to the upper surface 91 of the workpiece 90. The cleaning apparatus 10 includes a holding table 11 that holds a workpiece 90 parallel to the XY plane, a rotating unit 12 that continuously rotates the holding table 11 around a rotation axis 29 that is parallel to the ± Z direction perpendicular to the XY plane, Cleaning means 13 for cleaning the upper surface 91 of the workpiece 90 held on the holding table 11, lifting / lowering means 14 for moving the cleaning means 13 parallel to the ± Z direction, and moving the cleaning means 13 and the lifting / lowering means 14 in the ± Y direction The moving means 15 for moving, the water layer forming means 16 for forming a water layer on the upper surface 91 of the work 90, and the retracting means 17 for retracting the water layer forming means 16 when the work 90 is carried in and out.

  The holding table 11 sucks and holds the workpiece 90 placed on a holding surface parallel to the XY plane. When the rotating means 12 rotates the holding table 11 holding the workpiece 90, the workpiece 90 rotates about the rotation axis 29 together with the holding table 11.

  The cleaning means 13 includes an air intake 32 connected to an air supply source (not shown), a cleaning water intake 33 connected to a cleaning water supply source (not shown), and a gas such as air taken from the air intake 32 and cleaning. A cleaning nozzle 31 for injecting a mixed fluid mixed with cleaning water such as pure water taken from the water intake port 33 downward (−Z direction), and a rod-shaped support portion 34 extending in the ± X direction perpendicular to the YZ plane, It has.

  The elevating means 14 is configured such that when the motor 42 rotates the screw shaft 41 parallel to the ± Z direction, the moving portion 43 engaged with the screw shaft 41 is guided by the guide 44 and moved in the ± Z direction. Yes. One end of the support part 34 is fixed to the moving part 43, and the entire cleaning means 13 moves in the ± Z direction as the moving part 43 moves. When the lifting / lowering means 14 moves the cleaning means 13 in the −Z direction, the cleaning means 13 approaches the upper surface 91 of the work 90 held on the holding table 11, and conversely, the lifting / lowering means 14 moves the cleaning means 13 in the + Z direction. When moved, the cleaning means 13 moves away from the upper surface 91 of the work 90 held on the holding table 11.

  The moving means 15 includes, for example, a ball screw mechanism, and can move the elevating means 14 in the ± Y directions. As the lifting / lowering means 14 moves in the ± Y direction, the cleaning means 13 also moves in the ± Y direction. When the moving means 15 moves the elevating means 14 and the cleaning means 13 in the −Y direction, the cleaning nozzle 31 approaches the rotating shaft 29, and conversely, the moving means 15 moves the elevating means 14 and the cleaning means 13 in the + Y direction. As a result, the cleaning nozzle 31 moves away from the rotating shaft 29. That is, the cleaning nozzle 31 moves in the radial direction of the holding table 11.

  The water layer forming means 16 includes an intake port 62 connected to a cleaning water supply source (not shown), and a water layer forming nozzle 61 that supplies cleaning water such as pure water taken from the intake port 62 to the upper surface 91 of the workpiece 90. I have. The water layer forming nozzle 61 is arranged above the holding table 11 (on the + Z direction side), is formed in a box shape that is long in the ± X direction, and a plurality of supply ports 63 are arranged in a row in parallel on the lower surface thereof in the ± X direction. It is formed side by side. The length of the water layer forming nozzle 61 is longer than the radius of the holding table 11, the supply port 63 on the most distal end (−X) side is located in the vicinity of the rotation shaft 29, and the supply port 63 on the most proximal (+ X) side. Is positioned outside the outer periphery of the workpiece 90 held by the holding table 11. That is, the length of the portion where the plurality of supply ports 63 are disposed is longer than the radius of the outermost diameter of the workpiece 90. Water can be supplied from a plurality of supply ports 63 arranged in a line to the upper surface 91 of the work 90 held by the holding table 11 rotated by the rotating means 12.

  The retracting means 17 includes a rod-like support portion 72 extending in parallel with the ± Z direction, an arm portion 71 formed in a rod shape extending in parallel to the −X direction from the support portion 72 and supporting the water layer forming means 16, and the ± Z direction. And a nozzle turning portion 73 that rotates the support portion 72 around a rotation shaft 79 parallel to the rotation shaft 79.

  When carrying the workpiece 90 on the holding table 11 or carrying it out of the holding table 11, the nozzle turning unit 73 rotates the support portion 72 to support the arm portion 71 and the arm portion 71. The formed water layer forming means 16 rotates in parallel with the XY plane, and the water layer forming means 16 can be retracted from above the holding table 11.

  Next, a cleaning method for cleaning the workpiece 90 using the cleaning apparatus 10 will be described.

(1) Holding Step In the holding step, first, as indicated by a two-dot chain line in FIG. 2, the moving unit 15 moves the cleaning unit 13 in the + Y direction, and the retracting unit 17 rotates the water layer forming unit 16. Then, the cleaning means 13 and the water layer forming means 16 are retracted from above the holding table 11. Next, carry-in means (not shown) conveys the work 90 and places it on the holding table 11, and the holding table 11 sucks and holds the placed work 90. The holding table 11 keeps the work 90 held until the work 90 is cleaned.

(2) Water layer forming step In the water layer forming step, as shown in FIG. 2, the rotating means 12 continuously rotates the holding table 11, and the retracting means 17 rotates the water layer forming means 16, The water layer forming means 16 is positioned above the workpiece 90 held by the rotating holding table 11. And the water layer formation means 16 supplies water to the upper surface 91 of the workpiece | work 90 hold | maintained at the holding table 11 which is rotating, and the water layer which covers the whole surface of the upper surface 91 from the center part of the workpiece | work 90 to an outer peripheral part is formed. Form. The amount of water supplied by the water layer forming means 16 is, for example, 0.7 liter per minute.

(3) Cleaning process The cleaning process is executed in parallel with the water layer forming process. The moving unit 15 moves the cleaning unit 13 in the −Y direction parallel to the upper surface 91 of the workpiece 90, positions the cleaning unit 13 above the rotating workpiece 90, and the cleaning nozzle 31 mixes with the upper surface 91 of the workpiece 90. Inject fluid. The amount of air supplied from the air supply source 82 to the cleaning means 13 is, for example, 50 liters per minute. The amount of cleaning water supplied from the cleaning water supply source 83 to the cleaning means 13 is, for example, 0.2 liter per minute. Thus, the amount of cleaning water contained in the mixed fluid ejected by the cleaning means 13 is very small compared to the amount of gas.

  The jetted mixed fluid collides with the water layer formed on the upper surface 91 of the workpiece 90, and blows off the collided water layer with air. Thereby, the water layer is destroyed only in that portion, and the upper surface 91 of the workpiece 90 is exposed. When the mixed fluid hits the exposed upper surface 91 of the workpiece 90, the upper surface 91 of the workpiece 90 is cleaned.

  A part of the cleaning water contained in the mixed fluid that has cleaned the upper surface 91 of the work 90 scatters in a mist state in a state including the contamination removed from the upper surface 91 of the work 90 by the cleaning. However, since the entire upper surface 91 of the work 90 is covered with the water layer, the scattered cleaning water flows together with the water layer without adhering to the upper surface 91 of the work 90 as polka dots. Thereby, it is possible to prevent contamination contained in the scattered cleaning water from reattaching to the upper surface 91 of the workpiece 90.

The rotating means 12 rotates the holding table 11 and the moving means 15 performs cleaning while moving the cleaning means 13 in the ± Y directions, whereby the entire upper surface 91 of the workpiece 90 is cleaned.
Further, for example, when cleaning the workpiece 90 that has been subjected to the edge trimming process on the outer peripheral portion, if the time during which the moving means 15 positions the cleaning means 13 on the outer peripheral portion of the work 90 is lengthened, the outer peripheral portion of the workpiece 90 is emphasized. Can be cleaned. Even while the moving unit 15 positions the cleaning unit 13 on the outer peripheral portion of the workpiece 90 and cleans it, the water layer formed by the water layer forming unit 16 covers the entire upper surface 91 including the vicinity of the center of the workpiece 90. Since it covers, the contamination contained in the scattered washing water can be prevented from reattaching to the central portion of the workpiece 90 where the mixed fluid does not contact.

  If the amount of water supplied by the water layer forming means 16 is too small, the entire upper surface 91 of the workpiece 90 cannot be covered with the water layer, and contamination reattachment cannot be prevented. Conversely, if the amount of water supplied by the water layer forming means 16 is too large, the water layer becomes thick and the water layer cannot be destroyed by the mixed fluid ejected by the cleaning means 13, so that the workpiece 90 cannot be cleaned. . For this reason, the amount of water supplied by the water layer forming means 16 is preferably 0.5 liter to 1.0 liter per minute, and most preferably about 0.7 liter per minute.

  A cleaning apparatus 10A shown in FIG. 3 includes an aqueous layer forming means 16A instead of the aqueous layer forming means 16 of the cleaning apparatus 10 described in FIG. The other points are the same as the cleaning device 10.

  The water layer forming means 16 </ b> A includes an intake port 62 connected to a cleaning water supply source (not shown) and a water layer forming nozzle 61 </ b> A that supplies cleaning water taken from the intake port 62 to the upper surface 91 of the workpiece 90. The water layer forming nozzle 61 </ b> A is different from the water layer forming nozzle 61 of the water layer forming means 16 in that it does not supply water linearly but supplies water in the vicinity of the rotating shaft 29.

  A cleaning method for cleaning the workpiece 90 using the cleaning apparatus 10A is basically the same as that when the cleaning apparatus 10 is used. That is, as shown in FIG. 4, when the water layer forming unit 16 supplies water to the upper surface 91 of the work 90 held by the holding table 11 while the rotating unit 12 rotates the holding table 11 in the water layer forming step. The water supplied near the rotating shaft 29 spreads outward by centrifugal force. For this reason, it is possible to form a water layer not only near the center of the work 90 to which water is directly supplied from the water layer forming means 16 but also near the outer periphery of the work 90 to which water is not directly supplied from the water layer forming means 16. it can.

  The position where the water layer forming unit 16 supplies water may be a position where the water layer covering the entire upper surface 91 including the central portion of the workpiece 90 can be formed by the water supplied from the water layer forming unit 16. As shown in FIG. 4, the position may be a little away from the rotating shaft 29. In the case where the position where the water layer forming unit 16 supplies water is arranged on the rotation shaft 29, when the cleaning unit 13 cleans the central portion of the workpiece 90, the retracting unit 17 rotates the water layer forming unit 16. The water layer forming unit 16 may be configured to prevent the cleaning unit 13 and the water layer forming unit 16 from interfering with each other by slightly shifting the position where the water is supplied from the rotation shaft 29.

  In addition, the moving means may be configured to rotate the cleaning nozzle instead of moving it in parallel, and the retracting means is configured not to rotate the water layer forming means but to retract by moving in parallel. There may be.

10, 10A cleaning device,
11 holding table, 12 rotating means, 29 rotating shaft,
13 Cleaning means, 31 Cleaning nozzle, 32 Air intake port, 33 Cleaning water intake port,
34 support part,
14 Lifting means, 41 Screw shaft, 42 Motor, 43 Moving part, 44 Guide,
15 moving means, 16, 16A water layer forming means,
61, 61A water layer forming nozzle, 62 intake port, 63 supply port,
17 retraction means, 71 arm part, 72 support part, 73 nozzle turning part, 79 rotating shaft,
82 Air supply source, 83 Wash water supply source,
90 work, 91 top surface

Claims (3)

A holding table for holding a disk-shaped workpiece;
Rotating means for continuously rotating the holding table;
A cleaning nozzle for cleaning the upper surface of the workpiece by spraying a mixed fluid obtained by mixing cleaning water and gas on the upper surface of the workpiece held by the holding table;
Moving means for moving the cleaning nozzle in the radial direction of the holding table;
A cleaning device comprising:
Water is supplied to the upper surface of the disc-shaped workpiece from above the disc-shaped workpiece held by the holding table that is continuously rotated by the rotating means, and a water layer covering the entire upper surface of the workpiece is formed. It has a water layer forming nozzle to form,
A cleaning apparatus that causes the mixed fluid ejected from the cleaning nozzle to collide with the water layer formed by the water layer forming nozzle, destroys the water layer, and cleans the upper surface of the workpiece.   The water layer forming nozzle includes a plurality of supply ports arranged in a row in parallel with the upper surface of the disk-shaped workpiece held by the holding table, and the length of the plurality of supply ports arranged is The cleaning apparatus according to claim 1, wherein the cleaning device is longer than a radius of an outermost diameter of the disk-shaped workpiece held by the holding table rotated by the rotating means. A workpiece cleaning method for cleaning a workpiece using the cleaning device according to claim 1 or 2,
An aqueous layer forming step of forming the aqueous layer on the entire upper surface of the disc-shaped workpiece held on the holding table by the aqueous layer forming nozzle;
While forming the aqueous layer in the aqueous layer forming step, the mixed fluid is sprayed onto the upper surface by the cleaning nozzle, and the cleaning nozzle is moved in parallel to the upper surface of the disk-shaped workpiece by the moving means, A cleaning step of cleaning the upper surface of the workpiece;
A method for cleaning a workpiece.

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