JP2015174016A - Cleaning device and cleaning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the cleaning efficiency of electronic components and semiconductors.SOLUTION: A cleaning device includes: a cleaning tank in which cleaning is conducted; a rotary stage; stage rotation means which rotates the stage; a fixing base which fixes a cleaning object; first fixing base support means which supports the fixing base; second fixing base support means which supports the first fixing base support means on the stage; inclined angle adjustment means which couples the first fixing base support means to the second fixing base support means and adjusts an angle formed by the first fixing base support means and the second fixing base support means; and fixing base autorotation means which rotates the fixing base with the first fixing base support means set to a rotation axis.

Description

  The present invention relates to a cleaning apparatus and a cleaning method.

  Various cleanings are required in the manufacture of electronic devices. There are various objects to be cleaned, such as a semiconductor wafer, a semiconductor package, a printed wiring board, and other electronic components. The cleaning methods are roughly classified into dry cleaning and wet cleaning. Among these, wet cleaning methods include dipping (dipping), spraying, and the like in terms of liquid contact. In addition, for the purpose of improving the cleaning efficiency, the object to be cleaned may be moved, and peristalsis, spin (rotation), and the like have been often used. However, as the pitch of semiconductors and other electronic components has been reduced, it has become stricter to efficiently deliver a cleaning liquid and a rinsing liquid to the cleaning portion, making cleaning difficult.

  Various methods for solving such problems have been proposed. For example, Patent Document 1 discloses a method using planetary rotation, in which a plurality of fixing bases are provided on a stage, the fixing base to which the object to be cleaned is fixed rotates, and the stage revolves. By using planetary rotation, it is possible to increase the efficiency of penetration and flow of the cleaning liquid, compared to the case where the fixed base is merely rotated.

JP-A-2005-349301

  However, the technique of Patent Document 1 sometimes fails to obtain a sufficient cleaning effect. This is because the object to be cleaned was basically rotating on one plane.

  The present invention has been made in view of the above-described problems, and an object thereof is to provide a cleaning apparatus and a cleaning method that improve cleaning efficiency.

  In order to solve the above-described problems, a cleaning apparatus of the present invention includes a cleaning tank that performs cleaning processing therein, a rotatable stage, a stage rotating unit that rotates the stage, and a fixed base that fixes a cleaning target. A first fixing base supporting means for supporting the fixing base; a second fixing base supporting means for supporting the first fixing base supporting means on the stage; the first fixing base supporting means; Inclination angle adjusting means that couples with the second fixing base support means and adjusts the angle between the two, and fixing base rotation means for rotating the fixing base around the first fixing base support means. ing.

  The effect of the present invention is that a high cleaning effect can be obtained for various objects to be cleaned.

It is a side view which shows the 1st Embodiment of this invention. It is a side view which shows the 2nd Embodiment of this invention. It is sectional drawing which shows the 3rd Embodiment of this invention. It is sectional drawing which shows the 4th Embodiment of this invention. It is a top view which shows the 5th Embodiment of this invention. It is a top view which shows the 6th Embodiment of this invention. It is a top view which shows the 7th Embodiment of this invention. It is a top view which shows another example of the 7th Embodiment of this invention. It is a side view which shows the 8th Embodiment of this invention. It is a side view which shows another example of the 8th Embodiment of this invention. It is a side view which shows the 9th Embodiment of this invention. It is a side view which shows the 10th Embodiment of this invention. It is a block diagram which shows the 11th Embodiment of this invention.

Hereinafter, the present invention will be described in detail with reference to the drawings.
(First embodiment)
FIG. 1 is a side view showing a cleaning device according to a first embodiment of the present invention. However, the panel part which covers the front is removed and drawn. The cleaning apparatus of the present embodiment includes a cleaning tank 1 that performs a cleaning process therein, a rotatable stage 2, and a stage rotating unit 3 that rotates the stage 2. On the stage 2, a fixing base 4 that fixes the object to be cleaned, a first fixing base support means 5 that supports the fixing base 4, and a second base that supports the first fixing base support means 5 on the stage 2. Fixed base support means 6. The fixed base 4 is supported by the first fixed base support means 5, and the first fixed base support means 5 and the second fixed base support means 6 are connected via an inclination angle adjusting means 7 that adjusts an angle formed between them. Are combined. Further, the cleaning device has a fixed base rotation means 8 for rotating the fixed base 4 about the first fixed base support means 5 as an axis.

By setting it as the above structure, the angle and flow velocity of the flow of the washing | cleaning medium which moves on the washing | cleaning target object can be optimized according to a target object and a target process. Further, by combining the rotation of the fixed base 4 and the rotation (revolution) of the stage 2, the cleaning medium can be applied from various directions. For this reason, a high cleaning effect is obtained. Further, the cleaning effect can be further enhanced by arbitrarily setting the rotation of the fixed base rotating means 8 clockwise / counterclockwise. The rotation direction of the stage rotating means 3 can also be arbitrarily set to clockwise / counterclockwise to enhance the cleaning effect. In FIG. 1, the number of the fixed bases 4 is three, but the number is not limited to this.
(Second Embodiment)
FIG. 2 is a sectional view showing a second embodiment.

  The cleaning apparatus of the present embodiment is a mode for performing dip cleaning using the cleaning liquid 9. The cleaning tank 1 is provided with temperature adjusting means 10 and bubble generating means 11.

  In the cleaning, first, the cleaning liquid 9 is supplied so that the cleaning target fixed to the fixed base 4 is immersed. Next, the temperature adjustment means 10 is used to adjust the temperature of the cleaning liquid 9 to a temperature suitable for the object to be cleaned. In this state, the stage 2 rotates and the fixed base 4 revolves and also rotates. In the present invention, since the upper surface of the fixed base 4 is inclined, the cleaning liquid flows with a pressure in a direction of colliding with the upper surface of the fixed base by the revolving motion, so that a high cleaning effect can be obtained.

Further, bubbles 12 can be generated in the cleaning liquid 9 using the bubble generating means 11. The bubble 12 can supply local kinetic energy into the cleaning liquid. Using this action, it is possible to enhance the cleaning effect. Whether to use the bubbles 12 is appropriately selected depending on the object to be cleaned and the process.
(Third embodiment)
FIG. 3 is a sectional view showing a third embodiment.

  The first fixed base support body 5 and the second fixed base support means 6 are coupled by a ball joint method, and the angle formed by them, that is, the inclination angle of the fixed base 4 can be adjusted. Then, it can be fixed by the inclination angle fixing means 13.

  The fixed base 4 is supported by a driven shaft 5 a built in the first fixed base supporting means 5. A driving shaft 6 a is built in the second fixed base support means 6 and can be rotated by the fixed base rotation means 8. The stage rotation means 8 is, for example, a motor.

  Spherical gears 5c and 6c are provided at contact portions of the driven shaft 5a and the drive shaft 6a, respectively, and 5c and 6c are engaged with each other, and the driving force of the drive shaft 6a is transmitted to the driven shaft 5a. The fixed base 4 rotates in conjunction with the rotation of the driven shaft 5a. It is also possible to transmit power by frictional force using a substantially spherical elastic body instead of the spherical gear.

By setting it as the above structure, a fixed base can be rotated and revolved in the state which adjusted the inclination-angle of the fixed base to the desired angle, and cleaning efficiency can be improved.
(Fourth embodiment)
FIG. 4 is a sectional view showing a fourth embodiment of the present invention. In the present embodiment, the joint end 5d is formed on the driven shaft 5a, the joint end 6d is formed on the drive shaft 6a, and both are combined to form the universal joint 14. By using the universal joint 14 as the coupling portion, the fixed base can be supported and rotated at a desired inclination angle. Further, mechanical strength and rotational stability can be increased as compared with the use of a spherical gear or an elastic body.
(Fifth embodiment)
FIG. 5 is a top view showing a fifth embodiment of the present invention. The present embodiment is a configuration for rotating the fixed base 4 on a planet. On the back side of the stage 2, a planetary roller 8 a serving as the fixed base rotation means 8 is provided in combination with the drive shaft 6 a. The surface of the planetary roller 8a is an elastic body. The stage 2 is provided with a ring roller 2a that is coupled to the inside of the outer periphery. Further, a sun roller 3b is provided which is coupled to the stage rotating means 3 and has a stage rotating shaft 3a as an axis. The three roller surfaces are elastic bodies, and the planetary rotation mechanism is formed by combining the three members. The planetary rotation mechanism is a well-known technique. In the present embodiment, the sun roller 3b is driven by the stage rotating means 3, the driving force is transmitted by the frictional force, the planetary roller 8a rotates, and a revolving motion with the stage rotating shaft 3a as the revolving axis is performed.

  In the above planetary rotation mechanism, the inclination angle of the fixed base 4 corresponds to the inclination of the rotation axis in the planetary motion. By optimizing the inclination angle according to the object to be cleaned, the cleaning medium, the order of processes, etc., high cleaning efficiency can be obtained.

  Further, since only the sun roller 3a is used as the drive shaft, it is not necessary to generate the driving force by itself as the fixed base rotating means 8, so that parts are reduced and energy (for example, electric power) supplying means becomes unnecessary. For this reason, the design is facilitated and a failure is less likely to occur.

It is also possible to change the planetary roller 8a or the like to a gear to provide a planetary gear mechanism. When using planetary gears. Design and manufacture are difficult, but robustness and high rotation reliability can be obtained.
(Sixth embodiment)
FIG. 6 is a top view showing a sixth embodiment of the present invention. The mechanism for planetary movement of the fixed base 4 in the present embodiment is the same as in the fourth embodiment, but the driving force is not given to the sun roller 3b. Instead, an outer roller 2b made of an elastic body is provided on the outer periphery of the stage 2, and a ring driving roller 3c that is in contact with the outer roller 2b and applies a driving force is provided. By rotating the ring driving roller 3c, the outer roller 2b, that is, the stage 2 is rotated, the rotational force is transmitted from the ring roller 2a to the planetary roller 8a and the sun roller 3b, and the planetary roller 8a performs planetary motion. In other words, the fixed base can be moved in a planetary motion.

  In the present embodiment, since the roller for applying the driving force is disposed outside the stage, restrictions on the size and installation location are reduced. In addition, since there is no power generation part at the lower part of the stage 2, maintenance is also facilitated.

In the above configuration, the planetary gear mechanism can be configured by replacing each roller with a gear. By using the gear, robustness and high rotation reliability can be obtained.
(Seventh embodiment)
The present embodiment is an embodiment of a mechanism for fixing an object to be cleaned to the fixing table 4. FIG. 7 is a plan view showing an example in which the fixed claw 15 is used. A part of the cleaning object is fixed in a state of being pressed against the fixing table 4 by the fixing claw 15. The fixing claw 15 is screwed to the fixing base 4 with a screw 16, for example. By providing the screw holes 17 at a plurality of locations on the fixing base 4, it is possible to fix objects to be cleaned having various sizes and various shapes. This form is suitable for a thick object and a non-uniform object.

  FIG. 8 is a plan view showing an example of another fixing method. In this example, the object to be cleaned is fixed to the fixing table 4 using the magnet 18. This form is suitable, for example, for fixing a dedicated jig or the like for fixing the object to be cleaned to the fixing base 4. Moreover, since there is no fitting part, it is suitable also when using the cleaning medium which has corrosiveness. Although the arc-shaped magnet 18 is used in the figure, the shape is not limited to this.

According to the present embodiment described above, objects to be cleaned having various shapes and various sizes can be easily fixed to the fixing base 4.
(Eighth embodiment)
FIG. 9 is a side view showing an eighth embodiment of the present invention. In addition, the drawing which removes the panel which covers the side surface of the washing tank 1 is drawn. In the present embodiment, a specific configuration in the case of performing dip cleaning in which an object to be cleaned is immersed in the cleaning liquid 9 is shown. The cleaning tank 1 is provided with a liquid supply pipe 19 for supplying the cleaning liquid 9, a liquid supply valve 20, and a pump 21. A drainage pipe 22 and a drainage valve 23 are provided for drainage.

  In cleaning, the cleaning liquid 9 is supplied from the liquid supply pipe 19 to the cleaning tank 1, the fixing base 4 to which the object to be cleaned is fixed is immersed, and the fixing base 4 is rotated on a planetary surface to execute cleaning. When the cleaning is completed, the drain valve 23 is opened and the cleaning liquid 9 is discharged from the drain pipe 22.

  Further, depending on the process, it is possible to enhance the cleaning effect by supplying the bubbles 12 to the cleaning liquid 9 using the bubble generating means 11 as shown in FIG.

As described above, according to the present embodiment, the cleaning liquid 9 can be easily supplied and discharged to perform cleaning.
(Ninth embodiment)
FIG. 11 is a side view showing the ninth embodiment. In the present embodiment, the liquid surface height of the cleaning liquid 9 is adjusted so that a part of the cleaning object fixed to the fixing base 4 is in the cleaning liquid and a part is in the air. If it does in this way, a high cleaning effect will be acquired by repeating that a to-be-cleaned part jumps out of a liquid level, and enters into a liquid level again. Further, the cleaning effect can be further enhanced by arbitrarily controlling the clockwise / counterclockwise rotation.
(Tenth embodiment)
FIG. 12 is a side view showing a tenth embodiment of the present invention. In addition, the drawing which removes the panel which covers the side surface of the washing tank 1 is drawn.

  In the present embodiment, a spray 24 that discharges a cleaning medium is used as the cleaning means. As the cleaning medium, various solvents, surfactants, liquids such as acid or alkali solutions, gases such as air and nitrogen, and the like can be used. The discharge angle, pressure, flow rate, and the like of the spray 24 can be optimized using known techniques. A cleaning medium is supplied from the liquid supply pipe 19 to the spray 24, and pressure is applied by a pump 21. A drainage pipe 22 is connected to the bottom of the cleaning tank 1, and a drainage valve 23 is provided in a flow path formed by the drainage pipe 22. The number of sprays 24 is not limited to two as in this example, and the number of fixed bases 4 is not limited to three. Moreover, although called the liquid supply pipe | tube 19 and the drainage pipe | tube 22, as mentioned above, the medium which flows through a pipe | tube may be gas.

In the present embodiment, by adjusting the inclination of the fixed base, it is possible to select the optimum spray angle for various objects to be cleaned. This angle is determined by, for example, the combination of the cleaning object and the cleaning medium and the order of the processes. By such optimization, highly effective cleaning can be performed on various objects to be cleaned.
(Eleventh embodiment)
FIG. 13 is a block diagram showing an eleventh embodiment of the present invention. The present embodiment is an example of a cleaning system having a mechanism for supplying and circulating the cleaning liquid 9 and the rinse liquid. This figure shows the connection relationship of each block, and the positional relationship such as the direction, top and bottom, left and right of each block is not limited to the arrangement in the drawing.

  In this example, two cleaning media, a cleaning liquid and a rinsing liquid, are used. A liquid supply pipe 19 for supplying a cleaning liquid is connected to the cleaning tank 1. The cleaning liquid 9 is stored in the cleaning liquid tank 25 and supplied through the pump 21a and the liquid supply valve 20 in accordance with the cleaning conditions. The cleaning liquid tank 25 is provided with temperature adjusting means 10a. The rinse liquid is stored in the rinse liquid tank 26 and supplied via the pump 21 b and the liquid supply valve 20. The liquid supply valve 20 is a three-way valve in order to connect two channels to one channel. The cleaning tank 1 is provided with temperature adjusting means 10 and bubble generating means 11. For this reason, it is possible to adjust the liquid temperature or generate bubbles as required. The cleaning liquid tank 25 and the rinsing liquid tank 26 are each provided with a filter 27, and the cleaning liquid and the rinsing liquid are filtered at appropriate times to keep the liquid clean. Here, the configuration of the two systems using the cleaning liquid and the rinse liquid has been described, but the present embodiment can be applied even when there are three or more systems.

  As described above, according to the present embodiment, it is possible to construct a cleaning system capable of controlling various conditions such as circulation of the cleaning medium, filtration, temperature control, use of bubbles, and the like.

DESCRIPTION OF SYMBOLS 1 Washing tank 2 Stage 3 Stage rotation means 4 Fixed base 5 First fixed base support means 6 Second fixed base support means 7 Inclination angle adjustment means 8 Fixed base rotation means 9 Cleaning liquid 10 Temperature adjustment means 11 Bubble generation means 12 Bubbles 13 Inclination angle fixing means 14 Universal joint 15 Fixing claw 16 Screw 17 Screw hole 18 Magnet 19 Supply pipe 20 Supply valve 21 Pump 22 Drain pipe 23 Drain valve 24 Spray 25 Cleaning liquid tank 26 Rinse liquid tank 27 Filter

Claims (10)

  A cleaning tank for performing a cleaning process inside, a rotatable stage, a stage rotating means for rotating the stage, a fixing base for fixing an object to be cleaned, and a first fixing base supporting means for supporting the fixing base The second fixing table supporting means for supporting the first fixing table supporting means on the stage, the angle between the first fixing table supporting means and the second fixing table supporting means coupled to each other. A cleaning apparatus comprising: an inclination angle adjusting means for adjusting the angle; and a fixed base rotation means for rotating the fixed base around the first fixed base support means.   The cleaning apparatus according to claim 1, wherein the inclination angle adjusting unit includes a ball joint.   The second fixed base support means has a drive shaft that transmits the driving force of the fixed base rotation means, and the first fixed base support means has a driven shaft that transmits the driving force of the drive shaft. The cleaning apparatus according to claim 1, wherein the cleaning apparatus is characterized in that:   The driven shaft has a first spherical gear, the drive shaft has a second spherical gear, and the first spherical gear and the second spherical gear mesh with each other. The cleaning apparatus according to claim 3.   The cleaning apparatus according to claim 3, wherein the driven shaft and the drive shaft are coupled by a universal joint.   A sun roller around the rotation center of the stage, a ring roller provided near the outer periphery of the stage, and a planetary roller coupled to the drive shaft form a planetary rotation arrangement. The cleaning apparatus according to any one of claims 3 to 5.   A sun gear centered on the rotation center of the stage, a ring gear provided near the outer periphery of the stage, and a planetary gear coupled to the drive shaft form a planetary rotation arrangement. The cleaning apparatus according to any one of claims 3 to 5.   The cleaning apparatus according to claim 1, further comprising a spray that discharges a cleaning medium onto the object to be cleaned fixed to the fixing table.   The cleaning according to any one of claims 1 to 8, further comprising cleaning medium layer forming means for forming a cleaning medium layer for immersing the fixed base in the cleaning tank. apparatus.   The stage is rotated in the cleaning tank for performing the cleaning process, the object to be cleaned is fixed to the fixed base, the fixed base is supported by the first fixed base support means, and the first fixed base support means is the second base. The fixed base support means supports the first fixed base support means and the second fixed base support means, and an angle formed by both is adjusted, and the fixed base is adjusted to the first fixed base support means. The cleaning method is characterized by rotating around the rotation axis.

Images