JP2015122504A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015122504A5 JP2015122504A5 JP2014259265A JP2014259265A JP2015122504A5 JP 2015122504 A5 JP2015122504 A5 JP 2015122504A5 JP 2014259265 A JP2014259265 A JP 2014259265A JP 2014259265 A JP2014259265 A JP 2014259265A JP 2015122504 A5 JP2015122504 A5 JP 2015122504A5
- Authority
- JP
- Japan
- Prior art keywords
- molecular weight
- peel resistance
- low
- barc
- photoresists
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361920344P | 2013-12-23 | 2013-12-23 | |
| US61/920,344 | 2013-12-23 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015122504A JP2015122504A (ja) | 2015-07-02 |
| JP2015122504A5 true JP2015122504A5 (cg-RX-API-DMAC7.html) | 2016-06-23 |
| JP6014110B2 JP6014110B2 (ja) | 2016-10-25 |
Family
ID=53533840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014259265A Active JP6014110B2 (ja) | 2013-12-23 | 2014-12-22 | ギャップ充填方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9558987B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6014110B2 (cg-RX-API-DMAC7.html) |
| KR (2) | KR20150075046A (cg-RX-API-DMAC7.html) |
| CN (1) | CN105304550B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI573844B (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10163632B2 (en) * | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Material composition and process for substrate modification |
| KR20210145986A (ko) * | 2020-05-26 | 2021-12-03 | 에스케이하이닉스 주식회사 | 평탄화층 형성 방법 및 이를 이용한 패턴 형성 방법 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW299475B (cg-RX-API-DMAC7.html) | 1993-03-30 | 1997-03-01 | Siemens Ag | |
| JP3807587B2 (ja) * | 1999-07-12 | 2006-08-09 | 協和化学工業株式会社 | 難燃性熱可塑性樹脂組成物及びその成形品 |
| US6461717B1 (en) * | 2000-04-24 | 2002-10-08 | Shipley Company, L.L.C. | Aperture fill |
| JP4654544B2 (ja) | 2000-07-12 | 2011-03-23 | 日産化学工業株式会社 | リソグラフィー用ギャップフィル材形成組成物 |
| JP4574145B2 (ja) | 2002-09-13 | 2010-11-04 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | エアギャップ形成 |
| JP4210858B2 (ja) * | 2002-12-26 | 2009-01-21 | 日産化学工業株式会社 | アルカリ溶解型リソグラフィー用ギャップフィル材形成組成物 |
| TWI310484B (en) * | 2003-02-21 | 2009-06-01 | Nissan Chemical Ind Ltd | Composition containing acrylic polymer for forming gap-filling material for lithography |
| KR101318182B1 (ko) * | 2005-01-21 | 2013-10-16 | 닛산 가가쿠 고교 가부시키 가이샤 | 보호된 카르복실기를 갖는 화합물을 포함하는 리소그라피용 하층막 형성방법 |
| EP1691238A3 (en) | 2005-02-05 | 2009-01-21 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1762895B1 (en) * | 2005-08-29 | 2016-02-24 | Rohm and Haas Electronic Materials, L.L.C. | Antireflective Hard Mask Compositions |
| CN101459106B (zh) * | 2007-12-13 | 2011-01-12 | 中芯国际集成电路制造(上海)有限公司 | 浅沟槽隔离结构的形成方法 |
| JP5040839B2 (ja) * | 2008-07-18 | 2012-10-03 | Ｊｓｒ株式会社 | レジスト下層膜形成組成物 |
| WO2012111459A1 (en) | 2011-02-17 | 2012-08-23 | Fujifilm Corporation | Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition |
-
2014
- 2014-12-22 JP JP2014259265A patent/JP6014110B2/ja active Active
- 2014-12-23 CN CN201410858450.4A patent/CN105304550B/zh active Active
- 2014-12-23 US US14/582,149 patent/US9558987B2/en active Active
- 2014-12-23 KR KR1020140187562A patent/KR20150075046A/ko not_active Ceased
- 2014-12-23 TW TW103144924A patent/TWI573844B/zh active
-
2016
- 2016-09-29 KR KR1020160125437A patent/KR20160119011A/ko not_active Ceased