JP2015090965A - Semiconductor device - Google Patents

Semiconductor device Download PDF

Info

Publication number
JP2015090965A
JP2015090965A JP2013231312A JP2013231312A JP2015090965A JP 2015090965 A JP2015090965 A JP 2015090965A JP 2013231312 A JP2013231312 A JP 2013231312A JP 2013231312 A JP2013231312 A JP 2013231312A JP 2015090965 A JP2015090965 A JP 2015090965A
Authority
JP
Japan
Prior art keywords
solder
wiring board
recess
semiconductor device
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013231312A
Other languages
Japanese (ja)
Inventor
幸紘 森下
Yukihiro Morishita
幸紘 森下
宏貴 園田
Hirotaka Sonoda
宏貴 園田
広志 岩永
Hiroshi Iwanaga
広志 岩永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2013231312A priority Critical patent/JP2015090965A/en
Publication of JP2015090965A publication Critical patent/JP2015090965A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H01L2224/48139Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate with an intermediate bond, e.g. continuous wire daisy chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Landscapes

  • Cooling Or The Like Of Electrical Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device which can improve a soldering strength without a significant increase in solder amount.SOLUTION: A semiconductor device comprises: a wiring board arranged on a heat sink; a semiconductor chip mounted on the wiring board; a hollow case bonded to the heat sink so as to surround the wiring board and the semiconductor chip; an electrode terminal having a fixing part fixed to the case and a flat surface part 8b bonded to the wiring board by a solder 9 in the case; a recess 11 provided on a top face of the flat surface part 8b; and a through hole 12 provided from a lower surface of the flat surface part 8b to reach a bottom face of the recess 11. The lower surface of the flat surface part 8 and the wiring board are bonded by the solder 9. The solder extends in the through hole 12 and on the bottom face of the recess 11.

Description

本発明は、大幅なはんだ量の増加なくはんだ付け強度を向上させることができる半導体装置に関する。   The present invention relates to a semiconductor device that can improve soldering strength without a significant increase in the amount of solder.

電力用の半導体装置(パワーモジュール)において、中空のケースが配線基板及び半導体チップを取り囲むように放熱板に接合され、ケースに固定された電極端子の平面部が配線基板にはんだにより接合されている。   In a power semiconductor device (power module), a hollow case is joined to a heat sink so as to surround the wiring board and the semiconductor chip, and a flat portion of the electrode terminal fixed to the case is joined to the wiring board by solder. .

しかし、半導体装置の動作中に温度が上昇し、配線基板と電極端子のはんだ接合面に線膨張係数の違いに起因して熱応力が発生する。これにより、電極端子が配線基板から剥離して故障が発生するという問題があった。これに対して、電極端子の平面部に貫通孔を設けることが提案されている(例えば、特許文献1参照)。貫通孔を通って平面部の上面に存在するはんだがリベットになるため、はんだバルクによるアンカー効果が得られ、はんだ付け強度を向上させることができる。   However, the temperature rises during the operation of the semiconductor device, and thermal stress is generated on the solder joint surface between the wiring board and the electrode terminal due to the difference in coefficient of linear expansion. As a result, there has been a problem that the electrode terminal is peeled off from the wiring board and a failure occurs. On the other hand, providing a through-hole in the flat part of an electrode terminal is proposed (for example, refer to patent documents 1). Since the solder existing on the upper surface of the flat portion through the through hole becomes a rivet, an anchor effect by the solder bulk can be obtained and the soldering strength can be improved.

特開昭62−202548号公報JP-A-62-2202548

しかし、単純な貫通孔のみではリベットを構成するために、はんだ量を大幅に増加する必要がある。   However, in order to form a rivet with only a simple through hole, it is necessary to greatly increase the amount of solder.

本発明は、上述のような課題を解決するためになされたもので、その目的は大幅なはんだ量の増加なくはんだ付け強度を向上させることができる半導体装置を得るものである。   The present invention has been made to solve the above-described problems, and an object thereof is to obtain a semiconductor device capable of improving the soldering strength without a significant increase in the amount of solder.

本発明に係る半導体装置は、放熱板と、前記放熱板上に配置された配線基板と、前記配線基板上に実装された半導体チップと、前記配線基板及び前記半導体チップを取り囲むように前記放熱板に接合された中空のケースと、前記ケースに固定される固定部と、前記ケース内において前記配線基板にはんだにより接合された平面部とを有する電極端子とを備え、前記平面部の上面に凹部が設けられ、前記平面部の下面から前記凹部の底面に達する貫通孔が設けられ、前記平面部の前記下面と前記配線基板が前記はんだにより接合され、前記はんだは前記貫通孔内と前記凹部の前記底面上にも延在することを特徴とする。   The semiconductor device according to the present invention includes a heat sink, a wiring board disposed on the heat sink, a semiconductor chip mounted on the wiring board, and the heat sink so as to surround the wiring board and the semiconductor chip. A hollow case joined to the case, a fixed part fixed to the case, and an electrode terminal having a planar part joined to the wiring board by solder in the case, and a recess formed on the upper surface of the planar part A through hole reaching the bottom surface of the concave portion from the lower surface of the flat portion is provided, the lower surface of the flat portion and the wiring board are joined by the solder, and the solder is formed in the through hole and the concave portion. It also extends on the bottom surface.

本発明では貫通孔内と凹部の底面上に存在するはんだがリベットになるため、はんだバルクによるアンカー効果が得られ、はんだ付け強度を向上させ、信頼性において優れた半導体装置を得ることができる。また、単純な貫通孔のみではリベットを構成するために、はんだ量を大幅に増加する必要がある。そこで、平面部の上面に凹部を設け、平面部の下面から凹部の底面に達する貫通孔を設ける。これにより、大幅なはんだ量の増加なくはんだ付け強度を向上させることができる。   In the present invention, since the solder present in the through hole and on the bottom surface of the recess becomes a rivet, an anchor effect by the solder bulk can be obtained, the soldering strength can be improved, and a semiconductor device excellent in reliability can be obtained. Moreover, in order to constitute a rivet with only a simple through hole, it is necessary to greatly increase the amount of solder. Therefore, a concave portion is provided on the upper surface of the flat portion, and a through hole reaching from the lower surface of the flat portion to the bottom surface of the concave portion is provided. Thereby, the soldering strength can be improved without significantly increasing the amount of solder.

本発明の実施の形態1に係る半導体装置を示す断面図である。It is sectional drawing which shows the semiconductor device which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る電極端子と配線基板との接合部を示す斜視図である。It is a perspective view which shows the junction part of the electrode terminal and wiring board which concern on Embodiment 1 of this invention. 図2のI−IIに沿った断面図である。It is sectional drawing along I-II of FIG. 本発明の実施の形態2に係る電極端子の平面部を示す断面図である。It is sectional drawing which shows the plane part of the electrode terminal which concerns on Embodiment 2 of this invention. 本発明の実施の形態3に係る電極端子と配線基板との接合部を示す斜視図である。It is a perspective view which shows the junction part of the electrode terminal and wiring board which concern on Embodiment 3 of this invention. 本発明の実施の形態4に係る電極端子の平面部を示す断面図である。It is sectional drawing which shows the plane part of the electrode terminal which concerns on Embodiment 4 of this invention. 本発明の実施の形態5に係る電極端子と配線基板との接合部を示す斜視図である。It is a perspective view which shows the junction part of the electrode terminal and wiring board which concern on Embodiment 5 of this invention. 図7のI−IIに沿った断面図である。It is sectional drawing along I-II of FIG. 図7のI−IIに沿った断面図である。It is sectional drawing along I-II of FIG. 本発明の実施の形態6に係る電極端子の平面部を示す断面図である。It is sectional drawing which shows the plane part of the electrode terminal which concerns on Embodiment 6 of this invention.

本発明の実施の形態に係る半導体装置について図面を参照して説明する。同じ又は対応する構成要素には同じ符号を付し、説明の繰り返しを省略する場合がある。   A semiconductor device according to an embodiment of the present invention will be described with reference to the drawings. The same or corresponding components are denoted by the same reference numerals, and repeated description may be omitted.

実施の形態1.
図1は、本発明の実施の形態1に係る半導体装置を示す断面図である。放熱板1上に配線基板2が配置されている。両者ははんだ3により接合されている。配線基板2は絶縁基板上に回路が形成されたものである。絶縁基板は、放熱性に優れるAlN(窒化アルミニウム)等である。
Embodiment 1 FIG.
FIG. 1 is a cross-sectional view showing a semiconductor device according to the first embodiment of the present invention. A wiring board 2 is disposed on the heat sink 1. Both are joined by solder 3. The wiring board 2 is a circuit board formed on an insulating substrate. The insulating substrate is AlN (aluminum nitride) or the like having excellent heat dissipation.

配線基板2上にIGBT(Insulated-Gate Bipolar Transistor)等の半導体チップ4がはんだ5により実装されている。半導体チップ4はワイヤ6により配線基板2に接続されている。中空のケース7が配線基板2及び半導体チップ4を取り囲むように放熱板1に接合されている。ケース7はエンプラ(PPS)等である。   A semiconductor chip 4 such as an IGBT (Insulated-Gate Bipolar Transistor) is mounted on the wiring board 2 by solder 5. The semiconductor chip 4 is connected to the wiring board 2 by wires 6. A hollow case 7 is joined to the heat sink 1 so as to surround the wiring substrate 2 and the semiconductor chip 4. Case 7 is engineering plastic (PPS) or the like.

電極端子8は、ケース7に固定される固定部8aと、ケース7内において配線基板2にはんだ9により接合された平面部8bとを有し、直線状の固定部8aに対して平面部8bが横に折れ曲がったL字型となっている。電極端子8は、はんだ付け性を向上させるためNiめっきを施したCu等である。ケース7の内部にはシリコーンゲル10が充填されている。   The electrode terminal 8 has a fixing portion 8a fixed to the case 7, and a flat portion 8b joined to the wiring board 2 by the solder 9 in the case 7, and the flat portion 8b with respect to the linear fixing portion 8a. Is L-shaped bent sideways. The electrode terminal 8 is made of Cu or the like plated with Ni in order to improve solderability. The inside of the case 7 is filled with a silicone gel 10.

図2は、本発明の実施の形態1に係る電極端子と配線基板との接合部を示す斜視図である。図3は、図2のI−IIに沿った断面図である。平面部8bの上面に凹部11が設けられている。平面部8bの下面から凹部11の底面に達する貫通孔12が設けられている。平面部8bの下面と配線基板2がはんだ9により接合されている。はんだ9は貫通孔12内と凹部11の底面上にも延在する。凹部11の側面及び底面の一部にはんだ9が接合されているが、側面及び底面の全面にはんだ9が接合されていてもよい。   FIG. 2 is a perspective view showing a joint portion between the electrode terminal and the wiring board according to Embodiment 1 of the present invention. FIG. 3 is a cross-sectional view taken along the line I-II in FIG. A concave portion 11 is provided on the upper surface of the flat portion 8b. A through hole 12 that reaches the bottom surface of the recess 11 from the lower surface of the flat surface portion 8b is provided. The lower surface of the flat portion 8 b and the wiring board 2 are joined by solder 9. The solder 9 also extends in the through hole 12 and on the bottom surface of the recess 11. The solder 9 is joined to a part of the side surface and the bottom surface of the recess 11, but the solder 9 may be joined to the entire surface of the side surface and the bottom surface.

続いて、本実施の形態の効果を説明する。半導体装置の動作中に発生した熱で、ケース7、放熱板1、配線基板2が変形する。この変形により、ケース7に固定された電極端子8と配線基板2との接合部に応力が発生する。電極端子8を覆うシリコーンゲル10はモールド樹脂のように電極を固定するほどの強度がない。このため、電極端子8と配線基板2との接合部に大きな負荷が加わる。しかし、貫通孔12と凹部11が無い従来構造では、はんだ付け強度は平面部8bの下面と配線基板2の接合界面での強度だけで決まってしまう。   Then, the effect of this Embodiment is demonstrated. The case 7, the heat sink 1, and the wiring substrate 2 are deformed by heat generated during the operation of the semiconductor device. Due to this deformation, a stress is generated at the joint between the electrode terminal 8 fixed to the case 7 and the wiring board 2. The silicone gel 10 covering the electrode terminal 8 does not have enough strength to fix the electrode like a mold resin. For this reason, a large load is applied to the joint between the electrode terminal 8 and the wiring board 2. However, in the conventional structure without the through hole 12 and the recess 11, the soldering strength is determined only by the strength at the bonding interface between the lower surface of the flat portion 8 b and the wiring board 2.

一方、本実施の形態では、貫通孔12内と凹部11の底面上に存在するはんだ9がリベットになるため、はんだバルクによるアンカー効果が得られる。例えば変形により図3に示す上下の引張応力が印加された際に、はんだ9のリベットが凹部11の底面に下向きの抗力を発生させる。従って、はんだ付け強度を向上させ、信頼性において優れた半導体装置を得ることができる。また、単純な貫通孔12のみではリベットを構成するために、はんだ量を大幅に増加する必要がある。そこで、平面部8bの上面に凹部11を設け、平面部8bの下面から凹部11の底面に達する貫通孔12を設ける。これにより、大幅なはんだ量の増加なくはんだ付け強度を向上させることができる。   On the other hand, in the present embodiment, since the solder 9 existing in the through hole 12 and on the bottom surface of the recess 11 becomes a rivet, an anchor effect by the solder bulk can be obtained. For example, when the upper and lower tensile stresses shown in FIG. 3 are applied due to deformation, the rivet of the solder 9 generates a downward drag on the bottom surface of the recess 11. Therefore, the soldering strength can be improved and a semiconductor device excellent in reliability can be obtained. Moreover, in order to form a rivet only with the simple through-hole 12, it is necessary to greatly increase the amount of solder. Therefore, the concave portion 11 is provided on the upper surface of the flat portion 8b, and the through hole 12 reaching the bottom surface of the concave portion 11 from the lower surface of the flat portion 8b is provided. Thereby, the soldering strength can be improved without significantly increasing the amount of solder.

実施の形態2.
図4は、本発明の実施の形態2に係る電極端子の平面部を示す断面図である。凹部11の断面形状は円弧型である。凹部11の円弧の部分の一部にはんだ9が接合されているが、円弧の部分の全面にはんだ9が接合されていてもよい。
Embodiment 2. FIG.
FIG. 4 is a cross-sectional view showing a planar portion of the electrode terminal according to Embodiment 2 of the present invention. The cross-sectional shape of the recess 11 is an arc shape. Although the solder 9 is joined to a part of the arc portion of the recess 11, the solder 9 may be joined to the entire surface of the arc portion.

パワーモジュールの動作により斜め上下方向に引張応力が印加された際に、凹部11の円弧の部分でその応力に対抗する抗力を発生させることができる。よって、上下方向だけでなく、斜め方向への応力に対してはんだバルクの強度を付加することができる。   When a tensile stress is applied obliquely in the vertical direction by the operation of the power module, it is possible to generate a drag force against the stress at the arc portion of the recess 11. Therefore, the strength of the solder bulk can be added to the stress in the oblique direction as well as the vertical direction.

実施の形態3.
図5は、本発明の実施の形態3に係る電極端子と配線基板との接合部を示す斜視図である。はんだ付けされる平面部8bに発生する応力は特に先端角部で大きくなり、この部分を起点にしてはんだにクラックができ、内部に進行していき、最終的には剥離に至る。そこで、本実施の形態では凹部11を平面部8bの先端角部に設けている。これにより、クラックの起点となる部分の耐剥離強度が大きくなるため、クラックの発生を抑え、はんだ付け強度を向上させることができる。
Embodiment 3 FIG.
FIG. 5 is a perspective view showing a joint portion between the electrode terminal and the wiring board according to Embodiment 3 of the present invention. The stress generated in the flat part 8b to be soldered is particularly large at the corner of the tip, and the solder is cracked starting from this part, progresses to the inside, and finally peels off. Therefore, in the present embodiment, the concave portion 11 is provided at the tip corner of the flat portion 8b. Thereby, since the peeling-proof strength of the part used as the starting point of a crack becomes large, generation | occurrence | production of a crack can be suppressed and soldering intensity | strength can be improved.

実施の形態4.
図6は、本発明の実施の形態4に係る電極端子の平面部を示す断面図である。貫通孔12の下端部に直線状又は曲面状の面取り13が施されている。これにより、はんだ9の濡れ上がり性が向上するために、はんだ9が貫通孔12を通って凹部11の底面上に達しやすくなり、はんだ9によるリベット形状が安定して形成される。
Embodiment 4 FIG.
FIG. 6 is a cross-sectional view showing a planar portion of an electrode terminal according to Embodiment 4 of the present invention. A linear or curved chamfer 13 is provided at the lower end of the through hole 12. Thereby, since the wet-up property of the solder 9 is improved, the solder 9 easily reaches the bottom surface of the concave portion 11 through the through hole 12, and the rivet shape by the solder 9 is stably formed.

実施の形態5.
図7は、本発明の実施の形態5に係る電極端子と配線基板との接合部を示す斜視図である。図8及び図9は、図7のI−IIに沿った断面図である。平面部8bの上面三辺にそれぞれ凹部14が少なくとも1つ設けられている。平面部8bの下面と配線基板2がはんだ9により接合されている。はんだ9は平面部8bの下面から側面を這い上がって凹部14の底面上にも延在する。この凹部14の側面と底面の一部にはんだ9が接合されているが、側面と底面の全面にはんだ9が接合されていてもよい。
Embodiment 5 FIG.
FIG. 7 is a perspective view showing a joint portion between an electrode terminal and a wiring board according to Embodiment 5 of the present invention. 8 and 9 are cross-sectional views taken along the line II of FIG. At least one recess 14 is provided on each of the three upper sides of the flat portion 8b. The lower surface of the flat portion 8 b and the wiring board 2 are joined by solder 9. The solder 9 scoops up the side surface from the lower surface of the flat portion 8 b and extends also on the bottom surface of the recess 14. Although the solder 9 is joined to a part of the side surface and the bottom surface of the recess 14, the solder 9 may be joined to the entire surface of the side surface and the bottom surface.

剥離が発生しやすい平面部8bの周辺部において、はんだバルクによるアンカー効果が得られ、はんだ付け強度を向上させることができる。そして、図8に示すように、平面部8bを上に向かって引き剥がそうとする応力に対し、凹部14の底面上のはんだ9が平面部8bを上方から押さえることができる。また、平面部8bの上面三辺にそれぞれ凹部14を設けることにより、図9に示すように左右方向の応力に対しても抗力を持たせることができる。   An anchor effect due to the solder bulk can be obtained at the peripheral portion of the flat portion 8b where peeling easily occurs, and the soldering strength can be improved. Then, as shown in FIG. 8, the solder 9 on the bottom surface of the recess 14 can press the flat portion 8b from above against the stress to peel off the flat portion 8b upward. Further, by providing the concave portions 14 on the three sides of the upper surface of the flat portion 8b, it is possible to have a resistance against the stress in the left-right direction as shown in FIG.

実施の形態6.
図10は、本発明の実施の形態6に係る電極端子の平面部を示す断面図である。本実施の形態において電極端子8と配線基板2との接合部は図7と同様であり、図10は図7のI−IIに沿った断面図に対応する。平面部8bの下面から凹部14の底面に達する円柱状の貫通孔15が設けられている。はんだ9は貫通孔15内にも延在する。これにより、はんだ9の濡れ上がり性が向上するために、はんだ9が貫通孔15を通って凹部14の底面上に達しやすくなり、はんだ9によるリベット形状が安定して形成される。
Embodiment 6 FIG.
FIG. 10 is a cross-sectional view showing a planar portion of an electrode terminal according to Embodiment 6 of the present invention. In the present embodiment, the joint between the electrode terminal 8 and the wiring board 2 is the same as in FIG. 7, and FIG. 10 corresponds to a cross-sectional view taken along the line II in FIG. A cylindrical through-hole 15 is provided that reaches the bottom surface of the recess 14 from the lower surface of the flat portion 8b. The solder 9 also extends into the through hole 15. Thereby, since the wet-up property of the solder 9 is improved, the solder 9 easily reaches the bottom surface of the recess 14 through the through hole 15, and the rivet shape by the solder 9 is stably formed.

なお、半導体チップ4は、珪素によって形成されたものに限らず、珪素に比べてバンドギャップが大きいワイドバンドギャップ半導体によって形成されたものでもよい。ワイドバンドギャップ半導体は、例えば、炭化珪素、窒化ガリウム系材料、又はダイヤモンドである。このようなワイドバンドギャップ半導体によって形成された半導体チップ4は、耐電圧性や許容電流密度が高いため、小型化できる。この小型化された半導体チップ4を用いることで、この素子を組み込んだ半導体装置も小型化できる。また、半導体チップ4の耐熱性が高いため、ヒートシンクの放熱フィンを小型化でき、水冷部を空冷化できるので、半導体装置を更に小型化できる。また、半導体チップ4の電力損失が低く高効率であるため、半導体装置を高効率化できる。   The semiconductor chip 4 is not limited to being formed of silicon, but may be formed of a wide band gap semiconductor having a larger band gap than silicon. The wide band gap semiconductor is, for example, silicon carbide, a gallium nitride-based material, or diamond. Since the semiconductor chip 4 formed of such a wide band gap semiconductor has high voltage resistance and allowable current density, it can be miniaturized. By using the miniaturized semiconductor chip 4, a semiconductor device incorporating this element can be miniaturized. Moreover, since the heat resistance of the semiconductor chip 4 is high, the heat dissipating fins of the heat sink can be reduced in size, and the water cooling part can be cooled in the air, so that the semiconductor device can be further reduced in size. In addition, since the semiconductor chip 4 has low power loss and high efficiency, the semiconductor device can be highly efficient.

1 放熱板、2 配線基板、4 半導体チップ、7 ケース、8 電極端子、8a 固定部、8b 平面部、9 はんだ、11,14 凹部、12,15 貫通孔、13 面取り DESCRIPTION OF SYMBOLS 1 Heat sink, 2 Wiring board, 4 Semiconductor chip, 7 Case, 8 Electrode terminal, 8a Fixed part, 8b Plane part, 9 Solder, 11, 14 Recessed part, 12, 15 Through hole, 13 Chamfer

Claims (6)

放熱板と、
前記放熱板上に配置された配線基板と、
前記配線基板上に実装された半導体チップと、
前記配線基板及び前記半導体チップを取り囲むように前記放熱板に接合された中空のケースと、
前記ケースに固定される固定部と、前記ケース内において前記配線基板にはんだにより接合された平面部とを有する電極端子とを備え、
前記平面部の上面に凹部が設けられ、
前記平面部の下面から前記凹部の底面に達する貫通孔が設けられ、
前記平面部の前記下面と前記配線基板が前記はんだにより接合され、
前記はんだは前記貫通孔内と前記凹部の前記底面上にも延在することを特徴とする半導体装置。
A heat sink,
A wiring board disposed on the heat sink;
A semiconductor chip mounted on the wiring board;
A hollow case joined to the heat sink so as to surround the wiring board and the semiconductor chip;
An electrode terminal having a fixed portion fixed to the case and a plane portion joined to the wiring board by solder in the case;
A concave portion is provided on the upper surface of the planar portion,
A through hole reaching the bottom surface of the recess from the lower surface of the planar portion is provided,
The lower surface of the planar portion and the wiring board are joined by the solder,
The solder extends in the through hole and also on the bottom surface of the recess.
前記凹部の断面形状は円弧型であることを特徴とする請求項1に記載の半導体装置。   The semiconductor device according to claim 1, wherein a cross-sectional shape of the recess is an arc shape. 前記凹部は前記平面部の先端角部に設けられていることを特徴とする請求項1又は2に記載の半導体装置。   The semiconductor device according to claim 1, wherein the concave portion is provided at a corner portion of the flat portion. 前記貫通孔の下端部に面取りが施されていることを特徴とする請求項1〜3の何れか1項に記載の半導体装置。   The semiconductor device according to claim 1, wherein a chamfer is applied to a lower end portion of the through hole. 放熱板と、
前記放熱板上に配置された配線基板と、
前記配線基板上に実装された半導体チップと、
前記配線基板及び前記半導体チップを取り囲むように前記放熱板に接合された中空のケースと、
前記ケースに固定される固定部と、前記ケース内において前記配線基板にはんだにより接合された平面部とを有する電極端子とを備え、
前記平面部の上面三辺にそれぞれ凹部が設けられ、
前記平面部の前記下面と前記配線基板が前記はんだにより接合され、
前記はんだは前記凹部の底面上にも延在することを特徴とする半導体装置。
A heat sink,
A wiring board disposed on the heat sink;
A semiconductor chip mounted on the wiring board;
A hollow case joined to the heat sink so as to surround the wiring board and the semiconductor chip;
An electrode terminal having a fixed portion fixed to the case and a plane portion joined to the wiring board by solder in the case;
Recesses are provided on each of the three upper surfaces of the flat part,
The lower surface of the planar portion and the wiring board are joined by the solder,
The semiconductor device, wherein the solder also extends on a bottom surface of the recess.
前記平面部の下面から前記凹部の底面に達する貫通孔が設けられ、
前記はんだは前記貫通孔内にも延在することを特徴とする請求項5に記載の半導体装置。
A through hole reaching the bottom surface of the recess from the lower surface of the planar portion is provided,
The semiconductor device according to claim 5, wherein the solder also extends into the through hole.
JP2013231312A 2013-11-07 2013-11-07 Semiconductor device Pending JP2015090965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013231312A JP2015090965A (en) 2013-11-07 2013-11-07 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013231312A JP2015090965A (en) 2013-11-07 2013-11-07 Semiconductor device

Publications (1)

Publication Number Publication Date
JP2015090965A true JP2015090965A (en) 2015-05-11

Family

ID=53194341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013231312A Pending JP2015090965A (en) 2013-11-07 2013-11-07 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2015090965A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019082344A1 (en) * 2017-10-26 2019-05-02 新電元工業株式会社 Method for manufacturing semiconductor device
WO2019082343A1 (en) * 2017-10-26 2019-05-02 新電元工業株式会社 Semiconductor device
JPWO2019082345A1 (en) * 2017-10-26 2020-04-16 新電元工業株式会社 Semiconductor device and method of manufacturing semiconductor device
JP2020202311A (en) * 2019-06-11 2020-12-17 株式会社デンソー Semiconductor device
CN112289764A (en) * 2020-09-21 2021-01-29 西安中车永电电气有限公司 IGBT electrode welding pin structure, IGBT module and welding method
JP2021125635A (en) * 2020-02-07 2021-08-30 日立Astemo株式会社 Semiconductor device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62202548A (en) * 1986-02-28 1987-09-07 Mitsubishi Electric Corp Semiconductor device
JPH05136541A (en) * 1991-11-11 1993-06-01 Nippon Avionics Co Ltd Printed wiring board
JPH05291467A (en) * 1992-04-08 1993-11-05 Hitachi Ltd Lead frame and semiconductor device
JPH07154048A (en) * 1993-12-01 1995-06-16 Toyota Autom Loom Works Ltd Outer lead of electronic device
JPH10223822A (en) * 1997-02-03 1998-08-21 Matsushita Electric Works Ltd Semiconductor device
JP2002076615A (en) * 2000-08-31 2002-03-15 Asahi Chem Res Lab Ltd Printed circuit board and method for soldering to its through hole
JP2003273308A (en) * 2002-03-19 2003-09-26 Rohm Co Ltd Electronic part

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62202548A (en) * 1986-02-28 1987-09-07 Mitsubishi Electric Corp Semiconductor device
JPH05136541A (en) * 1991-11-11 1993-06-01 Nippon Avionics Co Ltd Printed wiring board
JPH05291467A (en) * 1992-04-08 1993-11-05 Hitachi Ltd Lead frame and semiconductor device
JPH07154048A (en) * 1993-12-01 1995-06-16 Toyota Autom Loom Works Ltd Outer lead of electronic device
JPH10223822A (en) * 1997-02-03 1998-08-21 Matsushita Electric Works Ltd Semiconductor device
JP2002076615A (en) * 2000-08-31 2002-03-15 Asahi Chem Res Lab Ltd Printed circuit board and method for soldering to its through hole
JP2003273308A (en) * 2002-03-19 2003-09-26 Rohm Co Ltd Electronic part

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11309232B2 (en) 2017-10-26 2022-04-19 Shindengen Electric Manufacturing Co., Ltd. Semiconductor device
WO2019082343A1 (en) * 2017-10-26 2019-05-02 新電元工業株式会社 Semiconductor device
JPWO2019082343A1 (en) * 2017-10-26 2020-04-16 新電元工業株式会社 Semiconductor device
JPWO2019082345A1 (en) * 2017-10-26 2020-04-16 新電元工業株式会社 Semiconductor device and method of manufacturing semiconductor device
JPWO2019082344A1 (en) * 2017-10-26 2020-04-16 新電元工業株式会社 Method for manufacturing semiconductor device
US11075091B2 (en) 2017-10-26 2021-07-27 Shindengen Electric Manufacturing Co., Ltd. Method for manufacturing semiconductor device
US11075154B2 (en) 2017-10-26 2021-07-27 Shindengen Electric Manufacturing Co., Ltd. Semiconductor device and method of manufacturing semiconductor device
WO2019082344A1 (en) * 2017-10-26 2019-05-02 新電元工業株式会社 Method for manufacturing semiconductor device
JP2020202311A (en) * 2019-06-11 2020-12-17 株式会社デンソー Semiconductor device
JP7183964B2 (en) 2019-06-11 2022-12-06 株式会社デンソー semiconductor equipment
JP2021125635A (en) * 2020-02-07 2021-08-30 日立Astemo株式会社 Semiconductor device
JP7341078B2 (en) 2020-02-07 2023-09-08 日立Astemo株式会社 semiconductor equipment
CN112289764A (en) * 2020-09-21 2021-01-29 西安中车永电电气有限公司 IGBT electrode welding pin structure, IGBT module and welding method

Similar Documents

Publication Publication Date Title
US9881846B2 (en) Semiconductor device
JP6337957B2 (en) Semiconductor module unit and semiconductor module
US10170433B2 (en) Insulated circuit board, power module and power unit
WO2015064232A1 (en) Semiconductor module
JP2015090965A (en) Semiconductor device
WO2013118478A1 (en) Semiconductor device
JP6407451B2 (en) Semiconductor module
JP2007311441A (en) Power semiconductor module
JP2013219267A (en) Power module
JP2014183058A (en) Power semiconductor module
JP2016018866A (en) Power module
US20150130042A1 (en) Semiconductor module with radiation fins
JP6366723B2 (en) Semiconductor device and manufacturing method thereof
JP6337954B2 (en) Insulating substrate and semiconductor device
JP2019125708A (en) Semiconductor device
JP5916651B2 (en) Method for manufacturing power semiconductor device
JP6129090B2 (en) Power module and method for manufacturing power module
JP2014013878A (en) Electronic apparatus
JP4614107B2 (en) Semiconductor device
WO2014045758A1 (en) Power semiconductor module
JP4797492B2 (en) Semiconductor device
JPWO2017103978A1 (en) Semiconductor device and manufacturing method thereof
JP2017069351A (en) Semiconductor device
JP2021093441A (en) Semiconductor module
KR101897304B1 (en) Power module

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151228

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160818

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160830

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20170516