JP2015081365A - 成膜装置、成膜方法、成膜材料の除去方法 - Google Patents

成膜装置、成膜方法、成膜材料の除去方法 Download PDF

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Publication number
JP2015081365A
JP2015081365A JP2013219115A JP2013219115A JP2015081365A JP 2015081365 A JP2015081365 A JP 2015081365A JP 2013219115 A JP2013219115 A JP 2013219115A JP 2013219115 A JP2013219115 A JP 2013219115A JP 2015081365 A JP2015081365 A JP 2015081365A
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film
light
film formation
film forming
forming material
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JP2015081365A5 (https=
Inventor
山崎　舜平
Shunpei Yamazaki
舜平 山崎
瀬尾　哲史
Tetsushi Seo
哲史 瀬尾
晴恵 尾坂
Harue Ozaka
晴恵 尾坂
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2013219115A priority Critical patent/JP2015081365A/ja
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Publication of JP2015081365A5 publication Critical patent/JP2015081365A5/ja
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JP2013219115A 2013-10-22 2013-10-22 成膜装置、成膜方法、成膜材料の除去方法 Withdrawn JP2015081365A (ja)

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JP2015081365A true JP2015081365A (ja) 2015-04-27
JP2015081365A5 JP2015081365A5 (https=) 2016-08-12

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116970914A (zh) * 2022-04-22 2023-10-31 光驰科技(上海)有限公司 一种基板装载治具及镀膜装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61258333A (ja) * 1985-05-13 1986-11-15 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法
JPS62235464A (ja) * 1985-12-13 1987-10-15 Nippon Telegr & Teleph Corp <Ntt> 有機物高配向膜の作製装置
JPS6455374A (en) * 1987-08-26 1989-03-02 Nec Corp Production of thin el layer
JPH06279991A (ja) * 1993-03-24 1994-10-04 Mitsubishi Electric Corp 有機薄膜の製造方法
JPH076933A (ja) * 1992-05-26 1995-01-10 Marcon Electron Co Ltd 固体電解コンデンサの製造方法
JP2003313654A (ja) * 2001-12-12 2003-11-06 Semiconductor Energy Lab Co Ltd 成膜装置および成膜方法およびクリーニング方法
JP2013189707A (ja) * 2012-02-17 2013-09-26 Semiconductor Energy Lab Co Ltd 成膜装置並びに成膜方法およびシャドーマスクのクリーニング方法
JP2014065961A (ja) * 2012-09-27 2014-04-17 Micro Engineering Inc 機能性膜及びその成膜装置、成膜方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61258333A (ja) * 1985-05-13 1986-11-15 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法
JPS62235464A (ja) * 1985-12-13 1987-10-15 Nippon Telegr & Teleph Corp <Ntt> 有機物高配向膜の作製装置
JPS6455374A (en) * 1987-08-26 1989-03-02 Nec Corp Production of thin el layer
JPH076933A (ja) * 1992-05-26 1995-01-10 Marcon Electron Co Ltd 固体電解コンデンサの製造方法
JPH06279991A (ja) * 1993-03-24 1994-10-04 Mitsubishi Electric Corp 有機薄膜の製造方法
JP2003313654A (ja) * 2001-12-12 2003-11-06 Semiconductor Energy Lab Co Ltd 成膜装置および成膜方法およびクリーニング方法
JP2013189707A (ja) * 2012-02-17 2013-09-26 Semiconductor Energy Lab Co Ltd 成膜装置並びに成膜方法およびシャドーマスクのクリーニング方法
JP2014065961A (ja) * 2012-09-27 2014-04-17 Micro Engineering Inc 機能性膜及びその成膜装置、成膜方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116970914A (zh) * 2022-04-22 2023-10-31 光驰科技(上海)有限公司 一种基板装载治具及镀膜装置

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