JP2015069683A5 - - Google Patents

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Publication number
JP2015069683A5
JP2015069683A5 JP2013204451A JP2013204451A JP2015069683A5 JP 2015069683 A5 JP2015069683 A5 JP 2015069683A5 JP 2013204451 A JP2013204451 A JP 2013204451A JP 2013204451 A JP2013204451 A JP 2013204451A JP 2015069683 A5 JP2015069683 A5 JP 2015069683A5
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Prior art keywords
polishing pad
magnetic disk
abrasive grains
dresser
polishing
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JP2013204451A
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Japanese (ja)
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JP6227357B2 (en
JP2015069683A (en
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Priority claimed from JP2013204451A external-priority patent/JP6227357B2/en
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Publication of JP2015069683A5 publication Critical patent/JP2015069683A5/ja
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Claims (9)

表面に複数の開口を有する研磨パッドと基板との間に、研磨砥粒を含む研磨スラリーを供給し、前記研磨パッドと前記基板とを相対的に移動させることにより、前記基板の表面を加工する研磨加工と、使用開始前及び研磨加工後の少なくとも一方の研磨パッドの表面を修正するドレッシング処理を含み、
前記ドレッシング処理は、研磨パッドの表面における開口の平均開口径よりも小さな平均粒子径の砥粒を基材の表面に備えた研磨パッド用ドレッサを用いて行うことを特徴とする磁気ディスク用基板の製造方法。 Between the polishing pad and the board having a plurality of openings on the surface, a polishing slurry containing abrasive grains is supplied, by relatively moving the said polishing pad and the front Kimoto plate, before Kimoto plate A polishing process for processing the surface of the substrate, and a dressing process for correcting the surface of at least one polishing pad before the start of use and after the polishing process,
The dressing process is abrasive grains board for a magnetic disk which is characterized in that using a polishing pad dresser having a surface of a substrate of a small average particle diameter than the average opening diameter of the opening in the surface of the polishing pad Manufacturing method. 前記研磨パッドは、多数の独立した気泡を内在した内層と該気泡が開口した表層とからなるナップ層を有することを特徴とする請求項１に記載の磁気ディスク用基板の製造方法。 The polishing pad includes a plurality of independent production method of the base plate for a magnetic disk according to claim 1 in which the inner layer and the bubbles were inherent bubbles and having a nap layer made of a surface layer having openings. 前記ドレッシング処理は、基材の表面に砥粒を備えた研磨パッド用ドレッサを、前記研磨パッドの表面と接触させて、前記研磨パッド用ドレッサと前記研磨パッドとを相対的に移動させることで前記研磨パッドの表面の修正を行うことを特徴とする請求項１または２に記載の磁気ディスク用基板の製造方法。 The dressing treatment is performed by bringing a polishing pad dresser having abrasive grains on a surface of a base material into contact with the surface of the polishing pad and relatively moving the polishing pad dresser and the polishing pad. the method of manufacturing a magnetic disk for board according to claim 1 or 2, characterized in that to correct the surface of the polishing pad. 前記研磨パッドの表面における開口の平均開口径Ｐと前記研磨パッド用ドレッサが備える砥粒の平均粒子径Ｄの比（Ｄ／Ｐ）は、０．６以上１未満であることを特徴とする請求項１乃至３のいずれかに記載の磁気ディスク用基板の製造方法。 The ratio (D / P) of the average opening diameter P of the openings on the surface of the polishing pad to the average particle diameter D of the abrasive grains provided in the polishing pad dresser is 0.6 or more and less than 1. method for producing a board for a magnetic disk according to any one of claim 1 to 3. 前記ドレッシング処理の後に、ドレッシング処理により研磨パッド用ドレッサから脱落し、研磨パッドに付着した砥粒を、低減する処理を行うことを特徴とする請求項１乃至４のいずれかに記載の磁気ディスク用基板の製造方法。 5. The magnetic disk according to claim 1, wherein after the dressing process, a process of reducing abrasive grains that fall off the dresser for the polishing pad by the dressing process and adhere to the polishing pad is performed . 6. manufacturing method of the base plate. 前記ドレッシング処理の後に、少なくとも加圧された流体を研磨パッド表面に噴射することを特徴とする請求項１乃至５のいずれかに記載の磁気ディスク用基板の製造方法。6. The method for manufacturing a magnetic disk substrate according to claim 1, wherein at least a pressurized fluid is sprayed onto the surface of the polishing pad after the dressing process. 請求項１乃至６のいずれかに記載の製造方法によって得られた磁気ディスク用基板上に、少なくとも磁性層を形成することを特徴とする磁気ディスクの製造方法。 In claim 1 to the magnetic disk base plate obtained by the production method according to any one of 6, a manufacturing method of a magnetic disk, which comprises forming at least a magnetic layer. 研磨パッドの表面における開口の平均開口径よりも小さな平均粒子径の砥粒を基材の表面に備えた研磨パッド用ドレッサ。A polishing pad dresser comprising abrasive grains having an average particle diameter smaller than the average opening diameter of the openings on the surface of the polishing pad on the surface of the substrate. 前記研磨パッドの表面における開口の平均開口径Ｐと前記研磨パッド用ドレッサが備える砥粒の平均粒子径Ｄの比（Ｄ／Ｐ）は、０．６以上１未満であることを特徴とする請求項８に記載の研磨パッド用ドレッサ。The ratio (D / P) of the average opening diameter P of the openings on the surface of the polishing pad to the average particle diameter D of the abrasive grains provided in the polishing pad dresser is 0.6 or more and less than 1. Item 9. A polishing pad dresser according to Item 8.
JP2013204451A 2013-09-30 2013-09-30 Magnetic disk substrate manufacturing method and magnetic disk manufacturing method Active JP6227357B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013204451A JP6227357B2 (en) 2013-09-30 2013-09-30 Magnetic disk substrate manufacturing method and magnetic disk manufacturing method

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Application Number Priority Date Filing Date Title
JP2013204451A JP6227357B2 (en) 2013-09-30 2013-09-30 Magnetic disk substrate manufacturing method and magnetic disk manufacturing method

Publications (3)

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JP2015069683A JP2015069683A (en) 2015-04-13
JP2015069683A5 true JP2015069683A5 (en) 2016-10-13
JP6227357B2 JP6227357B2 (en) 2017-11-08

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WO2023190428A1 (en) * 2022-03-29 2023-10-05 富士紡ホールディングス株式会社 Polishing pad, method for producing polishing pad, and method for polishing surface of optical material or semiconductor material

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* Cited by examiner, † Cited by third party
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JP2010107891A (en) * 2008-10-31 2010-05-13 Konica Minolta Opto Inc Wafer lens assemblage and method of manufacturing the same, lens unit, and imaging device
JP5233621B2 (en) * 2008-12-02 2013-07-10 旭硝子株式会社 Glass substrate for magnetic disk and method for producing the same.
JP5428793B2 (en) * 2009-11-17 2014-02-26 旭硝子株式会社 Glass substrate polishing method and method for producing glass substrate for magnetic recording medium
CN103501963A (en) * 2011-05-20 2014-01-08 株式会社小原 Method for producing polished product

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