JP2015065472A - Ring-shaped shield member, component thereof, and substrate placement stage equipped with ring-shaped shield member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a ring-shaped shield member capable of preventing occurrence of a gap between a component of the ring-shaped shield member and a substrate placement stage, and also preventing breakage of the component.SOLUTION: A shield ring 15 comprises four ring components 41-44. An omnidirectional movement regulating part 45 is provided to a fixed end in a length direction of the ring components 41-44. A unidirectional movement tolerable part 46 is provided away from the omnidirectional movement regulating part 45. For example, the ring components 41-44 are combined such that an end surface of a fixed end 41a of one ring component 41 abuts with a side surface of a free end 43b of an adjoining other ring component 43, and one side surface of a free end 41b of one ring component 41 abuts with an end surface of a fixed end 44a of an adjoining other ring component 44.

Description

  The present invention relates to a ring-shaped shield member applied to a substrate mounting table for mounting a substrate in a processing chamber, a component thereof, and a substrate mounting table including the ring-shaped shield member.

  2. Description of the Related Art A substrate processing apparatus that performs plasma processing on various substrates such as a glass substrate in a manufacturing process of an FPD (Flat Panel Display) including a liquid crystal display (LCD) is known.

  Such a substrate processing apparatus includes a substrate mounting table on which a substrate is mounted in a processing chamber (hereinafter referred to as a “chamber”), and an upper electrode disposed to face the substrate mounting table with a processing space therebetween. The substrate mounting table is supplied with high-frequency power (RF) for plasma generation, the substrate mounting table functions as a lower electrode, and plasma is generated from the processing gas introduced into the processing space in the chamber, A predetermined plasma process is performed on the substrate placed on the substrate placing table using the generated plasma.

Usually, the substrate mounting surface of the substrate mounting table has a rectangular shape, and a shield ring as a ring-shaped shield member is disposed on the outer periphery of the substrate mounting table in order to improve plasma focusing and ensure electrical insulation. Yes. The shield ring is made of insulating ceramics such as alumina (Al ₂ O ₃ ), and is fixed to the base material of the substrate mounting table by bolts. The shield ring is a rectangular annular body surrounding a rectangular substrate mounting surface, and the processing substrate has become larger due to recent industry demands, etc., and thus it is difficult to integrally form, and usually multiple It is formed by the combination of the structural members.

  FIG. 13 is a plan view showing a configuration of a conventional shield ring.

  In FIG. 13, a shield ring 105 is disposed so as to surround a rectangular substrate mounting surface 106 in the lower electrode (substrate mounting table) 100. The shield ring 105 is a combination of four ring components 101 to 104 that are substantially L-shaped in plan view. Each of the ring components 101 to 104 has bolt holes 107 at two locations near the L-shaped corner and at the vicinity of the tip of the elongated portion connected to the corner. 101-104 are being fixed to the flange part which comprises the circumference | surroundings of the board | substrate mounting surface 106 of the lower electrode 100 with the fixing volt | bolt with which the bolt hole 107 was mounted | worn.

  By the way, the shield ring 105 is heated by heat transfer from the lower electrode 100 heated according to the processing purpose, continuous irradiation of plasma, and the like, and is thermally expanded. At this time, one ring component pushes the other ring component in the direction indicated by the white arrow in the drawing on the abutting surfaces of adjacent ring components. At this time, the other ring component is displaced in the direction indicated by the white arrow in the figure by the clearance between the bolt hole 107 and the fixing bolt (not shown), so that there is a gap between the shield ring 105 and the lower electrode 100. May occur.

  When a gap is generated between the shield ring 105 and the lower electrode 100, plasma enters the gap. For example, the ceramic spraying of the lower electrode 100 is scraped to expose the base material, and abnormal discharge (arcing) occurs in the lower electrode 100. ) Or corrosion (erosion).

  In order to prevent the occurrence of the gap between the shield ring 105 and the lower electrode 100 described above, a ring component provided with a biasing member for biasing adjacent ring components, or each ring component 101 A shield ring provided with a biasing member that biases .about.104 toward the center of the lower electrode 100 has been proposed (see, for example, Patent Document 1).

JP 2008-311298 A

  However, it is not always easy to incorporate a biasing member for applying an acting force acting in a specific direction to each ring component 101 to 104 constituting the shield ring 105. On the other hand, when the fastening force of the fixing bolt for fixing each ring component 101 to 104 to the base material of the lower electrode 100 is increased in order to prevent deformation and movement due to thermal expansion, the lower electrode 100 is fastened to the base material. Or there exists a problem that each ring component 101-104 becomes easy to break at the time of thermal expansion.

  An object of the present invention is to provide a ring-shaped shield member capable of preventing the occurrence of a gap between a component of the ring-shaped shield member and the substrate mounting table and preventing damage to the component, the component and the ring-shaped shield member. An object of the present invention is to provide a substrate mounting table provided with a shield member.

  In order to achieve the above object, a component of the ring-shaped shield member according to claim 1 is a rectangular mounting plate for mounting the substrate in a processing chamber of a substrate processing apparatus that performs plasma processing on the rectangular substrate. A ring-shaped shield member component provided so as to surround the periphery of the mounting surface, comprising an insulating long body arranged along one side of the rectangular mounting surface, A first movement restricting portion that is provided at one end in the longitudinal direction and restricts movement of the component in all directions; and is provided separately from the first movement restricting portion in the longitudinal direction and A second movement restricting portion for restricting movement in a direction other than the longitudinal direction, wherein the first movement restricting portion is provided with a first guide that is immovable with respect to the substrate mounting table, and the first guide A first guide hole that is a recess in which the guide is loosely fitted. The clearance between each side surface of the first guide and each side surface of the first guide hole is set to be small so as to restrict the movement of the component parts in all directions, and the second movement restricting portion is A second guide that is immovable with respect to the substrate mounting table; and a second guide hole that is a recess in which the second guide is loosely fitted. The length in the longitudinal direction is set to be larger than the length in the longitudinal direction of the second guide.

  The component part of the ring-shaped shield member according to claim 2 is the component part of the ring-shaped shield member according to claim 1, wherein the elongated body includes a first elongated portion and a second elongated member along the longitudinal direction. The first movement restricting portion is provided at one end of the first long portion with respect to the longitudinal direction, and the second movement restricting portion is provided at the second long portion. The other end of the first long portion in the longitudinal direction is in contact with one end of the second long portion in the longitudinal direction.

  The ring-shaped shield member according to claim 3 is the component part of the ring-shaped shield member according to claim 2, wherein the first elongated portion and the second elongated portion are joined to each other, and the first length The contact part where the scale part and the second long part contact each other has a displacement prevention mechanism for preventing relative displacement between the first long part and the second long part. .

  In order to achieve the above object, a ring-shaped shield member according to claim 4 is provided on a rectangular mounting surface of a substrate mounting table for mounting the substrate in a processing chamber of a substrate processing apparatus that performs plasma processing on the rectangular substrate. A ring-shaped shield member disposed so as to surround the periphery, comprising the combination of component parts of the ring-shaped shield member according to any one of claims 1 to 3, wherein the longitudinal length of one component part An end surface of one end with respect to the direction abuts on a side surface of the other end of the other component adjacent to the longitudinal direction, and a side surface of the other end of the one component with respect to the longitudinal direction Each said component is combined so that it may contact | abut to the end surface of the end with respect to the said longitudinal direction of another said other adjacent component different from a component.

  The ring-shaped shield member according to claim 5 is the ring-shaped shield member according to claim 4, wherein each corner portion of the rectangular mounting surface is chamfered by a flat surface, and the chamfered surface at each corner portion. A triangular prism-shaped gap fitting member that fills a triangular prism-shaped gap formed by an end surface of one end of one component and a joint portion of the other end of another adjacent component. It is characterized by providing separately.

  In order to achieve the above object, a substrate mounting table according to a sixth aspect includes the ring-shaped shield member according to the fourth or fifth aspect.

  According to the present invention, the omnidirectional movement of the component is restricted by the first movement restricting portion having the first guide and the first guide hole, and the second guide and the second guide hole having the second guide hole. Since the movement restricting part restricts the movement of the component other than in the longitudinal direction, the component part of the ring-shaped shield member can be deformed and moved in the longitudinal direction of the long body starting from the first movement restricting part. Therefore, internal stress due to thermal expansion does not increase. Thereby, damage to a component can be prevented.

  In addition, one end face in the longitudinal direction of one component is in contact with the other side face in the longitudinal direction of another adjacent component, and the other end face in the other component is adjacent to another component. Since the component parts are combined so as to abut on the end surface of one end in the longitudinal direction of another adjacent component different from the above, the other end surface of one component abuts on another adjacent component When one component is deformed and moved in the longitudinal direction of the elongated body starting from the first movement restricting portion provided at one end by thermal expansion, the end surface of the other component is adjacent You don't have to press another component.

  Also, the end face of the other end of one component does not come into contact with another adjacent component, as is the case with the positional relationship between one component and another adjacent component. The end surface of one end of the component is not pushed by another adjacent component.

  Thereby, another adjacent component does not move in the longitudinal direction of one component, and one component does not move in the longitudinal direction of another adjacent component. As a result, it is possible to prevent the occurrence of a gap between the component parts of the ring-shaped shield member and the substrate mounting table.

It is sectional drawing which shows roughly the structure of the substrate processing apparatus provided with the substrate mounting base with which the ring-shaped shield member which concerns on embodiment of this invention is applied. It is a figure which shows schematically the structure of the shield ring which concerns on this Embodiment, FIG. 2 (A) is a top view, FIG.2 (B) is sectional drawing which follows the II-II line in FIG. 2 (A) It is. It is a perspective view of the clearance gap fitting member arrange | positioned at the board | substrate mounting surface of the susceptor in FIG. 4 is a diagram schematically showing the configuration of the omnidirectional movement restricting portion of the ring component in FIG. 2, and FIG. 4 (A) is a cross-sectional view in a direction perpendicular to the longitudinal direction of the ring component, FIG. B) is a cross-sectional view of the ring component in the longitudinal direction, and FIG. 4C is a cross-sectional view taken along line IV-IV in FIG. FIG. 5 is a diagram schematically showing a configuration of a unidirectional movement allowing portion of the ring component in FIG. 2, and FIG. 5 (A) is a cross-sectional view in a direction perpendicular to the longitudinal direction of the ring component; FIG. 5B is a sectional view in the longitudinal direction of the ring component, and FIG. 5C is a sectional view taken along line VV in FIG. FIG. 6 is a diagram schematically illustrating a configuration of a fastening portion of a ring component in FIG. 2, FIG. 6A is a cross-sectional view in a direction perpendicular to the longitudinal direction of the ring component, and FIG. It is sectional drawing regarding the longitudinal direction of a ring component, FIG.6 (C) is sectional drawing which follows the line VI-VI in FIG. 6 (A). It is a top view which shows the state which each ring component of the shield ring of FIG. 2 expanded thermally. It is a top view which shows the state which the susceptor in FIG. 1 thermally expanded. It is a top view which shows the state in which the board | substrate was mounted in the susceptor in FIG. FIG. 10 is a diagram schematically showing a configuration of a first modification of the shield ring according to the present embodiment in FIG. 2, and FIG. 10 (A) is a plan view of the first modification, and FIG. FIG. 10 is a cross-sectional view in the direction perpendicular to the longitudinal direction of the ring component of the omnidirectional movement restricting portion in the first modification, and FIG. 10C is the ring of the omnidirectional movement restricting portion in the first modification. FIG. 10D is a cross-sectional view in the direction perpendicular to the longitudinal direction of the ring component of the unidirectional movement allowing portion in the first modification, and FIG. E) It is sectional drawing regarding the longitudinal direction of the ring component of the one direction movement allowance part in a 1st modification. It is a top view which shows roughly the structure of the 2nd modification of the shield ring which concerns on this Embodiment of FIG. It is a figure which shows the connection part of the 1st elongate member in FIG. 11, and a 2nd elongate member, FIG. 12 (A) is an enlarged plan view of a connection part, FIG.12 (B) is an expansion of a connection part. FIG. 12C is a longitudinal sectional view, and FIG. 12C is a sectional view taken along line XII-XII in FIG. It is a top view which shows the structure of the conventional shield ring.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a cross-sectional view schematically showing a configuration of a substrate processing apparatus including a substrate mounting table to which a ring-shaped shield member according to an embodiment of the present invention is applied. In the substrate processing apparatus, for example, a predetermined plasma process is performed on a glass substrate for manufacturing a liquid crystal display device (LCD).

  In FIG. 1, a substrate processing apparatus 10 has a processing chamber (chamber) 11 for accommodating a rectangular glass substrate (hereinafter simply referred to as “substrate”) G having a side of several meters, for example. A substrate mounting table (susceptor) 12 on which the substrate G is mounted is arranged in the lower part of the figure. The susceptor 12 is composed of a base material 13 made of, for example, aluminum or stainless steel whose surface is anodized, and the base material 13 is supported on the bottom of the chamber 11 via an insulating member 14. The base material 13 has a convex cross section, and the upper plane is a substrate placement surface 13a on which the substrate G is placed. The substrate mounting surface 13a is covered with ceramic spraying to prevent the base material 13 from being exposed.

  The base material 13 is provided with a shield ring 15 as a ring-shaped shield member so as to surround the substrate mounting surface 13a. The shield ring 15 is a long length made of an insulating ceramic such as alumina, for example. It consists of the combination of the ring component parts 41-44 (after-mentioned) which are scales.

  The upper part of the base material 13 incorporates an electrostatic electrode plate 16 and functions as an electrostatic chuck. A DC power source 17 is connected to the electrostatic electrode plate 16, and when a positive DC voltage is applied to the electrostatic electrode plate 16, the electrostatic electrode plate 16 on the substrate G placed on the substrate placement surface 13a. A negative potential is generated on the side surface (hereinafter referred to as “rear surface”), thereby generating a potential difference between the electrostatic electrode plate 16 and the rear surface of the substrate G, and Coulomb force or Johnson Rabeck resulting from the potential difference. The substrate G is attracted and held on the substrate placement surface 13a by the force.

  Inside the base material 13, a temperature adjustment mechanism (not shown) including a coolant channel for adjusting the temperature of the base material 13 and the substrate G placed on the substrate placement surface 13 a is provided. For example, coolant such as cooling water or Galden (registered trademark) is circulated and supplied to the temperature adjusting mechanism, and the base material 13 cooled by the coolant cools the substrate G.

  Around the base material 13, an insulating ring 18 is disposed as a side ring-shaped shield member that covers the side surface of the base material 13. The insulating ring 18 is made of an insulating ceramic such as alumina.

  An elevating pin 21 is inserted in a through-hole penetrating the bottom wall of the chamber 11, the insulating member 14 and the base material 13 so as to be movable up and down. The elevating pins 21 operate when the substrate G placed on the substrate placement surface 13a is carried in and out, and when the substrate G is carried into the chamber 11 or unloaded from the chamber 11, the susceptor 12 Ascending to the upper transfer position, otherwise it is housed in the substrate mounting surface 13a in an embedded state.

  A plurality of heat transfer gas supply holes (not shown) are opened in the substrate mounting surface 13a. The plurality of heat transfer gas supply holes supply, for example, helium (He) gas as a heat transfer gas to the gap between the substrate mounting surface 13a and the back surface of the substrate G. The helium gas supplied to the gap between the substrate placement surface 13 a and the back surface of the substrate G effectively transfers the heat of the substrate G to the susceptor 12.

  A high frequency power source 23 for supplying high frequency power is connected to the base material 13 of the susceptor 12 via a matching unit 24. From the high frequency power supply 23, for example, high frequency power of 13.56 MHz is supplied to the base material 13, and the susceptor 12 functions as a lower electrode. The matching unit 24 reduces the reflection of the high frequency power from the susceptor 12 to maximize the supply efficiency of the high frequency power to the susceptor 12.

In the substrate processing apparatus 10, a side exhaust path 26 is formed by the inner wall of the chamber 11 and the side surface of the susceptor 12. The side exhaust path 26 is connected to an exhaust device 28 via an exhaust pipe 27. TMP (Turbo Molecular Pump), DP (Dry Pump), and MBP (Mechanical Booster Pump) (both not shown) as the exhaust device 28 evacuate the chamber 11 to reduce the pressure. Specifically, DP or MBP depressurizes the inside of the chamber 11 from atmospheric pressure to a medium vacuum state (for example, 1.3 × 10 Pa (0.1 Torr or less)), and TMP cooperates with DP or MBP in the chamber 11. The inside is depressurized to a high vacuum state (for example, 1.3 × 10 ⁻³ Pa (1.0 × 10 ⁻⁵ Torr or less)) that is lower than the medium vacuum state. The pressure in the chamber 11 is controlled by an APC valve (not shown).

  A shower head 30 is disposed on the ceiling portion of the chamber 11 so as to face the susceptor 12. The shower head 30 has an internal space 31 and a plurality of gas holes 32 for discharging a processing gas into the processing space S between the shower head 30 and the susceptor 12. The shower head 30 is grounded and forms a pair of parallel plate electrodes together with the susceptor 12 functioning as a lower electrode.

  The shower head 30 is connected to a processing gas supply source 39 through a gas supply pipe 36. The gas supply pipe 36 is provided with an open / close valve 37 and a mass flow controller 38. A substrate loading / unloading port 34 is provided on the side wall of the processing chamber 11, and the substrate loading / unloading port 34 can be opened and closed by a gate valve 35. Then, the substrate G to be processed is carried in / out through the gate valve 35.

  In the substrate processing apparatus 10, the processing gas is supplied from the processing gas supply source 39 through the processing gas introduction pipe 36. The supplied processing gas is introduced into the processing space S of the chamber 11 through the internal space 31 and the gas hole 32 of the shower head 30, and the introduced processing gas is supplied from the high frequency power supply 23 through the susceptor 12. Excited by the high-frequency power for plasma generation applied to S, it becomes plasma. Ions in the plasma are attracted toward the substrate G, and the substrate G is subjected to a predetermined plasma treatment.

  The operation of each component of the substrate processing apparatus 10 is controlled by a CPU of a control unit (not shown) provided in the substrate processing apparatus 10 according to a program corresponding to the plasma etching process.

  2 is a diagram schematically showing the configuration of the shield ring according to the present embodiment, FIG. 2 (A) is a plan view, and FIG. 2 (B) is the II-II line in FIG. 2 (A). FIG.

  In FIG. 2A, the shield ring 15 is disposed so as to surround the rectangular substrate placement surface 13a of the susceptor 12 functioning as a lower electrode. Ring component parts 41 and 42 composed of rectangular parallelepiped long bodies arranged along the short sides, and ring component part 43 composed of rectangular parallelepiped long bodies respectively disposed along two opposing long sides. , 44 in combination.

  The ring components 41 to 44 are omnidirectional movement restricting portions 45 provided at one ends (hereinafter referred to as “fixed ends”) 41a to 44a with respect to the longitudinal direction (hereinafter simply referred to as “longitudinal direction”) of the long body. (First movement restricting portion), a one-way movement permitting portion 46 (second movement restricting portion) provided away from the omnidirectional movement restricting portion 45 in the longitudinal direction, and 2 provided along the longitudinal direction. And two fastening portions 47. If the one-way movement allowance part 46 and the fastening part 47 are both provided apart from the omnidirectional movement restriction part 45 in the longitudinal direction, there is no particular restriction on the installation position, but each ring component 41 to 44 is reliably placed in the longitudinal direction. From the viewpoint of moving the unidirectional movement, the unidirectional movement allowing portion 46 is preferably provided as far as possible from the omnidirectional movement restricting portion 45. For example, the other end in the longitudinal direction of the long body (hereinafter referred to as "free end"). You may provide in 41b-44b.

  In the shield ring 15, the end surface of the fixed end 41 a of the ring component 41 abuts on the side surface of the free end 43 b of another adjacent ring component 43, and the side surface of the free end 41 b is adjacent to another ring component 44. The ring component 41 is disposed so as to contact the end surface of the fixed end 44a. On the other hand, the end surface of the free end 41 b does not come into contact with the fixed end 44 a of the ring component 44. In the present embodiment, the ring components 42 to 44 are also arranged in the same positional relationship as the ring component 41 with respect to the other adjacent ring components 44, 42, 41. Are arranged so as to be point targets with the ring components 41 and 43 with respect to the center point of the substrate placement surface 13a.

  In FIG. 2B, the base material 13 of the susceptor 12 has a convex section, and the upper plane of the convex section is the substrate placement surface 13a, and the surface of the step portion is the flange portion 13b.

  Further, each corner of the substrate placement surface 13a is chamfered by a flat surface, whereby, for example, a chamfer at one corner of the substrate placement surface 13a and a fixed end 41a of the ring component 41 are obtained. A triangular prism-shaped gap is formed between the end surface of the ring member 43 and the joint portion of the side surface of the free end 43b of the adjacent ring component 43, and a triangle having a right-angled triangle cross section as shown in FIG. A columnar gap fitting member 48 is loosely fitted. Similar triangular prism-shaped gaps are formed in the remaining corners of the substrate mounting surface 13a, and gap fitting members 48 are loosely fitted in the gaps.

  4 is a diagram schematically showing the configuration of the omnidirectional movement restricting portion of the ring component in FIG. 2, and FIG. 4 (A) is a cross-sectional view in a direction perpendicular to the longitudinal direction, and FIG. B) is a sectional view in the longitudinal direction, and FIG. 4C is a sectional view taken along line IV-IV in FIG.

  4 (A) to 4 (C), the omnidirectional movement restricting portion 45 is, for example, a circle formed by cutting the ring component 41 from above in FIGS. 4 (A) and 4 (B). Counterbore surface 45a, a collar hole 45b (first collar hole) made of a cylindrical space penetrating the ring component 41 in the thickness direction at the center of the counterbore surface 45a, and loosely engaged with the collar hole 45b A cylindrical collar 45c (first collar), and a bolt 45d (first bolt) that is inserted into the collar 45c and presses the collar 45c toward the flange portion 13b. The omnidirectional movement restricting portions 45 of the ring components 42 to 44 have the same configuration.

  In the omnidirectional movement restricting portion 45, as shown in FIG. 4C, the collar hole 45b has a circular cross section with respect to a plane perpendicular to the central axis of the collar 45c, and the side surface of the collar 45c and the side surface of the collar hole 45b The gap is set to a substantially constant value in all directions. In the present embodiment, the gap between the side surface of the collar 45c and the side surface of the collar hole 45b is set small so as to restrict the movement of the ring component 41 in all directions. Specifically, since the gap is set to, for example, 0.01 to 0.2 mm (0.02 to 0.4 mm in total on both sides in the diameter direction), the ring component 41 is an omnidirectional movement restricting portion. It can hardly move in the vicinity of 45.

  FIG. 5 is a diagram schematically showing the configuration of the unidirectional movement allowing portion of the ring component in FIG. 2, and FIG. 5 (A) is a sectional view in a direction perpendicular to the longitudinal direction. FIG. 5B is a cross-sectional view taken along the line VV in FIG. 5A.

  5 (A) to 5 (C), the one-way movement allowing portion 46 is, for example, a circle formed by cutting the ring component 41 from above in FIGS. 5 (A) and 5 (B). Counterbore surface 46a, a collar hole 46b (second collar hole) penetrating through the ring component 41 in the thickness direction at the center of the counterbore surface 46a, and a cylindrical collar loosely fitted in the collar hole 46b 46c (second collar) and a bolt 46d (second bolt) that is inserted into the collar 46c and presses the collar 46c toward the flange portion 13b. The unidirectional movement allowance portions 46 of the ring components 42 to 44 have the same configuration.

  In the unidirectional movement allowing portion 46, as shown in FIG. 5C, the collar hole 46b has an oval cross section with respect to a plane perpendicular to the central axis of the collar 46c, and the major axis of the oval cross section is the longitudinal direction. Therefore, a relatively large gap between the side surface of the collar 46c and the side surface of the collar hole 46b with respect to the longitudinal direction, for example, a gap on both sides sandwiching the bolt 46d is made uniform, for example, 1.5 A gap of ˜2.5 mm is generated, so that the ring component 41 provided with the collar hole 46b can move relative to the collar 46c in the longitudinal direction. On the other hand, with respect to a direction perpendicular to the longitudinal direction (hereinafter simply referred to as “vertical direction”), the gap between the side surface of the collar 46c and the side surface of the collar hole 46b restricts the movement of the ring component 41 in the vertical direction. Is set to be small. Specifically, since the gap is set to, for example, 0.01 to 0.2 mm on one side, similarly to the gap in the omnidirectional movement restricting portion 45, the ring component 41 is allowed to move in one direction 46. Can hardly move in the vertical direction in the vicinity of. That is, the ring component 41 can move along the longitudinal direction only in the vicinity of the one-way movement allowance portion 46. Here, “oval” means a rectangle or ellipse whose both ends are semicircles, and a figure having a major axis and a minor axis similar to these. The same applies to the following.

  As described above, in the present embodiment, when the ring component 41 thermally expands, the ring component 41 moves in the longitudinal direction starting from the omnidirectional movement restricting portion 45. Similarly, the ring components 42 to 44 also move in the longitudinal direction starting from the omnidirectional movement restricting portion 45.

  Further, in the omnidirectional movement restricting section 45 and the one-way movement allowing section 46, the bolts 45d and 46d are as shown in FIGS. 4 (A), 4 (B), 5 (A) and 5 (B). Even if it contacts the collars 45c and 46c, it does not contact the counterbore surfaces 45a and 46a. Therefore, the fastening force of the bolts 45d and 46d does not act on the ring components 41 to 44.

  6 is a diagram schematically showing the configuration of the fastening portion 47 of the ring component in FIG. 2, and FIG. 6 (A) is a cross-sectional view in a direction perpendicular to the longitudinal direction, and FIG. 6 (B). Is a sectional view in the longitudinal direction, and FIG. 6C is a sectional view taken along line VI-VI in FIG.

  6 (A) to 6 (C), the fastening portion 47 is, for example, a circular counterbore formed by cutting the ring component 41 from above in FIGS. 6 (A) and 6 (B). A face 47a, a bolt hole 47b made of an oval columnar or columnar space that penetrates the ring component 41 in the thickness direction at the center of the counterbore face 47a, and the inside of the bolt hole 47b; And a bolt 47c that presses the spot face 47a toward the flange portion 13b. In the fastening portion 47, the bolt 47 c presses the counterbore surface 47 a toward the flange portion 13 b, so that the ring component 41 is fastened to the base material 13 of the susceptor 12. The fastening portions 47 of the ring components 42 to 44 have the same configuration.

  In the fastening portion 47, as shown in FIG. 6C, the bolt hole 47b has an oval cross section with respect to a plane perpendicular to the central axis of the bolt 47c, and a gap is formed with respect to the longitudinal direction of the ring component 41. Have. In the present embodiment, the gap between the side surface of the bolt 47c and the side surface of the bolt hole 47b is set to be relatively large in the longitudinal direction. Specifically, the gap is a gap on both sides sandwiching the bolt 47c. Since it is set to, for example, 3 mm on one side in the case of equalization, the ring component 41 can freely move in the vicinity of the fastening portion 47.

  FIG. 7 is a plan view showing a state where each ring component of the shield ring of FIG. 2 is thermally expanded.

  As described above, the ring constituent members 41 to 44 of the shield ring 15 move in the longitudinal direction (the direction indicated by the white arrow in the figure) starting from the omnidirectional movement restricting portion 45 due to thermal expansion. The end surface of the free end 41 b of the ring component 41 is released without coming into contact with the fixed end 44 a of the ring component 44. Similarly, the end surface of the free end 42 b of the ring component 42 is the ring component 43. The end surface of the free end 43b of the ring component 43 is released without contacting the fixed end 41a of the ring component 41, and the ring component 44 is released. Since the end surface of the free end 44b is released without coming into contact with the fixed end 42a of the ring component 42, as shown in FIG. 41 to 44 do not have to push the other ring components.

  FIG. 8 is a plan view showing a state where the susceptor in FIG. 1 is thermally expanded.

  In FIG. 8, since the ring components 41 to 44 of the shield ring 15 are arranged so as to abut one-to-one on each side of the substrate placement surface 13a, the susceptor 12 is heated in the direction of the white arrow in the figure. When expanded, each of the ring components 41 to 44 receives a pressing force from only one side of the corresponding substrate mounting surface 13a. Therefore, each ring component 41-44 can move in the same direction as the movement of one side of the corresponding substrate mounting surface 13a, so that each ring component 41-44 and the corresponding substrate mounting surface 13a can be moved. There is no gap between one side.

  Along with the thermal expansion of the susceptor 12, a gap may be formed between each ring component, for example, between the end surface of the fixed end 41a and the side surface of the free end 43b (not shown). By adopting a labyrinth structure at the contact portion, the base material 13 can be prevented from being exposed. The labyrinth structure can be configured, for example, by providing a step at each of the fixed end 41a and the free end 43b at the contact portion and combining the steps.

  FIG. 9 is a plan view showing a state where the substrate is placed on the susceptor in FIG.

  In the susceptor 12, when the substrate G is placed on the substrate placement surface 13a, the substrate G is displaced from the substrate placement surface 13a as shown in FIG. Although the orientation flat 49 may not cover the corners of the substrate placement surface 13a, a gap fitting member 48 is disposed at each corner of the substrate placement surface 13a of the susceptor 12, and thus the substrate placement. The surface 13a is not exposed, and only the gap fitting member 48 is exposed. Thereby, the ceramic spraying of the substrate mounting surface 13a is not scraped off by the plasma, and thus it is possible to prevent the abnormal discharge or corrosion in the susceptor 12 from occurring.

  In the susceptor 12, the gap fitting members 48 are arranged at all corners of the substrate placement surface 13a. Therefore, even if the orientation of the substrate G is changed according to the contents of the plasma processing, the orientation flats One of the gap fitting members 48 exists corresponding to the position 49. Thereby, it can prevent reliably that the ceramic spraying of the board | substrate mounting surface 13a is shaved. Even if the gap fitting member 48 is consumed by plasma, the gap fitting member 48 can be easily replaced, so that the plasma resistance of the susceptor 12 can be easily maintained.

  According to the shield ring 15 as the ring-shaped shield member according to the embodiment of the present invention, the long body constituting each ring component 41 to 44 of the shield ring 15 is fastened to the susceptor 12 by the fastening portion 47. The omnidirectional movement restricting portion 45 restricts the movement of each ring component 41 to 44 in all directions, and the unidirectional movement permitting portion 46 restricts the movement of each ring component 41 to 44 other than the longitudinal direction. There is no need to increase the fastening force of the fastening portion 47 in order to prevent the deformation and movement of each ring component 41 to 44. Moreover, since each ring component 41-44 can be deformed and moved in the longitudinal direction starting from the omnidirectional movement restricting portion 45, internal stress due to thermal expansion does not increase. Thereby, damage to each ring component 41-44 can be prevented.

  In addition, the end surface of the fixed end 41a (42a, 43a or 44a) of one ring component 41 (42, 43 or 44) is the free end 43b of another adjacent ring component 43 (44, 42 or 41) ( 44b, 42b or 41b), and the side surface of the free end 41b (42b, 43b or 44b) of one ring component 41 (42, 43 or 44) is adjacent to another ring component 44 (43 41 or 42), the ring components 41 to 44 are combined so as to contact the end face of the fixed end 44a (43a, 41a or 42a), so that one ring component 41 (42, 43 or 44). ) Free end 41b (42b, 43b or 44b) end face does not come into contact with another ring component 44 (43, 41 or 42) adjacent to one ring component When 1 (42, 43 or 44) is deformed and moved in the longitudinal direction starting from the omnidirectional movement restricting portion 45 provided at the fixed end by thermal expansion, the ring component 41 (42, 43 or 44) The end face of the free end 41b (42b, 43b or 44b) does not push another ring component 44 (43, 41 or 42). Thereby, another ring component 44 (43, 41 or 42) does not move in the longitudinal direction of one ring component 41 (42, 43 or 44), and as a result, each ring configuration of the shield ring 15 Generation | occurrence | production of the clearance gap between the components 41-44 and the susceptor 12 can be prevented.

  Although the present invention has been described using the above embodiment, the present invention is not limited to the above embodiment.

  For example, in the shield ring 15 described above, the collars 45c and 46c are used to restrict the movement of the ring component parts 41 to 44, but the member for regulating the movement is not limited to the collar.

  FIG. 10 is a diagram schematically showing a configuration of the first modification of the shield ring according to the present embodiment of FIG. 2, and FIG. 10 (A) is a plan view of the first modification. 10 (B) is a cross-sectional view in a direction perpendicular to the longitudinal direction of the ring component of the omnidirectional movement restricting portion in the first modification, and FIG. 10 (C) is an omnidirectional movement in the first modification. It is sectional drawing regarding the longitudinal direction of the ring component of a control part, FIG.10 (D) is sectional drawing regarding the direction perpendicular | vertical to the longitudinal direction of the ring component of the one-way movement allowance part in the 1st modification. FIG. 10E is a cross-sectional view in the longitudinal direction of the ring component of the one-way movement allowance portion in the first modification.

  In FIG. 10 (A), the shield ring 50 is configured by a combination of ring component parts 51 to 54 each formed of a rectangular parallelepiped long body arranged along each side of the rectangular substrate mounting surface 13a. Yes.

  Each of the ring components 51 to 54 is provided at an omnidirectional movement restricting portion 55 (first movement restricting portion) provided at the fixed ends 51a to 54a and spaced apart from the omnidirectional movement restricting portion 55 in the longitudinal direction. It has the direction movement permission part 56 (2nd movement control part) and the two fastening parts 47 provided along a longitudinal direction.

  10 (B) and 10 (C), the omnidirectional movement restricting portion 55 is a rectangular parallelepiped guide 55a (first portion) that is partly embedded in the flange portion 13b and cannot move relative to the susceptor 12. And a guide hole 55b (first guide hole), which is a rectangular parallelepiped recess provided in the contact surface of the ring component 51 with the flange portion 13b, for example, to which the guide 55a is loosely fitted. The omnidirectional movement restricting portions 55 of the ring components 52 to 54 have the same configuration.

  In the omnidirectional movement restricting portion 55, the gap between the side surface of the guide 55a and the side surface of the guide hole 55b is set to a substantially constant value in all directions. In the present embodiment, the gap between the side surface of the guide 55a and the side surface of the guide hole 55b is set to be small so as to restrict the movement of the ring component 51 in all directions. Specifically, the gap is, for example, 0.01 to 0.2 mm (for example, on both sides of the guide 55a with respect to the longitudinal direction of the ring component), like the omnidirectional movement restricting portion 45 in the first embodiment. Therefore, the ring component 51 can hardly move in the vicinity of the omnidirectional movement restricting portion 55.

  10 (D) and 10 (E), the unidirectional movement allowing portion 56 is a rectangular parallelepiped guide 56a (second) that is partly embedded in the flange portion 13b and cannot be moved relative to the susceptor 12. And a guide hole 56b (second guide hole) which is a rectangular parallelepiped recess provided on the contact surface of the ring component 51 with the flange portion 13b and in which the guide 56a is loosely fitted. The unidirectional movement allowance portions 56 of the ring components 52 to 54 have the same configuration.

  In the unidirectional movement allowing portion 56, as shown in FIG. 10 (E), the length of the guide hole 56b in the longitudinal direction is set larger than the length of the guide 56a in the longitudinal direction. A relatively large gap between the side surface and the side surface of the guide hole 56b, for example, the gaps on both sides in the longitudinal direction across the guide 55a are made uniform, as in the one-way movement allowance portion 46 in the first embodiment. In this case, a gap of 1.5 to 2.5 mm is generated on one side, so that the ring component 51 provided with the guide hole 56b can move relative to the guide 56a in the longitudinal direction. On the other hand, with respect to the vertical direction, the gap between the side surface of the guide 56a and the side surface of the guide hole 56b is set small so as to restrict the movement of the ring component 51 in the vertical direction. Specifically, the gap is, for example, 0.01 to 0.2 mm (for example, a total of 0.02 to 0.4 mm on both sides of the guide 55a in the vertical direction), as in the omnidirectional movement restriction unit 55. Therefore, the ring component 51 can hardly move in the vertical direction in the vicinity of the one-way movement allowance portion 56. That is, the ring component 51 can move along the longitudinal direction only in the vicinity of the one-way movement allowance portion 56.

  As described above, in the first modification, when the ring component 51 thermally expands, the ring component 51 moves in the longitudinal direction starting from the omnidirectional movement restricting portion 55. Similarly, the ring components 52 to 54 also move in the longitudinal direction starting from the omnidirectional movement restricting portion 55.

  In the shield ring 15 described above, each of the ring components 41 to 44 is composed of one long body, but each ring component may be composed of a plurality of long bodies.

  FIG. 11 is a plan view schematically showing a configuration of a second modification of the shield ring according to the present embodiment of FIG.

  In FIG. 11, the shield ring 57 is configured by a combination of ring component parts 58 to 61 formed of a rectangular parallelepiped long body arranged along each side of the rectangular substrate mounting surface 13 a.

  Each ring component 58-61 is formed into a first long member 58a-61a (first long portion) and a second long member 58b-61b (second long portion) along the longitudinal direction. For example, in the ring component 58, the omnidirectional movement restricting portion 45 is provided at one end (fixed end) 58aa with respect to the longitudinal direction of the first long member 58a, and the one-way movement permitting portion 46 is the second length. The other end (contact end) 58ab in the longitudinal direction of the first long member 58a is abutted with one end (contact end) 58ba in the longitudinal direction of the second long member 58b. Each of the first elongate member 58a and the second elongate member 58b includes two or more fastening portions 47. Further, as shown in FIGS. 12A to 12C, the first long member 58a and the second long member 58b are fastened to each other by fastening means 62 such as a bolt at the connecting portion. In addition, a positioning pin 64 (position shift prevention mechanism) that is fitted into the pin hole 63 is disposed in the connecting portion in order to prevent the relative position shift therebetween. The fastening means 62 is not limited to a bolt, and may be one that clamps the connecting portion from the upper and lower surfaces, and the first elongate member 58a and the second elongate member 58b only by the positioning pin 64. The fastening means may not be provided as long as the fastening and the prevention of relative displacement can be realized. Thereby, even if it comprises a ring component by the elongate member divided | segmented, the effect similar to the case where a ring component is comprised by an integral member (1st Embodiment) can be acquired. Each of the ring components 59 to 61 has the same configuration as the ring component 58.

  In the shield ring 57, the end surface of the fixed end 58aa of the first elongate member 58a abuts on the side surface of the other end (free end) 60bb in the longitudinal direction of the adjacent second elongate member 60b, and the second length The ring component 58 is arranged so that the side surface of the free end 58bb of the scale member 58b contacts the end surface of the fixed end 61aa of the adjacent first long member 61a. On the other hand, the end surface of the free end 58bb of the second elongate member 58b does not contact the fixed end 61aa of the first elongate member 61a. In the present embodiment, the ring components 59 to 61 are also arranged in the same manner as the ring component 58, and the ring components 59 and 61 are respectively related to the center point of the substrate mounting surface 13a. It is arranged to be a point object.

  In the shield ring 57, for example, when the ring component 58 thermally expands, the first long member 58 a moves due to the thermal expansion, and the second long member 58 b moves by the thermal expansion and the first long member. The first long member 58a moves in the longitudinal direction starting from the omnidirectional movement restricting portion 45, and the second long member 58b is moved by the one-way movement allowing portion 46. The movement direction is restricted and the movement is in the longitudinal direction. Similarly, in the ring components 59 to 61, the first long members 59a to 61a move in the longitudinal direction starting from the omnidirectional movement restricting portion 45, and the second long members 59b to 61b are unidirectional movement allowing portions. The movement direction is restricted by 46 and the film moves in the longitudinal direction. Thereby, it is possible to prevent an increase in internal stress due to thermal expansion in the first long members 58a to 61a and the first long members 58a to 61a.

  In the shield ring 57, the end surface of the free end 58bb (59bb, 60bb or 61bb) of the second long member 58b (59b, 60b or 61b) is the end surface of the first long member 61a (60a, 58a or 59a). There is no contact with the fixed end 61aa (60aa, 58aa or 59aa). Thereby, another ring component 61 (60, 58 or 59) does not move in the longitudinal direction of one ring component 58 (59, 60 or 61), and as a result, each ring configuration of the shield ring 57 Generation | occurrence | production of the clearance gap between the components 58-61 and the susceptor 12 can be prevented.

  Further, in the shield ring 57, the ring components 58 to 61 are divided into the first long members 58a to 61a and the second long members 58b to 61b. Shielding member by integral molding for large generation FPD manufacturing apparatus, for example, apparatus handling a larger substrate than 7th generation FPD board, while preventing the required increase in size and workability from deteriorating However, by applying the present invention to the shield member, it is possible to obtain the same effect as that produced by the integrally formed shield member used in the conventional small FPD manufacturing apparatus.

G substrate 10 substrate processing apparatus 11 chamber 12 susceptor 13a substrate mounting surface 13b flange 15 shield rings 41-44, 51-54, 58-61 ring components 41a-44a, 51a-54a, 58aa-61aa fixed end 41b- 44b, 51b to 54b, 58bb to 61bb Free end 45, 55 Omnidirectional movement restricting portion 45b, 46b Collar hole 45c, 46c Collar 45d, 46d Bolt 46, 56 Unidirectional movement allowance portion 47 Fastening portion 48 Gap fitting member 55a, 56a Guide 55b, 56b Guide holes 58a-61a First long member 58b-61b Second long member

Claims (6)

A component part of a ring-shaped shield member provided so as to surround a rectangular mounting surface of a substrate mounting table for mounting the substrate in a processing chamber of a substrate processing apparatus that performs plasma processing on a rectangular substrate,
It consists of an insulating long body arranged along one side of the rectangular mounting surface,
A first movement restricting portion that is provided at one end in the longitudinal direction of the elongate body and restricts movement of the component parts in all directions; and is provided apart from the first movement restricting portion in the longitudinal direction. A second movement restricting portion for restricting movement of the component parts other than in the longitudinal direction;
The first movement restricting portion includes a first guide that is immovable with respect to the substrate mounting table, and a first guide hole that is a recess in which the first guide is loosely engaged. The gap between each side surface of the first guide and each side surface of the first guide hole is set to be small so as to restrict movement of the component parts in all directions,
The second movement restricting portion includes a second guide that is immovable with respect to the substrate mounting table, and a second guide hole that is a recess in which the second guide is loosely engaged. The length of the second guide hole in the longitudinal direction is set to be greater than the length of the second guide in the longitudinal direction. The long body is divided into a first long portion and a second long portion along the longitudinal direction,
The first movement restricting portion is provided at one end of the first long portion with respect to the longitudinal direction, the second movement restricting portion is provided at the second long portion, and the first long restrictive portion is provided. 2. The component of the ring-shaped shield member according to claim 1, wherein the other end of the portion in the longitudinal direction is in contact with one end of the second long portion in the longitudinal direction.   The first elongate portion and the second elongate portion are joined to each other, and the first elongate portion and the second elongate portion are brought into contact with the first elongate portion and the second elongate portion, respectively. The component part of the ring-shaped shield member according to claim 2, further comprising a displacement prevention mechanism that prevents a relative displacement of the second long portion. A ring-shaped shield member disposed so as to surround a rectangular mounting surface of a substrate mounting table for mounting the substrate in a processing chamber of a substrate processing apparatus that performs plasma processing on a rectangular substrate,
It comprises a combination of component parts of the ring-shaped shield member according to any one of claims 1 to 3,
One end face of the one component part in the longitudinal direction is in contact with a side face of the other end part of the other component part in the longitudinal direction, and the other side face of the one component part in the longitudinal direction. However, each of the component parts is combined so as to come into contact with an end face of one end in the longitudinal direction of another adjacent component part different from the other adjacent component parts. Shield member.   Each corner of the rectangular mounting surface is chamfered by a flat surface, the chamfered surface at each corner, the end surface of one end of one component, and the other end of another adjacent component. The ring-shaped shield member according to claim 4, further comprising a triangular prism-shaped gap fitting member that fills a triangular prism-shaped gap formed by a joint portion on the side surface of the ring, separately from the component parts.   A substrate mounting table comprising the ring-shaped shield member according to claim 4.

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