JP2015038564A5 - - Google Patents
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- Publication number
- JP2015038564A5 JP2015038564A5 JP2013169572A JP2013169572A JP2015038564A5 JP 2015038564 A5 JP2015038564 A5 JP 2015038564A5 JP 2013169572 A JP2013169572 A JP 2013169572A JP 2013169572 A JP2013169572 A JP 2013169572A JP 2015038564 A5 JP2015038564 A5 JP 2015038564A5
- Authority
- JP
- Japan
- Prior art keywords
- etching
- light shielding
- shielding layer
- transfer mask
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000000460 chlorine Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 239000010408 film Substances 0.000 claims 3
- 239000010409 thin film Substances 0.000 claims 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 2
- 229910052794 bromium Inorganic materials 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000011651 chromium Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- 229910052740 iodine Inorganic materials 0.000 claims 2
- 239000011630 iodine Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 229910052724 xenon Inorganic materials 0.000 claims 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- 150000003624 transition metals Chemical class 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013169572A JP6266919B2 (ja) | 2013-08-19 | 2013-08-19 | 転写用マスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013169572A JP6266919B2 (ja) | 2013-08-19 | 2013-08-19 | 転写用マスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015038564A JP2015038564A (ja) | 2015-02-26 |
| JP2015038564A5 true JP2015038564A5 (enrdf_load_stackoverflow) | 2016-09-29 |
| JP6266919B2 JP6266919B2 (ja) | 2018-01-24 |
Family
ID=52631660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013169572A Active JP6266919B2 (ja) | 2013-08-19 | 2013-08-19 | 転写用マスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6266919B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016185941A1 (ja) * | 2015-05-15 | 2016-11-24 | Hoya株式会社 | マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法 |
| US12366798B2 (en) * | 2021-06-07 | 2025-07-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography mask and methods |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4210166B2 (ja) * | 2003-06-30 | 2009-01-14 | Ｈｏｙａ株式会社 | グレートーンマスクの製造方法 |
| JP5704754B2 (ja) * | 2010-01-16 | 2015-04-22 | Hoya株式会社 | マスクブランク及び転写用マスクの製造方法 |
| JP2011227391A (ja) * | 2010-04-22 | 2011-11-10 | Toppan Printing Co Ltd | 液晶表示装置製造用ハーフトーンマスクブランクス、ハーフトーンマスクおよびハーフトーンマスク製造方法 |
| JP5917020B2 (ja) * | 2010-06-29 | 2016-05-11 | Hoya株式会社 | マスクブランクおよび多階調マスクの製造方法 |
| JP5924901B2 (ja) * | 2011-10-17 | 2016-05-25 | Hoya株式会社 | 転写用マスクの製造方法 |
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2013
- 2013-08-19 JP JP2013169572A patent/JP6266919B2/ja active Active