JP2015019016A5 - - Google Patents

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Publication number
JP2015019016A5
JP2015019016A5 JP2013146732A JP2013146732A JP2015019016A5 JP 2015019016 A5 JP2015019016 A5 JP 2015019016A5 JP 2013146732 A JP2013146732 A JP 2013146732A JP 2013146732 A JP2013146732 A JP 2013146732A JP 2015019016 A5 JP2015019016 A5 JP 2015019016A5
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JP
Japan
Prior art keywords
substrate
dried
rotation mechanism
drying
rotated
Prior art date
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Withdrawn
Application number
JP2013146732A
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English (en)
Japanese (ja)
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JP2015019016A (ja
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Priority to JP2013146732A priority Critical patent/JP2015019016A/ja
Priority claimed from JP2013146732A external-priority patent/JP2015019016A/ja
Publication of JP2015019016A publication Critical patent/JP2015019016A/ja
Publication of JP2015019016A5 publication Critical patent/JP2015019016A5/ja
Withdrawn legal-status Critical Current

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JP2013146732A 2013-07-12 2013-07-12 基板乾燥装置、基板処理装置及び基板乾燥方法 Withdrawn JP2015019016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013146732A JP2015019016A (ja) 2013-07-12 2013-07-12 基板乾燥装置、基板処理装置及び基板乾燥方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013146732A JP2015019016A (ja) 2013-07-12 2013-07-12 基板乾燥装置、基板処理装置及び基板乾燥方法

Publications (2)

Publication Number Publication Date
JP2015019016A JP2015019016A (ja) 2015-01-29
JP2015019016A5 true JP2015019016A5 (cg-RX-API-DMAC7.html) 2016-08-25

Family

ID=52439745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013146732A Withdrawn JP2015019016A (ja) 2013-07-12 2013-07-12 基板乾燥装置、基板処理装置及び基板乾燥方法

Country Status (1)

Country Link
JP (1) JP2015019016A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6573520B2 (ja) * 2015-09-29 2019-09-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
CN111668096A (zh) * 2020-06-22 2020-09-15 徐文凯 第三代半导体的刻蚀方法和装置

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