JP2015019016A5 - - Google Patents
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- JP2015019016A5 JP2015019016A5 JP2013146732A JP2013146732A JP2015019016A5 JP 2015019016 A5 JP2015019016 A5 JP 2015019016A5 JP 2013146732 A JP2013146732 A JP 2013146732A JP 2013146732 A JP2013146732 A JP 2013146732A JP 2015019016 A5 JP2015019016 A5 JP 2015019016A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- dried
- rotation mechanism
- drying
- rotated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000000758 substrate Substances 0.000 claims 4
- 238000001035 drying Methods 0.000 claims 3
- 239000007788 liquid Substances 0.000 claims 2
Claims (1)
- 乾燥対象面を有する基板をその乾燥対象面に交差する回転軸を中心として回転させる回転機構と、
前記回転機構により回転する前記基板の乾燥対象面に乾燥用液体を供給する液体供給部と、
前記回転機構により回転する前記基板の乾燥対象面上の大気を乾燥気体に置換する置換部と、
を備えることを特徴とする基板乾燥装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013146732A JP2015019016A (ja) | 2013-07-12 | 2013-07-12 | 基板乾燥装置、基板処理装置及び基板乾燥方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013146732A JP2015019016A (ja) | 2013-07-12 | 2013-07-12 | 基板乾燥装置、基板処理装置及び基板乾燥方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015019016A JP2015019016A (ja) | 2015-01-29 |
| JP2015019016A5 true JP2015019016A5 (ja) | 2016-08-25 |
Family
ID=52439745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013146732A Withdrawn JP2015019016A (ja) | 2013-07-12 | 2013-07-12 | 基板乾燥装置、基板処理装置及び基板乾燥方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2015019016A (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6573520B2 (ja) | 2015-09-29 | 2019-09-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法および基板処理装置 |
| CN111668096A (zh) * | 2020-06-22 | 2020-09-15 | 徐文凯 | 第三代半导体的刻蚀方法和装置 |
-
2013
- 2013-07-12 JP JP2013146732A patent/JP2015019016A/ja not_active Withdrawn
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