JP2015012015A - Processing method of wafer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a processing method of a wafer capable of determining whether a formation condition of a modified layer is appropriate, before dividing the wafer.SOLUTION: The processing method includes: a protective member arranging step of arranging a protective member (21) at the side of a front face (11a) of a wafer (11); a holding step of holding the protective member with a chuck table (10); a reference width setting step of setting a reference width of a modified layer (23) to be formed on the wafer; a modified layer forming step of forming the modified layer by irradiating the wafer held by the chuck table from the side of a rear face (11b) with a laser beam (40) along a predetermined dividing line (17) while focusing (42) the inside of the wafer; and a crack determining step of determining generation of a crack (25) extending from the modified layer to the front face of the wafer in the case where the modified layer of the wafer held by the chuck table is imaged from the rear face side of the wafer by an infrared camera (14) and a width of the imaged modified layer is wider than the reference width.

Description

  The present invention relates to a wafer processing method in which a laser beam is condensed inside a wafer to form a modified layer serving as a starting point of division.

  In order to divide a wafer having devices formed on the surface into a plurality of chips, a wafer processing method has been proposed in which a laser beam is condensed inside the wafer to form a modified layer serving as a starting point of the division (for example, , See Patent Document 1 and Patent Document 2).

  In this processing method, a laser beam having a wavelength that is difficult to be absorbed by the wafer is irradiated along the planned dividing line so as to be condensed inside the wafer, thereby forming a modified layer by multiphoton absorption. By applying a stress to the wafer on which the modified layer is formed, the wafer is divided along the division line.

JP 2005-86161 A JP 2010-68009 A

  By the way, in the above-described processing method, a good modified layer suitable for dividing a wafer is required unless the modified layer forming conditions such as the formation position of the modified layer in the depth direction of the wafer and the irradiation power of the laser beam are appropriately set. Can not form.

  On the other hand, there was a problem that it was not known until the wafer was actually divided whether or not a good modified layer could be formed. For this reason, many wafers are processed in a state where the formation conditions of the modified layer are not set appropriately, and there is a possibility that division failures occur frequently.

  The present invention has been made in view of such a problem, and an object of the present invention is to provide a wafer processing method capable of determining whether or not the conditions for forming the modified layer are appropriate before dividing the wafer. It is to be.

  According to the present invention, there is provided a wafer processing method for forming a modified layer inside a wafer along a plurality of division lines set on the surface of the wafer, wherein a protective member is disposed on the surface side of the wafer. A protective member disposing step, a holding step of holding the protective member side of the wafer by a chuck table after the protective member disposing step, and focusing a laser beam having a wavelength transmitting through the wafer inside the wafer. A reference width setting step for setting a reference width of a modified layer formed by irradiating the wafer, and after the reference width setting step, the laser beam is irradiated from the back side of the wafer held on the chuck table. Irradiation along an arbitrary division line while focusing on the inside of the wafer to form the modified layer along the arbitrary division line inside the wafer After the forming step and the modified layer forming step, the modified layer of the wafer held on the chuck table is imaged from the back side of the wafer by an infrared camera, and the width of the imaged modified layer And a crack determination step for determining that a crack extending from the modified layer toward the surface of the wafer is present when the thickness is larger than the reference width. .

  In the wafer processing method, the reference width set in the reference value setting step is preferably 4 μm.

  Further, in the wafer processing method, in the reference width setting step, the modified layer in which the crack is not elongated by irradiating the laser beam along the division line where the modified layer of the wafer is not formed. And measuring the width of the modified layer by imaging with the infrared camera, setting the reference width based on the width, and irradiating in the reference width setting step in the modified layer forming step Irradiating the laser beam with the laser beam and the position of the focal point changed in the incident direction along the modified layer, and forming a plurality of modified layers along the division line in the thickness direction of the wafer. preferable.

  Under the condition that a good modified layer suitable for dividing the wafer is formed, a crack is generated from the modified layer toward the surface of the wafer. Therefore, as in the wafer processing method according to the present invention, by performing the crack determination step after the modified layer forming step, it is determined before dividing the wafer whether or not the modified layer forming conditions are appropriate. it can.

FIG. 1A is a perspective view schematically showing a configuration example of a wafer, and FIG. 1B is a perspective view schematically showing a protective member disposing step. It is a perspective view which shows typically the structural example of a laser processing apparatus. 3A is a partial cross-sectional side view schematically showing the modified layer forming step, and FIG. 3B is a partial enlarged view showing a part of FIG. 3A enlarged. . It is a partial cross section side view showing a crack judging step typically. It is an image figure which shows typically the example of the captured image imaged at a crack determination step.

  Embodiments of the present invention will be described below with reference to the accompanying drawings. The wafer processing method according to the present embodiment includes a protective member disposing step (see FIG. 1), a holding step (see FIG. 2), a reference width setting step, a modified layer forming step (see FIG. 3), and a crack determining step. (See FIGS. 4 and 5).

  In the protective member disposing step, a protective member is disposed on the front surface side of the wafer. In the holding step, the wafer is sucked and held on the chuck table of the laser processing apparatus via the protective member. In the reference width setting step, a reference width of the modified layer that is a reference for determination in the subsequent crack determination step is set.

  In the modified layer forming step, a laser beam is irradiated from the laser processing head of the laser processing apparatus toward the back side of the wafer to form a modified layer along the street (division planned line). In the crack determination step, it is determined whether or not a crack is generated from the modified layer toward the surface of the wafer based on the width of the modified layer imaged by the infrared camera of the laser processing apparatus. Hereinafter, the wafer processing method according to the present embodiment will be described in detail.

  FIG. 1A is a perspective view schematically showing a configuration example of a wafer that is an object of the wafer processing method according to the present embodiment, and FIG. It is a perspective view shown in FIG.

  As shown in FIG. 1A, a wafer 11 that is a target of the processing method of the present embodiment is a disk-shaped semiconductor wafer, and includes a central device region 13, an outer peripheral surplus region 15 surrounding the device region 13, and It has.

  The device region 13 on the surface 11a side of the wafer 11 is partitioned into a plurality of regions by streets (division planned lines) 17 arranged in a lattice pattern, and a device 19 such as an IC is formed in each region. The outer peripheral surface 11c of the wafer 11 is chamfered and has a circular cross section (see FIG. 3A).

  In the processing method of the present embodiment, first, a protection member disposing step of disposing a protection member on the surface 11a side of the wafer 11 is performed. As shown in FIG. 1B, the protective member 21 is a disc-like film having an outer diameter equivalent to that of the wafer 11, and an adhesive layer having adhesiveness is provided on the surface 21a side.

  However, the structure of the protection member 21 is not limited to this. Any member that can appropriately protect the surface 11a side of the wafer 11 in the steps after the holding step described later can be used as the protective member 21. For example, a glass substrate, a semiconductor substrate, a metal substrate, a resin substrate, or the like may be used as the protective member 21.

  In the protection member disposing step, the wafer 11 and the protection member 21 are aligned so that the surface 11a side of the wafer 11 and the surface 21a side of the protection member 21 face each other. Then, the protective member 21 is bonded to the wafer 11 by bringing the surface 21 a of the protective member 21 into contact with the surface 11 a of the wafer 11.

  After the protective member disposing step, a holding step for sucking and holding the protective member 21 attached to the wafer 11 on the chuck table of the laser processing apparatus is performed. FIG. 2 is a perspective view schematically showing a configuration example of the laser processing apparatus used in the present embodiment. As shown in FIG. 2, the laser processing apparatus 2 includes a base 4 that supports each component. The base 4 includes a rectangular parallelepiped base 6 and a wall 8 extending upward at the rear end of the base 6.

  On the upper surface of the base 6, a chuck table 10 that sucks and holds the wafer 11 through a protective member 21 is disposed. A laser processing head 12 that irradiates a laser beam toward the wafer 11 is provided above the chuck table 10. An infrared camera 14 is provided at a position adjacent to the laser processing head 12.

  Below the chuck table 10, a Y-axis movement mechanism (index feed mechanism) 16 that moves the chuck table 10 in the index feed direction (Y-axis direction) is provided. The Y-axis moving mechanism 16 includes a pair of Y-axis guide rails 18 that are fixed to the upper surface of the base 6 and are parallel to the Y-axis direction.

  A Y-axis moving table 20 is slidably installed on the Y-axis guide rail 18. A nut (not shown) is fixed to the rear surface side (lower surface side) of the Y-axis moving table 20, and a Y-axis ball screw 22 parallel to the Y-axis guide rail 18 is screwed to the nut.

  A Y-axis pulse motor 24 is connected to one end of the Y-axis ball screw 22. If the Y-axis ball screw 22 is rotated by the Y-axis pulse motor 24, the Y-axis moving table 20 moves in the Y-axis direction along the Y-axis guide rail 18.

  An X-axis movement mechanism (machining feed mechanism) 26 that moves the chuck table 10 in the machining feed direction (X-axis direction) is provided on the front surface side (upper surface side) of the Y-axis movement table 20. The X-axis moving mechanism 26 includes a pair of X-axis guide rails 28 that are fixed to the upper surface of the Y-axis moving table 20 and are parallel to the X-axis direction.

  An X-axis moving table 30 is slidably installed on the X-axis guide rail 28. A nut (not shown) is fixed to the rear surface side (lower surface side) of the X-axis moving table 30, and an X-axis ball screw 32 parallel to the X-axis guide rail 28 is screwed to the nut.

  An X-axis pulse motor 34 is connected to one end of the X-axis ball screw 32. When the X-axis ball screw 32 is rotated by the X-axis pulse motor 34, the X-axis moving table 30 moves in the X-axis direction along the X-axis guide rail 28.

  A support base 36 is provided on the surface side (upper surface side) of the X-axis moving table 30. On the upper part of the support base 36, the chuck table 10 is arranged. The chuck table 10 is connected to a rotation mechanism (not shown) provided below the support base 36 and rotates around the Z axis.

  The front surface of the chuck table 10 is a holding surface 10 a that sucks and holds the back surface 21 b of the protective member 21 attached to the wafer 11. A negative pressure of a suction source (not shown) acts on the holding surface 10 a through a flow path (not shown) formed inside the chuck table 10, and a suction force for sucking the protection member 21 is generated.

  A support arm 38 extending toward the front is provided on the upper front surface of the wall 8, and the laser processing head 12 and the infrared camera 14 are disposed at the tip of the support arm 38.

  The laser processing head 12 includes a condenser (not shown) for condensing a laser beam oscillated by a laser oscillator (not shown) inside the wafer 11 held by the chuck table 10. The laser processing head 12 irradiates a laser beam so as to be condensed inside the wafer 11 to form a modified layer by multiphoton absorption.

  The infrared camera 14 includes an imaging device that detects light in an infrared region that is difficult to be absorbed by the wafer 11, and images the modified layer formed on the wafer 11 from the back surface 11 b side. The captured image is stored in a storage device (not shown) and used by a control device (not shown) or the like as necessary.

  In the holding step, the protection member 21 attached to the wafer 11 is sucked by the chuck table 10 of the laser processing apparatus 2 described above. Specifically, first, as shown in FIG. 2, the wafer 11 and the protection are placed on the chuck table 10 with the holding surface 10 a of the chuck table 10 and the back surface 21 b of the protection member 21 facing each other. The member 21 is placed.

  Thereafter, if the negative pressure of the suction source is applied to the holding surface 10 a of the chuck table 10, the protection member 21 is sucked by the chuck table 10. Thus, the wafer 11 is sucked and held on the chuck table 10 via the protective member 21.

  After the holding step, a reference width setting step for setting the reference width of the modified layer used in the subsequent crack determination step in the laser processing apparatus 2 is performed. The reference width is set in a range of 3 μm to 5 μm, for example. The set reference width is stored in the storage device of the laser processing apparatus 2.

  In this way, by setting the reference width of the modified layer, it is possible to determine whether or not a crack has occurred in a subsequent crack determination step. In the present embodiment, the reference width is set to 4 μm. However, the present invention is not limited to this, and the reference width can be arbitrarily set.

  As a result of diligent research, the present inventor has found that the wafer 11 can be appropriately divided when the modified layer is formed so as to generate a crack from the modified layer toward the surface 11 a side of the wafer 11. The reason why the wafer 11 can be appropriately divided under such conditions is considered to be because the division of the wafer 11 is induced by the occurrence of a crack.

  And it discovered that the width | variety of a modified layer looks thick on the conditions which the above cracks generate | occur | produce compared with the conditions which a crack does not generate | occur | produce. This phenomenon is presumed to occur because the reflectance (transmittance) changes in a range wider than the width of the original modified layer due to light scattering in the cracks. That is, it can be confirmed whether or not the modified layer has been formed under appropriate conditions by determining the presence or absence of the occurrence of cracks based on the width of the observed modified layer.

  After the reference width setting step, a modified layer forming step for forming a modified layer along the street 17 of the wafer 11 is performed. 3A is a partial cross-sectional side view schematically showing the modified layer forming step, and FIG. 3B is a partial enlarged view showing a part of FIG. 3A enlarged. .

  As shown in FIGS. 3A and 3B, in the modified layer forming step, first, the laser processing head 12 is positioned above the wafer 11 held on the chuck table 10. The wafer 11 is irradiated with the laser beam 40 while the chuck table 10 and the laser processing head 12 are relatively moved.

  The laser beam 40 is oscillated using, for example, YAG, YVO4, or the like as a laser medium, and is irradiated on the back surface 11b side of the wafer 11. Further, the laser beam 40 is irradiated along the street 17 by the relative movement between the chuck table 10 and the laser processing head 12. A condensing point (focal point) 42 of the laser beam 40 is positioned inside the wafer 11.

  When a silicon wafer is used as the wafer 11, it is preferable to use a laser beam 40 having a wavelength in the infrared region (for example, 1064 nm). By using the laser beam 40 having such a wavelength that is difficult to be absorbed by the wafer 11 (easy to be transmitted through the wafer), a good modified layer 23 can be formed inside the wafer 11. When the modified layer 23 is formed along all the streets 17, the modified layer forming step ends.

  After the modified layer forming step, a crack determining step for determining whether or not a crack is generated from the modified layer 23 toward the surface 11a of the wafer 11 is performed. FIG. 4 is a partial cross-sectional side view schematically illustrating the crack determination step, and FIG. 5 is an image diagram schematically illustrating an example of a captured image captured in the crack determination step.

  4A and 4B, in the crack determination step, the infrared camera 14 is positioned above the modified layer 23 formed along the street 17, and the wafer 11 is moved from the back surface 11b side. Take an image. The captured image is stored in the storage device of the laser processing device 2.

  Since the infrared camera 14 includes an image sensor that detects light in the infrared region, when the wafer 11 is imaged by the infrared camera 14, the internal state of the wafer 11 can be confirmed. In the present embodiment, since the modified layer 23 is formed inside the wafer 11 in the modified layer forming step, the modified layer 23 is reflected in the captured image captured by the infrared camera 14.

  As shown in FIG. 4A, when the modified layer 23 is formed under appropriate conditions, a crack 25 is generated between the modified layer 23 and the surface 11 a of the wafer 11. In this case, the captured image captured by the infrared camera 14 is, for example, as shown in FIG.

  On the other hand, as shown in FIG. 4B, when the modified layer 23 is formed under inappropriate conditions, no cracks 25 are generated between the modified layer 23 and the surface 11 a of the wafer 11. In this case, a captured image captured by the infrared camera 14 is, for example, as illustrated in FIG.

  As can be seen from the comparison between FIG. 5A and FIG. 5B, the width of the modified layer 23 appears to be thicker in the condition where the crack 25 occurs than in the condition where the crack 25 does not occur. Therefore, by comparing the width of the modified layer 23 with the reference width set in the above-described reference width setting step, it can be confirmed whether or not the modified layer 23 is formed under appropriate conditions.

  The width of the modified layer 23 in the captured image can be detected by image processing or the like in the control device, for example. In this case, for example, the control device detects the width of the modified layer 23 by reading the captured image stored in the storage device and extracting the contour of the modified layer 23 in the captured image.

  When the detected maximum width of the modified layer 23 is greater than or equal to the reference width, the control device determines that a crack 25 has occurred between the modified layer 23 and the surface 11 a of the wafer 11. On the other hand, when the detected maximum width of the modified layer 23 is less than the reference width, the control device determines that no crack 25 has occurred between the modified layer 23 and the surface 11 a of the wafer 11.

  That is, in the present embodiment, when the detected maximum width of the modified layer 23 is 4 μm or more, it is determined that the crack 25 has occurred, and the detected maximum width of the modified layer 23 is less than 4 μm. It is determined that no crack 25 has occurred. Although the maximum width of the modified layer 23 is compared with the reference width here, the present invention is not limited to this. For example, the average width or the like of the modified layer 23 may be compared with the reference width.

  Under the condition that a good modified layer 23 suitable for dividing the wafer 11 is formed, a crack 25 from the modified layer 23 toward the surface 11a of the wafer 11 occurs. Therefore, by performing the crack determination step after the modified layer forming step as in the wafer processing method according to the present embodiment, it is determined whether or not the formation condition of the modified layer 23 is appropriate. Can be judged before.

  In addition, this invention is not limited to description of the said embodiment, A various change can be implemented. For example, in the above-described embodiment, an example in which the reference width of the modified layer is set to an arbitrary value has been shown, but the present invention is not limited to this. It is considered that the appropriate reference width of the modified layer varies depending on the depth at which the modified layer is formed, the material of the wafer 11, and the like. Therefore, the reference width of the modified layer may be set based on the actually measured width of the modified layer.

  In this case, in the reference width setting step, for example, the modified layer 23 is formed by irradiating the laser beam 40 along the streets 17 of the wafer 11 held on the chuck table 10 under the condition that the crack 25 does not occur. And the back surface 11b side of the wafer 11 is imaged with the infrared camera 14, and the width | variety of this modified layer 23 is measured.

  As the reference width, for example, a value slightly larger than the measured width of the modified layer 23 is preferably set. Since the reference width of the modified layer set in this way is based on the actually measured width of the modified layer 23, the determination accuracy in the crack determination step can be sufficiently increased.

  In this case, in the later modified layer forming step, the position of the condensing point (focal point) 42 of the laser beam 40 is changed in the incident direction, and the height is different from that of the modified layer 23 formed in the reference width setting step. The modified layer 23 is formed at the position. That is, in this case, a plurality of modified layers 23 along the streets 17 are formed in the thickness direction of the wafer 11.

  Moreover, although the embodiment described above illustrates an embodiment in which the detection of the width of the modified layer 23 and the determination of whether or not the crack 25 is generated are performed in the control device, the present invention is not limited to this. The detection of the width of the modified layer 23 and the determination of whether or not the crack 25 is generated may be performed by an operator.

  Further, in the above-described embodiment, the crack determining step for determining whether or not the crack 25 is generated is performed after the modified layer 23 along all the streets 17 is formed in the modified layer forming step. Is not limited to this.

  For example, after forming the modified layer 23 on an arbitrary street 17 in the modified layer forming step, a crack determining step for determining whether or not the crack 25 is generated on the modified layer 23 may be performed.

  If it is determined that the crack 25 has occurred in the target street 17, the modified layer 23 is also formed on the other streets 17 under the same conditions. On the other hand, when it is determined that the crack 25 has not occurred, the modified layer 23 is formed again by changing the conditions.

  That is, after performing the modified layer forming step (first modified layer forming step) for forming the modified layer 23 on an arbitrary street 17, the crack determining step for determining whether or not the crack 25 is generated is performed, If it is determined that the crack 25 has occurred, a modified layer forming step (second modified layer forming step) is performed in which the modified layer 23 is formed on the other streets 17 (remaining streets 17). To do.

  In addition, after performing the modified layer forming step (first modified layer forming step) for forming the modified layer 23 on an arbitrary street 17, a crack determining step for determining whether or not the crack 25 is generated is performed, When it is determined that the crack 25 has not occurred, the modified layer is formed on all the streets 17 including the arbitrary street 17 on which the modified layer 23 has already been formed under different conditions. Step (third modified layer forming step) is performed.

  In other words, a crack determination step is performed before all the modified layers 23 are formed. Thereby, since it can be determined before forming all the modified layers 23 whether or not the formation conditions of the modified layer 23 are appropriate, the formation conditions of the inappropriate modified layer 23 can be found and corrected at an early stage. .

  In addition, the configurations, methods, and the like according to the above-described embodiments can be changed as appropriate without departing from the scope of the object of the present invention.

DESCRIPTION OF SYMBOLS 11 Wafer 11a Front surface 11b Back surface 11c Outer peripheral surface 13 Device area | region 15 Outer peripheral surplus area | region 17 Street (division plan line)
DESCRIPTION OF SYMBOLS 19 Device 21 Protection member 21a Front surface 21b Back surface 23 Modified layer 25 Crack 2 Laser processing apparatus 4 Base 6 Base 8 Wall 10 Chuck table 12 Laser processing head 14 Infrared camera 16 Y-axis moving mechanism (index feed mechanism)
18 Y-axis guide rail 20 Y-axis moving table 22 Y-axis ball screw 24 Y-axis pulse motor 26 X-axis moving mechanism (machining feed mechanism)
28 X-axis guide rail 30 X-axis moving table 32 X-axis ball screw 34 X-axis pulse motor 36 Support base 38 Support arm 40 Laser beam 42 Condensing point (focal point)

Claims (3)

A wafer processing method for forming a modified layer inside a wafer along a plurality of scheduled division lines set on the surface of the wafer,
A protective member disposing step of disposing a protective member on the surface side of the wafer;
A holding step of holding the protective member side of the wafer with a chuck table after the protective member disposing step;
A reference width setting step for setting a reference width of a modified layer formed by irradiating a laser beam having a wavelength that passes through the wafer while focusing on the inside of the wafer;
After the reference width setting step, the laser beam is irradiated from the back side of the wafer held on the chuck table along an arbitrary division line while focusing on the inside of the wafer, and the inside of the wafer is A modified layer forming step of forming the modified layer along an arbitrary division line;
After the modified layer forming step, the modified layer of the wafer held on the chuck table is imaged from the back side of the wafer with an infrared camera, and the width of the imaged modified layer is the reference width. If the thickness is larger than the above, a method for determining a wafer comprising: a crack determination step for determining that a crack extending from the modified layer toward the surface of the wafer is present.   2. The wafer processing method according to claim 1, wherein the reference width set in the reference value setting step is 4 [mu] m. In the reference width setting step, the modified layer in which the crack is not elongated by irradiating the laser beam along the division line on which the modified layer of the wafer is not formed is formed. The width is imaged and measured with the infrared camera, the reference width is set based on the width,
In the modified layer forming step, the laser beam irradiated in the reference width setting step and the laser beam in which the position of the focal point is changed in the incident direction are irradiated along the modified layer, and along the planned division line 2. The wafer processing method according to claim 1, wherein a plurality of modified layers are formed in the thickness direction of the wafer.

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