JP2015011140A - Color filter formation substrate and organic el display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter formation substrate for a white light emitting organic EL display device that can prevent or suppress color shift and color mixture of an image to be displayed resulting from the entry of light from an organic EL element to each of adjacent pixels, and eliminate unevenness in display resulting from bubbles generated when an organic EL element formation substrate and the color filter formation substrate are bonded with an adhesive.SOLUTION: There is provided a color filter formation substrate 20 for a white light emitting organic EL display device arranging light shielding layers 12 in a light shielding area for pixel segmentation to segment a pixel area 17, where the position of the surface of the light shielding layer 12 most distant from a substrate 11 is determined at a position distant farther from the substrate 11 than the surface of a colored layer not on the substrate 11 side, and a transparent smoothing layer 16 is disposed to cover the colored layers and light shielding layers 12.

Description

  The present invention relates to a color filter forming substrate for an organic EL display device and an organic EL display device using the substrate, and more particularly to a color filter forming substrate for a white light emitting type organic EL display device.

  In recent years, organic EL display devices are self-luminous and have excellent visibility and do not require a backlight. Therefore, they can be thin and light, have a simple structure and can be manufactured at low cost, and are suitable for displaying moving images. Therefore, research and development and commercialization of a flat display device (also referred to as a flat panel) following a liquid crystal display device and a plasma display device are being promoted.

As a white light-emitting organic EL display device using a white light-emitting organic EL element (also referred to as an organic light-emitting element or an organic EL light-emitting element), as shown in FIG. In order to achieve both purity and high brightness, in addition to pixels (also referred to as colored pixels) provided with colored layers of R, G, and B colors for color filters, a form provided with high light transmissive pixels with high light transmittance Has been adopted.
Note that a high light transmission pixel is usually provided with a resin layer that is not colored or a resin layer that is slightly colored in accordance with the combined colors of R, G, and B. The transmissive pixel is referred to as a WHITE pixel, and the resin layer disposed in the WHITE pixel is referred to as a WHITE layer.
In addition, as shown in FIG. 13B, a mode is also adopted in which a circularly polarizing plate 130 is provided on the front surface (observer side) of the white light emission type organic EL display device to reduce reflection of external incident light. .
Alternatively, as shown in FIG. 13C, a layer made of a photosensitive resin in which a coloring material is dispersed is arranged in a region corresponding to a WHITE pixel, and this is used as a transmittance adjusting unit 113WA, so that external light is incident or A configuration is also adopted in which the reflection of incident external light on the electrode and metal wiring of the organic EL element is adjusted. (See Patent Document 3)
In the case of the organic EL display device shown in FIG. 13A, the reflectance of external light incident from the front surface (observer side) is usually about 97%.
In the case of the organic EL display device shown in FIG. 13B, the reflectance of external light incident from the front surface (observer side) is usually about 0.1%, and the display brightness is as shown in FIG. It is about 40% of the organic EL display device of the form shown in FIG.
In the case of the organic EL display device shown in FIG. 13B, the transmittance adjustment unit 113WA adjusts the incidence of external light and the reflection of the incident external light on the electrode and metal wiring of the organic EL element. However, reflection of external light is not sufficiently reduced, and uneven reflection is easy to see.
The organic EL display device is also referred to as an organic electroluminescence display device or an organic EL display device, and the display device is also referred to as a display panel.

As described above, there are various forms of white light emitting type organic EL display devices using white light emitting organic EL elements, and in each form, a white light emitting organic EL element is provided corresponding to each pixel. Although each pixel is controlled and driven by a TFT element, in any case, as a display device is highly refined, when a certain pixel region is viewed, adjacent pixels are added to the colored layer of the pixel region. White light from an organic EL element for displaying directly enters, or white light from an organic EL element for displaying an adjacent pixel enters through a colored layer for a color filter of the adjacent pixel, For these reasons, color shift and color mixing of the displayed image occur depending on the viewing direction.
This is because when the display device is made high-definition, the pixel size (pixel size) is reduced, so that the width of the light-shielding layer, also called a black matrix that divides the pixel region of the colored layer of each color of the color filter forming substrate, is constant. Since the pixel aperture ratio is significantly reduced, the width of the light shielding layer is made as narrow as possible to ensure the aperture ratio, and all the light from the organic EL element is applied to the color filter forming substrate. This is due to the fact that the incident angle is not spread in the direction orthogonal to the substrate surface, but has a wider incident angle.
When white light from an organic EL element for displaying a certain pixel passes through the color layer for the color filter of the pixel and enters the color layer of the adjacent pixel, the two colored layers are visible. Since the light is almost absorbed by the transmission characteristics in the region, the color of the image to be displayed especially when white light from the organic EL element for displaying a certain pixel directly enters the colored layer of the adjacent pixel. It has a great influence on shifts and color mixing.
With the demand for high-definition and high-quality display, the entry of light from the organic EL elements of adjacent pixels has become difficult to ignore in terms of quality.

In the case of each of the display devices 120, 120a, and 120b shown in FIG. 13, in order to efficiently extract the light emitted from the organic EL element, the organic EL element is disposed between the organic EL element formation substrate and the color filter formation substrate. And an adhesive layer made of an insulating resin (for example, an optical adhesive, an ultraviolet curable resin, an optical elastic resin, etc., corresponding to 114 in FIG. 13), and an organic EL element forming substrate The organic EL display device is formed by bonding the color filter forming substrate.
This is because light straightness is improved and light extraction efficiency is improved as compared with a hollow structure in which the adhesive is replaced with an inert gas.
However, since the adhesive is required to contain no solvent and a solventless adhesive having a high viscosity is used, the organic EL element forming substrate and the color filter forming substrate are bonded to each other via the adhesive. When aligning, bubbles may be generated, and the display causes unevenness due to the bubbles, thereby reducing the yield in the bonding step.

JP 2008-47340 A JP 2002-377776 A Japanese Patent Application No. 2011-047924

As described above, in a white light emitting type organic EL display device, in particular, with the demand for high definition and high quality display, each pixel has a light emission from an organic EL element of an adjacent pixel in terms of quality. The intrusion was not negligible and this response was required.
In addition, when the organic EL element forming substrate and the color filter forming substrate are bonded together with an adhesive, bubbles may be generated, and there is a problem in that display is uneven due to the bubbles. A response was also required.
The present invention corresponds to these, and in a white light emitting type organic EL display device, color shift or color mixing of a displayed image caused by light entering from an organic EL element of an adjacent pixel for each pixel. A white light emitting type that can eliminate or suppress display unevenness caused by bubbles generated when the organic EL element forming substrate and the color filter forming substrate are bonded together via an adhesive. An object of the present invention is to provide a color filter forming substrate for an organic EL display device.
Another object of the present invention is to provide a white light emitting type organic EL display device using such a color filter forming substrate.

  In the color filter forming substrate according to the first aspect of the present invention, a colored layer of each color for a color filter is arranged in a predetermined pixel region on one surface of a base material made of a transparent substrate, and light shielding for pixel division is performed. A color filter forming substrate for a white light source type organic EL display device in which a light shielding layer is arranged in a region to divide a pixel region, and the position of the surface of the light shielding layer farthest from the base material is It is characterized in that a transparent flattening layer is disposed so as to cover the colored layer and the light shielding layer at a position farther from the substrate than the surface of the colored layer that is not on the substrate side.

A color filter forming substrate according to a second aspect of the present invention is the color filter forming substrate according to the first aspect, wherein the colored layers are separated from each other and the colored layers are arranged, and the light shielding layer Is a structure composed of a single light-shielding layer, is in contact with one surface of the base material, is formed on the flattening layer side, and fills a portion where the colored layers extending from the pixel regions are separated from each other. It is characterized by being.
Here, “a structure composed of one light-shielding layer” means that the entire light-shielding layer has a continuous single-layer structure and is made of the same material.
A color filter forming substrate according to a third aspect of the present invention is the color filter forming substrate according to the second aspect, wherein the width of the portion of the light shielding layer that is further away from the base material than the colored layers is between the colored layers. Is wider than the width of the light-shielding portion that fills the separated portion.

  A color filter forming substrate according to a fourth aspect of the present invention is the color filter forming substrate according to the first aspect, wherein the colored layers for the color filters of the adjacent pixels extend in the pixel segmenting light-shielding region. The light-shielding layer has a structure composed of one light-shielding layer and is formed on the flattening layer side in contact with the surface of the colored layer that is not the base material. It is characterized by that.

The color filter forming substrate according to claim 5 is the color filter forming substrate according to claim 1, wherein the light shielding layer includes a first light shielding layer and a second light shielding layer, and the base material. The first light-shielding layer is disposed in contact with one surface of the base material so as to cover the first light-shielding layer. The colored layers extending from the pixel regions are arranged without gaps in the pixel-segmenting light-shielding region, and the bases of the colored layers of the respective colors of the pixel-segmented light-shielding region are arranged. A second light-shielding layer is provided on the flattening layer side in contact with a surface that is not on the material side.
A color filter forming substrate according to a sixth aspect of the present invention is the color filter forming substrate according to the fifth aspect, wherein the second light-shielding layer comprises a colored layer containing a blue pigment. The color filter forming substrate according to claim 7 is the color filter forming substrate according to claim 6, wherein the colored layer containing the blue pigment is the same as the blue colored layer for the color filter. And
Here, “a structure composed of two light-shielding layers” means that a first light-shielding layer and a second light-shielding layer are provided separately in a direction perpendicular to the surface of the substrate. This means that each of the first light-shielding layer and the second light-shielding layer has a continuous single-layer structure and is made of the same material. doing.

A color filter forming substrate according to an eighth aspect of the present invention is the color filter forming substrate according to the first aspect, wherein a first light-shielding layer is provided in contact with one surface of the base material, and the first The first light-shielding layer region includes colored layers extending from each pixel region so as to cover the light-shielding layer and spaced apart from each other in the first light-shielding layer region. The colored layer is filled with a portion where the colored layers are separated from each other, and is in contact with the surface of the colored layer of each color of the pixel-segmenting light-shielding region that is not on the base material side, and is wider on the planarizing layer side than the separated portion. Thus, the second light-shielding layer is provided.
Here, the respective light-shielding layers of the first light-shielding layer and the second light-shielding layer each mean that the whole is a continuous form and made of the same material.

  A color filter forming substrate according to a ninth aspect of the present invention is the color filter forming substrate according to any one of the first to eighth aspects, wherein the planarizing layer is made of an inorganic composition.

A color filter forming substrate according to a tenth aspect of the present invention is the color filter forming substrate according to any one of the first to ninth aspects, wherein the planarization is a convex shape from the base material surface in the light shielding layer region. The step of the convex portion on the surface opposite to the substrate side of the layer is 0.5 μm or less.
Here, “the step of the convex portion on the surface opposite to the substrate side of the flattening layer” means a surface far from the substrate of the flattening layer on the light shielding layer and the flattening layer on the colored layer. It means a difference in distance in a direction perpendicular to the substrate surface from a surface far from the substrate.
As shown in FIG. 1C, the surface of the planarization layer opposite to the substrate side is flat in the vicinity of the center of the pixel and in the portion covering the colored layer, but the portion covering the light shielding layer 12 is flat. Convex shape.
A color filter forming substrate according to an eleventh aspect of the present invention is the color filter forming substrate according to the tenth aspect, wherein the distance from the base material surface of the convex portion on the side opposite to the base material side of the planarization layer. Is a position that is the same as the distance from the substrate surface of the surface opposite to the substrate side of the flattening layer in the center of the pixel, and in the direction orthogonal to the pixels along the substrate surface, The distance from the end of the light-shielding layer in the part farther from the base material than each colored layer to the closest position is 1.0 μm or more.

  A color filter forming substrate according to a twelfth aspect of the present invention is the color filter forming substrate according to any one of the first to eleventh aspects, wherein the planarizing layer has a thickness of 2.0 μm or less. And

A color filter forming substrate according to a thirteenth aspect of the present invention is the color filter forming substrate according to any one of the first to twelfth aspects, wherein a light absorption layer is laminated in the pixel region. It is characterized by.
A color filter forming substrate according to a fourteenth aspect of the present invention is the color filter forming substrate according to the thirteenth aspect, wherein the light absorbing layer has a black pigment such as carbon black or titanium black dispersed therein as a coloring material. It is characterized by being contained.
A color filter forming substrate according to a fifteenth aspect of the present invention is the color filter forming substrate according to any one of the thirteenth to fourteenth aspects, wherein an average transmittance of the light absorbing layer in a C light source is 45% to 95%. It is characterized by being.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

  An organic EL display device according to a sixteenth aspect of the present invention is a white light source type organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are laminated. The described color filter forming substrate is used.

(Function)
By adopting such a configuration, the color filter forming substrate of the present invention, in particular, in response to the demand for higher definition and higher quality of display, the light from the organic EL element of the adjacent pixel for each pixel. Color shift and color mixing of the displayed image due to the penetration can be prevented or suppressed, and furthermore, bubbles generated when the organic EL element forming substrate and the color filter forming substrate are bonded together with an adhesive. It is possible to provide a color filter forming substrate capable of producing a white light emitting type organic EL display device which can eliminate display unevenness due to the display.
Specifically, a color layer for each color filter is arranged in a predetermined pixel area on one surface of a base material made of a transparent substrate, and a light shielding layer is arranged in a pixel classification light shielding area. A color filter forming substrate for an organic EL display device of a white light source type that divides a pixel area, and the position of the surface of the light shielding layer farthest from the substrate is on the substrate side of the colored layer By setting it as the form of the color filter formation board | substrate of invention of Claim 1 which arrange | positions the transparent planarization layer which makes it the position away from the said base material rather than the surface which does not have, and covers the said colored layer and the said light shielding layer. Has achieved this.
More specifically, in the color filter forming substrate of the invention of claim 1, the colored layers are separated from each other and the colored layers are arranged, and the light shielding layer has a single layer structure. The embodiment of the invention of claim 2, in which the colored layer formed on the flattening layer side in contact with one surface of the base material and extending from each pixel region is buried, is buried. It is done.
Alternatively, in the color filter forming substrate according to the first aspect of the present invention, the colored layers for the color filters of the adjacent pixels are respectively extended and arranged without any gaps in the light blocking area for pixel division. The light-shielding layer has a single-layer structure, and is in contact with the surface of the colored layer that is not the base material, and is formed on the flattening layer side.
Or it is a color filter formation board | substrate of invention of Claim 1, Comprising: The said light shielding layer is a 2 layer structure which provided the 1st light shielding layer and the 2nd light shielding layer in the direction orthogonal to the said base material, and provided apart A first light-shielding layer is disposed in contact with one surface of the base material, and the colored layers extending from each pixel region so as to cover the first light-shielding layer are separated from each other by the pixel section. The second light-shielding layer is disposed on the flattening layer side in contact with the surface of the colored layer of each color of the pixel-segmenting light-shielding region that is not on the base material side. The form of the invention of Claim 5 which has arrange | positioned the layer is mentioned.
Alternatively, in the color filter forming substrate according to the first aspect of the present invention, the first light-shielding layer is disposed in contact with one surface of the base material, and the first light-shielding layer is covered, The colored layers extending from the pixel region are arranged apart from each other in the first light-shielding layer region, and the colored layers in the first light-shielding layer region are separated from each other. A second light-shielding layer is embedded in contact with the surface of the colored layer of each color of the pixel-segmenting light-shielding region that is not on the base material side and wider on the planarizing layer side than the separated portion. The form of the invention of Claim 8 arrange | positioned is mentioned.

Here, in the white light source type organic EL display device using the color filter forming substrate of the present invention, the color shift of the displayed image caused by the entrance of light from the organic EL element of the adjacent pixel for each pixel The fact that color mixing can be prevented or suppressed will be briefly described with reference to FIG.
In each color filter forming substrate shown in FIGS. 9B and 9C, it is assumed that the adhesive layer 14 and the planarizing layer 16 have similar refractive indexes.
First, in the case of a white light source type organic EL display device using a conventional color filter forming substrate 10A, as shown in FIG. 9A, most of the white light from the organic EL elements arranged in the pixel region 17a is obtained. Advances in a direction orthogonal to the surface of the base material 11 of the color filter forming substrate 10A, like the light ray L11, and reaches and passes through the colored layer 13R of the pixel region 17a, but a part thereof like the light ray L13 The colored layer 13R disposed in the pixel region 17a passes through the colored layer 13G in the adjacent pixel region 17b and passes through the colored layer 13R, or is directly disposed in the adjacent pixel region 17b like the light beam L12. It enters and passes through the layer 13G.
In the case of the light ray L13, since it passes through the colored layer 13R and the colored layer 13G, most of the transmission characteristics of the colored layer 13R and colored layer 13G are cut, but in the case of the light ray L12, only the colored layer 13G is passed. The light that should not be emitted is emitted with the transmission characteristics of the colored layer 13G.
For this reason, in particular, due to the light ray L12, a color shift or color mixing of the displayed image occurs depending on the viewing direction.
On the other hand, as shown in FIG. 9B, in the case of the organic EL display device using the color filter forming substrate 10 according to the invention of claim 2, a light beam L22 corresponding to the light beam L12 shown in FIG. Is cut by the light-shielding layer 12, and a light beam (not shown) corresponding to the light beam L13 shown in FIG. 9A is also cut.
For this reason, there is no color shift or color mixing of the displayed image depending on the viewing direction due to such light rays.
Further, as shown in FIG. 9C, in the case of an organic EL display device using the color filter forming substrate 10a according to the invention of claim 4, a light beam L22 corresponding to the light beam L12 shown in FIG. Is cut by the light-shielding layer 12a, and a part of the light beam L33 corresponding to the light beam L13 shown in FIG.
In the case of this form, since the light ray L22 corresponding to the light ray L12 shown in FIG. 9A is cut by the light-shielding layer 12a, the color shift or color mixture of the displayed image does not occur depending on the viewing direction.
In the form of the invention of claim 4, it is only necessary that most of the light ray L33 corresponding to the light ray L13 shown in FIG. 9A can be cut by the first light shielding layer 12b1, and the line width of the first light shielding layer 12b1 is set to be the first. Similarly, even if it is smaller than the line width of the second light shielding layer 12b2, the color shift and color mixing of the displayed image depending on the viewing direction caused by the light rays corresponding to the light rays L12 and L13 shown in FIG. Does not occur.
In the case of the organic EL display device using the color filter forming substrate 10a according to the fifth aspect of the invention, the light corresponding to the light L12 shown in FIG. Since most of the light rays cut by the layer 12b2 and corresponding to the light ray L13 shown in FIG. 9A are cut by the first light-shielding layer 12b1 shown in FIG. 3, the light rays L12 and L13 shown in FIG. No color shift or color mixing of the displayed image due to the light rays corresponding to.
Further, in the case of the organic EL display device using the color filter forming substrate 10h2 according to the eighth aspect of the invention, the light beam corresponding to the light beam L12 shown in FIG. 9A can be cut by the light shielding layer 12H2. Since most of the light beam corresponding to the light beam L13 shown in FIG. 9A can also be cut, the color shift of the displayed image caused by the light beams corresponding to the light beams L12 and L13 shown in FIG. Color mixing does not occur.

  In the form of the invention of claim 2, the width of the portion of the light shielding layer that is further away from the substrate than the colored layers is wider than the width of the light shielding portion that fills the portion where the colored layers are separated from each other. In the case of the organic EL display device using the color filter forming substrate 10h1 shown in FIG. 4 according to the third aspect of the invention, the color shift and color mixing of the displayed image can be effectively suppressed. In the case of the filter forming substrate 10h1, the width of the light shielding layer that is more distant from the base material than the colored layers and the width of the light shielding portion that fills the part where the colored layers are separated from each other are the same. Compared with the case where a color filter forming substrate (see FIG. 1) is used, the positional accuracy of forming the colored layer of each color can be made relatively rough.

A color filter forming substrate according to claim 5 of the present invention, wherein the second light-shielding layer is replaced with a resin composition layer containing a blue color material. In the case of the organic EL display device used, a light beam corresponding to the light beam L12 shown in FIG. 9A is a colored layer disposed in each pixel region from the transmission characteristics of the resin composition layer containing the blue color material. The color shift and color mixing of the displayed image caused by the light beam corresponding to the light beam L12 shown in FIG. 9A can be effectively suppressed.
And in the case of the form of the claim 7, the resin composition layer containing the blue color material is made of the same resin composition as the blue color layer for the color filter. The formation of the resin composition layer containing the blue color material can be performed by the same treatment.

  In the color filter forming substrate of any one of the above forms, in the case of the form of the ninth aspect, the planarizing layer is made of an inorganic composition, it is easy to ensure gas barrier performance.

In the color filter forming substrate of any one of the above forms, the step difference of the convex portion on the surface opposite to the base material side of the planarizing layer, which is convex from the base material surface in the light shielding layer region, is 0.5 μm. In the case of the embodiment according to claim 10, when an organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are bonded to each other with an adhesive made of an insulating resin is used. It is possible to suppress the generation of bubbles in the bonding process by the above, to prevent uneven display due to the bubbles, and to improve the yield in the bonding process.
Furthermore, the distance from the base material surface of the surface opposite to the base material side of the flattening layer in the convex portion is the base material surface of the surface opposite to the base material side of the flattening layer in the pixel center portion. And the closest position from the edge of the light-shielding layer in the part farther from the base material than the colored layers, in the same direction as the distance from and in the direction orthogonal to the pixels along the base material surface, In the case of the form of claim 11, in the bonding process, the paintability can be improved, the generation of bubbles can be further suppressed, and the uneven display due to the bubbles can be prevented. It is possible to improve the yield in the bonding step.
As for the level difference of the convex part, the level of the level difference is determined by fixing the resin for forming the leveling layer and changing the position of the surface of the light shielding layer farthest from the base material when forming the leveling layer. From the result when the organic EL element forming substrate and the color filter forming substrate are bonded with an adhesive layer at various steps, the step is preferably 0.5 μm or less.
Further, the distance Ld can be changed by fixing the position of the surface of the light shielding layer farthest from the base material of the light shielding layer and changing the amount of the solvent component of the planarization layer forming resin, thereby changing various distances. From the result when the organic EL element forming substrate and the color filter forming substrate are bonded to each other with an adhesive layer at Ld, the distance Ld is preferably 1.0 μm or more.
It should be noted that when the organic EL element forming substrate and the color filter forming substrate are bonded together, the adhesive is solventless and has a high viscosity, and the bonding is usually carried out in a suitable amount at a plurality of locations on one substrate. After drooping, the two substrates are evacuated in order to remove bubbles, and the two substrates are pressed to obtain a predetermined gap so that the adhesive spreads over the entire substrates.

  In the color filter forming substrate of any one of the above forms, the thickness of the planarizing layer is 2.0 μm or less. In the case of the form of the aspect 12, the organic EL element forming substrate and the color filter forming substrate are reduced. In an organic EL display device having a structure in which an adhesive made of a photoelastic insulating resin is bonded, optical characteristics can be ensured and the entire display device can be thinned.

特に、表示の際の可視光領域（４００ｎｍ〜７００ｎｍ波長領域）全体にわたり光吸収層の光透過率のバラツキが少ないフラットである場合、光吸収層を設けたことによる表示の際の色ずれを少ないものとできる。 In any one of the above forms, by adopting the form of claim 13 formed by laminating a light absorption layer in the pixel region, in addition to the effect of preventing color mixing, in addition to the reduction of external light reflection, It is possible to manufacture a display device that can achieve reduction prevention.
Specific examples of the light-absorbing layer include those in which a black pigment such as carbon black or titanium black is dispersed as a coloring material in the resin, but is not limited thereto. In these embodiments, the average transmittance of the light absorption layer in the C light source is 45% to 95%. In the case of the embodiment of the present invention, in particular, in addition to the effect of reducing the reflection of external light, the luminance during display is It can be made larger than the form shown in FIG. 13B using a circularly polarizing plate.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In particular, in the case where the light absorption layer is flat with little variation in light transmittance over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.

  In this way, the present invention, in particular, in response to the demand for higher definition and higher quality of display, the display of an image to be displayed due to the entrance of light from the organic EL element of the adjacent pixel for each pixel. Color shift and color mixing can be prevented or suppressed, and display unevenness due to bubbles generated when the organic EL element forming substrate and the color filter forming substrate are bonded together with an adhesive can be eliminated. Thus, it is possible to provide a color filter forming substrate capable of producing a white light emitting type organic EL display device.

FIG. 1A is a partial sectional view of a first example of an embodiment of a color filter forming substrate of the present invention, and FIG. 1B is a color of the first example shown in FIG. FIG. 1C is a partial cross-sectional view of an organic EL display device using a filter-formed substrate, and FIG. 1C is an enlarged cross-sectional view showing an A1 portion of FIG. FIG. 2A is a partial cross-sectional view of a second example of an embodiment of the color filter forming substrate of the present invention, and FIG. 2B is a color of the second example shown in FIG. FIG. 2C is a partial cross-sectional view of an organic EL display device using a filter-formed substrate, and FIG. 2C is an enlarged cross-sectional view showing an A2 portion of FIG. 3A is a partial cross-sectional view of a third example of the embodiment of the color filter forming substrate of the present invention, and FIG. 3B is a color of the third example shown in FIG. FIG. 3C is a partial cross-sectional view of an organic EL display device using a filter-formed substrate, and FIG. 3C is an enlarged cross-sectional view showing an A3 portion of FIG. It is a partial cross section figure of the modification of the 1st example of embodiment of the color filter formation board | substrate of this invention. FIG. 5A is a partial cross-sectional view of the fourth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 5B is the color of the fourth example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. 6A is a partial sectional view of a fifth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 6B is a color of the fifth example shown in FIG. 6A. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. It is a partial cross section figure of the 6th example of Embodiment of the color filter formation board | substrate of this invention. FIG. 8A is a partial cross-sectional view of the color filter forming substrate of the first example shown in FIG. 1A. FIGS. 8B and 8C are the first example, respectively. It is a partial sectional view showing a modification of the color filter forming substrate. FIG. 9A is a partial cross-sectional view showing light rays from an organic EL element in an organic EL display device using a conventional color filter forming substrate 10A, and FIG. 9B is shown in FIG. FIG. 9C is a partial sectional view showing light rays from an organic EL element in an organic EL display device using the color filter forming substrate 10 of the first example, and FIG. 9C is a second example shown in FIG. It is the partial cross section figure which showed the light ray from the organic EL element in the organic EL display apparatus using the color filter formation board | substrate 10a. It is the schematic layer block diagram which showed the structural example of the organic EL element. It is the figure which showed the spectral transmittance characteristic of the light absorption layer. It is the figure which showed the relationship between the transmittance | permeability of a light absorption layer, and the transmittance | permeability of the external light which passed the light absorption layer twice. FIG. 13A is a partial cross-sectional view of a conventional organic EL display device provided with a WHITE layer, and FIG. 13B is a front view (observer side) of the display device shown in FIG. FIG. 13C is a partial cross-sectional view of an organic EL display device provided with a circularly polarizing plate. FIG. 13C is a display device shown in FIG. 13A in which a transmittance adjusting unit is provided in a conventional WHITE layer forming region. It is a partial cross section figure of an organic electroluminescence display.

First, the 1st example of embodiment of the color filter formation board | substrate of this invention is demonstrated based on Fig.1 (a).
In the color filter forming substrate 10 of the first example, the color layers 13R, 13G, and 13B for each color filter are arranged on a predetermined pixel region 17 on each surface 11S of the base material 11 made of a transparent substrate. 1 is a color filter forming substrate for a white light source type organic EL display device, in which the light blocking layer 12 is arranged in the pixel partitioning light blocking region 18 and the pixel region 17 is partitioned. As shown, the colored layers are spaced apart from each other, and the light-shielding layer 12 is formed of one light-shielding layer and is in contact with one surface 11S of the substrate 11, A portion where the colored layers extending from each pixel region are separated is filled.
Here, the width of the light-shielding layer 12 is the width of the pixel-segmenting light-shielding region 18.
In particular, in the first example, the position of the surface 12S of the light shielding layer 12 farthest from the base material 11 is farther from the base material 11 than the surface of the colored layers 13R, 13G, and 13B that is not on the base material 11 side. The transparent flattening layer 16 is disposed so as to cover the colored layers and the light shielding layer 12.
In the first example, as shown in FIG. 1C, the planarizing layer 16 has a convex portion 16 </ b> T having a convex shape in a direction away from the surface 11 </ b> S of the substrate 11 in a portion covering the light shielding layer 12. However, the step δ1 of the convex portion on the surface opposite to the substrate 11 side of the planarizing layer 16 is 0.5 μm or less. Furthermore, in the first example, the distance from the base material surface 11S of the surface opposite to the base material 11 side of the flattening layer 16 in the convex portion 16T is the base material 11 of the flattening layer 16 in the pixel central portion. The light-shielding layer at a position that is the same as the distance from the base material surface 11S on the surface opposite to the side, in a direction that is orthogonal to the pixels along the base material surface and that is farther from the base material than the colored layers. The distance Ld1 from the end to the nearest position is 1.0 μm or more.
As shown in FIG. 1B, the color filter forming substrate 10 of the first example is bonded to the organic EL element forming substrate 20 via the adhesive layer 14 to form an organic EL display device.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multifunction terminal device (also referred to as a high function terminal device), but is not limited thereto.
In FIG. 1A, the WHITE pixel is not clearly shown, but the area of the WHITE pixel is also divided by the pixel classification light shielding layer 12.
In particular, in this example, the light shielding layer 12 of the pixel classification light shielding region 18 is composed of a single layer in contact with the one surface 11S of the substrate 11.
The color filter forming substrate 10 of the first example includes an organic EL element forming substrate 20 having an organic EL element layer 22A in which a white light emitting organic EL element (also referred to as an organic light emitting element or an organic EL light emitting element) is formed for each pixel. Then, an insulating resin layer 14 is sandwiched between them, and the organic EL display device is formed as shown in FIG.

In the color filter forming substrate 10 of the first example, the position of the surface 12S of the light shielding layer 12 farthest from the base material 11 is set to the base of the colored layers 13R, 13G, and 13B that are not on the base material 11 side. By being positioned away from the material 11, when used in a white light emitting type organic EL display device, certain pixels corresponding to the light beam L12 and the light beam L13 in the conventional organic EL display device shown in FIG. It is assumed that each light ray emitted from the organic EL element 17 enters the colored layer of the adjacent pixel region can be cut, and accordingly, depending on the viewing direction caused by such a ray, the display can be performed. Color shift and color mixing of the generated image are prevented.
The organic EL element forming substrate 20 and the color filter forming substrate 10 are bonded to each other with the adhesive 14 made of an insulating resin by setting the step δ1 of the convex portion 16T of the planarizing layer 16 to 0.5 μm or less. When the organic EL display device having the structure described above (see FIG. 1B) is produced, the generation of bubbles in the bonding process using the adhesive 14 can be suppressed, and uneven display due to the bubbles can be prevented. It is supposed that the yield in can be improved.
Furthermore, the distance from the base material surface 11S of the surface opposite to the base material 11 side of the flattening layer 16 in the convex portion 16T is the surface opposite to the base material 11 side of the flattening layer 16 in the pixel center portion. The position closest to the edge of the light-shielding layer in the part farther from the base material than the colored layers in the direction perpendicular to the pixels along the base material surface at the same position as the distance from the base material surface 11S By setting the distance Ld1 to 1.0 μm or more, it is possible to improve the paintability in the bonding process, further suppress the generation of bubbles, and prevent uneven display due to the bubbles. The yield in the process can be improved.

Each member of the color filter forming substrate 10 shown in FIG. 1A and the organic EL display device shown in FIG. 1B will be described.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
This is because the alkali-free glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and since it does not contain an alkali component in the glass, it can be suitably used for a color filter for a display device. .
As the substrate, a transparent transparent substrate is usually used.

<Light Shielding Layer 12 in Pixel Shielding Area>
As the light-shielding colored layer for forming the light-shielding layer 12 of the pixel segmentation region that segments the pixel region of the color layer for each color filter, for example, here, carbon black covered with a resin such as an epoxy resin is used. A pigment (pigment) dispersed in a binder resin is used.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the formation of the light-shielding colored layer for the light-shielding layer 12 in the pixel-segmenting light-shielding region is performed using a photolithography method. In this case, examples of the binder resin include acrylate-based, methacrylate-based, and polycinnamic acid. A photosensitive resin having a reactive vinyl group such as vinyl or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming the light-shielding layer 12 in the pixel-segmenting light-shielding region containing the black colorant and the photosensitive resin, and further increased as necessary. Sensitizers, coatability improvers, development improvers, crosslinking agents, polymerization inhibitors, plasticizers, flame retardants and the like may be added.
Note that the light-shielding colored layer for forming the light-shielding layer 12 in the pixel-segmenting light-shielding region may be formed by using a printing method or an ink-jet method. In this case, as the binder resin, for example, polymethyl Methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, malein Examples include acid resins and polyamide resins.
The shape of the opening pattern of the light shielding layer 12 in the light shielding area for pixel division and the arrangement of the colored layers of each color are not limited. There are also examples in which the shape of the opening pattern of the light shielding layer 12 in the pixel classification light shielding region is a stripe shape, or in which the arrangement of the colored layers is changed, such as a dogleg shape or a delta arrangement.
Here, the light shielding layer has an optical density in the visible light region of 2.0 or more, preferably 4.0 or more.

<Colored layers 13R, 13G, 13B>
In this example, the colored layers for forming the color filters are the three colored layers of the red colored layer 13R, the green colored layer 13G, and the blue colored layer 13B.
The colored layer of each color is formed by using a resin composition for forming a colored portion in which a coloring material (also referred to as a coloring material) such as a pigment or a dye of each color is dispersed or dissolved in a binder resin. Say).
As the binder resin used in the colored layer, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The thickness of the colored layer of each color is usually set to about 1 μm to 5 μm.
The color of the colored layer is not particularly limited as long as it includes at least three colors of red, green, and blue. For example, three colors of red, green, and blue, or red, green, blue, and yellow Or five colors such as red, green, blue, yellow, and cyan.
Examples of the colorant used in the red (also referred to as R) colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Can be mentioned.
These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green (also referred to as G) colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, and isoindoline pigments. Examples thereof include pigments and isoindolinone pigments.
These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue (also referred to as B) coloring layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. .
These pigments may be used alone or in combination of two or more.

<WHITE layer>
Although not explicitly shown in FIG. 1A, a resin having a composition in which the coloring material (coloring material) is removed from the resin composition that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B described above. Although it is used and formed by photolithography, the formation method is not limited to this.

<Planarization layer 16>
The material for the flattening layer 16 is preferably a material that has good optical properties, good flatness, can protect each coloring, and has good bondability with the adhesive layer 14, but is a thermosetting resin formed by coating. A composition and a photocurable resin composition are mentioned.
In the case of a film member that forms a planarization layer 16 by laminating a film, it is particularly preferable from the viewpoint of production.
In the first example, the thickness t1 of the planarization layer 16 at the center of the pixel is 2 μm or less, but by setting the thickness t1 to 2 μm or less, the organic EL element forming substrate and the color filter forming substrate are made of an insulating resin. In an organic EL display device having a structure bonded with an adhesive layer, good optical characteristics can be secured, and the entire display device can be thinned.
The photocurable resin composition for forming a coating film is the same as the binder resin used for the colored layer for forming each color filter, for example, acrylate, methacrylate, polyvinyl cinnamate, or ring. A photosensitive resin having a reactive vinyl group such as a synthetic rubber is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
In the first example, the color filter forming substrate is imposed to form each colored layer and the light shielding layer 12, and then the resin composition is applied by a spin coating method.
Examples of the thermosetting resin composition for forming a coating film include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.
Examples of the film member for forming a laminate include a thermosetting resin film (also referred to as a sheet). On the side where a light-blocking layer for pixel division and a colored layer for each color filter are formed by a roll laminator or the like. The film member is placed on the substrate, and the resin is flowed with heat and pressure to be sealed.
For example, when both sides of a resin film based on a semi-cured epoxy resin are used in a form protected with a peelable film, it is easy to handle, and is applied in a short time at a low temperature with a roll laminator. Can be cured.
Further, the planarizing layer is made of ITO, SiO ₂ , Si _x N _y O _z (nitride silicate: x, y, z is an integer) or Si _x C _y O _z (carbonized silicate: x, y, z is an integer). You may form with such an inorganic composition.
When the planarizing layer is made of an inorganic composition, it is easy to ensure gas barrier properties.

<Adhesive layer 14>
Examples of the material of the adhesive layer 14 that is an insulating resin layer include a thermosetting resin composition and a photocurable resin composition.
The photocurable resin composition is the same as the binder resin used for the color layers for forming the color filter, for example, acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber A photosensitive resin having a reactive vinyl group is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
Examples of the thermosetting resin composition include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

<Organic EL element formation substrate 20>
(1) Substrate 21
As the base material 21, basically, the same material as that of the base material 11 can be used. However, in the case of the display device shown in FIG. 1B using the color filter of the first example, the base material 11 is used. Since it is emitted from the side to the outside and displayed, it does not need to be transparent.

(2) Organic EL element (also referred to as organic light-emitting element or organic EL light-emitting element) 22
The white light-emitting organic EL element 22 shown in FIG. 1B is not explicitly shown in FIG. 1B, but has a material configuration as shown in FIG. 10, for example.
The organic EL element 22 shown in FIG. 10 uses three materials that emit red, green, and blue, and emits white light together.
Of course, the combination of the above three materials is not limited as long as desired white light emission can be achieved.
(Organic EL layer 26)
The organic EL layer 26 (corresponding to 22A in FIG. 1) forming the organic EL element 22 is composed of one or more organic layers including at least the light emitting layer 27.
Examples of the organic layer constituting the organic EL layer 26 other than the light emitting layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer.
This hole transport layer is often integrated with the hole injection layer by imparting a hole transport function to the hole injection layer.
In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited.
The organic EL layer may have a general configuration, and only the light emitting layer, hole injection layer / light emitting layer, hole injection layer / light emitting layer / electron injection layer, hole injection layer / hole blocking layer. / Light emitting layer / electron injection layer, hole injection layer / light emitting layer / electron transport layer, and the like can be exemplified.
The light emitting material in the white light emitting organic EL element 22 is hardly composed of a single compound, and generally, light emitting materials having two to three colors are used.
The emission spectrum is a combination of the spectra of the luminescent materials of each color.
(Anode 25, cathode 28)
As a conductive material for forming the electrode layers of the anode 25 and the cathode 28, a metal material is generally used. However, an organic material or an inorganic compound may be used, or a plurality of materials may be mixed and used.
In addition, the electrode layers of the anode and the cathode are appropriately selected as to whether or not they have transparency depending on the light extraction surface.
A conductive material having a high work function is preferably used for the anode 25 so that holes can be easily injected, and a conductive material having a low work function is preferably used for the cathode 28 so that electrons can be easily injected.
Examples of the conductive material include In—Zn—O (IZO), In—Sn—O (ITO), Zn—O—Al, and Zn—Sn—O when transparency is required. In the case where transparency is not required, metals can be used, specifically, Au, Ta, W, Pt, Ni, Al, Pd, Cr, Al alloy, Ni alloy, Cr alloy, etc. be able to.
Both the electrode layers of the anode 25 and the cathode 28 preferably have a relatively small resistance.
As a method for forming the electrode layer, a general method for forming an electrode can be used, and examples thereof include a sputtering method, an ion plating method, a vacuum deposition method, a CVD method, and a printing method.
An example of the patterning method for the electrode layer is a photolithography method.

Next, the 2nd example of embodiment of the color filter formation board | substrate of this invention is given.
Similarly to the first example, the color filter forming substrate 10a of the second example has the color layers 13R, 13G, and 13B for the respective colors on the one surface 11S of the base material 11 made of a transparent substrate. This is a color filter forming substrate for a white light source type organic EL display device, which is arranged in a predetermined pixel region 17 and also has a light shielding layer 12a arranged in a pixel partitioning light shielding region 18 to partition the pixel region 17. However, as shown in FIG. 2A, in the second example, in particular, the colored layers for the color filters of the adjacent pixels are respectively extended in the pixel-partitioning light-shielding region 18 and arranged without gaps. The light shielding layer 12a has a structure composed of one light shielding layer, and is formed on the flattening layer 16 side in contact with the surface of the colored layer that is not the base material.
Here, the width of the light-shielding layer 12a is the width of the pixel-segmenting light-shielding region 18.
Also here, the position of the surface 12aS of the light shielding layer 12a farthest from the base material 11 is a position farther from the base material 11 than the surface of the colored layers 13R, 13G, 13B that is not the base material 11 side, A transparent planarizing layer 16 is disposed so as to cover each colored layer and the light shielding layer 12a.
Then, as in the first example, as shown in FIG. 2C, the planarizing layer 16 has a convex portion 16T that has a convex shape in the direction away from the surface 11S of the substrate 11 in the portion covering the light shielding layer 12a. However, the level difference δ2 of the convex portion on the surface opposite to the substrate 11 side of the planarizing layer 16 is 0.5 μm or less.
Further, as in the first example, the distance from the base material surface 11S of the surface opposite to the base material 11 side of the flattening layer 16 in the convex portion 16T is the base material 11 of the flattening layer 16 in the pixel central portion. The light-shielding layer at a position that is the same as the distance from the base material surface 11S on the surface opposite to the side, in a direction that is orthogonal to the pixels along the base material surface and that is farther from the base material than the colored layers. The distance Ld2 from the end of the substrate to the nearest position is 1.0 μm or more. The color filter forming substrate 10a of the second example is also bonded to the organic EL element forming substrate 20 as shown in FIG. The organic EL display device is formed by being bonded through the agent layer 14.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device), but the application is not limited thereto.
The same members as those in the first example are applied as each member.

Also in the color filter forming substrate 10a of the second example, the position of the surface 12aS of the light shielding layer 12 farthest from the base material 11 is set to be higher than the surface of the colored layers 13R, 13G, and 13B that are not on the base material 11 side. By being positioned away from the material 11, when used in a white light emitting type organic EL display device, certain pixels corresponding to the light beam L12 and the light beam L13 in the conventional organic EL display device shown in FIG. It is assumed that each light ray emitted from the organic EL element 17 enters the colored layer of the adjacent pixel region can be cut, and accordingly, depending on the viewing direction caused by such a ray, the display can be performed. Color shift and color mixing of the generated image are prevented.
Then, by setting the step δ2 of the convex portion 16T of the planarizing layer 16 to 0.5 μm or less, the organic EL element forming substrate 20 and the color filter forming substrate 10 are bonded together with an adhesive 14 made of an insulating resin. When the organic EL display device having the structure described above (see FIG. 1B) is produced, the generation of bubbles in the bonding process using the adhesive 14 can be suppressed, and uneven display due to the bubbles can be prevented. It is supposed that the yield in can be improved. Furthermore, the distance from the base material surface 11S of the surface opposite to the base material 11 side of the flattening layer 16 in the convex portion 16T is the surface opposite to the base material 11 side of the flattening layer 16 in the pixel center portion. The position closest to the edge of the light-shielding layer in the part farther from the base material than the colored layers in the direction perpendicular to the pixels along the base material surface at the same position as the distance from the base material surface 11S By setting the distance Ld2 to 1.0 μm or more, it is possible to improve the paintability in the bonding process, to further suppress the generation of bubbles, and to prevent display unevenness due to the bubbles. The yield in the process can be improved.

Next, the 3rd example of embodiment of the color filter formation board | substrate of this invention is given.
Similarly to the first example and the second example, the color filter forming substrate 10b of the third example is also provided with the colored layers 13R, 13G, and 13B for each color filter on the one surface 11S of the base material 11 made of a transparent substrate. Are arranged in a predetermined pixel area 17 and each pixel color 17 is provided with a light shielding layer 12b in a pixel sorting light shielding area 18, and the color for a white light source type organic EL display device. Although it is a filter forming substrate, as shown in FIG. 3A, the light shielding layer 12b is formed by separating the first light shielding layer 12b1 and the second light shielding layer 12b2 in a direction perpendicular to the base material 11. It is a structure composed of two light-shielding layers provided, in contact with one surface 11S of the substrate 11, a first light-shielding layer 12b1 is disposed, and each of the first light-shielding 1b1 layers is covered, The colored layers extending from the pixel region are In the light-shielding area for segmentation, the second layer is disposed on the flattening layer 16 side in contact with the surface that is not on the substrate 11 side of the colored layer of each color of the pixel-shading light-shielding area 18. The light shielding layer 12b2 is disposed.
Here, the width of the first light-shielding layer 12b1 and the width of the second light-shielding layer 12b2 are the same as the width of the pixel-segmenting light-shielding region 18.
Also here, the surface 12bS farthest from the one surface 11S of the substrate 11 of the second light-shielding layer 12b2 of the pixel-segmenting light-shielding region 18 is the side that is not on the substrate 11 side of the colored layer for each color filter. It is formed at a position farther from the one surface 11S of the substrate 11 than the surface.
Then, as in the first example and the second example, as shown in FIG. 2C, the planarizing layer 16 has a convex shape in a direction away from the surface 11S of the substrate 11 in a portion covering the light shielding layer 12a. The level difference δ3 of the convex portion on the surface opposite to the substrate 11 side of the planarizing layer 16 is 0.5 μm or less.
Further, as in the first example and the second example, the distance from the base material surface 11S of the surface of the convex portion 16T opposite to the base material 11 side of the flattening layer 16 is equal to the flattening layer in the center of the pixel. In the direction which is the same as the distance from the base material surface 11S of the surface on the opposite side to the base material 11 side of 16 in the direction orthogonal to a pixel along a base material surface, it separated from the said base material rather than each said colored layer. The distance Ld3 from the end of the light shielding layer in the portion to the nearest position is 1.0 μm or more. The color filter forming substrate 10b of the third example is also an organic EL element as shown in FIG. The organic EL display device is formed by being bonded to the formation substrate 20 via the adhesive layer 14.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device), but the application is not limited thereto.
The same members as those in the first example are applied as each member.

Also in the color filter forming substrate 10b of the third example, the position of the surface 12bS of the light shielding layer 12 farthest from the base material 11 is set to the base of the surface of the colored layers 13R, 13G, and 13B that is not on the base material 11 side. By being positioned away from the material 11, when used in a white light emitting type organic EL display device, certain pixels corresponding to the light beam L12 and the light beam L13 in the conventional organic EL display device shown in FIG. It is assumed that each light ray emitted from the organic EL element 17 enters the colored layer of the adjacent pixel region can be cut, and accordingly, depending on the viewing direction caused by such a ray, the display can be performed. Color shift and color mixing of the generated image are prevented.
Then, by setting the step δ3 of the convex portion 16T of the planarizing layer 16 to 0.5 μm or less, the organic EL element forming substrate 20 and the color filter forming substrate 10 are bonded together with an adhesive 14 made of an insulating resin. When the organic EL display device having the structure described above (see FIG. 1B) is produced, the generation of bubbles in the bonding process using the adhesive 14 can be suppressed, and uneven display due to the bubbles can be prevented. It is supposed that the yield in can be improved. Furthermore, the distance from the base material surface 11S of the surface opposite to the base material 11 side of the flattening layer 16 in the convex portion 16T is the surface opposite to the base material 11 side of the flattening layer 16 in the pixel center portion. The position closest to the edge of the light-shielding layer in the part farther from the base material than the colored layers in the direction perpendicular to the pixels along the base material surface at the same position as the distance from the base material surface 11S By setting the distance Ld3 to 1.0 μm or more, it is possible to improve the paintability in the bonding process, further suppress the generation of bubbles, and prevent uneven display due to the bubbles. The yield in the process can be improved.

Next, the 4th example of embodiment of the color filter formation board | substrate of this invention is given.
As shown in FIG. 5A, the color filter forming substrate 10c of the fifth example is similar to the line width of the second light shielding layer 12b2 in the color filter forming substrate 10b of the third example shown in FIG. Is larger than the line width of the first light-shielding layer 12b1, and the width of the second light-shielding layer 12b2 is the width of the pixel-shading light-shielding region 18. Otherwise, the third This is the same as the example.
In the fourth example, the line width of the second light-shielding layer 12c2 is larger than the line width of the first light-shielding layer 12c1, and the width of the second light-shielding layer 12c2 is set to be equal to that of the pixel-segmenting light-shielding region 18. Width.
The color filter forming substrate 10c of the fourth example is also bonded to the organic EL element forming substrate 20 via the adhesive layer 14 to form an organic EL display device as shown in FIG. 5B.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device), but the application is not limited thereto.
The same members as those in the first example are applied as each member.
The shape of the planarization layer 16 is the same as that in the third example.
The color filter forming substrate 10c of the fourth example can obtain the same effects as the color filter forming substrate 10b of the third example.

Next, the 5th example of embodiment of the color filter formation board | substrate of this invention is given.
The color filter forming substrate 10d of the fifth example shown in FIG. 6A is the same as the color filter forming substrate 10c of the fourth example shown in FIG. , 13B and the second light shielding layer 12c2, and the light absorption layer 15 is arranged so as to cover the entire colored layers 13R, 13G, and 13B of the respective colors.
Here, the light absorption layer 15 is disposed between the colored layers 13R, 13G, 13B of the respective colors and the second light shielding layer 12d2.
Also in this example, as shown in FIG. 6A, the line width of the second light shielding layer 12d2 is made larger than the line width of the first light shielding layer 12d1, and the width of the second light shielding layer 12d2 Is the width of the pixel-segmenting light-shielding region 18, and other than that is the same as the fourth example.
The color filter forming substrate 10d of the fifth example is also bonded to the organic EL element forming substrate 20 via the adhesive layer 14 as shown in FIG. 6B to form an organic EL display device.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device), but the application is not limited thereto.
The same members as those in the first example are applied as each member.
The shape of the planarization layer 16 is the same as that in the fourth example.
In the case of this example, because of such a form, in addition to obtaining the same operational effects as in the fourth example, by providing the light absorption layer 15, reflected light of external light can be reduced.

Hereinafter, the light absorption layer 15 will be described.
<Light absorption layer 15>
As a material for forming the light absorption layer 15, a resin containing a black pigment such as carbon black or titanium black as a coloring material, a BLUE pigment or the like for color adjustment, and a dispersion thereof is used. However, as the resin, a resin having a composition in which a color material is removed from a resin composition or the like that forms the pixel-segmenting light-blocking layer 12 and the colored layers 13R, 13G, and 13B is used for coating.
Examples of the coating method include photolithography (die coating method, spin coating method), ink jet method, and the like. Usually, coating is performed by photolithography.
From the viewpoint of coating properties and reduction of external light reflection, the thickness of the light absorption layer 15 is preferably 0.3 μm or more.
The intensity of light transmitted through the light absorbing layer can be adjusted by adjusting the concentration of the main color material, and the visible light region (400 nm to 700 nm wavelength region) at the time of display can be obtained by appropriately including a color adjusting pigment. Flat transmittance characteristics with little variation in light transmittance of the light absorbing layer can be easily obtained.
By adjusting the concentration of black pigment such as carbon black or titanium black as the main coloring material, various transmittances can be easily obtained as shown in FIG.
In FIG. 10, the horizontal axis represents the transmittance value of the light absorbing layer, and the vertical axis represents the transmittance when passing through the light absorbing layer corresponding to the transmittance value of the light absorbing layer twice. The triangles in FIG. 10 indicate the transmittance (horizontal axis) of the light absorbing layer obtained by adjusting and measuring the carbon black concentration, and the transmittance when passing through the corresponding absorbing layer twice (vertical axis). Is shown.
Further, by adjusting the content of the pigment for color adjustment, it is possible to easily obtain transmittance characteristics close to flat over the visible light region (wavelength range of 400 nm to 700 nm).
In the visible light region (wavelength range of 400 nm to 700 nm), the light absorption layer has a light transmission characteristic closer to a flat color shift due to the provision of the light absorption layer, and a color shift of transmitted light during display. The color shift of external light reflection can be reduced.
For example, when a light absorption layer having transmittance characteristics close to a flat as shown in FIG. 9 is used, there is no problem of color misregistration due to the provision of the light absorption layer.

特に、表示の際の可視光領域（４００ｎｍ〜７００ｎｍ波長領域）全体にわたり光吸収層の光透過率のバラツキが少ないフラットである場合、光吸収層を設けたことによる表示の際の色ずれを少ないものとできる。 For example, in the visible light region (wavelength range of 400 nm to 700 nm), when the transmittance characteristic of the light absorption layer 15 is flat and 60%, the light passing through the light absorption layer 15 twice is substantially 60%, 60% 36%.
Further, since the light for display passes through the light absorbing layer 15 once and is emitted, the transmitted light is reduced by the light absorbing layer 15 only once. For example, the transmittance of the light absorbing layer 15 is set to 60. If%, the decrease in transmitted light due to passing through the light absorption layer 15 once is substantially 60%.
Therefore, when the color filter forming substrate of the fifth example is used, if the transmittance characteristic of the light absorption layer 15 is 60% flat in the visible light region (wavelength range of 400 nm to 700 nm), FIG. Compared with the organic EL display device shown in FIG. 6), the external light reflected from the front surface (observer side), reflected by the internal electrodes and wiring, and emitted is reduced to 36%. The passing light at the time of display can be 60%, and the passing light at the time of display is about 40% of the organic EL display device shown in FIG. 13 (a), and the circularly polarizing plate shown in FIG. 13 (b). As compared with the organic EL display device using the display, it is possible to increase the light passing through the display.
The transmittance of the light absorption layer 15 is such that external light is incident from the front surface (observer side) and is reflected by internal electrodes and wiring as compared with the conventional organic EL display device shown in FIG. Since the reflected light of the external light emitted can be reduced and the transmitted light at the time of display is increased compared to the organic EL display device using the circularly polarizing plate shown in FIG. In the case of a C light source, the average transmittance is preferably 45% to 95%.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and averaging the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In particular, in the case where the light absorption layer is flat with little variation in light transmittance over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.

Next, the 6th example of embodiment of the color filter formation board of the present invention is given.
As in the first example, the color filter forming substrate 10e of the sixth example shown in FIG. 7 has colored layers 13R, 13G, and 13B for each color filter on one surface 11S of the base material 11 made of a transparent substrate. A color filter for a white light source type organic EL display device, in which each color is arranged in a predetermined pixel region 17 and the pixel region 17 is divided by arranging a light shielding layer 12a in the pixel division light shielding region 18. As shown in FIG. 7, in the second example, in particular, the first light-shielding layer 12e1 is disposed in contact with the first surface 11S of the base material 11 to form the first light-shielding layer. 12e1 is provided so that the colored layers extending from the respective pixel regions are spaced apart from each other in the first light-shielding layer region, and in the first light-shielding layer region Fill the part where the colored layers are separated from each other, and The second light-shielding layer 12e2 is disposed on the flattening layer side so as to be wider than the spaced-apart portion in contact with the surface of the colored layer of each color of the sorting light-shielding region that is not on the substrate side. .
Here, the width of the first light shielding layer 12e1 and the width of the second light shielding layer 12e2 are used as the width of the pixel partitioning light shielding region.
The color filter forming substrate 10e of the sixth example is also bonded to the organic EL element forming substrate 20 via the adhesive layer 14 to form an organic EL display device.
The organic EL display device here is for a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device), but the application is not limited thereto.
The same members as those in the first example are applied as each member.
The shape of the planarization layer 16 is the same as that in the first example.
Because of such a configuration, the same effect as the first example can be obtained.

The color filter forming substrate of the present invention is not limited to the above form.
For example, in each of Examples 3 to 5 described above, the second light shielding layers 12b2, 12c2, and 12d2 may be replaced with a resin composition layer containing a blue color material. In these forms, the resin composition layer containing a blue color material is effectively absorbed when passing through a colored layer disposed in each pixel region due to its transmission characteristics, and is shown in FIG. It is possible to effectively suppress the color shift and color mixing of the displayed image caused by the light beam corresponding to the light beam L12.
In the case where the resin composition layer containing the blue color material is made of the same resin composition as the blue color layer for the color filter, the resin containing the blue color layer for the color filter and the blue color material in the production. The formation of the composition layer can be carried out by a joint process.

Further, as a modification of the second example, a protective layer that covers the colored layers for each color filter is arranged, and the light shielding layer (the light shielding layer 12a in FIG. 2) is provided on the surface of the protective layer that is not on the substrate 11 side. Is also formed.
In the case of this embodiment, the protective layer is expected to be flattened and the base is stabilized, so that the light-shielding layer is easily formed. Further, when the protective layer is made of an inorganic composition, the gas barrier property Can be secured, and can be stabilized as a base in the formation of the light shielding layer.
Of course, the same effect as the second example can be obtained.

Similarly, as a modification of each example of the third example to the fifth example, a protective layer that covers the colored layer of each color for the color filter is arranged, and on the surface of the protective layer that is not on the substrate 11 side, There may also be a form in which a second light shielding layer (corresponding to the light shielding layer 12b2 in FIG. 3, the light shielding layer 12c2 in FIG. 5, and the light shielding layer 12d2 in FIG. 6) is formed.
In the case of these forms, the protective layer is expected to be flattened and the base is stabilized, so that the light-shielding layer is easily formed. Further, when the protective layer is made of an inorganic composition, a gas barrier is provided. Can be secured, and can be stabilized as a base in the formation of the light shielding layer.
Of course, also in these forms, the same operational effects as those of the third to fifth examples can be obtained.

As a modification of the first example, as shown in FIG. 4, the width W <b> 1 of the portion farther from the base material 11 than the colored layers of the light shielding layer 12 fills the portion where the colored layers are separated from each other. A form wider than the width W <b> 2 is mentioned.
Here, the width W1 is the width of the pixel-segmenting light-shielding region 18, and the same effect as in the first example can be obtained.
Further, as a modification of the first example (10 in FIG. 8A), the light absorption layer 15 is provided on the substrate 11 side of each colored layer shown in FIGS. 8B and 8C, respectively. The arranged form is also mentioned.
As each member, the same members as those in the first example other than the light absorption layer 15 are applied.
The shape of the planarization layer 16 is the same as that in the first example.
In the case of this example, because of such a form, in addition to obtaining the same operational effects as those of the first example, the reflection light of the external light can be reduced by providing the light absorption layer 15.

Next, an example of a method for manufacturing a color filter forming substrate of the present invention will be briefly described.
First, an example of a manufacturing method of the color filter forming substrate 10 of the first example shown in FIG.
A transparent base material 11 is prepared in advance, and first, a light shielding layer 12 of a pixel classification light shielding region is formed on one surface of the base material 11 by a general photolithography method, and then each color for a color filter is formed. The colored layers 13R, 13G, and 13B and the WHITE layer 13W are sequentially formed in a predetermined formation region by a general photolithography method.
Usually, the light shielding layer 12 in the pixel classification light shielding region and the color layers 13R, 13G, and 13B for color filters are for forming colored portions in which color materials such as pigments and dyes of each color are dispersed or dissolved in a binder resin. The resin composition is formed by a photolithography method (also referred to as a photolithography method), but is not limited thereto.
It can also be formed by a printing method or an inkjet method.
In addition, when there is a WHITE pixel, the WHITE layer is further replaced with a coloring material (coloring material) from a resin composition or the like that forms the light shielding layer 12 or the colored layers 13R, 13G, and 13B in the pixel classification light shielding region. Although the resin of the composition removed is used and formed by a photolithographic method, the forming method is not limited to this.
It can also be formed by a printing method or an inkjet method.
Then, after forming the light shielding layer 12, the colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter, the planarizing layer 16 is applied using the thermosetting resin composition and the photocurable resin composition. A film is formed.
The color filter forming substrate 10h1 of the modification of the first example shown in FIG. 4 can also be formed in the same manner as in the first example.

The second example of the color filter forming substrate 10a shown in FIG. 2A is the same as the method of manufacturing the color filter forming substrate 10 of the first example described above. And changing the order of the colored layers 13R, 13G, and 13B of the respective colors.
The method for forming each layer is the same as the method for manufacturing the color filter forming substrate 10 of the first example.
In the manufacturing method of the color filter forming substrate 10b of the third example shown in FIG. 3A, the light shielding layer is formed before and after the formation of the colored layers 13R, 13G, and 13B of the respective colors.
The method for forming each layer is the same as the method for manufacturing the color filter forming substrate 10 of the first example.
This is basically the same as the manufacturing method of the color filter forming substrate 10c of the fourth example shown in FIG. 5A and the manufacturing method of the third color filter forming substrate 10b.
The method for producing the color filter forming substrate 10d of the fifth example shown in FIG. 6A is a photosphere in advance before the formation of the second light shielding layer 12d2 in the method for producing the third color filter forming substrate 10b. A seed layer is formed, and the others are the same.
The manufacturing method of the color filter forming substrate 10e of the sixth example shown in FIG. 7 can be performed in the same manner as the manufacturing method of the color filter forming substrate 10a of the second example shown in FIG.
Further, in the case of manufacturing the color filter forming substrate 10f in the form shown in FIG. 8B, in the manufacturing method of the color filter forming substrate 10 of the first example, the formation of the colored layers 13R, 13G, and 13B of each color is performed. The process of forming the light absorption layer before is increased.
The light absorption layer can be formed by a photolithography method, an inkjet method, or the like.
Further, in the case of manufacturing the color filter forming substrate 10g having the form shown in FIG. 8C, in the manufacturing method of the color filter forming substrate 10 of the first example, the light absorbing layer is formed before the light shielding layer 12 is formed. Form.
The light absorption layer can be formed by a coating method or the like.

[Example]
Furthermore, an example is given and demonstrated.
Example 1
Example 1 is an example in which the color filter-formed substrate shown in FIG. 1A was prepared. A photocurable curable resin composition A was prepared and prepared as follows. Using the curable resin composition A, a red curable resin composition for forming a color filter, a green curable resin composition, a blue curable resin composition, and a light-shielding resin light-shielding film in a pixel-partitioning light-shielding part A curable resin composition is prepared for each curable resin composition and a photolithographic method is used for each curable resin composition to form each colored resin layer for color filters and a light-blocking part for pixel classification.
Here, after the pixel-segmenting light-shielding portion 12 is formed, a red colored resin layer 13R, a green colored resin layer 13G, and a blue colored resin layer 13B for color filters are respectively formed by a photolithography process.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of pixel-partitioning light-shielding portion 12)
First, a film thickness is formed by photolithography using a black light-blocking photocurable resin composition for forming a light-blocking layer 12 on one surface of a glass substrate (manufactured by Asahi Glass Co., Ltd., AN material) as a base material 11. The pixel-segmenting light-shielding portion was formed so that the thickness was 2.5 μm.
<Preparation of black light-blocking photocurable resin composition for forming light-blocking layer 12>
First, components of the following amount were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion B.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding composition for forming a resin light-shielding film.
-Black pigment dispersion B: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight Spin the composition for forming the light-shielding resin light-shielding film on one surface of the substrate 11 It was applied with a coater and dried at 100 ° C. for 3 minutes to form a light-shielding resin layer.
A photomask is placed on the light-shielding colored resin layer at a distance of 100 μm from the coating film and exposed to a light-shielding pattern with a 2.0 kW ultra-high pressure mercury lamp by a proximity aligner, and then a 0.05 wt% potassium hydroxide aqueous solution Then, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment, thereby forming the pixel-segmenting light-shielding portion 12 in a predetermined shape.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

Next, a colored resin layer for each color filter was formed as follows.
(1) Formation of red colored resin layer 13R A red curable resin composition having the following composition was applied onto a black matrix by a spin coating method, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment, thereby forming a red pixel pattern in the display region 13S.
The formed film thickness was 2.0 μm.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 3 parts by weight C.I. I. Pigment Red 254: 4 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 23 parts by weight-3-methoxybutyl acetate: 67 parts by weight (2) Green colored resin layer 13G Next, using the green curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A relief pattern composed of a green colored layer was formed in the display area of the pixels.
<Composition of green curable resin composition>
C. I. Pigment Green 58: 7 parts by weight C.I. I. Pigment Yellow 138: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 22 parts by weight-3-methoxybutyl acetate: 67 parts by weight (3) Blue colored resin layer 13B Further, using a blue curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A blue relief pattern was formed in the area.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 4 parts by weight C.I. I. Pigment Violet 23: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of planarization layer 16)
On the substrate on which the colored resin layer 13 was formed as described above, the aforementioned curable resin composition A was applied by a spin coating method and dried to form a coating film having a dry coating film thickness of 2.0 μm.
A photomask is placed at a distance of 100 μm from the coating film of the curable resin composition A, and an ultraviolet ray is applied only to the region corresponding to the formation region of the planarization layer using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 2 seconds.
Next, it was immersed in a 0.05 wt% aqueous potassium hydroxide solution (liquid 23 ° C.) for 1 minute and alkali developed to remove only the uncured portion of the coating film of the curable resin composition.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment to form a protective film.
Thus, the color filter forming substrate 10 of the example shown in FIG.
At this time, the values of δ1 and Ld1 shown in FIG. 1C were 0.3 μm and 1.0 μm, respectively.

(Example 2)
A color filter forming substrate 10 was produced in the same manner as in Example 1 except that the film thickness of the pixel-shading light-shielding portion 12 was 2.7 μm.
At this time, the values of δ1 and Ld1 shown in FIG. 1C were 0.5 μm and 1.2 μm, respectively.

Example 3
A color filter forming substrate 10 was produced in the same manner as in Example 2 except that the drying conditions at the time of forming the protective film 16 were relaxed.
By changing the drying conditions, the leveling properties of the protective film changed, and the values of δ1 and Ld1 shown in FIG. 1C were 0.5 μm and 1.5 μm, respectively.

(Comparative Example 1)
A color filter forming substrate 10 was prepared in the same manner as in Example 1 except that the film thickness of the pixel-partitioning light-shielding portion 12 was 3.0 μm. At this time, the values of δ1 and Ld1 shown in FIG. 1C were 0.7 μm and 1.3 μm, respectively.

(Comparative Example 2)
A color filter forming substrate 10 was produced in the same manner as in Example 2 except that the drying conditions for forming the protective film 16 were tight. By changing the drying conditions, the leveling property of the protective film changed, and the values of δ1 and Ld1 shown in FIG. 1C were 0.5 μm and 0.7 μm, respectively.

これより、凸部の段差については、０. ５μｍ以下が好ましく、また、距離Ｌｄ１については、１. ０μｍ以上であることが好ましい。
また、実施例１〜実施例３、比較例１、比較例２の各カラーフィルタ形成基板を用いて作製した各パネルについて、表示される画像の色シフトや混色の有無を目視にて検査したが、表示される画像の色シフトや混色は見られなかった。 About each color filter formation board of each example and each comparative example, it bonded together using the organic EL element of the white light source formed by the predetermined method, and UV curable resin adhesive (SVR1320: made by Dexerials Corporation) A panel was prepared, and the presence or absence of display unevenness of each manufactured panel was visually confirmed.
As a result, as shown in Table 1, when each color filter forming substrate of Examples 1 to 3 was used, display unevenness was not observed, but each color filter forming substrate of Comparative Examples 1 and 2 was When used, the occurrence of display unevenness was confirmed.

Accordingly, the step of the convex portion is preferably 0.5 μm or less, and the distance Ld1 is preferably 1.0 μm or more.
Moreover, about each panel produced using each color filter formation board | substrate of Example 1- Example 3, Comparative Example 1, and Comparative Example 2, although the presence or absence of the color shift of the image displayed and color mixing was inspected visually, No color shift or color mixture was observed in the displayed image.

10, 10a, 10b, 10c Color filter forming substrate 10d, 10e, 10f, 10g Color filter forming substrate 10h1 Color filter forming substrate 11 Base material (also referred to as transparent substrate)
11S substrate surfaces 12, 12a, 12A Light-shielding layers 12b1, 12c1, 12d1 First light-shielding layer (also simply referred to as light-shielding layer)
12b2, 12c2, 12d2 Second light-shielding layer (also simply referred to as light-shielding layer)
12e1 First light-shielding layer (also simply referred to as a light-shielding layer)
12e2 Second light-shielding layer (also simply referred to as light-shielding layer)
12S, 12aS, surfaces 12bS, 12cS, 12dS (of the light shielding layer furthest away from the substrate) surfaces 12hS, 12eS (surfaces of the light shielding layer furthest from the substrate) 13R red Colored layer 13G Green colored layer 13B Blue colored layer 14 Adhesive layer (insulating resin layer)
DESCRIPTION OF SYMBOLS 15 Light absorption layer 16 Flattening layer 17 Pixel area | region 17a-17f Pixel area | region 18 The light shielding area | region 20 for pixel division Organic EL element formation substrate 21 Base material (it is also called a transparent substrate)
22 Organic EL element (also referred to as organic light-emitting element or organic EL light-emitting element)
22A Organic EL element layer 25 Anode 26 Organic EL layer 27 Light emitting layer 28 Cathode Ld1, Ld2, Ld3 Distance (length)
δ1, δ2, δ3 steps t1, t2, t3 (pixel center) thickness 110, 110a, 110b, color filter forming substrate 111 base material (also referred to as transparent substrate)
112 Black matrix 113R Red colored layer 113G Green colored layer 113B Blue colored layer 113W WHITE layer 113WA Transmittance adjustment unit 113RL1, 113RL2, 113RL3 Red display color 113GL1, 113GL2, 113GL3 Green display color 113BL1, 113BL2, 113BL3 Blue display color 114 Insulating resin layer 120 Organic EL element forming substrate 121 Base material (also referred to as transparent substrate)
122 Organic EL element 122W White light

Claims (16)

  A colored layer of each color for a color filter is arranged in a predetermined pixel area on one surface of a base material made of a transparent substrate, and a light shielding layer is arranged in a pixel classification light shielding area to divide the pixel area. It is a color filter forming substrate for an organic EL display device of a white light source type, and the position of the surface of the light shielding layer farthest from the substrate is more than the surface that is not the substrate side of the colored layer, A color filter forming substrate, wherein a transparent flattening layer is disposed so as to cover the colored layer and the light shielding layer at a position away from the base material.   The color filter forming substrate according to claim 1, wherein the colored layers are separated from each other and the colored layers are arranged, and the light shielding layer has a structure composed of one light shielding layer. The color filter is formed in such a manner that the colored layer formed on the flattening layer side is in contact with one surface of the base material, and the colored layers extending from the pixel regions are separated from each other. substrate.   3. The color filter forming substrate according to claim 2, wherein the width of the portion of the light shielding layer that is further away from the base material than the colored layers is the width of the light shielding portion that fills the portion where the colored layers are separated from each other. A color filter forming substrate characterized in that it is wider.   2. The color filter forming substrate according to claim 1, wherein each pixel-colored light-shielding region includes a color layer for each color filter of an adjacent pixel extending without any gaps, The color filter forming substrate, wherein the light shielding layer has a structure composed of one light shielding layer, and is formed on the flattening layer side in contact with the surface of the colored layer that is not the base material.   2. The color filter forming substrate according to claim 1, wherein the light shielding layer is a two-layer structure in which a first light shielding layer and a second light shielding layer are provided apart from each other in a direction perpendicular to the base material. A structure composed of a light-shielding layer, which is in contact with one surface of the base material, is provided with a first light-shielding layer, and extends from each pixel region so as to cover the first light-shielding layer The flattening layer is arranged in such a manner that the layers are arranged with no gap in the pixel-segmenting light-shielding region, and in contact with the surface of the colored layer of each color of the pixel-segmenting light-shielding region that is not on the substrate side A color filter forming substrate, wherein a second light-shielding layer is disposed on the side.   6. The color filter forming substrate according to claim 5, wherein the second light-shielding layer is a colored layer containing a blue pigment.   The color filter forming substrate according to claim 6, wherein the colored layer containing the blue pigment is the same as the blue colored layer for a color filter.   2. The color filter forming substrate according to claim 1, wherein a first light-shielding layer is disposed in contact with one surface of the base material, and each pixel region is covered with the first light-shielding layer. The colored layers extending from the first light-shielding layer region are spaced apart from each other, and the colored layers in the first light-shielding layer region are filled with the separated portions, In addition, a second light-shielding layer is disposed on the flattening layer side so as to be wider than the spaced-apart portion in contact with the surface of the colored layer of each color of the pixel-segmenting light-shielding region that is not on the substrate side. A color filter forming substrate characterized by comprising:   The color filter forming substrate according to claim 1, wherein the planarizing layer is made of an inorganic composition.   The color filter forming substrate according to any one of claims 1 to 9, wherein the light shielding layer region has a convex shape from the base material surface, the surface of the flattening layer opposite to the base material side. The color filter forming substrate, wherein the step of the convex portion is 0.5 μm or less.   11. The color filter forming substrate according to claim 10, wherein the distance from the base material surface of the surface opposite to the base material side of the flattening layer in the convex portion is a base of the flattening layer in the pixel central portion. The portion on the opposite side of the material side is the same distance from the base material surface, and in the direction perpendicular to the pixels along the base material surface, a portion farther from the base material than the colored layers A color filter forming substrate, wherein the distance from the end of the light shielding layer to the nearest position is 1.0 μm or more.   12. The color filter forming substrate according to claim 1, wherein the planarizing layer has a thickness of 2.0 [mu] m or less.   13. The color filter forming substrate according to claim 1, wherein a light absorption layer is laminated in the pixel region.   14. The color filter forming substrate according to claim 13, wherein the light absorption layer contains a black pigment such as carbon black or titanium black dispersed in a resin as a coloring material. Color filter forming substrate.   The color filter forming substrate according to any one of claims 13 to 14, wherein an average transmittance of the light absorbing layer in a C light source is 45% to 95%.   A white light source type organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are laminated, wherein the color filter forming substrate according to any one of claims 1 to 15 is used. A characteristic organic EL display device.

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