JP2014531704A5 - - Google Patents

Download PDF

Info

Publication number
JP2014531704A5
JP2014531704A5 JP2014527556A JP2014527556A JP2014531704A5 JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5 JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5
Authority
JP
Japan
Prior art keywords
seed laser
beam splitter
laser beam
radiation source
optical amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014527556A
Other languages
English (en)
Japanese (ja)
Other versions
JP6047573B2 (ja
JP2014531704A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2012/064775 external-priority patent/WO2013029895A1/en
Publication of JP2014531704A publication Critical patent/JP2014531704A/ja
Publication of JP2014531704A5 publication Critical patent/JP2014531704A5/ja
Application granted granted Critical
Publication of JP6047573B2 publication Critical patent/JP6047573B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014527556A 2011-09-02 2012-07-27 放射源 Active JP6047573B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161530782P 2011-09-02 2011-09-02
US61/530,782 2011-09-02
PCT/EP2012/064775 WO2013029895A1 (en) 2011-09-02 2012-07-27 Radiation source

Publications (3)

Publication Number Publication Date
JP2014531704A JP2014531704A (ja) 2014-11-27
JP2014531704A5 true JP2014531704A5 (cg-RX-API-DMAC7.html) 2015-09-10
JP6047573B2 JP6047573B2 (ja) 2016-12-21

Family

ID=46640658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014527556A Active JP6047573B2 (ja) 2011-09-02 2012-07-27 放射源

Country Status (4)

Country Link
US (1) US9516732B2 (cg-RX-API-DMAC7.html)
JP (1) JP6047573B2 (cg-RX-API-DMAC7.html)
TW (1) TWI586222B (cg-RX-API-DMAC7.html)
WO (1) WO2013029895A1 (cg-RX-API-DMAC7.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000501033A (ja) 1995-11-30 2000-02-02 ヴァーチャル テクノロジーズ インコーポレイテッド 触覚をフィードバックする人間/機械インターフェース
CN104577685B (zh) * 2015-01-04 2017-10-20 中国科学院上海光学精密机械研究所 光纤激光双程泵浦1.2μm波段范围激光器
US10686290B2 (en) 2015-02-19 2020-06-16 Asml Netherlands B.V. Radiation source
US10048199B1 (en) * 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10524345B2 (en) * 2017-04-28 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Residual gain monitoring and reduction for EUV drive laser
WO2018219578A1 (en) * 2017-05-30 2018-12-06 Asml Netherlands B.V. Radiation source
CN118538834A (zh) * 2017-06-12 2024-08-23 库力索法荷兰有限公司 分立组件向基板上的并行组装
CN115398757A (zh) * 2020-04-09 2022-11-25 Asml荷兰有限公司 针对辐射源的种子激光系统

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4194813A (en) * 1978-10-13 1980-03-25 The United States Of America As Represented By The United States Department Of Energy Vacuum aperture isolator for retroreflection from laser-irradiated target
US5790574A (en) * 1994-08-24 1998-08-04 Imar Technology Company Low cost, high average power, high brightness solid state laser
US6999491B2 (en) * 1999-10-15 2006-02-14 Jmar Research, Inc. High intensity and high power solid state laser amplifying system and method
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7087914B2 (en) 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
FR2871622B1 (fr) 2004-06-14 2008-09-12 Commissariat Energie Atomique Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
JP2006172898A (ja) 2004-12-15 2006-06-29 National Institute Of Advanced Industrial & Technology レーザープラズマx線発生装置
US7308007B2 (en) 2004-12-23 2007-12-11 Colorado State University Research Foundation Increased laser output energy and average power at wavelengths below 35 nm
WO2006075535A1 (ja) 2005-01-12 2006-07-20 Nikon Corporation レーザプラズマeuv光源、ターゲット部材、テープ部材、ターゲット部材の製造方法、ターゲットの供給方法、及びeuv露光装置
JP2006228998A (ja) 2005-02-18 2006-08-31 Komatsu Ltd 極端紫外線光源装置
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7289263B1 (en) 2006-08-02 2007-10-30 Coherent, Inc. Double-pass fiber amplifier
US20080181266A1 (en) 2007-01-26 2008-07-31 Institut National D'optique Enhanced seeded pulsed fiber laser source
NL1036272A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
US7903697B2 (en) 2008-01-16 2011-03-08 Pyrophotonics Lasers Inc. Method and system for tunable pulsed laser source
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8749880B2 (en) 2009-11-24 2014-06-10 Applied Energetics Off axis walk off multi-pass amplifiers
JP5722061B2 (ja) 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
US9113540B2 (en) 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection

Similar Documents

Publication Publication Date Title
JP2014531704A5 (cg-RX-API-DMAC7.html)
TWI636709B (zh) 極紫外線(euv)光源及產生euv光之方法
TWI705734B (zh) 產生極紫外(euv)光之方法及euv系統
JP2016522887A5 (cg-RX-API-DMAC7.html)
JP2012523705A5 (cg-RX-API-DMAC7.html)
CN105190776B (zh) 用于极紫外光源的标靶
JP2017510823A5 (cg-RX-API-DMAC7.html)
JP2016512913A5 (cg-RX-API-DMAC7.html)
JP2017526947A5 (cg-RX-API-DMAC7.html)
WO2012125287A3 (en) Drive laser delivery systems for euv light source
JP2010537424A5 (cg-RX-API-DMAC7.html)
MX2018011468A (es) Dispositivo para fumar y metodo para generar aerosol.
JP2010539700A5 (cg-RX-API-DMAC7.html)
JP2015511769A5 (cg-RX-API-DMAC7.html)
JP2006135298A5 (cg-RX-API-DMAC7.html)
MX2016003664A (es) Dispositivo y procedimiento de marcado laser de una lentilla oftalmica con un pulso laser de longitud de onda y energia por pulsos seleccionados.
WO2012107815A3 (en) Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light
RU2015123440A (ru) Анализ образцов для масс-цитометрии
JP2014534559A5 (ja) 放射源およびリソグラフィ装置
JP2012074388A5 (ja) 放射源、リソグラフィ装置、並びに放射源又はリソグラフィ装置を用いる方法
JP2011530823A5 (cg-RX-API-DMAC7.html)
JP2015502665A5 (cg-RX-API-DMAC7.html)
CN109792831A (zh) 在极紫外光源中的靶轨迹量测
MY160582A (en) System and method for tracking and removing coating from an edge of a substrate
WO2012024341A3 (en) Energy emitting device