JP2014527685A5 - 磁気的閉じ込め及びファラデーシールド付き誘導結合型プラズマシステム並びに磁気的閉じ込め及びファラデーシールドを提供する方法 - Google Patents

磁気的閉じ込め及びファラデーシールド付き誘導結合型プラズマシステム並びに磁気的閉じ込め及びファラデーシールドを提供する方法 Download PDF

Info

Publication number
JP2014527685A5
JP2014527685A5 JP2014520297A JP2014520297A JP2014527685A5 JP 2014527685 A5 JP2014527685 A5 JP 2014527685A5 JP 2014520297 A JP2014520297 A JP 2014520297A JP 2014520297 A JP2014520297 A JP 2014520297A JP 2014527685 A5 JP2014527685 A5 JP 2014527685A5
Authority
JP
Japan
Prior art keywords
faraday shield
magnetic confinement
inductively coupled
coupled plasma
plasma system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014520297A
Other languages
English (en)
Other versions
JP2014527685A (ja
JP6139520B2 (ja
Filing date
Publication date
Priority claimed from US13/181,210 external-priority patent/US20130015053A1/en
Application filed filed Critical
Publication of JP2014527685A publication Critical patent/JP2014527685A/ja
Publication of JP2014527685A5 publication Critical patent/JP2014527685A5/ja
Application granted granted Critical
Publication of JP6139520B2 publication Critical patent/JP6139520B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Description

図2は、図1aに示すプラズマ源の一部分の詳細な断面ブロック図を示す。この図にはプラズマ源5の一断面が示され、この断面ではアンテナアレイ16を流れるRF電流18(Irf)は紙面に垂直に向いているが、永久マルチカスプ磁石アレイ14はその磁化ベクトルとともに紙面内にある。同様に、図3は図2から90度オフセットした図1aのプラズマ源5の一部分の詳細な第2の断面ブロック図を示す。この図にはプラズマ源5の一断面が示され、この断面では永久磁石アレイ14の磁化ベクトルとアンテナアレイ16を流れるRF電流18(Irf)の両方が紙面内にある。
JP2014520297A 2011-07-12 2012-07-12 磁気的閉じ込め及びファラデーシールド付き誘導結合型プラズマシステム並びに磁気的閉じ込め及びファラデーシールドを提供する方法 Active JP6139520B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/181,210 US20130015053A1 (en) 2011-07-12 2011-07-12 Inductively coupled rf plasma source with magnetic confinement and faraday shielding
US13/181,210 2011-07-12
PCT/US2012/046369 WO2013009941A1 (en) 2011-07-12 2012-07-12 Inductively coupled rf plasma source with magnetic confinement and faraday shielding

Publications (3)

Publication Number Publication Date
JP2014527685A JP2014527685A (ja) 2014-10-16
JP2014527685A5 true JP2014527685A5 (ja) 2015-05-14
JP6139520B2 JP6139520B2 (ja) 2017-05-31

Family

ID=46679281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014520297A Active JP6139520B2 (ja) 2011-07-12 2012-07-12 磁気的閉じ込め及びファラデーシールド付き誘導結合型プラズマシステム並びに磁気的閉じ込め及びファラデーシールドを提供する方法

Country Status (6)

Country Link
US (2) US20130015053A1 (ja)
JP (1) JP6139520B2 (ja)
KR (1) KR102031578B1 (ja)
CN (1) CN103650098B (ja)
TW (1) TWI547215B (ja)
WO (1) WO2013009941A1 (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101962499B1 (ko) 2011-10-28 2019-03-26 코닝 인코포레이티드 적외선 반사도를 갖는 유리 제품 및 이의 제조방법
KR101542905B1 (ko) * 2013-04-26 2015-08-07 (주)얼라이드 테크 파인더즈 반도체 장치
TWI549155B (zh) * 2014-09-04 2016-09-11 技術發現者聯合有限公司 半導體裝置
CN104797071B (zh) * 2015-04-16 2018-09-04 中国科学院等离子体物理研究所 一种磁约束天线内置式射频离子源
WO2016176096A1 (en) 2015-04-30 2016-11-03 Corning Incorporated Electrically conductive articles with discrete metallic silver layers and methods for making same
KR101682106B1 (ko) 2015-09-03 2016-12-02 부림자동화(주) 회수라인에 설치된 유량계를 이용한 쿠션성능 및 행정거리 측정장치 및 그 측정방법
KR102334378B1 (ko) * 2015-09-23 2021-12-02 삼성전자 주식회사 유전체 윈도우, 그 윈도우를 포함한 플라즈마 공정 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법
DE102015225906A1 (de) * 2015-12-18 2017-06-22 Wacker Chemie Ag Siloxanharzzusammensetzungen
WO2018152142A1 (en) * 2017-02-20 2018-08-23 Mattson Technology, Inc. Temperature control using temperature control element coupled to faraday shield
WO2019021078A1 (en) * 2017-07-27 2019-01-31 Crocus Technology Sa APPARATUS FOR GENERATING A MAGNETIC FIELD AND METHOD OF USING THE SAME
US10276340B1 (en) * 2017-12-20 2019-04-30 Varian Semiconductor Equipment Associates, Inc. Low particle capacitively coupled components for workpiece processing
US11489847B1 (en) * 2018-02-14 2022-11-01 Nokomis, Inc. System and method for physically detecting, identifying, and diagnosing medical electronic devices connectable to a network
CN110536530A (zh) * 2018-09-20 2019-12-03 北京北方华创微电子装备有限公司 磁增强法拉第屏蔽结构及感应耦合等离子体源
KR20200131942A (ko) 2019-05-14 2020-11-25 주식회사 인포비온 High Flux 플라즈마 소스
KR102288388B1 (ko) 2019-05-14 2021-08-11 주식회사 인포비온 High Flux 플라즈마 소스
US11791126B2 (en) 2019-08-27 2023-10-17 Applied Materials, Inc. Apparatus for directional processing
GB2590613B (en) * 2019-12-16 2023-06-07 Dyson Technology Ltd Method and apparatus for use in generating plasma
JP7394632B2 (ja) * 2020-01-16 2023-12-08 東京エレクトロン株式会社 アレーアンテナ及びプラズマ処理装置
US12080516B2 (en) * 2021-11-23 2024-09-03 Applied Materials, Inc. High density plasma enhanced process chamber
CN114605174A (zh) * 2022-01-27 2022-06-10 杭州三得农业科技有限公司 氮气制植物化能自养专用氮离子肥系统及工艺

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
JP3371176B2 (ja) * 1995-01-25 2003-01-27 ソニー株式会社 プラズマ処理装置および半導体装置の製造方法
US5757018A (en) * 1995-12-11 1998-05-26 Varian Associates, Inc. Zero deflection magnetically-suppressed Faraday for ion implanters
JPH09266096A (ja) * 1996-03-28 1997-10-07 Hitachi Ltd プラズマ処理装置及びこれを用いたプラズマ処理方法
US5754391A (en) * 1996-05-17 1998-05-19 Saphikon Inc. Electrostatic chuck
US6149760A (en) * 1997-10-20 2000-11-21 Tokyo Electron Yamanashi Limited Plasma processing apparatus
JP4119547B2 (ja) * 1997-10-20 2008-07-16 東京エレクトロンAt株式会社 プラズマ処理装置
US6474258B2 (en) * 1999-03-26 2002-11-05 Tokyo Electron Limited Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
US6523493B1 (en) * 2000-08-01 2003-02-25 Tokyo Electron Limited Ring-shaped high-density plasma source and method
US6771026B2 (en) * 2002-06-12 2004-08-03 Tokyo Electron Limited Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave
KR100592241B1 (ko) * 2003-01-11 2006-06-23 삼성에스디아이 주식회사 유도결합형 플라즈마 처리장치
KR101007822B1 (ko) * 2003-07-14 2011-01-13 주성엔지니어링(주) 혼합형 플라즈마 발생 장치
JP2008128887A (ja) * 2006-11-22 2008-06-05 Ae Kiki Engineering Co Ltd プラズマ源,それを用いた高周波イオン源,負イオン源,イオンビーム処理装置,核融合用中性粒子ビーム入射装置
EP2299789A4 (en) * 2008-05-22 2013-11-06 Emd Corp PLASMA GENERATING APPARATUS AND PLASMA PROCESSING APPARATUS
JP4763857B2 (ja) * 2008-12-29 2011-08-31 キヤノンアネルバ株式会社 均一膜厚分布のためのスパッタ装置の磁界制御
JP5642181B2 (ja) * 2009-08-21 2014-12-17 マットソン テクノロジー インコーポレイテッドMattson Technology, Inc. 基体を処理する装置及び基体の処理方法
KR102334378B1 (ko) * 2015-09-23 2021-12-02 삼성전자 주식회사 유전체 윈도우, 그 윈도우를 포함한 플라즈마 공정 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법

Similar Documents

Publication Publication Date Title
JP2014527685A5 (ja) 磁気的閉じ込め及びファラデーシールド付き誘導結合型プラズマシステム並びに磁気的閉じ込め及びファラデーシールドを提供する方法
GB201316237D0 (en) Magnetic tunnel junction with iron dusting layer between free layer and tunnel barrier
BR112017004353A2 (pt) aumento ferromagnético para formação de imagem de ressonância magnética
EP2235725A4 (en) FOCUSED FLUX SHAPED PERMANENT MAGNET, MAGNETIC UNIT COMPRISING THE MAGNETS, DEVICE COMPRISING THE MAGNETIC UNITS, AND METHOD FOR ASYMMETRICALLY FOCUSING PERMANENT MAGNET FLOW FIELDS
WO2013188307A3 (en) Haptic electromagnetic actuator
MX2017005428A (es) Transductor electromagnetico acustico.
MY186139A (en) Coil assembly for magnetic resonance imaging
MY162696A (en) Magnetic field downhole tool attachment
IN2012DE00125A (ja)
JP2011202217A5 (ja)
WO2011106134A3 (en) Magnetically actuated system
PE20110779A1 (es) Dispositivo de separacion para separar particulas magnetizables y no magnetizables que son transportadas en una suspension que fluye a traves de un canal de separacion
IN2012DN03923A (ja)
SG11201508217RA (en) Encapsulating magnetic fields for plasma confinement
WO2012161342A8 (en) Motor, design method and manufacturing method of motor, stage device, and exposure apparatus
MX2013013390A (es) Yugo electromagnetico multidireccional para la inspeccion de orificios.
JP2012137451A5 (ja)
MX363412B (es) Fuente de evaporacion por arco.
JP2015017304A5 (ja)
WO2011025143A3 (ko) 플라즈마 발생용 마이크로웨이브 안테나
EP4004572A4 (en) MAGNETIC FLUX CONCENTRATOR FOR MAGNETIC FIELD CONCENTRATION IN PLANE DIRECTION
EP3067899A4 (en) Magnetic material, permanent magnet, motor, and power generator
EP2972443A4 (en) Versatile superconducting magnet for extremities magnetic resonance imaging
JP2014516238A5 (ja)
GB201107318D0 (en) Magnets