JP2014523640A5 - - Google Patents

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Publication number
JP2014523640A5
JP2014523640A5 JP2014514465A JP2014514465A JP2014523640A5 JP 2014523640 A5 JP2014523640 A5 JP 2014523640A5 JP 2014514465 A JP2014514465 A JP 2014514465A JP 2014514465 A JP2014514465 A JP 2014514465A JP 2014523640 A5 JP2014523640 A5 JP 2014523640A5
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JP
Japan
Prior art keywords
light source
optical system
gas
source according
beam path
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JP2014514465A
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English (en)
Japanese (ja)
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JP2014523640A (ja
JP6043789B2 (ja
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Priority claimed from US13/156,188 external-priority patent/US9516730B2/en
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Publication of JP2014523640A5 publication Critical patent/JP2014523640A5/ja
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JP2014514465A 2011-06-08 2012-05-10 レーザ生成プラズマ光源内の緩衝ガス流安定化のためのシステム及び方法 Active JP6043789B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/156,188 US9516730B2 (en) 2011-06-08 2011-06-08 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US13/156,188 2011-06-08
PCT/US2012/037363 WO2012170144A1 (en) 2011-06-08 2012-05-10 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

Publications (3)

Publication Number Publication Date
JP2014523640A JP2014523640A (ja) 2014-09-11
JP2014523640A5 true JP2014523640A5 (https=) 2015-07-02
JP6043789B2 JP6043789B2 (ja) 2016-12-14

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ID=47292352

Family Applications (1)

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JP2014514465A Active JP6043789B2 (ja) 2011-06-08 2012-05-10 レーザ生成プラズマ光源内の緩衝ガス流安定化のためのシステム及び方法

Country Status (6)

Country Link
US (1) US9516730B2 (https=)
EP (1) EP2719261A4 (https=)
JP (1) JP6043789B2 (https=)
KR (1) KR101940162B1 (https=)
TW (1) TWI576013B (https=)
WO (1) WO2012170144A1 (https=)

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US8853655B2 (en) * 2013-02-22 2014-10-07 Kla-Tencor Corporation Gas refraction compensation for laser-sustained plasma bulbs
US8872143B2 (en) 2013-03-14 2014-10-28 Asml Netherlands B.V. Target for laser produced plasma extreme ultraviolet light source
US8791440B1 (en) * 2013-03-14 2014-07-29 Asml Netherlands B.V. Target for extreme ultraviolet light source
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US9560730B2 (en) 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
US9557650B2 (en) * 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
WO2015086232A1 (en) * 2013-12-09 2015-06-18 Asml Netherlands B.V. Radiation source device, lithographic apparatus and device manufacturing method
US9338870B2 (en) 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
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US9155178B1 (en) * 2014-06-27 2015-10-06 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9544986B2 (en) 2014-06-27 2017-01-10 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
JP6393196B2 (ja) * 2015-01-19 2018-09-19 浜松ホトニクス株式会社 レーザ光増幅装置
US9776218B2 (en) 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
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US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
CN117202469A (zh) * 2017-01-06 2023-12-08 Asml荷兰有限公司 引导装置和相关联的系统
US10955749B2 (en) 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
US10165664B1 (en) * 2017-11-21 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for decontaminating windows of an EUV source module
US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
NL2022644A (en) * 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
JP7143439B2 (ja) * 2018-11-15 2022-09-28 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法
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JP7368984B2 (ja) * 2019-09-05 2023-10-25 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
US10923311B1 (en) * 2019-11-11 2021-02-16 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Cathode for ion source comprising a tapered sidewall
JP7849186B2 (ja) 2022-02-21 2026-04-21 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法

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