JP2014523540A5 - - Google Patents

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Publication number
JP2014523540A5
JP2014523540A5 JP2014514482A JP2014514482A JP2014523540A5 JP 2014523540 A5 JP2014523540 A5 JP 2014523540A5 JP 2014514482 A JP2014514482 A JP 2014514482A JP 2014514482 A JP2014514482 A JP 2014514482A JP 2014523540 A5 JP2014523540 A5 JP 2014523540A5
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JP
Japan
Prior art keywords
photoresist
polymer
nanoparticles
composition
dispersed
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JP2014514482A
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English (en)
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JP2014523540A (ja
JP5995963B2 (ja
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Priority claimed from PCT/US2012/039081 external-priority patent/WO2012170204A1/en
Publication of JP2014523540A publication Critical patent/JP2014523540A/ja
Publication of JP2014523540A5 publication Critical patent/JP2014523540A5/ja
Application granted granted Critical
Publication of JP5995963B2 publication Critical patent/JP5995963B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (2)

  1. フォトレジストと、
    該フォトレジストに分散した二光子光開始剤系と、
    該フォトレジストに分散したポリマー連結ナノ粒子と、を含み、
    該ポリマー連結ナノ粒子が、ポリマーとナノ粒子との間の共有結合を含み、
    露光されていない、組成物。
  2. フォトレジスト、該フォトレジストに分散した二光子光開始剤系、及び該フォトレジストに分散したポリマー連結ナノ粒子を含むとともに、該ポリマー連結ナノ粒子が、ポリマーとナノ粒子との間の共有結合を含む、露光していない組成物を準備することと、
    該露光していない組成物を走査レーザー光線に暴露させて、物品の形状露光した組成物を形成することと、
    該組成物を現像すること、とを含む、物品の製造方法。
JP2014514482A 2011-06-08 2012-05-23 ポリマー連結ナノ粒子を含有するフォトレジスト Expired - Fee Related JP5995963B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161494620P 2011-06-08 2011-06-08
US61/494,620 2011-06-08
PCT/US2012/039081 WO2012170204A1 (en) 2011-06-08 2012-05-23 Photoresists containing polymer-tethered nanoparticles

Publications (3)

Publication Number Publication Date
JP2014523540A JP2014523540A (ja) 2014-09-11
JP2014523540A5 true JP2014523540A5 (ja) 2015-04-09
JP5995963B2 JP5995963B2 (ja) 2016-09-21

Family

ID=46201838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014514482A Expired - Fee Related JP5995963B2 (ja) 2011-06-08 2012-05-23 ポリマー連結ナノ粒子を含有するフォトレジスト

Country Status (5)

Country Link
US (1) US9104100B2 (ja)
EP (1) EP2718766A1 (ja)
JP (1) JP5995963B2 (ja)
CN (1) CN103608726B (ja)
WO (1) WO2012170204A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10712483B2 (en) 2015-08-24 2020-07-14 Samsung Electronics Co., Ltd. Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
KR102631400B1 (ko) 2015-10-22 2024-01-29 삼성전자주식회사 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자
TWI557177B (zh) * 2015-12-16 2016-11-11 財團法人工業技術研究院 低介電無溶劑型樹脂組成物及基板結構
KR102527764B1 (ko) 2015-12-17 2023-05-02 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
US12020174B2 (en) 2016-08-16 2024-06-25 Ebay Inc. Selecting next user prompt types in an intelligent online personal assistant multi-turn dialog
US11748978B2 (en) 2016-10-16 2023-09-05 Ebay Inc. Intelligent online personal assistant with offline visual search database
US10860898B2 (en) 2016-10-16 2020-12-08 Ebay Inc. Image analysis and prediction based visual search
US11004131B2 (en) 2016-10-16 2021-05-11 Ebay Inc. Intelligent online personal assistant with multi-turn dialog based on visual search
KR102477802B1 (ko) * 2016-12-21 2022-12-15 메르크 파텐트 게엠베하 금속 산화물 나노입자 및 유기 중합체를 함유하는 스핀-온 물질의 조성물
DE102017101823A1 (de) 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strukturiertes Komposit aus Matrixmaterial und Nanopartikeln
CN110325913B (zh) * 2017-03-29 2022-11-01 旭化成株式会社 感光性树脂组合物
EP3704545A4 (en) * 2017-10-31 2021-06-16 Lawrence Livermore National Security, LLC DEEP-RESOLUTION PARALLEL BIPHOTONIC BIPHOTONIC POLYMERIZATION SYSTEM AND PROCESS FOR EXTENDABLE SUBMICRONIC ADDITIVE MANUFACTURING

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
US5037579A (en) 1990-02-12 1991-08-06 Nalco Chemical Company Hydrothermal process for producing zirconia sol
US5258225A (en) * 1990-02-16 1993-11-02 General Electric Company Acrylic coated thermoplastic substrate
US5189136A (en) 1990-12-12 1993-02-23 The Regents Of The University Of California Conducting polymer formed of poly(2-methoxy,5-(2'-ethyl-hexyloxy)-p-phenylenevinylene)
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
TW268969B (ja) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
CN1082934C (zh) * 1994-04-11 2002-04-17 宇部日东化成株式会社 交联树脂包覆二氧化硅微粒及其制造方法
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
US6267913B1 (en) 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US6503231B1 (en) * 1998-06-10 2003-01-07 Georgia Tech Research Corporation Microneedle device for transport of molecules across tissue
JP2000007717A (ja) * 1998-06-19 2000-01-11 Takeda Chem Ind Ltd 紫外線硬化型樹脂組成物
EP1112228B1 (en) * 1998-07-30 2004-10-20 Minnesota Mining And Manufacturing Company Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
ATE433129T1 (de) 2000-06-15 2009-06-15 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische bauteile
US6465670B2 (en) * 2000-08-01 2002-10-15 The Goodyear Tire & Rubber Company Preparation of surface modified silica
JP4463473B2 (ja) * 2000-12-15 2010-05-19 ジ・アリゾナ・ボード・オブ・リージェンツ 前駆体を含有するナノ粒子を用いた金属のパターニング方法
US6663820B2 (en) * 2001-03-14 2003-12-16 The Procter & Gamble Company Method of manufacturing microneedle structures using soft lithography and photolithography
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
DE502004007350D1 (de) * 2003-09-29 2008-07-24 Bosch Gmbh Robert Härtbares Reaktionsharzsystem
US7189768B2 (en) 2003-11-25 2007-03-13 3M Innovative Properties Company Solution containing surface-modified nanoparticles
ATE439612T1 (de) * 2003-12-05 2009-08-15 3M Innovative Properties Co Prozess zur herstellung von photonischen kristallen
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
US7294449B1 (en) * 2003-12-31 2007-11-13 Kovio, Inc. Radiation patternable functional materials, methods of their use, and structures formed therefrom
TWI246929B (en) * 2004-07-16 2006-01-11 Ind Tech Res Inst Microneedle array device and its fabrication method
WO2007070004A2 (en) * 2005-12-14 2007-06-21 Silex Microsystems Ab Methods for making micro needles and applications thereof
US7875415B2 (en) * 2005-12-30 2011-01-25 Intel Corporation Helical pixilated photoresist
KR100717514B1 (ko) * 2005-12-30 2007-05-11 제일모직주식회사 유기/무기 혼성 나노복합체 및 이를 이용한 열가소성나노복합재 수지 조성물
WO2007112309A2 (en) 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
US20070276330A1 (en) * 2006-05-28 2007-11-29 Beck Patricia A Microneedles and methods of fabricating thereof
US8617798B2 (en) * 2006-08-17 2013-12-31 The Regents Of The University Of California Customized lithographic particles
US8193397B2 (en) 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
WO2008068154A2 (en) * 2006-12-06 2008-06-12 Ciba Holding Inc. Changing surface properties by functionalized nanoparticles
TWI368765B (en) 2007-06-13 2012-07-21 Chimei Innolux Corp Color photo-resist with gold nano-particles and color filters made thereby
US7652095B2 (en) * 2007-06-20 2010-01-26 3M Innovative Properties Company Pressure-sensitive adhesive containing aziridinyl silanes
KR100911889B1 (ko) * 2007-07-16 2009-08-11 한국전기연구원 유무기 하이브리드 감광성 수지 조성물 및 이의 경화체를이용한 액정표시소자
US20110003946A1 (en) * 2008-01-18 2011-01-06 Klaus-Volker Schuett Curable reaction resin system
CN102301277B (zh) 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
WO2011133331A1 (en) 2010-04-20 2011-10-27 3M Innovative Properties Company Pressure sensitive adhesives containing reactive, surface-modified nanoparticles
KR20130028971A (ko) 2010-06-30 2013-03-20 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노입자를 이용한 감압 접착제의 표면 개질
CN103518148B (zh) * 2011-03-09 2016-01-20 3M创新有限公司 包含大粒度热解法二氧化硅的抗反射膜
EP2699965A2 (en) 2011-04-22 2014-02-26 3M Innovative Properties Company Enhanced multi-photon imaging resolution method

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