JP2014514600A - 吐出方法および吐出用装置 - Google Patents
吐出方法および吐出用装置 Download PDFInfo
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- JP2014514600A JP2014514600A JP2013558463A JP2013558463A JP2014514600A JP 2014514600 A JP2014514600 A JP 2014514600A JP 2013558463 A JP2013558463 A JP 2013558463A JP 2013558463 A JP2013558463 A JP 2013558463A JP 2014514600 A JP2014514600 A JP 2014514600A
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- 238000000034 method Methods 0.000 title claims abstract description 49
- 239000007788 liquid Substances 0.000 claims abstract description 201
- 230000033001 locomotion Effects 0.000 claims abstract description 9
- 230000001376 precipitating effect Effects 0.000 claims description 3
- 239000012530 fluid Substances 0.000 description 12
- 239000003921 oil Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 230000002209 hydrophobic effect Effects 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical group O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical group OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/007—Processes for applying liquids or other fluent materials using an electrostatic field
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B25/00—Eyepieces; Magnifying glasses
- G02B25/002—Magnifying glasses
- G02B25/004—Magnifying glasses having binocular arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Sampling And Sample Adjustment (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (14)
- 長尺塗布器を用いて表面の第1エリア上に第1液体の層を提供する方法であって、
前記塗布器と前記表面との間に長尺間隙が形成され、前記間隙は前記第1液体の長尺小滴により満たされ、
ある量の第2液体が前記塗布器と接触し前記小滴と接触する状態で配置され、前記第1液体および前記第2液体は不混和性であり、前記第1エリアは前記第2液体に対するよりも前記第1液体に対してより高い濡れ性を有し、
前記塗布器と前記表面との間に相対運動を加えるステップを含み、前記量の第2液体は前記塗布器の後続側面上にのみ配置される、方法。 - ある量の前記第1液体を前記間隙内に沈殿することにより前記間隙を満たすステップを含む、請求項1に記載の方法。
- 前記第1液体は、前記塗布器が移動する間、前記間隙内に沈殿される、請求項2に記載の方法。
- ある量の前記第2液体を前記塗布器の1つの側面にそって前記表面上に沈殿することにより前記第2液体を提供するステップを含む、請求項1、請求項2、または請求項3に記載の方法。
- 前記表面は実質的に水平である、請求項1から請求項4のいずれか1つに記載の方法。
- 前記表面は、前記第1液体に対するよりも前記第2液体に対してより高い濡れ性を有する前記第1エリアに隣接する第2エリアを有する、請求項1から請求項5のいずれか1つに記載の方法。
- 前記表面は、第2エリアにより隔てられた複数の第1エリアを含み、それにより1つのパターンが形成される、請求項6に記載の方法。
- 前記間隙は前記塗布器の長軸に平行な前記パターンの寸法と少なくとも同じ長さを有する、請求項7に記載の方法。
- 前記塗布器と前記表面との間の前記相対運動は前記塗布器の長軸に対して実質的に垂直な方向でなされる、請求項1から請求項8のいずれか1つに記載の方法。
- 第1エリアと第2エリアの間の境界線と前記塗布器の長軸方向とは0度とは異なる角度を形成する、請求項7、請求項8、または請求項9に記載の方法。
- 前記塗布器により前記表面をさらに走査するステップを含む、請求項1から請求項10のいずれか1つに記載の方法。
- 前記表面は第1支持プレートの一部であり、前記方法は第2支持プレートを提供するステップを含み、前記第2支持プレートは前記第1支持プレートと前記第2支持プレートとの間に空間を画成し、前記空間は前記第1液体および前記第2液体を含む、請求項1から請求項11のいずれか1つに記載の方法。
- 前記第1支持プレートおよび前記第2支持プレートはエレクトロウェッティング素子を形成する、請求項12に記載の方法。
- 請求項1から請求項13のいずれか1つに係る方法を用いて表面の第1エリア上に第1液体の層を提供するための塗布器を含む装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1104713.1A GB201104713D0 (en) | 2011-03-21 | 2011-03-21 | Dispensing method and device for dispensing |
GB1104713.1 | 2011-03-21 | ||
PCT/EP2012/054710 WO2012126851A1 (en) | 2011-03-21 | 2012-03-16 | Dispensing method and device for dispensing |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014514600A true JP2014514600A (ja) | 2014-06-19 |
JP5719457B2 JP5719457B2 (ja) | 2015-05-20 |
Family
ID=44012887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013558463A Active JP5719457B2 (ja) | 2011-03-21 | 2012-03-16 | 吐出方法および吐出用装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9259756B2 (ja) |
JP (1) | JP5719457B2 (ja) |
KR (1) | KR101522132B1 (ja) |
CN (1) | CN103492928B (ja) |
GB (1) | GB201104713D0 (ja) |
TW (1) | TWI547316B (ja) |
WO (1) | WO2012126851A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201220155D0 (en) | 2012-11-08 | 2012-12-26 | Samsung Lcd Nl R & D Ct Bv | Method of manufacture |
US9625704B1 (en) | 2014-12-19 | 2017-04-18 | Amazon Technologies, Inc. | Liquid dispensing method for manufacturing an electrowetting device |
US9581804B1 (en) | 2014-12-19 | 2017-02-28 | Amazon Technologies, Inc. | Liquid dispensing method for manufacturing an electrowetting device |
CN106773017B (zh) | 2017-01-22 | 2023-03-24 | 华南师范大学 | 一种干湿分离的电润湿显示器件的填充方法和填充设备 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4938994A (en) * | 1987-11-23 | 1990-07-03 | Epicor Technology, Inc. | Method and apparatus for patch coating printed circuit boards |
JPH04155622A (ja) * | 1990-10-19 | 1992-05-28 | Fuji Photo Film Co Ltd | 塗布方法 |
JP2003260400A (ja) * | 2002-03-08 | 2003-09-16 | Fuji Photo Film Co Ltd | 塗布方法及び装置 |
JP2004268028A (ja) * | 2003-02-18 | 2004-09-30 | Sharp Corp | 複合膜の製造方法、塗布方法、塗布材の流動制御方法、複合膜、カラーフィルタ、及びカラーフィルタを備えた表示装置 |
JP2004330164A (ja) * | 2003-05-12 | 2004-11-25 | Seiko Epson Corp | 薄膜パターン形成方法、デバイスとその製造方法及び電気光学装置並びに電子機器 |
JP2005262083A (ja) * | 2004-03-18 | 2005-09-29 | Sony Corp | 塗布方法 |
JP2007532942A (ja) * | 2004-04-08 | 2007-11-15 | リクアヴィスタ ビー. ヴィー. | ディスプレイデバイス |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1478974B1 (en) | 2002-02-19 | 2012-03-07 | Samsung LCD Netherlands R&D Center B.V. | Display device |
KR101129435B1 (ko) * | 2005-06-15 | 2012-03-27 | 삼성전자주식회사 | 전기습윤 표시패널과 이의 제조 방법 |
GB0707201D0 (en) * | 2007-04-13 | 2007-05-23 | Liquavista Bv | Dispensing method and device for dispensing |
GB0722812D0 (en) * | 2007-11-21 | 2008-01-02 | Liquavista Bv | Method of making an electrowetting device, apparatus for carrying out the method and electrowetting device |
GB0908681D0 (en) * | 2009-05-20 | 2009-07-01 | Liquavista Bv | Method of manufacturing an optical display |
-
2011
- 2011-03-21 GB GBGB1104713.1A patent/GB201104713D0/en not_active Ceased
-
2012
- 2012-03-16 CN CN201280013907.0A patent/CN103492928B/zh active Active
- 2012-03-16 JP JP2013558463A patent/JP5719457B2/ja active Active
- 2012-03-16 WO PCT/EP2012/054710 patent/WO2012126851A1/en active Application Filing
- 2012-03-16 KR KR1020137027246A patent/KR101522132B1/ko active IP Right Grant
- 2012-03-21 TW TW101109733A patent/TWI547316B/zh active
-
2013
- 2013-09-20 US US14/032,937 patent/US9259756B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4938994A (en) * | 1987-11-23 | 1990-07-03 | Epicor Technology, Inc. | Method and apparatus for patch coating printed circuit boards |
JPH04155622A (ja) * | 1990-10-19 | 1992-05-28 | Fuji Photo Film Co Ltd | 塗布方法 |
JP2003260400A (ja) * | 2002-03-08 | 2003-09-16 | Fuji Photo Film Co Ltd | 塗布方法及び装置 |
JP2004268028A (ja) * | 2003-02-18 | 2004-09-30 | Sharp Corp | 複合膜の製造方法、塗布方法、塗布材の流動制御方法、複合膜、カラーフィルタ、及びカラーフィルタを備えた表示装置 |
JP2004330164A (ja) * | 2003-05-12 | 2004-11-25 | Seiko Epson Corp | 薄膜パターン形成方法、デバイスとその製造方法及び電気光学装置並びに電子機器 |
JP2005262083A (ja) * | 2004-03-18 | 2005-09-29 | Sony Corp | 塗布方法 |
JP2007532942A (ja) * | 2004-04-08 | 2007-11-15 | リクアヴィスタ ビー. ヴィー. | ディスプレイデバイス |
Also Published As
Publication number | Publication date |
---|---|
KR101522132B1 (ko) | 2015-05-20 |
KR20130130866A (ko) | 2013-12-02 |
CN103492928B (zh) | 2016-02-10 |
CN103492928A (zh) | 2014-01-01 |
GB201104713D0 (en) | 2011-05-04 |
US9259756B2 (en) | 2016-02-16 |
US20140023792A1 (en) | 2014-01-23 |
TWI547316B (zh) | 2016-09-01 |
JP5719457B2 (ja) | 2015-05-20 |
WO2012126851A1 (en) | 2012-09-27 |
TW201249546A (en) | 2012-12-16 |
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