JP2014229481A - 荷電粒子線応用装置 - Google Patents

荷電粒子線応用装置 Download PDF

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Publication number
JP2014229481A
JP2014229481A JP2013108240A JP2013108240A JP2014229481A JP 2014229481 A JP2014229481 A JP 2014229481A JP 2013108240 A JP2013108240 A JP 2013108240A JP 2013108240 A JP2013108240 A JP 2013108240A JP 2014229481 A JP2014229481 A JP 2014229481A
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JP
Japan
Prior art keywords
charged particle
array
particle beam
lens
application apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013108240A
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English (en)
Japanese (ja)
Inventor
百代 圓山
Momoyo Maruyama
百代 圓山
谷本　明佳
Akiyoshi Tanimoto
明佳 谷本
慎 榊原
Shin Sakakibara
慎 榊原
太田　洋也
Hiroya Ota
洋也 太田
早田　康成
Yasunari Hayata
康成 早田
直正 鈴木
Naomasa Suzuki
直正 鈴木
伊藤　博之
Hiroyuki Ito
博之 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2013108240A priority Critical patent/JP2014229481A/ja
Priority to PCT/JP2014/062404 priority patent/WO2014188882A1/fr
Publication of JP2014229481A publication Critical patent/JP2014229481A/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2013108240A 2013-05-22 2013-05-22 荷電粒子線応用装置 Pending JP2014229481A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013108240A JP2014229481A (ja) 2013-05-22 2013-05-22 荷電粒子線応用装置
PCT/JP2014/062404 WO2014188882A1 (fr) 2013-05-22 2014-05-08 Dispositif d'application de faisceau de particules chargées

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013108240A JP2014229481A (ja) 2013-05-22 2013-05-22 荷電粒子線応用装置

Publications (1)

Publication Number Publication Date
JP2014229481A true JP2014229481A (ja) 2014-12-08

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ID=51933445

Family Applications (1)

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JP2013108240A Pending JP2014229481A (ja) 2013-05-22 2013-05-22 荷電粒子線応用装置

Country Status (2)

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JP (1) JP2014229481A (fr)
WO (1) WO2014188882A1 (fr)

Cited By (27)

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KR20180018483A (ko) * 2015-03-10 2018-02-21 헤르메스 마이크로비전 인코포레이티드 복수의 하전 입자 빔을 이용하는 장치
JP2018513543A (ja) * 2016-04-13 2018-05-24 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数荷電粒子ビームの装置
JP2018520495A (ja) * 2015-07-22 2018-07-26 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数荷電粒子ビームの装置
US10109456B2 (en) 2015-03-10 2018-10-23 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US10157723B2 (en) 2016-08-03 2018-12-18 Nuflare Technology, Inc. Multi charged particle beam writing apparatus and method of adjusting the same
KR20190041016A (ko) * 2016-09-08 2019-04-19 케이엘에이-텐코 코포레이션 다중열 스캐닝 전자 현미경 시스템에서 배열된 비점수차를 보정하기 위한 장치 및 방법
JP2019145506A (ja) * 2019-03-05 2019-08-29 エーエスエムエル ネザーランズ ビー．ブイ． 複数荷電粒子ビームの装置
JP2019204694A (ja) * 2018-05-24 2019-11-28 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
JP2020511770A (ja) * 2017-03-01 2020-04-16 ドンファン ジンギュアン エレクトロン リミテッド 複数の電子ビームを用いたパターン基板画像形成
US10734190B2 (en) 2018-05-18 2020-08-04 Nuflare Technology, Inc. Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method
JP2020161497A (ja) * 2020-06-17 2020-10-01 エーエスエムエル ネザーランズ ビー．ブイ． 複数荷電粒子ビームの装置
EP3840010A1 (fr) * 2019-12-19 2021-06-23 ASML Netherlands B.V. Systèmes et procédés d'atténuation d'aberrations chromatiques
WO2021122862A1 (fr) * 2019-12-19 2021-06-24 Asml Netherlands B.V. Systèmes et procédés d'atténuation d'aberration chromatique
US11139138B2 (en) 2019-03-05 2021-10-05 Nuflare Technology, Inc. Multiple electron beams irradiation apparatus
US11145485B2 (en) 2018-12-26 2021-10-12 Nuflare Technology, Inc. Multiple electron beams irradiation apparatus
US11158482B2 (en) 2018-02-16 2021-10-26 Carl Zeiss Multisem Gmbh Multi-beam particle microscope
US11164715B2 (en) 2018-05-21 2021-11-02 Carl Zeiss Multisem Gmbh Charged particle beam system
US11239053B2 (en) 2018-02-27 2022-02-01 Carl Zeiss Multisem Gmbh Charged particle beam system and method
US11239054B2 (en) 2018-02-16 2022-02-01 Carl Zeiss Multisem Gmbh Multi-beam particle beam system
US11521827B2 (en) 2019-01-24 2022-12-06 Carl Zeiss Multisem Gmbh Method of imaging a 2D sample with a multi-beam particle microscope
US11562880B2 (en) 2018-09-27 2023-01-24 Carl Zeiss Multisem Gmbh Particle beam system for adjusting the current of individual particle beams
JP2023514498A (ja) * 2020-02-21 2023-04-06 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
US11645740B2 (en) 2018-09-21 2023-05-09 Carl Zeiss Multisem Gmbh Method for detector equalization during the imaging of objects with a multi-beam particle microscope
US11657999B2 (en) 2015-02-06 2023-05-23 Carl Zeiss Multisem Gmbh Particle beam system and method for the particle-optical examination of an object
US11735393B2 (en) 2018-09-28 2023-08-22 Carl Zeiss Multisem Gmbh Method for operating a multi-beam particle beam microscope
JP7409946B2 (ja) 2020-04-13 2024-01-09 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム照射装置及びマルチ荷電粒子ビーム検査装置
US11935721B2 (en) 2019-01-24 2024-03-19 Carl Zeiss Multisem Gmbh System comprising a multi-beam particle microscope and method for operating the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021140035A1 (fr) 2020-01-06 2021-07-15 Asml Netherlands B.V. Outil d'évaluation de particules chargées, procédé d'inspection

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8200559A (nl) * 1982-02-15 1983-09-01 Ir Jan Bart Le Poole Prof Dr Bestralingsinrichting met bundelsplitsing.
KR100465117B1 (ko) * 2000-04-04 2005-01-05 주식회사 아도반테스토 다축전자렌즈를 이용한 멀티빔 노광장치, 복수의 전자빔을집속하는 다축전자렌즈, 반도체소자 제조방법
JP4756776B2 (ja) * 2001-05-25 2011-08-24 キヤノン株式会社 荷電粒子線露光装置、荷電粒子線露光方法およびデバイス製造方法
NL1032066C2 (nl) * 2006-06-27 2008-01-02 Univ Delft Tech Werkwijze en inrichting voor het vormen van een afbeelding.
US7763851B2 (en) * 2006-12-22 2010-07-27 Ims Nanofabrication Ag Particle-beam apparatus with improved wien-type filter
EP2453461A1 (fr) * 2010-11-10 2012-05-16 FEI Company Source de particule chargée avec un filtre d'énergie électrostatique intégrée

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US11657999B2 (en) 2015-02-06 2023-05-23 Carl Zeiss Multisem Gmbh Particle beam system and method for the particle-optical examination of an object
KR102014868B1 (ko) * 2015-03-10 2019-08-27 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
KR102320860B1 (ko) 2015-03-10 2021-11-02 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
KR20180018483A (ko) * 2015-03-10 2018-02-21 헤르메스 마이크로비전 인코포레이티드 복수의 하전 입자 빔을 이용하는 장치
US11107657B2 (en) 2015-03-10 2021-08-31 Asml Netherlands B.V. Apparatus of plural charged-particle beams
US10109456B2 (en) 2015-03-10 2018-10-23 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US10643820B2 (en) 2015-03-10 2020-05-05 Hermes Microvision Inc. Apparatus of plural charged-particle beams
KR20190100460A (ko) * 2015-03-10 2019-08-28 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US10276347B2 (en) 2015-03-10 2019-04-30 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US10395886B2 (en) 2015-07-22 2019-08-27 Asml Netherlands B.V. Apparatus of plural charged-particle beams
CN108738363B (zh) * 2015-07-22 2020-08-07 Asml荷兰有限公司 多个带电粒子束的装置
JP2018520495A (ja) * 2015-07-22 2018-07-26 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数荷電粒子ビームの装置
KR102651558B1 (ko) 2015-07-22 2024-03-26 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US20210233736A1 (en) * 2015-07-22 2021-07-29 Asml Netherlands B.V. Apparatus of plural charged-particle beams
KR20220134790A (ko) * 2015-07-22 2022-10-05 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
CN108738363A (zh) * 2015-07-22 2018-11-02 汉民微测科技股份有限公司 多个带电粒子束的装置
US11587758B2 (en) 2015-07-22 2023-02-21 Asml Netherlands B.V. Apparatus of plural charged-particle beams
US10879031B2 (en) 2015-07-22 2020-12-29 Asml Netherlands B.V. Apparatus of plural charged-particle beams
US11887807B2 (en) 2015-07-22 2024-01-30 Asml Netherlands B.V. Apparatus of plural charged-particle beams
JP2018513543A (ja) * 2016-04-13 2018-05-24 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数荷電粒子ビームの装置
CN108292583A (zh) * 2016-04-13 2018-07-17 汉民微测科技股份有限公司 多个带电粒子束的装置
US10157723B2 (en) 2016-08-03 2018-12-18 Nuflare Technology, Inc. Multi charged particle beam writing apparatus and method of adjusting the same
KR102515235B1 (ko) * 2016-09-08 2023-03-28 케이엘에이 코포레이션 다중열 스캐닝 전자 현미경 시스템에서 배열된 비점수차를 보정하기 위한 장치 및 방법
JP2019526912A (ja) * 2016-09-08 2019-09-19 ケーエルエー コーポレイション マルチカラム走査電子顕微鏡法システムにおけるアレイ型非点収差を修正するための装置及び方法
KR20190041016A (ko) * 2016-09-08 2019-04-19 케이엘에이-텐코 코포레이션 다중열 스캐닝 전자 현미경 시스템에서 배열된 비점수차를 보정하기 위한 장치 및 방법
JP7119010B2 (ja) 2017-03-01 2022-08-16 ドンファン ジンギュアン エレクトロン リミテッド マルチビーム画像形成システムを用いて基板表面の画像を形成する方法、及び、多数の電子ビームレットを用いて基板表面の画像を形成するためのシステム
JP2020511770A (ja) * 2017-03-01 2020-04-16 ドンファン ジンギュアン エレクトロン リミテッド 複数の電子ビームを用いたパターン基板画像形成
US11239054B2 (en) 2018-02-16 2022-02-01 Carl Zeiss Multisem Gmbh Multi-beam particle beam system
US11158482B2 (en) 2018-02-16 2021-10-26 Carl Zeiss Multisem Gmbh Multi-beam particle microscope
US11239053B2 (en) 2018-02-27 2022-02-01 Carl Zeiss Multisem Gmbh Charged particle beam system and method
US10734190B2 (en) 2018-05-18 2020-08-04 Nuflare Technology, Inc. Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method
US11164715B2 (en) 2018-05-21 2021-11-02 Carl Zeiss Multisem Gmbh Charged particle beam system
US11562881B2 (en) 2018-05-21 2023-01-24 Carl Zeiss Multisem Gmbh Charged particle beam system
JP7057220B2 (ja) 2018-05-24 2022-04-19 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
US10896801B2 (en) 2018-05-24 2021-01-19 Nuflare Technology, Inc. Multiple electron beam image acquisition apparatus, and alignment method of multiple electron beam optical system
JP2019204694A (ja) * 2018-05-24 2019-11-28 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
US11645740B2 (en) 2018-09-21 2023-05-09 Carl Zeiss Multisem Gmbh Method for detector equalization during the imaging of objects with a multi-beam particle microscope
US11562880B2 (en) 2018-09-27 2023-01-24 Carl Zeiss Multisem Gmbh Particle beam system for adjusting the current of individual particle beams
US11735393B2 (en) 2018-09-28 2023-08-22 Carl Zeiss Multisem Gmbh Method for operating a multi-beam particle beam microscope
US11145485B2 (en) 2018-12-26 2021-10-12 Nuflare Technology, Inc. Multiple electron beams irradiation apparatus
US11521827B2 (en) 2019-01-24 2022-12-06 Carl Zeiss Multisem Gmbh Method of imaging a 2D sample with a multi-beam particle microscope
US11935721B2 (en) 2019-01-24 2024-03-19 Carl Zeiss Multisem Gmbh System comprising a multi-beam particle microscope and method for operating the same
JP2019145506A (ja) * 2019-03-05 2019-08-29 エーエスエムエル ネザーランズ ビー．ブイ． 複数荷電粒子ビームの装置
TWI786705B (zh) * 2019-03-05 2022-12-11 日商紐富來科技股份有限公司 多電子束照射裝置
US11139138B2 (en) 2019-03-05 2021-10-05 Nuflare Technology, Inc. Multiple electron beams irradiation apparatus
TWI773020B (zh) * 2019-12-19 2022-08-01 荷蘭商Ａｓｍｌ荷蘭公司 用於色像差減輕之系統及方法
WO2021122862A1 (fr) * 2019-12-19 2021-06-24 Asml Netherlands B.V. Systèmes et procédés d'atténuation d'aberration chromatique
EP3840010A1 (fr) * 2019-12-19 2021-06-23 ASML Netherlands B.V. Systèmes et procédés d'atténuation d'aberrations chromatiques
JP2023514498A (ja) * 2020-02-21 2023-04-06 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
JP7482238B2 (ja) 2020-02-21 2024-05-13 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
JP7409946B2 (ja) 2020-04-13 2024-01-09 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム照射装置及びマルチ荷電粒子ビーム検査装置
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JP2020161497A (ja) * 2020-06-17 2020-10-01 エーエスエムエル ネザーランズ ビー．ブイ． 複数荷電粒子ビームの装置

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