JP2014209595A5 - - Google Patents
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- JP2014209595A5 JP2014209595A5 JP2014055836A JP2014055836A JP2014209595A5 JP 2014209595 A5 JP2014209595 A5 JP 2014209595A5 JP 2014055836 A JP2014055836 A JP 2014055836A JP 2014055836 A JP2014055836 A JP 2014055836A JP 2014209595 A5 JP2014209595 A5 JP 2014209595A5
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- JP
- Japan
- Prior art keywords
- substrate
- liquid
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- 239000000758 substrate Substances 0.000 claims 13
- 239000007788 liquid Substances 0.000 claims 9
- 230000001678 irradiating effect Effects 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 3
- 238000003672 processing method Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 239000011555 saturated liquid Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014055836A JP6612015B2 (ja) | 2013-03-28 | 2014-03-19 | 基板処理装置及び基板処理方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013069259 | 2013-03-28 | ||
| JP2013069259 | 2013-03-28 | ||
| JP2014055836A JP6612015B2 (ja) | 2013-03-28 | 2014-03-19 | 基板処理装置及び基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014209595A JP2014209595A (ja) | 2014-11-06 |
| JP2014209595A5 true JP2014209595A5 (https=) | 2017-02-09 |
| JP6612015B2 JP6612015B2 (ja) | 2019-11-27 |
Family
ID=51903612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014055836A Active JP6612015B2 (ja) | 2013-03-28 | 2014-03-19 | 基板処理装置及び基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6612015B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6934376B2 (ja) * | 2017-09-20 | 2021-09-15 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
| JP2025074800A (ja) * | 2023-10-30 | 2025-05-14 | 株式会社Screenホールディングス | 基板処理装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01286425A (ja) * | 1988-05-13 | 1989-11-17 | Hitachi Ltd | 付着物除去方法とその装置 |
| KR910010639A (ko) * | 1989-11-13 | 1991-06-29 | 제임스 조셉 드롱 | 압력차에 의해 제품의 표면에서 오염입자를 제거시키는 방법 및 장치 |
| JPH047071A (ja) * | 1990-04-24 | 1992-01-10 | Ebara Res Co Ltd | 洗浄方法 |
| JPH0458527A (ja) * | 1990-06-28 | 1992-02-25 | Ebara Res Co Ltd | 洗浄方法 |
| JP2777498B2 (ja) * | 1991-12-06 | 1998-07-16 | 三菱電機株式会社 | 基板の洗浄方法 |
| JPH05259142A (ja) * | 1992-03-12 | 1993-10-08 | Hitachi Ltd | 微細加工品の洗浄方法及び装置 |
| JPH1064863A (ja) * | 1996-08-21 | 1998-03-06 | Nikon Corp | 基板洗浄装置 |
| JP2006093740A (ja) * | 2002-07-16 | 2006-04-06 | Chem Art Technol:Kk | 基板処理方法及び基板処理装置 |
-
2014
- 2014-03-19 JP JP2014055836A patent/JP6612015B2/ja active Active
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