JP2014208833A - ジオレフィン樹脂、エポキシ樹脂、及び該組成物 - Google Patents
ジオレフィン樹脂、エポキシ樹脂、及び該組成物 Download PDFInfo
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- JP2014208833A JP2014208833A JP2014125600A JP2014125600A JP2014208833A JP 2014208833 A JP2014208833 A JP 2014208833A JP 2014125600 A JP2014125600 A JP 2014125600A JP 2014125600 A JP2014125600 A JP 2014125600A JP 2014208833 A JP2014208833 A JP 2014208833A
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- Prior art keywords
- epoxy resin
- acid
- resin composition
- reaction
- curable resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 75
- 229920005989 resin Polymers 0.000 title claims abstract description 32
- 239000011347 resin Substances 0.000 title claims abstract description 32
- 150000001993 dienes Chemical class 0.000 title claims abstract description 15
- 239000000203 mixture Substances 0.000 title description 22
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims abstract description 10
- 230000001590 oxidative effect Effects 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000005376 alkyl siloxane group Chemical group 0.000 claims abstract description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 6
- 239000011342 resin composition Substances 0.000 claims description 61
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 41
- 150000001875 compounds Chemical class 0.000 claims description 40
- 239000003795 chemical substances by application Substances 0.000 claims description 22
- 239000003054 catalyst Substances 0.000 claims description 14
- 239000004593 Epoxy Substances 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000004965 peroxy acids Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 2
- -1 methyl dicyclopentadiene Chemical compound 0.000 abstract description 50
- 238000006243 chemical reaction Methods 0.000 abstract description 45
- 230000003287 optical effect Effects 0.000 abstract description 32
- 125000002723 alicyclic group Chemical group 0.000 abstract description 9
- 239000000463 material Substances 0.000 description 48
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- 150000003839 salts Chemical class 0.000 description 20
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- 239000000047 product Substances 0.000 description 16
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- 238000010438 heat treatment Methods 0.000 description 15
- 235000021317 phosphate Nutrition 0.000 description 15
- 239000011521 glass Substances 0.000 description 14
- 229910052698 phosphorus Inorganic materials 0.000 description 14
- 239000011574 phosphorus Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
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- 239000010452 phosphate Substances 0.000 description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
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- 150000008065 acid anhydrides Chemical class 0.000 description 11
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- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 8
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- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000011256 inorganic filler Substances 0.000 description 6
- 229910003475 inorganic filler Inorganic materials 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000012945 sealing adhesive Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 150000007514 bases Chemical class 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 150000005846 sugar alcohols Polymers 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
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- 125000004122 cyclic group Chemical group 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 4
- 239000012776 electronic material Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 4
- 239000004611 light stabiliser Substances 0.000 description 4
- 239000003504 photosensitizing agent Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 238000004382 potting Methods 0.000 description 4
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- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 150000003657 tungsten Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000013191 viscoelastic testing Methods 0.000 description 1
- 235000019154 vitamin C Nutrition 0.000 description 1
- 239000011718 vitamin C Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Polymers & Plastics (AREA)
Abstract
Description
またコンポジット材、車の車体や船舶の構造材として、近年、その製造法の簡便さからRTMが使用されている。このような組成物においてはカーボンファイバー等への含浸のされやすさから低粘度のエポキシ樹脂が望まれている。
すなわち本発明は、
(1)2つのSi−H結合を有するアルキルシロキサンとジシクロペンタジエンおよび/またはメチルジシクロペンタジエンとの反応により得られるジオレフィン樹脂
(2)下記式(1)
で表されることを特徴とするジオレフィン樹脂、
(3)前項(1)又は(2)いずれか一項に記載のジオレフィン化合物を酸化することにより得られるエポキシ樹脂、
(4)過酸化水素、過酸のいずれかを用いてエポキシ化することを特徴とする前項(3)に記載のエポキシ樹脂、
(5)前項(3)又は(4)のいずれか一項に記載のエポキシ樹脂と硬化剤および/または硬化触媒を含有する硬化性樹脂組成物、
(6)前項(5)に記載の硬化性樹脂組成物を硬化してなる硬化物、
に関する。
で表される。
本発明においては特にくり返し数nが0である前記式(1)の構造が好ましい。
ここで、式(2)の化合物の分子量分布は仕込みの比率と温度で制御をすることが可能である。
過酸によるエポキシ化の手法としては具体的には特開2006−52187号公報に記載の手法などが挙げられる。
過酸化水素水によるエポキシ化の手法においては種々の手法が適応できるが、具体的には、特開昭59−108793号公報、特開昭62−234550号公報、特開平5−213919号公報、特開平11−349579号公報、特公平1―33471号公報、特開2001−17864号公報、特公平3−57102号公報等に挙げられるような手法が適応できる。
まず、本発明のジオレフィン樹脂、ポリ酸類及び4級アンモニウム塩を有機物、過酸化水素水の懸濁状態で反応を行う。
具体的なポリ酸類としては、タングステン酸、12−タングスト燐酸、12−タングストホウ酸、18−タングスト燐酸、12−タングストケイ酸、などのタングステン系の酸、モリブデン酸、燐モリブデン酸等のモリブデン系の酸の塩等が挙げられる。
これらの塩のカウンターカチオンとしてはアンモニウムイオン、アルカリ土類金属イオン、アルカリ金属イオンなどが挙げられる。
具体的にはカルシウムイオン、マグネシウムイオン等のアルカリ土類金属イオン、ナトリウム、カリウム、セシウム等のアルカリ金属イオンなどが挙げられるがこれらに限定されない。特に好ましいカウンターカチオンとしてはナトリウムイオン、カリウムイオン、カルシウムイオン、アンモニウムイオンである。
具体的にはトリデカニルメチルアンモニウム塩、ジラウリルジメチルアンモニウム塩、トリオクチルメチルアンモニウム塩、トリアルキルメチル(アルキル基がオクチル基である化合物とデカニル基である化合物の混合タイプ)アンモニウム塩、トリヘキサデシルメチルアンモニウム塩、トリメチルステアリルアンモニウム塩、テトラペンチルアンモニウム塩、セチルトリメチルアンモニウム塩、ベンジルトリブチルアンモニウム塩、ジセチルジメチルアンモニウム塩、トリセチルメチルアンモニウム塩、ジ硬化牛脂アルキルジメチルアンモニウム塩などが挙げられるがこれらに限定されない。特に炭素数が25〜100の物が好ましい。
またこれら塩のアニオン種に特に限定はなく、具体的にはハロゲン化物イオン、硝酸イオン、硫酸イオン、硫酸水素イオン、アセテートイオン、炭酸イオン、等が挙げられるが、これらに限定されない。
炭素数が100を上回ると疎水性が強くなりすぎて、4級アンモニウム塩の有機層への溶解性が悪くなる場合がある。炭素数が10以下であると親水性が強くなり、同様に4級アンモニウム塩の有機層への相溶性が悪くなり、好ましくない。
4級アンモニウム塩の使用量は使用するタングステン酸類の価数倍の0.01〜0.8倍当量、あるいは1.1〜10倍当量が好ましい。より好ましくは0.05〜0.7倍当量、あるいは1.2〜6.0倍当量であり、さらに好ましくは0.05〜0.5倍当量、あるいは1.3〜4.5倍当量である。
例えば、タングステン酸であればH2WO4で2価であるので、タングステン酸1モルに対し、4級アンモニウムのカルボン酸塩は0.02〜1.6モル、もしくは2.2〜20モルの範囲が好ましい。またタングスト燐酸であれば3価であるので、同様に0.03〜2.4モル、もしくは3.3〜20モル、ケイタングステン酸であれば4価であるので0.04〜3.2モル、もしくは4.4〜40モルが好ましい。
4級アンモニウムのカルボン酸塩の量が、タングステン酸類の価数倍の1.1倍当量よりも低い場合、エポキシ化反応が進行しづらい(場合によっては反応の進行が早くなる)、また副生成物ができやすいという問題が生じる。10倍当量よりも多い場合、後処理が大変であるばかりか、反応を抑制する働きがあり、好ましくない。
特に本発明においては触媒であるタングステン酸類を溶解した際に、pH5〜9の間になるように調整されることが好ましい。
緩衝液の使用方法は、例えば好ましい緩衝液である燐酸−燐酸塩水溶液の場合は過酸化水素に対し、0.1〜10モル%当量の燐酸(あるいは燐酸二水素ナトリウム等の燐酸塩)を使用し、塩基性化合物(たとえば水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸カリウム等)でpH調整を行うという方法が挙げられる。ここでpHは過酸化水素を添加した際に前述のpHになるように添加することが好ましい。また、燐酸二水素ナトリウム、燐酸水素二ナトリウムなどを用いて調整することも可能である。好ましい燐酸塩の濃度は0.1〜60重量%、より好ましくは1〜45重量%である。 また、本反応においては緩衝液を使用せず、燐酸水素2ナトリウム、燐酸2水素ナトリウム、燐酸ナトリウム、トリポリ燐酸ナトリウム、など(またはその水和物)を、pH調整無しに燐酸塩を直接添加しても構わない。工程の簡略化、という意味合いではpH調整のわずらわしさが無く、直接の添加が特に好ましい。この場合の燐酸塩の使用量は、過酸化水素に対し、通常0.1〜5モル%当量、好ましくは0.2〜4モル%当量、より好ましくは、0.3〜3モル%当量である。この際、過酸化水素に対し、5モル%当量を超えるとpH調整が必要となり、0.1モル%当量以下の場合、できたエポキシ化合物の加水分解物が進行しやすくなる、あるいは反応が遅くなるなどの弊害が生じる。
あるいは水、有機溶剤、炭素-炭素二重結合を有する化合物を撹拌している中に、タングステン酸類、燐酸(あるいは燐酸塩類)を加え、pH調整を行った後、4級アンモニウム塩を添加し、二層で撹拌したところに、過酸化水素を滴下するという手法を用いるという方法でも構わない。
これらは水溶液として加えることが好ましく、その濃度は0.5〜30重量%である。
水や有機溶剤に溶解しない固体塩基を使用する場合、系中に残存する過酸化水素の量に対し、重量比で1〜1000倍の量を使用することが好ましい。より好ましくは10〜500倍、さらに好ましくは10〜300倍である。水や有機溶剤に溶解しない固体塩基を使用する場合は、後に記載する水層と有機層の分離の後、処理を行っても構わない。
得られた有機層は必要に応じてイオン交換樹脂や金属酸化物(特に、シリカゲル、アルミナなどが好ましい)、活性炭(中でも特に薬品賦活活性炭が好ましい)、複合金属塩(中でも特に塩基性複合金属塩が好ましい)、粘度鉱物(中でも特にモンモリロナイトなど層状粘度鉱物が好ましい)等により、不純物を除去し、さらに水洗、ろ過等を行った後、溶剤を留去し、目的とするエポキシ化合物を得る。場合によってはさらにカラムクロマトグラフィーや蒸留により精製しても構わない。
で表される分子を主成分とするが、エポキシが開環した加水分解体、未反応のオレフィン体、さらにはエポキシ基同士の重合した高分子量体や、その他副反応物が反応条件によっては生成する。
これらエポキシ樹脂としては、シクロヘキセンカルボン酸とアルコール類とのエステル化反応あるいはシクロヘキセンメタノールとカルボン酸類とのエステル化反応(Tetrahedron vol.36 p.2409 (1980)、Tetrahedron Letter p.4475 (1980)等に記載の手法)、あるいはシクロヘキセンアルデヒドのティシェンコ反応(特開2003−170059号公報、特開2004−262871号公報等に記載の手法)、さらにはシクロヘキセンカルボン酸エステルのエステル交換反応(特開2006−052187号公報等に記載の手法)によって製造できる化合物を酸化した物などが挙げられる。
アルコール類としては、アルコール性水酸基を有する化合物であれば特に限定されないがエチレングリコール、プロピレングリコール、1,3−プロパンジオール、1,2−ブタンジオール、1,4−ブタンジオール、1,5−ペンタンジオール、1,6−ヘキサンジオール、シクロヘキサンジメタノール、2,4−ジエチルペンタンジオール、2−エチル−2−ブチル−1.3−プロパンジオール、ネオペンチルグリコール、トリシクロデカンジメタノール、ノルボルネンジオールなどのジオール類、グリセ燐、トリメチロールエタン、トリメチロールプロパン、トリメチロールブタン、2−ヒドロキシメチル−1,4−ブタンジオールなどのトリオール類、ペンタエリスリトール、ジトリメチロールプロパンなどのテトラオール類などが挙げられる。またカルボン酸類としてはシュウ酸、マレイン酸、フマル酸、フタル酸、イソフタル酸、アジピン酸、シクロヘキサンジカルボン酸などが挙げられるがこれに限らない。
これらエポキシ樹脂の具体例としては、ERL−4221、UVR−6105、ERL−4299(全て商品名、いずれもダウ・ケミカル製)、セロキサイド2021P、エポリードGT401、EHPE3150、EHPE3150CE(全て商品名、いずれもダイセル化学工業製)及びジシクロペンタジエンジエポキシドなどが挙げられるがこれらに限定されるものではない(参考文献:総説エポキシ樹脂 基礎編I p76−85)。
これらは単独で用いてもよく、2種以上併用してもよい。
本発明の硬化性樹脂組成物Aが含有する硬化剤としては、例えばアミン系化合物、酸無水物系化合物、アミド系化合物、フェノール系化合物、カルボン酸系化合物などが挙げられる。用いうる硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンより合成されるポリアミド樹脂などの含窒素化合物(アミン、アミド化合物);無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ブタンテトラカルボン酸無水物、ビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、メチルビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物、などの酸無水物;各種アルコール、カルビノール変性シリコーン、と前述の酸無水物との付加反応により得られるカルボン酸樹脂;ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、テルペンジフェノール、4,4’−ビフェノール、2,2’−ビフェノール、3,3’,5,5’−テトラメチル−[1,1’−ビフェニル]−4,4’−ジオール、ハイドロキノン、レゾルシン、ナフタレンジオール、トリス−(4−ヒドロキシフェニル)メタン、1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン、フェノール類(フェノール、アルキル置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、ジヒドロキシナフタレン等)とホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p−ヒドロキシベンズアルデヒド、o−ヒドロキシベンズアルデヒド、p−ヒドロキシアセトフェノン、o−ヒドロキシアセトフェノン、ジシクロペンタジエン、フルフラール、4,4’−ビス(クロロメチル)−1,1’−ビフェニル、4,4’−ビス(メトキシメチル)−1,1’−ビフェニル、1,4’−ビス(クロロメチル)ベンゼン、1,4’−ビス(メトキシメチル)ベンゼン等との重縮合物及びこれらの変性物、テトラブロモビスフェノールA等のハロゲン化ビスフェノール類、テルペンとフェノール類の縮合物などのポリフェノール類;イミダゾール、トリフルオロボラン−アミン錯体、グアニジン誘導体の化合物などが挙げられるが、これらに限定されるものではない。これらは単独で用いてもよく、2種以上を用いてもよい。
本発明においては特に前述の酸無水物、カルボン酸樹脂に代表される、酸無水物構造、及び/またはカルボン酸構造を有する化合物が好ましい。
2〜4官能の多価アルコールとしては、アルコール性水酸基を有する化合物であれば特に限定されないがエチレングリコール、プロピレングリコール、1,3−プロパンジオール、1,2−ブタンジオール、1,4−ブタンジオール、1,5−ペンタンジオール、1,6−ヘキサンジオール、シクロヘキサンジメタノール、2,4−ジエチルペンタンジオール、2−エチル−2−ブチル−1,3−プロパンジオール、ネオペンチルグリコール、トリシクロデカンジメタノール、ジシクロペンタジエンジメタノール、ノルボルネンジオール等のジオール類、グリセ燐、トリメチロールエタン、トリメチロールプロパン、トリメチロールブタン、2−ヒドロキシメチル−1,4−ブタンジオール等のトリオール類、ペンタエリスリトール、ジトリメチロールプロパン等のテトラオール類等が挙げられる。 特に好ましい2〜4官能の多価アルコールとしてはシクロヘキサンジメタノール、2,4−ジエチルペンタンジオール、2−エチル−2−ブチル−1,3−プロパンジオール、ネオペンチルグリコール、トリシクロデカンジメタノール、ジシクロペンタジエンジメタノール、ノルボルネンジオール等の分岐鎖状や環状のアルコール類である。
加熱条件は例えば80〜230℃で1分〜24時間程度が好ましい。加熱硬化の際に発生する内部応力を低減する目的で、例えば80〜120℃、30分〜5時間予備硬化させた後に、120〜180℃、30分〜10時間の条件で後硬化させることができる。
注入方法としては、ディスペンサー、トランスファー成形、射出成形等が挙げられる。加熱は、熱風循環式、赤外線、高周波等の方法が使用できる。
加熱条件は例えば80〜230℃で1分〜24時間程度が好ましい。加熱硬化の際に発生する内部応力を低減する目的で、例えば80〜120℃、30分〜5時間予備硬化させた後に、120〜180℃、30分〜10時間の条件で後硬化させることができる。
酸性硬化触媒を用いて硬化させる本発明の硬化性樹脂組成物Bは、酸性硬化触媒として光重合開始剤あるいは熱重合開始剤を含有する。さらに、希釈剤、重合性モノマー、重合性オリゴマー、重合開始補助剤、光増感剤等の各種公知の化合物、材料等を含有していてもよい。また、所望に応じて無機充填材、着色顔料、紫外線吸収剤、酸化防止剤、安定剤等、各種公知の添加剤を含有してもよい。
また、具体例としては、「アデカオプトマーSP150」、「アデカオプトマーSP170」(いずれも旭電化工業社製)、「UVE−1014」(ゼネラルエレクトロニクス社製)、「CD−1012」(サートマー社製)、「RP−2074」(ローディア社製)等が挙げられる。 該カチオン重合開始剤の使用量は、エポキシ樹脂成分100重量部に対して、好ましくは、0.01〜50重量部であり、より好ましくは、0.1〜10重量部である。
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、窒素パージを施しながら、ジシクロペンタジエン79.3部、1,1,3,3-テトラメチルジシロキサン40.3部、トルエン200部を加え、1%ヘキサクロロ白金酸・THF溶液を10mg添加し、50℃で反応を行った。8時間反応するごとに1%ヘキサクロロ白金酸・THF溶液を10mg追加していき、合計で40時間反応を行った。その後、水洗を5回繰り返し、ロータリーエバポレーターで加熱減圧下においてトルエンを留去することで、下記式(4)
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、窒素パージを施しながら、ジシクロペンタジエン79.3部、1,1,3,3-テトラメチルジシロキサン53.9部、トルエン200部を加え、1%ヘキサクロロ白金酸・THF溶液を10mg添加し、50℃で5時間、60℃2時間反応後、80℃に昇温して反応を行った。なお、8時間反応するごとに1%ヘキサクロロ白金酸・THF溶液を10mg追加していき、合計で40時間反応を行った。その後、水洗を5回繰り返し、ロータリーエバポレーターで加熱減圧下においてトルエンを留去することで、下記式(5)
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、窒素パージを施しながら水15部、12−タングスト燐酸0.95部、燐酸水素2ナトリウム0.78部、ジ牛脂アルキルジメチルアンモニウムアセテート2.7部(ライオンアクゾ製 50重量%ヘキサン溶液、アカード2HTアセテート)を加え、タングステン酸系触媒を生成させた後、トルエン120部、実施例2で得られたジオレフィン化合物D1を81部を加え、さらに再度攪拌することで懸濁状態の液とした。この溶液を50℃に昇温し、激しく攪拌しながら、35%過酸化水素水55部を加え、そのまま50℃で15時間攪拌した。GCにて反応の進行を確認したところ、反応終了後の基質のコンバ−ジョンは>99%であり、原料ピークは消失していた。 ついで1重量%水酸化ナトリウム水溶液で中和した後、20重量%チオ硫酸ナトリウム水溶液25部を加え30分攪拌を行い、静置した。2層に分離した有機層を取り出し、ここに活性炭(味の素ファインテクノ製 CP2)15部、シリカゲル5部を加え、室温で3時間攪拌後、ろ過した。得られたろ液を水100部で3回水洗を行い、得られた有機層より、有機溶剤を留去することで、下記式(6)
実施例3で得られた本発明のエポキシ樹脂(EP1)9.5部、脂環式エポキシ樹脂A(3,4−エポキシシクロヘキシルメチル−3'、4'−エポキシシクロヘキシルカルボキシレート、日本化薬製 SEJ−01R)6.6部、硬化剤として、メチルヘキサヒドロフタル酸無水物(新日本理化(株)製、リカシッドMH700G)8.4部、1,3,4-シクロヘキサントリカルボン酸−3,4−無水物(H−TMAn)4.9部、硬化促進剤としてヘキサデシルトリメチルアンモニウムヒドロキシド(東京化成工業(株)製 25%メタノール溶液)0.2部を配合し、20分間脱泡を行い、本発明の硬化性組成物Bを得た。
実施例4における脂環式エポキシ樹脂Aを脂環式エポキシ樹脂C(ビス(3,4−エポキシシクロヘキシルメチル)アジペート、ダウケミカル製 ERL−4299)9.7部に変更した意外は同様にして、本発明の硬化性組成物Dを得た。
実施例4〜6で得られた硬化性樹脂組成物を真空脱泡20分間実施後、横7mm、縦5cm、厚み約800μmの試験片用金型に静かに注型し、その後上からポリイミドフィルムでフタをした。その注型物を前述の条件で硬化させ動的粘弾性用試験片を得た。これらの試験片を用い、下記に示した条件で、動的粘弾性試験を実施した。 硬化性組成物Bの硬化物はTgが176℃、硬化性樹脂組成物Dの硬化物はTgが96℃であった。測定条件動的粘弾性測定器:TA−instruments製、DMA-2980測定温度範囲:−30℃〜280℃ 温速度:2℃/分試験片サイズ:5mm×50mmに切り出した物を使用した(厚みは約800μm)。解析条件Tg:DMA測定に於けるTan−δのピーク点をTgとした。
Claims (6)
- エポキシ当量が190g/eq.以下であることを特徴とする請求項1に記載のエポキシ樹脂。
- 請求項1〜3のいずれか一項に記載のエポキシ樹脂と硬化剤および/または硬化触媒を含有する硬化性樹脂組成物。
- 請求項4に記載の硬化性樹脂組成物を硬化してなる硬化物。
- 2つのSi−H結合を有するアルキルシロキサンとジシクロペンタンジエンおよび/またはメチルジシクロペンタジエンとを50℃以下で反応させることにより得られるジオレフィン樹脂を酸化してエポキシ樹脂を得ることを特徴とするエポキシ樹脂の製造方法。
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JP2005133073A (ja) * | 2003-10-10 | 2005-05-26 | Shin Etsu Chem Co Ltd | 硬化性組成物 |
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JP2005133073A (ja) * | 2003-10-10 | 2005-05-26 | Shin Etsu Chem Co Ltd | 硬化性組成物 |
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