JP2014192286A - Peeling device and peeling method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technology capable of well peeling two plate-like bodies tightly fitting to each other, and especially coping with increase in size of the plate-like body.SOLUTION: (-Y) side end pat of a substrate SB in a work piece WK placed on a stage 30 is pulled up by adsorption-holding using a first adsorption unit 51, and a peeling roller 340 abutted with the substrate SB is moved in (+Y) direction, thus peeling is made to progress. A lower surface of the work piece WK is imaged with an imaging part 37 from below an abutment nip region R4 of the peeling roller 340, to detect position of a peeling border line that occurs at a border between a peeling region and a non-peeling region, for determining moving start timing of the peeling roller 340.

Description

  The present invention relates to a peeling apparatus and a peeling method for peeling and separating two plate-like bodies that are in close contact with each other.

  As a technique for forming a predetermined pattern or thin film on a plate-like body such as a glass substrate or a semiconductor substrate, a technique for transferring a pattern or thin film (hereinafter referred to as “pattern etc.”) carried on another plate-like body onto the substrate. is there. In this technique, after two plates are brought into close contact with each other and a pattern or the like is transferred from one to the other, it is necessary to peel the two plates without damaging the pattern or the like.

  As a technique that can be used for this purpose, for example, Patent Document 1 describes an apparatus for separating an element formation substrate and a transfer substrate that are in close contact with each other via an organic layer. In this technique, two bonded substrates are held in a horizontal posture, and are moved in a separating direction in a state where the upper and lower substrates are vacuum-adsorbed. The upper and lower substrates are sucked and held by a plurality of suction pads arranged in a distributed manner.

Japanese Patent Laying-Open No. 2008-287949 (for example, FIG. 6)

  This type of transfer technology has come to be applied to various device manufacturing processes, but in the peeling process due to the diversification of materials forming patterns, pattern miniaturization, and substrate size increase. More precise progress management is required. That is, in the peeling process, the peeling boundary line that is the boundary between the peeled area and the unpeeled area between the two plate-like bodies proceeds toward the unpeeled area side, so that the whole is finally peeled off. However, when the traveling speed of the peeling boundary line, that is, the peeling speed varies, the pattern or the like due to stress concentration is likely to be damaged. In particular, since the shape of the peeling boundary line is not stable at the initial stage of the peeling process, the peeling speed is likely to change due to the change in the shape of the peeling boundary line.

  However, the above prior art does not have a configuration capable of strictly controlling the peeling speed in this way, and there is no method for stabilizing the shape and traveling speed of the irregular peeling boundary line in the initial stage of peeling. It was. For this reason, there is room for improvement in the above prior art in terms of preventing damage to patterns and the like.

  The present invention has been made in view of the above problems. In a peeling apparatus and a peeling method for peeling and separating two plate-like bodies that are in close contact with each other, a pattern or the like formed between the two plate-like bodies is obtained. It is an object of the present invention to provide a technique capable of satisfactorily peeling two plate-like bodies without damaging them.

  One aspect of the present invention is to provide a peeling apparatus for peeling a first plate-like body and a second plate-like body which are in close contact with each other through a thin film or a pattern. The holding surface has a holding surface larger than the plane size of the effective area on which the thin film or the pattern is formed, and the surface on the opposite side of the surface of the first plate-like body that is in close contact with the second plate-like body is attached to the holding surface. The holding means for holding the first plate-like body by contact and the one end portion of the second plate-like body moving in a direction away from the holding means while holding the one end portion of the second plate-like body, Peeling means for peeling from the plate-like body; and extending along the second plate-like body in a direction perpendicular to the peeling progress direction from one end of the second plate-like body to the other end opposite to the one end. One end in the direction of progress of peeling A contact means that forms a contact nip by contacting one surface of the second plate-like body opposite to the surface in close contact with the first plate-like body at a contact start position adjacent to the downstream side; Of the plate-like body, an image of a peeling boundary line formed at a boundary between an unpeeled region in close contact with the second plate-like body and a peeled region peeled from the second plate-like body is captured via the first plate-like body. The position of the separation boundary line is detected based on the imaging means and the image captured by the imaging means, and when the separation boundary line reaches the position corresponding to the upstream end of the contact nip in the peeling progress direction, Movement control means for starting movement of the means from the contact start position in the peeling progress direction.

  According to another aspect of the present invention, there is provided a peeling method for peeling a first plate-like body and a second plate-like body that are in close contact with each other through a thin film or a pattern. The surface of the first plate-like body opposite to the surface in close contact with the second plate-like body is brought into contact with the holding surface larger than the plane size of the effective area on which the thin film or pattern is formed. At the contact start position adjacent to the downstream side of the one end in the peeling progress direction from the one end of the second plate to the other end opposite to the one end. A step of abutting a roller-like abutting means extending in a direction orthogonal to the peeling progress direction on one surface of the second plate-like body on the opposite side to the surface in close contact with the one plate-like body; One end of the plate-like body is moved in a direction away from the first plate-like body, and one end of the second plate-like body is moved to the first plate-like body. And the separation boundary line generated at the boundary between the unpeeled area in close contact with the second plate-like body and the peeled area peeled off from the second plate-like body in the first plate-like body. Obtaining the time when the peeling boundary line reaches the position corresponding to the upstream end in the peeling progress direction of the contact nip based on the captured image and the step of imaging through the plate-like body, and contact at that time And a step of starting movement of the means from the contact start position in the peeling progress direction.

  When peeling is advanced by moving the two plate-like bodies relative to each other in a direction away from each other, the peeling boundary that occurs at the boundary between the unpeeled area where both are in close contact before peeling and the peeled area already peeled off It is necessary for the line to travel at a constant speed in order to achieve good peeling. This is because if the progress speed of the separation boundary line fluctuates, a local stress concentration may occur in a thin film or pattern (hereinafter referred to as “pattern or the like”) carried between the plate-like bodies, and the pattern or the like may be damaged. . In the present invention, the roller-like contact means is brought into contact with the second plate-like body, and the peeling is advanced while being moved in the peeling progress direction. Since the separation boundary line does not advance beyond the contact position with the contact means, the progress of the separation can be appropriately managed by the contact means.

  However, in order to obtain the effect of such contact means, it is necessary to synchronize the movement of the separation boundary line and the movement of the contact means in the initial stage of separation. This is because if there is a deviation between these, the movement of the separation boundary line is stagnant or cannot be managed. However, particularly at the initial stage of peeling, the traveling speed of the peeling boundary line is unstable.

  Therefore, in the present invention, the separation boundary line is imaged via the first plate-like body, and the movement start timing of the contact means is controlled based on the result. Due to the difference in refractive index between the pattern and the like and the second plate-like body and the surrounding atmosphere, the peeling boundary line can be easily observed through the first plate-like body. Therefore, by observing the actual progress of the separation boundary line and determining the movement start timing of the contact means, the progress of the separation boundary line can be achieved regardless of the instability of the traveling speed of the separation boundary line in the initial stage. At the same time, the movement of the contact means can be started. Therefore, according to the present invention, it is possible to suppress the shift between the movement of the contact means and the progress of the separation boundary line, and to improve them without damaging the pattern formed between the two plates. It is possible to peel off.

  In these inventions, for example, the contact means may be configured to contact the first plate-like body at the contact start position upstream of the effective region in the peeling progress direction. In such a configuration, since the progress management by the contact means is established before the separation boundary line reaches the effective area, the pattern or the like in the effective area is not damaged.

  Also, for example, a position corresponding to the upstream end of the contact nip in the peeling progress direction is set as a reference position in advance, and movement of the contact means is started when it is detected that the peeling boundary has reached the reference position. The structure to be made may be sufficient. In such a configuration, when the peeling boundary line reaches the reference position, the movement of the contact means can be started without delay.

  Further, for example, a position shifted from the position corresponding to the upstream end in the peeling progress direction of the contact nip to the upstream side in the peeling progress direction by a predetermined distance is set in advance as a reference position, and the peeling boundary line is set as the reference position. The configuration may be such that the movement of the contact means is started when the arrival is detected. In such a configuration, for example, when it takes time to start the contact means or reach a constant speed, the progress of the peeling boundary line is prevented from being stagnated by the contact means.

  Also, for example, the separation boundary line arrives at a position corresponding to the upstream end portion of the contact nip in the separation progress direction, which is predicted based on the detection result of the separation boundary line before the separation boundary line reaches the reference position. The configuration may be such that the movement of the contact means is started at the time. In such a configuration, it is possible to grasp in advance the timing at which the movement of the contact means should be started and control the movement, and the separation boundary line can be smoothly advanced.

  Further, the holding means for holding the first plate-like body includes, for example, a plane portion that contacts the effective area of the first plate-like body, and a plane portion that is connected to the plane portion and away from the ridge line portion that is connected to the plane portion. And a holding surface including a taper surface portion that recedes from the extended flat surface, and holds the peripheral portion on the upstream side in the peeling progress direction from the flat plate portion toward the taper surface portion side from the effective area of the first plate-like body. And a pressing member that presses the peripheral edge of the first plate-like body and bends it to the opposite side of the second plate-like body to start peeling with the second plate-like body. The contact means may be configured to contact the second plate-like body at a contact start position between the ridge line portion and the effective area.

  In such a configuration, since the linear peeling boundary line can be formed in the vicinity of the ridge line part by bending the peripheral part of the first plate-like body in the initial stage of peeling, the peeling boundary line is stabilized at an early stage. Can be. Then, by contacting the abutting means with the contact start position as the contact start position between the ridge line portion where the stable separation boundary line is first formed and the effective region, the separation boundary line can reach before the effective region. It is possible to establish the progress management by the contact means more reliably.

  In this case, for example, a configuration may be employed in which imaging is performed through an imaging window having light transmittance provided on the upstream side in the peeling progress direction with respect to the position corresponding to the effective region in the plane portion. In such a configuration, the separation boundary line can be imaged from the side opposite to the first plate-like body via the holding means. For this reason, the freedom degree with respect to the installation position of an imaging means becomes high.

  Further, for example, the imaging unit may be configured to image the central portion of the first plate-like body in a direction orthogonal to the peeling progress direction. In the initial stage of peeling, the progress of peeling is not necessarily uniform in the direction perpendicular to the peeling progress direction. In many cases, the peeling force acts intensively on the corners of the plate-like body, and the first peeling starts from the vicinity thereof. Therefore, the progress of peeling observed in the vicinity of the end in the direction perpendicular to the peeling progress direction does not necessarily represent the progress of the entire peeling. By capturing an image of the central portion where the progress of peeling tends to be slowed, it is possible to avoid the movement of the contact means at least before reaching the peeling boundary line.

  In these inventions, it is preferable to move the contact means after the start of movement at a constant speed in the peeling progress direction. In such a configuration, the peeling can proceed at a constant speed, and damage to the pattern or the like due to the speed fluctuation can be surely prevented.

  According to the present invention, since the progress of the peeling boundary line is actually imaged in the initial stage of peeling and the movement start of the contact means is controlled, it is caused by the shift between the movement of the contacting means and the progress of the peeling boundary line. It is possible to prevent damage to the pattern and the like and to peel the two plate-like bodies well.

It is a perspective view which shows one Embodiment of the peeling apparatus concerning this invention. It is a perspective view which shows the main structures of this peeling apparatus. It is a perspective view which shows the more detailed structure of a stage. It is a side view which shows the structure of an initial stage peeling unit, and the positional relationship of each part. It is a figure which shows the positional relationship of a stage and the workpiece | work mounted on this. It is a block diagram which shows the electric constitution of this peeling apparatus. It is a flowchart which shows a peeling process. It is a 1st figure which shows the positional relationship of each part in each step in process. It is a 2nd figure which shows the positional relationship of each part in each step in process. It is a 3rd figure which shows the positional relationship of each part in each step in process.

  FIG. 1 is a perspective view showing an embodiment of a peeling apparatus according to the present invention. In order to uniformly indicate the direction in each figure, XYZ orthogonal coordinate axes are set as shown in the lower right of FIG. Here, the XY plane represents a horizontal plane and the Z axis represents a vertical axis. More specifically, the (+ Z) direction represents a vertically upward direction.

  This peeling apparatus 1 is an apparatus for peeling two plate-like bodies carried in with the main surfaces in close contact with each other. For example, it is used in a part of a pattern forming process for forming a predetermined pattern on the surface of a substrate such as a glass substrate or a semiconductor substrate. More specifically, in this pattern formation process, a pattern forming material is uniformly applied to a blanket surface as a carrier that temporarily carries a pattern to be transferred to a substrate, which is a transfer target (application process), and a pattern is formed. The coating layer is patterned by pressing a plate whose surface is processed according to the shape against the coating layer on the blanket (patterning step), and the blanket thus formed is brought into close contact with the substrate (transfer step), thereby forming a pattern. Is finally transferred from the blanket to the substrate.

  At this time, the apparatus can be suitably applied for the purpose of separating the plate and the blanket that are in close contact in the patterning step, or the substrate and the blanket that is in close contact in the transfer step. Of course, it may be used for both of these, and may be used for other purposes. For example, the present invention can also be applied to a peeling process when transferring a thin film carried on a carrier to a substrate.

  This peeling apparatus 1 has a structure in which a stage block 3 and an upper suction block 5 are respectively fixed on a main frame 11 attached to a housing. In FIG. 1, the housing is not shown to show the internal structure of the apparatus. In addition to these blocks, the peeling apparatus 1 includes a control unit 70 (FIG. 6) described later.

  The stage block 3 has a stage 30 for placing a close contact body (hereinafter referred to as “work”) in which a plate or a substrate and a blanket are in close contact, and the stage 30 is a flat surface whose upper surface is substantially horizontal. The horizontal stage part 31 which became and the taper stage part 32 where the upper surface became a plane which has the inclination of several degrees (for example, about 2 degree | times) with respect to a horizontal surface are provided. An initial peeling unit 33 is provided on the taper stage portion 32 side of the stage 30, that is, in the vicinity of the (−Y) side end. A roller unit 34 is provided so as to straddle the horizontal stage portion 31.

  On the other hand, the upper suction block 5 is erected from the main frame 11 and has a support frame 50 provided so as to cover the upper part of the stage block 3, a first suction unit 51 attached to the support frame 50, and a second An adsorption unit 52, a third adsorption unit 53, and a fourth adsorption unit 54 are provided. These adsorption units 51 to 54 are arranged in order in the (+ Y) direction.

  FIG. 2 is a perspective view showing the main configuration of the peeling apparatus. More specifically, FIG. 2 shows the structure of the stage 30, the roller unit 34, and the second suction unit 52 among the components of the peeling apparatus 1. The stage 30 includes a horizontal stage portion 31 whose upper surface 310 is a substantially horizontal surface and a tapered stage portion 32 whose upper surface 320 is a tapered surface. The upper surface 310 of the horizontal stage unit 31 has a plane size that is slightly larger than the plane size of the workpiece to be placed.

  The tapered stage portion 32 is provided in close contact with the (−Y) side end portion of the horizontal stage portion 31, and the upper surface 320 has a horizontal surface 321 and a tapered surface 322. More specifically, a portion of the upper surface 320 of the taper stage portion 32 that is in contact with the horizontal stage portion 31 is a horizontal surface 321 that is located at the same height (Z-direction position) as the upper surface 310 of the horizontal stage portion 31. On the other hand, on the (−Y) direction side with respect to the horizontal plane 321, the upper surface 320 of the tapered stage portion 32 descends downward, that is, recedes in the (−Z) direction as it moves away from the horizontal stage portion 31 in the (−Y) direction. A tapered surface 322 having Therefore, in the entire stage 30, the horizontal surface 321 of the upper surface 310 of the horizontal stage portion 31 and the horizontal surface 321 of the upper surface 320 of the tapered stage portion 32 continuously form an integral horizontal surface, and the (−Y) side end of the horizontal surface. A tapered surface 322 is connected to the portion. The ridge line portion E where the horizontal plane 321 and the tapered surface 322 are connected has a linear shape extending in the X direction.

  An imaging window 323 is provided in the center in the X direction on the horizontal plane 321 of the upper surface 320 of the taper stage section 32. The imaging window 323 has a structure in which a transparent member is fitted in a through-hole penetrating from the horizontal plane 320 to the lower surface side of the taper stage portion 32, and the upper surface thereof is flush with the horizontal surface 321 of the taper stage portion 32. . Note that the imaging window only needs to have a structure capable of optically observing the workpiece placed on the stage 30 from below, and may be, for example, only a through hole. Moreover, the opening shape is also arbitrary. Furthermore, the entire tapered stage portion 32 or the entire horizontal surface 321 may be made of a light-transmitting material such as glass or quartz, and in this case, it is not necessary to provide an imaging window.

  In addition, lattice-shaped grooves are formed on the upper surface 310 of the horizontal stage portion 31. More specifically, a grid-like groove 311 is provided at the center of the upper surface 310 of the horizontal stage portion 31 and one of the rectangles on the tapered stage portion 32 side is surrounded so as to surround the region where the groove 311 is formed. A groove 312 is provided on the peripheral edge of the upper surface 310 of the horizontal stage portion 31 so as to have a substantially U shape excluding the side. These grooves 311 and 312 are connected to a negative pressure supply unit 704 (FIG. 6), which will be described later, via a control valve. By supplying negative pressure, the work placed on the stage 30 is sucked and held. It functions as an adsorption groove. The two types of grooves 311 and 312 are not connected on the stage, and are connected to the negative pressure supply unit 704 via independent control valves. Therefore, in addition to adsorption using both grooves, Adsorption using only grooves is also possible.

  A roller unit 34 is provided so as to straddle the stage 30 configured in this manner. Specifically, a pair of guide rails 351 and 352 extend in the Y direction along both ends in the X direction of the horizontal stage portion 31, and these guide rails 351 and 352 are fixed to the main frame 11. ing. A roller unit 34 is slidably attached to the guide rails 351 and 352.

  The roller unit 34 includes sliders 341 and 342 slidably engaged with the guide rails 351 and 352, respectively, and extends in the X direction across the upper part of the stage 30 so as to connect the sliders 341 and 342. The lower angle 343 is provided. An upper angle 345 is attached to the lower angle 343 via an appropriate lifting mechanism 344 so as to be movable up and down. A columnar peeling roller 340 extending in the X direction is attached to the upper angle 345 in a freely rotatable manner.

  When the upper angle 345 is lowered downward, that is, in the (−Z) direction by the lifting mechanism 344, the lower surface of the peeling roller 340 comes into contact with the upper surface of the work placed on the stage 30. On the other hand, in a state where the upper angle 345 is positioned upward, that is, in a position in the (+ Z) direction by the lifting mechanism 344, the peeling roller 340 is separated from the upper surface of the workpiece. A backup roller 346 for suppressing the bending of the peeling roller 340 is rotatably attached to the upper angle 345, and a rib for preventing the upper angle 345 itself from being bent is appropriately provided. The peeling roller 340 and the backup roller 346 do not have a drive source, and these rotate freely.

  The roller unit 34 is movable in the Y direction by a motor 353 attached to the main frame 11. More specifically, the lower angle 343 is connected to, for example, a ball screw mechanism 354 as a conversion mechanism that converts the rotational motion of the motor 353 into linear motion. When the motor 353 rotates, the lower angle 343 is guided to the guide rails 351, 351. The roller unit 34 moves in the Y direction by moving along the 352 in the Y direction. The movable range of the peeling roller 340 according to the movement of the roller unit 34 is as follows: (−Y) direction to the vicinity of the (−Y) side end portion of the horizontal stage portion 31, (+ Y) direction of the horizontal stage portion 31 ( The position is set to the outside of the (+ Y) side end, that is, the position further advanced to the (+ Y) side.

  Next, the configuration of the second adsorption unit 52 will be described. The first to fourth adsorption units 51 to 54 all have the same structure, and here, the structure of the second adsorption unit 52 will be described as a representative. The second suction unit 52 includes a beam member 521 that extends in the X direction and is fixed to the support frame 50. The beam member 521 has a pair of vertical downwards, that is, a (−Z) direction. The column members 522 and 523 are attached at different positions in the X direction. A plate member 524 is attached to the column members 522 and 523 via a guide rail that is hidden in the drawing so as to be lifted and lowered. The plate member 524 is lifted and lowered by a lifting mechanism 525 including a motor and a conversion mechanism (for example, a ball screw mechanism). Driven.

  A bar-shaped pad support member 526 extending in the X direction is attached to the lower portion of the plate member 524, and a plurality of suction pads 527 are arranged at equal intervals in the X direction on the lower surface of the pad support member 526. FIG. 2 shows a state where the second suction unit 52 is moved upward from the actual position. However, when the plate member 524 is moved downward by the lifting mechanism 525, the suction pad 527 is moved to the horizontal stage portion 31. It can be lowered to a position very close to the upper surface 310, and comes into contact with the upper surface of the workpiece when the workpiece is placed on the stage 30. A negative pressure from a negative pressure supply unit 704 described later is applied to each suction pad 527, and the upper surface of the workpiece is sucked and held.

  FIG. 3 is a perspective view showing a more detailed configuration of the stage. As shown in FIG. 3A, the horizontal stage portion 31 and the tapered stage portion 32 of the stage 30 are formed separately and can be separated. The taper stage unit 32 can be moved toward and away from the horizontal stage unit 31 in a horizontal direction by a horizontal movement mechanism (not shown), and the taper stage unit 32 is in close contact with the side surface of the horizontal stage unit 31. The horizontal stage portion 31 and the taper stage portion 32 function as the stage 30 integrally.

  In addition to the suction grooves 311 and 312 described above, openings 313 and 314 having different shapes are provided on the upper surface 310 of the horizontal stage portion 31. More specifically, a plurality of first openings 313 having an oval shape are dispersedly arranged at a plurality of flat portions between the suction grooves 311 and the suction grooves 312 on the upper surface 310 of the horizontal stage portion 31. . In addition, substantially circular second openings 314 are provided at four locations spaced apart from each other at the center of the upper surface 310 of the horizontal stage portion 31. Neither the first opening 313 nor the second opening 314 is connected to the suction grooves 311 and 312 on the upper surface 310 of the horizontal stage portion 31. For this reason, the suction groove 311 is divided around the second opening 314.

  On the other hand, four sets of main lifters 36 are arranged in the X direction on the side where the tapered stage portion 32 is provided, that is, on the side surface of the horizontal stage portion 31 on the (−Y) side. These main lifters 36 have the same structure. Each of the main lifters 36 supports a lifter pin 361 that is finished in a thin plate shape along the side surface of the horizontal stage portion 31, and supports the lifter pin 361 from below, and responds to a drive signal from the control unit 70 (FIG. 6). And an elevating mechanism 365 that elevates in the vertical direction (Z direction). The elevating mechanism 365 is fixed to the bottom surface of the horizontal stage unit 31.

  FIG. 3B shows a schematic structure of the lifter pin 361. As shown in the figure, the upper surface 361a of the lifter pin 361 is finished to be substantially flat. A suction pad 362 is provided at the center, and the suction pad 362 communicates with a negative pressure supply path 363 provided through the inside of the lifter pin 361. The negative pressure supply path 363 is connected to a later-described negative pressure supply unit 704 (FIG. 6) via a control valve.

  A main lifter 36 having the same structure is provided for each of the plurality of first openings 313 formed in the upper surface 310 of the horizontal stage portion 31. That is, the elevating mechanism 365 is attached to the lower end of the through hole penetrating from the first opening 313 to the bottom surface of the horizontal stage unit 31, and the lifter pin 361 is inserted into the through hole communicating with each opening 313.

  Each main lifter 36 performs the same operation in accordance with a drive signal from the control unit 70. That is, each lifter pin 361 can be positioned at a lower position where the upper end of the lifter pin 361 is retracted below the upper surface 310 of the horizontal stage portion 31 and an upper position where the upper end protrudes above the upper surface 310 of the horizontal stage portion 31. In accordance with the drive signal from the control unit 70, it moves up and down simultaneously between the upper position and the lower position. At the upper position where the upper end of each lifter pin 361 protrudes above the upper surface 310 of the horizontal stage portion 31 and is positioned, the upper surface 361a of the lifter pin 361 is brought into contact with the lower surface of the work placed on the stage 30. It is possible to support in a state separated from the stage 30.

  In addition, a sub-lifter (not shown) is disposed in the second opening 314 drilled in the central portion of the upper surface 310 of the horizontal stage portion 31 where the suction groove 311 is disposed. Similar to the main lifter 36, the sub lifter has a lifter pin and a lifting mechanism that lifts and lowers the lifter pin. The lifter pin protrudes above the upper surface 310 of the horizontal stage unit 31 in accordance with a drive signal from the control unit 70. Can be supported in an auxiliary manner. The upper surface of the lifter pin of the sub lifter has a disk shape smaller than the upper surface 361a of the lifter pin 361 of the main lifter 36, and the second opening 314 has a shape corresponding thereto.

  FIG. 4 is a side view showing the structure of the initial peeling unit and the positional relationship of each part. First, the structure of the initial peeling unit 33 will be described with reference to FIGS. 1 and 4. As shown in FIG. 4A, the initial peeling unit 33 has a bar-like pressing member 331 extending in the X direction above the taper stage portion 32, and the pressing member 331 is supported by the support arm 332. Has been. The support arm 332 is attached to the column member 334 via a guide rail 333 extending in the vertical direction, and the support arm 332 moves up and down with respect to the column member 334 by the operation of the lifting mechanism 335. The column member 334 is supported by a base portion 336 attached to the main frame 11, but the position adjustment mechanism 337 can adjust the position in the Y direction of the column member 334 on the base portion 336 within a predetermined range. .

  A workpiece WK as an object to be peeled is placed on a stage 30 constituted by the horizontal stage portion 31 and the taper stage portion 32. The workpiece in the patterning step described above is a close contact body in which a plate and a blanket are in close contact via a thin film of pattern forming material. On the other hand, the workpiece in the transfer process is a close contact body in which the substrate and the blanket are in close contact with each other through a patterned pattern. In the following, the peeling operation of the peeling apparatus 1 in the case where the contact body between the substrate SB and the blanket BL in the transfer process is the workpiece WK will be described. Can be done.

  In the work WK, it is assumed that the blanket BL has a larger planar size than the substrate SB. The substrate SB is in close contact with the substantially central portion of the blanket BL. The work WK is placed on the stage 30 with the blanket BL down and the substrate SB up. At this time, as shown in FIG. 4A, the (−Y) side end portion of the substrate SB in the workpiece WK is the boundary between the horizontal surface and the tapered surface of the stage 30, that is, the horizontal surface 321 and the tapered surface of the tapered stage portion 32. It is located substantially above the ridgeline E at the boundary with 322. More specifically, the workpiece WK is placed on the stage 30 such that the (−Y) side end portion of the substrate SB is slightly shifted to the (−Y) side from the ridge line portion E. Accordingly, the blanket BL outside the substrate SB in the (−Y) direction is arranged so as to protrude onto the tapered surface 322 of the tapered stage portion 32, and a gap is generated between the lower surface of the blanket BL and the tapered surface 322. . An angle θ formed by the lower surface of the blanket BL and the tapered surface 322 is about the same number of degrees (2 degrees in this embodiment) as the taper angle of the tapered stage portion 32.

  The horizontal stage portion 31 is provided with a suction groove 311 and sucks and holds the lower surface of the blanket BL. More specifically, the suction groove 311 sucks the lower surface of the blanket BL that hits the lower portion of the substrate SB. On the other hand, as shown in FIG. 3, another suction groove 312 is provided so as to surround the suction groove 311, and the suction groove 312 sucks the lower surface of the blanket BL outside the substrate SB. The suction grooves 311 and 312 can independently turn on and off the suction, and the two types of suction grooves 311 and 312 can be used together to strongly suck the blanket BL. On the other hand, by performing suction using only the outer suction groove 312 and not performing suction on the central portion of the blanket BL where the pattern is effectively formed, a pattern resulting from the deflection of the blanket BL due to suction. Can prevent damage. As described above, by independently controlling the negative pressure supply to the suction groove 311 at the center and the suction groove 312 at the peripheral edge, it is possible to switch the suction holding mode of the blanket BL according to the purpose. Yes.

  Thus, the first to fourth suction units 51 to 54 and the peeling roller 340 of the roller unit 34 are arranged above the work WK sucked and held on the stage 30. In FIG. 4A, only two suction units 51 and 52 on the (−Y) side of the four suction units appear. As described above, the plurality of suction pads 527 are arranged below the second suction unit 52 in the X direction. More specifically, the suction pad 527 is integrally formed of a material having flexibility and elasticity, such as rubber or silicon resin, and the lower surface thereof contacts the upper surface of the work WK (more specifically, the upper surface of the substrate SB). It has an adsorbing portion 527a that contacts and adsorbs it, and a bellows portion 527b that has elasticity in the vertical direction (Z direction). The suction pads provided in the other suction units 51, 53 and 54 have the same structure. Hereinafter, the suction pad provided in the first suction unit 51 is denoted by reference numeral 517 to be distinguished from the suction pad 527 of the second suction unit 52.

  The first suction unit 51 is provided above the ridge line portion E and sucks the upper surface of the (−Y) side end portion of the substrate SB when lowered. On the other hand, the fourth suction unit 54 (FIG. 1) arranged on the most (+ Y) side is provided above the (+ Y) side end of the substrate SB placed on the stage 30, and when lowered, the substrate SB. Adsorb the upper surface of the (+ Y) side end of. The second suction unit 52 and the third suction unit 53 are appropriately distributed between them, and for example, the suction pads 517 and the like provided in each of the suction units 51 to 54 may be substantially equally spaced in the Y direction. it can. Between these adsorption units 51 to 54, movement in the vertical direction and on / off of adsorption can be performed independently of each other.

  The peeling roller 340 moves in the vertical direction to move toward and away from the substrate SB, and moves in the Y direction to move horizontally along the substrate SB. In the state where the peeling roller 340 is lowered, it moves horizontally while abutting on the upper surface of the substrate SB and rolling. The position of the peeling roller 340 when moved to the most (−Y) side is a position closest to the (+ Y) side of the suction pad 517 of the first suction unit 51. In order to enable the arrangement in such a proximity position, the first suction unit 51 has the same structure as the second suction unit 52 shown in FIG. The fourth suction units 52 to 54 are attached to the support frame 50 in the opposite direction.

  The initial peeling unit 33 has its Y-direction position adjusted so that the pressing member 331 is positioned above the blanket BL protruding above the taper stage portion 32. Then, when the support arm 332 is lowered, the lower end of the pressing member 331 is lowered and presses the upper surface of the blanket BL. At this time, the tip of the pressing member 331 is formed of an elastic member so that the pressing member 331 does not damage the blanket BL.

  As described above, the main lifter 36 is provided on the (−Y) side surface of the horizontal stage portion 31. The lower part of the horizontal surface 321 of the taper stage part 32 is notched so that the lifter pin 361 retracted to the lower position does not interfere with the taper stage part 32.

  In addition, an imaging unit 37 having an imaging element such as a CCD sensor or a CMOS sensor and an imaging optical system having an upward imaging direction is provided immediately below the imaging window 323 provided on the horizontal plane 321 of the taper stage unit 32. ing. The imaging unit 37 is fixed to any one of the horizontal stage unit 31, the taper stage unit 32, and the main frame 11. The imaging unit 37 images the work WK facing the imaging window 323 from below via the imaging window 323, and transmits the acquired image data to the control unit 70 (FIG. 6).

  The taper stage 32 is configured to be movable in the Y direction by a horizontal movement mechanism (not shown). As shown in FIG. 4A, in the state where the taper stage portion 32 is positioned at the (+ Y) side position by the horizontal movement mechanism, the taper stage portion 32 abuts against the side surface of the horizontal stage portion 31 and is an integrated stage 30. Function as. On the other hand, in a state where the taper stage portion 32 is positioned at the (−Y) side position by the horizontal movement mechanism, the taper stage portion 32 is separated from the horizontal stage portion 31 as shown in FIG. A lifter pin 361 of the main lifter 36 attached to the side surface on the (−Y) side of the horizontal stage portion 31 moves up and down through this gap.

  FIG. 4B shows a case where the imaging unit 37 is fixed to the horizontal stage unit 31 or the main frame 11, and the imaging unit 37 does not move with the movement of the tapered stage unit 32. On the other hand, when the imaging unit 37 is fixed to the tapered stage unit 32, the imaging unit 37 also moves in the Y direction as the tapered stage unit 32 moves. As will be described later, since the imaging unit 37 performs imaging in the state illustrated in FIG. 4A in which the horizontal stage unit 31 and the taper stage unit 32 are coupled, any mode may be employed.

  In a state where the plurality of lifter pins 361 provided on the horizontal stage portion 31 protrude above the stage upper surface 310 as described above, the workpiece WK can be supported while being separated from the stage upper surface 310. When the workpiece WK is carried into the peeling device 1 from the outside, the workpiece WK can be received by projecting the lifter pin 361 to the upper position. After receiving the workpiece WK in this manner, the lifter pin 361 is lowered and retracted below the stage upper surface 310, so that the workpiece WK is delivered to the stage 30. On the other hand, the blanket BL remaining on the stage 30 after the peeling process on the workpiece WK is finished can be transferred to the outside by being lifted from the stage 30 by the lifter pins 361.

  In these cases, the lower surface of the blanket BL can be sucked and held by supplying a negative pressure to the suction pad 362 provided on each lifter pin 361. Moreover, it can suppress that the center part of the workpiece | work WK or the blanket BL bends by operating a sub lifter as needed.

  FIG. 5 is a diagram showing the positional relationship between the stage and the workpiece placed on the stage. In the work WK in which the substrate SB and the blanket BL are in close contact, the blanket BL has a larger planar size than the substrate SB. Therefore, the entire surface of the substrate SB faces the blanket BL, while the blanket BL has a central portion facing the substrate SB, but the peripheral portion is a blank portion that does not face the substrate SB. Yes. An effective area AR that functions as a device by effectively transferring the pattern is set in the central portion of the surface area of the substrate SB except the peripheral edge. Therefore, the purpose of the peeling apparatus 1 is to peel the substrate SB and the blanket BL without damaging the pattern transferred from the blanket BL to the effective area AR of the substrate SB.

  The workpiece WK is placed on the stage 30 so that the entire effective area AR of the substrate SB is positioned on the upper surface 310 of the horizontal stage unit 31. On the other hand, on the outside of the effective area AR, the (−Y) side end of the substrate SB is positioned at a position slightly protruding to the (−Y) side from the ridge line portion E at the boundary between the horizontal plane and the tapered surface of the stage 30. Is done.

  In the figure, a region R1 with dots indicates a region where the blanket BL is adsorbed by the adsorption groove 311. The region R1 sucked by the suction groove 311 covers the entire effective region AR. A region R2 indicates a region where the blanket BL is sucked by the suction groove 312. The suction groove 312 sucks the blanket BL outside the effective area AR. Therefore, for example, in the aspect in which the blanket BL is sucked only by the suction groove 312, it is avoided that the pattern in the effective area AR is affected by the suction.

  A region R6 indicates a lower surface region of the blanket BL with which the lifter pins 361 of the main lifter 36 abut. The lifter pin 361 is in contact with the lower surface of the blanket BL in a region of the work WK where the substrate SB and the blanket BL overlap and outside the effective region AR. Thereby, it is possible to prevent the pressing force from being applied to the pattern or the like in the effective area AR during the support. Further, since the workpiece WK is supported by the rigidity of the substrate SB and the blanket BL, even a large and heavy workpiece WK can be reliably supported. The other regions R3, R4, and R7 shown in FIG. 5 will be described later when the operation is described.

  FIG. 6 is a block diagram showing an electrical configuration of the peeling apparatus. Each part of the apparatus is controlled by a control unit 70. The control unit 70 supplies the CPU 701 that controls the operation of the entire apparatus, a motor control unit 702 that controls motors provided in each unit, a valve control unit 703 that controls valves provided in each unit, and each unit. A negative pressure supply unit 704 that generates a negative pressure and a user interface (UI) unit 705 for accepting an operation input from the user and notifying the user of the state of the apparatus are provided. In addition, when the negative pressure supplied from the outside, such as factory power, can be used, the control unit 70 may not include the negative pressure supply unit.

  The motor control unit 702 includes motors such as a motor 353 and lift mechanisms 335, 344, and 365 provided in the stage block 3, a horizontal movement mechanism, and a lift mechanism 525 provided in each of the suction units 51 to 54 of the upper suction block 5. Drive control of the group. In addition, although the motor is typically described here as the drive source of each movable part, it is not limited to this, and various actuators, such as an air cylinder, a solenoid, and a piezoelectric element, are driven according to the use. It may be used as a source.

  The valve control unit 703 is provided on a piping path connected from the negative pressure supply unit 704 to the suction grooves 311, 312 provided in the horizontal stage unit 31 and the suction pad 362 provided in the lifter pin 361. A valve group V3 for individually supplying a predetermined negative pressure to the pads, a negative pressure supply unit 704, provided on a piping path connected to the suction pads 517 of the suction units 51 to 54, etc. A valve group V5 for supplying a predetermined negative pressure is controlled.

  Further, the control unit 70 controls the imaging unit 37 provided in the stage block 3 to execute a necessary imaging operation, and receives the image data acquired by the imaging unit 37 and performs image processing. The imaging unit 37 images the lower surface of the blanket BL via the imaging window 323 provided in the taper stage unit 32. The control unit 70 controls the progress of the peeling operation described below based on the captured image.

  Next, the peeling operation by the peeling apparatus 1 configured as described above will be described with reference to FIGS. FIG. 7 is a flowchart showing the peeling process. FIG. 8 to FIG. 10 are diagrams showing the positional relationship of each part at each stage during processing, and schematically show the progress of processing. This peeling process is performed by the CPU 701 executing a processing program stored in advance to control each unit.

  First, when the workpiece WK is loaded at the above position on the stage 30 by an operator or an external transfer robot (step S101), the apparatus is initialized and each part of the apparatus is set to a predetermined initial state (step S102). . In the initial state, the work WK is sucked and held by one or both of the suction grooves 311 and 312, and the suction member 331 of the initial peeling unit 33, the peeling roller 340 of the roller unit 34, and the first to fourth suction units 51 to 54 are sucked. The pads 517 and the like are all separated from the work WK. Further, the peeling roller 340 is at a position closest to the (−Y) side in the movable range.

  From this state, the first suction unit 51 and the peeling roller 340 are lowered and brought into contact with the upper surface of the workpiece WK (step S103). At this time, as shown in FIG. 8A, the suction pad 517 of the first suction unit 51 sucks the upper surface of the (−Y) side end of the substrate SB, and the peeling roller 340 is positioned adjacent to the (+ Y) side. In contact with the upper surface of the substrate SB. In addition, the downward arrow attached | subjected to the vicinity of the press member 331 in Fig.8 (a) means that the press member 331 moves to the said arrow direction in the subsequent process from the state shown by a figure. The same applies to the following drawings.

  A region R3 shown in FIG. 5 indicates a region where the substrate SB is sucked by the first suction unit 51 at this time, and a region R4 indicates a contact nip region formed when the peeling roller 340 contacts the substrate SB. As shown in FIG. 5, the first suction unit 51 sucks and holds the (−Y) side end of the substrate SB, while the peeling roller 340 is adjacent to the (+ Y) side of the suction region R <b> 3 by the first suction unit 51. It contacts the substrate SB in the region R4. The contact nip region R4 with which the peeling roller 340 contacts is outside the effective region AR, that is, a position closer to the (−Y) side from the effective region AR, and (+ Y) side from the ridge line portion E of the stage 30. The position on the horizontal plane. Therefore, the inside of the effective area AR is not subjected to either the suction by the first suction unit 51 or the pressing by the peeling roller 340.

  Subsequently, imaging by the imaging unit 37 is started (step S104). Thereafter, the imaging unit 37 transmits the captured image at any time to the control unit 70 in real time, but the imaging unit 37 itself may have been operating before this. A region R <b> 7 illustrated in FIG. 5 indicates a region where the imaging window 323 is provided in the horizontal surface 321 of the taper stage unit 32. As shown in FIG. 5, the region R7 where the imaging window 323 is provided and the region R4 of the contact nip formed by the peeling roller 340 partially overlap each other. In other words, the position of the imaging window 323 and the initial position of the peeling roller 340 are set in advance so as to achieve such an arrangement.

  As shown in FIG. 8A, an imaging unit 37 is provided at a position directly below the imaging window 323, and the imaging unit 37 images the upper side through the imaging window 323. As described above, a part of the contact nip where the peeling roller 340 contacts the substrate SB faces the imaging window 323. As shown in FIG. 8B, at least a part of the contact nip region R4, preferably the (−Y) side end portion P4, is present in the imaging field FV when the imaging unit 37 images the lower surface of the blanket BL. To be included.

  Returning to FIG. 7, next, the initial peeling unit 33 is operated, the pressing member 331 is lowered, and the end of the blanket BL is pressed (step S105). The end portion of the blanket BL protrudes above the tapered surface 322 of the tapered stage portion 32, and there is a gap between the lower surface and the tapered surface 322. Therefore, as shown in FIG. 9A, the pressing member 331 presses the end of the blanket BL downward, so that the end of the blanket BL is bent downward along the tapered surface 322. As a result, the (−Y) side end PS of the substrate SB sucked and held by the first suction unit 51 and the blanket BL are separated from each other, and peeling is started. The pressing member 331 is formed in a rod shape extending in the X direction, and the length in the X direction is set longer than that of the blanket BL. Therefore, as shown in FIG. 5, the contact region R5 where the pressing member 331 contacts the blanket BL extends linearly from the (−X) side end of the blanket BL to the (+ X) side end. By doing so, the blanket BL can be bent into a columnar shape, and the boundary line between the peeling region where the substrate SB and the blanket BL have already peeled and the unpeeled region that has not yet peeled (hereinafter referred to as “peeling boundary”). Line)) can be made straight.

  Thus, the first suction unit 51 starts to be lifted from the state where the peeling is started from the substrate end PS (step S106). As a result, as shown in FIG. 9B, the end portion PS of the substrate SB sucked and held by the first suction unit 51 is further separated from the blanket BL, and accordingly, the peeling boundary line is (+ Y). Peeling progresses by moving in the direction. That is, the peeling progress direction in this embodiment is the (+ Y) direction.

  FIG. 9C is a diagram schematically illustrating the relationship between the movement of the separation boundary line during this period and the image captured by the imaging unit 37. The peeling boundary line TL1 at time T1 immediately after the peeling between the substrate SB and the blanket BL is started by the pressing of the pressing member 331 illustrated in FIG. 9A is a stage as shown in FIG. 9C. It is located on the (−Y) side from the ridge line portion 30 of 30 and does not necessarily enter the imaging field of view FV.

  On the (−Y) side of the peeling boundary line, that is, on the upstream side in the peeling progress direction, the substrate SB that has been in close contact with the upper surface of the blanket BL is already separated, and there is a gap between them. The ambient atmosphere is flowing. On the other hand, on the (+ Y) side of the peeling boundary line, that is, on the downstream side in the peeling progress direction, it is an unpeeled region where the substrate SB is still in close contact with the upper surface of the blanket BL. In imaging through the blanket BL, there is a large luminance difference between the peeled area and the non-peeled area due to the difference in color tone and refractive index between the substrate SB and the surrounding atmosphere, so the peel boundary line is optically detected. Easy to do.

  For this purpose, it is desirable that the blanket BL has a light transmission property that transmits at least part of incident light. In the control unit 70, for example, the position of the separation boundary line can be detected by detecting an edge having a large luminance change in the image. As for the contact nip region R4, the positional relationship between the position and the imaging field of view FV only needs to be known and does not necessarily need to be detectable from the image.

  Thereafter, at time T2 when the pull-up of the substrate end PS illustrated in FIG. 9B is started and the peeling boundary line advances to the (+ Y) side, the peeling boundary line TL2 enters the imaging visual field FV. . This indicates that peeling has progressed to a position directly above the imaging window 323. Then, the substrate SB is further lifted and the separation boundary line advances, and finally the separation boundary line advances to the contact nip region R4 by the separation roller 340.

  If the separation roller 340 starts to move in the (+ Y) direction at this timing, then the separation boundary line further proceeds in the (+ Y) direction while being restricted by the separation roller 340. That is, the peeling proceeds while being managed by the movement of the peeling roller 340.

  At this time, the peeling boundary line does not enter the contact nip region R4 and further advance beyond this to the (+ Y) side. Therefore, if there is a time delay from when the peeling boundary line reaches the contact nip region R4 until the movement of the peeling roller 340 starts, the progress of peeling is stopped and restarted with the start of movement of the peeling roller 340. Speed fluctuations occur. This causes damage to the pattern and the like. Further, the substrate SB may be detached from the suction by the first suction unit 51 by forcibly pulling up the substrate SB pressed by the peeling roller 340. On the other hand, if the movement of the peeling roller 340 is started before the peeling boundary line reaches the abutting nip region R4, the peeling roller 340 does not perform the function of managing the progress of peeling. Causes damage to patterns, etc. Therefore, it is required that the movement of the peeling roller 340 is started without delay when the peeling boundary line reaches the contact nip region R4.

  In this embodiment, the progress of the peeling boundary line is detected in real time from the image captured by the imaging unit 37, and the movement of the peeling roller 340 is controlled based on the detection result, so that the above request can be met. ing. Specifically, a determination line JL as a reference position for determining the movement start timing of the peeling roller 340 is set in advance with respect to the peeling boundary line traveling in the imaging field of view FV of the imaging unit 37. When it is detected that the determination line JL has been reached, the movement of the peeling roller 340 is started (steps S107 and S108).

  The determination line JL can be, for example, the position of the (−Y) side end P4 of the contact nip region R4, that is, the position of the upstream end in the peeling progress direction. In this way, the movement of the peeling roller 340 can be started almost simultaneously with the arrival of the peeling boundary line in the contact nip region R4. On the other hand, when a time delay is assumed after the separation boundary line reaches the determination line JL and the movement of the separation roller 340 is started, for example, the separation is performed from the upstream end P4 of the contact nip region R4. The determination line JL may be set at this position with the position shifted by a predetermined amount upstream in the traveling direction, that is, the (−Y) side as a reference position.

  As another method, the progress speed of the separation boundary line in the imaging field of view FV is detected from the captured image, and the time at which the separation boundary line reaches the contact nip region R4 is predicted from the detection result. The peeling roller 340 may be started to move. In this way, the time difference between the arrival of the peeling boundary line at the contact nip region R4 and the start of the peeling roller 340 can be made substantially zero.

  In any case, the contact nip region R4 in the initial state is set at a position deviated from the effective region AR on the (−Y) side, that is, on the upstream side in the peeling progress direction (FIG. 5). Even if there is a minute time difference between the arrival of the peeling boundary line at the contact nip region R4 and the start of the peeling roller 340, it is possible to avoid affecting the pattern in the effective area AR.

  Thereafter, the first suction unit 51 moves upward, that is, in the (+ Z) direction, and the peeling roller 340 moves at a constant speed in the (+ Y) direction. In this way, in addition to the rise of the first suction unit 51, the movement of the peeling roller 340 is started, so that peeling further proceeds.

  As shown in FIG. 10A, when the first suction unit 51 that holds the end of the substrate SB is raised, the substrate SB is pulled up, and the separation from the blanket BL proceeds in the (+ Y) direction. Since the peeling roller 340 is in contact, the peeling does not proceed beyond the contact region R4 (FIG. 5) by the peeling roller 340. By moving the peeling roller 340 in the (+ Y) direction at a constant speed while being in contact with the substrate SB, the progressing speed of the peeling can be kept constant. That is, the separation boundary line is a straight line along the roller extending direction, that is, the X direction, and further proceeds in the (+ Y) direction at a constant speed. Thereby, the damage of the pattern resulting from the stress concentration by the fluctuation | variation of the advancing speed of peeling can be prevented reliably.

  Thereafter, it waits for the separation roller 340 to pass through a preset switching position (step S109). This switching position is set for each of the suction pads 52 to 54, and is a position on the substrate SB immediately below the suction pad. For example, the switching position corresponding to the second suction unit 52 is the surface position of the substrate SB immediately below the second suction unit 52. When the peeling roller 340 passes through the position, the second suction unit 52 is lowered and the substrate SB is captured by the suction pad 527 of the second suction unit 52 as shown in FIG. 52 is raised again (step S110).

  As shown in FIG. 10B, since the peeling roller 340 has already passed, the substrate SB is peeled from the blanket BL and lifted upward at a position directly below the second suction unit 52. By approaching the substrate SB while applying a negative pressure to the suction pad 527 made of an elastic member having elasticity, the substrate SB is captured when the lower surface of the suction pad 527 comes into contact with the upper surface of the substrate SB. Can be adsorbed. After the suction pad 527 is lowered to a predetermined position, the substrate SB pulled up may be waited. In any case, it is possible to prevent suction failure by providing the suction pad with flexibility.

  After the adsorption of the substrate SB is started, the movement of the second adsorption unit 52 is turned up. As a result, as shown in FIG. 10C, the peeling progress speed is still controlled by the peeling roller 340, and the main body for lifting the substrate SB for peeling is changed from the first suction unit 51 to the second suction unit 52. Taken over. Further, the substrate SB after separation is switched from holding by only the first suction unit 51 to holding by the first suction unit 51 and the second suction unit 52, and the number of holding points increases. In addition, when each adsorption | suction unit 51-54 raises, the relative position in the Z direction between each adsorption | suction unit 51-54 is maintained so that the attitude | position of the board | substrate SB after peeling becomes a substantially plane.

  By performing the same processing (steps S109 to S111) for the remaining suction units 53 and 54, as shown in FIG. 10 (d), the holding positions of the substrates SB by the suction units are sequentially added, and the substrate SB. The main body of pulling up will be switched to the adsorption unit downstream. When the processing is completed for all the suction units (step S111), the entire substrate SB is separated from the blanket BL. Therefore, the separation roller 340 is moved to the (+ Y) side from the stage 30 to stop the movement (step S112). And after raising all the adsorption units 51-54 to the same height, it stops (step S113). Further, the pressing member 331 of the initial peeling unit 33 is separated from the blanket BL and moved to a retracted position above the upper surface of the blanket BL and at the (−Y) side end of the (−Y) side end of the blanket BL (step S114). ). Thereafter, the suction holding of the blanket BL by the suction groove is released, and the separated substrate SB and the blanket BL are carried out of the apparatus (step S115), thereby completing the peeling process.

  The suction units 51 to 54 have the same height by holding the substrate SB after separation and the blanket BL in parallel so that the hand for dispensing hand inserted by an external robot or operator can be accessed. This is to facilitate the delivery of the blanket BL and the substrate SB.

  As described above, in this embodiment, the peeling roller 340 extending in the X direction perpendicular to the peeling progress direction (Y direction here) is brought into contact with the substrate SB, and the peeling roller 340 is moved in the peeling progress direction. By pulling up the substrate SB while being moved at a constant speed, the separation speed can be kept constant and the substrate SB and the blanket BL can be favorably separated. That is, the peeling roller 340 can control the shape and traveling speed of the peeling boundary line formed between the peeling area where the substrate SB and the blanket BL have already peeled and the unpeeled area which has not yet peeled.

  In particular, the separation boundary line is started by starting the contact of the separation roller 340 from the (−Y) side end PS of the substrate SB where the separation is started to the effective area AR where an effective pattern or the like is formed. Prior to reaching the effective area AR, the progress management of the peeling by the peeling roller 340 is established, and damage to the pattern or the like in the effective area AR due to fluctuations in the peeling progress speed can be prevented.

  In the initial stage before management by the peeling roller 340 is established, the peeling progress speed tends to be unstable. However, in this embodiment, since the progress of the actual separation boundary line is grasped from the image captured by the imaging unit 37 and the movement start timing of the separation roller 340 is determined, the actual separation boundary line progresses. In addition, the peeling roller 340 can be moved. Thereby, even before and after the start of the peeling roller 340, the peeling boundary line proceeds smoothly, and it is possible to reliably prevent damage to the pattern and the like due to fluctuations in the peeling progress speed.

  Further, in this embodiment, as shown in FIG. 5, the region R3 on which the substrate SB is adsorbed by the first adsorption unit 51 responsible for pulling up the substrate SB in the initial stage of peeling is an effective region on which an effective pattern is formed. Outside the AR. When the substrate SB is locally adsorbed, the substrate SB is partially peeled off from the blanket BL at that portion, which may cause an effect such as deformation or damage of the pattern. By adsorbing, such a problem is avoided. Further, the peeling speed becomes unstable until the peeling boundary line reaches the position immediately below the peeling roller 340. Similarly, the peeling speed can be reduced by setting the contact area R4 of the peeling roller 340 in the initial stage outside the effective area. Damage to the pattern due to fluctuations in the pattern is also prevented.

  On the other hand, the second to fourth adsorption units 52 to 54 that newly adsorb the substrate SB during the peeling are in contact with the substrate SB in the area already peeled off from the blanket BL. Will not damage the printed pattern.

  As described above, in this embodiment, the blanket BL corresponds to the “first plate-like body” of the present invention and the substrate SB of the present invention is the “second plate-shaped body” of the workpiece WK as the separation target. Is equivalent to. The (−Y) side end of the substrate SB corresponds to “one end” of the present invention, and the (+ Y) side end opposite to this corresponds to the “other end” of the present invention. The (+ Y) direction corresponds to the “peeling progress direction” of the present invention.

  In this embodiment, the stage 30 functions as the “holding means” of the present invention, and the upper surface 310 of the horizontal stage portion 31 and the upper surface 320 of the tapered stage portion 32 function as a “holding surface” of the present invention. doing. In particular, the upper surface 310 of the horizontal stage portion 31 and the horizontal surface 321 of the taper stage portion 32 function integrally as a “planar portion” of the present invention, and the taper surface 322 of the taper stage portion 32 functions as a “taper surface” of the present invention. doing.

  In this embodiment, the first adsorption unit 51 functions as the “peeling means” of the present invention. Further, the peeling roller 340 functions as the “contacting means” of the present invention, and the position of the contact nip region R4 by the peeling roller 340 before the movement shown in FIGS. 5 and 8A is “ This corresponds to the “contact position”. In the above embodiment, the imaging unit 37 functions as the “imaging unit” of the present invention, and the control unit 70 functions as the “movement control unit” of the present invention. Further, the pressing member 331 functions as the “pressing member” of the present invention.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the above-described embodiment, one imaging window 323 is provided at a substantially central portion in the X direction of the horizontal plane 321 of the taper stage unit 32, and one imaging unit 37 is provided immediately below the imaging window 323. However, as described above, the progress of the peeling boundary line until the progress management by the peeling roller 340 is established is irregular and may vary depending on the position. From this point, the peeling boundary lines may be imaged at a plurality of locations in the X direction, and the start timing of the peeling roller may be determined from the result. In this case, it is preferable to start the movement of the peeling roller in accordance with the peeling boundary line at the slowest progressing position. By doing so, it is avoided that the movement of the roller is started at least before the peeling boundary line reaches the contact nip.

  In a general rectangular substrate, peeling is likely to start from the corner where the peeling force acts intensively, and peeling is often delayed at the center of the side. From this point, when the imaging position is one, it is effective to use the central portion, and this embodiment corresponds to this case.

  Moreover, although the board | substrate and the blanket are hold | maintained by vacuum suction in the said embodiment, the aspect of holding | maintenance is not limited to this. For example, it may be attracted and held by electrostatic or magnetic attracting force. In particular, the first suction unit 51 that holds outside the effective area of the substrate may be held by mechanically gripping the peripheral edge of the substrate, regardless of suction.

  In the above embodiment, the stage 30 can be separated for the convenience of delivery when the workpiece WK is carried in and out. However, the workpiece loading and unloading mode is not limited to this, and a stage separation structure is also essential. It is not a requirement.

  Further, in the above embodiment, the blanket BL is protruded and held on the taper stage portion 32, and the blanket BL is bent by the pressing member 331 to create a trigger for peeling. However, this is not an essential requirement. For example, the peeling may be started only by pulling up the first suction unit. In this case, it is not necessary to provide a taper on the stage.

  The present invention can be applied to a peeling process in a pattern forming process in which two plates are brought into close contact with each other to transfer a pattern or the like. This can be suitably applied to various purposes for satisfactorily peeling the plate-like body.

1 Peeling device 30 Stage (holding means)
31 Horizontal stage (holding means)
32 Tapered stage (holding means)
37 Imaging unit (imaging means)
51 1st adsorption unit (peeling means)
52-54 2nd thru | or 4th adsorption | suction unit 70 Control unit (movement control means)
310 Upper surface (holding surface) of the horizontal stage unit 31
321 Horizontal surface (holding surface) of taper stage 32
322 Tapered surface (of taper stage 32) 331 Pressing member 340 Peeling roller (contacting means)
517,527 Suction pad BL Blanket (first plate)
R4 Contact nip SB substrate (second plate)

Claims (13)

In the peeling apparatus for peeling the first plate and the second plate that are in close contact with each other through a thin film or pattern,
The first plate-like body has a holding surface larger than the plane size of the effective area where the thin film or pattern is formed, and the second plate-like body among the surfaces of the first plate-like body is provided on the holding surface. Holding means for holding the first plate-like body by contacting a surface opposite to the surface in close contact with,
A peeling means for peeling the one end of the second plate from the first plate by moving in a direction away from the holding means while holding the one end of the second plate.
The second plate-like body is formed in a roller shape extending along the second plate-like body in a direction orthogonal to the peeling progress direction from the one end portion to the other end portion opposite to the one end portion. In addition, it is configured to be movable in the peeling progress direction, and at the contact start position adjacent to the downstream side of the one end in the peeling progress direction, the second side opposite to the surface in close contact with the first plate-like body. A contact means for forming a contact nip by contacting one surface of the plate-like body;
In the first plate-like body, a separation boundary line generated at a boundary between an unpeeled region in close contact with the second plate-like body and a separation region peeled from the second plate-like body is defined as the first plate. An imaging means for imaging through a state body;
The position of the separation boundary line is detected based on an image captured by the imaging means, and when the separation boundary line reaches a position corresponding to the upstream end portion of the contact nip in the separation progress direction, A peeling device comprising movement control means for starting movement of the contact means from the contact start position in the peeling progress direction.   2. The peeling device according to claim 1, wherein the abutting means abuts on the first plate-like body at the abutting start position upstream of the effective area in the peeling progression direction.   The movement control means sets a position corresponding to the upstream end of the contact nip in the peeling progress direction as a reference position in advance, and detects that the peeling boundary line has reached the reference position. The peeling apparatus according to claim 1 or 2, wherein movement of the contact means is started.   The movement control means sets in advance as a reference position a position shifted from the position corresponding to the upstream end of the contact nip in the peeling progress direction by a predetermined distance to the upstream side in the peeling progress direction, The peeling apparatus according to claim 1 or 2, wherein when the peeling boundary line is detected to have reached the reference position, movement of the contact means is started.   The movement control means predicts based on a position detection result of the peeling boundary line before the peeling boundary line reaches the reference position, and the peeling boundary line is upstream of the contact nip in the peeling progress direction. The peeling apparatus according to claim 1 or 2, wherein the movement of the contact means is started at a time when the position corresponding to the end portion is reached. The holding means recedes from an extended plane that extends from the flat portion that contacts the effective area of the first plate-like body and extends from the ridge line portion that is connected to the flat portion and is connected to the flat portion. And a holding surface including a tapered surface portion, and a peripheral edge portion on the upstream side in the peeling progress direction with respect to the effective region of the first plate-like body protrudes from the flat surface portion to the tapered surface portion side and is held. ,
A pressing member that presses the peripheral edge of the first plate-like body to bend to the opposite side of the second plate-like body and starts peeling with the second plate-like body;
The peeling device according to any one of claims 1 to 5, wherein the abutting means abuts on the second plate-like body at the abutting start position between the ridge line portion and the effective area.   The peeling according to claim 6, wherein the imaging unit performs imaging through a light-transmitting imaging window provided upstream of the position corresponding to the effective area in the planar portion in the peeling progress direction. apparatus.   The peeling apparatus according to any one of claims 1 to 7, wherein the imaging unit images a central portion of the first plate-like body in a direction orthogonal to the peeling progress direction. In the peeling method of peeling the first plate and the second plate that are in close contact with each other through a thin film or pattern,
The surface of the first plate is opposite to the surface of the first plate that is in close contact with the second plate on the holding surface that is larger than the plane size of the effective area on which the thin film or pattern is formed. Holding the first plate-like body by contacting the side surface;
At the contact start position adjacent to the downstream side of the one end in the peeling progress direction from one end of the second plate to the other end opposite to the one end, the second plate contacts the first plate Contacting one surface of the second plate-like body opposite to the surface with roller-shaped contact means extending in a direction perpendicular to the peeling progress direction;
Moving one end of the second plate-like body in a direction away from the first plate-like body, and peeling the one end of the second plate-like body from the first plate-like body;
In the first plate-like body, a separation boundary line generated at a boundary between an unpeeled region in close contact with the second plate-like body and a separation region peeled from the second plate-like body is defined as the first plate. Imaging through the object,
Based on the captured image, a time at which the peeling boundary line reaches a position corresponding to the upstream end of the contact nip in the peeling progress direction is obtained, and the contact means is moved to the contact start position at that time. And a step of starting movement in the peeling progress direction.   A position corresponding to the upstream end of the contact nip in the peeling progress direction is set in advance as a reference position, and the contact means moves when it is detected that the peeling boundary line has reached the reference position. The peeling method according to claim 9 which starts.   A position shifted from the position corresponding to the upstream end in the peeling progress direction of the contact nip to the upstream side in the peeling progress direction by a predetermined distance is set in advance as a reference position, and the peeling boundary line is the reference position. The peeling method according to claim 9, wherein the contact means starts moving when it is detected that the position has been reached.   The position where the peeling boundary line corresponds to the upstream end of the contact nip in the peeling progress direction, which is predicted based on the detection result of the peeling boundary line before the peeling boundary line reaches the reference position. The peeling method according to claim 9, wherein the movement of the contact means is started at the time of reaching the point.   The peeling method according to any one of claims 9 to 12, wherein the contact means after the start of movement is moved in the peeling progress direction at a constant speed.

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