JP2014186362A - Touch panel sensor and touch panel device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a touch panel sensor having good designing property.SOLUTION: A touch panel sensor 30 includes: a substrate film including index matching layers 70, 75; a first transparent conductor 40 disposed on one side of the substrate film 32; and a second transparent conductor 45 disposed on the other side of the substrate film 32. A region overlapping both of the transparent conductors 40, 45 is denoted by a double-transparent conductive region R2; a region overlapping one of the transparent conductors 40, 45 is denoted by a single transparent conductive region R11, R12; and a region overlapping none of the transparent conductors 40, 45 is denoted by a non-transparent conductive region R0. The index matching layers 70, 75 are configured to give 1% or less of a difference in the reflectance of light among the regions R2, R11, R12, R0. A region occupying the largest area in an active area among the regions R2, R11, R12, R0 has the greatest reflectance.

Description

  The present invention relates to a touch panel sensor and a touch panel device with improved design properties.

  Today, touch panel devices are widely used as input means. The touch panel device includes a touch panel sensor, a control circuit that detects a contact position on the touch panel sensor, wiring, and an FPC (flexible printed circuit board). In many cases, the touch panel device is used together with the display device as an input means for various devices including a display device such as a liquid crystal display or a plasma display (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). ing. In such a device, the touch panel sensor is disposed on the display surface of the display device, thereby enabling extremely direct input to the display device. The area | region which faces the display area of a display apparatus among touch panel sensors is transparent, and this area | region of a touch panel sensor comprises the active area which can detect a contact position (approach position).

  Touch panel devices are classified into various types based on the principle of detecting a contact position (approach position) on a touch panel sensor. In recent years, capacitive touch panel devices have attracted attention because they are optically bright, have good design properties, have a simple structure, and are superior in function. In a capacitively coupled touch panel device, when an external conductor (typically a finger) whose position is to be detected contacts (approaches) the touch panel sensor via a dielectric, a new strange capacitance is generated. The position of the object on the touch panel sensor is detected based on the change in capacitance caused by this strange capacity. The capacitive coupling method includes a surface type and a projection type. The projection type is attracting attention because it is suitable for multi-touch recognition (multi-point recognition) (for example, Patent Document 1).

  The projected capacitively coupled touch panel sensor includes a dielectric and a first transparent pattern and a second transparent pattern that are formed in different patterns on both sides of the dielectric and have conductivity. In this case, the position of the transparent pattern close to the outer conductor is detected based on an electromagnetic change or a change in capacitance that occurs when the outer conductor (typically a finger) contacts or approaches the touch panel sensor. The

  In a projected capacitively coupled touch panel sensor, generally, the optical refractive index of a transparent pattern is relatively large. Therefore, a region where a transparent pattern is provided and a region where a transparent pattern is not provided in the touch panel sensor. In some cases, the difference in the reflectance of the light increases. Thus, when the difference of the reflectance of the light between areas is large, a transparent pattern will be visually recognized from the user of a touch panel sensor, and it is unpreferable from a design viewpoint. In order to solve such a problem, for example, Patent Document 2 proposes a touch panel sensor in which a difference in light reflectance between regions is reduced by appropriately adjusting a light refractive index of a material used as an adhesive layer. ing.

Japanese Patent Laid-Open No. 9-292950 JP 2008-98169 A

  As described above, the touch panel sensor is composed of various layers such as a dielectric, a transparent conductor, and an adhesive layer. Therefore, in order to sufficiently reduce the difference between the light reflectance in the area where the transparent pattern is provided and the light reflectance in the area where the transparent pattern is not provided, the interface reflection in many layers is required. It is necessary to precisely set the photorefractive index and thickness of the above-mentioned adhesive layer and the like after calculating the above. Moreover, it is necessary to manufacture layers, such as the above-mentioned adhesion layer, with the optical refractive index and thickness as set. For this reason, the error which can be accept | permitted in a design or manufacture is small, and it is possible as a result that the man-hour required for a design or manufacture becomes large.

  An object of this invention is to provide the touch panel sensor and touch panel apparatus which can solve such a subject effectively.

  The present invention is a touch panel sensor including an active area corresponding to a region where a touch position can be detected, a base film including an index matching layer, and a predetermined pattern on one side of the base film in the active area A first transparent conductor having translucency and conductivity; and a second transparent having a translucency and conductivity provided in a predetermined pattern on the other side of the base film in the active area. A region overlapping with both the first transparent conductor and the second transparent conductor in the normal direction of the base film is referred to as a double transparent conductive region, and the first transparent conductor or A region overlapping any one of the second transparent conductors is referred to as a single transparent conductive region, and the first transparent conductor and the second transparent conductor When the non-overlapping region is referred to as a non-transparent conductive region, the index matching layer has a light reflectance difference of 1% or less between the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region. The region that occupies the largest area in the active area among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region has the highest reflectance. It is a touch panel sensor. Here, “reflectance” means reflection of light caused by each component arranged on one side of the touch panel sensor such as the first transparent conductor, and arrangement on the other side of the touch panel sensor such as the second transparent conductor. It means the reflectance calculated from the total reflection of light caused by each component.

  In the touch panel sensor according to the present invention, a region occupying a second largest area in the active area among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region has a second highest reflectance. It may be.

  In the touch panel sensor according to the present invention, the first transparent conductor includes a plurality of first transparent patterns for detecting a touch position, and a first dummy pattern disposed between two adjacent first transparent patterns. , May be included. The second transparent conductor includes a plurality of second transparent patterns for detecting a touch position and a second dummy pattern disposed between the two adjacent second transparent patterns. Also good. In this case, the double transparent conductive region occupies the largest area in the active area among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region, and has the highest reflectance. There may be.

  In the touch panel sensor according to the present invention, the index matching layer includes a wide area index matching layer provided so as to overlap with the double transparent conductive area, the single transparent conductive area, and the non-transparent conductive area, and the wide area index matching layer. And the first transparent conductor, and a first local index matching layer having a pattern corresponding to the first transparent conductor, and between the wide area index matching layer and the second transparent conductor. And a second local index matching layer having a pattern corresponding to the second transparent conductor.

  The present invention is a touch panel device including a touch panel sensor and a control circuit that detects a contact position on the touch panel sensor, wherein the touch panel sensor includes the touch panel sensor described above.

  According to the present invention, even when the reflectance of light is slightly different between regions, it is possible to suppress identification of each region. For this reason, the tolerance with respect to the difference of the reflectance of the light between area | regions can be enlarged, and the man-hour required for the design and manufacture of a touch panel sensor can be reduced by this.

FIG. 1 is a plan view showing a touch panel sensor according to an embodiment of the present invention. 2 is a cross-sectional view of the touch panel sensor of FIG. 1 taken along the line II. 3 is a cross-sectional view taken along line III of the touch panel sensor of FIG. 4 is a cross-sectional view of the touch panel sensor of FIG. 1 taken along line IV. FIG. 5 is an enlarged plan view showing a region V surrounded by an alternate long and short dash line in FIG. 1. FIG. 6 is a cross-sectional view showing a layer configuration of each region included in the active area. FIG. 7A is a diagram showing a manufacturing method of the touch panel sensor shown in FIG. 1. FIG. 7B is a diagram showing a method for manufacturing the touch panel sensor shown in FIG. 1. FIG. 7C is a diagram showing a method for manufacturing the touch panel sensor shown in FIG. 1. FIG. 7D is a diagram showing a manufacturing method of the touch panel sensor shown in FIG. 1. FIG. 7E is a diagram showing a method for manufacturing the touch panel sensor shown in FIG. 1. FIG. 7F is a diagram showing a method for manufacturing the touch panel sensor shown in FIG. 1. FIG. 8A is a plan view showing an example in which the touch panel sensor includes a dummy pattern. FIG. 8B is a plan view showing an example in which the touch panel sensor includes a dummy pattern.

  Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 7F. In the drawings attached to the present specification, for the sake of illustration and ease of understanding, the scale, the vertical / horizontal dimension ratio, and the like are appropriately changed and exaggerated from those of the actual ones. Further, in this case, the term “film” is not distinguished from members and parts called “sheet”, “plate”, and the like, based only on the difference in designation.

  First, the entire touch panel sensor 30 in the present embodiment will be described with reference to FIG. Here, an example in which the touch panel sensor 30 is configured as a projection capacitive touch panel sensor will be described. The “capacitive coupling” method is also referred to as “capacitance” method or “capacitance coupling” method in the technical field of touch panels. It is treated as a term synonymous with the “capacitive coupling” method. A typical capacitive coupling type touch panel sensor has a light-transmitting conductive pattern, and an external conductor (typically a human finger) approaches the touch panel sensor to externally. A capacitor (capacitance) is formed between this conductor and the conductive pattern of the touch panel sensor. Based on the change in the electrical state accompanying the formation of the capacitor, the position coordinates of the position where the external conductor is approaching on the touch panel sensor are specified. The touch panel sensor is usually used in combination with a display device such as a liquid crystal display or an organic EL display.

  As shown in FIG. 1, the touch panel sensor 30 includes a base film 32, a first transparent conductor 40 provided in a predetermined pattern on the surface of one side (observer side) of the base film 32, And a second transparent conductor 45 provided in a predetermined pattern on the other side (display device side) of the base film 32. In the present embodiment, the transparent conductors 40 and 45 are patterns made of a material having translucency and conductivity. In FIG. 1, components provided on the other side of the base film 32 such as the second transparent conductor 45 are indicated by dotted lines for convenience.

  The base film 32 functions as a dielectric in the touch panel sensor 30. As shown in FIG. 1, the base film 32 includes a rectangular active area Aa1 corresponding to a region where the touch position can be detected, and a rectangular frame-shaped inactive area Aa2 surrounding the active area Aa1. . The above-described first transparent conductor 40 provided on one side of the base film 32 has a first transparent pattern 41 provided in the active area Aa1 in order to detect a touch position. Similarly, the above-mentioned second transparent conductor 45 provided on the other side of the base film 32 has a second transparent pattern 46 provided in the active area Aa1 in order to detect the touch position. . The non-active area Aa2 is provided with extraction patterns 43 and 48 and terminal portions 44 and 49 for transmitting signals from the transparent conductors 40 and 45 to the outside.

  Hereinafter, each element constituting the touch panel sensor 30 will be described in detail.

(Transparent conductor, transparent pattern)
As shown in FIG. 1, the first transparent pattern 41 of the first transparent conductor 40 has a line portion 41a extending linearly along the x direction and a bulging portion 41b bulging from the line portion 41a. doing. Here, the bulging portion 41 b is a portion that bulges from the line portion 41 a along the film surface of the base film 32. Similarly, the second transparent pattern 46 of the second transparent conductor 45 includes a line portion 46a extending linearly along the y direction orthogonal to the x direction, and a bulging portion 46b bulging from the line portion 46a. Have.

  As shown in FIG. 1, the first transparent pattern 41 and the second transparent pattern 46 are arranged in different patterns. Specifically, as shown in FIG. 1, the bulging portion 41 b of the first transparent pattern 41 and the bulging portion 46 b of the second transparent pattern 46 are observed from the normal direction of the film surface of the base film 32. In such a case, they are arranged so as not to overlap each other. In this way, either the first transparent pattern 41 or the second transparent pattern 46 is disposed over almost the entire active area Aa1 of the base film 32.

  As the material of the transparent patterns 41 and 46, that is, the material of the transparent conductors 40 and 45, a material having transparency and required conductivity is used. Examples of such materials include indium tin oxide (ITO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, and zinc oxide-oxide Examples thereof include metal oxides such as tin, indium oxide-tin oxide, and zinc oxide-indium oxide-magnesium oxide. A combination of two or more of these metal oxides may be used.

  When the transparent conductors 40 and 45 are made of ITO, the light refractive index of the transparent conductors 40 and 45 is about 1.94 near the light wavelength of 550 nm. The method for calculating the optical refractive index is not particularly limited, but the refractive index of each layer in the visible light region having an optical wavelength of 380 to 780 nm can be calculated from, for example, measurement using an ellipsometer. Alternatively, the light refractive index at a specific wavelength can be calculated using a light source that generates light with a specific wavelength, for example, a He—Ne laser that generates light with a wavelength of 633 nm. The magnitude relationship of the refractive index is based on, for example, the average value of the refractive index measured in the visible light region of the light wavelength of 380 to 780 nm, or based on the refractive index measured at the specific wavelength, for example, the light wavelength of 550 nm. Can be defined.

  The thickness of the transparent conductors 40 and 45 is preferably 20 nm or less, for example, 18 nm each. When the film thickness is small, for example, 40 nm or less, generally, the smaller the thickness of the transparent conductors 40 and 45, the smaller the light reflectance at the interface between the transparent conductors 40 and 45 and the air, and the influence of the absorption term. Is small, the transmittance is high.

  By the way, when the index matching layer (described later) is not interposed between the transparent conductors 40, 45 and the film body (described later) of the base film 32, generally, the light reflectance in the transparent conductors 40, 45 is low. The smaller the touch panel sensor 30, the smaller the difference in light reflectance between the area where the transparent conductors 40 and 45 are provided and the area where the transparent conductors 40 and 45 are not provided. For this reason, by reducing the thickness of the transparent conductors 40 and 45, the area of the touch panel sensor 30 where the transparent conductors 40 and 45 are provided and the area where the transparent conductors 40 and 45 are not provided are provided. The difference in the reflectance of light between the two can be reduced, whereby the pattern of the transparent conductors 40 and 45 can be prevented from being visually recognized by the user of the touch panel sensor 30.

  On the other hand, when an index matching layer is interposed between the transparent conductors 40 and 45 and the film body of the base film 32, the reflectance in the region of the touch panel sensor 30 where the transparent conductors 40 and 45 are not provided. As a result, the difference in light reflectance between the area where the transparent conductors 40 and 45 are provided in the touch panel sensor 30 and the area where the transparent conductors 40 and 45 are not provided is reduced. . Here, the index matching layer is a layer including at least a pair of a high refractive index layer and a low refractive index layer, as will be described later. When such an index matching layer is interposed between the transparent conductors 40 and 45 and the film main body, an effect of thin film interference occurs, whereby the transparent conductors 40 and 45 of the touch panel sensor 30 are provided. The difference in light reflectance and transmittance between the region where the transparent conductors 40 and 45 are not provided can be reduced. In the present embodiment, a first index matching layer is configured between the first transparent conductor 40 and the film body, and a second index matching is performed between the second transparent conductor 45 and the film body. Layers are configured.

(Extraction pattern, terminal part)
Next, the extraction patterns 43 and 48 and the terminal portions 44 and 49 will be described with reference to FIGS. 2 to 4 are sectional views taken along lines II to IV of the touch panel sensor 30 shown in FIG.

  As shown in FIG. 1, the first extraction pattern 43 is connected to the first transparent pattern 41 at one end and is connected to the first terminal portion 44 at the other end. Similarly, the second extraction pattern 48 is connected to the second transparent pattern 46 at one end and connected to the second terminal portion 49 at the other end. The signals detected by the transparent patterns 41 and 46 are transmitted to the terminal portions 44 and 49 through the extraction patterns 43 and 48 and are extracted from the terminal portions 44 and 49 to the outside. The material which comprises the extraction patterns 43 and 48 and the terminal parts 44 and 49 is not specifically limited as long as it has electroconductivity. For example, as illustrated in FIGS. 2 to 4, the extraction patterns 43 and 48 may include transparent conductive portions 43 a and 48 a of transparent conductors 40 and 45 made of a material having translucency and conductivity. . Similarly, the terminal portions 44 and 49 may include transparent conductive portions 44a and 49a of the transparent conductors 40 and 45 made of a material having translucency and conductivity.

  The extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 are arranged in the inactive area Aa2 as described above. For this reason, the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 do not need to transmit light. Therefore, the extraction conductors 43 and 48 and the terminal portions 44 and 49 may include a light-shielding conductive material, for example, a metal material. For example, as shown in FIGS. 2 to 4, the extraction conductors 43 and 48 may include light-shielding conductive parts 43b and 48b that are provided on the transparent conductive parts 43a and 48a and are made of a light-shielding metal material. Good. Similarly, the terminal portions 44 and 49 may include light-shielding conductive portions 44b and 49b that are provided on the transparent conductive portions 44a and 49a and are made of a light-shielding metal material. Thereby, the value of the electrical resistance of the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 can be reduced. Examples of the metal material constituting the light-shielding conductive portions 43b and 48b and the light-shielding conductive portions 44b and 49b include aluminum, molybdenum, silver, chromium, copper, and alloys thereof.

(How to see the active area)
Next, how the active area Aa1 of the touch panel sensor 30 appears will be described. FIG. 5 is an enlarged plan view showing a region V surrounded by a dashed line in FIG.

As described above, the optical refractive index of the transparent conductors 40 and 45 is much larger than that of the base film 32. Accordingly, the manner of light reflection differs greatly between the region where the transparent conductors 40 and 45 are provided and the region where the transparent conductors 40 and 45 are not provided. Further, the region where the transparent conductors 40 and 45 are provided includes not only the region where only the first transparent conductor 40 or the second transparent conductor 45 is provided, but also the first transparent conductor 40 and the second transparent conductor 40. A region where both of the transparent conductors 45 are provided is included. Therefore, when considering the appearance of the active area Aa1 of the touch panel sensor 30, it is appropriate to classify the active area Aa1 into the following three types of areas.
1st area | region: When it sees from the normal line direction of the base film 32, it overlaps with both the 1st transparent conductor 40 and the 2nd transparent conductor 45 (henceforth a double transparent conductive area | region).
Second region: a region overlapping with either the first transparent conductor 40 or the second transparent conductor 45 when viewed from the normal direction of the substrate film 32 (hereinafter also referred to as a single transparent conductive region).
Third region: a region that does not overlap with either the first transparent conductor 40 or the second transparent conductor 45 when viewed from the normal direction of the base film 32 (hereinafter also referred to as a non-transparent conductive region).

  In the present embodiment, as described above, the bulging portion 41b of the first transparent pattern 41 of the first transparent conductor 40 and the bulging portion 46b of the second transparent pattern 46 of the second transparent conductor 45 are The base films 32 are arranged so as not to overlap each other when observed from the normal direction of the film surface of the base film 32. Therefore, as represented by reference sign A11 or A12 in FIG. 5, the single transparent conductive region has a region overlapping with the bulging portion 41b or the bulging portion 46b when viewed from the normal direction of the base film 32. Conceivable. The single transparent conductive region represented by reference numeral A11 means a region overlapping the first transparent conductor 40 such as the bulging portion 41b. Further, the single transparent conductive region denoted by reference sign A12 means a region overlapping the second transparent conductor 45 such as the bulging portion 46b.

  As shown in FIG. 5, the line portion 41 a of the first transparent pattern 41 of the first transparent conductor 40 and the line portion 46 a of the second transparent pattern 46 of the second transparent conductor 45 are formed on the base film 32. They are arranged so as to partially overlap each other when observed from the normal direction of the film surface. Therefore, as represented by the symbol A2 in FIG. 5, the double transparent conductive region may be a region that overlaps the line portion 41a and the line portion 46a when viewed from the normal direction of the base film 32. Further, as indicated by reference numeral A0 in FIG. 5, the non-transparent conductive region is located between the bulging portion 41b and the bulging portion 46b when viewed from the normal direction of the base film 32. Possible areas.

  FIG. 6 is a cross-sectional view showing the layer configuration of each of the regions A2, A11, A12, A0 included in the active area Aa1. FIG. 6 is a diagram for explaining each of the areas A2, A11, A12, A0, and does not correspond to the actual pattern of the transparent conductors 40, 45 in the touch panel sensor 30.

  FIG. 6 shows how light is reflected by the areas A2, A11, A12, and A0. Reference numerals R2, R11, R12, and R0 shown in FIG. 6 represent the light reflectance in the regions A2, A11, A12, and A0, respectively. The light reflectances R2, R11, R12, and R0 in the regions A2, A11, A12, and A0 are not only the reflections on the surfaces of the regions, but also the interfaces between the layers that form the regions A2, A11, A12, and A0. It is calculated by also considering the reflection at. Specifically, the reflection of light caused by each component arranged on one side of the touch panel sensor 30 such as the first transparent conductor 40 and the first index matching layer 70, and the second transparent conductor 45 and the first index matching layer 70. It is calculated from the total reflection of light caused by each component arranged on the other side of the touch panel sensor 30 such as the 2-index matching layer 75. Of course, reflection of light caused by the base film 32 is also considered.

Configuration for Reflectance Difference of 1% or Less As described above, it is preferable that the pattern of the transparent conductors 40 and 45 is not visually recognized by the user of the touch panel sensor 30 from the viewpoint of design. Therefore, it is necessary to suppress an increase in the difference between the light reflectances R2, R11, R12, and R0 in the regions A2, A11, A12, and A0. Considering the characteristics of the human eye, it is preferable that the difference between the light reflectances R2, R11, R12, and R0 in each of the regions A2, A11, A12, and A0 is at least 1%. Hereinafter, the structure of the base film 32 for realizing such a difference in reflectance will be described.

  As shown in FIG. 6, the base film 32 includes a transparent film body 33, index matching layers 71 and 74 provided between the film body 33 and the first transparent conductor 40, the film body 33, and the first film body 33. And index matching layers 76 and 79 provided between the two transparent conductors 45. Among these, the index matching layers denoted by reference numerals 71 and 76 are provided so as to overlap all of the double transparent conductive region A2, the single transparent conductive regions A11 and A12, and the non-transparent conductive region A0. On the other hand, the index matching layers represented by reference numerals 74 and 79 are provided so as to overlap only a part of the areas A2, A11, A12, and A0. Based on such a difference in configuration, in the following description, the index matching layer represented by reference numeral 71 is referred to as a first wide-area index matching layer, and the index matching layer represented by reference numeral 74 is referred to as a first local index matching layer. Called. Similarly, in the following description, the index matching layer represented by reference numeral 76 is referred to as a second wide area index matching layer, and the index matching layer represented by reference numeral 79 is referred to as a second local index matching layer. The first index matching layer 70 includes a first wide area index matching layer 71 and a first local index matching layer 74. Similarly, the second index matching layer 75 includes a second wide area index matching layer 76. And a second local index matching layer 79.

  As shown in FIG. 6, the first wide-area index matching layer 71 includes a first high refractive index layer 72 provided on the surface of the film body 33 on the first transparent conductor 40 side (one side), And a first low refractive index layer 73 provided on the surface of the high refractive index layer 72 on the first transparent conductor 40 side (one side). The second wide-area index matching layer 76 includes a second high-refractive index layer 77 provided on the second transparent conductor 45 side (the other side) of the film body 33, and a second high-refractive index layer 77. And a second low refractive index layer 78 provided on the second transparent conductor 45 side (the other side). FIG. 6 shows an example in which the first local index matching layer 74 and the second local index matching layer 79 are each composed of a single layer. However, the present invention is not limited to this, and the wide area index matching is performed. As in the case of the layers 71 and 76, the local index matching layers 74 and 79 may each be composed of a plurality of layers.

(Film body)
The material of the film body 33 is preferably a highly transparent material, for example, polyethylene terephthalate (PET), cycloolefin polymer (COP), cyclic olefin copolymer (COC), polycarbonate (PC), triacetyl cellulose (TAC). (Polymethyl methacrylate (PMMA), etc.) The thickness of the film body 33 is, for example, in the range of 25 to 200 μm. The rate is about 1.66.

(Index matching layer)
Next, the first index matching layer 70 and the second index matching layer 75 will be described in detail. As described above, the wide-area index matching layers 71 and 76 of the index matching layers 70 and 75 include the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78. Among these, the light refractive index of the low refractive index layers 73 and 78 is smaller than the light refractive index of the film body 33. Moreover, the light refractive index of the high refractive index layers 72 and 77 is larger than the light refractive index of the film body 33. By providing the wide-area index matching layers 71 and 76 having such a configuration between the film main body 33 and the transparent conductors 40 and 45, the effect of thin film interference can be produced. The difference between the reflectances R2, R11, R12, and R0 at A11, A12, and A0 can be reduced.

Next, the local index matching layers 74 and 79 will be described. As described above, the local index matching layers 74 and 79 are provided so as to overlap only a part of the areas A2, A11, A12, and A0. For example, as shown in FIG. 6, the first local index matching layer 74 has a pattern corresponding to the first transparent conductor 40 and is provided between the first wide area index matching layer 71 and the first transparent conductor 40. Yes. The second local index matching layer 79 has a pattern corresponding to the second transparent conductor 45 and is provided between the second wide area index matching layer 76 and the second transparent conductor 45. By providing such local index matching layers 74 and 79, the reflectances R2, R11, and R12 in the double transparent conductive region A2 and the single transparent conductive regions A11 and A12 are set to the reflectance R0 in the non-transparent conductive region A0. Can be adjusted precisely with a high degree of freedom.
For example, consider a case where the thickness of the transparent conductors 40 and 45 is changed without changing the thickness of the base film 32 because of the design change of the touch panel sensor 30. At this time, if the local index matching layers 74 and 79 are not present, the reflectance R2 in each of the regions A2, A11, A12, and A0 is adjusted by adjusting the thickness and refractive index of the wide-area index matching layers 71 and 76. The difference between R11, R12, and R0 will be readjusted. In this case, since four types of reflectivity R2, R11, R12, R0 must be considered, adjustment is not easy.
On the other hand, when the local index matching layers 74 and 79 are present, the thickness and refractive index of only the local index matching layers 74 and 79 are adjusted while the thickness and refractive index of the wide-area index matching layers 71 and 76 remain unchanged. , Can be used. In this case, since the reflectance R0 in the region A0 does not change, the local index matching layers 74 and 79 are considered only considering that the reflectances R2, R11, and R12 in the regions A2, A11, and A12 are close to the reflectance R0. Adjustments can be made. That is, the number of reflectance types to be considered can be reduced. For this reason, adjustment can be easily performed compared with the case where the local index matching layers 74 and 79 do not exist.

(Index matching layer design method)
Next, an example of a method for designing the index matching layers 70 and 75 having the above functions will be described. First, a target of optical characteristics in the touch panel sensor 30 is determined. For example, the optical characteristic target is that the difference between the reflectances R2, R11, R12, and R0 in the regions A2, A11, A12, and A0 is 1% or less.

  Next, based on the thickness and optical refractive index of each layer of the base film 32 and the thickness and optical refractive index of the transparent conductors 40 and 45, the reflectance value is obtained by simulation. Then, the above-mentioned optical system is used with the thickness and optical refractive index of the wide index matching layers 71 and 76 such as the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 and the local index matching layers 74 and 79 as variable parameters. Search for parameters that achieve the goal of the characteristic. Thereby, the appropriate ranges of the thickness and the optical refractive index of the wide-area index matching layers 71 and 76 such as the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 and the local index matching layers 74 and 79 are calculated. In this way, the index matching layers 70 and 75 that can obtain target optical characteristics are designed. As a simulation tool, for example, CODE of W. Thesis Hard-and Software can be used.

Next, materials constituting the index matching layers 70 and 75 will be described. First, materials of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 constituting the wide-area index matching layers 71 and 76 will be described in detail. As a material of the high refractive index layers 72 and 77, for example, a high refractive index material such as niobium oxide or zirconium is used. The high refractive index layers 72 and 77 may be a film composed of a single high refractive index material, or are composed of an organic resin and particles of a high refractive index material dispersed in the organic resin. May be.
As a material of the low refractive index layers 73 and 78, for example, a low refractive index material such as silicon oxide is used. In the low-refractive index layers 73 and 78, as in the case of the high-refractive index layers 72 and 77, the low-refractive index material may be a film composed of a single low-refractive index material, or as a plurality of particles. May be present. Here, a case where the low refractive index layers 73 and 78 are composed of an organic resin and particles of a low refractive index material dispersed in the organic resin will be described.

  The material constituting the local index matching layers 74 and 79 is not particularly limited, and various materials that can realize the desired reflectances R2, R11, and R12 in the regions A2, A11, and A12 can be used. For example, the local index matching layers 74 and 79 may be made of a low refractive index material such as silicon oxide. More specifically, the local index matching layers 74 and 79 may be films made of a low refractive index material such as silicon oxide. Here, when the low refractive index layers 73 and 78 adjacent to the local index matching layers 74 and 79 are composed of organic resin and particles of low refractive index material dispersed in the organic resin as described above, The optical refractive index in the local index matching layers 74 and 79 may be substantially equal to the optical refractive index in the low refractive index layers 73 and 78. For example, the absolute value of the difference between the optical refractive index in the local index matching layers 74 and 79 and the optical refractive index in the low refractive index layers 73 and 78 may be 0.05 or less.

表１に示すような層構成に基づいて、各領域Ａ２，Ａ１１，Ａ０における光の反射率Ｒ２，Ｒ１１，Ｒ０を計算したところ、反射率Ｒ２，Ｒ１１，Ｒ０はそれぞれ１２．５％，１２．５％，１２．５％であった。各領域Ａ２，Ａ１１，Ａ０における光の反射率に差が生じることを高いレベルで抑制できていると言える。 An example of the design of the thickness and optical refractive index of each layer of the index matching layers 70 and 75 configured as described above is shown in Table 1 as a reference.

Based on the layer structure as shown in Table 1, the light reflectances R2, R11, R0 in the respective regions A2, A11, A0 were calculated. The reflectances R2, R11, R0 were 12.5%, 12. 5% and 12.5%. It can be said that the occurrence of a difference in the reflectance of light in each of the regions A2, A11, A0 can be suppressed at a high level.

表２に示すような層構成に基づいて、各領域Ａ２，Ａ１１，Ａ０における光の反射率Ｒ２，Ｒ１１，Ｒ０を計算したところ、反射率Ｒ２，Ｒ１１，Ｒ０はそれぞれ１２．２％，１２．３％，１２．５％であった。このように、局所インデックスマッチング層を用いない場合、各領域Ａ２，Ａ１１，Ａ０における光の反射率の差が最大で０．３％となっていた。このことから、局所インデックスマッチング層を用いた場合、二重透明導電領域Ａ２および一重透明導電領域Ａ１１，Ａ１２における反射率Ｒ２，Ｒ１１，Ｒ１２を、非透明導電領域Ａ０における反射率Ｒ０に対して高い自由度で精密に調整することができるため、各領域Ａ２，Ａ１１，Ａ１２，Ａ０における光の反射率に差が生じることを高いレベルで抑制できると言える。 For comparison, Table 2 shows the results of designing the thickness and optical refractive index of each layer of the index matching layers 70 and 75 without using the local index matching layer.

Based on the layer structure as shown in Table 2, the light reflectances R2, R11, and R0 in the regions A2, A11, and A0 were calculated. The reflectances R2, R11, and R0 were 12.2%, 12. 3% and 12.5%. As described above, when the local index matching layer is not used, the difference in light reflectance between the regions A2, A11, and A0 is 0.3% at the maximum. From this, when the local index matching layer is used, the reflectances R2, R11, R12 in the double transparent conductive region A2 and the single transparent conductive regions A11, A12 are higher than the reflectance R0 in the non-transparent conductive region A0. Since it can be adjusted precisely with a degree of freedom, it can be said that a difference in the reflectance of light in each region A2, A11, A12, A0 can be suppressed at a high level.

Configuration for further invisibility The difference in light reflectance in each of the areas A2, A11, A0 based on the design shown in Table 1 above is a calculated value. In an actual product, manufacturing errors and the like exist, so it is difficult to make the difference in reflectance in each region zero. In addition, as a result of the inventor's extensive research, the pattern of the transparent conductors 40 and 45 can be obtained simply by reducing the difference between the light reflectances R2, R11, R12, and R0 in the regions A2, A11, A12, and A0. It has been found that there is a case where it is not possible to sufficiently realize that the user of the touch panel sensor 30 is not visually recognized (pattern invisibility). Hereinafter, the obtained knowledge will be described in detail.

  As a result of extensive research conducted by the present inventors, when comparing a plurality of regions having the same reflectivity, it was found that the region having the highest reflectivity among the plurality of regions was conspicuously recognized. For example, when the reflectance of the region R0 is 0.9 and the reflectance of the regions R11 and R12 is 0.85, even if the area of the regions R11 and R12 is larger than the area of the region R0, human It was noticed that the presence of the region R0 was recognized remarkably in the eyes. In other words, if the area of the regions R11 and R12 is larger than the area of the region R0, the reflectivity of the regions R11 and R12 is made larger than the reflectivity of the region R0, thereby making the presence of the region R0. It means that it can be very inconspicuous. Based on such knowledge, according to the present embodiment, by setting the light reflectance R2, R11, R12, R0 in each region A2, A11, A12, A0 as follows, Pattern invisibility can be realized at a higher level than when the difference in rate is simply reduced.

  In the present embodiment, among the double transparent conductive region A2, the single transparent conductive region A11, A12, and the non-transparent conductive region A0, the index occupying the largest area in the active area Aa1 has the highest reflectance. Matching layers 70 and 75 are formed. For example, as is apparent from FIG. 5, in the present embodiment, the regions occupying the largest area are the single transparent conductive regions A11 and A12. Therefore, the index matching layers 70 and 75 are set so that the reflectances R11 and R12 in the single transparent conductive regions A11 and A12 are larger than the reflectance R2 in the double transparent conductive region A2 and the reflectance R0 in the non-transparent conductive region A0. It is configured. As a result, the double transparent conductive region A2 and the non-transparent conductive region A0 can be made extremely inconspicuous compared to the single transparent conductive regions A11 and A12. Thereby, it can fully suppress that the pattern of the transparent conductors 40 and 45 is visually recognized by the user of the touch panel sensor 30.

  Preferably, the double transparent conductive region A2, the single transparent conductive region A11, A12, and the non-transparent conductive region A0 are indexed so that the region occupying the second largest area in the active area Aa1 has the second largest reflectance. Matching layers 70 and 75 are formed. In addition, the area | region which occupies the 2nd largest area in active area Aa1 and has the 2nd largest reflectance may be double transparent conductive area A2, or non-transparent conductive area A0.

Method for Manufacturing Touch Panel Sensor Next, a method for manufacturing the touch panel sensor 30 having the above configuration will be described with reference to FIGS. 7A to 7F. 7A to 7F are diagrams illustrating the transition of the layer configuration in each of the regions A2, A11, A12, and A0 of the active area Aa1 in the manufacturing process of the touch panel sensor 30. Detailed description of the manufacturing process of the inactive area Aa2 is omitted.

  First, as shown in FIG. 7A, a laminate 50 (also referred to as a blank) as a base material for producing the touch panel sensor 30 is prepared. The laminated body 50 includes a film main body 33, a first high refractive index layer 72, a first low refractive index layer 73, a first local index matching layer 74, and a first transparent conductive layer provided in this order on one side of the film main body 33. Layer 52a, and a second high refractive index layer 77, a second low refractive index layer 78, a second local index matching layer 79, and a second transparent conductive layer 52b provided in this order on the other side of the film body 33. doing. The transparent conductive layers 52a and 52b are layers made of a material having translucency and conductivity, and are layers that are patterned to become the transparent conductors 40 and 45 later.

  The method for configuring each layer of the laminate 50 is not particularly limited, and a known method is appropriately used. For example, the high refractive index layers 72 and 77 can be formed by coating an application liquid containing particles of an organic resin and a high refractive index material using a coater. Similarly, the low refractive index layers 73 and 78 can be formed by coating a coating solution containing particles of an organic resin and a low refractive index material. The local index matching layers 74 and 79 and the transparent conductive layers 52a and 52b can be formed by sputtering or vacuum deposition.

  The layer configuration of the stacked body 50 is not limited to the configuration illustrated in FIG. 7A, and other layers may be further included in the stacked body 50. For example, although not shown, the laminated body 50 may further include a metal layer provided on the transparent conductive layers 52a and 52b in order to form the above-described light-shielding conductive portions 43b, 44b, 48b, and 49b. In addition, the laminate 50 may further include a hard coat layer provided between the film body 33 and the high refractive index layers 72 and 77 in order to protect the base film 32. A hard-coat layer is a layer comprised from an acrylic resin, for example.

  Next, as shown in FIG. 7B, the first photosensitive layer 56 a is formed on one surface of the stacked body 50, and the second photosensitive layer 56 b is formed on the other surface of the stacked body 50. . The first photosensitive layer 56a and the second photosensitive layer 56b have photosensitivity to light in a specific wavelength range, for example, ultraviolet rays. The photosensitive layers 56a and 56b are formed, for example, by coating a photosensitive material on the surface of the laminate 50 using a coater. The type of the photosensitive layers 56a and 56b is not particularly limited. For example, a photodissolvable photosensitive layer may be used, or a photocurable photosensitive layer may be used.

  Next, as shown in FIG. 7C, the photosensitive layers 56a and 56b are exposed in a predetermined pattern so that the photosensitive layers 56a and 56b have patterns corresponding to the transparent conductors 40 and 45 to be formed. And develop. Thereafter, as shown in FIG. 7D, the first transparent conductive layer 52a is etched using the patterned first photosensitive layer 56a as a mask, and the second transparent conductive layer 52b is etched using the patterned second photosensitive layer 56b as a mask. To do. As the etchant, for example, a solution containing ferric chloride is used.

  Next, the first local index matching layer 74 is etched using the patterned first photosensitive layer 56a and the first transparent conductive layer 52a as a mask, and the patterned second photosensitive layer 56b and the second transparent conductive layer 52b are masked. As a result, the second local index matching layer 79 is etched. As a result, as shown in FIG. 7E, local index matching layers 74 and 79 having patterns corresponding to the transparent conductors 40 and 45 can be obtained.

  Thereafter, the photosensitive layers 56a and 56b on the transparent conductive layers 52a and 52b are removed. As a result, as shown in FIG. 7F, transparent conductors 40 and 45 composed of transparent conductive layers 52a and 52b can be obtained. In this manner, the touch panel sensor 30 including the transparent conductors 40 and 45 including the transparent patterns 41 and 46 for detecting the touch position can be manufactured. In the step of etching the local index matching layers 74 and 79, when an alkaline solution is used as the etchant, the photosensitive layers 56a and 56b can be removed simultaneously with the etching of the local index matching layers 74 and 79. is there.

  In the step of etching the local index matching layers 74 and 79 described above, only the local index matching layers 74 and 79 are etched, and the wide-area index matching layers 71 and 76 such as the low refractive index layers 73 and 78 are configured. The element is not etched. This is because the low refractive index layers 73 and 78 are composed of an organic resin and particles of a low refractive index material dispersed in the organic resin. For this reason, the particles of the low refractive index material are made of organic resin. This is because it is protected from the etching solution.

  According to the present embodiment, as described above, the index matching layers 70 and 75 reflect light in the double transparent conductive region A2, the single transparent conductive regions A11 and A12, and the non-transparent conductive region A0 in the active area Aa1. The difference between the rates R2, R11, R12, R0 is configured to be at least 1%. Thereby, it is possible to suppress the visual recognition of the boundary between the double transparent conductive region A2, the single transparent conductive region A11, A12, and the non-transparent conductive region A0. Further, according to the present embodiment, the index matching layers 70 and 75 have a region that occupies the largest area in the active area Aa1 among the double transparent conductive region A2, the single transparent conductive regions A11 and A12, and the non-transparent conductive region A0. The index matching layers 70 and 75 are configured to have the highest reflectance. For this reason, the area which occupies the largest area among the double transparent conductive area A2, the single transparent conductive areas A11, A12, and the non-transparent conductive area A0 is the most easily visible area. That is, the other areas can be made inconspicuous. By these things, it can fully suppress that the pattern of the transparent conductors 40 and 45 is visually recognized from the user of the touch panel sensor 30. Further, according to the present embodiment, by adjusting the reflectivity R2, R11, R12, R0 of each region A2, A11, A12, A0 according to the area of each region A2, A11, A12, A0, Compared with the case where no adjustment is performed, the tolerance for the difference in the reflectance of light between regions can be increased in realizing the invisible visibility of the transparent conductors 40 and 45. Thereby, the man-hour required for the design and manufacture of the touch panel sensor 30 can be reduced.

  Further, according to the present embodiment, as described above, the index matching layers 70 and 75 are provided so as to overlap any of the double transparent conductive region A2, the single transparent conductive regions A11 and A12, and the non-transparent conductive region A0. In addition to the wide-area index matching layers 71 and 76, local index matching layers 74 and 79 having patterns corresponding to the transparent conductors 40 and 45 (that is, the double transparent conductive regions A2 and the single transparent conductive regions A11 and A12) are further included. It is out. For this reason, the reflectivity R2, R11, R12 in the double transparent conductive region A2 and the single transparent conductive region A11, A12 can be precisely adjusted with a high degree of freedom relative to the reflectivity R0 in the non-transparent conductive region A0. . As a result, the difference and magnitude relationship between the light reflectances R2, R11, R12, and R0 in the regions A2, A11, A12, and A0 can be set more precisely and easily. Thereby, it can fully suppress that the pattern of the transparent conductors 40 and 45 is visually recognized from the user of the touch panel sensor 30, reducing the man-hour required for the design and manufacture of the touch panel sensor 30.

  Note that various modifications can be made to the above-described embodiment. Hereinafter, some modifications will be described with reference to the drawings. In the following description and the drawings used in the following description, the same reference numerals as those used for the corresponding parts in the above embodiment are used for the parts that can be configured in the same manner as in the above embodiment. A duplicate description is omitted.

Example in which a dummy pattern is provided Conventionally, as a method for preventing the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30, the area where the transparent conductors 40 and 45 are not provided. In addition, it has been proposed to form a dummy pattern using the same material as that of the transparent conductors 40 and 45. Also in this embodiment, such a dummy pattern may be further provided. Hereinafter, an example in which the touch panel sensor 30 further includes a dummy pattern will be described with reference to FIGS. 8A and 8B.

  8A and 8B are diagrams showing an enlarged part of the active area Aa1, and corresponding to FIG. 5 in the present embodiment described above. 8A shows only the first transparent conductor 40 provided on one side of the base film 32, and FIG. 8B shows the base film 32 in order to avoid complication of the drawing. Only the second transparent conductor 45 provided on the other side is shown.

  As shown in FIG. 8A, the first transparent conductor 40 includes the first transparent patterns 41 arranged between two adjacent first transparent patterns 41 in addition to the plurality of first transparent patterns 41 for detecting the touch position. A dummy pattern 42 is further provided. Each first dummy pattern 42 is a layer made of a material having translucency and conductivity. For example, each first dummy pattern 42 is formed simultaneously with the first transparent pattern 41 from the first transparent conductive layer 52a described above. By providing such a first dummy pattern 42, the first transparent conductor 40 can be uniformly present on one side of the base film 32, and thereby the pattern of the first transparent conductor 40. Can be prevented from being visually recognized. As shown in FIG. 8A, the first dummy pattern 42 may be composed of a plurality of unit patterns 42a. That is, the first dummy pattern 42 may be finely partitioned. Accordingly, even if a part of the unit pattern 42a comes into contact with the first transparent pattern 41 due to a manufacturing error or the like in the manufacturing process, the first pattern is caused by such unintended contact. It is possible to prevent the occurrence of problems such as a short of the one transparent pattern 41.

  As shown in FIG. 8B, the second transparent conductor 45 includes a second transparent pattern 46 disposed between two adjacent second transparent patterns 46 in addition to the plurality of second transparent patterns 46 for detecting the touch position. A dummy pattern 47 is further provided. Each second dummy pattern 47 is a layer made of a material having translucency and conductivity. For example, each second dummy pattern 47 is formed simultaneously with the second transparent pattern 46 from the second transparent conductive layer 52b described above. By providing such a second dummy pattern 47, the second transparent conductor 45 can be uniformly present on the other side of the base film 32, whereby the pattern of the second transparent conductor 45 is obtained. Can be prevented from being visually recognized. As in the case of the first dummy pattern 42, the second dummy pattern 47 may be composed of a plurality of unit patterns 47a.

  Also in this modified example, as in the case of the above-described embodiment, the region occupying the largest area in the active area Aa1 among the double transparent conductive region A2, the single transparent conductive region A11, A12, and the non-transparent conductive region A0. However, the index matching layers 70 and 75 are configured to have the highest reflectance. Preferably, the double transparent conductive region A2, the single transparent conductive region A11, A12, and the non-transparent conductive region A0 are indexed so that the region occupying the second largest area in the active area Aa1 has the second largest reflectance. Matching layers 70 and 75 are formed.

  In this modification, as is apparent from FIGS. 8A and 8B, most of the unit pattern 42a of the first dummy pattern 42 of the first transparent conductor 40 is the second transparent pattern of the second transparent conductor 45. 46 overlaps the bulging portion 46b. Further, most of the unit pattern 47 a of the second dummy pattern 47 of the second transparent conductor 45 overlaps the bulging portion 41 b of the first transparent pattern 41 of the first transparent conductor 40. Therefore, in this modification, most of the region overlapping the unit pattern 42a of the first dummy pattern 42 or the unit pattern 47a of the second dummy pattern 47 when viewed from the normal direction of the base film 32 is double. It is a transparent conductive region A2. Therefore, in this modification, the region occupying the largest area in the active area Aa1 is the double transparent conductive region A2. Therefore, in this modification, the index R is set so that the reflectance R2 in the double transparent conductive region A2 is larger than the reflectances R11 and R12 in the single transparent conductive regions A11 and A12 and the reflectance R0 in the non-transparent conductive region A0. Matching layers 70 and 75 are formed. As a result, the single transparent conductive regions A11, A12 and the non-transparent conductive region A0 can be made extremely inconspicuous compared to the double transparent conductive region A2. Thereby, it can fully suppress that the pattern of the transparent conductors 40 and 45 is visually recognized by the user of the touch panel sensor 30.

  In the above-described embodiment shown in FIGS. 1 to 7F, the regions occupying the largest area are the single transparent conductive regions A11 and A12. In this case, in order to make the reflectances R11 and R12 in the single transparent conductive regions A11 and A12 larger than the reflectance R2 in the double transparent conductive region A2, the above-described local index matching layers 74 and 79 are usually required. . On the other hand, in the present modification shown in FIGS. 8A and 8B, the region occupying the largest area is the double transparent conductive region A2. In this case, even if the above-described local index matching layers 74 and 79 are not provided, the reflectance R2 in the double transparent conductive region A2 is higher than the reflectances R11 and R12 in the single transparent conductive regions A11 and A12. Can be bigger. Therefore, in the present modification, the above-described local index matching layers 74 and 79 are not essential components.

  In addition, although some modified examples with respect to the above-described embodiment have been described, naturally, a plurality of modified examples can be applied in combination as appropriate.

30 touch panel sensor 32 base film 33 film body 40 first transparent conductor 41 first transparent pattern 42 first dummy pattern 45 first transparent conductor 46 second transparent pattern 47 second dummy pattern 50 laminate 70 first index matching Layer 71 First wide area index matching layer 74 First local index matching layer 75 Second index matching layer 76 Second wide area index matching layer 79 Second local index matching layer A2 Double transparent conductive areas A11, A12 Single transparent conductive area A0 Transparent conductive area

Claims (5)

A touch panel sensor including an active area corresponding to a region where a touch position can be detected,
A base film including an index matching layer;
A first transparent conductor provided in a predetermined pattern on one side of the base film in the active area, and having translucency and conductivity;
A second transparent conductor provided in a predetermined pattern on the other side of the base film in the active area and having translucency and conductivity;
A region overlapping with both the first transparent conductor and the second transparent conductor in the normal direction of the base film is referred to as a double transparent conductive region, and the first transparent conductor or the second transparent conductor When the region that overlaps either one is referred to as a single transparent conductive region, and the region that does not overlap any of the first transparent conductor and the second transparent conductor is referred to as a non-transparent conductive region, the index matching layer is A difference in light reflectance between the double transparent conductive region, the single transparent conductive region and the non-transparent conductive region is configured to be 1% or less,
The touch panel sensor, wherein a region occupying the largest area in the active area among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region has the highest reflectance.   The region that occupies the second largest area in the active area among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region has a second highest reflectance. The touch panel sensor described. The first transparent conductor has a plurality of first transparent patterns for detecting a touch position, and a first dummy pattern disposed between two adjacent first transparent patterns,
The second transparent conductor has a plurality of second transparent patterns for detecting a touch position, and a second dummy pattern disposed between two adjacent second transparent patterns,
The double transparent conductive region is a region that occupies the largest area in the active area and has the highest reflectance among the double transparent conductive region, the single transparent conductive region, and the non-transparent conductive region. Item 3. The touch panel sensor according to item 1 or 2.   The index matching layer includes a wide area index matching layer provided to overlap with the double transparent conductive area, the single transparent conductive area, and the non-transparent conductive area; the wide area index matching layer; and the first transparent conductor. Between the first local index matching layer having a pattern corresponding to the first transparent conductor, the wide-area index matching layer and the second transparent conductor, and the second transparent conductor. The touch panel sensor according to claim 1, further comprising: a second local index matching layer having a pattern corresponding to the conductor. A touch panel device including a touch panel sensor and a control circuit for detecting a contact position on the touch panel sensor,
A touch panel device, wherein the touch panel sensor comprises the touch panel sensor according to claim 1.

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