JP2014163950A - Substrate with color filter formed therein, display device, and method for manufacturing substrate with color filter formed therein - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate with a color filter formed therein to be used in a display unit configured to include a frame part formed on the entire periphery of a display region, in which a base surface of the substrate with the color filter is disposed outside (on an observer side) and reflection of external light can be suppressed to give a good appearance while a power source is turned off.SOLUTION: The substrate with a color filter formed therein has a layered structure in a frame part or in a frame part and a light-shielding part for segmenting a pixel, the layered structure comprising, from one surface side of a base material, a reflection suppressing layer comprising a resin composition and a black light-shielding layer comprising a resin composition. A refractive index nof the base material, a real part nin a complex refractive index of the reflection suppressing layer, a real part nin a complex refractive index of the light-shielding layer have such relationships that in a wavelength region from 505 nm to 605 m centering at 555 nm where a luminous factor in a bright place is high, an absolute value of a difference between the refractive index nand the refractive index nis smaller than an absolute value of a difference between the refractive index nand the refractive index n. The reflection suppressing layer consists of an opaque resin layer having absorptivity for light in the above wavelength region from 505 nm to 605 nm.

Description

  The present invention relates to a color filter forming substrate for a display device and a display device, and in particular, for a color filter in a region partitioned by a pixel partitioning light-shielding portion (also referred to as a black matrix) on one side of a base material made of a transparent substrate. A color filter forming substrate having a colored resin layer of each color formed to form a display region, and a light-shielding frame portion as a non-display region outside the display region, and the base material The present invention relates to a color filter forming substrate used for a display device (also referred to as a display unit) of a mobile electronic device, with the other side, not one side, being the outermost side (observer side).

In recent years, display devices such as liquid crystal display devices have been used as flat display panels while display devices have become very popular.
In particular, the liquid crystal display device includes a color filter forming substrate in which a pixel-partitioning light-shielding portion composed of a light-shielding colored resin layer and the like and a colored resin layer for each color filter are disposed on one surface of the transparent substrate, A counter electrode substrate (also referred to as a TFT substrate) is arranged facing each other with a predetermined gap, and a liquid crystal is sealed in the gap, and the light transmittance of the colored resin layer of each color is controlled by liquid crystal It is widely used to display a color image by electrically controlling the orientation.
In addition, the organic EL display device controls the organic EL light emitting layer with TFTs and selectively emits light for each pixel to display. However, since it is self-luminous, it has excellent visibility and has a backlight. Since it is unnecessary, it can be thin and light, has a simple structure, can be expected to reduce costs, and is suitable for displaying moving images. In recent years, research and development and commercialization have been actively promoted.
In such a display device, high display quality is required.

On the other hand, recently, notebook computers and multi-function terminal devices (also referred to as high-function terminal devices), which are mobile models, have become widespread, and in particular, tablet-type multi-function terminal devices as shown in FIG. Rapid spread is expected, and display devices (also referred to as display units) of these terminal devices (hereinafter referred to as mobile electronic devices) are required to have better design properties in addition to high display quality. ing.
In mobile electronic devices that have recently become popular, efforts have been made to achieve high added value, such as high definition, energy saving, and miniaturization (lightening).
The environment where mobile electronic devices are used is not limited to indoors, and the frequency of outdoor use is much higher, so visibility improvements (contrast improvement) under sunlight have been implemented.
However, almost no efforts have been made for improvement from the viewpoint of design.

  Conventionally, as a display device for these mobile electronic devices, a light-shielding black frame for forming a non-display area over the entire periphery of the display area is formed on one side of a transparent substrate as a base material. There is a form in which the non-display area is formed by using the provided cover glass and the base material side is arranged on the outermost side (observer side). In response to the demand for weight reduction of these mobile electronic devices, Without using a cover glass, a transparent substrate is used as a base material, and a colored layer of each color for color filters is arranged in the display area on the one side, and for the non-display over the entire periphery of the display area A non-display area is formed by using a color filter forming substrate with a light-shielding black frame to form an area, and placing the other side of the base material on the outermost side (observer side). There is also a form to do. However, in any case of the display device, the frame portion as the non-display region and the reflection by the external light in the display region do not look good, particularly in the frame portion, indoors / outdoors, under room light, sunlight Below, the black-tightening of the light-shielding frame portion is not good, and it is difficult to finish a high-quality product in terms of design, which has been a problem.

In the case of a display device for a mobile electronic device that does not use a cover glass, for example, when a simplified cross-sectional configuration is shown, as shown in FIG. The color filter forming substrate 110 and the TFT substrate 150 in this order.
Further, in the case of a display device for a mobile electronic device using a cover glass, when a simplified cross-sectional configuration is shown, as shown in FIG. 130, the color filter forming substrate 110, and the TFT substrate 150 in this order.
Further, in the case of a display device for an in-cell touch panel type mobile electronic device that does not use a cover glass, for example, when a simplified cross-sectional configuration is shown, as shown in FIG. The base material side 111 of the TFT substrate 150 and the TFT substrate 150 are arranged in this order, with the color filter forming substrate 110 and the touch panel 140 integrated.
On the other hand, in the case of a display device of a touch panel type mobile electronic device using a cover glass, as shown in a simplified cross-sectional configuration, the cover glass is on the outside (observer side) as shown in FIG. The cover glass 130 and the touch panel 140 are integrated, and the color filter forming substrate 110 and the TFT substrate 150 are arranged in this order.
8A, FIG. 8B, FIG. 9A, and FIG. 9B are simplified and show only the positional relationship between the above-described parts.

And the color filter formation board | substrate used for the display apparatus of the mobile electronic device shown to Fig.8 (a) and FIG.9 (a) which does not use a cover glass has the form as shown in FIG. 10 normally.
10A is a plan view of the color filter forming substrate, and FIGS. 10B and 10C are directions of arrows in E1-E2 and E3-E4 of FIG. 10A, respectively. FIG. 10D is an enlarged view of a portion E5 in FIG. 10A, and FIG. 10E is an enlarged view of a portion E6 in FIG. 10A.
Usually, the colored layers for each color filter, the colored layer for the pixel-shading light-shielding portion, and the colored layer for the frame portion are formed by a photolithography process and are not displayed over the entire periphery of the display area. Similarly, a predetermined colored layer is also formed on the light-shielding frame portion 112 as a use region by a photolithography process.
Usually, the frame portion 112 and the pixel-segment light-shielding portion (not shown) are formed together in the same photolithography process, but depending on the case, the frame portion 112 and the pixel-segment light-shielding portion (not shown). Does not have to be formed together in the same photolithography process.

WO2010-150668 gazette JP 2009-053893 A

As mentioned above, recently, notebook PCs and multifunction terminal devices (also called high-end devices), which are mobile models, have become popular, and tablet-type multifunction terminal devices have rapidly spread. Although liquid crystal display devices and organic EL display devices are used as display devices for these mobile electronic devices, better design is required in addition to high display quality.
Under such circumstances, a colored layer for each color filter is arranged in the display area on one side of the substrate made of a transparent substrate, and a non-display area is formed over the entire periphery of the display area. Therefore, a non-display area is formed by using a color filter forming substrate provided with a light-shielding black frame portion and arranging the other surface side, not the one surface side, on the outer side (observer side). In the display device of a mobile electronic device, the frame portion as a non-display area and the reflection by the external light in the display area do not look good, and in particular, a light-shielding frame in indoor / outdoor, indoor light, under sunlight The black part of the part is not tightened well, and there is a problem that the product does not have a high-class feeling, and this countermeasure has been demanded.
The present invention corresponds to this, and in particular, a colored layer for each color filter is disposed on the display area on one side of the base material made of a transparent substrate, and the entire periphery of the display area In order to form a non-display area, a color filter forming substrate provided with a light-shielding black frame portion is used, and the other side, not one side of the base material, is arranged outside (observer side). In the display device of the mobile electronic device in the form of forming the display area, the frame portion as the non-display area and the appearance of the reflection by the external light in the display area are improved, so that it is indoor, outdoor, under indoor light, under sunlight However, an object of the present invention is to provide a color filter forming substrate that can improve the blackness of the light-shielding frame portion and give the product a high-class feeling.
At the same time, an object of the present invention is to provide a display device using such a color filter forming substrate.

The color filter forming substrate of the present invention forms a display region by arranging a colored resin layer for each color filter in a region partitioned by a pixel partitioning light-shielding portion on one side of a base material made of a transparent substrate. A color filter forming substrate having a light-shielding frame portion as a non-display area outside the display area, and the other side that is not one side of the base is the outside (observer side) A color filter forming substrate used in a display device, wherein the reflection suppressing layer is made of a resin composition in order from the one surface side of the base material to the frame portion, or to the frame portion and the pixel classification light-shielding portion. And a black light-shielding layer made of a resin composition, the refractive index n _{s of} the base material, the real part of the complex refractive index of the antireflection layer is n ₁ , and the complex refraction of the light-shielding layer If the real part of the rate was set to n ₂ , The difference in the wavelength region 505Nm～605nm, the absolute value of the difference between the refractive index _{n 1} and the refractive index _{n s} is the refractive index _{n s} with the refractive index _{n 2} around the visual sensitivity is high 555nm in a bright place The reflection suppression layer is an opaque resin layer having light absorptivity in the wavelength region 505 nm to 605 nm.
And it is said color filter formation board | substrate, Comprising: The said reflection suppression layer is a resin layer which disperse | distributes and contains 1 or more types of color materials, The said reflection suppression layer is blue. It is a blue resin layer containing a material dispersed therein.
Further, in any one of the color filter forming substrates, the black light shielding layer contains carbon black dispersed in a resin. (In the “wavelength region 505 nm to 605 nm”, the absolute value of the difference between the refractive index n _s and the refractive index n ₁ is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n _2. “Relationship” means that the absolute value of the difference between the refractive index n _s and the refractive index n ₁ is partially the refractive index n _s and the refractive index n _{2 in} some narrow wavelength regions within the wavelength region 505 nm to 605 nm. This means that even if there is a relationship greater than the absolute value of the difference between and the case where the influence of the narrow wavelength region is negligible, this is included.)

  The display device of the present invention is characterized in that a display portion is formed using any of the color filter forming substrates described above.

(Function)
The color filter forming substrate of the invention of claim 1 is arranged in such a configuration so that a colored resin layer for each color filter is disposed on the display region on one side of the base material made of a transparent substrate, and In order to form a non-display area over the entire periphery of the display area, a color filter forming substrate provided with a light-shielding black frame portion is used, and the other side that is not one side of the substrate is the outermost side In a display device that is arranged on the (observer side) and forms a non-display area, the frame portion as the non-display area and the appearance of reflection by external light in the display area are improved, especially indoors and outdoors. Even under indoor light and sunlight, it is possible to provide a color filter-formed substrate that can improve the blackness of the light-shielding frame and give the product a high-class feeling.
It is used indoors and outdoors like a mobile electronic device, and is effective for a display portion that requires high quality and design.
Specifically, a reflection suppressing layer made of a resin composition and a black light-shielding layer made of a resin composition are sequentially formed on the frame portion, or on the frame portion and the pixel classification light-shielding portion, from one side of the substrate. It is bright when it has a laminated structure, the refractive index n _{s of} the base material, the real part of the complex refractive index of the antireflection layer is n ₁ , and the real part of the complex refractive index of the light shielding layer is n ₂ The absolute value of the difference between the refractive index n _s and the refractive index n ₁ is the absolute value of the difference between the refractive index n _s and the refractive index n ₂ in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility is high. It is possible to achieve this by having a relationship smaller than the value, and the antireflection layer is an opaque resin layer having light absorption in the wavelength region 505 nm to 605 nm. Yes.
In the case of a conventional color filter forming substrate, the frame portion has a structure in which a base material 11 and a light shielding layer 16B are laminated as shown in FIG. 2A, and reflected light of external light L0 is shielded from the base material 11. The reflected light Ref0 is emitted from the reflected light ref0 reflected at the interface of the layer 16B. However, because the reflected light Ref0 is large, the reflected light Ref0 causes the indoor and outdoor, under indoor light, sunlight. Underneath, the black color of the light-shielding frame is not good, and when used in a display device, it is difficult to finish a high-quality product in terms of design, which has been a problem.
On the other hand, as shown in FIG. 2B, when the base material 11, the reflection suppressing layer 16R, and the light shielding layer 16B are laminated in this order, the reflected light of the external light L0 is reflected from the base material 11 and reflected. The reflected light Ref1 is emitted from the reflected light ref1 reflected at the interface of the suppression layer 16R, and passes through the reflection suppression layer 16R from the substrate 11 side, and is reflected at the interface between the reflection suppression layer 16R and the light shielding layer 16B. The light incident from the other external light L0 is the sum of the reflected light Ref2 emitted from the reflected light ref2 and absorbed by the reflection suppressing layer 16R and the light shielding layer 16B.
In the color filter forming substrate of the present invention, the frame portion or the frame portion and the pixel-segmenting light-shielding portion have the layer configuration shown in FIG. 2B, and the refractive index n _s of the base material 11 and the reflection suppressing layer 16R When the real part of the complex refractive index is n ₁ and the real part of the complex refractive index of the light shielding layer 16B is n ₂ , the refractive index n is in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility in a bright place is high. The absolute value of the difference between _s and the refractive index n ₁ is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n ₂ , and the antireflection layer has a wavelength range of 505 nm to 505 nm. By being an opaque resin layer having light absorption at 605 nm, in the wavelength region where human visibility is high, the emission light Ref1 from the reflected light ref1 reflected at the interface between the base material 11 and the reflection suppression layer 16R, and the base Reflection suppression from the material 11 side The reflected light Ref2 emitted from the reflected light ref2 that passes through the layer 16R and is reflected at the interface between the antireflection layer 16R and the light shielding layer 16B can be suppressed to a small amount, and as shown in FIG. The influence of the external light of the reflected light Ref1 and the reflected light Ref2 can be made smaller than the influence of the external light of the reflected light Ref0 shown in FIG. When used, the light-shielding frame can be tightened in black, indoors and outdoors, under indoor light, and under sunlight, resulting in high-quality design. It was made by finding that a product can be finished.
Here, a layer for measuring a refractive index is formed on a glass substrate, and the complex refractive index of each layer is determined by measuring using an optical film thickness measuring system DF-1042RT manufactured by Techno Synergy. Looking for.

式（１）、式（２）からは、屈折率ｎ_０１と屈折率ｎ_０２の差が小さいほど反射率も小さくなることが分かる。
したがって、図２（ｂ）において、明るい所での視感度が高い５５５ｎｍを中心とする波長領域５０５ｎｍ〜６０５ｎｍにおいて、基材１１の屈折率ｎ_ｓ と反射抑制層１６Ｒの屈折率ｎ_１ との差が、基材１１の屈折率ｎ_ｓ と遮光層１６Ｂの屈折率ｎ_２ との差より小の場合、反射抑制層１６Ｒでは、吸収があることから、波長領域５０５ｎｍ〜６０５ｎｍのほぼ全域において、基材１１と反射抑制層１６Ｒの界面で反射される反射光ｒｅｆ１の強度と、反射抑制層１６Ｒと遮光層１６Ｂとの界面で反射される反射光ｒｅｆ２の強度との和は、図２（ａ）に示す、基材１１と遮光層１６Ｂとの界面で反射される反射光ｒｅｆ０の強度よりも、小となる。 Incidentally, homogeneous refractive index n _01, is incident at an angle from the medium is isotropic to a medium having a refractive index n ₀₂ .theta.i (angle of incidence), considering the light refraction angle [theta] t (exit angle), the incident light plane wave The component included in the incident surface of the electric vector is referred to as P-polarized light, and the component perpendicular to the incident surface is referred to as S-polarized light. It is represented by the following formulas (1) and (2).
The reflectance is expressed as 1/2 of the sum of rp and rs.

From equations (1) and (2), it can be seen that the smaller the difference between the refractive index _n01 and the refractive index _n02 , the smaller the reflectance.
Therefore, in FIG. 2B, the difference between the refractive index n _{s of the} substrate 11 and the refractive index n ₁ of the antireflection layer 16R in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility in a bright place is high. Is smaller than the difference between the refractive index n _s of the base material 11 and the refractive index n ₂ of the light shielding layer 16B, the reflection suppressing layer 16R has absorption, and therefore, in almost the entire wavelength region 505 nm to 605 nm, The sum of the intensity of the reflected light ref1 reflected at the interface between the material 11 and the reflection suppressing layer 16R and the intensity of the reflected light ref2 reflected at the interface between the reflection suppressing layer 16R and the light shielding layer 16B is shown in FIG. It becomes smaller than the intensity | strength of the reflected light ref0 reflected in the interface of the base material 11 and the light shielding layer 16B shown in FIG.

Note that the refractive index n of any color layer for forming a color filter is the difference between the refractive index n _s and the refractive index n in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility in a bright place is high. Satisfies the relationship that the absolute value of the refractive index is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n _2, and these colored layers are opaque resin layers having light absorption in the wavelength region of 505 nm to 605 nm. Therefore, in a wavelength region where human visibility is high, the reflected light ref1 from the interface between the base material and the reflection suppression layer shown in FIG. 2B can be reduced, and the reflection suppression layer It is valid.
In particular, when a blue colored resin layer is used as the reflection suppression layer, the light absorption of the reflection suppression layer is large (see the Y value in Table 1), and the refractive index n ₁ and the refractive index n ₂ Since the absolute value of the difference is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n ₂ , the difference light is emitted from the reflected light ref2 reflected at the interface between the antireflection layer 16R and the light shielding layer 16B. The reflected light Ref2 is effectively suppressed.
From this, when the blue colored resin layer is used as the reflection suppressing layer, compared with the case where the colored resin layer of another color is used as the reflection suppressing layer, in the wavelength region 505 nm to 605 nm where human visibility is large, 2 (b), it is possible to further reduce the influence of external light by the reflected light Ref1 and the reflected light Ref2, and as a result, when used in a display device, indoors, outdoors, under room light, under sunlight. Further, it is possible to further improve the blackness of the light-shielding frame portion, and it is possible to finish the product with a sense of quality in terms of design.

As shown in Table 3 for Examples and Comparative Examples, which will be described later, the light shielding layer (BM layer), the opaque resin layer 1 to the opaque resin layer 4, the light shielding layer (BM layer), a transparent resin layer without a color material As for the layers other than (transparent layer), the Y value (D65 light source) measured by the SCI method shown in FIG. D65 light source) shows that a BLUE (blue) layer is preferable as the reflection suppressing layer.
In Table 2, it is understood from the Y value (D65 light source) obtained from the spectral transmittance measurement that the opaque resin layer 3 (colored layer 3, BLUE (blue) layer) is preferable as the reflection suppressing layer.
Here, the spectral transmittance of each layer is obtained, and the degree of attenuation in each layer is evaluated.

Here, the SCI method (abbreviation of Special Components Include method) is a measurement method in which the total of regular reflection light and diffuse reflection light is detected by a spectrocolorimeter as shown in FIG. The smaller the value of brightness Y in the XYZ color system of JISZ8701 obtained by calculation from the measurement result of the spectral characteristics of the reflectance, the better, and this is used as an appearance evaluation method by external light reflection.
The SCI method is widely used when measuring an object color.
In some cases, the spectral characteristics of the reflectance of reflected light of external light is measured by a specular reflection exclusion method (special components excluded method (hereinafter abbreviated as SCE method)) that can detect diffuse reflection components. In some cases, a smaller value of the brightness Y in the XYZ color system of JISZ8701 obtained by calculation from the results of the above is better, and the appearance by external light reflection may be evaluated.
In FIG. 3, the thick solid line arrow indicates the incident light 62L from the light source 62, the dotted line arrow indicates the direction of light from each point, and the thin solid line arrow indicates the detection light 63L incident on the detector 63. Show.
Here, the spectral transmittance was measured using OSP-SP2000 (manufactured by OLYMPUS Co., Ltd.) as a microspectrophotometer.
The spectral transmittance of each layer was obtained, and from the obtained results, the value of brightness Y in the XYZ color system of JISZ8701 of the transmitted light was obtained by calculation, and this was evaluated as the degree of attenuation in each layer.
The spectral transmittance of each layer was obtained, and from the obtained results, the value of brightness Y in the XYZ color system of JISZ8701 of the transmitted light was obtained by calculation, and this was evaluated as the degree of attenuation in each layer.

The antireflection layer includes a resin layer containing one or more color materials dispersed therein. In the case of a blue resin layer containing a blue material dispersed therein, the antireflection layer is particularly effective. As preferred.
Moreover, as said black light shielding layer, what disperse | distributes and contains carbon black in resin is mentioned.
The light-shielding layer preferably has a required optical density (usually 4 or more) and has low internal reflection that causes malfunction of the TFT when used in a display device. Are preferably contained in the form of pigments dispersed in the resin as pigments.
The thickness is adjusted to the optical density.
Moreover, as the said reflection suppression layer, what consists of a blue colored resin layer is preferable.

  By adopting such a configuration, the display device of the present invention improves the appearance of reflection due to external light in the frame portion as a non-display region and the display region. Even under light, it is possible to provide a display device having a display portion that can enhance the blackness of the light-shielding frame portion and give a product a high-class feeling.

In this way, the present invention particularly arranges a colored layer of each color for a color filter in a display area on one surface side of a base material made of a transparent substrate, and does not cover the entire periphery of the display area. A non-display area is formed by using a color filter forming substrate provided with a light-shielding black frame portion to form a display area, and arranging the other side, not the one side, on the outside (observer side). In the display device of the mobile electronic device in the form of forming, the appearance of the reflection by the outside light in the frame portion as a non-display area and the display area is improved, and the light is blocked even indoors, outdoors, under sunlight It is possible to provide a color filter-formed substrate that can enhance the quality of the black color of the frame part and give the product a high-class feeling.
At the same time, a display device using such a color filter forming substrate can be provided.

FIG. 1A is a plan view of an example of an embodiment of a color filter forming substrate of the present invention. FIGS. 1B and 1C are respectively A1-A2 and A3 in FIG. 1A. FIG. 1 (d) is an enlarged view of the A5 portion of FIG. 1 (a), and FIG. 1 (e) shows the layer structure of the pixel-partitioning light shielding portion and the frame portion. It is sectional drawing which showed. FIG. 2A is a cross-sectional view schematically showing the relationship between external light and reflected light in the conventional layer structure, and the external light and reflection in the layer structure shown in FIGS. 2B and 1E. It is sectional drawing which showed roughly the relationship with light. It is the schematic which showed the measuring method of the SCI system by a spectrocolorimeter. It is the figure which showed the relationship between the refractive index of each member, and a wavelength. It is the figure which showed the relationship between the relative visibility in a bright place, and a wavelength. It is a top view of a tablet type multifunction terminal. FIG. 7A to FIG. 7F are process cross-sectional views illustrating a method for forming the pixel-partitioning light shielding portion of the color filter forming substrate shown in FIG. FIG. 8A is a cross-sectional configuration diagram illustrating the positional relationship of each part of the display device of a mobile electronic device that is not a touch panel without using a cover glass, and FIG. 8B is a cover glass. 1 is a cross-sectional configuration diagram showing the positional relationship of each part of the display device of a mobile electronic device that is not a touch panel in a simplified manner. FIG. 9A is a cross-sectional configuration diagram showing the display device of a mobile electronic device which is a touch panel without using a cover glass, and the positional relationship between the respective parts in an easy-to-understand manner. FIG. It is the cross-sectional block diagram which simplified and showed easily the positional relationship of each part of the display apparatus of the used mobile electronic device which is a touch panel. 10A is a plan view of a conventional color filter forming substrate, and FIGS. 10B and 10C are directions of arrows in E1-E2 and E3-E4 of FIG. 10A, respectively. FIG. 10D is an enlarged view of the portion E5 in FIG. 10A, and FIG. 10E is an enlarged view of the portion E6 in FIG.

First, an example of an embodiment of a color filter forming substrate of the present invention will be described with reference to FIG.
The color filter forming substrate of this example is a color filter forming substrate used for a display device (liquid crystal display device) of a mobile electronic device such as a mobile type notebook personal computer or a multi-function terminal device (also referred to as a high-function terminal device). As shown in FIG. 1A, a transparent substrate made of a glass substrate is used as a base material 11, and on one surface side of the base material 11, a colored resin layer (13R, 13G, 13B) and a pixel-partitioning light-shielding portion (also referred to as a black matrix) 14, and a light-shielding frame portion 12 is provided as a non-display region outside the display region 13S. FIG. As shown in FIG. 1C, a protective layer (also referred to as an overcoat layer or an OC layer) 15 is formed in a flat shape so as to cover the colored resin layer 13 and the frame portion 12 in the display region 13S. It is.
Then, the other side of the substrate 11 that is not the one side is the outermost side (observer side), and the display device of the mobile electronic device in the form shown in FIG. 8A or the form shown in FIG. Used.
In this example, in particular, as shown in FIG. 1 (e), the pixel-segmenting light-shielding portion 14 and the frame portion 12 are formed in order from the base material 11 side, the reflection suppressing layer 16R made of a resin composition, and the resin composition. A black light-shielding layer 16B made of a multilayer structure, a refractive index n _{s of} the substrate 11, a real part of the complex refractive index of the antireflection layer 16R is n ₁ , and a complex refractive index of the light-shielding layer 16B when the real part and the _{n 2,} in the wavelength region 505nm~605nm where visibility in bright places around the high 555 nm, the absolute value of the difference between the refractive index _{n s} with the refractive index _{n 1} is a refractive index n with small relationship: than the absolute value of the difference between the refractive index n ₂ and _s.
Here, the reflection suppressing layer 16R is an opaque resin layer having light absorptivity in the wavelength region of 505 nm to 605 nm.
Further, as the black light-shielding light-shielding layer 16B, a light-shielding resin layer in which carbon black particles are dispersed as a pigment in the resin component is used, and a required optical density (usually 4 or more) can be ensured. The film thickness is adjusted to the optical density.

In the color filter forming substrate 10 of this example, the refractive index n _s of the base material 11, the real part of the complex refractive index of the antireflection layer 16R is n ₁ , and the real part of the complex refractive index of the light shielding layer 16B is n ₂ The absolute value of the difference between the refractive index n _s and the refractive index n ₁ is the difference between the refractive index n _s and the refractive index n ₂ in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility in a bright place is high. 2B, and the antireflection layer 16R is an opaque resin layer having light absorption in the wavelength region 505 nm to 605 nm. ), When external light L0 is incident, light from the reflected light ref1 reflected at the interface between the base material 11 and the reflection suppression layer 16R is emitted in a wavelength region where human visibility is high. Reflected light Ref1 and base material The reflected light Ref2 from which the light from the reflected light ref2 that passes through the reflection suppressing layer 16R from the first side and is reflected at the interface between the reflection suppressing layer 16R and the light shielding layer 16B is emitted can be suppressed. The influence of the external light of the reflected light Ref1 and the reflected light Ref2 can be made smaller than the influence of the external light of the reflected light Ref0 shown in FIG.
As a result, when used in a display device, the blackness of the light-shielding frame can be further improved indoors, outdoors, indoors, under sunlight, and finished in a high-quality product in terms of design. In particular, it can be used indoors and outdoors like a mobile electronic device, and is effective for a display portion that requires high quality and design.

The frame portion 12 and the pixel-segmentation light-shielding portion 14 of the color filter forming substrate 10 of this example have a layer structure as shown in FIG. 2B (same as FIG. 1E), and a base material. 11 having a refractive index n _s , a real part of the complex refractive index of the antireflection layer 16R being n ₁ , and a real part of the complex refractive index of the light shielding layer 16B being n ₂ , centered on 555 nm where the visibility in a bright place is high The absolute value of the difference between the refractive index n _s and the refractive index n ₁ is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n ₂ in the wavelength region 505 nm to 605 nm, and The reason why the reflection suppression layer 16R is an opaque resin layer having light absorption in the wavelength region 505 nm to 605 nm is that refraction at the boundary between the base material 11 and the reflection suppression layer 16R is particularly in the wavelength region where human visibility is high. The rate difference of the conventional layer structure shown in FIG. The difference in refractive index at the boundary between the base material 11 and the light shielding layer 16B is smaller than the reflected light ref1 at the boundary between the base material 11 and the reflection suppression layer 16R, and the boundary between the reflection suppression layer 16R and the light shielding layer 16B. The reflected light ref <b> 2 at the interface is suppressed to a small amount, so that the reflected light ref <b> 1 at the boundary between the base material 11 and the reflection suppressing layer 16 </ b> R, the reflection suppressing layer 16 </ b> R, and the light shielding layer are suppressed in a wavelength region where human visibility is high. The influence of the appearance of the reflected light ref2 at the boundary with 16B is less than the influence of the appearance of the reflected light ref0 at the boundary between the base material 11 and the light shielding layer 16B of the conventional laminated structure shown in FIG. This is because the influence of reflected light of external light can be reduced in appearance.
That is, in the frame portion 12 and the pixel-segmenting light-shielding portion 13M of the color filter forming substrate 10 of this example, the smaller the refractive index difference at each layer boundary, the smaller the reflection at the boundary and the human visibility. In a bright place, such a layer structure is formed in consideration of the wavelength characteristic as shown in FIG. 5 with a peak at 555 nm.

As can be seen from FIG. 5, in order to reduce the reflected light of the external light felt by the observer, it is necessary to reduce the amount of light in the wavelength region near the 555 nm wavelength where the visibility is high.
From FIG. 5, it is judged that reducing the reflected light of outside light is particularly effective in the wavelength range of 505 nm to 605 nm.
The relative visibility in FIG. 5 is a relative representation of the visibility of other wavelengths, with a visibility of 555 nm as 1.
Further, for example, the refractive index of the substrate 11 and n _s, (also referred to as a colored layer 1 or RED layer) red, green, blue colors colored resin layer of the (simply colored layers also called) made of an opaque resin layer 1, Opaque resin layer 2 (also referred to as colored layer 2 or GREEN layer), opaque resin layer 3 (also referred to as colored layer 3 or BLUE layer), opaque resin layer 4 (also referred to as colored layer 4 or GRAY layer), transparent resin layer When the real number terms (also simply referred to as refractive indexes) of the complex refractive index of the light shielding layer 16B are n _R , n _G , n _B , n _b , n _c , and n ₂ , respectively, the spectrum as shown in FIG. Become a characteristic.
The opaque resin layer 4 is obtained by increasing the proportion of the resin layer in the light shielding layer 16B, and the transparent resin layer including only the resin layer of the light shielding layer 16B is used as the transparent resin layer.
The opaque resin layer 3 (colored layer 3), opaque resin layer 1 (colored layer 1), opaque resin layer 2 (colored layer 2), and opaque resin layer 3 (colored layer 4) of Example or Comparative Example shown in FIG. is a wavelength region 505nm~605nm centered at 555 nm, the absolute value of the difference between the refractive index _{n s} with the refractive index _{n 1} indicates examples and comparative examples, as shown in Table 1, the refractive index _{n s} And a relationship smaller than the absolute value of the difference between the refractive index n ₂ and the refractive index n ₂ .
Accordingly, it is determined that the colored resin layers of G, B, and R are applicable as the reflection suppressing layer 16R.

On the other hand, from the absorptive surface of the antireflection layer, it is preferable that the brightness Y in the XYZ color system of JIS Z8701 calculated from the spectral transmittance of the antireflection layer is JIS Z8701. Thus, the opaque resin layer 3 (colored layer 3), opaque resin layer 1 (colored layer 1), opaque resin layer 2 (colored layer 2), and opaque resin layer 3 (colored layer 4) in Examples or Comparative Examples are as follows. All have sufficient light absorption in the wavelength region 505 nm to 605 nm centered at 555 nm.
As shown in Table 2, a colored resin layer of B color (blue) is particularly preferable because the brightness Y in the XYZ color system of JIS Z8701 calculated from the spectral transmittance in consideration of the visual sensitivity is low.
In Table 2, the colored resin layers of R, G, and B are referred to as a colored layer 1 (RED layer), a colored layer 2 (GREEN layer), and a colored layer 3 (BLUE layer), respectively.

In addition, here, when used in a display device, an area that becomes a display area is a display area 13S, which means an area inside the frame portion 12 in FIG.
Further, a region of the frame portion 12 that does not become a display region is set as a non-display region.
The colored portion 13 is a generic term for the red, green, and blue colored layers 13R, 13G, and 13B for the color filter and the pixel-segmenting light-shielding portion 14.
Further, in the display area, as shown in FIG. 1D, colored layers (also referred to as colored resin layers) 13R, 13G, and 13B for color filters are shaded for pixel division. It is formed in a predetermined arrangement so as to be separated by the portion 14.
The opening pattern shape of the pixel-partitioning light-shielding portion 14 and the arrangement of the colored layers of each color are not limited to the form shown in FIG.
There are also examples in which the shape of the opening pattern of the pixel-partitioning light-shielding portion 14 is a stripe shape, a shape in which the shape of the colored layer is changed, such as a square shape or a delta arrangement.

Next, the material of each part will be described.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
The alkali-free type glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and does not contain an alkali component in the glass. Therefore, it is suitably used for a color filter for an active matrix type color liquid crystal display device. Because it can.
As the substrate, a transparent transparent substrate is usually used.

<Pixel-partitioning shading part 14 and frame part 12>
(Light shielding layer 16B)
As the light shielding layer 16B made of a light shielding resin layer, for example, here, carbon black coated with a resin such as an epoxy resin is used as a pigment (pigment) dispersed in a binder resin.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the film thickness is set such that an optical density (usually 4.0 or more) can be secured.
Here, the formation of the light shielding layer 16B made of a light shielding resin layer in the pixel sorting light shielding portion 14 and the frame portion 12 is performed by a photolithography method. In this case, as the binder resin, for example, acrylate-based, methacrylate A photosensitive resin having a reactive vinyl group such as a poly (vinyl cinnamate) system or a cyclized rubber system is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a black matrix containing a black colorant and a photosensitive resin, and further, if necessary, a sensitizer, a coatability improver, A development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added.
In addition, in some cases, both the light shielding layer 14 for pixel division and the light shielding layer made of a light shielding resin layer of the frame portion 12 may be formed by using a printing method or an ink jet method. As the binder resin, for example, polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin , Epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.
(Antireflection layer 16R)
As the reflection suppression layer 16R, for example, a material in which a color material of each color is dispersed in a binder resin is used, but the refractive index ns of the base material 11 and the real part of the complex refractive index of the reflection suppression layer 16R are used. n1, where n2 is the real part of the complex refractive index of the light shielding layer 16B, the absolute difference between the refractive index ns and the refractive index n1 in the wavelength region 505 nm to 605 nm centered at 555 nm where the visibility in a bright place is high If the value is smaller than the absolute value of the difference between the refractive index ns and the refractive index n2, and the reflection suppressing layer is an opaque resin layer having light absorption in the wavelength region 505 nm to 605 nm Although not particularly limited, here, as the antireflection layer 16R, a blue colored resin layer 13B for a color filter is used.
The blue colored resin layer 13B will be described in the following description for each color colored resin layer for forming a color filter.

<Colored Layers 13R, 13G, 13B for Color Filter Formation>
In this example, the colored resin layers for forming color filters (referred to as simply colored layers) have three colors: a red colored layer 13R, a green colored layer 13G, and a blue colored layer 13B.
The colored resin layer of each color is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color in a binder resin, and is formed by a photolithography method (also referred to as a photolithography method).
As the binder resin used for the colored resin layer, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further, a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The film thickness of the colored resin layer of each color is usually set to about 1 μm to 5 μm.
Here, the color of the colored resin layer is three colors of red, green, and blue, but is not particularly limited as long as it includes at least three colors of red, green, and blue. Three colors of green and blue, or four colors of red, green, blue, yellow, red, green, blue, and white, or five colors of red, green, blue, yellow, and cyan may be used.
Examples of the colorant used in the red (also referred to as R) colored resin layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, isoindoline pigments, and the like. Is mentioned.
These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green (also referred to as G) colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, and isoindoline pigments. Examples thereof include pigments and isoindolinone pigments.
These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue (also referred to as B) colored resin layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. It is done.
These pigments may be used alone or in combination of two or more.

<Protective layer 15>
Examples of the material for the protective layer 15 include a thermosetting resin composition and a photocurable resin composition.
The photo-curable resin composition is preferable for cutting into pieces after imposing the color filter-formed substrate on the surface.
The photocurable resin composition for the protective layer 15 is the same as the binder resin used for the colored layers for forming the color filter, for example, acrylate-based, methacrylate-based, polyvinyl cinnamate-based, or ring A photosensitive resin having a reactive vinyl group such as a synthetic rubber is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
In the first example, the color filter forming substrate is impositioned and the red, green, and blue colored resin layers 13R, 13G, and 13B, the pixel-partitioning light-shielding portion 14, and the frame portion 12 are formed. The resin composition is applied by a spin coating method, but a protective layer cut is provided between each color filter substrate, and the resin composition for the protective layer is separated into pieces by separating the cuts. As a photocurable resin composition, it is dried after application, selectively irradiated with light only in a predetermined region, and developed, but the method for forming the protective layer is not limited thereto.
Examples of the thermosetting resin composition for the protective layer include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

A general example of a method for manufacturing the color filter forming substrate shown in FIG. 1 will be briefly described with reference to FIG.
In the case of the color filter forming substrate shown in FIG. 1, the reflection suppressing layer 16R is a blue colored layer (colored resin layer) 13B for a color filter. First, the reflection suppressing layer 16R is a blue colored layer for a color filter. An example in the case where they are not formed together in the same process will be described.
First, a resin composition 16Ra for forming a reflection suppressing layer, which is a negative photosensitive resin, is coated on one surface of the substrate 11 (FIG. 7A), and selected using a predetermined photomask 17. Exposure is performed, and further, development processing, heat drying processing, and the like are performed (FIG. 7B), and the reflection suppressing layer 16R of the pixel-partitioning light-shielding portion is formed in a predetermined shape. (Fig. 7 (c))
Next, a resin composition 16Ba for forming the light shielding part of the pixel-partitioning light shielding part, which is a negative photosensitive resin, is coated on the entire surface so as to cover the reflection suppressing layer 16R (FIG. 7D). Selective exposure is performed using the photomask 17A (FIG. 7E), and further development processing and heat drying processing are performed to form the light shielding layer 16B of the pixel-partitioning light shielding portion 14 in a shape covering the reflection suppressing layer 16R. To do. (Fig. 7 (f))
In this way, the pixel-partitioning light-shielding portion 12 including the reflection suppressing layer 16R and the light-shielding layer 16B is formed by photolithography.
Next, red, green, and blue colored layers 13R, 13G, and 13B for forming a color filter are formed by a photolithography method using a photosensitive curable resin composition, respectively. (Not shown)
The formation of each part in the display area 13S is as described above. However, the formation of the frame part 12 in the non-display area is the same as the formation of the pixel-partitioning light-shielding part 14, and here, the pixel-partitioning light-shielding part 14 In the step of forming, the frame portion 12 is formed together.

  As another method for producing the color filter forming substrate shown in FIG. 1, the reflection suppressing layer 16R is the same as the blue colored layer 13B for the color filter, and therefore the pixel section light shielding portion 12 shown in FIG. 7 is formed. , The blue colored resin layer 13B for the color filter and the reflection suppressing layer 16R are formed together in the same photolithography process, and the light shielding layer 16B is formed by the same photolithography method as shown in FIG. After forming the pixel-partitioning light-shielding portion 12 including the reflection suppressing layer 16R and the light-shielding layer 16B, each of the red and green colored layers 13R and 13G for forming a color filter is formed with a photosensitive curable resin. The method of forming by a photolithography method using a composition is also mentioned.

The color filter forming substrate of the present invention is not limited to this example shown in FIG.
For example, instead of the blue colored layer (colored layer 3, opaque resin layer 3) 13B as the reflection suppressing layer in the example shown in FIG. 1, a green colored layer (colored layer 2, opaque resin layer 2) 13G, red The form using the colored layer (colored layer 1, opaque resin layer 1) and the opaque resin layer 4 which increased the ratio of the resin layer with the light shielding layer 16B is also mentioned.

[Example]
The present invention will be further described with reference to examples.
Example 1
Example 1 produced the color filter formation board | substrate of the example shown in FIG. 1, and prepared and produced the photocurable curable resin composition A as follows, and produced the sclerosis | hardenability produced. Using resin composition A, a red curable resin composition for forming a color filter, a green curable resin composition, a blue curable resin composition, a light shielding resin light shielding film for a pixel division light shielding portion and a frame portion A curable resin composition for a color filter was prepared, and using these, each curable resin composition was subjected to a photolithography method to form each colored resin layer for a color filter, a light-blocking portion for a pixel section, and a frame portion is.
Here, after forming the pixel-segmenting light-shielding portion 14 and the frame portion 12, the red colored resin layer 13R, the green colored resin layer 13G, and the blue colored resin layer 13B for the color filter in the display region 13S are respectively formed. It was formed by a photolithography process.
The width of the light shielding layer 16B of the pixel sorting light shielding portion 14 in the display region 13S was 7.0 μm, and the aperture ratio was 60%.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of the pixel-partitioning light-shielding portion 14 and the frame portion 12)
First, the colored layer 3 (BLUE layer) which is a blue colored layer as the reflection suppressing layer 16 </ b> R was formed on one surface of the glass substrate (Asahi Glass Co., Ltd., AN material) as the base material 11.
The blue colored layer is formed by using a blue curable resin composition having the following composition by a photolithography method shown in FIGS. 7A to 7C so that the formed film thickness becomes 2.0 μm. A blue relief pattern was formed in the pixel-partitioning light-shielding part forming region.
A blue curable resin composition 16Ba is applied onto one surface of the substrate 11 with a spin coater and dried at 100 ° C. for 3 minutes, and then a photomask is disposed at a distance of 100 μm from the formed film, and a proximity aligner. Then, the light-shielding pattern was exposed with a 2.0 kW ultra-high pressure mercury lamp (see FIG. 7B), developed with 0.05 wt% potassium hydroxide aqueous solution, and then the substrate was placed in an atmosphere at 230 ° C. for 30 minutes. Heat treatment was performed by leaving it to stand to form the antireflection layer 16R.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 4 parts by weight C.I. I. Pigment Violet 23: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

Next, using the black light-shielding photocurable resin composition for forming the light-shielding layer 16B, which was prepared as described below, it was applied to the entire surface so as to cover the formed blue relief pattern. A blue relief pattern was formed in the pixel-partitioning light-shielding part formation region by the photolithography method shown in FIGS. 7D to 7F so that the formed film thickness was 1.5 μm.
<Preparation of black light-blocking photocurable resin composition for forming light-blocking layer 16B>
First, components of the following amount were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion B.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding composition for forming a resin light-shielding film.
-Black pigment dispersion B: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight On the antireflection layer 16R formed on one surface of the substrate 11, the light-shielding resin A composition 16Ba for forming a light shielding film was applied by a spin coater and dried at 100 ° C. for 3 minutes to form a light shielding colored resin layer.
A photomask is placed on the light-shielding colored resin layer at a distance of 100 μm from the coating film and exposed to a light-shielding pattern with a 2.0 kW ultra-high pressure mercury lamp by a proximity aligner, and then a 0.05 wt% potassium hydroxide aqueous solution Then, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment, and the pixel-partitioning light-shielding portion 14 and the light-shielding layer 16B in the frame portion were formed in a predetermined shape.
As a result, the pixel classification light-shielding portion 14 and the frame portion 12 were formed.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

Next, a colored resin layer for each color filter was formed as follows.
(1) Formation of red colored resin layer 13R A red curable resin composition having the following composition was applied onto a black matrix by a spin coating method, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment, thereby forming a red pixel pattern in the display region 13S.
The formed film thickness was 2.0 μm.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 3 parts by weight C.I. I. Pigment Red 254: 4 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 23 parts by weight-3-methoxybutyl acetate: 67 parts by weight (2) Green colored resin layer 13G Next, using the green curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A relief pattern composed of a green colored layer was formed in the display area of the pixels.
<Composition of green curable resin composition>
C. I. Pigment Green 58: 7 parts by weight C.I. I. Pigment Yellow 138: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 22 parts by weight-3-methoxybutyl acetate: 67 parts by weight (3) Blue colored resin layer 13B Further, using a blue curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A blue relief pattern was formed in the area.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 4 parts by weight C.I. I. Pigment Violet 23: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of protective film 15)
On the substrate on which the colored resin layer 13 was formed as described above, the aforementioned curable resin composition A was applied by a spin coating method and dried to form a coating film having a dry coating film thickness of 2.0 μm.
A photomask is placed at a distance of 100 μm from the coating film of the curable resin composition A, and an ultraviolet ray is applied only to the region corresponding to the protective layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner for 10 seconds. Irradiated.
Next, it was immersed in a 0.05 wt% aqueous potassium hydroxide solution (liquid 23 ° C.) for 1 minute and alkali developed to remove only the uncured portion of the coating film of the curable resin composition.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment to form a protective film.
Thus, the color filter forming substrate 10 of the example shown in FIG. 1 was produced.

Next, a spacer having a predetermined height was disposed on the protective layer 15 of the color filter forming substrate 10 of the example shown in FIG. 1 produced as follows, and a liquid crystal display device was produced.
(Spacer formation)
On the protective layer 15 of the color filter forming substrate 10 on which the colored layer and the protective layer were formed as described above, the curable resin composition A was applied by a spin coating method and dried to form a coating film.
A photomask was placed at a distance of 100 μm from the coating film of the curable resin composition A, and only a spacer formation region was irradiated with ultraviolet rays for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of the curable resin composition A was removed.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 30 minutes to perform a heat treatment to form a predetermined number density.
(Production of liquid crystal display device)
An alignment film (SE-6210, manufactured by Nissan Chemical Industries, Ltd.) was formed on the surface of the color filter forming substrate obtained as described above on the colored layer forming side.
Next, a necessary amount of IPS liquid crystal is dropped on the glass substrate (TFT substrate) on which the TFT is formed, the color filters are overlaid, and a UV curable resin (Three Bond Co., Ltd., Three Bond 3025) is used as a sealing material. A cell was assembled by exposing at a dose of 400 mJ / cm ² while applying a pressure of ³ kgf / cm ² to form a cell, and a polarizing plate, a backlight unit, and a cover were installed to obtain a liquid crystal display device.

(Example 2)
In Example 2, instead of the colored layer 3 which is a blue colored layer as the reflection suppressing layer 16R in Example 1, a colored layer 2 (GREEN layer) which is a green colored layer is used, and the example shown in FIG. A color filter forming substrate 10 was produced, and a liquid crystal display device was produced in the same manner as in Example 1.
The colored layer 2 which is a green colored layer as the reflection suppressing layer 16R is the same as the green colored resin layer for forming a color filter.

(Example 3)
In Example 3, instead of the colored layer 3 which is a blue colored layer as the reflection suppressing layer 16R in Example 1, a colored layer 1 (RED layer) which is a red colored layer is used, and the example shown in FIG. A color filter forming substrate 10 was produced, and a liquid crystal display device was produced in the same manner as in Example 1.
The colored layer 1 which is a red colored layer as the reflection suppressing layer 16R is the same as the red colored resin layer for forming a color filter.

Example 4
In Example 4, in place of the colored layer 3 that is the blue colored layer as the reflection suppressing layer 16R in Example 1, the colored layer 4 (GRAY layer, The color filter forming substrate 10 of the example shown in FIG. 1 was produced, and a liquid crystal display device was produced in the same manner as in Example 1.
The composition for forming the opaque resin layer as the antireflection layer 16R was sufficiently mixed with the following components to obtain a composition for forming the opaque resin layer.
-Black pigment dispersion B: 14 parts by weight-Curable resin composition A: 48 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight The others are the same as in Example 1.

(Comparative Example 1)
Comparative Example 1 is the same as Example 1 except for the conventional structure having no antireflection layer 16R in Example 1.
A liquid crystal display device was produced in the same manner as in Example 1.

(Comparative Example 2)
Comparative Example 2 is a transparent resin layer having a composition in which the amount of the coloring material of the light shielding layer is zero, instead of the colored layer 3 which is the blue colored layer as the reflection suppressing layer 16R in Example 1, The color filter forming substrate 10 of the example shown in 1 was produced, and a liquid crystal display device was produced in the same manner as in Example 1.
The composition for forming a transparent resin layer as the antireflection layer 16R was sufficiently mixed with the following components to obtain a composition for forming a transparent resin layer.
-Curable resin composition A: 62 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight The others are the same as in Example 1.

In the color filter forming substrate produced as in Examples 1 to 4 and Comparative Example 2, the colored layer 1 (RED layer), which is a blue, green, and red colored layer, used as a reflection suppressing layer, The complex refractive index was measured for the colored layer 2 (GREEN layer), the colored layer 3 (BLUE layer), the colored layer 4 (GRAY layer), the transparent resin layer, and the light shielding layer 16B, and the real number term was obtained as the refractive index. However, it became like FIG.
Here, a layer for measuring a refractive index is formed on a glass substrate, and the complex refractive index of each layer is determined by measuring using an optical film thickness measuring system DF-1042RT manufactured by Techno Synergy. Looking for.
For the refractive index of the glass substrate (manufactured by Asahi Glass Co., Ltd., AN material) as the base material 11, known materials are referred to.
In Figure 4, the refractive index of the substrate 11 and _{n s,} The red, green, and blue colored layers colored layer 1 (RED layer), a colored layer 2 (GREEN layer), a colored layer 3 (BLUE layer) , The real number terms (also simply referred to as the refractive index) of the complex refractive index of the colored layer 4 (GRAY layer), the transparent resin layer, and the light shielding layer 16B described above, respectively, are n _R , n _G , n _B , n _b , n _c, it is set to _{n 2.}

Colored layer 1 (RED layer), colored layer 2 (GREEN layer), colored layer 3 (BLUE layer), and the above-described colored layer 4 (GRAY) whose refractive indexes are shown in FIG. 4 are red, green and blue colored layers. Layer) and the transparent resin layer, as can be seen from Table 1, the absolute value of the difference in refractive index between the substrate and the light shielding film is smaller than the absolute value of the difference in refractive index between the substrate and the light-shielding film at 555 nm. .

表２において、分光透過率から計算された、ＪＩＳ Ｚ８７０１のＸＹＺ表色系における明るさＹが低い層ほど、層中での減衰は大きい。 Moreover, in the color filter formation board | substrate produced like the said Example 1- Example 4, the comparative example 1, and the comparative example 2, the colored layer which is a blue, green, red colored layer used as a reflection suppression layer For 1 (RED layer), colored layer 2 (GREEN layer), colored layer 3 (BLUE layer), colored layer 4 (GRAY layer), and transparent resin layer, spectral transmittance was measured and calculated from the obtained data. Then, the chromaticity (x, y) and brightness Y in the XYZ color system of JIS Z8701 in the D65 light source were obtained.
In Table 2, the colored resin layers of R, G, and B are referred to as a colored layer 1 (RED layer), a colored layer 2 (GREEN layer), and a colored layer 3 (BLUE layer), respectively.
As a spectrophotometer, a microspectrophotometer OSP-2000 manufactured by OLYMPUS Co., Ltd. was used.

In Table 2, the lower the brightness Y in the XYZ color system of JIS Z8701 calculated from the spectral transmittance, the greater the attenuation in the layer.

尚、分光測色計としては、コニカミノルタ（株）製のＣＭ−２５００ｄを用いた。
＜測定条件：分光測色計＞
測定器 ： コニカミノルタ( 株) 製、分光測色計「ＣＭ−２５００ｄ」
照明の受光条件 ： ｄ／８°( ＪＩＳ Ｚ８７２２条件ｃ)
第１の照射領域 ： 測定径＝直径１１ｍｍの円形
第２の照射領域 ： 第１の照射領域と同じ測定径＝直径１１ｍｍの円形
測定領域 ： 照射領域中の８ｍｍの円形（重心位置は照射領域、直径１１ｍｍの円形と同じ）
また、額縁部の黒色の締りについて視認性の評価は、遮光部を形成した側とは反対側ガラス基板面側から、ＧＥＮＴＯＳ ＳｕｐｅｒＦｉｒｅ Ｘ（（株）サンジェルマン製）を光源として照射して、その反射光を、目視し、目視による視認性で額縁部の黒色の締りを判断したもので、良いとされるものを○印で、良くないとされるものを×印で、一番良いものを◎印で示している。
光源は上記のものに限定されるものではなく、太陽光下と同じ結果が得られるものであればよい。 On the other hand, samples S1 to S6 having the same layer structure as the pixel structure light shielding portion 14 and the frame portion 12 of each color filter forming substrate of Examples 1 to 4, Comparative Example 1, and Comparative Example 2 are prepared. Then, the spectral reflectance of these samples is measured by SCI measurement using the spectrocolorimeter shown in FIG. 3, and the XYZ color system of JIS Z8701 in the D65 light source is calculated from the obtained measurement results. In Table 3, the chromaticity (x, y) and brightness Y of the frame portion were obtained.
Furthermore, with respect to the color filter-formed substrate produced as in Examples 1 to 4, Comparative Example 1 and Comparative Example 2 having a layer structure corresponding to each of the above samples, the black color of the frame portion is tightened. Table 3 also shows the result of the visibility determination.

Note that CM-2500d manufactured by Konica Minolta Co., Ltd. was used as the spectrocolorimeter.
<Measurement conditions: spectrocolorimeter>
Measuring instrument: Konica Minolta Co., Ltd., spectral colorimeter "CM-2500d"
Light reception condition: d / 8 ° (JIS Z8722 condition c)
First irradiation area: circular with measurement diameter = 11 mm diameter Second irradiation area: same measurement diameter as first irradiation area = circular with diameter 11 mm Measurement area: circular with 8 mm in the irradiation area (the center of gravity is the irradiation area, (Same as a circle with a diameter of 11 mm)
In addition, the visibility of the black tightening of the frame portion is evaluated by irradiating GENTOS SuperFire X (manufactured by Saint-Germain Co., Ltd.) as a light source from the side of the glass substrate surface opposite to the side where the light shielding portion is formed. The light is visually checked and the blackness of the frame portion is judged by visual visibility. The one that is considered good is marked with a circle, the one that is not good is marked with a x, and the best one is marked with ◎. This is indicated by a mark.
The light source is not limited to the above, and any light source can be used as long as the same result as that obtained under sunlight is obtained.

The brightness Y (D65 light source) in the XYZ color system obtained from the spectral characteristics of the reflected light obtained by measuring with the SCI method shown in Table 3 is 5.0 or less. It is judged that the tightening is good.
In particular, it can be seen that Example 1 in which a BLUE (blue) layer having a low Y value (D65 light source) is used as the reflection suppression layer is most preferable.
Next, Example 2 using a colored layer 2 that is a green colored layer as a reflection suppressing layer, Example 3 using a colored layer 1 that is a red colored layer as a reflection suppressing layer, and a colored layer (GRAY as a reflection suppressing layer) Example 4 using the layer) is preferable.
In addition, in Comparative Example 1 (conventional product) in which no reflection suppression layer is arranged, and in Comparative Example 2 in which the above-described transparent resin layer is used as the reflection suppression layer, the Y value obtained from the spectral reflectance measurement data ( D65 light source) was large, and black tightening was not good in visual judgment.

When the results in Table 3 above are correlated with the refractive index shown in FIG. 4 and the Y value (D65 light source) calculated from the spectral transmittance shown in Table 2, it is possible to improve black tightening by visual judgment. When the refractive index n _{s of} the base material, the real part of the complex refractive index of the antireflection layer is n ₁ , and the real part of the complex refractive index of the light shielding layer is n ₂ , the visibility in a bright place is high. In the wavelength region 505 nm to 605 nm centered at 555 nm, the absolute value of the difference between the refractive index n _s and the refractive index n ₁ is smaller than the absolute value of the difference between the refractive index n _s and the refractive index n _2. Further, it is understood that the reflection suppression layer is more preferable as the reflection suppression layer having a lower brightness Y of the D65 light source obtained from the spectral transmittance characteristics in the wavelength region 505 nm to 605 nm.
Usually, the brightness Y of the D65 light source obtained from the spectral transmittance characteristics is preferably 80 or less.

10 Color filter forming substrate 11 Base material (transparent substrate)
12 Frame portion 13 Colored portion 13R Red colored layer (also referred to as red colored resin layer)
13G green colored layer (also called green colored resin layer)
13B Blue colored layer (also called blue colored resin layer)
14 Shading part for pixel classification (also called black matrix)
13S display area 13A (for measurement) film part 15 protective tank (also referred to as overcoat layer or OC layer)
16B Light shielding layer 16R Antireflection layer 20 Refractive index adjusting oil 30 Black plate 61 Integrating sphere 62 Light source 62L Incident light 63 Detector 63L Detection light 64 Trap θ Angle ns Refractive index of substrate nR Complex refractive index of red colored layer Real term (also referred to simply as refractive index)
nG Real term of complex refractive index of green colored layer (also simply referred to as refractive index)
nB Real number term of complex refractive index of blue colored layer (also simply referred to as refractive index)
n2 Real term of complex refractive index of light shielding layer (also simply referred to as refractive index)
nb Real number term of complex refractive index of opaque resin layer (also simply referred to as refractive index)
nc Real term of complex refractive index of transparent resin layer (also simply referred to as refractive index)
110 Color filter forming substrate 110a (Frame portion of the color filter forming substrate)
111 Base material (transparent substrate)
112 Frame portion 113 Colored layer 113R Red colored layer (also referred to as colored resin layer)
113G green colored layer (also called colored resin layer)
113B Blue colored layer (also called colored resin layer)
113S Display region 113M Pixel segmenting light shielding portion (also referred to as black matrix)
114 Protection tank (also called overcoat layer or OC layer)
130 cover glass 130a (cover glass) frame part 140 touch panel 150 TFT substrate

Claims (5)

On one side of the substrate made of a transparent substrate, a colored resin layer for each color filter is arranged in a region divided by the pixel-partitioning light-shielding portion to form a display region, outside the display region, A color filter forming substrate having a light-shielding frame portion as a non-display area, and a color filter forming substrate used in a display device with the other side, not the one side, of the substrate as the outside (observer side) In the frame portion or the frame portion and the pixel-division light-shielding portion, the light-shielding layer made of the resin composition and the black light-shielding material made of the resin composition are sequentially arranged from one side of the base material. The refractive index n _{s of} the base material, the real part of the complex refractive index of the reflection suppressing layer is n ₁ , and the real part of the complex refractive index of the light shielding layer is n ₂ . The visibility is high in a bright place 555 Yes in the wavelength region 505nm~605nm centered at m, the absolute value of the difference between the refractive index _{n 1} and the refractive index _{n s} is small the relationship than the absolute value of the difference between the refractive index _{n 2} and the refractive index _{n s} And the said reflection suppression layer is an opaque resin layer which has a light absorptivity in the said wavelength range 505nm-605nm, The color filter formation board | substrate characterized by the above-mentioned.   2. The color filter forming substrate according to claim 1, wherein the reflection suppressing layer is a resin layer containing one or more color materials dispersed therein. 3.   3. The color filter forming substrate according to claim 2, wherein the reflection suppressing layer is a blue resin layer containing a blue material dispersed therein.   4. The color filter forming substrate according to claim 1, wherein the black light shielding layer contains carbon black dispersed in a resin. substrate.   A display device, wherein a display portion is formed using the color filter forming substrate according to claim 1.

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