JP2014157911A - Rotary coating apparatus and cleaning method of the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a rotary coating apparatus which prevents dryness and solidification of a coating liquid adhering to an inner wall of a spin cup, properly supplies a cleaning fluid to an inner wall surface of the spin cup, and enables necessary and sufficient cleaning operation of the inner wall of the spin cup with a small amount of the cleaning fluid.SOLUTION: A rotary coating apparatus includes: rotary parts which rotate a substrate; a nozzle which supplies a coating liquid to the substrate; a spin cup which covers the rotary parts; and a spin cup cleaning mechanism which flows a cleaning fluid from a cleaning fluid supply passage arranged at an upper part of an inner wall surface of the spin cup along the inner wall surface of the spin cup to clean the inner wall surface. The spin cup cleaning mechanism is formed by providing an upper opening of a cleaning fluid discharge groove which continuously opens in the upper part of the inner wall surface of the spin cup. The upper opening is formed with a slit formed on a front surface, and the cleaning fluid flows along the inner wall surface of the spin cup after flowing through a slit portion to clean the inner wall surface.

Description

  The present invention relates to a spin coater, a cleaning method for the spin coater, a substrate, an element and an apparatus manufactured by the spin coater, and a spin cup cleaning mechanism of the spin coater.

  The present invention relates to a spin coater and a cleaning method for the spin coater. More specifically, for example, a functional thin film is formed on a substrate by spin coating a photoresist or a developer on a substrate to be processed (hereinafter, also simply referred to as a substrate) such as a semiconductor wafer, or by a chemical solution method. The present invention relates to a spin coater for spin coating a coating solution. More particularly, the present invention relates to, for example, a cleaning method for a spin coating apparatus that cleans the inner surface of a spin cup contaminated with a coating solution scattered from a substrate and a dried solidified product of the coating solution during a spin coating process.

Here, the method of forming a uniform thin film by dropping the coating solution onto the substrate, rotating the substrate at a high speed, spreading the coating solution to the outer periphery of the substrate by the centrifugal force, and then shaking off the excess coating solution. It is well known as a spin coating method. Examples of the coating solution include a photoresist, a developer, or a precursor solution that becomes a functional thin film by a chemical solution method.
An apparatus for forming a thin film by spin coating is a spin coater or spin coater generally called a spinner or spin coater. A substrate is placed horizontally on a spin table provided with a chuck mechanism at the upper end of a rotary shaft arranged in a vertical direction. A uniform thin film is formed by holding and rotating the film.
Further, the spin coater is generally provided with a cylindrical spin cup so as to surround the periphery of the substrate, and the spin coating removes excess coating liquid splashed off from the periphery of the substrate by being shaken off during the spin coating process. By adhering to the inner wall of the cup, contamination around the device is prevented.

  However, in the conventional spin coating method, after the excess coating solution is shaken off, there is a problem that the shaken coating solution adheres to the inner wall of the cup and is dried and solidified. Then, when crystal pieces or powders are dried and solidified from the coating liquid, they are easily peeled off from the inner wall due to the influence of vibration or the like, and in some cases, the crystal pieces or powders are reattached to the substrate and become defective. Therefore, it is necessary to frequently clean the inner wall of the cup in order to prevent deposition of crystal pieces or powder that is dried and solidified from the coating solution. Although it is preferable in terms of efficiency that the cleaning operation is performed before the coating solution is dried, particularly in the case of a coating solution that is quickly dried, cleaning before drying is difficult.

  Therefore, in Patent Documents 1 to 6, an annular inner peripheral surface cleaning pipe is provided in the upper part of the inner wall for the purpose of cleaning the inner wall of the cup, and a number of cleaning liquid discharge holes are opened toward the inner surface of the inner wall upper part. A configuration is disclosed in which a cleaning liquid is caused to flow from the opening along the inner wall. In addition, an annular inclined plate cleaning pipe is also provided on the rectifying inclined plate located below the substrate in the cup, and a large number of cleaning liquid discharge holes are opened toward the upper side of the rectifying inclined surface in the inclined surface cleaning pipe. Is also disclosed.

  However, in the configuration in which the cleaning liquid flows from the discontinuous small holes provided in a large number of cleaning pipes, the cleaning liquid tends to pass through the path once passed, and the cleaning liquid tends to flow in a streak pattern downward from each discharge hole. Therefore, it is difficult to clean the entire inner wall. For this reason, when the entire inner wall is forced to be cleaned with the structure of the cleaning mechanism as described above, it is necessary to increase the pressure at which the cleaning liquid is discharged and to flow a large amount of cleaning liquid to the inner wall surface. There is a problem of consuming.

  Further, Patent Document 7 discloses a configuration in which the inner wall surface is cleaned by discharging the cleaning liquid from the cleaning liquid discharge nozzle directed toward the inner wall surface and receiving the discharged cleaning liquid on the inner wall surface while the spin cup rotates. Yes.

However, in the configuration in which the cleaning liquid is sprayed on the inner wall surface as described above, when the cleaning liquid is sprayed on the innermost peripheral portion of the spin cup, the sprayed cleaning liquid rebounds on the spin table, causing a substrate chuck failure. In the configuration as described above, the cleaning liquid adhering to the inner wall surface of the innermost part of the spin cup will drip onto the substrate and cause product defects. The washing operation cannot be performed.
As a result, the coating liquid adheres to the innermost peripheral portion of the spin cup closest to the substrate, and the crystal pieces or powder that has been dried and solidified accumulates, and drops on the substrate to cause defects. In addition, this method has a problem that the amount of the cleaning liquid to be used or the cleaning waste liquid discharged at the same time increases.

  Further, in Patent Documents 8 to 14, a cleaning liquid is supplied to a rotating unit that rotates the substrate at a high speed, a rotary cleaning device that can be attached to and detached from the rotating unit, a dummy substrate, or a substrate on which film formation is performed, and this occurs when the substrate is rotated at a high speed. A configuration is disclosed in which a cleaning liquid is discharged onto the inner wall surface of a spin cup by using centrifugal force to clean the inner wall surface.

  However, since the cleaning liquid that flies around by centrifugal force is in the form of small droplets or mist, the cleaning ability when it adheres to the inner wall surface is small. Therefore, if you try to supply a large amount of cleaning liquid to increase the cleaning capacity, because of the increased weight, most of the cleaning liquid falls before it reaches the inner wall surface, which only increases wasteful consumption of the cleaning liquid. Become.

  The present invention has been made in view of the above-described problems in the prior art. In order to prevent drying and solidification of the coating liquid adhering to the inner wall of the spin cup, and to prevent deposition of dry crystal fragments or powder of the coating liquid, It is an object of the present invention to provide a spin coater that can appropriately supply a cleaning liquid to the inner wall surface of a cup and perform a necessary and sufficient cleaning operation of the inner wall of the spin cup by using less cleaning liquid.

  In order to solve the above problems, a spin coating apparatus according to the present invention includes a rotating unit that fixes and rotates a substrate, a nozzle that supplies a coating liquid to the substrate, a spin cup that covers the rotating unit, and a spin cup A spin-coating device having a spin cup cleaning mechanism that cleans the inner wall surface by flowing a cleaning liquid along the inner wall surface of the spin cup from a cleaning liquid supply path circulated around an upper portion of the inner wall surface, wherein the spin cup cleaning mechanism is And an upper opening of a cleaning liquid discharge groove that is continuously open at an upper portion of the inner wall surface of the spin cup and that communicates with the cleaning liquid supply path, and the upper opening portion extends along the inner wall surface of the spin cup. Is covered with a clearance of a certain width, so that a slit is formed on the front surface of the upper opening, and the cleaning liquid leaks from the cleaning liquid discharge groove and the spin Tsu when flowing along flop top, after the cleaning liquid flows through the said slit portion, characterized by washing the spin cup wall flows in along the wall spin cup.

  According to the present invention, the coating liquid adhering to the inner wall of the spin cup is prevented from being dried and solidified, the cleaning liquid is appropriately supplied to the inner surface of the spin cup, and the necessary and sufficient cleaning operation of the inner wall of the spin cup is performed with less cleaning liquid. A spin coater that can be used in use can be provided.

It is sectional drawing which shows the structure in one Embodiment of the spin coater which concerns on this invention. (A) It is uppermost expanded sectional drawing of the spin cup side cylinder part 5a of FIG. (B) It is the uppermost expanded sectional view of the spin cup lower surface plate inclined surface 6a of FIG. (A) It is the schematic explaining the prior art example which discharges a washing | cleaning liquid from the small hole 9 provided many in the side of the washing | cleaning-liquid supply path. (B) It is the schematic explaining the prior art which discharges a cleaning liquid from the cleaning liquid discharge groove | channel 10 which has a width | variety comparable as the cleaning liquid supply path 7 provided in the circumferential direction continuously above the cleaning liquid supply path 7. FIG.

The spin coating apparatus according to the present invention includes rotating units 2 and 3 that fix and rotate the substrate S, a nozzle that supplies a coating solution to the substrate S, a spin cup 5 that covers the rotating units 2 and 3, A spin-coating device having a spin cup cleaning mechanism that cleans the inner wall surface by flowing a cleaning liquid along the inner wall surface of the spin cup 5 from a cleaning liquid supply path 7 circulated around an upper portion of the inner wall surface. Is provided with an upper opening portion of a cleaning liquid discharge groove 10 that communicates with the cleaning liquid supply passage 7 and continuously opens at the upper part of the inner wall surface of the spin cup 5. A slit 13 is formed on the front surface of the upper opening by covering the wall surface with a clearance of a certain width, and the cleaning liquid leaks from the cleaning liquid discharge groove 10, so that the upper portion of the spin cup 5 is aligned. To when flowing, after the cleaning liquid has to flow the slit 13 portion, characterized by washing the spin cup 5 in the wall flows into the spin cup 5 along the wall.
Next, the spin coater according to the present invention will be described in more detail.
Although the embodiments described below are preferred embodiments of the present invention, various technically preferable limitations are attached thereto, but the scope of the present invention is intended to limit the present invention in the following description. Unless otherwise described, the present invention is not limited to these embodiments.

FIG. 1 is a sectional view of a rotary film forming apparatus 1 according to an embodiment of the present invention. The configuration of the rotary film forming apparatus 1 will be described below.
The rotating film forming apparatus 1 includes a substrate S, a rotating shaft 2 that rotates the substrate S, a spin table 3 that adsorbs the substrate S to the rotating shaft 2, and a nozzle (not shown) that supplies a coating liquid to the substrate S. The rotating shaft 2 and the spin table 3 correspond to a rotating portion in the present invention, and illustration of nozzles for supplying a coating liquid to the substrate is omitted.
In addition, the rotary film forming apparatus 1 passes outside the apparatus through the exhaust gas and the waste liquid of the coating liquid or the cleaning liquid sucked together with the extra small droplets (mist) of the coating liquid scattered when the substrate S on which the coating liquid is dropped is rotated at high speed. An opening 4 for taking out, a substrate S, and a spin cup 5 surrounding the rotating part are provided.
Further, the rotary film forming apparatus 1 includes a spin cup lower surface plate 6 that receives the coating liquid that has flowed down to the lower side of the substrate S and the back rinse liquid that has cleaned the back surface of the substrate S and rectifies the opening 4.

Further, in the configuration according to the present invention, the coating liquid adhering to the inner wall surface (the surface facing the substrate S) is washed off at the uppermost portions of the side cylindrical portion 5a of the spin cup 5 and the inclined surface 6a of the spin cup lower surface plate 6. A cleaning liquid supply path 7 for supplying a possible cleaning liquid is provided.
In other words, a spin cup cleaning that includes a cleaning liquid supply path 7 that circulates above the inner wall surface of the spin cup 5 and that flows the cleaning liquid along the inner wall surface of the spin cup 5 from the cleaning liquid supply path 7. It has a mechanism. In addition, the spin cup cleaning mechanism includes a cleaning liquid supply path 7 that runs around the bottom of the inner wall surface of the spin cup 5.

  FIG. 2 is an enlarged view of the periphery of the cleaning liquid supply path 7, FIG. 2A is an enlarged cross-sectional view of the uppermost portion of the spin cup side cylindrical portion 5a, and FIG. Shown in 2 (b). In addition, the same code | symbol is used about the component which has the same function in Fig.2 (a) and FIG.2 (b).

The cleaning liquid supply path 7 shown in FIGS. 1 and 2 is filled with the cleaning liquid supply path 7 by injecting a cleaning liquid (not shown) from a plurality of cleaning liquid injection ports 8.
If the cleaning liquid is further injected into the cleaning liquid supply path 7 from the cleaning liquid inlet 8 while the cleaning liquid supply path 7 is filled with the cleaning liquid, the cleaning liquid overflows from the cleaning liquid supply path 7 and the inner wall surface of the spin cup 5 or the spin cup lower surface plate 6. And wash away the coating solution adhering to the same part.

  A method of overflowing the above-described cleaning liquid and flowing it out to the inner wall surface of the spin cup 5 or the spin cup lower surface plate 6 will be described. The cleaning liquid supply path 7 provided continuously in the circumferential direction from a large number of small holes 9 provided on the side surface of the cleaning liquid supply path 7 shown in FIG. 3A or above the cleaning liquid supply path 7 shown in FIG. A method is used in which the cleaning liquid is discharged from the cleaning liquid discharge groove 10 having the same width as that of the first liquid, the inner wall surface is flowed, and the coating liquid adhering to the same portion is washed away.

  However, in the method of discharging the cleaning liquid from the small holes 9 provided on the side surface of the cleaning liquid supply path 7 shown in FIG. 3A, the cleaning liquid discharged from the small holes 9 has a streak shape in the vertical direction from the discharged small holes 9. Have a tendency to flow. For this reason, in order to sufficiently clean the entire inner wall surface, it is necessary to increase the injection pressure of the cleaning liquid injected from the cleaning liquid injection port 8 and discharge a large amount of cleaning liquid.

Further, in the conventional example shown in FIG. 3B, when the injection pressure of the cleaning liquid injected from the cleaning liquid injection port 8 is kept low and the inner wall surface is cleaned with a small amount of cleaning liquid, the cleaning liquid is uniformly distributed over the entire inner wall surface. Instead of flowing out, it flows concentrated in some areas. This is a phenomenon caused by delicate processing or assembly variations. Even if the flow rate balance of the cleaning liquid injected from the plurality of cleaning liquid injection ports 8 is adjusted or the leveling adjustment of the spin cup 5 is performed, It is difficult to completely eliminate this.
As a result, it is essential to perform an operation of cleaning the entire inner wall surface by increasing the injection pressure of the cleaning liquid injected from the cleaning liquid injection port 8 and discharging a large amount of cleaning liquid.

Therefore, in the present invention, as shown in FIG. 2A, the front surface of the cleaning liquid discharge groove (upper opening) 10 is covered with the overhang portion 12 at a predetermined interval, and the overhang portion 12 and the spin cup side cylindrical portion are covered. A slit 13 having a predetermined width was formed between the gap 5a.
In other words, the spin cup cleaning mechanism is provided with an upper opening portion of the cleaning liquid discharge groove 10 that communicates with the cleaning liquid supply path 7 and opens continuously on the inner wall surface of the spin cup 5. Along the inner wall surface of the spin cup 5, the spin cup 5 is covered via a clearance having a certain width. With this configuration, the slit 13 is formed in front of the upper opening.
The term “open continuously” as used herein refers to a form in which the spin cup 5 is continuously open on the circumference of the inner wall surface, and does not include a form having intermittent openings. .

By adopting such a configuration, the cleaning liquid flowing out from the cleaning liquid supply path 7 to the cleaning liquid discharge groove 10 first collides with the overhang portion 12 to change the direction of flow, and while expanding in the slit 13, the spin cup side cylindrical portion It flows down along 5a. As a result, compared with the conventional example in which the inner surface of the spin cup is cleaned with the cleaning liquid overflowing from the cleaning liquid discharge groove, the cleaning liquid flows efficiently and reliably over the entire side surface of the spin cup, and the same portion is cleaned with a smaller amount of cleaning liquid. It becomes possible.
That is, when the cleaning liquid leaks from the cleaning liquid discharge groove and flows along the spin cup 5, the cleaning liquid flows along the slit 13 portion and then flows along the inner wall surface of the spin cup 5 to clean the inner wall surface of the spin cup 5. Efficient and reliable cleaning can be realized with a small amount of cleaning liquid.

Furthermore, in the present invention, it is preferable to provide a narrowed portion 11 that is sufficiently narrower than the cleaning liquid supply path 7 in the cleaning liquid flow path between the cleaning liquid supply path 7 and the cleaning liquid discharge groove 10. Further, it is preferable that the width (clearance) of the slit 13 provided between the overhang portion 12 and the spin cup side cylindrical portion 5 a is set wider than that of the aperture portion 11.
Specifically, the aperture is obtained by multiplying the slit width by 0.2 to 0.3 mm with respect to the slit width of 0.4 to 0.6 mm, and more preferably by multiplying the slit width by 0.5 to 0.6. The width of the diaphragm portion is set to 0.25 to 0.3 mm with respect to the width of the portion, for example, the slit width of 0.5 mm. In this case, the length of the overhang portion 12 is 3 to 4 mm, and the short diameter of the cleaning liquid supply path 7 is 4 to 5 mm.
In addition, when the upper opening as the narrowed portion 11 does not have a uniform width but has a narrow portion, the width of the narrow portion can be compared with the cleaning liquid supply path 7 and the slit 13. preferable. The same applies to the bottom opening as the diaphragm 11.

  When a plurality of, preferably four or more, more preferably eight or more cleaning liquid injection ports 8 provided in the above-described configuration of the cleaning liquid supply path 7 according to the present invention are injected to fill the interior and further inject the cleaning liquid, The cleaning liquid is discharged to the outside through the throttle unit 11. At this time, since the throttle portion 11 is narrowed to a sufficiently narrow width as compared with the cleaning liquid supply path 7, the discharge pressure of the cleaning liquid flowing out toward the throttle portion 11 is equal to the injection pressure from the cleaning liquid inlet 8. Has been enhanced. As a result, the cleaning liquid is discharged from the cleaning liquid discharge groove 10 not in a part of the region that is relatively easy to discharge but in the entire circumferential direction. Further, since the throttle portion 11 is narrowed to a sufficiently narrow width as compared with the cleaning liquid supply path 7, the flow rate of the cleaning liquid discharged with respect to the discharge pressure can be reduced.

Subsequently, the cleaning liquid discharged from the cleaning liquid discharge groove 10 flows on the inner wall surface of the spin cup 5 through the slit 13 while colliding with the overhang portion 12 covering the front and spreading in the circumferential direction. Since the slit 13 is wider than the throttle portion 11, the flow resistance when flowing through the slit portion 11 is small, and the cleaning liquid flows more easily than the throttle portion 11. Therefore, the cleaning liquid immediately after passing through the throttle portion 11 has an increased flow rate due to a rapid change (decrease) in the flow resistance, and the rectifying effect when the cleaning liquid collides with the overhang portion 12 and changes the flow direction is increased. The entire inner wall surface of the spin cup 5 flows more efficiently and reliably.
As a result, the entire inner wall surface of the spin cup 5 can be sufficiently cleaned with a small amount of cleaning liquid.

In the present invention, as shown in FIG. 2B, the spin cup lower surface plate 6 is also provided with a cleaning mechanism having the same configuration as that of the upper portion of the spin cup 5 so that a small amount of coating liquid adhering to the inner wall surface 6a can be obtained. It can be washed sufficiently with a cleaning solution.
Specifically, a bottom opening of a cleaning liquid discharge groove is provided which communicates with the cleaning liquid supply path 7 and is continuously open at the bottom of the inner wall surface of the spin cup 5, and the bottom opening is formed inside the spin cup 5. It is covered along the wall surface with a certain clearance. As a result, a slit 13 is formed in front of the bottom opening.
When the cleaning liquid leaks from the cleaning liquid discharge groove and flows along the bottom of the spin cup 5, the cleaning liquid flows through the slit 13 and then flows along the bottom of the inner wall surface of the spin cup 5 to clean the bottom of the spin cup 5.

As a result, the excess coating liquid that has been shaken off is dried and solidified, and crystal pieces or powder are deposited in the apparatus, and the deposited crystal pieces or powder adhere to the substrate S during the coating process due to some kind of trigger and become defective. The trouble can be avoided.
Various functional elements can be manufactured using the substrate formed by the spin coating apparatus according to the present invention as described above, and various apparatuses can be manufactured using the elements. Since an element and a device using the element are manufactured using a substrate in which defects generated during the spin coating process are suppressed by the method according to the present invention, it is possible to manufacture an element and an apparatus with few defects at a high yield. It becomes possible.
Specific examples of the element and device include a piezoelectric element as a functional element, an inkjet head manufactured by providing a mechanism for ejecting ink to the piezoelectric element, an inkjet printer equipped with the inkjet head, and the functionality of the piezoelectric element. MEMS mirrors (micromirrors) manufactured in this way, scanners and projectors using the same, infrared sensors utilizing pyroelectricity as functional elements, and automatic lighting equipment using the same.

S Substrate 1 Rotating film forming apparatus 2 Rotating shaft 3 Spin table 4 Aperture 5 Spin cup 6 Spin cup bottom plate 6 a Inclined surface 7 Cleaning liquid supply path 8 Cleaning liquid inlet 9 Small hole 9
10 Cleaning liquid discharge groove 11 Restriction part 12 Overhang part 13 Slit

Japanese Utility Model Publication No. 6-28223 JP-A-5-169004 JP 2011-086826 A JP 2000-114219 A JP 2007-149890 A JP 11-283949 A JP 2002-143749 A Japanese Patent Laid-Open No. 11-033468 Japanese Patent Laid-Open No. 10-005668 Japanese Patent Laid-Open No. 05-160017 JP 09-117708 A JP-A-62-234572 JP 2003-174005 A Japanese Patent Laid-Open No. 02-268415

Claims (10)

A rotating part for fixing and rotating the substrate;
A nozzle for supplying a coating liquid to the substrate;
A spin cup covering the rotating part;
A spin coating apparatus having a spin cup cleaning mechanism for cleaning the inner wall surface by flowing a cleaning liquid along the inner wall surface of the spin cup from a cleaning liquid supply path which is circulated around an upper surface of the inner wall surface of the spin cup,
The spin cup cleaning mechanism communicates with the cleaning liquid supply path, and is provided with an upper opening of a cleaning liquid discharge groove that is continuously open on the inner wall surface of the spin cup,
The upper opening is covered with a fixed width clearance along the inner wall surface of the spin cup, and a slit is formed on the front surface of the upper opening.
When the cleaning liquid leaks from the cleaning liquid discharge groove and flows along the upper portion of the spin cup, the cleaning liquid flows through the slit portion and then flows along the inner wall surface of the spin cup to clean the inner surface of the spin cup. Rotating coating device. The spin cup cleaning mechanism includes a cleaning liquid supply path that extends around the bottom of the inner wall surface of the spin cup, communicates with the cleaning liquid supply path, and continuously opens at the bottom of the inner wall surface of the spin cup. The bottom opening of the cleaning liquid discharge groove is provided,
The bottom opening is covered with a certain width of clearance along the inner wall surface of the spin cup, so that a slit is formed in front of the bottom opening,
When the cleaning liquid leaks out from the cleaning liquid discharge groove and flows along the bottom of the spin cup, the cleaning liquid flows along the bottom of the inner wall surface of the spin cup after flowing through the slit portion to clean the bottom of the spin cup. The spin coater according to claim 1. The width of the upper opening and / or the width of the bottom opening is reduced compared to the cleaning liquid supply path communicating with the cleaning liquid discharge groove,
3. The width of the upper opening and / or the width of the bottom opening is narrower than a clearance of a slit provided to face the upper opening and / or the bottom opening. The spin coater described. A rotating part that fastens and fastens the substrate;
A nozzle for supplying a coating liquid to the substrate;
A spin cup covering the rotating part;
A spin cup cleaning mechanism that cleans the inner wall surface by flowing a cleaning liquid along the inner wall surface of the spin cup from a cleaning liquid supply path that circulates above the inner wall surface of the spin cup. And
The spin cup cleaning mechanism communicates with the cleaning liquid supply path, and is provided with an upper opening of a cleaning liquid discharge groove that is continuously open on the inner wall surface of the spin cup,
The upper opening is covered with a fixed width clearance along the inner wall surface of the spin cup, and a slit is formed on the front surface of the upper opening.
When the cleaning liquid leaks from the cleaning liquid discharge groove and flows along the upper portion of the spin cup, the cleaning liquid flows through the slit portion and then flows along the inner wall surface of the spin cup to clean the inner surface of the spin cup. A method for cleaning a spin coater. The spin cup cleaning mechanism includes a cleaning liquid supply path that extends around the bottom of the inner wall surface of the spin cup, communicates with the cleaning liquid supply path, and continuously opens at the bottom of the inner wall surface of the spin cup. The bottom opening of the cleaning liquid discharge groove is provided,
The bottom opening is covered with a certain width of clearance along the inner wall surface of the spin cup, so that a slit is formed in front of the bottom opening,
When the cleaning liquid leaks out from the cleaning liquid discharge groove and flows along the bottom of the spin cup, the cleaning liquid flows along the bottom of the inner wall surface of the spin cup after flowing through the slit portion to clean the bottom of the spin cup. The cleaning method of the spin coater according to claim 4. The width of the upper opening and / or the width of the bottom opening is reduced compared to the cleaning liquid supply path communicating with the cleaning liquid discharge groove,
6. The width of the upper opening and / or the width of the bottom opening is narrower than a clearance of a slit provided to face the upper opening and / or the bottom opening. The washing | cleaning method of the spin coater of description.   A substrate, wherein the film is formed by the spin coater according to claim 1.   An element manufactured using the substrate according to claim 7.   An apparatus manufactured using the element according to claim 8. A spin cup cleaning mechanism used in the spin coater according to any one of claims 1 to 3.